JP2796043B2 - Electronic components - Google Patents

Electronic components

Info

Publication number
JP2796043B2
JP2796043B2 JP5189712A JP18971293A JP2796043B2 JP 2796043 B2 JP2796043 B2 JP 2796043B2 JP 5189712 A JP5189712 A JP 5189712A JP 18971293 A JP18971293 A JP 18971293A JP 2796043 B2 JP2796043 B2 JP 2796043B2
Authority
JP
Japan
Prior art keywords
sealing member
sealing layer
ceramic substrate
fused silica
sealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5189712A
Other languages
Japanese (ja)
Other versions
JPH0745753A (en
Inventor
淳一 中村
勉 小田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP5189712A priority Critical patent/JP2796043B2/en
Publication of JPH0745753A publication Critical patent/JPH0745753A/en
Application granted granted Critical
Publication of JP2796043B2 publication Critical patent/JP2796043B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は電子素子を含む所定回路
を形成したセラミック基板を封止部材により被覆した電
子部品に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electronic component in which a ceramic substrate on which a predetermined circuit including an electronic element is formed is covered with a sealing member.

【0002】[0002]

【従来の技術】従来、セラミック基板上に所定回路パタ
ーンを形成し、該回路パターン上に半導体素子やコンデ
ンサ等の電子素子を実装し、セラミック基板を樹脂など
の封止部材で被覆した電子部品が多用されている。これ
は、一般に混成集積回路と呼ばれている。
2. Description of the Related Art Conventionally, an electronic component in which a predetermined circuit pattern is formed on a ceramic substrate, electronic elements such as semiconductor elements and capacitors are mounted on the circuit pattern, and the ceramic substrate is covered with a sealing member such as a resin. It is heavily used. This is commonly called a hybrid integrated circuit.

【0003】このような封止部材は、熱硬化性樹脂、充
填材、顔料などの添加剤を溶剤によって溶解した封止樹
脂を浸漬法などによってセラミック基板の周囲に塗膜し
て、溶剤を乾燥除去して硬化することによって形成して
いた。
[0003] Such a sealing member is formed by coating a sealing resin obtained by dissolving additives such as a thermosetting resin, a filler and a pigment with a solvent around a ceramic substrate by a dipping method or the like, and drying the solvent. It was formed by removing and curing.

【0004】そして、このような封止部材を構成する熱
硬化性樹脂や充填材の材料やその構成比率を制御して、
緻密で耐水性に優れ、クラックや剥離が発生せず、さら
にはセラミック基板との熱膨張係数差を小さくなるよう
にしていた。
[0004] By controlling the material of the thermosetting resin and the filler constituting the sealing member and the composition ratio thereof,
It is dense and excellent in water resistance, is free from cracks and peeling, and has a small difference in thermal expansion coefficient from the ceramic substrate.

【0005】一般に、セラミック基板との熱膨張係数差
を小さくするために封止部材の中の充填材の割合を多く
すると、充填材間に介在されて接着剤として作用する熱
硬化性樹脂の割合が相対的に少なくなり、封止部材の目
が粗くなり、耐水性が充分な特性が得られない。
In general, when the proportion of the filler in the sealing member is increased in order to reduce the difference in thermal expansion coefficient from the ceramic substrate, the proportion of the thermosetting resin interposed between the fillers and acting as an adhesive is increased. Is relatively small, the mesh of the sealing member is coarse, and sufficient characteristics of water resistance cannot be obtained.

【0006】また、逆に充填材の割合を少なくし封止材
の目を緻密にすると、セラミック基板との熱膨張係数差
が大きくなり、熱衝撃が加わった際に封止部材にクラッ
クや剥離が生じるといった問題が発生する。
On the other hand, if the proportion of the filler is reduced and the mesh of the sealing material is made finer, the difference in thermal expansion coefficient from the ceramic substrate increases, and cracks or peeling of the sealing member occurs when a thermal shock is applied. A problem such as the occurrence of a problem occurs.

【0007】そこで、上述の相反する両特性を満足させ
るためには、従来は、封止部材を多層構造にして、充填
部材が多い封止層にワックスを含浸させて、耐水性・耐
湿性を向上させたり(特開昭64−44052号)、両
特性を満足するように、異種の樹脂で下地封止層と外装
封止層を構成していた(特開平2−134892号)。
[0007] Therefore, in order to satisfy both of the above-mentioned contradictory characteristics, conventionally, the sealing member has a multilayer structure, and the sealing layer having a large number of filling members is impregnated with wax to improve water resistance and moisture resistance. In order to improve both properties (Japanese Unexamined Patent Publication No. 64-44052) and to satisfy both characteristics, the undersealing sealing layer and the exterior sealing layer are made of different kinds of resins (Japanese Unexamined Patent Publication No. 2-134892).

【0008】[0008]

【発明が解決しようとする課題】しかしながら、ワック
スを含浸させた封止部材は、この電子部品をプリント配
線基板に半田接合したり、その他の熱処理を施したり、
さらには高温で使用した場合、ワックスが溶融してしま
い、耐水性が著しく劣化するという問題点があった。
However, the sealing member impregnated with the wax can be used to solder the electronic component to a printed wiring board or to perform other heat treatments.
Further, when used at a high temperature, there is a problem that the wax is melted and the water resistance is significantly deteriorated.

【0009】さらに、異種の樹脂を組み合わせた多層構
造の封止部材は、夫々の封止層において異種の樹脂を用
いているため、樹脂物性の違いにより、各々の封止層の
界面の剥離や膨れを生じ易く、耐熱衝撃性が劣化した
り、根本的に樹脂硬化条件が異なるために樹脂の硬化工
程が複雑となるという問題点があった。
Further, in a sealing member having a multilayer structure in which different types of resins are combined, different types of resins are used in the respective sealing layers. There is a problem that blisters are easily generated, thermal shock resistance is deteriorated, and a curing process of the resin is complicated due to fundamentally different resin curing conditions.

【0010】本発明は上述の問題点に鑑みて案出された
ものであり、その目的は多層構造の封止部材の各層の夫
々に熱硬化性樹脂としてエポキシ系樹脂を用いて、硬化
工程を容易し、しかも耐水性及び耐熱衝撃性が良好な封
止部材を有する電子部品を提供することにある。
The present invention has been devised in view of the above-mentioned problems, and has as its object to perform a curing step by using an epoxy resin as a thermosetting resin for each layer of a sealing member having a multilayer structure. An object of the present invention is to provide an electronic component having a sealing member that is easy and has good water resistance and thermal shock resistance.

【0011】[0011]

【問題を解決するための手段】本発明は、電子素子が実
装されたセラミック基板を多層構造の封止部材で被覆し
て成る電子部品において、前記封止部材が熱硬化性樹脂
であるエポキシ系樹脂と充填材である溶融シリカガラス
を含み、前記セラミック基板に接する側(以下、下地封
止層という)には80重量%以上の溶融シリカガラス
を、外装側(以下、外装封止層という)には77.5重
量%以下の溶融シリカガラスを含有している電子部品で
あり、好ましくは、前記封止部材が2層構造から成り、
その膜厚が0.5〜2.5mmであり、且つ外装側の封
止層の厚みが全体の66%以上である。
According to the present invention, there is provided an electronic component comprising a ceramic substrate on which an electronic element is mounted, covered with a sealing member having a multilayer structure, wherein the sealing member is a thermosetting resin. 80% by weight or more of fused silica glass containing resin and fused silica glass as a filler, and being in contact with the ceramic substrate (hereinafter referred to as a base sealing layer); Is an electronic component containing 77.5% by weight or less of fused silica glass, preferably, the sealing member has a two-layer structure,
The film thickness is 0.5 to 2.5 mm, and the thickness of the sealing layer on the exterior side is 66% or more of the whole.

【0012】[0012]

【作用】本発明によれば、多層構造の封止部材を形成す
るにあたり、各層に同種の熱硬化性樹脂であるエポキシ
系樹脂を用いて形成されるので、硬化工程を各層同一に
行うことが可能となり、製造工程が簡略化でき、各層の
界面に膨れや剥離を生じない封止部材が得られる。
According to the present invention, when forming a sealing member having a multi-layer structure, each layer is formed by using an epoxy resin which is the same type of thermosetting resin. This makes it possible to simplify the manufacturing process and obtain a sealing member that does not cause swelling or peeling at the interface between the layers.

【0013】また、セラミック基板と接する側の下地封
止層は、充填材である溶融シリカガラスが80%以上添
加されているため、この下地封止層とセラミック基板と
の熱膨張係数差が小さくなり、これによって耐熱衝撃性
が向上する。
Further, since the fused silica glass as a filler is added to the base sealing layer on the side in contact with the ceramic substrate at 80% or more, the difference in thermal expansion coefficient between the base sealing layer and the ceramic substrate is small. This improves the thermal shock resistance.

【0014】また、外装封止層は、充填材である溶融シ
リカガラスが77.5%以下であるため、相対的に充填
材添加量が少なく樹脂量が多くなり、封止部材の目が緻
密となり、耐水性が良好となる。
Further, since the outer sealing layer contains 77.5% or less of fused silica glass as a filler, the amount of the filler is relatively small and the amount of the resin is relatively large, so that the sealing member has a fine mesh. And the water resistance becomes good.

【0015】これにより、製造工程が容易で、耐水性や
耐衝撃性に優れた封止部材を有する電子部品が達成され
る。
As a result, an electronic component having a sealing member which is easy to manufacture and has excellent water resistance and impact resistance is achieved.

【0016】尚、封止部材を2層構造とした時、その厚
みは全体として0.5〜2.5mmが望ましい。0.5
mmを下回ると、セラミック基板のエッヂ部分で封止部
材が極めて薄くなり、セラミック基板が露出してしまう
可能性があり、また、2.5mmを越えると、電子部品
全体の厚みが厚くなり、プリント配線基板上での高密度
実装が困難となる。
When the sealing member has a two-layer structure, its thickness is desirably 0.5 to 2.5 mm as a whole. 0.5
If the thickness is less than 2.5 mm, the sealing member becomes extremely thin at the edge of the ceramic substrate, and the ceramic substrate may be exposed. High-density mounting on a wiring board becomes difficult.

【0017】また、上述の封止部材の厚みにおいて、外
装封止層の厚みを全体の66.6%以上にする。66.
6%を下回ると耐水性が大きく劣化してしまう。
In the above-mentioned thickness of the sealing member, the thickness of the exterior sealing layer is set to 66.6% or more of the whole. 66.
If it is less than 6%, the water resistance is greatly deteriorated.

【0018】[0018]

【実施例】以下、本発明の電子部品を図面を用いて詳説
する。図1は、本発明の電子部品の一部で封止部材を省
略した概略図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an electronic component according to the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic view in which a sealing member is omitted in a part of the electronic component of the present invention.

【0019】図において、1はセラミック基板、2は回
路を形成するための導体パターン、3は電子素子の一例
である半導体素子、4は電子素子の一例であるチップ抵
抗、チップコンデンサなどのチップ部品、5・・はリー
ド端子、6は封止部材である。尚、図では、封止部材6
は2層構造であり、セラミック基板1と接する側の封止
層、即ち下地封止層61と、外装側の封止層、即ち外装
封止層62とから構成されている。
In the drawing, 1 is a ceramic substrate, 2 is a conductor pattern for forming a circuit, 3 is a semiconductor element as an example of an electronic element, and 4 is a chip component such as a chip resistor and a chip capacitor as an example of an electronic element. ,... Are lead terminals, and 6 is a sealing member. In the drawing, the sealing member 6 is shown.
Has a two-layer structure, and includes a sealing layer on the side in contact with the ceramic substrate 1, that is, a base sealing layer 61, and a sealing layer on the exterior side, that is, an exterior sealing layer 62.

【0020】セラミック基板1の表面に、所定回路を形
成する導体パターン2が厚膜技術、例えば、導電性ペー
ストの印刷・焼きつけによって形成されている。この導
体パターン2には、電子素子である半導体素子3や各種
チップ部品4が実装されている。尚、半導体素子3と導
体パターン2との接合はワイヤボンディングや半田バン
プによるフェースボンディングなどによって行われ、チ
ップ部品4と導体パターン2との接合は半田接合などに
よって行われる。また、セラミック基板1の端部には、
導体パターン2と接続するように複数のリード端子5・
・・が接合されている。
On the surface of the ceramic substrate 1, a conductor pattern 2 for forming a predetermined circuit is formed by a thick film technique, for example, printing and baking of a conductive paste. A semiconductor element 3 as an electronic element and various chip components 4 are mounted on the conductor pattern 2. The bonding between the semiconductor element 3 and the conductor pattern 2 is performed by wire bonding or face bonding using solder bumps, and the bonding between the chip component 4 and the conductor pattern 2 is performed by solder bonding or the like. Also, at the end of the ceramic substrate 1,
A plurality of lead terminals 5.
.. are joined.

【0021】このようなセラミック基板1の周囲には、
封止部材6が被覆される。
Around such a ceramic substrate 1,
The sealing member 6 is covered.

【0022】封止部材6は、下地封止層61および最外
の封止層62から成り、熱硬化性樹脂であるエポキシ系
樹脂、充填材である溶融シリカガラスを主成分となって
いる。
The sealing member 6 is composed of a base sealing layer 61 and an outermost sealing layer 62, and is mainly composed of an epoxy resin as a thermosetting resin and a fused silica glass as a filler.

【0023】下地封止層61は、充填材である溶融シリ
カガラスを80重量%以上含み、残部は実質的に熱硬化
性樹脂であるエポキシ系樹脂である。
The base sealing layer 61 contains at least 80% by weight of a fused silica glass as a filler, and the remainder is substantially an epoxy resin which is a thermosetting resin.

【0024】これに対して、外装封止層62は、充填材
である溶融シリカガラスを77.5重量%以下となるよ
うに設定され、残部は実質的に熱硬化性樹脂であるエポ
キシ系樹脂である。
On the other hand, the outer sealing layer 62 is set so that the content of the fused silica glass as a filler is 77.5% by weight or less, and the remainder is substantially an epoxy resin which is a thermosetting resin. It is.

【0025】このような2層構造の封止部材6は、次の
ような製造方法によって作成される。
The sealing member 6 having such a two-layer structure is manufactured by the following manufacturing method.

【0026】まず、下地封止層61、外装封止層62と
なる溶剤によって溶解した樹脂を用意する。例えば、下
地封止層61となる溶解樹脂は、硬化後、即ち溶剤が除
去された後に、溶融シリカガラスが80重量%以上とな
るように、エポキシ系樹脂、溶融シリカガラス、顔料な
どの添加剤を溶剤に解かして作成する。尚、外装封止層
62となる溶解樹脂をも同様にして作成する。
First, a resin dissolved by a solvent for the base sealing layer 61 and the exterior sealing layer 62 is prepared. For example, the melted resin serving as the base sealing layer 61 may be added with an additive such as an epoxy resin, a fused silica glass, or a pigment so that the fused silica glass becomes 80% by weight or more after curing, that is, after the solvent is removed. Is dissolved in a solvent. In addition, the dissolving resin which becomes the exterior sealing layer 62 is similarly prepared.

【0027】次に、半導体素子3やチップ部品4が導体
パターン2上に実装され、且つリード端子5・・が接合
したセラミック基板1を、下地封止層61となる溶解樹
脂の浴中に浸漬して、引上げ後、風乾を行う。尚、下地
封止層61の厚みを所定値にするために、この浸漬、引
き上げ、風乾を複数回繰り返しても構わない。
Next, the ceramic substrate 1 on which the semiconductor element 3 and the chip component 4 are mounted on the conductor pattern 2 and to which the lead terminals 5 are joined is immersed in a bath of a molten resin to be a base sealing layer 61. After pulling up, air dry. In order to set the thickness of the base sealing layer 61 to a predetermined value, this immersion, pulling up, and air drying may be repeated a plurality of times.

【0028】次いで、この下地封止層61となる樹脂が
塗布されたセラミック基板1を、外装封止層62となる
溶解樹脂の浴中に浸漬して、引上げ後、風乾を行う。
尚、外装封止層62の厚みを所定値にするために、この
浸漬、引き上げ、風乾を複数回繰り返しても構わない。
これにより、封止部材6の厚みを0.5〜2.5mmと
し、且つ外装封止層62の全体に対する厚み比率を6
6.6%以上にする。
Next, the ceramic substrate 1 coated with the resin to be the base sealing layer 61 is immersed in a bath of a molten resin to be the exterior sealing layer 62, pulled up, and air-dried.
In order to set the thickness of the exterior sealing layer 62 to a predetermined value, the immersion, lifting, and air drying may be repeated a plurality of times.
Thereby, the thickness of the sealing member 6 is set to 0.5 to 2.5 mm, and the thickness ratio of the exterior sealing layer 62 to the whole is 6 mm.
6.6% or more.

【0029】その後、150℃、30〜3時間の加熱処
理により、熱硬化性樹脂であるエポキシ系樹脂を完全に
硬化する。
Thereafter, the epoxy resin which is a thermosetting resin is completely cured by a heat treatment at 150 ° C. for 30 to 3 hours.

【0030】これにより、下地封止層61及び外装封止
層62とから成る封止部材6が、セラミック基板1の周
囲に被着形成されることになる。
As a result, the sealing member 6 including the base sealing layer 61 and the exterior sealing layer 62 is formed around the ceramic substrate 1.

【0031】上述の封止部材6において、下地封止層6
1は充填材である溶融シリカガラスが多く含まれてい
る。従って、セラミック基板1の熱膨張係数に比較的近
い値の溶融シリカガラスが多いため、セラミック基板1
との熱膨張係数の差を小さくすることができ、耐熱衝撃
性が向上し、熱衝撃によるセラミック基板1と封止部材
6との間で剥離、半導体素子3のワイヤ細線の破損など
を有効に防止することができる。
In the sealing member 6 described above, the base sealing layer 6
No. 1 contains a large amount of fused silica glass as a filler. Therefore, since there are many fused silica glass having a value relatively close to the coefficient of thermal expansion of the ceramic substrate 1, the ceramic substrate 1
The thermal shock resistance is improved, and peeling between the ceramic substrate 1 and the sealing member 6 due to the thermal shock and breakage of the thin wires of the semiconductor element 3 can be effectively prevented. Can be prevented.

【0032】また、外装封止層62は下地封止層61に
比較して、溶融シリカガラスは少なく、熱硬化性樹脂で
あるエポキシ系樹脂が相対的に多く含まれているため、
溶融シリカガラスの周囲に接着材として作用する充分な
量のエポキシ系樹脂が介在されるため、緻密な封止層と
なる。これにより1g中の吸水量が4mmg以下とな
り、封止部材6の全体として耐水性が優れたものとな
る。
Since the exterior sealing layer 62 contains less fused silica glass and contains a relatively large amount of an epoxy resin as a thermosetting resin as compared with the base sealing layer 61,
Since a sufficient amount of epoxy resin acting as an adhesive is interposed around the fused silica glass, a dense sealing layer is formed. As a result, the water absorption in 1 g becomes 4 mmg or less, and the sealing member 6 as a whole has excellent water resistance.

【0033】さらに、両封止層61、62は、互いに同
種の熱硬化性樹脂であるエポキシ系樹脂が用いられてい
ること、上述の硬化工程で説明したように、一括的に硬
化を行うことができ、しかも、構造的に、両封止層6
1、62の界面が強固な状態で接合され、その間での剥
離などが発生しない。
Further, both sealing layers 61 and 62 are made of the same type of thermosetting resin, ie, an epoxy resin. In addition, structurally, both sealing layers 6
The interfaces 1 and 62 are joined in a strong state, and no separation occurs between them.

【0034】尚、上述の耐水性及び耐熱衝撃性を向上さ
れるためには、封止部材6の膜厚を0.5〜2.5mm
に設定し、且つ外装封止層62の厚み比率を66.6%
以上にすることが重要となる。
In order to improve the above-mentioned water resistance and thermal shock resistance, the thickness of the sealing member 6 should be 0.5 to 2.5 mm.
And the thickness ratio of the exterior sealing layer 62 is 66.6%.
It is important to do the above.

【0035】封止部材6の膜厚が0.5mmを下回る
と、セラミック基板1のエッヂ部分で封止部材が極めて
薄くなり、セラミック基板1が露出してしまい、耐湿性
が劣化してしまう。また、2.5mmを越えると、電子
部品全体の厚みが厚くなり、高密度実装のプリント配線
基板への使用が困難となり、また、硬化工程に要する時
間が非常長くなる。さらに、外装封止層62の厚み比率
が66.6%を下回ると耐水性が大きく劣化してしま
う。
If the thickness of the sealing member 6 is less than 0.5 mm, the sealing member becomes extremely thin at the edge of the ceramic substrate 1, exposing the ceramic substrate 1 and deteriorating the moisture resistance. On the other hand, if the thickness exceeds 2.5 mm, the thickness of the entire electronic component becomes large, making it difficult to use the printed wiring board for high-density mounting, and the time required for the curing step becomes extremely long. Further, when the thickness ratio of the exterior sealing layer 62 is less than 66.6%, the water resistance is greatly deteriorated.

【0036】本発明者らは、表1に示すように、下地封
止層61、外装封止層62の硬化後の溶融シリカガラス
の重量比率、外装封止層62の厚み比率を夫々設定した
電子部品を作成して、封止部材6の耐水性及び耐熱衝撃
性を調べた。
As shown in Table 1, the present inventors set the weight ratio of the fused silica glass after curing of the base sealing layer 61 and the exterior sealing layer 62 and the thickness ratio of the exterior sealing layer 62, respectively. An electronic component was prepared, and the water resistance and thermal shock resistance of the sealing member 6 were examined.

【0037】ここで、耐熱衝撃性は、電子部品を0℃と
100℃の水中にそれぞれ6分間ずつ浸漬し、これを繰
り返して封止部材6のクラックや剥離がどれくらいのサ
イクル数で起こるかを評価した。良品は1000サイク
ルを耐ええるものである。
Here, the thermal shock resistance refers to the number of cycles at which cracking or peeling of the sealing member 6 occurs by immersing an electronic component in water at 0 ° C. and 100 ° C. for 6 minutes each, and repeating this. evaluated. Good products can withstand 1000 cycles.

【0038】また、耐水性は、前記電子部品を65℃の
水中と0℃の飽和食塩水中にそれぞれ1時間浸漬し、こ
れを6回繰り返した後の吸水量を評価した。良品は1g
中の吸水量が4mmg以下のものである。
The water resistance was evaluated by immersing the electronic components in water at 65 ° C. and saturated saline at 0 ° C. for 1 hour, and repeating the procedure 6 times to evaluate the water absorption. Good product is 1g
It has a water absorption of 4 mmg or less.

【0039】尚、表1中における試料番号7〜11にお
いては封止部材6を1層構造であるものの、厚み2.5
mmを達成するために、同一の溶融樹脂の浴に浸漬・風
乾を複数回繰り返したものであり、同一組成の封止層が
多層に積層されていることと同じと言える。また封止部
材6の厚みは合計で2.5mmとした。
In Samples Nos. 7 to 11 in Table 1, although the sealing member 6 had a single-layer structure, the thickness was 2.5
mm is achieved by repeating immersion and air drying in a bath of the same molten resin a plurality of times, which can be said to be the same as having multiple layers of sealing layers having the same composition. The thickness of the sealing member 6 was 2.5 mm in total.

【0040】[0040]

【表1】 [Table 1]

【0041】表1から明らかなように、試料番号7〜1
1のうよに一層構造の封止部材では、厚みが2.5mm
であっても、耐水性及び耐熱衝撃性を同時に満足するも
のは得られない。
As is clear from Table 1, Sample Nos. 7-1
1, the thickness of the single-layered sealing member is 2.5 mm.
However, a material satisfying both water resistance and thermal shock resistance cannot be obtained.

【0042】2層構造の封止部材では、下地封止層61
の溶融シリカガラスが80重量%以上であれば(試料番
号1〜4、6)、耐熱衝撃性が良好となり、また、外装
封止層62の溶融シリカガラスが77.5重量%以下で
あれば(試料番号1〜5)であれば、封止部材6の1g
あたり吸水量は1〜4mgであり、耐水性が良好とな
る。
In the sealing member having the two-layer structure, the base sealing layer 61
When the fused silica glass is 80% by weight or more (Sample Nos. 1 to 4 and 6), the thermal shock resistance becomes good, and when the fused silica glass of the exterior sealing layer 62 is 77.5% by weight or less. (Sample number 1 to 5), 1 g of the sealing member 6
The water absorption per unit is 1 to 4 mg, and the water resistance is good.

【0043】従って、下地封止層61の充填材である溶
融シリカガラスの含有量が80重量%以上で、且つ外装
封止層62の充填材が溶融シリカガラスの含有量が7
7.5重量%以下であれば、耐水性と、耐熱衝撃性を満
足することが判る。ただし、封止部材6の溶融シリカガ
ラスの含有量が同一である試料番号3、6において、試
料番号6は、組成比率的には満足していても、外装封止
層62の厚み比率が33.3%と薄くなると、耐水性が
劣化してしまう。従って、外装封止層62の厚み比率は
66.6%以上となることが重要となる。
Therefore, the content of the fused silica glass as the filler of the base sealing layer 61 is 80% by weight or more, and the content of the fused silica glass of the exterior sealing layer 62 is 7% or more.
It is understood that when the content is 7.5% by weight or less, the water resistance and the thermal shock resistance are satisfied. However, in Sample Nos. 3 and 6 in which the content of the fused silica glass in the sealing member 6 is the same, Sample No. 6 has a thickness ratio of the exterior sealing layer 62 of 33 even though the composition ratio is satisfied. When it is as thin as 0.3%, the water resistance deteriorates. Therefore, it is important that the thickness ratio of the exterior sealing layer 62 be 66.6% or more.

【0044】尚、上述の実施例では封止部材6が下地封
止層61と外装封止層62との2層構造で説明したが、
この間に中間封止層を形成して、多層化を行っても構わ
ない。この場合、熱硬化性樹脂としてはエポキシ系樹脂
を用いることが重要である。
In the above-described embodiment, the sealing member 6 has a two-layer structure including the base sealing layer 61 and the exterior sealing layer 62.
During this time, an intermediate sealing layer may be formed to perform multilayering. In this case, it is important to use an epoxy resin as the thermosetting resin.

【0045】[0045]

【発明の効果】以上、本発明によれば、熱硬化性樹脂と
充填材を含む封止部材で、セラミック基板を被覆するよ
うに形成した電子部品であって、前記熱硬化性樹脂がエ
ポキシ系樹脂であり、前記充填材が溶融シリカガラスで
あり、前記基板に接する側の下地封止層の溶融シリカガ
ラスを80重量%以上含み、外装封止層では77.5重
量%以下含むため、これにより層間の膨れ等を防止し、
硬化工程が簡単で、且つ耐水性、耐熱衝撃性共に良好な
封止部材を得ることができ、安定してセラミック基板上
の回路パターンを保護することができる。
As described above, according to the present invention, there is provided an electronic component formed so as to cover a ceramic substrate with a sealing member containing a thermosetting resin and a filler, wherein the thermosetting resin is an epoxy-based resin. Resin, the filler is fused silica glass, and contains 80% by weight or more of the fused silica glass of the base sealing layer on the side in contact with the substrate, and 77.5% by weight or less in the exterior sealing layer. Prevents swelling between layers,
It is possible to obtain a sealing member which has a simple curing process and good water resistance and thermal shock resistance, and can stably protect a circuit pattern on a ceramic substrate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る電子部品の概略図である。FIG. 1 is a schematic view of an electronic component according to the present invention.

【符号の説明】[Explanation of symbols]

1・・・セラミック基板 2・・・導体パターン 3・・・半導体素子 4・・・チップ部品 5・・・リード端子 6・・・封止部材 61・・・下地層 62・・・最外層の封止層 DESCRIPTION OF SYMBOLS 1 ... Ceramic substrate 2 ... Conductor pattern 3 ... Semiconductor element 4 ... Chip component 5 ... Lead terminal 6 ... Sealing member 61 ... Underlayer 62 ... Outermost layer Sealing layer

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】電子素子が実装されたセラミック基板を多
層構造の封止部材で被覆して成る電子部品において、 前記封止部材が熱硬化性樹脂であるエポキシ系樹脂と充
填材である溶融シリカガラスを含んで構成され、前記セ
ラミック基板に接する側には80重量%以上の溶融シリ
カガラスを、外装側には77.5重量%以下の溶融シリ
カガラスを含有しているとともに、外装側の封止層の厚
みが、封止部材の厚みに対して66%以上であることを
特徴とする電子部品。
An electronic component comprising a ceramic substrate on which an electronic element is mounted and covered with a sealing member having a multilayer structure, wherein the sealing member is an epoxy resin as a thermosetting resin and a fused silica as a filler. It is composed of glass and contains 80% by weight or more of fused silica glass on the side in contact with the ceramic substrate and 77.5% by weight or less of fused silica glass on the exterior side. Stopper thickness
An electronic component, wherein the thickness is 66% or more of the thickness of the sealing member .
JP5189712A 1993-07-30 1993-07-30 Electronic components Expired - Fee Related JP2796043B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5189712A JP2796043B2 (en) 1993-07-30 1993-07-30 Electronic components

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5189712A JP2796043B2 (en) 1993-07-30 1993-07-30 Electronic components

Publications (2)

Publication Number Publication Date
JPH0745753A JPH0745753A (en) 1995-02-14
JP2796043B2 true JP2796043B2 (en) 1998-09-10

Family

ID=16245937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5189712A Expired - Fee Related JP2796043B2 (en) 1993-07-30 1993-07-30 Electronic components

Country Status (1)

Country Link
JP (1) JP2796043B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5981040U (en) * 1982-11-22 1984-05-31 太陽誘電株式会社 hybrid integrated circuit

Also Published As

Publication number Publication date
JPH0745753A (en) 1995-02-14

Similar Documents

Publication Publication Date Title
US5510594A (en) Method of manufacturing thick-film circuit component
US4306217A (en) Flat electrical components
US5576518A (en) Via-structure of a multilayer interconnection ceramic substrate
EP0142783B1 (en) Method for producing hybrid integrated circuit
JPH05102645A (en) Hybrid integrated circuit
JP3444291B2 (en) Ceramic electronic component and method of manufacturing the same
JP2796043B2 (en) Electronic components
JP3444290B2 (en) Ceramic electronic component and method of manufacturing the same
JPH0210571B2 (en)
JP4570190B2 (en) Wiring board
US4898805A (en) Method for fabricating hybrid integrated circuit
JPH04105310A (en) Multilayered ceramic capacitor
JPH0682908B2 (en) Method for manufacturing ceramic circuit board with resistor
JPS6025290A (en) Method of producing hybrid integrated circuit board
JPH0212949A (en) Circuit device using semiconductor chip
JPH05259633A (en) Electronic circuit device
JP2710492B2 (en) Method for manufacturing multilayer printed wiring board
JPH04346489A (en) Hybrid integrated circuit
JPS6234159B2 (en)
JPH01260711A (en) Paste composition and conductor
JPS62213194A (en) Thick film circuit board and manufacture of the same
JPS61112398A (en) Manufacture ceramic circuit board
JPH0864473A (en) Printed ceramic capacitor
JPS6297313A (en) Porcelain capacitor and cladding of the same
JPH0521934A (en) Substrate for hybrid integrated circuit and its manufacture

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees