JP2765050B2 - Magnetic recording media - Google Patents

Magnetic recording media

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Publication number
JP2765050B2
JP2765050B2 JP1126943A JP12694389A JP2765050B2 JP 2765050 B2 JP2765050 B2 JP 2765050B2 JP 1126943 A JP1126943 A JP 1126943A JP 12694389 A JP12694389 A JP 12694389A JP 2765050 B2 JP2765050 B2 JP 2765050B2
Authority
JP
Japan
Prior art keywords
film
chromium
plane
peak intensity
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1126943A
Other languages
Japanese (ja)
Other versions
JPH02306425A (en
Inventor
健生 福田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1126943A priority Critical patent/JP2765050B2/en
Publication of JPH02306425A publication Critical patent/JPH02306425A/en
Application granted granted Critical
Publication of JP2765050B2 publication Critical patent/JP2765050B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 産業上の利用分野 本発明は磁気記録再生装置、たとえば磁気ディスク装
置に用いられる磁気記録媒体に関するものである。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording / reproducing apparatus, for example, a magnetic recording medium used in a magnetic disk drive.

従来の技術 現在、磁気記録媒体として使用される磁気ディスクの
多くは酸化物塗布媒体であり、さらに記録密度を向上さ
せるものとして、めっきあるいはスパッタなどによって
できた金属薄膜磁性層を有する記録媒体が注目されてい
る。
2. Description of the Related Art At present, most magnetic disks used as magnetic recording media are oxide-coated media, and a recording medium having a metal thin-film magnetic layer formed by plating or sputtering has been attracting attention as a means for improving the recording density. Have been.

しかしながら、金属薄膜媒体は、Coベースの合金が主
に用いられており、耐食性が十分でない。したがって一
般に、金属薄膜媒体では、耐食性を向上させるために、
金属薄膜磁性層上に保護膜を形成している。また保護膜
には耐摩耗性を持たせる事も必要である。また、記録密
度を高めるためには、磁気ヘッドが金属磁性膜表面にで
きるだけ近接できることが好ましく、この保護膜は薄い
ほど良い。
However, as the metal thin film medium, a Co-based alloy is mainly used, and the corrosion resistance is not sufficient. Therefore, in general, in a metal thin film medium, in order to improve corrosion resistance,
A protective film is formed on the metal thin-film magnetic layer. It is also necessary that the protective film have abrasion resistance. In order to increase the recording density, it is preferable that the magnetic head be as close as possible to the surface of the metal magnetic film. The thinner the protective film, the better.

従来、この種の保護膜としては、湿式めっきによって
構成される金属薄膜(Rh,Au,Cr,Ni−Pなど)、酸化膜
(金属磁性膜の表面を酸化させた膜、SiO2など)、窒化
物膜(Si3N4など)、炭化物膜(SiCなど)などの硬質膜
が提案されている。
Conventionally, as this kind of protective film, a metal thin film (Rh, Au, Cr, Ni-P, etc.) formed by wet plating, an oxide film (a film obtained by oxidizing the surface of a metal magnetic film, SiO2, etc.), a nitride film Hard films such as material films (such as Si3N4) and carbide films (such as SiC) have been proposed.

これらの保護膜のうちで、耐食性・耐摩耗性ともかな
り優れた保護膜がいくつかある。たとえば、記録密度を
高めるために、膜厚50nm以下の2層保護膜(下層により
耐食性のよいクロム酸化物膜、上層にSiO2膜)が提案さ
れている。(特開昭58−177528号公報) また、特開昭61−82321号公報のように金属磁性膜の
上にCr膜を形成し、そのCr膜の上に炭素膜を形成するも
のがある。
Among these protective films, there are some protective films having considerably excellent corrosion resistance and wear resistance. For example, in order to increase the recording density, a two-layer protective film having a thickness of 50 nm or less (a chromium oxide film having better corrosion resistance in the lower layer and a SiO2 film in the upper layer) has been proposed. (Japanese Patent Application Laid-Open No. Sho 58-177528) Further, as disclosed in Japanese Patent Application Laid-Open No. Sho 61-82321, a Cr film is formed on a metal magnetic film, and a carbon film is formed on the Cr film.

発明が解決しようとする課題 上記の保護膜はあるていどの耐食性は確保できるもの
の、膜厚が薄いほど耐食性が低下し、使用時間が長いほ
どより多く腐食する。したがって、磁気記録媒体の高記
録密度化に伴い、磁気ヘッドと磁性膜間距離を短くする
為に、保護膜を薄くした場合、上記の保護膜では、充分
な耐食性を確保することができないという問題点を有し
ていた。
Problems to be Solved by the Invention Although the above-described protective film can secure any corrosion resistance, the thinner the film thickness, the lower the corrosion resistance, and the longer the use time, the more the corrosion. Therefore, when the protective film is thinned in order to shorten the distance between the magnetic head and the magnetic film with the increase in the recording density of the magnetic recording medium, the above-mentioned protective film cannot secure sufficient corrosion resistance. Had a point.

課題を解決するための手段 本発明は上記問題点を解決するために、金属磁性膜上
に、クロム体心立方結晶構造のX線回折による(110)
面のピーク強度に対する(211)面のピーク強度の比が2
0%から25%であるクロム膜を被覆する。
Means for Solving the Problems In order to solve the above-mentioned problems, the present invention provides a method in which a chromium body-centered cubic crystal structure is formed on a metal magnetic film by X-ray diffraction (110).
The ratio of the peak intensity of the (211) plane to the peak intensity of the plane is 2
Coat a chromium film that is between 0% and 25%.

作用 この構成により、クロム膜中の(211)面の割合を多
くする事ができる。
Action With this configuration, the ratio of the (211) plane in the chromium film can be increased.

実 施 例 第1図は本発明の一実施例における磁気記録媒体を示
す拡大断面図である。第1図においてアルミニウム合金
から成るディスク用基板1上に、膜厚20μmのNi−P無
電解めっき下地膜2が形成され、その上に、Cr下地を持
つCo−Ni20、の金属磁性膜3が形成され、さらにその上
に厚10nmのクロム体心立方結晶構造のX線回折による
(110)面のピーク強度I(110)と(211)面のピーク
強度I(211)の比、I(211)/I(110)の値が0.20〜
0.25であるクロム膜4が形成され、さらにその上に、耐
摩耗性を確保するために、膜厚20nmのカーボン膜5が形
成され、さらにその上に、潤滑性をを得るために、膜厚
5nmのフッ素系オイルの潤滑膜6がコーティングされて
いる。
FIG. 1 is an enlarged sectional view showing a magnetic recording medium according to an embodiment of the present invention. In FIG. 1, a 20 μm-thick Ni—P electroless plating base film 2 is formed on a disk substrate 1 made of an aluminum alloy, and a Co—Ni 20 metal magnetic film 3 having a Cr base is formed thereon. Is formed thereon, and the ratio of the peak intensity I (110) of the (110) plane to the peak intensity I (211) of the (211) plane by X-ray diffraction of a 10 nm thick chromium body-centered cubic crystal structure, I (211) ) / I (110) value is 0.20 ~
A chromium film 4 having a thickness of 0.25 is formed thereon, and a carbon film 5 having a thickness of 20 nm is further formed thereon to secure abrasion resistance.
A lubricating film 6 of 5 nm fluorine-based oil is coated.

クロム膜は、RFスパッタ法によって作成した。しか
し、クロム体心立方結晶構造のX線回折による(110)
面のピーク強度I(110)に対する(211)面のピーク強
度I(211)の比、I(211)/I(110)の値が0.20〜0.2
5であるクロム膜を得るためには、適当なスパッタパワ
ー、スパッタ圧、基板温度が必要である。その例とし
て、スパッタ圧を3mmTorr、基板温度を90℃とした時の
スパッタパワーとX線回折によるクロム体心立方結晶構
造の(110)面のピークと(211)面のピークとの強度
比、I(211)/I(110)の値との関係を示す。第2図か
らわかるようにこの条件の時はスパッタパワーがほぼ30
0Wから800Wの範囲でI(211)/I(110)の値が0.20〜0.
25になっている。またスパッタパワー、スパッタ圧、基
板温度はそれぞれのスパッタ装置によって設定しなけれ
ばならない。
The chromium film was formed by an RF sputtering method. However, X-ray diffraction of the chromium body-centered cubic crystal structure (110)
The ratio of the peak intensity I (211) of the (211) plane to the peak intensity I (110) of the plane, and the value of I (211) / I (110) is 0.20 to 0.2
In order to obtain a chromium film of 5, an appropriate sputtering power, sputtering pressure and substrate temperature are required. As an example, the intensity ratio between the peak of the (110) plane and the peak of the (211) plane of the chromium body-centered cubic crystal structure by X-ray diffraction when the sputtering pressure is 3 mmTorr and the substrate temperature is 90 ° C. This shows the relationship with the value of I (211) / I (110). As can be seen from FIG. 2, under this condition, the sputter power is almost 30.
The value of I (211) / I (110) in the range of 0W to 800W is 0.20 ~ 0.2.
It is 25. Also, the sputter power, the sputter pressure, and the substrate temperature must be set for each sputter device.

第3図に、クロム体心立方結晶構造のX線回折による
(110)面のピーク強度I(110)と(211)面のピーク
強度I(211)の比、I(211)/I(110)の値とミッシ
ングパルスエラーを起こす個所の増加量の関係を示す。
これは、金属磁性膜の上にクロム体心立方結晶構造のX
線回折による(110)面のピーク強度I(110)と(21
1)面のピーク強度I(211)の比、I(211)/I(110)
の値の互いに異なる膜厚10nmのクロム膜をスパッタリン
グによりコーティングし、その他は、上記の構成と同じ
磁気ディスクを作成し、80℃ 80%R.Hの雰囲気中に100
0時間の環境試験を行った後にミッシングパルスエラー
を起した個所を測定した。第3図において点1はスパッ
タパワー500W,基板温度0℃,電源はDCで、点2はスパ
ッタパワー500W,基板温度90℃,電源はDCで、点3はス
パッタパワー200W,基板温度90℃,電源はRFで、点4は
スパッタパワー1000W,基板温度90℃,電源はRFで、点5
はスパッタパワー500W,基板温度150℃,電源はRFで、点
6はスパッタパワー700W,基板温度90℃,電源はRFで、
点7はスパッタパワー500W,基板温度90℃,電源はRFで
それぞれ磁性層の上にクロム膜を形成し、環境試験後の
ミッシングパルスエラーを起した個所の数を測定し、そ
の測定した数から環境試験を行う前に測定しておいたミ
ッシングパルスエラーを起した個所の数を引いた数を縦
軸に取った。第3図に示したとおり、クロム体心立方結
晶構造のX線回折による(110)面のピーク強度I(11
0)と(211)面のピーク強度I(211)の比、I(211)
/I(110)の値が0.20〜0.25であれば、ミッシングパル
スエラー個所の増加数が全く無いと言う優れた耐食性を
示している。
FIG. 3 shows the ratio of the peak intensity I (110) on the (110) plane to the peak intensity I (211) on the (211) plane by X-ray diffraction of the chromium body-centered cubic crystal structure, I (211) / I (110). 4) shows the relationship between the value of ()) and the amount of increase in the location where a missing pulse error occurs.
This is because the chromium body-centered cubic crystal structure X
(110) plane peak intensities I (110) and (21)
1) The ratio of the peak intensity I (211) of the plane, I (211) / I (110)
A chromium film with a thickness of 10 nm different from each other is coated by sputtering.
After performing an environmental test for 0 hours, a portion where a missing pulse error occurred was measured. In FIG. 3, point 1 is a sputter power of 500 W, a substrate temperature of 0 ° C., and the power supply is DC. Point 2 is a sputter power of 500 W, a substrate temperature of 90 ° C., and the power supply is DC. Point 3 is a sputter power of 200 W, a substrate temperature of 90 ° C. Power is RF, point 4 is sputter power 1000W, substrate temperature 90 ° C, power is RF, point 5
Is a sputtering power of 500 W, a substrate temperature of 150 ° C., and the power supply is RF. Point 6 is a sputtering power of 700 W, a substrate temperature of 90 ° C., and the power supply is RF.
Point 7 is that a chromium film is formed on the magnetic layer by sputtering power of 500 W, substrate temperature of 90 ° C., and power supply of RF, and the number of locations where a missing pulse error occurs after the environmental test is measured. From the measured number, The number obtained by subtracting the number of locations where a missing pulse error has occurred before the environmental test was performed is plotted on the vertical axis. As shown in FIG. 3, the peak intensity I (11) of the (110) plane by X-ray diffraction of the chromium body-centered cubic crystal structure
0) and (211) plane peak intensity I (211) ratio, I (211)
When the value of / I (110) is 0.20 to 0.25, it shows excellent corrosion resistance that there is no increase in the number of missing pulse error locations.

高耐食性クロム膜により高い耐食性を持つ磁気ディス
ク媒体を得ることができた。特に、高耐食性クロム膜
4、保護膜5、潤滑膜6の厚みをそれぞれ10nm、20nm、
5nmとし、合計35nmという極めて薄い保護膜でも、耐食
性、耐摩耗性、低摩耗性の優れた磁気ディスクを作成す
ることができた。
A magnetic disk medium having high corrosion resistance was obtained by the high corrosion resistance chromium film. In particular, the thicknesses of the highly corrosion-resistant chromium film 4, the protective film 5, and the lubricating film 6 are 10 nm, 20 nm, respectively.
A magnetic disk with excellent corrosion resistance, abrasion resistance, and low abrasion resistance could be produced even with an extremely thin protective film having a thickness of 5 nm and a total thickness of 35 nm.

発明の効果 本発明は、金属磁性膜上に、クロム体心立方結晶構造
のX線回折による(110)面のピーク強度に対する(21
1)面のピーク強度の比が0.2以上であるクロム膜を被覆
する事により、クロム膜中の(211)面の割合を多くす
る事ができるので、優れた耐食性を有する事ができ、悪
環境の中でも長時間金属磁性膜の腐食を防止する事がで
きる。
Advantageous Effects of the Invention The present invention provides a method for producing a chromium body-centered cubic crystal structure on a metal magnetic film, which has a (21) peak intensity of (110) plane by X-ray diffraction.
1) By coating a chromium film with a surface peak intensity ratio of 0.2 or more, the ratio of the (211) surface in the chromium film can be increased, resulting in excellent corrosion resistance and poor environment. Among them, corrosion of the metal magnetic film can be prevented for a long time.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例における磁気記録媒体の拡大
断面図、第2図は、クロム体心立方結晶構造のX線回折
による(110)面のピーク強度I(110)と(211)面の
ピーク強度I(211)の比、I(211)/I(110)の値と
スパッタパワーとの関係を表すグラフ、第3図はI(21
1)/I(110)の値と試験前後のミッシングパルスエラー
の増加数との関係を表すグラフである。 1……基板 2……下地膜 3……金属磁性膜 4……クロム膜 5……保護膜 6……潤滑膜
FIG. 1 is an enlarged cross-sectional view of a magnetic recording medium according to an embodiment of the present invention, and FIG. 2 is a peak intensity I (110) and (211) of a (110) plane by X-ray diffraction of a chromium body-centered cubic crystal structure. FIG. 3 is a graph showing the relationship between the ratio of the surface peak intensity I (211), the value of I (211) / I (110), and the sputter power.
1) A graph showing the relationship between the value of / I (110) and the number of missing pulse errors before and after the test. DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Base film 3 ... Metal magnetic film 4 ... Chromium film 5 ... Protective film 6 ... Lubricating film

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上に金属磁性膜を設け、前記金属磁性
膜上に、クロム体心立方結晶構造のX線回折による(11
0)面のピーク強度に対する(211)面のピーク強度の比
が20%から25%であるクロム膜を設けたことを特徴とす
る磁気記録媒体。
A metal magnetic film is provided on a substrate, and a chromium body-centered cubic crystal structure is formed on the metal magnetic film by X-ray diffraction.
A magnetic recording medium comprising a chromium film having a ratio of the peak intensity of the (211) plane to the peak intensity of the (0) plane being 20% to 25%.
JP1126943A 1989-05-19 1989-05-19 Magnetic recording media Expired - Lifetime JP2765050B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1126943A JP2765050B2 (en) 1989-05-19 1989-05-19 Magnetic recording media

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1126943A JP2765050B2 (en) 1989-05-19 1989-05-19 Magnetic recording media

Publications (2)

Publication Number Publication Date
JPH02306425A JPH02306425A (en) 1990-12-19
JP2765050B2 true JP2765050B2 (en) 1998-06-11

Family

ID=14947736

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1126943A Expired - Lifetime JP2765050B2 (en) 1989-05-19 1989-05-19 Magnetic recording media

Country Status (1)

Country Link
JP (1) JP2765050B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6387612A (en) * 1986-09-30 1988-04-18 Sony Corp Perpendicular magnetic recording medium

Also Published As

Publication number Publication date
JPH02306425A (en) 1990-12-19

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