JP2758660B2 - Dispersion type electroluminescent device using zinc oxide as transparent electrode - Google Patents

Dispersion type electroluminescent device using zinc oxide as transparent electrode

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Publication number
JP2758660B2
JP2758660B2 JP1186885A JP18688589A JP2758660B2 JP 2758660 B2 JP2758660 B2 JP 2758660B2 JP 1186885 A JP1186885 A JP 1186885A JP 18688589 A JP18688589 A JP 18688589A JP 2758660 B2 JP2758660 B2 JP 2758660B2
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Japan
Prior art keywords
film
transparent electrode
zno
zinc oxide
dispersion
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JP1186885A
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Japanese (ja)
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JPH0353495A (en
Inventor
内嗣 南
新三 高田
秀仁 南戸
友紀 吉崎
尚雄 板谷
俊介 平野
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Gunze Ltd
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Gunze Ltd
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Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、例えば面状光源として利用される分散型エ
レクトロルミネッセンス素子(以下EL素子と記す)に関
する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a dispersion-type electroluminescent device (hereinafter, referred to as an EL device) used as, for example, a planar light source.

[従来の技術] 従来の分散型EL素子の透明電極は、スパッタリング或
は蒸着等によって形成されたインジウム・スズ酸化薄膜
(以下ITO膜と記す)が知られており、汎用されてい
る。
[Prior Art] As a transparent electrode of a conventional dispersion type EL element, an indium tin oxide thin film (hereinafter referred to as an ITO film) formed by sputtering or vapor deposition is known and widely used.

[発明が解決しようとする課題] しかしながらITO膜が透明電極である分散型EL素子
は、次の通り問題点がある。
[Problems to be Solved by the Invention] However, the dispersion type EL device in which the ITO film is a transparent electrode has the following problems.

長時間点灯した場合、後で詳述するように、ITO膜
は、発光層との界面において黒化する現象が発生し、更
に発光層が劣化し、このため輝度が低下して寿命が短く
なる。
When lighted for a long time, as will be described in detail later, the ITO film undergoes a phenomenon of blackening at the interface with the light emitting layer, further deteriorating the light emitting layer, thereby reducing the luminance and shortening the life. .

特に高温多湿もしくは日光照射した状態で点灯する
と、早期に黒化現象が発生し、このため使用分野が限定
される。
In particular, when the lamp is lit in a high-temperature, high-humidity or sunlight-irradiated state, a blackening phenomenon occurs at an early stage, which limits the field of use.

更に上記の黒化現象は、製品の外観を損ない、商品
価値を下げる。
Further, the above blackening phenomenon impairs the appearance of the product and lowers the commercial value.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、分散型EL素子の透明電極に従来使用されて
いるITO膜に替え、酸化亜鉛(ZnO)透明導電膜又はIII
族元素及び/またはIV族元素を含有した酸化亜鉛透明導
電膜(以下両者を総称してZnO系膜という)を用いるこ
とにより前記問題点が改善されることを見出したもので
ある。また、分散型EL素子は、上記のZnO系膜を素子の
表面側の透明電極もしくは背面側の透明電極として又は
両方の電極として用いて、公知の製造技術によって作製
できる。
The present invention uses a zinc oxide (ZnO) transparent conductive film or III instead of an ITO film conventionally used for a transparent electrode of a dispersion type EL element.
It has been found that the above problem can be improved by using a zinc oxide transparent conductive film containing a group IV element and / or a group IV element (hereinafter, both are collectively referred to as a ZnO-based film). Further, the dispersion type EL device can be manufactured by a known manufacturing technique using the above-mentioned ZnO-based film as a transparent electrode on the front surface or a transparent electrode on the back surface of the device or as both electrodes.

次に本発明の各々の構成要素についてその概略を説明
することにする。
Next, an outline of each component of the present invention will be described.

ZnO透明導電膜に不純物として含有される元素としてI
II族元素のアルミニウム(Al)、IV族元素のシリコン
(Si)を具体的な例として説明する。Alおよび/または
Siの含有量は、亜鉛(Zn)に対する原子%で0.1〜20%
であることが望ましい。Alおよび/またはSiの含有量が
0.1原子%未満であると概して添加効果が得られにくい
場合があり、20%を超えると透明導電膜の結晶性が著し
く悪化し、低効率が増大する傾向を示すからであり、Al
やSiの好ましい含有量の値は1〜15原子%である。勿論
本発明はZnO単独で用いることも可能であり、これらIII
族元素,IV族元素等は必要に応じ、所定量を加えればよ
く特に制限はない。
I as an element contained as an impurity in the ZnO transparent conductive film
Specific examples will be described using group II element aluminum (Al) and group IV element silicon (Si). Al and / or
The content of Si is 0.1 to 20% by atomic% based on zinc (Zn).
It is desirable that Al and / or Si content
If the content is less than 0.1 atomic%, it is generally difficult to obtain the effect of addition. If the content is more than 20%, the crystallinity of the transparent conductive film is significantly deteriorated, and the low efficiency tends to increase.
The preferred content of Si and Si is 1 to 15 atomic%. Of course, the present invention can be used alone ZnO, these III
The group element, group IV element, and the like are not particularly limited as long as a predetermined amount is added as necessary.

ZnO系膜はスパッタ法、スプレー法、その他の任意の
公知の膜形成技術によって製造できるが、透明電極にあ
っては、EL発光層の下地としての役割もあり、結晶性や
特に表面の平滑性と均一性に優れた良質の膜質が望まれ
ることから、スパッタ法によることが望ましい。
The ZnO-based film can be manufactured by a sputtering method, a spray method, or any other known film forming technique.However, in the case of a transparent electrode, the ZnO-based film also serves as a base for the EL light-emitting layer, and has crystallinity and particularly smoothness of the surface. It is desirable to use a sputtering method because a high quality film having excellent uniformity is desired.

尚、前記のAl以外のIII族元素として、ガリウム(G
a)、インジウム(In)およびホウ素(B)等またはSi
以外のIV族元素として、ゲルマニウム(Ge)、チタン
(Ti)、ジルコニウム(Zr)およびハフニウム(Hf)等
を例示でき、その添加量もAl、Siと同様の値を例示でき
る。勿論III族元素とIV族元素とを併用しても差しつか
えない。
In addition, gallium (G
a), indium (In) and boron (B) etc. or Si
Examples of group IV elements other than the above include germanium (Ge), titanium (Ti), zirconium (Zr), hafnium (Hf), and the like, and the amounts of addition thereof can be the same as those of Al and Si. Of course, a group III element and a group IV element may be used in combination.

又、本発明に係わる透明電極を形成する基体として
は、透明ガラス、透明プラスチック製のフィルム、シー
ト、板等を例示でき特に制限はない。
Examples of the substrate on which the transparent electrode according to the present invention is formed include transparent glass, transparent plastic films, sheets, and plates, and are not particularly limited.

発光層を形成する発光体としては主剤、活性剤必要な
らば付活性剤を含む公知の混合物を例示でき、主剤とし
てはZnS、SrS、CaS等、活性剤としてはCu、Mn、Ce、E
u、Tb、Ce等、付活性剤としてはCl、Al、F等を例示で
きるが特に制限はない。
The luminous body forming the luminescent layer can be exemplified by a known mixture containing a main agent, an activator and, if necessary, an activator, such as ZnS, SrS, and CaS as the main agent, and Cu, Mn, Ce, and E as the activator.
Examples of activators such as u, Tb, Ce and the like include Cl, Al, F and the like, but are not particularly limited.

また、発光層を形成する有機高分子結着剤としてはシ
アノエチルセルロース、シアノエチルサッカロース、シ
アノエチルプルラン等の高誘電率の有機化合物を例示で
きるが特に制限はなく、発光層はこれら結着剤中に蛍光
体が分散した状態となっている。
Examples of the organic polymer binder forming the light emitting layer include organic compounds having a high dielectric constant such as cyanoethyl cellulose, cyanoethyl saccharose, and cyanoethyl pullulan, but there is no particular limitation. The body is in a dispersed state.

本発明に係る絶縁層としては有機高分子結着剤中にBa
TiO3、SrTiO3、PbTiO3(これらは特に制限はなくあくま
で例示)等が分散されてなる構成のもの、もしくはポリ
エチレンテレフタレート、ポリフッ化ビニリデン(これ
らは特に制限はなくあくまで例示)等の高誘電率を有す
る熱可塑性樹脂を主成分とした構成のもの等を例示でき
るが特に制限はない。この際、有機高分子結着剤として
は発光層において前記に例示した結着剤と同じものを例
示できるが、特に制限はない。また、前記熱可塑性樹脂
を主成分とした構成のものとしてはフィルム、シート等
を例示できるが特に制限はない。
As the insulating layer according to the present invention, Ba is contained in an organic polymer binder.
TiO 3 , SrTiO 3 , PbTiO 3 (there are no particular restrictions and examples are merely examples) dispersed therein, or high dielectric constants such as polyethylene terephthalate and polyvinylidene fluoride (these examples are no particular restrictions and examples) Can be exemplified, but there is no particular limitation. In this case, the organic polymer binder may be the same as the binder exemplified above in the light emitting layer, but is not particularly limited. In addition, examples of the composition mainly composed of the thermoplastic resin include a film and a sheet, but there is no particular limitation.

本発明に係る背面電極としては特に制限はないが、例
えば絶縁層の構成により次の如き構成を取ることが一層
有利である。即ち、絶縁層において有機高分子結着剤と
BaTiO3等の化合物とを用いる場合は、Al等の金属箔が望
ましく、一方絶縁層が高誘電率の熱可塑性樹脂を主成分
とする場合は、Ag、C、Ni、その他導電物質を含むペー
ストの導電性塗料等を絶縁層上に塗工するか、もしくは
Al、Ag、その他の金属蒸着を絶縁層上に形成するのが望
ましい。この際、導電性塗料としては導電物質の微粉末
をポリエステル系樹脂、その他適宜の樹脂のバインダー
中に分散せしめたペースト状のものを例示できる。勿論
背面電極としては以上に例示した以外にも好ましい態様
のものを適宜に使用することができることは云うまでも
ない。
Although the back electrode according to the present invention is not particularly limited, it is more advantageous to adopt the following configuration depending on the configuration of the insulating layer, for example. That is, an organic polymer binder is used in the insulating layer.
When using a compound such as BaTiO 3 , a metal foil such as Al is preferable, while when the insulating layer is mainly composed of a thermoplastic resin having a high dielectric constant, a paste containing Ag, C, Ni, and other conductive materials is used. A conductive paint or the like on the insulating layer, or
It is desirable to form Al, Ag, and other metal deposits on the insulating layer. In this case, examples of the conductive paint include a paste in which fine powder of a conductive substance is dispersed in a binder of a polyester resin or other appropriate resin. Of course, it is needless to say that a preferred embodiment other than the above examples can be appropriately used as the back electrode.

本発明における透明導電膜はZnO系膜を備えたもので
あるが、ZnO膜及び、III族元素及びIV族元素の群から選
ばれた少なくとも1種の元素を不純物として添加したZn
O膜の少なくとも2層を有する多層のものも使用可能で
ある。その際どちらの膜が発光層と接する構成であって
も差しつかえないし、二層以上でもよく、その構成順序
も特に制限はない。
The transparent conductive film in the present invention is provided with a ZnO-based film.A ZnO film and Zn doped with at least one element selected from the group consisting of a group III element and a group IV element as impurities.
A multilayer having at least two O films can also be used. In this case, either of the films may be in contact with the light-emitting layer, or two or more layers may be used, and the order of the structures is not particularly limited.

更に本発明の透明導電膜はZnO系膜と基体との間に、
他の金属、金属酸化物等からなる透明導電膜を設けるこ
とはいっこうに差しつかえない。特にITO膜の好まし
く、かかるITO膜はZnO系膜の密着力の向上及び導電性の
向上にとって効果的である場合も考えられる。
Further, the transparent conductive film of the present invention, between the ZnO-based film and the substrate,
The provision of a transparent conductive film made of another metal, a metal oxide, or the like is inevitable. In particular, an ITO film is preferable. Such an ITO film may be effective in improving the adhesion and the conductivity of the ZnO-based film.

本発明はZnO系膜透明電極、発光層、絶縁層、背面電
極をこの順序に積層した構成であるが、必要ならば発光
層と絶縁層、絶縁層と背面電極との間に他の第三成分か
らなる層が入ることはいっこうに差しつかえない。もち
ろん、基体や背面電極の外側に必要ならば他の第三成分
からなる層を加えることも自由である。
The present invention has a structure in which a ZnO-based film transparent electrode, a light emitting layer, an insulating layer, and a back electrode are laminated in this order, but if necessary, another third light emitting layer is provided between the light emitting layer and the insulating layer, and between the insulating layer and the back electrode. It is absolutely inevitable that a layer composed of the components will enter. Of course, if necessary, a layer made of another third component may be added to the outside of the base or the back electrode.

以上は本発明に係わる各々の構成要素を例示的に説明
したもので、本発明はこれらの記載に制限を受けるもの
でないことはいうまでもない。
The above has been an exemplary description of each component related to the present invention, and it goes without saying that the present invention is not limited to these descriptions.

[作用] 一般的に分散型EL素子は、発光層等に多少なりとも水
(H2O)を含んでいる。この分散型EL素子に電圧を印加
すると、透明電極と発光層との界面においてH2Oの電気
分解現象が発生し、電気分解で生じた水素が、酸化物で
ある透明電極の薄膜を還元し金属化させることが、前述
した黒化現象の一つの要因と考えられる。
[Operation] In general, a dispersion-type EL element contains water (H 2 O) at least in a light-emitting layer or the like. When a voltage is applied to this dispersion-type EL element, an electrolysis phenomenon of H 2 O occurs at the interface between the transparent electrode and the light emitting layer, and hydrogen generated by the electrolysis reduces the oxide thin film of the transparent electrode. Metallization is considered to be one factor in the above-described blackening phenomenon.

又、現在の分散型EL素子の防湿方法は完全でないた
め、特に多湿の環境下では外部からH2Oが透明電極と発
光層との界面に侵入し、このH2Oの電気分解により更に
水素が発生し、前記黒化現象を促進させるものと推測さ
れる。
In addition, since the current moisture-proofing method of the dispersion-type EL element is not perfect, H 2 O intrudes from the outside into the interface between the transparent electrode and the light emitting layer, especially in a humid environment, and further hydrogen is generated by the electrolysis of H 2 O. Is presumed to promote the blackening phenomenon.

更に、日光に曝露される条件下では、電気分解と光化
学反応により黒化の促進と同時に発光層の劣化も促進さ
れる。
Furthermore, under conditions of exposure to sunlight, electrolysis and photochemical reaction promote the blackening and also promote the deterioration of the light emitting layer.

以上の黒化現象は酸化物である透明電極の金属と酸素
との結合エネルギーによって左右される。
The above blackening phenomenon depends on the binding energy between the metal of the transparent electrode, which is an oxide, and oxygen.

現在、一般的に透明電極として用いられている酸化ス
ズ薄膜(SnO2膜という)やITO膜や本発明のZnO系膜で
は、SnO2膜が最も還元されやすく、その次がITO膜、ZnO
系膜の順で還元されにくくなる。これは、それぞれの金
属の酸素結合エネルギーが、スズ(Sn)が290KJ/mol、
インジウム(In)が308KJ/mol、亜鉛(Zn)が348KJ/mol
という値であることからもZnO系膜が最も還元され難い
と云うことを推測できる。
At present, in a tin oxide thin film (referred to as a SnO 2 film), an ITO film, and a ZnO-based film of the present invention which are generally used as a transparent electrode, the SnO 2 film is most easily reduced, followed by an ITO film and a ZnO film.
It becomes difficult to be reduced in the order of the base film. This is because the oxygen binding energy of each metal is 290 KJ / mol for tin (Sn),
Indium (In): 308KJ / mol, Zinc (Zn): 348KJ / mol
From this value, it can be inferred that the ZnO-based film is most difficult to be reduced.

更に、インジウム・スズ酸化物と酸化亜鉛との材料固
有のバンドギャップをみると前者が3.75〜4.3eV、後者
が3.2〜3.4eVであることから、これを参考にするとZnO
系膜の方がITO膜よりもより可視光側の紫外線から全て
の紫外線を吸収遮断すると考えられる。
Further, looking at the band gap inherent to the material between indium tin oxide and zinc oxide, the former is 3.75 to 4.3 eV and the latter is 3.2 to 3.4 eV.
It is considered that the system film absorbs and blocks all the ultraviolet rays from the ultraviolet light on the visible light side more than the ITO film.

このことから分散型EL素子において、透明電極をITO
膜からZnO系膜に替えることにより、日光曝露に伴う透
明電極の黒化現象の進行速度を抑え、更に日光曝露によ
る発光層自体の劣化を抑制できる。
For this reason, in the dispersion type EL device, the transparent electrode is
By replacing the film with a ZnO-based film, the progress speed of the blackening phenomenon of the transparent electrode due to sunlight exposure can be suppressed, and furthermore, the deterioration of the light emitting layer itself due to sunlight exposure can be suppressed.

又、ZnO系膜透明電極を用いた分散型EL素子の高性能
なEL特性は、ZnOとZnSとの界面のなじみの良さによるも
のと考えられる。
The high-performance EL characteristics of the dispersion-type EL element using the ZnO-based film transparent electrode are considered to be due to the familiarity of the interface between ZnO and ZnS.

[実施例] 以下、本発明を実施例を用いて説明する。Examples Hereinafter, the present invention will be described with reference to Examples.

実施例1 第1図に示したごとくAl箔(厚さ約50μm)からなる
背面電極5の上にシアノエチルセルロース10重量部、シ
アノエチルサッカロース60重量部をジメチルホルムアミ
ド溶液150重量部に加熱溶解させてできた有機高分子結
着剤中にBaTiO3(粒径約1μm)200重量部を分散させ
た絶縁層4を、10〜20μmの厚みでスクリーン印刷法に
より作製し、その上に前記同様の有機高分子結着剤(シ
アノエチルセルロース:シアノエチルサッカロース:ジ
メチルホルムアミド溶液が10:60:150重量部のもの)100
重量部に対しZnS:Cu蛍光体80〜90重量部を分散させた発
光層3を、50〜60μmの厚みでスクリーン印刷法により
積層した。一方、透明基体1としてポリエステルフィル
ム(厚さ約100μm)を用いその上に、ZnO:Al膜(厚さ8
00〜1000Å、透過率が550nmで82%、Al原子がZn原子に
対し3.6原子%添加)の透明電極2を成膜し、この透明
電極2を前記発光層3の上に重ね加熱ローラーを通す
と、前記有機高分子結着剤が熱によって接着力を発揮
し、透明電極2と発光層3が接着する。こうして作製さ
れた分散型EL素子の更にその上に防湿フィルムを封止し
てできたEL素子と、その透明電極2としてITO膜(厚さ4
00〜500Å、透過率が550nmで86%)を用いる以外他は前
記同様の方法で作製した分散型EL素子と、の2種類のEL
素子を400Hz,100Vの正弦波電圧を印加して連続点灯し輝
度の経時変化を比較した。その結果を駆動環境条件とし
て第2図の常温常湿環境、第3図の30℃,95%環境、及
び第4図の日光照射環境の3つの環境下において示し
た。実線6,8,10で示した曲線は透明電極がZnO:Al膜の分
散型EL素子であり、破線7,9,11で示した曲線は透明電極
がITO膜の分散型EL素子である。又、それぞれの経過時
間後の輝度保持率を下表に示す。
Example 1 As shown in FIG. 1, 10 parts by weight of cyanoethyl cellulose and 60 parts by weight of cyanoethyl saccharose were heated and dissolved in 150 parts by weight of a dimethylformamide solution on a back electrode 5 made of Al foil (thickness: about 50 μm). An insulating layer 4 in which 200 parts by weight of BaTiO 3 (particle size: about 1 μm) was dispersed in an organic polymer binder was prepared by a screen printing method to a thickness of 10 to 20 μm, and the same organic layer as above was formed thereon. Molecular binder (cyanoethylcellulose: cyanoethylsaccharose: dimethylformamide solution containing 10: 60: 150 parts by weight) 100
A luminescent layer 3 in which 80 to 90 parts by weight of ZnS: Cu phosphor was dispersed with respect to parts by weight was laminated by screen printing at a thickness of 50 to 60 μm. On the other hand, a polyester film (about 100 μm in thickness) was used as the transparent substrate 1, and a ZnO: Al film (8
A transparent electrode 2 having a thickness of 100 to 1000 ° and a transmittance of 550 nm of 82% and an Al atom of 3.6% with respect to the Zn atom is deposited. The transparent electrode 2 is overlaid on the light emitting layer 3 and passed through a heating roller. Then, the organic polymer binder exerts an adhesive force by heat, and the transparent electrode 2 and the light emitting layer 3 are bonded. An EL element obtained by sealing a moisture-proof film on the dispersion-type EL element thus produced, and an ITO film (thickness: 4
And a dispersion-type EL element manufactured in the same manner as described above except that the dispersion EL element is used in the same manner as above.
The device was continuously lit by applying a sine wave voltage of 400 Hz and 100 V, and the change over time in luminance was compared. The results are shown as driving environment conditions in three environments: a normal temperature and normal humidity environment in FIG. 2, a 30 ° C., 95% environment in FIG. 3, and a sunlight irradiation environment in FIG. The curves shown by solid lines 6, 8, and 10 are the dispersion-type EL devices in which the transparent electrodes are ZnO: Al films, and the curves shown by broken lines 7, 9, and 11 are the dispersion-type EL devices in which the transparent electrodes are ITO films. The following table shows the luminance retention ratio after each elapsed time.

いずれの環境条件においても、ITO膜のものは早期に
黒化現象が発生したが、ZnO:Al膜を透明電極としたEL素
子の方は黒化現象が発生しなかった。また輝度の経時低
下も遅く、長寿命であることがわかった。
Under any of the environmental conditions, the blackening phenomenon occurred early in the ITO film, but did not occur in the EL element using the ZnO: Al film as the transparent electrode. It was also found that the luminance decreased slowly with time, and the life was long.

一方、透明基体1として用いたガラス上にITO膜から
なる透明電極およびZnO:Al膜からなる透明電極を用い、
分散型EL素子を作製した場合も、前記の3つの駆動環境
下においてZnO:Al膜からなる透明電極を用いた分散型EL
素子は黒化現象が発生せず、輝度低下に関しても優位性
がみられた。
On the other hand, a transparent electrode made of an ITO film and a transparent electrode made of a ZnO: Al film were used on the glass used as the transparent substrate 1,
When a dispersion type EL device is manufactured, the dispersion type EL using a transparent electrode composed of a ZnO: Al film under the above three driving environments is also used.
The element did not suffer from blackening, and was superior in terms of luminance reduction.

更に発光層のZnS:Cu蛍光体粉末に替えてZnS:Mnの蛍光
体粉末を用いた場合においても前記の優位性が認められ
た。
Further, the superiority was also observed when a ZnS: Mn phosphor powder was used instead of the ZnS: Cu phosphor powder of the light emitting layer.

以上のZnO:Al膜の優位性は、不純物元素としてガリウ
ム(Ga)、インジウム(In)、ホウ素(B)、シリコン
(Si)、ゲルマニウム(Ge)、チタン(Ti)、ハフニウ
ム(Hf)、およびジルコニウム(Zr)を添加した酸化亜
鉛膜においても確認された。
The superiority of the above ZnO: Al film is that gallium (Ga), indium (In), boron (B), silicon (Si), germanium (Ge), titanium (Ti), hafnium (Hf), and It was also confirmed in a zinc oxide film to which zirconium (Zr) was added.

また、絶縁層、発光層を形成するに際し、本例では溶
剤を用いたが、かかる溶液の種類については特に制限は
なく、また溶液なしで形成可能ならば使用しなくてもよ
い。この際本例ではスクリーン印刷後に溶液は適宜に蒸
発する。
Further, in forming an insulating layer and a light emitting layer, a solvent is used in this example. However, the type of such a solution is not particularly limited, and may be omitted if it can be formed without a solution. At this time, in this example, the solution evaporates appropriately after screen printing.

実施例2 第5図に示すように、透明基体1として用いたポリエ
ステルフィルム(厚さ約100μm)の上にITO膜2a(厚さ
400〜500Å)を成膜し、更にその上にZnO膜2b(厚さ400
〜500Å)を成膜した透明電極を用いて実施例1に従っ
て分散型EL素子を作製した場合と、同じく透明基体1の
上にITO膜(厚さ800〜900Å)のみを成膜した透明電極
を用いて同様に分散型EL素子を作製した場合、とについ
て実施例1の3つの駆動環境下で400Hz,100Vの正弦波電
圧を印加し連続点灯した時の劣化を比較すると、透明電
極としてITO膜のみのものは早期に黒化現象が発生した
が、本発明にかかる2層構造の透明電極を用いた分散型
EL素子は、1000時間経過後も黒化現象は発生していなか
った。
Example 2 As shown in FIG. 5, an ITO film 2a (thickness: about 100 μm) was used on a polyester film (thickness: about 100 μm) used as a transparent substrate.
400-500mm) and then a ZnO film 2b (thickness 400
A transparent electrode having only an ITO film (thickness: 800 to 900 mm) was formed on the transparent substrate 1 in the same manner as in the case where a dispersion-type EL element was manufactured using the transparent electrode having a thickness of When a dispersion-type EL element was similarly manufactured using the same method, the deterioration when continuously lit by applying a sine wave voltage of 400 Hz and 100 V under three driving environments in Example 1 was compared. In the case of only one, the blackening phenomenon occurred early, but the dispersion type using the two-layered transparent electrode according to the present invention was used.
In the EL element, the blackening phenomenon did not occur even after 1000 hours.

これは透明電極内にITO膜が存在しても発光層と接触
していなければ還元されることは無く、すなわち黒化現
象が発光層と透明電極との界面で発生していることを示
すものであり、第III族や第IV族の元素を不純物として
添加していないZnO膜を保護膜としても使用できること
を表示すものである。
This indicates that even if the ITO film exists in the transparent electrode, it is not reduced unless it is in contact with the light emitting layer, that is, the blackening phenomenon occurs at the interface between the light emitting layer and the transparent electrode. This indicates that a ZnO film to which a Group III or Group IV element is not added as an impurity can also be used as a protective film.

又、第III族や第IV族の元素を不純物として添加した
酸化亜鉛膜を多層化した場合においても、その保護膜と
しての有効性が確認できた。
Further, even when a zinc oxide film to which a group III or IV element is added as an impurity is formed into a multilayer, its effectiveness as a protective film was confirmed.

実施例3 絶縁層を形成するに際し、有機高分子結着剤としてシ
アノエチルプルラン10重量部と、シアノエチルサッカロ
ース20重量部をジメチルホルムアミド溶液40重量部に加
熱溶解したものと、BaTio370重量部とを用い、発光層を
形成するに際し前記同様の有機高分子結着剤(シアノエ
チルプルラン:シアノエチルサッカルース:ジメチルホ
ルムアミドが10:20:40重量部のもの)100重量部と、Zn
S:Cu蛍光体80〜90重量部と、を用いる以外は実施例1と
同様にして分散型EL素子を作製した場合において、その
透明電極がITO膜である場合と、ZnO:Al膜である場合に
実施例1の3つの駆動環境下で400Hz,100Vの正弦波電圧
を印加して連続点灯した場合の劣化を比較すると、ITO
膜を用いた分散型EL素子は早期に黒化現象が発生してい
たが、ZnO:Al膜を用いた素子は1000時間経過後も黒化現
象は発生していなかった。これはZnO:Al膜の優位性が高
分子結着剤の種類によらず認められることを示すもので
ある。
Example 3 In forming an insulating layer, 10 parts by weight of cyanoethyl pullulan as an organic polymer binder, 20 parts by weight of cyanoethyl sucrose dissolved in 40 parts by weight of a dimethylformamide solution, and 70 parts by weight of BaTio 3 were used. In forming the light-emitting layer, 100 parts by weight of the same organic polymer binder as described above (10:20:40 parts by weight of cyanoethyl pullulan: cyanoethyl saccharose: dimethylformamide) and Zn
S: 80 to 90 parts by weight of a Cu phosphor, and a dispersion type EL element was prepared in the same manner as in Example 1 except that the transparent electrode was an ITO film and a ZnO: Al film. In the three driving environments of Example 1, when the sine wave voltage of 400 Hz and 100 V is applied and the lamp is continuously lit, a comparison is made.
The blackening phenomenon occurred early in the dispersed EL device using the film, but the blackening phenomenon did not occur even after 1000 hours had passed in the device using the ZnO: Al film. This indicates that the superiority of the ZnO: Al film is recognized regardless of the type of the polymer binder.

実施例4 第1図における絶縁層4としてポリエステルフィルム
(厚さ6〜7μm)、更にこのポリエステルフィルム絶
縁層上に背面電極5としてAgペースト(Ag微粒子をポリ
エステル系樹脂バインダーと有機溶剤とに分散せしめた
ペースト状の導電性塗料)をスクリーン印刷により塗工
せしめたもの(有機溶剤は気化する)を用いて実施例1
と同様に分散型EL素子を作製した場合において、その透
明電極がITO膜である場合と、ZnO:Al膜である場合の2
種類について実施例1の3つの駆動環境下で400Hz,100V
の正弦波電圧を印加して連続点灯した時の劣化を比較す
ると、ITO膜を用いた分散型EL素子は早期に黒化現象が
発生していたが、ZnO:Al膜を用いた素子は1200時間経過
後も黒化現象は発生していなかった。これはZnO:Al膜の
優位性が絶縁層の種類によらず認められることを示すも
のである。
Example 4 A polyester film (thickness: 6 to 7 μm) was used as the insulating layer 4 in FIG. 1, and an Ag paste (Ag fine particles were dispersed in a polyester resin binder and an organic solvent) as a back electrode 5 on the polyester film insulating layer. Example 1 was prepared by using a paste-like conductive paint) applied by screen printing (organic solvent is vaporized).
In the case where a dispersion-type EL element is produced in the same manner as in the above, there are two cases in which the transparent electrode is an ITO film and a case where the transparent electrode is a ZnO: Al film.
400Hz, 100V under the three driving environments of Example 1
Comparing the degradation during continuous lighting by applying a sinusoidal voltage of, the blackening phenomenon occurred early in the dispersion type EL device using the ITO film, but the device using the ZnO: Al film No blackening phenomenon occurred even after the lapse of time. This indicates that the superiority of the ZnO: Al film is recognized regardless of the type of the insulating layer.

[発明の効果] 従来にみられるITO膜を透明電極として使用した分散
型EL素子では、連続点灯した場合発光層との界面で黒化
現象が発生する。しかし、ITO膜に替えてZnO系膜を使用
することにより、そのような黒化現象が抑えられ、輝度
の経時低下も遅くなり、長寿命化を図ることができ、非
常に優れた特性を持つ分散型EL素子を提供することがで
きる。
[Effects of the Invention] In a conventional dispersion type EL device using an ITO film as a transparent electrode, a blackening phenomenon occurs at an interface with a light emitting layer when the device is continuously lit. However, by using a ZnO-based film instead of the ITO film, such a blackening phenomenon is suppressed, the aging of the luminance is slowed down, the life can be extended, and very excellent characteristics are obtained. A distributed EL element can be provided.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明に係わる分散型EL素子の一実施例を示す
断面図、第2図,第3図及び第4図は、第1図図示のEL
素子のそれぞれの3つの環境下における輝度の経時変化
を示す図、第5図は本発明に係わる分散型EL素子の別の
実施例を示す断面図である。 1…透明基体、2…透明電極、2a…ITO膜、2b…ZnO膜、
3…発光層、4…絶縁層、5…背面電極。
FIG. 1 is a cross-sectional view showing one embodiment of a distributed EL device according to the present invention, and FIGS. 2, 3, and 4 are EL devices shown in FIG.
FIG. 5 is a diagram showing a change over time in luminance under three environments of the device. FIG. 5 is a cross-sectional view showing another embodiment of the dispersion type EL device according to the present invention. 1 ... Transparent substrate, 2 ... Transparent electrode, 2a ... ITO film, 2b ... ZnO film,
Reference numeral 3 represents a light emitting layer, 4 represents an insulating layer, and 5 represents a back electrode.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 平野 俊介 滋賀県守山市森川原町163番地 グンゼ 株式会社守山工場内 (56)参考文献 特開 昭62−122011(JP,A) 特開 昭61−198592(JP,A) 特開 昭63−245889(JP,A) 実開 昭61−76695(JP,U) (58)調査した分野(Int.Cl.6,DB名) H05B 33/28──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Shunsuke Hirano 163 Morikawaramachi, Moriyama City, Shiga Prefecture Gunze Moriyama Plant (56) References JP-A-62-122011 (JP, A) JP-A-61-198592 (JP, A) JP-A-63-245889 (JP, A) JP-A-61-76695 (JP, U) (58) Fields investigated (Int. Cl. 6 , DB name) H05B 33/28

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】酸化亜鉛透明導電膜と、III族元素及びIV
族元素の群から選ばれた少なくとも1種の元素を不純物
として添加した酸化亜鉛透明導電膜との二層もしくは二
層以上の多層からなり、かつ前記層の積層順が限定され
ない構成を有する透明電極を基体上に形成し、該透明電
極上に、蛍光体を有機高分子結着剤中に分散させてなる
発光層、絶縁層及び背面電極の順序に積層したことを特
徴とする分散型エレクトロルミネッセンス素子。
A zinc oxide transparent conductive film, a group III element and an IV
A transparent electrode comprising a two-layer or a multilayer of two or more layers with a zinc oxide transparent conductive film to which at least one element selected from the group of group elements is added as an impurity, and having a configuration in which the stacking order of the layers is not limited Is formed on a substrate, and on the transparent electrode, a light-emitting layer, an insulating layer, and a back electrode each formed by dispersing a phosphor in an organic polymer binder are laminated in this order. element.
【請求項2】基体上に、インジウム・スズ酸化薄膜を形
成し、該薄膜上に酸化亜鉛透明導電膜もしくはIII族元
素及びIV族元素の群から選ばれた少なくとも1種の元素
を不純物として添加した酸化亜鉛透明導電膜またはこれ
らの二層もしくは二層以上からなる多層膜を形成し、こ
れらを透明電極とした構成を有する請求の範囲第1項に
記載の分散型エレクトロルミネッセンス素子。
2. An indium tin oxide thin film is formed on a substrate, and a zinc oxide transparent conductive film or at least one element selected from the group consisting of a group III element and a group IV element is added as an impurity on the thin film. 2. The dispersion-type electroluminescence device according to claim 1, wherein the dispersion-type electroluminescence device has a configuration in which a zinc oxide transparent conductive film or a multilayer film including two or more layers thereof is formed and these are used as transparent electrodes.
JP1186885A 1989-07-18 1989-07-18 Dispersion type electroluminescent device using zinc oxide as transparent electrode Expired - Fee Related JP2758660B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1186885A JP2758660B2 (en) 1989-07-18 1989-07-18 Dispersion type electroluminescent device using zinc oxide as transparent electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1186885A JP2758660B2 (en) 1989-07-18 1989-07-18 Dispersion type electroluminescent device using zinc oxide as transparent electrode

Publications (2)

Publication Number Publication Date
JPH0353495A JPH0353495A (en) 1991-03-07
JP2758660B2 true JP2758660B2 (en) 1998-05-28

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Country Link
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JPH0498296U (en) * 1991-01-21 1992-08-25
JPH05174975A (en) * 1991-10-16 1993-07-13 Fuji Electric Co Ltd Organic thin film luminous element
JPH0645291U (en) * 1992-11-27 1994-06-14 日本精機株式会社 EL element
JP4853848B2 (en) * 2006-02-06 2012-01-11 日通商事株式会社 Container for transporting waste
WO2008105198A1 (en) * 2007-02-26 2008-09-04 Murata Manufacturing Co., Ltd. Conductive film and method for production of conductive film
US9444068B2 (en) * 2013-03-12 2016-09-13 Ppg Industries Ohio, Inc. Transparent conductive oxide coatings for organic light emitting diodes and solar devices
WO2015118726A1 (en) * 2014-02-07 2015-08-13 リンテック株式会社 Transparent conductive laminate, method for producing transparent conductive laminate, and electronic device formed using transparent conductive laminate
JP2018195512A (en) * 2017-05-19 2018-12-06 国立大学法人東京工業大学 Organic EL element

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JPS61198592A (en) * 1985-02-27 1986-09-02 株式会社村田製作所 Thin film el element
JPH0731950B2 (en) * 1985-11-22 1995-04-10 株式会社リコー Method for producing transparent conductive film
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