JP2724563B2 - Multilayer interference filter - Google Patents
Multilayer interference filterInfo
- Publication number
- JP2724563B2 JP2724563B2 JP2005321A JP532190A JP2724563B2 JP 2724563 B2 JP2724563 B2 JP 2724563B2 JP 2005321 A JP2005321 A JP 2005321A JP 532190 A JP532190 A JP 532190A JP 2724563 B2 JP2724563 B2 JP 2724563B2
- Authority
- JP
- Japan
- Prior art keywords
- interference filter
- index material
- material film
- refractive index
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/14—Integrated circuits
Landscapes
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Filters (AREA)
Description
【発明の詳細な説明】 ｛産業上の利用分野｝ 本発明は、赤外線ガス分析計に使用される、高屈折率
材料膜と低屈折率材料膜とからなる光学用の多層膜干渉
フィルタに関するものである。Description: TECHNICAL FIELD The present invention relates to an optical multilayer interference filter comprising a high-refractive-index material film and a low-refractive-index material film, used for an infrared gas analyzer. It is.
｛従来の技術｝ 赤外線ガス分析計に使用される多層膜干渉フィルタ
は、例えば、第３図に示したものが知られている。<< Prior Art >> As a multilayer film interference filter used in an infrared gas analyzer, for example, the one shown in FIG. 3 is known.
この多層膜干渉フィルタは、Si、SiO2、Al2O3などか
らなる基板１に、光学膜厚を所要の透過中心波長の1/4
としたGeからなる高屈折率材料膜ＨとSiOからなる低屈
折率材料膜Ｌとが、次の構成で積層されたものである。In this multilayer interference filter, an optical film thickness is set to / 4 of a required transmission center wavelength on a substrate 1 made of Si, SiO 2 , Al 2 O 3 or the like.
A high-refractive-index material film H made of Ge and a low-refractive-index material film L made of SiO are laminated in the following configuration.
SiLHL（LHLHLHL）2LH また、Geからなる高屈折率材料膜ＨとZnSからなる低
屈折率材料膜とを、 SiLHL（LHLHLHL）LH の構成で積層した多層膜干渉フィルタも知られてい
る。SiLHL (LHLHLHL) 2 LH A multilayer interference filter in which a high-refractive-index material film H made of Ge and a low-refractive-index material film made of ZnS are stacked in a configuration of SiLHL (LHLHLHL) LH is also known.
これら従来の多層膜干渉フィルタは、いずれも高屈折
率材料膜Ｈが最終層になっている。In each of these conventional multilayer interference filters, the high refractive index material film H is the final layer.
｛発明が解決しようとする課題｝ 前記従来の多層膜干渉フィルタは、その使用期間の経
過に従って、設定された透過波長帯域の透過率が低下す
る問題があった。<< Problems to be Solved by the Invention >> The conventional multilayer interference filter has a problem that the transmittance in a set transmission wavelength band is reduced as the use period elapses.
この透過率低下の問題を解決するため、その多層膜干
渉フィルタを種々調べた結果、例えば、最終層が空気と
の接触による化学反応で変色していることを見出だし
た。また、このように変色した干渉フィルタの透過率が
低下していたので、最終層の経時変化のために前記透過
率の低下が生じるものと考えられる。As a result of various investigations on the multilayer interference filter to solve the problem of the decrease in transmittance, it was found that, for example, the final layer was discolored by a chemical reaction caused by contact with air. In addition, since the transmittance of the interference filter that has changed in color in this manner has decreased, it is considered that the transmittance decreases due to the temporal change of the final layer.
本発明は上記の課題を解決するものであって、経時変
化による透過率低下を防ぐことができる多層膜干渉フィ
ルタをうることを目的とするものである。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has as its object to provide a multilayer interference filter capable of preventing a decrease in transmittance due to aging.
｛課題を解決するための手段｝ 本発明は、光学膜厚を所要の透過中心波長の1/4とし
たGeからなる高屈折率材料膜とSiOまたはZnSからなる低
屈折率材料膜とが基板に積層され、かつ前記積層が前記
高屈折率材料膜で終わっている、赤外線ガス分析計に使
用される多層膜干渉フィルタにおいて、最終層を、75nm
の光学膜厚を有するSiOまたはZnSからなる保護膜で被覆
した特徴がある。<< Means for Solving the Problems >> According to the present invention, a high-refractive-index material film made of Ge whose optical thickness is 1/4 of a required transmission center wavelength and a low-refractive-index material film made of SiO or ZnS are formed on a substrate. In the multilayer interference filter used in the infrared gas analyzer, wherein the stack is terminated with the high refractive index material film, the final layer, 75nm
Covered with a protective film made of SiO or ZnS having the following optical film thickness.
｛作用｝ この多層膜干渉フィルタは、その最終層を75nmの光学
膜厚を有するSiOまたはZnSからなる保護膜で被覆して、
その経時変化を防ぐものである。そして、この保護層
は、干渉フィルタを構成した低屈折率材料で光学膜厚に
形成されており、干渉フィルタの分光スペクトルに対す
る影響は生じない。<Action> This multilayer interference filter coats the final layer with a protective film made of SiO or ZnS having an optical thickness of 75 nm,
This prevents the change with time. The protective layer is formed with a low refractive index material constituting the interference filter to an optical thickness, and does not affect the spectral spectrum of the interference filter.
｛実施例｝ 本発明の多層膜干渉フィルタの第１実施例を第１図に
ついて説明する。<< Example >> A first example of the multilayer interference filter of the present invention will be described with reference to FIG.
この第１実施例は、光学膜厚を所要の透過中心波長の
1/4にしたGeからなる高屈折率材料膜ＨとSiOからなる低
屈折率材料膜Ｌとのそれぞれを、 SiLHL（LHLHLHL）2LH の構成で、Si、SiO2、Al2O3などからなる基板１（この
実施例ではSi）に蒸着で積層して干渉フィルタ２が構成
されている。そして、前記低屈折率材料膜Ｌを構成した
SiOを75nmの光学膜厚で蒸着してなる保護膜３で、前記
干渉フィルタ２における最終層の高屈折率材料膜Ｈを被
覆し保護している。In the first embodiment, the optical film thickness is set at a required transmission center wavelength.
Each of the high-refractive-index material film H made of 1/4 of Ge and the low-refractive-index material film L made of SiO is formed of SiLHL (LHLHLHL) 2 LH by using Si, SiO 2 , Al 2 O 3, etc. An interference filter 2 is formed by laminating a substrate 1 (Si in this embodiment) by evaporation. Then, the low refractive index material film L was formed.
A protective film 3 formed by depositing SiO with an optical film thickness of 75 nm covers and protects the high refractive index material film H as the final layer in the interference filter 2.
そして、この干渉フィルタ２の耐久性テストを次のよ
うに行った。Then, a durability test of the interference filter 2 was performed as follows.
干渉フィルタ２の分光スペクトルをまず測定した。そ
の結果は、第２図に示すＡのとおりであった。次に、そ
の干渉フィルタ２を約0.4％の塩水に24時間漬けた後、
その分光スペクトルを測定したが、それは前記Ａとほと
んど同じであって、変化は認められなかった。First, the spectrum of the interference filter 2 was measured. The results were as shown in A in FIG. Next, after soaking the interference filter 2 in about 0.4% salt water for 24 hours,
The spectrum was measured and found to be almost the same as A, with no change observed.
また、比較例として、前記従来例の多層膜干渉フィル
タの分光スペクトルを測定したところ、それは前記実施
例の分光スペクトルＡとほぼ同じであった。次に、その
干渉フィルタを約0.4％の塩水に24時間漬けた後、その
分光スペクトルを測定したところ、第２図に示すＢのよ
うに、透過率が大巾に低下していた。As a comparative example, the spectral spectrum of the multilayer interference filter of the conventional example was measured, and it was almost the same as the spectral spectrum A of the example. Next, the interference filter was immersed in about 0.4% salt water for 24 hours, and its spectral spectrum was measured. As a result, as shown in B of FIG. 2, the transmittance was greatly reduced.
この耐久テストの結果から明らかなように、前記第１
実施例の干渉フィルタ２は、塩水に漬ける前と、24時間
漬けたのちの分光スペクトルにほとんど差がなく、耐久
性にすぐれていることが明らかである。As is clear from the result of the durability test, the first
It is clear that the interference filter 2 of the example has almost no difference in the spectrum before and after immersion in the salt water for 24 hours, and is excellent in durability.
しかも、前記保護膜３が干渉フィルタ２の分光スペク
トルに影響を与えないことは、その分光スペクトルＡ
が、前記従来例の保護膜を備えていない干渉フィルタの
塩水に漬ける前の分光スペクトルとほぼ同じであること
が明らかである。Moreover, the fact that the protective film 3 does not affect the spectral spectrum of the interference filter 2 means that the spectral spectrum A
However, it is apparent that the spectrum of the interference filter without the protective film of the conventional example is almost the same as the spectrum before immersion in salt water.
したがって、前記干渉フィルタ２を、赤外線ガス分析
計その他に使用した場合において、経時変化のおそれが
ほとんどなく、設定された赤外線の波長帯域を効率よく
透過させることができる。Therefore, when the interference filter 2 is used for an infrared gas analyzer or the like, there is almost no possibility of a change with time, and the set infrared wavelength band can be efficiently transmitted.
この干渉フィルタ２の保護膜３は、低屈折率材料膜Ｌ
と同じSiOで形成しているから、保護膜３の蒸着をわざ
わざ第３の材料を使用することなく、低屈折率材料膜Ｌ
の形成材料を使用して連続的に行うことが可能であり、
保護膜３を能率よく形成することが可能である。The protective film 3 of the interference filter 2 is made of a low refractive index material film L
Since the protective film 3 is formed of the same SiO, the low refractive index material film L can be deposited without using the third material.
Can be performed continuously using the forming material of
The protective film 3 can be formed efficiently.
しかし、保護膜３は低屈折率材料であるZnSで形成す
ることも可能である。However, the protective film 3 can be formed of ZnS which is a low refractive index material.
次に、第２実施例を示すが、その構造は第１図と同じ
であるから、第１図を参照して説明する。Next, a second embodiment will be described. The structure of the second embodiment is the same as that of FIG. 1 and will be described with reference to FIG.
この第２実施例は、Geからなる高屈折率材料膜ＨとZn
Sからなる低屈折率材料膜Ｌとのそれぞれを、 SiLHL（LHLHLHL）LH の構成で、基板１に蒸着で積層して干渉フィルタ２を構
成する。そして、前記低屈折率材料膜Ｌを構成したZnS
を75nmの光学膜厚で蒸着してなる保護膜３で、前記干渉
フィルタにおける最終層の高屈折率材料膜Ｈを被覆して
いる。In the second embodiment, a high-refractive-index material film H made of Ge and Zn
The low-refractive-index material film L made of S is laminated on the substrate 1 by vapor deposition in the configuration of SiLHL (LHLHLHL) LH to form the interference filter 2. Then, ZnS constituting the low refractive index material film L is formed.
Is coated with a protective film 3 having an optical film thickness of 75 nm, which covers the high refractive index material film H as the final layer in the interference filter.
この第２実施例の干渉フィルタ２も、その保護膜３が
干渉フィルタ２の分光スペクトルに影響を与えることな
く、最終層の高屈折率材料膜Ｈの経時変化を保護膜３で
防ぐことが可能である。Also in the interference filter 2 of the second embodiment, the protection film 3 can prevent the temporal change of the high refractive index material film H of the final layer without the protection film 3 affecting the spectrum of the interference filter 2. It is.
前記保護膜３は、低屈折率材料であるSiOで形成する
ことも可能である。The protective film 3 can be formed of SiO, which is a low refractive index material.
｛発明の効果｝ 本発明の多層膜干渉フィルタは、最終層を、75nmの光
学膜厚を有するSiOまたはZnSからなる保護膜で被覆した
ので、最終層に空気などが触れないようにできる。ま
た、前記膜厚の保護膜を形成したからといって、多層膜
干渉フィルタの分光スペクトルに対してほとんど影響し
ない。<< Effect of the Invention >> In the multilayer interference filter of the present invention, since the final layer is covered with a protective film made of SiO or ZnS having an optical thickness of 75 nm, air and the like can be prevented from touching the final layer. Further, the formation of the protective film having the above-mentioned thickness has almost no effect on the spectrum of the multilayer interference filter.
したがって、この多層膜干渉フィルタが、例えば、空
気と接触する状態で使用されても、最終層である高屈折
率材料膜が経時的に変化するおそれはほとんどなく、使
用期間の長短に無関係に、多層膜干渉フィルタに設定さ
れた赤外線の透過帯域を効率よく透過させることができ
る。Therefore, even if this multilayer interference filter is used in a state of being in contact with air, for example, there is almost no possibility that the high refractive index material film as the final layer changes over time, regardless of the length of the use period, The transmission band of infrared rays set in the multilayer interference filter can be transmitted efficiently.
また、保護膜は低屈折率材料膜と同じSiOまたはZnSで
形成しているから、低屈折率材料膜と保護膜との構成材
を一致させて、わざわざ第３の材料を使用することな
く、低屈折率材料膜の形成材料をしようして保護膜の蒸
着を連続的に行うようにすることも可能であり、保護膜
を能率よく形成することができる。Further, since the protective film is formed of the same SiO or ZnS as the low refractive index material film, the constituent materials of the low refractive index material film and the protective film are made to match each other without using the third material. It is also possible to continuously deposit the protective film by using the material for forming the low refractive index material film, so that the protective film can be formed efficiently.
第１図は本発明の干渉フィルターの一部を省略した拡大
図、第２図は干渉フィルタの分光スペクトル図、第３図
は一部を省略した従来例の拡大図である。 1:基板、2:干渉フィルタ、3:保護膜、H:高屈折率材料
膜、L:低屈折率材料膜。FIG. 1 is an enlarged view of a part of the interference filter of the present invention omitted, FIG. 2 is a spectrum diagram of the interference filter, and FIG. 3 is an enlarged view of a conventional example with a part omitted. 1: substrate, 2: interference filter, 3: protective film, H: high refractive index material film, L: low refractive index material film.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭60−262101（ＪＰ，Ａ) 特開 昭62−240903（ＪＰ，Ａ) 特開 昭63−147106（ＪＰ，Ａ) 特開 昭60−296306（ＪＰ，Ａ) 特開 昭64−35502（ＪＰ，Ａ) 特開 昭63−5304（ＪＰ，Ａ) 特開 昭61−296306（ＪＰ，Ａ) ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-60-262101 (JP, A) JP-A-62-240903 (JP, A) JP-A-63-147106 (JP, A) JP-A-60-260 296306 (JP, A) JP-A-64-3502 (JP, A) JP-A-63-5304 (JP, A) JP-A-61-296306 (JP, A)
Claims (1)
たGeからなる高屈折率材料膜とSiOまたはZnSからなる低
屈折率材料膜とが基板に積層され、かつ前記積層が前記
高屈折率材料膜で終わっている、赤外線ガス分析計に使
用される多層膜干渉フィルタにおいて、最終層を、75nm
の光学膜厚を有するSiOまたはZnSからなる保護膜で被覆
したことを特徴とする多層膜干渉フィルタ。A high refractive index material film made of Ge whose optical thickness is 1/4 of a required transmission center wavelength and a low refractive index material film made of SiO or ZnS are laminated on a substrate. In the multilayer interference filter used in the infrared gas analyzer, ending with the high refractive index material film, the final layer is 75 nm
A multilayer interference filter covered with a protective film made of SiO or ZnS having an optical film thickness of
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005321A JP2724563B2 (en) | 1990-01-14 | 1990-01-14 | Multilayer interference filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005321A JP2724563B2 (en) | 1990-01-14 | 1990-01-14 | Multilayer interference filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03210503A JPH03210503A (en) | 1991-09-13 |
| JP2724563B2 true JP2724563B2 (en) | 1998-03-09 |
Family
ID=11607991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005321A Expired - Fee Related JP2724563B2 (en) | 1990-01-14 | 1990-01-14 | Multilayer interference filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2724563B2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3005971B2 (en) * | 1992-05-09 | 2000-02-07 | 株式会社堀場製作所 | Multilayer optical filter |
| US5433995A (en) * | 1993-08-18 | 1995-07-18 | Amoco Corporation | Carbon fiber-reinforced composite heat reflectors |
| TWI329208B (en) * | 2003-06-03 | 2010-08-21 | Oerlikon Trading Ag | Optical substrate for enhanced detectability of fluorescence |
| JP5751332B2 (en) * | 2011-08-25 | 2015-07-22 | 株式会社ニコン | Spatial light modulation element manufacturing method, spatial light modulation element, spatial light modulator, and exposure apparatus |
| CN103713349B (en) * | 2013-11-29 | 2016-03-30 | 杭州麦乐克电子科技有限公司 | The medical infrared gas detection analysis filter of centre wavelength 6557nm |
| US10168459B2 (en) * | 2016-11-30 | 2019-01-01 | Viavi Solutions Inc. | Silicon-germanium based optical filter |
| CN110058342A (en) * | 2019-06-05 | 2019-07-26 | 信阳舜宇光学有限公司 | Near-infrared bandpass filter and preparation method thereof and optical sensor system |
| CN110109208A (en) * | 2019-06-05 | 2019-08-09 | 信阳舜宇光学有限公司 | Near-infrared bandpass filter and optical sensor system |
| CN110261948B (en) * | 2019-06-25 | 2022-01-25 | 上海格斐特传感技术有限公司 | Infrared filter for nitric oxide gas detection and preparation method thereof |
| CN111323862A (en) * | 2020-03-11 | 2020-06-23 | 上海翼捷工业安全设备股份有限公司 | Infrared filter for sunlight interference resistance flame detection and preparation method thereof |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60225803A (en) * | 1984-04-24 | 1985-11-11 | Horiba Ltd | Multilayered film interference filter for gas analyzer |
| JPS60262101A (en) * | 1984-06-09 | 1985-12-25 | Horiba Ltd | Multi-layered film interference filter for moisture meter |
| JPS61296306A (en) * | 1985-06-25 | 1986-12-27 | Horiba Ltd | Infrared interference filter made of multi-layered film |
| JPH0629882B2 (en) * | 1986-04-14 | 1994-04-20 | 東芝硝子株式会社 | Multilayer film mirror |
| JPH0820569B2 (en) * | 1986-06-25 | 1996-03-04 | 松下電工株式会社 | Multilayer interference film |
| JPS63147106A (en) * | 1986-12-10 | 1988-06-20 | Matsushita Electric Ind Co Ltd | Optical parts |
| JPS6435502A (en) * | 1987-07-31 | 1989-02-06 | Nippon Sheet Glass Co Ltd | Reflecting mirror made of multi-layered films |
-
1990
- 1990-01-14 JP JP2005321A patent/JP2724563B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03210503A (en) | 1991-09-13 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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| LAPS | Cancellation because of no payment of annual fees |