JP2742300B2 - Cleaning device and cleaning method - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial application field) The present invention relates to a cleaning apparatus and a cleaning method for cleaning an object to be processed.

(Prior Art) For example, in a photolithography process of a semiconductor wafer, it is an essential process to clean the semiconductor wafer. As a method of cleaning a semiconductor wafer, a brush scribing method in which a brush is brought into contact with the surface of the wafer and the semiconductor wafer is cleaned with the brush (Japanese Patent Laid-Open No. Sho 62
-259447). When the diameter of the scribing brush is smaller than the outer shape of the semiconductor wafer, the scribing brush is scanned on the semiconductor wafer and driven, for example, to swing.

(Problem to be Solved by the Invention) The biggest drawback of the above brush scribing method is that the same scribing brush is used repeatedly on a large number of semiconductor wafers, so that the scribing brush must be re-used without being sufficiently cleaned. By using
The problem is that impurities remaining on the brush adhere to the semiconductor wafer and lower the yield. Here, conventionally, each time the semiconductor wafer is replaced, the scribing brush is retracted, and the brush is immersed in a cleaning liquid in a brush cleaning container provided at the retracted position to perform cleaning. In such a brush cleaning container, the cleaning liquid is usually supplied from above, and the contaminated cleaning liquid is drained from a drain port provided on the bottom side of the container, but before the contaminated cleaning liquid is discharged from the drain port. In addition, the contaminants adhere to the brush again, making it impossible to perform effective cleaning.

Therefore, an object of the present invention is to significantly reduce the possibility that contaminants separated from the brush due to cleaning in the brush cleaning container adhere to the brush again.
An object of the present invention is to provide a cleaning device and a cleaning method having a high cleaning effect.

[Structure of the Invention] (Means for Solving the Problems) In the cleaning apparatus according to the first aspect of the present invention, the cleaning brush is retracted at the time of replacing the cleaning object with the cleaning position for cleaning the processing object. A brush cleaning container that immerses the cleaning brush in the cleaning liquid and performs the brush cleaning of the cleaning brush, and the cleaning liquid in the brush cleaning container. A brush cleaning liquid supply control means for controlling supply to the brush cleaning container, wherein the brush cleaning container is disposed on a bottom side of the brush cleaning container, and a drain port for draining the cleaning liquid from the brush cleaning container; An opening formed at an upper end side of the container so that a brush portion of the cleaning brush can be carried in and out, and wherein the brush cleaning liquid supply control means is provided in the brush cleaning container. Through a supply port that opens in the cleaning liquid, a larger amount of cleaning liquid is supplied than the amount of water discharged from the drain port, and supply control is performed such that the cleaning liquid in the brush cleaning container overflows from the opening. I do.

According to a second aspect of the present invention, in the cleaning apparatus according to the first aspect, the brush cleaning liquid supply control unit is configured to control the brush cleaning liquid when a new object is not carried into the cleaning position for a predetermined time or more. It is characterized in that the supply of the cleaning liquid is controlled in a water-saving state.

According to a third aspect of the present invention, in the cleaning apparatus according to the second aspect, the brush cleaning liquid supply control unit includes a cleaning liquid supply pipe configured to supply the cleaning liquid from the cleaning liquid supply source toward the brush cleaning container, and the cleaning liquid supply. A first valve disposed in the middle of the pipe and capable of switching between an open state in which the cleaning liquid can be supplied into the cleaning liquid supply pipe and a closed state in which the cleaning liquid supply pipe is completely closed; A second switch disposed in the middle of the supply pipe and capable of switching between an open state in which the cleaning liquid can be supplied into the cleaning liquid supply pipe and a closed state in which the cleaning liquid can be supplied in a water-saving state.
And a valve control unit that controls the opening and closing of each of the first and second valves.

The cleaning device according to the invention described in claim 4 is the cleaning device according to claim 1.
In any one of the first to third aspects, an outer cup accommodating the entire brush cleaning container, and a second drain disposed in the outer cup and draining a cleaning liquid drained from the drain port and the opening of the brush cleaning container. And a mouth.

The cleaning device according to the fifth aspect of the present invention provides the cleaning device according to the first aspect.
In any one of the fourth to ninth aspects, the cleaning brush is further provided with a rotation driving means for rotating the cleaning brush.

The cleaning device according to the invention according to claim 6 is the cleaning device according to claims 1 to
5. The method according to any one of the items 5, further comprising an ultrasonic vibrator disposed on a bottom side of the brush cleaning container and exciting the cleaning liquid by ultrasonic waves.

A cleaning device according to a seventh aspect of the present invention is the cleaning device according to the sixth aspect, wherein the water level detection sensor is disposed in the brush cleaning container and detects a water level state of the cleaning liquid in the brush cleaning container, and the water level detection sensor And driving stop means for stopping the driving of the ultrasonic transducer based on the detection result.

The cleaning method according to claim 8, wherein the cleaning brush is moved to a cleaning position for cleaning the object to be processed and a retreat position for retreating when the object to be processed is replaced, and the cleaning brush is moved at the retreat position. A cleaning method for cleaning a cleaning brush, wherein a cleaning step is performed in which a cleaning container having an opening provided on an upper end side and a drain port provided on a bottom side is filled with a cleaning liquid, and the cleaning brush is immersed in the cleaning liquid for cleaning. Draining the cleaning liquid through the drain port during the cleaning step of the cleaning brush; and opening in the cleaning liquid in the brush cleaning container during the cleaning step of the cleaning brush. Supplying a larger amount of cleaning liquid than the amount of water discharged from the drain port via a supply port, and causing the cleaning liquid to overflow from the opening.

The cleaning method according to the ninth aspect of the present invention is the cleaning method according to the eighth aspect, wherein the cleaning step includes irradiating the cleaning brush with an ultrasonic vibrator provided on a bottom side of the brush cleaning container. Characterized by having an excitation step of washing the substrate.

In the cleaning apparatus according to the tenth aspect of the present invention, the cleaning brush smaller than the diameter of the object is moved between a cleaning position for cleaning the object and a retreat position for retreating when the object is replaced. In the cleaning device, the cleaning brush is cleaned at the retracted position, and the cleaning object is cleaned by the cleaning brush at the cleaning position, and the processing target is chucked and the processing target is rotated. Rotation driving means, rotation driving means for driving the cleaning brush to rotate around an axis perpendicular to the surface of the object,
Scanning driving means for scanning and driving the cleaning brush on the surface of the object to be processed; and brush cleaning of the cleaning brush which is disposed at the retracted position on the extension of the cleaning brush in the scanning direction and immersed in a cleaning liquid. And a brush cleaning liquid supply control means for controlling the supply of the cleaning liquid into the brush cleaning container, the brush cleaning container,
A drain port disposed on the bottom side of the brush cleaning container and configured to drain the cleaning liquid from the brush cleaning container; and a drain port disposed on an upper end side of the brush cleaning container so that a brush portion of the cleaning brush can be carried in and out. Wherein the brush cleaning liquid supply control means supplies a larger amount of cleaning liquid than the amount of water discharged from the drain port through a supply port opened in the cleaning liquid in the brush cleaning container. The cleaning liquid in the brush cleaning container is supplied so as to overflow from the opening.

(Operation) According to each of the inventions described in claims 1 and 8, the following operation and effect can be obtained.

(A) Since the upper and lower drains are performed simultaneously, only the overflow is performed during the cleaning process and the cleaning process is performed after a certain period of time, as in JP-A-59-195651 and JP-A-59-195649. Compared to the case where the cycle of draining all the cleaning liquid accumulated in the lower drain port is repeated, the exchange efficiency of replacing the cleaning liquid with a clean cleaning liquid is increased. In addition, since the operation can be performed once, the time for storing water can be omitted, and the time required for replacement can be reduced.

(B) A supply port for supplying the cleaning liquid is provided in the brush cleaning container filled with the cleaning liquid. Here, for example, as in JP-A-59-195651, JP-A-59-195649 and the like, when supplying the cleaning liquid from a position above the water surface of the cleaning liquid, the supplied new clean cleaning liquid is the old stored When the cleaning liquid is dropped onto the upper layer of the water surface, the cleaning liquid overflows immediately, and the exchange efficiency of replacing the old cleaning liquid that has accumulated with a clean cleaning liquid has deteriorated.

In contrast, in Claims 1 and 8, since the supply port is located inside the old accumulated cleaning liquid, the newly supplied clean cleaning liquid penetrates the inside from the middle layer and supplies a new clean cleaning liquid. As a result, the old cleaning liquid in the upper layer overflows, and the exchange efficiency and circulation efficiency of the cleaning liquid are increased. Thus, a clean cleaning liquid can be always secured, and contaminants detached from the brush can be prevented from attaching to the cleaning brush again.

(C) There is a drain port on the bottom side of the brush cleaning container, and a larger amount of cleaning liquid is supplied than the amount discharged from the drain port.
Of the contaminants separated from the brush by the cleaning, the contaminants having a relatively high specific gravity can be discharged from the drain port, and the contaminants having a relatively low specific gravity can be rapidly discharged by overflow.

According to the second aspect of the present invention, since the cleaning liquid is supplied in a water-saving state, when the cleaning brush is on standby for a long time, a large amount of useless cleaning liquid is prevented from being consumed, and the cleaning liquid is used efficiently. Cleaning cost can be reduced.

According to the third aspect of the present invention, the cleaning liquid does not stay inside the cleaning liquid supply pipe for a long time, and the cleaning liquid is contaminated due to generation of microorganisms, while exhibiting the same effect as the second aspect. Etc. can be prevented. In addition, if only the second valve is closed by the valve control unit, water can be saved, and at the time of normal standby, both the first and second valves are switched off.
What is necessary is just to make it a closed state.

According to the fourth aspect of the present invention, both of the cleaning drainage liquids can be drained from the second drain port, and the size and simplification of drainage facilities such as drainage pipes can be achieved.

According to the fifth aspect of the present invention, since the brush is driven to rotate while being immersed in the cleaning liquid, effective contact between the brush and the cleaning liquid can be achieved, and the cleaning efficiency can be increased.

According to the sixth and ninth aspects of the present invention, the cleaning liquid is excited by the ultrasonic vibrator. When the cleaning liquid is excited, cavitation (cavitation phenomenon) occurs in the cleaning liquid,
The generation and destruction of bubbles in the cleaning liquid are repeatedly executed. Since a large force is generated when the air bubbles are destroyed, the cleaning liquid is pressed by the force generated when the air bubbles are destroyed, so that the cleaning liquid can reliably remove minute dirt present on the tip of the cleaning brush. It becomes possible to wash.

In this manner, by performing effective cleaning, even if the same cleaning brush is replaced and used for cleaning with a new workpiece, contamination of the workpiece by the cleaning brush can be reliably prevented. .

According to the invention described in claim 7, when the cleaning liquid is supplied in a water-saving state, the cleaning liquid in the brush cleaning container is drained from the drain port. In this case, since the water level detection sensor is provided at an appropriate position inside the brush cleaning container, the driving of the ultrasonic vibrator is stopped by the drive stopping means based on the detection result of the water level detection sensor, and the ultrasonic vibrator is driven. Can be prevented.

According to the tenth aspect of the present invention, the following functions and effects can be achieved while achieving the same functions and effects as the above (a) to (c) of the first aspect.

(D) In the cleaning of the object to be processed in the cleaning apparatus, the cleaning brush scans, for example, oscillates on the surface of the object to be processed by the scanning means while being rotationally driven by the rotary driving means, and
The cleaning brush itself is driven to rotate by the rotation driving means. Then, a cleaning liquid for cleaning the object to be processed is supplied to the cleaning brush by, for example, an inner nozzle provided on the cleaning brush, and the entire surface of the object to be processed is cleaned.

Thus, the object to be processed can be thoroughly washed over the entire surface of the object to be processed, even though the size of the cleaning brush is smaller than the diameter of the object to be processed, and the cleaning efficiency is improved. . In addition, the diameter of the brush can be made smaller than the outer diameter of the object to be processed, and accordingly, the cleaning container can be downsized to fit the brush, thereby reducing the cost of members, saving space, and reducing the consumption of the cleaning liquid. And running costs can be reduced. Further, since it is not necessary to adjust the brush diameter to the outer diameter of the object, it is possible to cope with various objects without increasing the number of parts.

(E) After the cleaning operation of the object to be processed is completed, the object to be processed is replaced in order to cause the rotation drive unit to chuck a new object to be processed. At this time, the cleaning brush is retracted to the retracted position by the scanning means, and the cleaning brush is cleaned in the above-described brush cleaning container. Thus, while the object to be processed is mounted on the rotary drive unit at one of the cleaning positions, the cleaning brush can be cleaned using the standby time at the other retracted position, and the cleaning of the object to be processed and the cleaning brush can be performed. Process time can be reduced. Further, since the brush cleaning container is arranged in the scanning direction, the scanning means can be used for both brush movement for cleaning the object to be processed and brush movement to the cleaning container for brush cleaning. Further, the rotation driving means can be used for both the surface cleaning of the object to be processed and the contamination cleaning of the cleaning brush.

Embodiment An embodiment in which the present invention is applied to a semiconductor wafer cleaning apparatus will be specifically described below with reference to the drawings.

In this cleaning apparatus, as schematically shown in FIG. 2, the semiconductor wafer 10 can be fixed on the spin chuck 12 by, for example, vacuum suction or a Bernoulli-chuck method. The semiconductor wafer 10 can be rotated at a relatively low speed. Further, a cup 14 is formed so as to cover the wafer 10 in order to prevent the cleaning liquid from scattering outside the apparatus when the semiconductor wafer 10 is washed.

A scribing brush 22, which is a cleaning brush for cleaning the semiconductor wafer 10, is fixed to one end of an arm 16, and the other end of the arm 16 is supported by a scanner 18. The arm is driven by the drive of the scanner 18.
The scribing brush 22 can be swung (revolving drive) through the swing range shown in FIG. That is, at the time of cleaning using the scribing brush 22, the semiconductor wafer 10 is rotationally driven by the rotation of the spin chuck 12, so that the scribing brush 22
Is revolved over the swing range A shown in FIG.
Cleaning can be performed by bringing 22 into contact. In order to further enhance the cleaning effect, the scribing brush 22 can be driven to rotate in the direction of arrow C in FIG.

Further, the scribing brush 22 is connected to the scanner
By the drive of 18, it is possible to swing over the swing range B shown in FIG. 2, and it is possible to retreat to the retreat position located outside the cup 14. A brush cleaning container 20 is disposed at the retracted position.

Next, the configuration of the brush cleaning container 20 will be described with reference to FIG. The brush cleaning container 20 includes an inner cup 30 and an outer cup. The inner cup 30 is formed in a size capable of immersing at least the brush portion of the scribing brush 22, and has a first drain port 32 formed near the bottom surface thereof. on the other hand,
The outer cup 34 has an area and a height that can completely accommodate the inner cup 30, and a second drain port 36 is formed near the bottom surface thereof.

Next, a configuration for supplying the cleaning liquid to the inner cup 30 will be described. In the present embodiment, the cleaning liquid is supplied from above the inner cup 30, and for this purpose, a cleaning liquid supply pipe 40 which is inserted from above the inner cup 30 and has a discharge port inside the inner cup 30 is provided. ing. The other end of the cleaning liquid supply pipe 40 is connected to a pump (not shown), and a leak valve 42 and a main valve 44 are inserted and connected in the middle of the pipe. The leak valve 42 and the main valve 44 are both switchable between an open state and a closed state. However, when the leak valve 42 is in the closed state, the cleaning liquid supply pipe 40 cannot be completely closed. The cleaning liquid can be supplied in a water-saving state. On the other hand, when the main valve 44 is in the closed state, the cleaning liquid supply pipe 40 can be completely closed. The open and closed states of the inner cup 42 and the main valve 44 are driven and controlled by a valve controller 46. For example, when both valves 42 and 44 are electromagnetic valves, an electric signal for controlling these valves is controlled by a valve control. It will be output from the unit 40. The control contents of the valve control unit 46 are as shown in the table below.

Further, in order to enhance the cleaning effect of the scribing brush 22 in the inner cup 30, on the bottom surface of the outer cup 34 opposed to the bottom surface of the inner cup 30, for example, ultrasonic vibrations formed in an array at predetermined intervals are arranged. A child 50 is provided. The ultrasonic vibrator 50 preferably has an ultrasonic vibrating surface formed parallel to the bottom surface of the main valve 34, and the cleaning liquid inside the inner cup 30 can be excited by driving the vibrator 50. When supplying the cleaning liquid in a water-saving state, the inner cup 30
Since the cleaning liquid inside is drained from the first drain port 32, in order to prevent the ultrasonic transducer 50 from being driven in this case, a water level detection sensor is provided at an appropriate position inside the inner cup 30, The driving of the vibrator 50 can be stopped based on this detection.

 Next, the operation will be described.

The cleaning of the semiconductor wafer 10 in this cleaning apparatus is performed in the second
As shown in FIG.
While rotating the scribing brush 10, the scribing brush 22 is driven to swing in the direction A in the drawing by the revolving drive of the arm 16, and the scribing brush 22 itself is moved in the direction indicated by the arrow C in FIG.
It is rotating in the direction.

Then, a cleaning liquid for wafer cleaning is supplied to the brush 22 by, for example, an inner nozzle or the like provided on the scribing brush 22, and the entire surface of the semiconductor wafer 10 is cleaned.

After the cleaning operation of the semiconductor wafer 10 is completed, the semiconductor wafer 10 needs to be replaced in order to support the next new wafer 10 on the chuck 12. When the semiconductor wafer 10 is replaced, the scribing brush 22 swings in the direction of arrow B in FIG. 2 and retreats at the retreat position. Since the brush cleaning container 20 is provided at the retracted position, the contaminated brush 22 is cleaned using the standby time.

Next, the cleaning operation in the brush cleaning container 20 will be described.

In this embodiment, the flow rate of the cleaning liquid from the brush cleaning liquid supply pipe 40 is set to be larger than the flow rate of the drain water from the first drain port 32 of the inner cup 30. For this reason, as shown in the above-described table, the valve control unit 46 keeps both the leak valve 42 and the main valve 44 in the fully open state. In this case, the cleaning liquid in the inner cup 30 is discharged from the first drain 32
Drained from the bottom side through the inner cup
The water overflows from the upper end of the inner cup 30 and can be drained together from the upper and lower directions of the inner cup 30. As a result, the heavy contaminants are efficiently discharged through the first drain port 32, and the light contaminants are discharged from the upper end of the inner cup 30 due to the overflow of the cleaning liquid. For this reason, a clean cleaning liquid can always be secured in the vicinity of the brush 22, and the adverse effect that the contaminants detached from the brush 22 adhere to the brush 22 again can be prevented.

Further, in this embodiment, in order to further enhance the cleaning effect, the brush 22 is driven to rotate while being immersed in the cleaning liquid. As a result, effective contact between the brush 22 and the cleaning liquid can be achieved.

Further, in this embodiment, the cleaning liquid in the inner cup 30 is excited by the ultrasonic vibrator 50. When the cleaning liquid is excited, cavitation (cavity phenomenon) occurs in the cleaning liquid, and the generation and destruction of bubbles in the cleaning liquid are repeatedly performed.

Since a large force is generated when the air bubbles are destroyed, the cleaning liquid is pressed by the force generated when the air bubbles are destroyed, so that the cleaning liquid is surely cleaned of fine dirt present on the tip of the scribing brush 22. It is possible to do.

As described above, while the scribing brush 22 is on standby, the scribing brush 22 is
The same brush 22 can be effectively cleaned
Repeatedly used for cleaning with a new semiconductor wafer 10,
The contamination of the wafer 10 by the brush 22 can be reliably prevented.

Here, when the semiconductor wafer 10 is repeatedly cleaned at predetermined intervals, the above-described cleaning operation is repeatedly performed during the standby time of the brush 22. In a state in which the cleaning liquid is not carried in, for example, a break between lots, the supply operation of the cleaning liquid to the inner cup 30 is executed as follows.

Even when the scribing brush 22 is on standby for a long time, if the cleaning liquid is supplied by overflow as described above, a large amount of useless cleaning liquid is consumed. Therefore, in such a case, only the leak valve 42 is closed by the valve control unit 46 as shown in the table described above. When the leak valve 42 is closed, the brush cleaning liquid supply pipe 40 cannot be completely closed, and the cleaning liquid is supplied in a water saving state. The supply of the cleaning liquid in such a water-saving state is not for the purpose of cleaning the scribing brush 22, and if the cleaning liquid stays inside the brush cleaning liquid supply pipe 40 for a long time, deterioration of the cleaning liquid, for example, generation of microorganisms, etc. This is because cleaning liquid is contaminated.

The cleaning liquid used for the scribing brush 22 is preferably IPA (iso-propyl alcohol).
Alternatively, pure water, ultrapure water, or the like is preferably used, and hot water may be mixed.

The present invention is not limited to the above-described embodiment, and various modifications can be made within the scope of the present invention.

[Effects of the Invention] According to each of the first and eighth aspects of the present invention, since the supply port is located inside the cleaning liquid, the newly supplied clean cleaning liquid permeates into the inside, and the new clean cleaning liquid is stored in the container. While staying inside, the old cleaning liquid in the upper layer overflows, the exchange efficiency is increased, and a clean cleaning liquid can always be secured.

In addition, a drain port is provided on the bottom side of the container, and a larger amount of cleaning liquid is supplied than the discharge port, so heavy pollutants are discharged from the drain port and light pollutants are overflowed. Since the water can be discharged and the upper and lower drains are performed at the same time, the time required for conversion when converting into a clean liquid can be reduced.

Furthermore, the circulation of the cleaning liquid in the area in which the brush is immersed can be accelerated, and the brush can be cleaned with the clean cleaning liquid at all times. Therefore, the contamination of the object to be processed due to the contamination of the brush can be reliably prevented.

According to the second aspect of the invention, when the cleaning brush is on standby for a long time, the cleaning liquid is supplied in a water-saving state, so that a large amount of useless cleaning liquid is prevented from being consumed, and the cleaning cost can be reduced.

According to the third aspect of the present invention, the cleaning liquid does not stay in the cleaning liquid supply pipe for a long time, and contamination of the cleaning liquid due to generation of microorganisms and the like can be prevented. In addition, if only the second valve is closed, water can be saved. At the time of normal standby, both the first and second valves may be closed.

According to the fourth aspect of the present invention, the size and simplification of the drainage portion such as the drainage pipe can be achieved.

According to the fifth aspect of the present invention, the brush is driven to rotate while being immersed in the cleaning liquid, so that effective contact between the brush and the cleaning liquid can be achieved.

According to each of the sixth and ninth aspects of the present invention, the cleaning liquid is excited by the ultrasonic vibrator, bubbles are generated in the cleaning liquid, and the cleaning liquid is pressed by a force generated when the bubbles are destroyed, so that the bristles of the cleaning brush. Fine dirt present at the tip can be reliably cleaned.

According to the invention of claim 7, it is possible to stop the driving of the ultrasonic vibrator by the driving stop means based on the detection result of the water level detection sensor and prevent the ultrasonic vibrator from being driven.

According to the tenth aspect of the present invention, the entire surface of the object to be processed can be cleaned, and the cleaning efficiency is improved, even though the size of the cleaning brush is smaller than the diameter of the object to be processed. Further, the cleaning of the cleaning brush can be performed by using the standby time at the retreat position, and the cleaning process time of the object and the cleaning brush can be reduced.

[Brief description of the drawings]

FIG. 1 is a schematic cross-sectional view of a brush cleaning container in a cleaning device to which the present invention is applied, and FIG. 2 is a plan view of an embodiment device. 20: Brush cleaning container, 30: Inner cup, 34: Outer cup, 40: Brush cleaning liquid supply pipe, 42, 44, 46 ... Brush cleaning liquid supply control means, 50: Ultrasonic vibrator.

 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-62-122131 (JP, A) JP-A-59-195651 (JP, A) JP-A-59-195649 (JP, A)

Claims (10)

(57) [Claims] 1. A cleaning device for moving a cleaning brush to a cleaning position for cleaning an object to be processed and a retreat position for retreating when the object to be processed is replaced, and performing a brush cleaning of the cleaning brush at the retreat position. A brush cleaning container immersed in a cleaning liquid to perform brush cleaning of the cleaning brush; and a brush cleaning liquid supply control unit configured to control supply of the cleaning liquid into the brush cleaning container. A drain port disposed on the bottom side of the brush cleaning container and configured to drain the cleaning liquid from the brush cleaning container; and a drain port disposed on an upper end side of the brush cleaning container so that a brush portion of the cleaning brush can be carried in and out. And a brush cleaning liquid supply control means, wherein the amount of water discharged from the drain port is controlled via a supply port opened in the cleaning liquid in the brush cleaning container. Cleaning device also supplying a large amount of the cleaning liquid, characterized by a cleaning liquid of the brush cleaning container to supply control so as to overflow from the opening. 2. The brush cleaning liquid supply control means according to claim 1, wherein said brush cleaning liquid supply control means keeps said brush cleaning liquid in a water-saving state when a new object is not carried into said cleaning position for a predetermined time or more. A cleaning device for controlling supply. 3. The cleaning liquid supply control means according to claim 2, wherein said brush cleaning liquid supply control means includes a cleaning liquid supply pipe for supplying said cleaning liquid from said cleaning liquid supply source toward said brush cleaning container, and a pipe halfway of said cleaning liquid supply pipe. A first valve that is switchable between an open state where the cleaning liquid supply pipe can be supplied to the cleaning liquid supply pipe and a closed state where the cleaning liquid supply pipe is completely closed; A second valve disposed and switchable between an open state in which the cleaning liquid can be supplied into the cleaning liquid supply pipe and a closed state in which the cleaning liquid can be supplied in a water-saving state; 2. A cleaning device, comprising: a valve control unit that drives and controls the opening and closing of each of the valves. 4. The brush cleaning container according to claim 1, further comprising: an outer cup accommodating the whole of the brush cleaning container; A second drain port for draining a cleaning liquid drained from the opening. 5. The cleaning apparatus according to claim 1, further comprising an automatic driving means for automatically driving the cleaning brush. 6. The brush cleaning device according to claim 1, further comprising an ultrasonic vibrator disposed on a bottom surface side of said brush cleaning container and for exciting a cleaning liquid with ultrasonic waves. Cleaning equipment. 7. A water level detection sensor according to claim 6, wherein said water level detection sensor is provided in said brush cleaning container and detects a water level state of said cleaning liquid in said brush cleaning container, based on a detection result of said water level detection sensor. And a drive stopping means for stopping the driving of the ultrasonic vibrator. 8. A cleaning method for moving a cleaning brush to a cleaning position for cleaning an object to be processed and a retreat position for retreating when the object to be processed is replaced, and cleaning the cleaning brush at the retreat position. A cleaning step of filling a cleaning liquid in a cleaning container having an opening provided on an upper end side and a drain port provided on a bottom side, and immersing the cleaning brush in the cleaning liquid for cleaning; Draining the cleaning liquid through the drain port, and draining the cleaning liquid through the supply port opened in the cleaning liquid in the brush cleaning container during the cleaning step of the cleaning brush. Supplying a larger amount of cleaning liquid than the amount of drainage from the mouth, and causing the cleaning liquid to overflow from the opening. 9. The cleaning step according to claim 8, wherein the cleaning step includes cleaning the cleaning brush while vibrating the cleaning brush with an ultrasonic vibrator disposed on a bottom side of the brush cleaning container. A cleaning method comprising: 10. A cleaning brush smaller than the diameter of the object to be processed is moved between a cleaning position for cleaning the object to be processed and a retreat position for retreating when the object to be processed is replaced. A cleaning device that performs cleaning of a brush and cleans the object to be processed by the cleaning brush at the cleaning position; a rotation driving unit that chucks the object to be processed and rotates the object to be processed; Rotation driving means for driving the cleaning brush to rotate about an axis perpendicular to the surface of the body, scanning driving means for scanning and driving the cleaning brush on the surface of the object, and extending the cleaning brush in the scanning direction. A brush cleaning container disposed at the retreat position and immersed in a cleaning liquid to perform brush cleaning of the cleaning brush; and controlling the supply of the cleaning liquid into the brush cleaning container. A brush cleaning liquid supply control means, wherein the brush cleaning container is disposed on a bottom side of the brush cleaning container, and a drain port for draining the cleaning liquid from the brush cleaning container; and an upper end of the brush cleaning container And an opening formed so as to be able to carry in and out a brush portion of the cleaning brush, wherein the brush cleaning liquid supply control means includes a supply port opened in the cleaning liquid in the brush cleaning container. A cleaning liquid supplied from the drain port via the drain port, and a supply of the cleaning liquid in the brush cleaning container is controlled so as to overflow from the opening.