JPH0625370A - Silicone-modified aralkyl resin - Google Patents

Silicone-modified aralkyl resin

Info

Publication number
JPH0625370A
JPH0625370A JP24259492A JP24259492A JPH0625370A JP H0625370 A JPH0625370 A JP H0625370A JP 24259492 A JP24259492 A JP 24259492A JP 24259492 A JP24259492 A JP 24259492A JP H0625370 A JPH0625370 A JP H0625370A
Authority
JP
Japan
Prior art keywords
resin
alkenyl group
aralkyl resin
group
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP24259492A
Other languages
Japanese (ja)
Other versions
JP2727888B2 (en
Inventor
Toshio Shiobara
利夫 塩原
Manabu Narumi
学 鳴海
Hisashi Shimizu
久司 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP4242594A priority Critical patent/JP2727888B2/en
Publication of JPH0625370A publication Critical patent/JPH0625370A/en
Application granted granted Critical
Publication of JP2727888B2 publication Critical patent/JP2727888B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To obtain the subject new resin useful as a resin component for sealing a semiconductor device, providing a cured material having extremely low water absorption and low elasticity by adding a specific organosilicon compound to an alkenyl group of an aralkyl resin containing an alkenyl group. CONSTITUTION:Three Si groups of an organosilicon compound of formula I (R<1> is monofunctional hydrocarbon, OH, etc.; (a) and (b) are integers satisfying 0.01<=a<=1, 1<=b<=3, 1<=a+b<=4) are added to an alkenyl group of an aralkyl resin containing an alkenyl group to give the objective resin. The resin is preferably obtained by adding the compound of formula I to the aralkyl resin containing an alkenyl group in the presence of a platinum catalyst such as chloroplatinic acid in an inert organic solvent such as benzene at 60-120 deg.C for 30 minutes to 10 hours. A resin of formula II (R is H, Cl, etc.; G is OH, glycidyl ether, etc.; (n) is 0-20) etc., is preferable as the aralkyl resin containing an alkenyl group.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置封止用エポキ
シ樹脂組成物の成分等として好適に使用し得る新規なシ
リコーン変性アラルキル樹脂に関する。
FIELD OF THE INVENTION The present invention relates to a novel silicone-modified aralkyl resin which can be suitably used as a component of an epoxy resin composition for encapsulating a semiconductor device.

【0002】[0002]

【従来の技術及び発明が解決しようとする課題】従来、
エポキシ樹脂は、これに硬化剤及び無機充填剤等を加え
た組成物として各種成形材料、粉体塗料用材料、電気絶
縁材料等に広く使用され、特に最近においてはダイオー
ド、トランジスタ、IC、LSI、超LSI等の樹脂封
止型の半導体装置封止用材料として多量に使用されてい
る。これは、エポキシ樹脂が一般に他の熱硬化性樹脂に
比べて成形性、接着性、電気特性、機械特性、耐湿性等
に優れているという特性を利用したものである。
2. Description of the Related Art Conventionally, the problems to be solved by the invention
Epoxy resin is widely used as a composition obtained by adding a curing agent and an inorganic filler to various molding materials, powder coating materials, electrical insulating materials, and the like. Recently, in particular, diodes, transistors, ICs, LSIs, It is used in large quantities as a resin-encapsulation type semiconductor device encapsulation material such as VLSI. This utilizes the characteristics that the epoxy resin is generally superior to other thermosetting resins in moldability, adhesiveness, electrical characteristics, mechanical characteristics, moisture resistance and the like.

【0003】これら半導体装置は最近ではその集積度が
益々大きくなり、これに応じてチップ寸法も大きくなり
つつあるが、これに対してパッケージ外形寸法は、電子
機器の小型化、軽量化の要求にともない小型化、薄型化
が進んでいる。更に、半導体部品を回路基板へ取り付け
る方法においても、基板上の部品の高密度化や基板の薄
型化のため、半導体部品の表面実装が行われている。
In recent years, the degree of integration of these semiconductor devices has increased, and the chip size has been correspondingly increased. On the other hand, the package external dimensions are required to reduce the size and weight of electronic equipment. Along with this, miniaturization and thinning are progressing. Further, also in the method of mounting a semiconductor component on a circuit board, surface mounting of the semiconductor component is performed in order to increase the density of components on the substrate and to reduce the thickness of the substrate.

【0004】しかしながら、半導体装置を回路基板へ表
面実装する場合、半導体装置全体を半田浴に浸漬する
か、または半田が溶融する高温帯を通過させる方法が一
般的であるが、その際の熱衝撃により封止樹脂層にクラ
ックが発生したり、リードフレームやチップと封止樹脂
との界面に剥離が生じたりするという問題があった。こ
のようなクラックや剥離は、表面実装の熱衝撃以前に半
導体装置の封止樹脂層が吸湿していると更に顕著なもの
となるが、実際の作業工程においては、封止樹脂層の吸
湿は避けられず、このため実装後のエポキシ樹脂組成物
で封止した半導体装置の信頼性が大きく損なわれる場合
があった。
However, when the semiconductor device is surface-mounted on a circuit board, a method of immersing the entire semiconductor device in a solder bath or passing through a high temperature zone where the solder melts is generally used, but thermal shock at that time is used. As a result, there is a problem in that a crack is generated in the sealing resin layer or peeling occurs at the interface between the lead frame or the chip and the sealing resin. Such cracks and peeling become more noticeable when the sealing resin layer of the semiconductor device absorbs moisture before the thermal shock of surface mounting, but in the actual working process, the moisture absorption of the sealing resin layer does not occur. This is unavoidable, and thus the reliability of the semiconductor device encapsulated with the epoxy resin composition after mounting may be greatly impaired.

【0005】従って、回路基板への表面実装後に高い信
頼性の半導体装置を与え得る高品質の半導体装置用エポ
キシ樹脂組成物の開発が望まれていた。
Therefore, it has been desired to develop a high quality epoxy resin composition for a semiconductor device which can provide a highly reliable semiconductor device after surface mounting on a circuit board.

【0006】本発明は上記事情に鑑みなされたもので、
表面実装半導体装置用エポキシ樹脂組成物の成分等とし
て好適に使用し得る新規なシリコーン変性アラルキル樹
脂を提供することを目的とする。
The present invention has been made in view of the above circumstances.
An object of the present invention is to provide a novel silicone-modified aralkyl resin that can be suitably used as a component of an epoxy resin composition for surface-mount semiconductor devices.

【0007】[0007]

【課題を解決するための手段及び作用】本発明者は上記
目的を達成するため鋭意検討を重ねた結果、アルケニル
基を含有するアラルキル樹脂に対し、≡SiH基を有す
る下記組成式(1)で示される有機珪素化合物を付加さ
せることにより、アルケニル基含有アラルキル樹脂中の
アルケニル基と結合していない遊離の有機珪素化合物を
殆んど含まないシリコーン変性アラルキル樹脂を工業的
に有利に得ることができること、このシリコーン変性ア
ラルキル樹脂は、それがフェノール樹脂かエポキシ樹脂
かに応じ、従来公知のフェノール樹脂、エポキシ樹脂と
同様にエポキシ樹脂の硬化剤として使用したり、エポキ
シ硬化剤、触媒と共に硬化させることができ、また場合
により有機錫化合物等のシリコーン用硬化触媒の存在下
に硬化させることもでき、これにより低応力で強靭な硬
化物を与え、更に樹脂成分として硬化性エポキシ樹脂と
併用した場合には、優れた耐クラック性を有し、かつガ
ラス転移点も10℃程度向上したエポキシ樹脂組成物の
成形物を与えること、それ故、本発明で得られたシリコ
ーン変性アラルキル樹脂が半導体封止用エポキシ樹脂組
成物の成分として非常に有用であることを知見し、本発
明をなすに至ったものである。
Means for Solving the Problems The present inventors have conducted extensive studies to achieve the above-mentioned object, and as a result, for the aralkyl resin containing an alkenyl group, the following composition formula (1) having an ≡SiH group was used. It is possible to industrially advantageously obtain a silicone-modified aralkyl resin containing almost no free organosilicon compound that is not bonded to an alkenyl group in an alkenyl group-containing aralkyl resin by adding the organosilicon compound shown. The silicone-modified aralkyl resin can be used as a curing agent for an epoxy resin like a conventionally known phenol resin or epoxy resin, or can be cured together with an epoxy curing agent or a catalyst, depending on whether it is a phenol resin or an epoxy resin. Can be cured in the presence of a curing catalyst for silicone such as organotin compounds, if necessary This gives an epoxy resin having a low stress and toughness, and when used in combination with a curable epoxy resin as a resin component, it has excellent crack resistance and has an improved glass transition point of about 10 ° C. It was found that a silicone-modified aralkyl resin obtained by the present invention is very useful as a component of an epoxy resin composition for semiconductor encapsulation, and thus the present invention is completed. It is a thing.

【0008】[0008]

【化2】 (但し、式中R1は置換もしくは非置換の1価炭化水素
基、水酸基又はアルコキシ基を示し、a,bは0.01
≦a≦1、1≦b≦3、1≦a+b≦4を満足する正数
である。)
[Chemical 2] (In the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, a hydroxyl group or an alkoxy group, and a and b are 0.01
It is a positive number that satisfies ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦ 4. )

【0009】従って、本発明は、アルケニル基含有アラ
ルキル樹脂のアルケニル基に上記組成式(1)で示され
る有機珪素化合物の≡SiH基が付加されてなるシリコ
ーン変性アラルキル樹脂を提供する。
Accordingly, the present invention provides a silicone-modified aralkyl resin obtained by adding the ≡SiH group of the organosilicon compound represented by the above composition formula (1) to the alkenyl group of the alkenyl group-containing aralkyl resin.

【0010】以下、本発明につき更に詳述すると、本発
明のシリコーン変性アラルキル樹脂は、アルケニル基含
有アラルキル樹脂のアルケニル基に下記組成式(1)で
示される有機珪素化合物の≡SiH基が付加されてなる
重合体である。
The present invention will be described in more detail below. In the silicone-modified aralkyl resin of the present invention, the ≡SiH group of the organosilicon compound represented by the following composition formula (1) is added to the alkenyl group of the alkenyl group-containing aralkyl resin. It is a polymer composed of

【0011】[0011]

【化3】 (但し、式中R1は置換もしくは非置換の1価炭化水素
基、水酸基又はアルコキシ基を示し、a,bは0.01
≦a≦1、1≦b≦3、1≦a+b≦4を満足する正数
である。)
[Chemical 3] (In the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, a hydroxyl group or an alkoxy group, and a and b are 0.01
It is a positive number that satisfies ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦ 4. )

【0012】ここで、本発明に用いられるアルケニル基
含有アラルキル樹脂成分としては、フェノールアラルキ
ル樹脂にアリルグリシジルエーテル等を付加させたもの
や、ハロゲン化アリルを反応させてアリルエーテル化し
たフェノールアラルキル樹脂、またはこの種のアルケニ
ル基含有フェノールアラルキル樹脂をエピクロルヒドリ
ンによりエポキシ化したり、エポキシ化したフェノール
アラルキル樹脂に2−アリルフェノールなどを部分的に
反応させたりして得られるものなどが使用できる。
Here, as the alkenyl group-containing aralkyl resin component used in the present invention, phenol aralkyl resin to which allyl glycidyl ether or the like is added, or phenol aralkyl resin allyl etherified by reacting allyl halide, Alternatively, those obtained by epoxidizing this type of alkenyl group-containing phenol aralkyl resin with epichlorohydrin or partially reacting the epoxidized phenol aralkyl resin with 2-allylphenol or the like can be used.

【0013】このようなアルケニル基含有アラルキル樹
脂として具体的には、下記構造式(2)〜(7)で示さ
れるものが例示されるが、特に式(2),(3)のもの
が好適に用いられる。
Specific examples of such an alkenyl group-containing aralkyl resin include those represented by the following structural formulas (2) to (7), and those of the formulas (2) and (3) are particularly preferable. Used for.

【0014】[0014]

【化4】 [Chemical 4]

【0015】[0015]

【化5】 [Chemical 5]

【0016】なお、上記アルケニル基含有アラルキル樹
脂中のアルケニル基の含有割合は、1分子中に1個以上
有すればよいが、全水酸基又は全グリシジルエーテル基
に対して0.01〜0.3個であることが好ましく、更
に好ましくは0.03〜0.4個である。
The content ratio of the alkenyl group in the alkenyl group-containing aralkyl resin may be one or more in one molecule, but is 0.01 to 0.3 with respect to all hydroxyl groups or all glycidyl ether groups. The number is preferably 0.03 to 0.4, more preferably 0.03 to 0.4.

【0017】次に、上記のアルケニル基含有アラルキル
樹脂に付加される有機珪素化合物は、1分子中に少なく
とも1個の≡SiH基を有するもので、上述したように
下記組成式(1)で示されるものである。
Next, the organosilicon compound added to the alkenyl group-containing aralkyl resin has at least one ≡SiH group in one molecule, and is represented by the following composition formula (1) as described above. It is what is done.

【0018】[0018]

【化6】 (但し、式中R1は置換もしくは非置換の1価炭化水素
基、水酸基又はアルコキシ基を示し、a,bは0.01
≦a≦1、1≦b≦3、1≦a+b≦4を満足する正数
である。)
[Chemical 6] (In the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, a hydroxyl group or an alkoxy group, and a and b are 0.01
It is a positive number that satisfies ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦ 4. )

【0019】上記式(1)において、R1は置換もしく
は非置換の1価炭化水素基、水酸基又はアルコキシ基で
あるが、非置換の1価炭化水素基としては炭素数1〜2
0、特に1〜10のもの、例えばメチル基、エチル基、
フェニル基、ベンジル基、ビニル基、アリル基、アクリ
ルオキシ基、イソプロペニルオキシ基、イソブテニルオ
キシ基などが挙げられ、置換1価炭化水素基としてはク
ロロプロピル基、クロロメチル基、グリシジルプロピル
基などが挙げられ、アルコキシ基としては炭素数1〜1
0、特に1〜5のもの、例えばメトキシ基、エトキシ基
などが挙げられる。
In the above formula (1), R 1 is a substituted or unsubstituted monovalent hydrocarbon group, a hydroxyl group or an alkoxy group, and the unsubstituted monovalent hydrocarbon group has 1 to 2 carbon atoms.
0, especially 1 to 10, such as methyl group, ethyl group,
Examples thereof include a phenyl group, a benzyl group, a vinyl group, an allyl group, an acryloxy group, an isopropenyloxy group and an isobutenyloxy group. Examples of the substituted monovalent hydrocarbon group include a chloropropyl group, a chloromethyl group and a glycidylpropyl group. And the like, and the alkoxy group has 1 to 1 carbon atoms.
Examples thereof include 0, particularly 1 to 5, such as methoxy group and ethoxy group.

【0020】なお、上記式(1)の有機珪素化合物は、
1分子中の珪素原子の数が1〜400、好ましくは20
〜200の整数であり、かつ1分子中の珪素原子に直結
した水素原子の数が1以上、好ましくは1〜10の整数
である。
The organosilicon compound of the above formula (1) is
The number of silicon atoms in one molecule is 1 to 400, preferably 20.
The number of hydrogen atoms directly bonded to a silicon atom in one molecule is 1 or more, preferably 1 to 10.

【0021】本発明のシリコーン変性アラルキル樹脂
は、上述したアルケニル基含有アラルキル樹脂と上記式
(1)の有機珪素化合物とを付加反応させることにより
得ることができる。
The silicone-modified aralkyl resin of the present invention can be obtained by addition-reacting the above-mentioned alkenyl group-containing aralkyl resin with the organosilicon compound of the above formula (1).

【0022】この場合、アルケニル基含有アラルキル樹
脂と上記式(1)の有機珪素化合物はそれぞれ1種のみ
を使用してもよく、2種以上を使用してもよいが、アル
ケニル基含有アラルキル樹脂中のアルケニル基の当量を
A、有機珪素化合物中の≡SiH基の当量をBとした場
合、0.1≦B/A≦2、特に0.2≦B/A≦1とな
るような割合で反応させることが好ましい。B/Aが
0.1より小さくなると目的化合物の収率が小さくなっ
て工業的に不利になる場合があり、B/Aが2より大き
くなるとゲル化する可能性がある。
In this case, the alkenyl group-containing aralkyl resin and the organosilicon compound of the above formula (1) may be used alone or in combination of two or more kinds. Where A is the equivalent of the alkenyl group and B is the equivalent of the ≡SiH group in the organosilicon compound, the ratio is 0.1 ≦ B / A ≦ 2, particularly 0.2 ≦ B / A ≦ 1. It is preferable to react. If B / A is smaller than 0.1, the yield of the target compound may be small, which may be industrially disadvantageous, and if B / A is larger than 2, gelation may occur.

【0023】更に付加反応に際しては、従来公知の付加
触媒、例えば塩化白金酸のような白金触媒を使用するこ
とが好ましい。なお、付加触媒の添加量は通常量とする
ことができる。
Further, in the addition reaction, it is preferable to use a conventionally known addition catalyst, for example, a platinum catalyst such as chloroplatinic acid. The addition amount of the addition catalyst can be a normal amount.

【0024】また、上記付加反応は有機溶媒中で行うこ
とが望ましく、有機溶媒としては、ベンゼン、トルエ
ン、メチルイソブチルケトン等の不活性溶媒を用いるこ
とが好ましい。
The above addition reaction is preferably carried out in an organic solvent, and as the organic solvent, it is preferable to use an inert solvent such as benzene, toluene or methyl isobutyl ketone.

【0025】付加反応条件は特に制限されないが、通常
60〜120℃で30分〜10時間反応させることが好
ましい。
The addition reaction conditions are not particularly limited, but it is usually preferable to carry out the reaction at 60 to 120 ° C. for 30 minutes to 10 hours.

【0026】反応終了後は、通常の方法で後処理、精製
することにより、目的とするシリコーン変性アラルキル
樹脂を得ることができる。
After completion of the reaction, the desired silicone-modified aralkyl resin can be obtained by post-treatment and purification by a conventional method.

【0027】本発明のシリコーン変性アラルキル樹脂
は、それがフェノール樹脂かエポキシ樹脂かに応じ、従
来公知のフェノール樹脂、エポキシ樹脂と同様にエポキ
シ樹脂の硬化剤として使用したり、エポキシ硬化剤、触
媒と共に硬化させることができ、また場合により有機錫
化合物等のシリコーン用硬化触媒の存在下に硬化させる
こともでき、これにより低応力で強靭な硬化物を与え
る。また、硬化性エポキシ樹脂と併用した場合、耐クラ
ック性に優れ、ガラス転移点も10℃程度向上した硬化
物を与える。従って、本発明のシリコーン変性アラルキ
ル樹脂は、半導体装置封止用エポキシ樹脂組成物の成分
として好適に使用される。
The silicone-modified aralkyl resin of the present invention can be used as a curing agent for an epoxy resin in the same manner as a conventionally known phenol resin or epoxy resin depending on whether it is a phenol resin or an epoxy resin, or together with an epoxy curing agent and a catalyst. It can be cured and, optionally, in the presence of a curing catalyst for silicone such as an organotin compound, which gives a cured product with low stress and toughness. When used in combination with a curable epoxy resin, it gives a cured product having excellent crack resistance and a glass transition point improved by about 10 ° C. Therefore, the silicone-modified aralkyl resin of the present invention is suitably used as a component of an epoxy resin composition for semiconductor device encapsulation.

【0028】なお、本発明のシリコーン変性アラルキル
樹脂を半導体装置封止用に用いる場合、その他の成分は
従来のエポキシ樹脂組成物と同様であり、例えばこのシ
リコーン変性アラルキル樹脂(フェノール型)を硬化剤
として使用し、単独で又はこれと通常の硬化剤を併用し
て用い、硬化性エポキシ樹脂、硬化促進剤、充填剤等を
配合するか、あるいはシリコーン変性アラルキル樹脂
(エポキシ化物)を樹脂成分として使用し、単独で又は
これと通常の硬化性エポキシ樹脂とを併用して用い、こ
れに硬化剤、硬化促進剤、充填剤等を配合して半導体装
置封止用エポキシ樹脂組成物を製造することができる。
When the silicone-modified aralkyl resin of the present invention is used for encapsulating a semiconductor device, the other components are the same as in the conventional epoxy resin composition. For example, this silicone-modified aralkyl resin (phenol type) is used as a curing agent. As a resin component, a curable epoxy resin, a curing accelerator, a filler or the like is blended, or a silicone-modified aralkyl resin (epoxidized product) is used as a resin component. It is possible to produce an epoxy resin composition for semiconductor device encapsulation by using it alone or in combination with a usual curable epoxy resin, and adding a curing agent, a curing accelerator, a filler and the like to it. it can.

【0029】[0029]

【発明の効果】本発明のシリコーン変性アラルキル樹脂
は、半導体装置封止用樹脂成分として使用すると、非常
に低吸湿性かつ低弾性で各種特性に優れた硬化物を与え
るもので、半導体装置封止用樹脂成分として有用であ
る。
The silicone-modified aralkyl resin of the present invention, when used as a resin component for semiconductor device encapsulation, gives a cured product having extremely low hygroscopicity and low elasticity and excellent in various characteristics. It is useful as a resin component for automobiles.

【0030】[0030]

【実施例】以下、実施例及び配合例を示して本発明を具
体的に説明するが、本発明は下記実施例に制限されるも
のではない。
EXAMPLES The present invention will be specifically described below with reference to examples and formulation examples, but the present invention is not limited to the following examples.

【0031】〔実施例1〕リフラックスコンデンサー、
温度計、撹拌機及び滴下ロートを具備した3リットルの
四つ口フラスコ内にトルエン600g、メチルイソブチ
ルケトン(MIBK)600g、下記式(8)で示され
るフェノールアラルキル樹脂(フェノール当量170)
340gを入れ、撹拌しながら加熱溶解し、50%KO
H水溶液2.25gを加えて還流下で脱水した。
[Example 1] Reflux condenser,
In a 3 liter four-necked flask equipped with a thermometer, a stirrer and a dropping funnel, 600 g of toluene, 600 g of methyl isobutyl ketone (MIBK), a phenol aralkyl resin represented by the following formula (8) (phenol equivalent 170)
Add 340g, dissolve with heating with stirring, 50% KO
2.25 g of H aqueous solution was added and dehydrated under reflux.

【0032】[0032]

【化7】 [Chemical 7]

【0033】アリルグリシジルエーテル(AGE)1
1.4gをこの中に滴下した後、8時間還流下で反応さ
せた。濃塩酸で中和後、水洗し、溶媒を減圧下で溜去し
たところ、AGE化フェノールアラルキル樹脂と式
(8)の原料との混合物(化合物A)335g(収率9
5.3%、フェノール当量185.3、アリル当量35
13.1)が得られた。
Allyl glycidyl ether (AGE) 1
After 1.4 g was added dropwise thereto, the mixture was reacted under reflux for 8 hours. After neutralization with concentrated hydrochloric acid and washing with water, the solvent was distilled off under reduced pressure. As a result, 335 g of a mixture of AGE-phenol phenol aralkyl resin and the raw material of the formula (8) (Compound A) (yield 9
5.3%, phenol equivalent 185.3, allyl equivalent 35
13.1) was obtained.

【0034】[0034]

【化8】 [Chemical 8]

【0035】次いで、前記と同様の反応装置の四つ口フ
ラスコ内に、上で得られた化合物A(アリル基含有フェ
ノールアラルキル樹脂)100g、MIBK370g、
白金濃度0.5%の2−エチルヘキサノール変性塩化白
金酸溶液0.39gを入れ、加熱撹拌下で化合物Aを溶
解させ、1時間共沸脱水し、更に還流下において下記式
(9)で示される有機珪素化合物45.77gを滴下ロ
ートにて滴下した。滴下後、更に還流させながら6時間
反応させた。その後、水洗し、溶媒を留去したところ、
粗反応生成物が得られた。
Then, in a four-necked flask of the same reaction apparatus as described above, 100 g of the above-obtained compound A (allyl group-containing phenol aralkyl resin), 370 g of MIBK,
0.39 g of a 2-ethylhexanol-modified chloroplatinic acid solution having a platinum concentration of 0.5% was added, the compound A was dissolved under heating and stirring, azeotropic dehydration was carried out for 1 hour, and further represented by the following formula (9) under reflux. 45.77 g of the organosilicon compound to be prepared was added dropwise with a dropping funnel. After the dropping, the mixture was reacted for 6 hours while further refluxing. Then, after washing with water and distilling off the solvent,
A crude reaction product was obtained.

【0036】[0036]

【化9】 [Chemical 9]

【0037】この粗反応生成物143gをアセトン40
0gに溶解し、これに水150gを加えて放置すること
により、二層分離した溶液を得、この溶液の上層を破棄
した後、再びアセトン200gを加えて混合し、これに
水50gを加えて放置した。得られた二層分離の溶液よ
りその下層を採取し、アセトン及び水を減圧溜去したと
ころ、目的とするシリコーン変性アラルキル樹脂(下記
化合物B)43gが得られた。
143 g of this crude reaction product was added to 40 parts of acetone.
It was dissolved in 0 g, and 150 g of water was added thereto and left to stand to obtain a solution having two layers separated. After discarding the upper layer of this solution, 200 g of acetone was again added and mixed, and 50 g of water was added thereto. I left it. The lower layer was collected from the obtained solution for two-layer separation, and acetone and water were distilled off under reduced pressure to obtain 43 g of the desired silicone-modified aralkyl resin (Compound B below).

【0038】[0038]

【化10】 [Chemical 10]

【0039】〔実施例2〕前記と同様の反応装置の四つ
口フラスコに化合物A140.56gとエピクロルヒド
リン417.4g、セチルトリメチルアンモニウム0.
4gを入れ、還流下で3時間撹拌した。その後NaOH
(50%水溶液)67gを減圧下(80〜90℃/10
0〜130mmHg)で滴下した。滴下終了後、3時間
熟成し、その後濾過、溶媒除去し、更にNaOH(10
%水溶液)で加水分解性塩素を除き、水洗したところ、
AGE化フェノールアラルキル樹脂のエポキシ化物と式
(8)の原料のエポキシ化物との混合物(下記化合物
C)170.5g(収率92%、エポキシ当量245.
3、アリル当量4660.7)が得られた。
Example 2 In a four-necked flask having the same reaction apparatus as described above, 140.56 g of Compound A, 417.4 g of epichlorohydrin, 0.10 g of cetyltrimethylammonium were added.
4 g was added, and the mixture was stirred under reflux for 3 hours. Then NaOH
67 g (50% aqueous solution) under reduced pressure (80 to 90 ° C./10
It was added dropwise at 0 to 130 mmHg). After completion of the dropping, the mixture was aged for 3 hours, then filtered, the solvent was removed, and further NaOH (10
% Aqueous solution) to remove hydrolyzable chlorine and wash with water,
170.5 g of a mixture of the epoxidized AGE phenol aralkyl resin and the epoxidized raw material of the formula (8) (compound C below) (yield 92%, epoxy equivalent 245.
3, an allyl equivalent of 4660.7) was obtained.

【0040】[0040]

【化11】 [Chemical 11]

【0041】次いで、実施例1と同様に化合物C100
g、トルエン370g、白金触媒0.39gを加熱撹拌
溶解し、前記と同様に式(9)の有機珪素化合物19.
8gを滴下し、後処理、精製したところ、下記化合物D
19.6gが得られた。
Then, the compound C100 was prepared in the same manner as in Example 1.
g, toluene 370 g, and platinum catalyst 0.39 g are heated and dissolved under stirring, and the organosilicon compound of the formula (9) 19.
After 8 g was added dropwise and after-treatment and purification, the following compound D
19.6 g was obtained.

【0042】[0042]

【化12】 [Chemical 12]

【0043】〔実施例3〕下記式(10)のフェノール
アラルキル樹脂(フェノール当量218)327g、A
GE8.56gを用いて、実施例1と同様に反応させた
ところ、下記構造のAGE化フェノールアラルキル樹脂
と式(10)の原料との混合物(E)が322g(収率
96%、フェノール当量235.5、アリル当量447
4.5)が得られた。
Example 3 327 g of phenol aralkyl resin (phenol equivalent 218) of the following formula (10), A
When GE 8.56 g was used and reacted in the same manner as in Example 1, 322 g (yield 96%, phenol equivalent 235) of a mixture (E) of the AGEd phenol aralkyl resin having the following structure and the raw material of the formula (10) was obtained. .5, allyl equivalent 447
4.5) was obtained.

【0044】[0044]

【化13】 [Chemical 13]

【0045】次いで、実施例1と同様に化合物E100
g、MIBK370g、白金触媒0.39gを加熱撹拌
溶解し、式(9)の有機珪素化合物35.1gを滴下
し、後処理、精製をしたところ、下記式化合物F34.
5gが得られた。
Then, the compound E100 was prepared in the same manner as in Example 1.
g, MIBK 370 g, and platinum catalyst 0.39 g were dissolved under heating with stirring, 35.1 g of the organosilicon compound of the formula (9) was added dropwise, and after post-treatment and purification, the following formula compound F34.
5 g was obtained.

【0046】[0046]

【化14】 [Chemical 14]

【0047】〔実施例4〕化合物E161.6gとエピ
クロルヒドリン365.2g、セチルトリメチルアンモ
ニウム0.35gを用い、実施例2と同様にしてエポキ
シ化したところ、化合物Eと式(10)の原料のエポキ
シ化物との混合物(G)が182g(収率91%、エポ
キシ当量293.5、アリル当量5576.5)が得ら
れた。
Example 4 Using 161.6 g of compound E, 365.2 g of epichlorohydrin, and 0.35 g of cetyltrimethylammonium, an epoxidation was carried out in the same manner as in Example 2. As a result, compound E and the epoxy as the raw material of formula (10) were obtained. 182 g (yield 91%, epoxy equivalent 293.5, allyl equivalent 5576.5) of a mixture (G) with a compound was obtained.

【0048】[0048]

【化15】 [Chemical 15]

【0049】次いで、同様に化合物G100g、トルエ
ン370g、白金触媒0.39gを加熱撹拌溶解し、式
(9)の有機珪素化合物19.8gを滴下し、後処理、
精製をしたところ、下記化合物H19.9gが得られ
た。
Then, similarly, 100 g of compound G, 370 g of toluene, and 0.39 g of platinum catalyst were heated and dissolved with stirring, and 19.8 g of the organosilicon compound of formula (9) was added dropwise to the solution, which was post-treated.
Upon purification, 19.9 g of the following compound H was obtained.

【0050】[0050]

【化16】 [Chemical 16]

【0051】図1〜4にそれぞれ上記実施例1〜4で得
られたシリコーン変性アラルキル樹脂(化合物(B),
(D),(F),(H))の赤外線吸収スペクトルを示
す。また化合物(B),(D),(F),(H)の核磁
気共鳴スペクトル(NMRピークの帰属)は以下の通り
であった。
1 to 4 show the silicone-modified aralkyl resins (compound (B), obtained in Examples 1 to 4).
The infrared absorption spectra of (D), (F), and (H) are shown. Further, the nuclear magnetic resonance spectra (attribution of NMR peaks) of the compounds (B), (D), (F) and (H) were as follows.

【0052】[0052]

【化17】 [Chemical 17]

【0053】〔配合例1〜5〕実施例で得られたシリコ
ーン変性アラルキル樹脂と、硬化性エポキシ樹脂、硬化
剤、硬化触媒、石英粉末、難燃剤等を表1に示す配合量
で使用し、得られた配合物を熱2本ロールで均一に溶融
混合し、5種類の熱硬化性樹脂組成物を製造した(但
し、シリコーン変性アラルキル樹脂は混練り性を良くす
るため、精製前の粗反応生成物を用いた)。
[Compounding Examples 1 to 5] The silicone-modified aralkyl resin obtained in the examples, a curable epoxy resin, a curing agent, a curing catalyst, quartz powder, a flame retardant, etc. were used in the compounding amounts shown in Table 1, The resulting blend was uniformly melt-mixed with two heat rolls to produce five types of thermosetting resin compositions (however, since the silicone-modified aralkyl resin improves the kneading property, the crude reaction before purification is performed). The product was used).

【0054】ここで、硬化性エポキシ樹脂及び硬化剤に
はオルトクレゾールノボラック樹脂のエポキシ化物(化
合物J)、下記に示すフェノールノボラック樹脂(化合
物K)をそれぞれ使用した。
Here, as the curable epoxy resin and the curing agent, the epoxidized product of ortho-cresol novolac resin (Compound J) and the phenol novolac resin shown below (Compound K) were used.

【0055】[0055]

【化18】 [Chemical 18]

【0056】これらの熱硬化性樹脂組成物につき下記の
(イ)〜(ニ)の諸試験を行った。 (イ)スパイラルフロー値 EMMI規格に準じた金型を使用して、175℃、70
kg/cm2の条件で測定した。 (ロ)機械的強度(曲げ強度及び曲げ弾性率) JISK−6911に準じて180℃、70kg/cm
2、成形時間2分の条件で10×4×100mmの抗折
棒を成形し、180℃、4時間ポストキュアーしたもの
について室温で測定した。 (ハ)膨張係数、ガラス転移温度 180℃、70kg/cm2、成形時間2分の条件で5
×5×15mmの試験片を成形し、180℃、4時間ポ
ストキュアーしたものを用いてディラトメーターにより
毎分5℃で昇温した時の値を測定した。 (ニ)吸水率 180℃、70kg/cm2、成形時間2分の条件で5
0φ×3mmの円盤を成形し、180℃、4時間ポスト
キュアーしたものを121℃/100%RH雰囲気中に
24時間放置し、吸水率を測定した。以上の結果を表1
に併記する。
The following tests (a) to (d) were conducted on these thermosetting resin compositions. (A) Spiral flow value Using a mold conforming to the EMMI standard, 175 ° C, 70
It was measured under the condition of kg / cm 2 . (B) Mechanical strength (bending strength and bending elastic modulus) 180 ° C, 70 kg / cm according to JISK-6911
2. A bending bar having a size of 10 × 4 × 100 mm was molded under the condition of a molding time of 2 minutes, and post-cured at 180 ° C. for 4 hours. (C) 5 under the conditions of expansion coefficient, glass transition temperature 180 ° C., 70 kg / cm 2 , molding time 2 minutes
A test piece of × 5 × 15 mm was molded, post-cured at 180 ° C. for 4 hours, and the value when the temperature was raised at 5 ° C./min was measured by a dilatometer. (D) Water absorption rate: 180 ° C., 70 kg / cm 2 , molding time: 2 minutes 5
A 0φ × 3 mm disk was molded, post-cured at 180 ° C. for 4 hours, and left in an atmosphere of 121 ° C./100% RH for 24 hours to measure the water absorption. The above results are shown in Table 1.
Also described in.

【0057】[0057]

【表1】 [Table 1]

【0058】表1の結果より、本発明のシリコーン変性
アラルキル樹脂を配合した熱硬化性樹脂組成物は、非常
に低吸水率でかつ低弾性率の硬化物を与えることがわか
った。
From the results shown in Table 1, it was found that the thermosetting resin composition containing the silicone-modified aralkyl resin of the present invention gives a cured product having a very low water absorption rate and a low elastic modulus.

【図面の簡単な説明】[Brief description of drawings]

【図1】化合物(B)のIRスペクトルを示すグラフで
ある。
FIG. 1 is a graph showing an IR spectrum of compound (B).

【図2】化合物(D)のIRスペクトルを示すグラフで
ある。
FIG. 2 is a graph showing an IR spectrum of compound (D).

【図3】化合物(F)のIRスペクトルを示すグラフで
ある。
FIG. 3 is a graph showing an IR spectrum of compound (F).

【図4】化合物(H)のIRスペクトルを示すグラフで
ある。
FIG. 4 is a graph showing an IR spectrum of compound (H).

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成4年10月1日[Submission date] October 1, 1992

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0016[Correction target item name] 0016

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0016】なお、上記アルケニル基含有アラルキル樹
脂中のアルケニル基の含有割合は、1分子中に1個以上
有すればよいが、全水酸基又は全グリシジルエーテル基
に対して0.01〜0.4個であることが好ましく、更
に好ましくは0.03〜0.3個である。
The content ratio of alkenyl groups in the alkenyl group-containing aralkyl resin may be one or more in one molecule, but is 0.01 to 0.4 with respect to all hydroxyl groups or all glycidyl ether groups. The number is preferably 0.03 to 0.3, and more preferably 0.03 to 0.3 .

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0057[Name of item to be corrected] 0057

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0057】[0057]

【表1】 [Table 1]

───────────────────────────────────────────────────── フロントページの続き (72)発明者 清水 久司 群馬県碓氷郡松井田町大字人見1番地10 信越化学工業株式会社シリコーン電子材料 技術研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kuji Shimizu 1 Hitomi, Oita, Matsuida-cho, Usui-gun, Gunma 10 Shin-Etsu Chemical Co., Ltd. Silicone Electronic Materials Research Laboratory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 アルケニル基含有アラルキル樹脂のアル
ケニル基に下記組成式(1)で示される有機珪素化合物
の≡SiH基を付加してなるシリコーン変性アラルキル
樹脂。 【化1】 (但し、式中R1は置換もしくは非置換の1価炭化水素
基、水酸基又はアルコキシ基を示し、a,bは0.01
≦a≦1、1≦b≦3、1≦a+b≦4を満足する正数
である。)
1. A silicone-modified aralkyl resin obtained by adding an ≡SiH group of an organosilicon compound represented by the following composition formula (1) to an alkenyl group of an alkenyl group-containing aralkyl resin. [Chemical 1] (In the formula, R 1 represents a substituted or unsubstituted monovalent hydrocarbon group, a hydroxyl group or an alkoxy group, and a and b are 0.01
It is a positive number that satisfies ≦ a ≦ 1, 1 ≦ b ≦ 3, 1 ≦ a + b ≦ 4. )
JP4242594A 1992-05-14 1992-08-20 Silicone-modified aralkyl resin Expired - Fee Related JP2727888B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4242594A JP2727888B2 (en) 1992-05-14 1992-08-20 Silicone-modified aralkyl resin

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP4-148269 1992-05-14
JP14826992 1992-05-14
JP4242594A JP2727888B2 (en) 1992-05-14 1992-08-20 Silicone-modified aralkyl resin

Publications (2)

Publication Number Publication Date
JPH0625370A true JPH0625370A (en) 1994-02-01
JP2727888B2 JP2727888B2 (en) 1998-03-18

Family

ID=26478528

Family Applications (1)

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Country Status (1)

Country Link
JP (1) JP2727888B2 (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6221417A (en) * 1985-07-17 1987-01-29 Sumitomo Electric Ind Ltd Double deck type coiler
JPS62212417A (en) * 1986-03-13 1987-09-18 Shin Etsu Chem Co Ltd Epoxy resin composition
JPS6356515A (en) * 1986-08-28 1988-03-11 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
JPH02180952A (en) * 1988-05-17 1990-07-13 Sumitomo Chem Co Ltd Thermosetting resin composition
JPH0473795A (en) * 1990-07-14 1992-03-09 Kosaku Ueda Operating mechanism for rotary plate in advertising device
JPH0559175A (en) * 1991-09-02 1993-03-09 Hitachi Chem Co Ltd Silicone-novolak copolymer and its production
JPH0597949A (en) * 1991-10-03 1993-04-20 Nippon Kayaku Co Ltd Silicone-modified phenolic novolak resin, resin c0mp0sition and cured product
JPH05331354A (en) * 1992-03-30 1993-12-14 Sumitomo Chem Co Ltd Thermoplastic resin composition and electronic component sealed therewith

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6221417A (en) * 1985-07-17 1987-01-29 Sumitomo Electric Ind Ltd Double deck type coiler
JPS62212417A (en) * 1986-03-13 1987-09-18 Shin Etsu Chem Co Ltd Epoxy resin composition
JPS6356515A (en) * 1986-08-28 1988-03-11 Sumitomo Bakelite Co Ltd Epoxy resin composition for sealing semiconductor
JPH02180952A (en) * 1988-05-17 1990-07-13 Sumitomo Chem Co Ltd Thermosetting resin composition
JPH0473795A (en) * 1990-07-14 1992-03-09 Kosaku Ueda Operating mechanism for rotary plate in advertising device
JPH0559175A (en) * 1991-09-02 1993-03-09 Hitachi Chem Co Ltd Silicone-novolak copolymer and its production
JPH0597949A (en) * 1991-10-03 1993-04-20 Nippon Kayaku Co Ltd Silicone-modified phenolic novolak resin, resin c0mp0sition and cured product
JPH05331354A (en) * 1992-03-30 1993-12-14 Sumitomo Chem Co Ltd Thermoplastic resin composition and electronic component sealed therewith

Also Published As

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