JP2729951B2 - Dispersion plating equipment - Google Patents
Dispersion plating equipmentInfo
- Publication number
- JP2729951B2 JP2729951B2 JP3549589A JP3549589A JP2729951B2 JP 2729951 B2 JP2729951 B2 JP 2729951B2 JP 3549589 A JP3549589 A JP 3549589A JP 3549589 A JP3549589 A JP 3549589A JP 2729951 B2 JP2729951 B2 JP 2729951B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- pipe
- plating solution
- air
- air stirring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Chemically Coating (AREA)
Description
【発明の詳細な説明】 a. 産業上の利用分野 本発明はメッキ液に分散材(複合材など)を混合して
おこなう分散メッキ装置に関する。DETAILED DESCRIPTION OF THE INVENTION a. Industrial Field of the Invention The present invention relates to a dispersion plating apparatus for mixing a plating solution with a dispersant (such as a composite material).
b. 従来の技術 従来から使用されている前記分散メッキ装置を第3図
に概念的に示す。図においてaはメッキ槽、bは空気撹
拌パイプ、cはメッキ液の循環パイプ、dはメッキ液の
循環ポンプ、eは空気撹拌パイプに設けた多数の空気噴
出口、fは分散材を混入したメッキ液である。b. Prior Art FIG. 3 conceptually shows the dispersion plating apparatus conventionally used. In the figure, a is a plating tank, b is an air stirring pipe, c is a plating solution circulation pipe, d is a plating solution circulation pump, e is a number of air jets provided in the air stirring pipe, and f is a mixture of dispersant. It is a plating solution.
メッキ槽a内のメッキ液を循環パイプcによってメッ
キ槽aの底部付近からその上部に循環させる一方、空気
撹拌パイプbの空気噴出口eよりメッキ槽aの底部に空
気を送入してメッキ液を撹拌させて、メッキ槽a内のメ
ッキ液fの懸濁状態を均一に維持しながらメッキ槽a内
に浸透した被メッキ部品(図示省略)にメッキを施して
いた。The plating solution in the plating tank a is circulated from the vicinity of the bottom of the plating tank a to the upper part thereof by the circulation pipe c, and air is fed into the bottom of the plating tank a from the air jet port e of the air stirring pipe b to form the plating solution. Is stirred, and the plated component (not shown) that has permeated into the plating tank a is plated while the suspension of the plating solution f in the plating tank a is maintained uniformly.
c. 発明が解決しようとする課題 メッキ作業が終了し、メッキ液fに対する空気撹拌を
停止すると、空気撹拌パイプb内には第4図に示すよう
に分散材が沈降堆積し、またメッキ液温の低下にともな
いメッキ液添加物、たとえば硼酸などが析出し、空気撹
拌パイプbの空気噴出口eを分散材として添加物の析出
によって塞いでしまう。したがって、再びメッキ作業を
開始すると第5図に示すように沈澱物(分散材・析出物
等)gによって一部塞鎖されたまゝの噴出口eが生じ、
予定している空気噴出の速度,量,位置に影響を与え、
メッキ槽a内のメッキ液fの分散材の懸濁状態を一定に
保持できなくなるという問題点があった。c. Problems to be Solved by the Invention When the plating operation is completed and the air stirring for the plating solution f is stopped, the dispersing material settles and accumulates in the air stirring pipe b as shown in FIG. As a result, the plating solution additive, for example, boric acid or the like is precipitated, and the air jet port e of the air stirring pipe b is blocked as a dispersant by the deposition of the additive. Therefore, when the plating operation is started again, a spout e which is partially blocked by the precipitate (dispersion material / precipitate, etc.) g is generated as shown in FIG.
Affects the speed, volume, and location of the planned air jet,
There has been a problem that the suspension state of the dispersion material of the plating solution f in the plating tank a cannot be kept constant.
本発明は、このような事情に鑑みてなされたもので、
前記問題点を解消してなる分散メッキ装置を提供するこ
とを目的とする。The present invention has been made in view of such circumstances,
It is an object of the present invention to provide a dispersion plating apparatus which solves the above problems.
e. 課題を解決するための手段 前記目的に添い、本発明はメッキ槽にメッキ液の循環
パイプと、空気撹拌パイプとを設けてなる分散メッキ装
置において、前記空気撹拌パイプにメッキ槽内のメッキ
液を送出するパイプを接続することによって前記課題を
解決した。e. Means for Solving the Problems According to the above object, the present invention provides a distributed plating apparatus comprising a plating tank provided with a plating solution circulation pipe and an air stirring pipe. The above problem was solved by connecting a pipe for delivering a liquid.
以下、本発明の実施例について図面を参照しながら詳
細に説明する。Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第1図において、1はメッキ槽、2は空気撹拌パイ
プ、3は循環パイプ、4は循環パイプ3の一部から分岐
して設けた分岐パイプで、該分岐パイプ4は、前記空気
撹拌パイプ2の途中に接続している。5はメッキ液の循
環ポンプ、2aは空気撹拌パイプの空気の噴出口、6はメ
ッキ液である。In FIG. 1, 1 is a plating tank, 2 is an air stirring pipe, 3 is a circulation pipe, 4 is a branch pipe provided by branching from a part of the circulation pipe 3, and the branch pipe 4 is the air stirring pipe 2 Connected in the middle of Reference numeral 5 denotes a plating solution circulating pump, 2a denotes an air outlet of an air stirring pipe, and 6 denotes a plating solution.
循環パイプ3はメッキ槽1の底部付近に吸入口3aを、
メッキ液6の液面に近く排出口3bを備えている。The circulation pipe 3 has a suction port 3a near the bottom of the plating tank 1,
An outlet 3b is provided near the surface of the plating solution 6.
前記分岐パイプ4は循環パイプ3の吸入口3aと排出口
3bとの間の分岐点8から分岐し、その末端の排出口4aを
前記空気撹拌パイプ2のメッキ液面上部の特定位置に接
続挿入し、空気の送入方向と同方向にメッキ液が送られ
るように構成してある。The branch pipe 4 is a suction port 3a and a discharge port of the circulation pipe 3.
3b, the outlet 4a at the end thereof is connected and inserted into a specific position above the plating liquid surface of the air stirring pipe 2, and the plating liquid is supplied in the same direction as the air supply direction. It is configured to be able to.
メッキ槽1内のメッキ液6内に被メッキ部品を入れ、
メッキ処理をおこなう間、循環ポンプ5によってメッキ
槽1の底部付近のメッキ液6は循環パイプ3の吸入口3a
から吸入され、分岐点8において、従来通り、排出口3b
に向って流れるメッキ液と、分岐パイプ4を通り、その
排出口4aに向って流れるメッキ液とに分流する。The parts to be plated are placed in the plating solution 6 in the plating tank 1,
During the plating process, the plating solution 6 near the bottom of the plating tank 1 is supplied by the circulation pump 5 to the suction port 3 a of the circulation pipe 3.
From the outlet 3b at the junction 8 as before.
And the plating solution flowing through the branch pipe 4 and flowing toward the outlet 4a.
分岐パイプ4の排出口4aでは、空気撹拌パイプ2内を
矢印方向に流れる空気とともに、メッキ液が同方向に送
出され、これが空気撹拌パイプ2の噴出口2aから空気と
ともにメッキ槽1内のメッキ液中に排出される。At the discharge port 4a of the branch pipe 4, the plating solution is sent in the same direction together with the air flowing in the air stirring pipe 2 in the direction of the arrow. Is discharged inside.
すなわち、メッキ液が排出された空気撹拌パイプ2内
では、空気とメッキ液とが共存し、両者は撹乱した状態
となる。その結果、メッキ作業を停止したあと、噴出口
2aを塞いでいた沈澱物は、物理的に取り除かれる。That is, in the air stirring pipe 2 from which the plating solution has been discharged, the air and the plating solution coexist, and both are in a disturbed state. As a result, after stopping the plating work,
The precipitate blocking 2a is physically removed.
また、空気撹拌パイプ2内へのメッキ液の導入は、メ
ッキ液温度の上昇にしたがって、空気撹拌パイプ2内で
析出凝固した添加物を溶解することができ、したがって
析出物による空気噴出口の閉塞の防止と、堆積した分散
材の固化防止と、分離した析出凝固物の塊が、塞がれて
いない噴出口を閉塞することを防止する。In addition, the introduction of the plating solution into the air stirring pipe 2 can dissolve the additive precipitated and solidified in the air stirring pipe 2 as the plating solution temperature rises. And solidification of the deposited dispersing material, and a block of separated solidified solids is prevented from blocking an unblocked jet port.
第2図は本発明に係る装置の他の実施例を示し、循環
パイプに分岐管を設けず、空気撹拌パイプに対し、専用
の供給パイプを設けて、メッキ液を提供するようにした
ものである。同図において11はメッキ槽、12は空気撹拌
パイプ、13は循環パイプ、14はメッキ液を空気撹拌パイ
プ12に供給する供給パイプで、該供給パイプ14はメッキ
槽11内にメッキ液の吸入口14bと空気撹拌パイプ12への
排出口14aとを備えている。15は循環パイプ13に設けた
循環ポンプ、19は供給パイプ14に設けた循環ポンプ、16
はメッキ液をそれぞれ示す。FIG. 2 shows another embodiment of the apparatus according to the present invention, in which a circulating pipe is not provided with a branch pipe, and a dedicated supply pipe is provided for an air stirring pipe to provide a plating solution. is there. In the figure, 11 is a plating tank, 12 is an air stirring pipe, 13 is a circulation pipe, 14 is a supply pipe for supplying the plating liquid to the air stirring pipe 12, and the supply pipe 14 is a plating liquid suction port in the plating tank 11. 14b and an outlet 14a to the air stirring pipe 12 are provided. 15 is a circulation pump provided in the circulation pipe 13, 19 is a circulation pump provided in the supply pipe 14, 16
Indicates a plating solution.
本装置では、メッキ槽11内のメッキ液は循環パイプ13
によって従来装置と同様に循環させる。空気撹拌パイプ
12には供給パイプ14の排出口14aを挿入し、吸入口14bに
よってメッキ槽11から直接吸入したメッキ液を供給す
る。In this apparatus, the plating solution in the plating tank 11 is
Circulates in the same manner as in the conventional apparatus. Air stirring pipe
The outlet 12a of the supply pipe 14 is inserted into 12, and the plating solution sucked directly from the plating tank 11 through the inlet 14b is supplied.
この実施例では空気撹拌パイプ12へ供給するメッキ液
を専用の供給パイプ14で供給するように構成したので、
前記実施例では空気撹拌パイプへのメッキ液供給量が調
整できなかった点が改善され、供給量が事由に調整でき
る。In this embodiment, since the plating solution to be supplied to the air stirring pipe 12 is configured to be supplied through the dedicated supply pipe 14,
In the above embodiment, the point that the supply amount of the plating solution to the air stirring pipe could not be adjusted is improved, and the supply amount can be adjusted for any reason.
e. 発明の効果 本発明に係る分散メッキ装置によれば、従来、空気撹
拌パイプの空気噴出口が分散材等によって閉塞されるの
を、効果的に防止することができる。e. Effects of the Invention According to the dispersion plating apparatus of the present invention, it is possible to effectively prevent the air outlet of the air stirring pipe from being blocked by the dispersant or the like.
また、すでに析出・堆積した分散材や析出物を科学的
に、また物理的に除去し、空気噴出口が閉塞されるのを
防止することができ、空気の流れも一定に保持できる。In addition, the already deposited and deposited dispersing material and precipitates can be scientifically and physically removed to prevent the air outlet from being blocked, and the air flow can be kept constant.
さらに撹拌状態が一定になり、メッキ液中の分散材を
収支安定した懸濁状態に維持できる。Furthermore, the stirring state becomes constant, and the dispersion material in the plating solution can be maintained in a stable suspension state.
第1図は本発明に係る分散メッキ装置の一実施例を概念
的に示す説明図、第2図は同じく他の実施例の説明図、
第3図は従来装置の説明図、第4図および第5図は従来
装置の空気撹拌パイプの空気噴出口部分の断面説明図で
ある。 1・11……メッキ槽、2・12……空気撹拌パイプ、 3・13……循環パイプ、4……分岐パイプ、 14……供給パイプ。FIG. 1 is an explanatory view conceptually showing one embodiment of a dispersion plating apparatus according to the present invention, FIG. 2 is an explanatory view of another embodiment,
FIG. 3 is an explanatory view of a conventional apparatus, and FIGS. 4 and 5 are cross-sectional explanatory views of an air ejection port portion of an air stirring pipe of the conventional apparatus. 1.11 plating bath, 2.12 air stirring pipe, 3.13 circulation pipe, 4 branch pipe, 14 supply pipe.
Claims (1)
撹拌パイプとを設けてなる分散メッキ装置において、前
記空気撹拌パイプにメッキ槽内のメッキ液を送出するパ
イプを接続したことを特徴とする分散メッキ装置。In a dispersion plating apparatus having a plating tank provided with a plating solution circulation pipe and an air stirring pipe, a pipe for sending a plating solution in the plating tank is connected to the air stirring pipe. Dispersion plating equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3549589A JP2729951B2 (en) | 1989-02-15 | 1989-02-15 | Dispersion plating equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3549589A JP2729951B2 (en) | 1989-02-15 | 1989-02-15 | Dispersion plating equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH02213497A JPH02213497A (en) | 1990-08-24 |
JP2729951B2 true JP2729951B2 (en) | 1998-03-18 |
Family
ID=12443332
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3549589A Expired - Lifetime JP2729951B2 (en) | 1989-02-15 | 1989-02-15 | Dispersion plating equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2729951B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200141605A (en) * | 2019-06-11 | 2020-12-21 | 이정열 | Electro-plating apparatus |
-
1989
- 1989-02-15 JP JP3549589A patent/JP2729951B2/en not_active Expired - Lifetime
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200141605A (en) * | 2019-06-11 | 2020-12-21 | 이정열 | Electro-plating apparatus |
KR102248133B1 (en) * | 2019-06-11 | 2021-05-03 | 이정열 | Electro-plating apparatus |
Also Published As
Publication number | Publication date |
---|---|
JPH02213497A (en) | 1990-08-24 |
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