JP2727888B2 - Silicone-modified aralkyl resin - Google Patents
Silicone-modified aralkyl resinInfo
- Publication number
- JP2727888B2 JP2727888B2 JP4242594A JP24259492A JP2727888B2 JP 2727888 B2 JP2727888 B2 JP 2727888B2 JP 4242594 A JP4242594 A JP 4242594A JP 24259492 A JP24259492 A JP 24259492A JP 2727888 B2 JP2727888 B2 JP 2727888B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- silicone
- resin
- aralkyl resin
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Phenolic Resins Or Amino Resins (AREA)
- Epoxy Resins (AREA)
- Silicon Polymers (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は半導体装置封止用エポキ
シ樹脂組成物の成分等として好適に使用し得る新規なシ
リコーン変性アラルキル樹脂に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel silicone-modified aralkyl resin which can be suitably used as a component of an epoxy resin composition for encapsulating semiconductor devices.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来、
エポキシ樹脂は、これに硬化剤及び無機充填剤等を加え
た組成物として各種成形材料、粉体塗料用材料、電気絶
縁材料等に広く使用され、特に最近においてはダイオー
ド、トランジスタ、IC、LSI、超LSI等の樹脂封
止型の半導体装置封止用材料として多量に使用されてい
る。これは、エポキシ樹脂が一般に他の熱硬化性樹脂に
比べて成形性、接着性、電気特性、機械特性、耐湿性等
に優れているという特性を利用したものである。2. Description of the Related Art
Epoxy resins are widely used in various molding materials, powder coating materials, electric insulating materials, and the like as a composition obtained by adding a curing agent and an inorganic filler to the resin. Particularly in recent years, diodes, transistors, ICs, LSIs, It is widely used as a resin-sealing-type semiconductor device sealing material such as a super LSI. This is based on the fact that epoxy resins are generally superior to other thermosetting resins in terms of moldability, adhesiveness, electrical properties, mechanical properties, moisture resistance, and the like.
【0003】これら半導体装置は最近ではその集積度が
益々大きくなり、これに応じてチップ寸法も大きくなり
つつあるが、これに対してパッケージ外形寸法は、電子
機器の小型化、軽量化の要求にともない小型化、薄型化
が進んでいる。更に、半導体部品を回路基板へ取り付け
る方法においても、基板上の部品の高密度化や基板の薄
型化のため、半導体部品の表面実装が行われている。In recent years, the degree of integration of these semiconductor devices has been increasing, and the chip size has been increasing accordingly. However, the external dimensions of the package are required to reduce the size and weight of electronic devices. It is becoming smaller and thinner. Further, in a method of attaching a semiconductor component to a circuit board, surface mounting of the semiconductor component is performed to increase the density of components on the board and to reduce the thickness of the board.
【0004】しかしながら、半導体装置を回路基板へ表
面実装する場合、半導体装置全体を半田浴に浸漬する
か、または半田が溶融する高温帯を通過させる方法が一
般的であるが、その際の熱衝撃により封止樹脂層にクラ
ックが発生したり、リードフレームやチップと封止樹脂
との界面に剥離が生じたりするという問題があった。こ
のようなクラックや剥離は、表面実装の熱衝撃以前に半
導体装置の封止樹脂層が吸湿していると更に顕著なもの
となるが、実際の作業工程においては、封止樹脂層の吸
湿は避けられず、このため実装後のエポキシ樹脂組成物
で封止した半導体装置の信頼性が大きく損なわれる場合
があった。However, when a semiconductor device is surface-mounted on a circuit board, it is common to immerse the entire semiconductor device in a solder bath or pass the semiconductor device through a high-temperature zone in which the solder melts. As a result, there is a problem that cracks occur in the sealing resin layer, and separation occurs at the interface between the lead frame or chip and the sealing resin. Such cracks and peeling become more remarkable when the sealing resin layer of the semiconductor device absorbs moisture before the thermal shock of the surface mounting.However, in the actual working process, the moisture absorption of the sealing resin layer Inevitably, the reliability of the semiconductor device sealed with the epoxy resin composition after mounting may be greatly impaired.
【0005】従って、回路基板への表面実装後に高い信
頼性の半導体装置を与え得る高品質の半導体装置用エポ
キシ樹脂組成物の開発が望まれていた。Therefore, development of a high quality epoxy resin composition for a semiconductor device capable of providing a highly reliable semiconductor device after surface mounting on a circuit board has been desired.
【0006】本発明は上記事情に鑑みなされたもので、
表面実装半導体装置用エポキシ樹脂組成物の成分等とし
て好適に使用し得る新規なシリコーン変性アラルキル樹
脂を提供することを目的とする。The present invention has been made in view of the above circumstances,
An object of the present invention is to provide a novel silicone-modified aralkyl resin that can be suitably used as a component of an epoxy resin composition for a surface mount semiconductor device.
【0007】[0007]
【課題を解決するための手段及び作用】本発明者は上記
目的を達成するため鋭意検討を重ねた結果、後述する構
造式(2)〜(7)から選ばれるアルケニル基を含有す
るアラルキル樹脂に対し、≡SiH基を有する下記組成
式(1)で示される1分子中の珪素原子の数が1〜40
0である有機珪素化合物を付加させることにより、アル
ケニル基含有アラルキル樹脂中のアルケニル基と結合し
ていない遊離の有機珪素化合物を殆んど含まないシリコ
ーン変性アラルキル樹脂を工業的に有利に得ることがで
きること、このシリコーン変性アラルキル樹脂は、それ
がフェノール樹脂かエポキシ樹脂かに応じ、従来公知の
フェノール樹脂、エポキシ樹脂と同様にエポキシ樹脂の
硬化剤として使用したり、エポキシ硬化剤、触媒と共に
硬化させることができ、また場合により有機錫化合物等
のシリコーン用硬化触媒の存在下に硬化させることもで
き、これにより低応力で強靭な硬化物を与え、更に樹脂
成分として硬化性エポキシ樹脂と併用した場合には、優
れた耐クラック性を有し、かつガラス転移点も10℃程
度向上したエポキシ樹脂組成物の成形物を与えること、
それ故、本発明で得られたシリコーン変性アラルキル樹
脂が半導体封止用エポキシ樹脂組成物の成分として非常
に有用であることを知見し、本発明をなすに至ったもの
である。The present inventors have made intensive studies to achieve the above object, and as a result, have found that aralkyl resins containing an alkenyl group selected from structural formulas (2) to (7) described below. On the other hand, the number of silicon atoms in one molecule represented by the following composition formula (1) having a ≡SiH group is 1 to 40
By adding an organic silicon compound which is 0, a silicone-modified aralkyl resin containing almost no free organic silicon compound not bonded to an alkenyl group in the alkenyl group-containing aralkyl resin can be industrially advantageously obtained. Depending on whether it is a phenolic resin or an epoxy resin, this silicone-modified aralkyl resin can be used as a curing agent for an epoxy resin in the same manner as a conventionally known phenolic resin or epoxy resin, or cured together with an epoxy curing agent and a catalyst. It can also be cured in the presence of a curing catalyst for silicone such as an organotin compound, if necessary, to give a low-stress, tough cured product, and when used together with a curable epoxy resin as a resin component. Is an epoxy resin with excellent crack resistance and improved glass transition point by about 10 ° C. Providing a molded product of the resin composition,
Therefore, they have found that the silicone-modified aralkyl resin obtained in the present invention is very useful as a component of an epoxy resin composition for semiconductor encapsulation, and have accomplished the present invention.
【0008】[0008]
【化2】 (但し、式中R1はメチル基、エチル基、フェニル基、
ベンジル基、クロロメチル基、クロロプロピル基、炭素
数1〜5のアルコキシ基から選ばれる1価の基を示し、
a,bは0.01≦a≦1、1≦b≦3、1≦a+b≦
4を満足する正数である。)Embedded image (Where R 1 is a methyl group, an ethyl group, a phenyl group,
A benzyl group, a chloromethyl group, a chloropropyl group, a monovalent group selected from alkoxy groups having 1 to 5 carbon atoms,
a and b are 0.01 ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦
It is a positive number that satisfies 4. )
【0009】従って、本発明は、後述する構造式(2)
〜(7)から選ばれるアルケニル基含有アラルキル樹脂
の上記アルケニル基に上記組成式(1)で示される1分
子中の珪素原子の数が1〜400である有機珪素化合物
の≡SiH基が付加されてなるシリコーン変性アラルキ
ル樹脂を提供する。Accordingly, the present invention provides a compound represented by the following structural formula (2):
To the alkenyl group of the alkenyl group-containing aralkyl resin selected from (7) to (7), a ≡SiH group of an organosilicon compound having 1 to 400 silicon atoms in one molecule represented by the composition formula (1) is added. And a silicone-modified aralkyl resin.
【0010】以下、本発明につき更に詳述すると、本発
明のシリコーン変性アラルキル樹脂は、後述する構造式
(2)〜(7)から選ばれるアルケニル基含有アラルキ
ル樹脂の上記アルケニル基に下記組成式(1)で示され
る1分子中の珪素原子の数が1〜400である有機珪素
化合物の≡SiH基が付加されてなる重合体である。Hereinafter, the present invention will be described in more detail. The silicone-modified aralkyl resin of the present invention is obtained by adding the following alkenyl group of an alkenyl group-containing aralkyl resin selected from structural formulas (2) to (7) described below to the following composition formula ( It is a polymer obtained by adding a ≡SiH group of an organosilicon compound having 1 to 400 silicon atoms in one molecule shown in 1).
【0011】[0011]
【化3】 (但し、式中R1はメチル基、エチル基、フェニル基、
ベンジル基、クロロメチル基、クロロプロピル基、炭素
数1〜5のアルコキシ基から選ばれる1価の基を示し、
a,bは0.01≦a≦1、1≦b≦3、1≦a+b≦
4を満足する正数である。)Embedded image (Where R 1 is a methyl group, an ethyl group, a phenyl group,
A benzyl group, a chloromethyl group, a chloropropyl group, a monovalent group selected from alkoxy groups having 1 to 5 carbon atoms,
a and b are 0.01 ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦
It is a positive number that satisfies 4. )
【0012】ここで、本発明に用いられるアルケニル基
含有アラルキル樹脂成分としては、下記構造式(2)〜
(7)から選ばれるものを使用する。これらの中で特に
式(2),(3)のものが好適に用いられる。The alkenyl group-containing aralkyl resin component used in the present invention is represented by the following structural formula (2):
Use one selected from (7). Of these, those of the formulas (2) and (3) are particularly preferably used.
【0013】[0013]
【0014】[0014]
【化4】 Embedded image
【0015】[0015]
【化5】(但し、式中Rは水素原子、ハロゲン原子、メ
チル基,エチル基,ブチル基又は アクリルオキシ基から選ばれるアルケニル基を示し、か
つ分子中のGの少なくと るグリシジルエーテル基である。また、n,p,qはそ
れぞれ0〜20の整数である。)Wherein R is a hydrogen atom, a halogen atom, a methyl group, an ethyl group, a butyl group or An alkenyl group selected from an acryloxy group, and at least G in the molecule Glycidyl ether group. Further, n, p, and q are integers of 0 to 20, respectively. )
【0016】なお、上記アルケニル基含有アラルキル樹
脂中のアルケニル基の含有割合は、1分子中に1個以上
有すればよいが、全水酸基又は全グリシジルエーテル基
に対して0.01〜0.4個であることが好ましく、更
に好ましくは0.03〜0.3個である。The content of the alkenyl group in the alkenyl group-containing aralkyl resin may be at least one in one molecule, but may be 0.01 to 0.4 with respect to all hydroxyl groups or all glycidyl ether groups. The number is preferably, and more preferably 0.03 to 0.3 .
【0017】次に、上記のアルケニル基含有アラルキル
樹脂に付加される有機珪素化合物は、1分子中に少なく
とも1個の≡SiH基を有するもので、上述したように
下記組成式(1)で示されるものである。Next, the organosilicon compound added to the alkenyl group-containing aralkyl resin has at least one ≡SiH group in one molecule and is represented by the following composition formula (1) as described above. It is what is done.
【0018】[0018]
【化6】 (但し、式中R1はメチル基、エチル基、フェニル基、
ベンジル基、クロロメチル基、クロロプロピル基、炭素
数1〜5のアルコキシ基から選ばれる1価の基を示し、
a,bは0.01≦a≦1、1≦b≦3、1≦a+b≦
4を満足する正数である。)Embedded image (Where R 1 is a methyl group, an ethyl group, a phenyl group,
A benzyl group, a chloromethyl group, a chloropropyl group, a monovalent group selected from alkoxy groups having 1 to 5 carbon atoms,
a and b are 0.01 ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦
It is a positive number that satisfies 4. )
【0019】上記式(1)において、R1はメチル基、
エチル基、フェニル基、ベンジル基、クロロプロピル
基、クロロメチル基、炭素数1〜5のアルコキシ基(例
えばメトキシ基、エトキシ基など)から選ばれる。In the above formula (1), R 1 is a methyl group,
It is selected from an ethyl group, a phenyl group, a benzyl group, a chloropropyl group, a chloromethyl group, and an alkoxy group having 1 to 5 carbon atoms (such as a methoxy group and an ethoxy group).
【0020】なお、上記式(1)の有機珪素化合物は、
1分子中の珪素原子の数が1〜400、好ましくは20
〜200の整数であり、かつ1分子中の珪素原子に直結
した水素原子の数が1以上、好ましくは1〜10の整数
である。The organosilicon compound of the above formula (1) is
The number of silicon atoms in one molecule is from 1 to 400, preferably 20
And the number of hydrogen atoms directly connected to silicon atoms in one molecule is 1 or more, preferably an integer of 1 to 10.
【0021】本発明のシリコーン変性アラルキル樹脂
は、上述したアルケニル基含有アラルキル樹脂と上記式
(1)の有機珪素化合物とを付加反応させることにより
得る。The silicone-modified aralkyl resin of the present invention is obtained by subjecting the above-mentioned alkenyl group-containing aralkyl resin to an addition reaction with the organosilicon compound of the above formula (1).
【0022】この場合、アルケニル基含有アラルキル樹
脂と上記式(1)の有機珪素化合物はそれぞれ1種のみ
を使用してもよく、2種以上を使用してもよいが、アル
ケニル基含有アラルキル樹脂中のアルケニル基の当量を
A、有機珪素化合物中の≡SiH基の当量をBとした場
合、0.1≦B/A≦2、特に0.2≦B/A≦1とな
るような割合で反応させることが好ましい。B/Aが
0.1より小さくなると目的化合物の収率が小さくなっ
て工業的に不利になる場合があり、B/Aが2より大き
くなるとゲル化する可能性がある。In this case, the alkenyl group-containing aralkyl resin and the organosilicon compound of the above formula (1) may be used alone or in combination of two or more. Where A is the equivalent of the alkenyl group and B is the equivalent of the ≡SiH group in the organosilicon compound, the ratio is 0.1 ≦ B / A ≦ 2, particularly 0.2 ≦ B / A ≦ 1. It is preferred to react. If B / A is less than 0.1, the yield of the target compound may be low, which may be industrially disadvantageous. If B / A is more than 2, gelation may occur.
【0023】更に付加反応に際しては、従来公知の付加
触媒、例えば塩化白金酸のような白金触媒を使用するこ
とが好ましい。なお、付加触媒の添加量は通常量とする
ことができる。In addition reaction, it is preferable to use a conventionally known addition catalyst, for example, a platinum catalyst such as chloroplatinic acid. In addition, the addition amount of the additional catalyst can be a normal amount.
【0024】また、上記付加反応は有機溶媒中で行うこ
とが望ましく、有機溶媒としては、ベンゼン、トルエ
ン、メチルイソブチルケトン等の不活性溶媒を用いるこ
とが好ましい。The above addition reaction is preferably carried out in an organic solvent. As the organic solvent, it is preferable to use an inert solvent such as benzene, toluene and methyl isobutyl ketone.
【0025】付加反応条件は特に制限されないが、通常
60〜120℃で30分〜10時間反応させることが好
ましい。The conditions of the addition reaction are not particularly limited, but the reaction is preferably carried out at 60 to 120 ° C. for 30 minutes to 10 hours.
【0026】反応終了後は、通常の方法で後処理、精製
することにより、目的とするシリコーン変性アラルキル
樹脂を得ることができる。After completion of the reaction, the desired silicone-modified aralkyl resin can be obtained by post-treatment and purification by a usual method.
【0027】本発明のシリコーン変性アラルキル樹脂
は、それがフェノール樹脂かエポキシ樹脂かに応じ、従
来公知のフェノール樹脂、エポキシ樹脂と同様にエポキ
シ樹脂の硬化剤として使用したり、エポキシ硬化剤、触
媒と共に硬化させることができ、また場合により有機錫
化合物等のシリコーン用硬化触媒の存在下に硬化させる
こともでき、これにより低応力で強靭な硬化物を与え
る。また、硬化性エポキシ樹脂と併用した場合、耐クラ
ック性に優れ、ガラス転移点も10℃程度向上した硬化
物を与える。従って、本発明のシリコーン変性アラルキ
ル樹脂は、半導体装置封止用エポキシ樹脂組成物の成分
として好適に使用される。The silicone-modified aralkyl resin of the present invention may be used as a curing agent for an epoxy resin in the same manner as a conventionally known phenol resin or epoxy resin, or may be used together with an epoxy curing agent and a catalyst, depending on whether the resin is a phenol resin or an epoxy resin. It can be cured, and in some cases, can be cured in the presence of a curing catalyst for silicone such as an organotin compound, thereby giving a low-stress and tough cured product. When used in combination with a curable epoxy resin, a cured product having excellent crack resistance and a glass transition point improved by about 10 ° C. is provided. Therefore, the silicone-modified aralkyl resin of the present invention is suitably used as a component of an epoxy resin composition for encapsulating a semiconductor device.
【0028】なお、本発明のシリコーン変性アラルキル
樹脂を半導体装置封止用に用いる場合、その他の成分は
従来のエポキシ樹脂組成物と同様であり、例えばこのシ
リコーン変性アラルキル樹脂(フェノール型)を硬化剤
として使用し、単独で又はこれと通常の硬化剤を併用し
て用い、硬化性エポキシ樹脂、硬化促進剤、充填剤等を
配合するか、あるいはシリコーン変性アラルキル樹脂
(エポキシ化物)を樹脂成分として使用し、単独で又は
これと通常の硬化性エポキシ樹脂とを併用して用い、こ
れに硬化剤、硬化促進剤、充填剤等を配合して半導体装
置封止用エポキシ樹脂組成物を製造することができる。When the silicone-modified aralkyl resin of the present invention is used for encapsulating a semiconductor device, other components are the same as those of the conventional epoxy resin composition. For example, this silicone-modified aralkyl resin (phenol type) is used as a curing agent. Used alone or in combination with a usual curing agent, blended with a curable epoxy resin, curing accelerator, filler, etc., or used a silicone-modified aralkyl resin (epoxidized product) as a resin component It is possible to produce an epoxy resin composition for semiconductor device encapsulation by using it alone or in combination with a usual curable epoxy resin, and adding a curing agent, a curing accelerator, a filler, and the like thereto. it can.
【0029】[0029]
【発明の効果】本発明のシリコーン変性アラルキル樹脂
は、半導体装置封止用樹脂成分として使用すると、非常
に低吸湿性かつ低弾性で各種特性に優れた硬化物を与え
るもので、半導体装置封止用樹脂成分として有用であ
る。The silicone-modified aralkyl resin of the present invention, when used as a resin component for encapsulating a semiconductor device, gives a cured product having very low hygroscopicity and low elasticity and excellent in various properties. It is useful as a resin component.
【0030】[0030]
【実施例】以下、実施例及び配合例を示して本発明を具
体的に説明するが、本発明は下記実施例に制限されるも
のではない。EXAMPLES The present invention will be specifically described below with reference to Examples and Formulation Examples, but the present invention is not limited to the following Examples.
【0031】〔実施例1〕リフラックスコンデンサー、
温度計、撹拌機及び滴下ロートを具備した3リットルの
四つ口フラスコ内にトルエン600g、メチルイソブチ
ルケトン(MIBK)600g、下記式(8)で示され
るフェノールアラルキル樹脂(フェノール当量170)
340gを入れ、撹拌しながら加熱溶解し、50%KO
H水溶液2.25gを加えて還流下で脱水した。[Example 1] A reflux condenser,
In a 3 liter four-necked flask equipped with a thermometer, a stirrer, and a dropping funnel, 600 g of toluene, 600 g of methyl isobutyl ketone (MIBK), and a phenol aralkyl resin represented by the following formula (8) (phenol equivalent: 170)
Add 340 g, heat and dissolve while stirring, and add 50% KO
2.25 g of an H aqueous solution was added, and the mixture was dehydrated under reflux.
【0032】[0032]
【化7】 Embedded image
【0033】アリルグリシジルエーテル(AGE)1
1.4gをこの中に滴下した後、8時間還流下で反応さ
せた。濃塩酸で中和後、水洗し、溶媒を減圧下で溜去し
たところ、AGE化フェノールアラルキル樹脂と式
(8)の原料との混合物(化合物A)335g(収率9
5.3%、フェノール当量185.3、アリル当量35
13.1)が得られた。Allyl glycidyl ether (AGE) 1
After 1.4 g of the solution was added dropwise thereto, the mixture was reacted under reflux for 8 hours. After neutralizing with concentrated hydrochloric acid, washing with water and distilling off the solvent under reduced pressure, 335 g of a mixture (compound A) of the AGE phenol aralkyl resin and the raw material of the formula (8) (yield 9)
5.3%, phenol equivalent 185.3, allyl equivalent 35
13.1) was obtained.
【0034】[0034]
【化8】 Embedded image
【0035】次いで、前記と同様の反応装置の四つ口フ
ラスコ内に、上で得られた化合物A(アリル基含有フェ
ノールアラルキル樹脂)100g、MIBK370g、
白金濃度0.5%の2−エチルヘキサノール変性塩化白
金酸溶液0.39gを入れ、加熱撹拌下で化合物Aを溶
解させ、1時間共沸脱水し、更に還流下において下記式
(9)で示される有機珪素化合物45.77gを滴下ロ
ートにて滴下した。滴下後、更に還流させながら6時間
反応させた。その後、水洗し、溶媒を留去したところ、
粗反応生成物が得られた。Next, 100 g of the compound A (allyl group-containing phenol aralkyl resin) obtained above and 370 g of MIBK were placed in a four-necked flask of the same reactor as above.
0.39 g of a 2-ethylhexanol-modified chloroplatinic acid solution having a platinum concentration of 0.5% was added thereto, Compound A was dissolved under heating and stirring, azeotropically dehydrated for 1 hour, and further represented by the following formula (9) under reflux. 45.77 g of the resulting organosilicon compound was added dropwise using a dropping funnel. After the dropwise addition, the mixture was reacted for 6 hours while further refluxing. After washing with water and distilling off the solvent,
A crude reaction product was obtained.
【0036】[0036]
【化9】 Embedded image
【0037】この粗反応生成物143gをアセトン40
0gに溶解し、これに水150gを加えて放置すること
により、二層分離した溶液を得、この溶液の上層を破棄
した後、再びアセトン200gを加えて混合し、これに
水50gを加えて放置した。得られた二層分離の溶液よ
りその下層を採取し、アセトン及び水を減圧溜去したと
ころ、目的とするシリコーン変性アラルキル樹脂(下記
化合物B)43gが得られた。143 g of the crude reaction product was added to acetone 40
0 g, dissolved in 150 g of water and left to stand, to obtain a solution in which two layers were separated. After discarding the upper layer of this solution, 200 g of acetone was again added and mixed, and 50 g of water was added thereto. I left it. The lower layer was collected from the resulting two-layer separation solution, and acetone and water were distilled off under reduced pressure to obtain 43 g of the desired silicone-modified aralkyl resin (compound B below).
【0038】[0038]
【化10】 Embedded image
【0039】〔実施例2〕前記と同様の反応装置の四つ
口フラスコに化合物A140.56gとエピクロルヒド
リン417.4g、セチルトリメチルアンモニウム0.
4gを入れ、還流下で3時間撹拌した。その後NaOH
(50%水溶液)67gを減圧下(80〜90℃/10
0〜130mmHg)で滴下した。滴下終了後、3時間
熟成し、その後濾過、溶媒除去し、更にNaOH(10
%水溶液)で加水分解性塩素を除き、水洗したところ、
AGE化フェノールアラルキル樹脂のエポキシ化物と式
(8)の原料のエポキシ化物との混合物(下記化合物
C)170.5g(収率92%、エポキシ当量245.
3、アリル当量4660.7)が得られた。Example 2 140.56 g of compound A, 417.4 g of epichlorohydrin and 0.1 ml of cetyltrimethylammonium were placed in a four-necked flask having the same reaction apparatus as described above.
4 g was added and the mixture was stirred under reflux for 3 hours. Then NaOH
(50% aqueous solution) 67 g under reduced pressure (80-90 ° C / 10
(0 to 130 mmHg). After completion of the dropwise addition, the mixture was aged for 3 hours, then filtered and the solvent was removed.
% Aqueous solution) to remove hydrolyzable chlorine and wash with water.
170.5 g of a mixture of the epoxidized AGE phenol aralkyl resin and the epoxidized material of the formula (8) (compound C below) (yield 92%, epoxy equivalent 245.
3, allyl equivalent 4660.7).
【0040】[0040]
【化11】 Embedded image
【0041】次いで、実施例1と同様に化合物C100
g、トルエン370g、白金触媒0.39gを加熱撹拌
溶解し、前記と同様に式(9)の有機珪素化合物19.
8gを滴下し、後処理、精製したところ、下記化合物D
19.6gが得られた。Next, the compound C100 was prepared in the same manner as in Example 1.
g, 370 g of toluene and 0.39 g of a platinum catalyst were dissolved by heating with stirring, and the organosilicon compound of the formula (9) was dissolved in the same manner as described above.
8 g was added dropwise, and after-treatment and purification, the following compound D
19.6 g were obtained.
【0042】[0042]
【化12】 Embedded image
【0043】〔実施例3〕下記式(10)のフェノール
アラルキル樹脂(フェノール当量218)327g、A
GE8.56gを用いて、実施例1と同様に反応させた
ところ、下記構造のAGE化フェノールアラルキル樹脂
と式(10)の原料との混合物(E)が322g(収率
96%、フェノール当量235.5、アリル当量447
4.5)が得られた。Example 3 327 g of a phenol aralkyl resin of the following formula (10) (phenol equivalent 218),
The reaction was carried out in the same manner as in Example 1 using 8.56 g of GE. As a result, 322 g of a mixture (E) of the AGE phenol aralkyl resin having the following structure and the raw material of the formula (10) was obtained (96% yield, 235 phenol equivalent). .5, allyl equivalent 447
4.5) was obtained.
【0044】[0044]
【化13】 Embedded image
【0045】次いで、実施例1と同様に化合物E100
g、MIBK370g、白金触媒0.39gを加熱撹拌
溶解し、式(9)の有機珪素化合物35.1gを滴下
し、後処理、精製をしたところ、下記式化合物F34.
5gが得られた。Then, Compound E100 was prepared in the same manner as in Example 1.
g, 370 g of MIBK and 0.39 g of a platinum catalyst were dissolved under heating with stirring, and 35.1 g of the organosilicon compound of the formula (9) was added dropwise. After post-treatment and purification, the compound of the following formula F34.
5 g were obtained.
【0046】[0046]
【化14】 Embedded image
【0047】〔実施例4〕化合物E161.6gとエピ
クロルヒドリン365.2g、セチルトリメチルアンモ
ニウム0.35gを用い、実施例2と同様にしてエポキ
シ化したところ、化合物Eと式(10)の原料のエポキ
シ化物との混合物(G)が182g(収率91%、エポ
キシ当量293.5、アリル当量5576.5)が得ら
れた。Example 4 Epoxidation was carried out in the same manner as in Example 2 using 161.6 g of compound E, 365.2 g of epichlorohydrin, and 0.35 g of cetyltrimethylammonium. 182 g (yield 91%, epoxy equivalent 293.5, allyl equivalent 5576.5) of a mixture (G) with a compound was obtained.
【0048】[0048]
【化15】 Embedded image
【0049】次いで、同様に化合物G100g、トルエ
ン370g、白金触媒0.39gを加熱撹拌溶解し、式
(9)の有機珪素化合物19.8gを滴下し、後処理、
精製をしたところ、下記化合物H19.9gが得られ
た。Next, similarly, 100 g of the compound G, 370 g of toluene and 0.39 g of a platinum catalyst were dissolved under heating with stirring, and 19.8 g of the organosilicon compound of the formula (9) was added dropwise.
After purification, 19.9 g of the following compound H was obtained.
【0050】[0050]
【化16】 Embedded image
【0051】図1〜4にそれぞれ上記実施例1〜4で得
られたシリコーン変性アラルキル樹脂(化合物(B),
(D),(F),(H))の赤外線吸収スペクトルを示
す。また化合物(B),(D),(F),(H)の核磁
気共鳴スペクトル(NMRピークの帰属)は以下の通り
であった。FIGS. 1 to 4 show the silicone-modified aralkyl resins (compound (B),
(D), (F), (H)) shows the infrared absorption spectrum. The nuclear magnetic resonance spectra (assignment of NMR peaks) of compounds (B), (D), (F) and (H) were as follows.
【0052】[0052]
【化17】 Embedded image
【0053】〔配合例1〜5〕実施例で得られたシリコ
ーン変性アラルキル樹脂と、硬化性エポキシ樹脂、硬化
剤、硬化触媒、石英粉末、難燃剤等を表1に示す配合量
で使用し、得られた配合物を熱2本ロールで均一に溶融
混合し、5種類の熱硬化性樹脂組成物を製造した(但
し、シリコーン変性アラルキル樹脂は混練り性を良くす
るため、精製前の粗反応生成物を用いた)。[Formulation Examples 1 to 5] The silicone-modified aralkyl resin obtained in the examples, the curable epoxy resin, the curing agent, the curing catalyst, the quartz powder, the flame retardant, etc. were used in the amounts shown in Table 1, The resulting blend was uniformly melted and mixed with two hot rolls to produce five types of thermosetting resin compositions (however, the silicone-modified aralkyl resin has a crude reaction before purification in order to improve kneading properties). The product was used).
【0054】ここで、硬化性エポキシ樹脂及び硬化剤に
はオルトクレゾールノボラック樹脂のエポキシ化物(化
合物J)、下記に示すフェノールノボラック樹脂(化合
物K)をそれぞれ使用した。Here, epoxidized orthocresol novolak resin (compound J) and phenol novolak resin (compound K) shown below were used as the curable epoxy resin and the curing agent, respectively.
【0055】[0055]
【化18】 Embedded image
【0056】これらの熱硬化性樹脂組成物につき下記の
(イ)〜(ニ)の諸試験を行った。 (イ)スパイラルフロー値 EMMI規格に準じた金型を使用して、175℃、70
kg/cm2の条件で測定した。 (ロ)機械的強度(曲げ強度及び曲げ弾性率) JISK−6911に準じて180℃、70kg/cm
2、成形時間2分の条件で10×4×100mmの抗折
棒を成形し、180℃、4時間ポストキュアーしたもの
について室温で測定した。 (ハ)膨張係数、ガラス転移温度 180℃、70kg/cm2、成形時間2分の条件で5
×5×15mmの試験片を成形し、180℃、4時間ポ
ストキュアーしたものを用いてディラトメーターにより
毎分5℃で昇温した時の値を測定した。 (ニ)吸水率 180℃、70kg/cm2、成形時間2分の条件で5
0φ×3mmの円盤を成形し、180℃、4時間ポスト
キュアーしたものを121℃/100%RH雰囲気中に
24時間放置し、吸水率を測定した。以上の結果を表1
に併記する。The following various tests (a) to (d) were conducted on these thermosetting resin compositions. (A) Spiral flow value Using a mold conforming to the EMMI standard, 175 ° C, 70
It was measured under the condition of kg / cm 2 . (B) Mechanical strength (flexural strength and flexural modulus) 180 ° C, 70 kg / cm according to JIS K-6911
2. A bending rod of 10 × 4 × 100 mm was molded under the conditions of a molding time of 2 minutes, and post-cured at 180 ° C. for 4 hours. (C) Expansion coefficient, glass transition temperature 180 ° C., 70 kg / cm 2 , molding time 2 minutes 5
A test piece of × 5 × 15 mm was molded and post-cured at 180 ° C. for 4 hours, and the value when the temperature was raised at 5 ° C./min by a dilatometer was measured. (D) Water absorption rate: 180 ° C., 70 kg / cm 2 , molding time 2 min.
A disk of 0φ × 3 mm was formed, post-cured at 180 ° C. for 4 hours, and left in an atmosphere of 121 ° C./100% RH for 24 hours to measure the water absorption. Table 1 shows the above results.
It is described together.
【0057】[0057]
【表1】 [Table 1]
【0058】表1の結果より、本発明のシリコーン変性
アラルキル樹脂を配合した熱硬化性樹脂組成物は、非常
に低吸水率でかつ低弾性率の硬化物を与えることがわか
った。From the results shown in Table 1, it was found that the thermosetting resin composition containing the silicone-modified aralkyl resin of the present invention gave a cured product having a very low water absorption and a low elastic modulus.
【図1】化合物(B)のIRスペクトルを示すグラフで
ある。FIG. 1 is a graph showing an IR spectrum of compound (B).
【図2】化合物(D)のIRスペクトルを示すグラフで
ある。FIG. 2 is a graph showing an IR spectrum of compound (D).
【図3】化合物(F)のIRスペクトルを示すグラフで
ある。FIG. 3 is a graph showing an IR spectrum of compound (F).
【図4】化合物(H)のIRスペクトルを示すグラフで
ある。FIG. 4 is a graph showing an IR spectrum of compound (H).
───────────────────────────────────────────────────── フロントページの続き (72)発明者 清水 久司 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社 シリコーン電 子材料技術研究所内 (56)参考文献 特開 平5−97949(JP,A) 特開 平5−59175(JP,A) 特開 平4−73795(JP,A) 特開 昭62−212417(JP,A) 特開 平2−180952(JP,A) 特開 昭63−56515(JP,A) ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Hisashi Shimizu 1-10 Hitomi, Matsuida-cho, Usui-gun, Gunma Prefecture Inside the Silicone Electronic Materials Research Laboratory, Shin-Etsu Chemical Co., Ltd. (56) References JP-A-5-97949 ( JP, A) JP-A-5-59175 (JP, A) JP-A-4-73795 (JP, A) JP-A-62-212417 (JP, A) JP-A-2-180952 (JP, A) JP 63-56515 (JP, A)
Claims (1)
ら選ばれるアルケニル基含有アラルキル樹脂のアルケニ
ル基に下記組成式(1)で示される1分子中の珪素原子
の数が1〜400である有機珪素化合物の≡SiH基を
付加してなるシリコーン変性アラルキル樹脂。 【化19】 【化20】(但し、式中Rは水素原子、ハロゲン原子、
メチル基,エチル基,ブチル基又は アクリルオキシ基から選ばれるアルケニル基を示し、か
つ分子中のGの少なくと るグリシジルエーテル基である。また、n,p,qはそ
れぞれ0〜20の整数である。) 【化21】 (但し、式中R1はメチル基、エチル基、フェニル基、
ベンジル基、クロロメチル基、クロロプロピル基、炭素
数1〜5のアルコキシ基から選ばれる1価の基を示し、
a,bは0.01≦a≦1、1≦b≦3、1≦a+b≦
4を満足する正数である。)1. An alkenyl group of an alkenyl group-containing aralkyl resin selected from the group consisting of the following structural formulas (2) to (7), wherein the number of silicon atoms in one molecule represented by the following composition formula (1) is 1 to A silicone-modified aralkyl resin obtained by adding a ≡SiH group of an organosilicon compound having a molecular weight of 400. Embedded image Wherein R is a hydrogen atom, a halogen atom,
Methyl, ethyl, butyl or An alkenyl group selected from an acryloxy group, and at least G in the molecule Glycidyl ether group. Further, n, p, and q are integers of 0 to 20, respectively. ) (Where R 1 is a methyl group, an ethyl group, a phenyl group,
A benzyl group, a chloromethyl group, a chloropropyl group, a monovalent group selected from alkoxy groups having 1 to 5 carbon atoms,
a and b are 0.01 ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦
It is a positive number that satisfies 4. )
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4242594A JP2727888B2 (en) | 1992-05-14 | 1992-08-20 | Silicone-modified aralkyl resin |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14826992 | 1992-05-14 | ||
JP4-148269 | 1992-05-14 | ||
JP4242594A JP2727888B2 (en) | 1992-05-14 | 1992-08-20 | Silicone-modified aralkyl resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0625370A JPH0625370A (en) | 1994-02-01 |
JP2727888B2 true JP2727888B2 (en) | 1998-03-18 |
Family
ID=26478528
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4242594A Expired - Fee Related JP2727888B2 (en) | 1992-05-14 | 1992-08-20 | Silicone-modified aralkyl resin |
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JP (1) | JP2727888B2 (en) |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6221417A (en) * | 1985-07-17 | 1987-01-29 | Sumitomo Electric Ind Ltd | Double deck type coiler |
JPS62212417A (en) * | 1986-03-13 | 1987-09-18 | Shin Etsu Chem Co Ltd | Epoxy resin composition |
JPH0651785B2 (en) * | 1986-08-28 | 1994-07-06 | 住友ベ−クライト株式会社 | Epoxy resin composition for semiconductor encapsulation |
JPH02180952A (en) * | 1988-05-17 | 1990-07-13 | Sumitomo Chem Co Ltd | Thermosetting resin composition |
JPH0614267B2 (en) * | 1990-07-14 | 1994-02-23 | 耕作 上田 | Rotating plate operation mechanism for advertising devices |
JP3155783B2 (en) * | 1991-09-02 | 2001-04-16 | 日立化成工業株式会社 | Silicone-novolak block copolymer and method for producing the same |
JPH0597949A (en) * | 1991-10-03 | 1993-04-20 | Nippon Kayaku Co Ltd | Silicone-modified phenolic novolak resin, resin c0mp0sition and cured product |
JPH05331354A (en) * | 1992-03-30 | 1993-12-14 | Sumitomo Chem Co Ltd | Thermoplastic resin composition and electronic component sealed therewith |
-
1992
- 1992-08-20 JP JP4242594A patent/JP2727888B2/en not_active Expired - Fee Related
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JPH0625370A (en) | 1994-02-01 |
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