JP2713651B2 - Photoconductor production method - Google Patents

Photoconductor production method

Info

Publication number
JP2713651B2
JP2713651B2 JP23382490A JP23382490A JP2713651B2 JP 2713651 B2 JP2713651 B2 JP 2713651B2 JP 23382490 A JP23382490 A JP 23382490A JP 23382490 A JP23382490 A JP 23382490A JP 2713651 B2 JP2713651 B2 JP 2713651B2
Authority
JP
Japan
Prior art keywords
substrate
cleaning
photoreceptor
solvent
examples
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP23382490A
Other languages
Japanese (ja)
Other versions
JPH04114167A (en
Inventor
雅則 松本
雅遊亀 坂元
隆生 中井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP23382490A priority Critical patent/JP2713651B2/en
Publication of JPH04114167A publication Critical patent/JPH04114167A/en
Application granted granted Critical
Publication of JP2713651B2 publication Critical patent/JP2713651B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は感光体の製造方法に関し、更に詳しくは、電
子写真感光体の製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a photoreceptor, and more particularly, to a method for manufacturing an electrophotographic photoreceptor.

[従来の技術] 電子写真感光体として、ドラム状の導電性基体上に感
光層を形成してなる感光体が使用されている。このドラ
ム状の導電性基体は、円管状のアルミ合金を鏡面加工す
るか又は板状アルミ合金をインパクト形成することによ
り作成される。アルミ合金基体の加工中に基体の表面に
は、切削油、ダスト等が付着するため、基体表面に洗浄
処理が施される。
[Prior Art] As an electrophotographic photosensitive member, a photosensitive member having a photosensitive layer formed on a drum-shaped conductive substrate is used. This drum-shaped conductive substrate is formed by mirror-finishing a tubular aluminum alloy or by impact-forming a plate-shaped aluminum alloy. During the processing of the aluminum alloy substrate, the surface of the substrate is subjected to a cleaning treatment because cutting oil, dust and the like adhere to the surface of the substrate.

洗浄処理された基体表面に感光液を塗布し、乾燥する
ことによって感光体が作成される。感光体の製造におい
て、基体の洗浄が不十分であると、その表面に切削油、
ダスト等が残り、塗布の際に、感光液のハジギが発生し
塗布欠陥を生じ、得られた画像に欠陥が生ずる。この画
像欠陥は、コピー画像上に黒ポチ、白ポチとして多数現
われ、画像品質の低下を招き、実用上適さないものとな
る。
A photoreceptor is prepared by applying a photosensitive liquid to the surface of the substrate subjected to the cleaning treatment and drying the liquid. In the manufacture of the photoreceptor, if the cleaning of the substrate is insufficient, cutting oil,
Dust and the like remain, and at the time of coating, bleeding of the photosensitive liquid is generated to cause a coating defect, resulting in a defect in the obtained image. Many of these image defects appear as black spots and white spots on the copied image, resulting in a decrease in image quality, which is not suitable for practical use.

基体表面の切削油、ダスト等の付着物の除去方法とし
ては、次に記載するような方法が知られている。
As a method for removing deposits such as cutting oil and dust on the surface of a substrate, the following methods are known.

スクラブ洗浄法 浸漬洗浄法 超音波洗浄方法 蒸気洗浄法 紫外線・オゾン洗浄法 スクラブ洗浄法としては、純水、中性洗剤を吹き付け
ながら回転するブラシでスクラブ(scrub)する方法が
挙げられる。
Scrub cleaning method Immersion cleaning method Ultrasonic cleaning method Steam cleaning method Ultraviolet / ozone cleaning method Scrub cleaning methods include a method of scrubbing with a rotating brush while spraying pure water and a neutral detergent.

浸漬洗浄法としては、洗浄液として酸、アルカリ等を
用いて化学洗浄するものが挙げられる。洗浄液の具体例
としては、 (i) 酸類:硫酸、塩酸、硝酸、燐酸、弗酸、クロム
酸(スケールの除去、酸化物の分解)、 (ii) アルカリ類:NaOH、Na2CO3、NaOHCO3、Na3PO4
Na2HPO4、Na4P2O7(ピロ燐酸ソーダ)(蛋白質の分解、
脱脂作用)、 (iii) 過酸化物:過酸化水素、過硝酸ソーダ(酸化
分解作用)、 が挙げられる。
Examples of the immersion cleaning method include a method of chemically cleaning using an acid, an alkali, or the like as a cleaning liquid. Specific examples of the cleaning liquid include: (i) acids: sulfuric acid, hydrochloric acid, nitric acid, phosphoric acid, hydrofluoric acid, and chromic acid (removal of scale and decomposition of oxides); (ii) alkalis: NaOH, Na 2 CO 3 , and NaOHCO 3 , Na 3 PO 4 ,
Na 2 HPO 4 , Na 4 P 2 O 7 (sodium pyrophosphate) (protein degradation,
(Iii) peroxides: hydrogen peroxide, sodium pernitrate (oxidative decomposition).

超音波洗浄法としては、有機溶剤を使用しての超音波
洗浄が挙げられる。具体的には、温媒槽中で超音波洗浄
→冷媒槽中でのすすぎ→蒸気槽中での蒸気洗浄による仕
上げ洗浄と乾燥とから成る。必要に応じて温媒槽を更に
追加したり、溶剤に界面活性剤を添加する。
The ultrasonic cleaning method includes ultrasonic cleaning using an organic solvent. Specifically, the cleaning process includes ultrasonic cleaning in a heating medium tank, rinsing in a refrigerant tank, and finish cleaning and drying by steam cleaning in a steam tank. If necessary, a heating medium tank is further added, or a surfactant is added to the solvent.

溶剤としては、次のものが使用される。 The following are used as the solvent.

(i) 塩素系溶剤:トリクロルエチレン、パークロル
エチレン、塩化メチレン、トリクロルエタン、 (ii) 弗素系:フロン−113、フロン−112、その他フ
ロン系混合溶剤、 (iii) その他の系:ベンゼン、トルエン、イソプロ
ピルアルコール、メタノール、エタノール、アセトン、 蒸気洗浄法とは、沸点に加熱したフロン、イソプロピ
ルアルコール、トリクロルエチレン、トリクロルエタン
などの蒸気槽に基体を挿入し、付着物を溶解除去する方
法である。
(I) Chlorine-based solvent: trichloroethylene, perchlorethylene, methylene chloride, trichloroethane, (ii) Fluorine-based: CFC-113, CFC-112, other CFC-based mixed solvents, (iii) Other systems: benzene, toluene The isopropyl alcohol, methanol, ethanol, acetone, and steam cleaning method is a method in which a substrate is inserted into a steam tank of fluorocarbon, isopropyl alcohol, trichloroethylene, trichloroethane, or the like heated to a boiling point, and attached matter is dissolved and removed.

更に、0〜90℃の純水、界面活性剤が添加された純
水、有機溶剤の洗浄媒体を高圧噴射して基体に当てて洗
浄する方法(特開平1−130159)、300nm以下の波長光
からなる紫外線を基体に照射して洗浄する方法(特開平
1−130161)、超音波洗浄槽内の溶剤中に浸漬して洗浄
し、ついで蒸気洗浄槽に挿入されて洗浄する方法(特開
平1−271762)が提案されている。
Further, a cleaning medium of 0 to 90 ° C. pure water, pure water to which a surfactant is added, and an organic solvent is sprayed at a high pressure to wash the substrate by applying to the substrate (Japanese Patent Laid-Open No. 1-130159). (Japanese Patent Application Laid-Open No. 1-130161), a method of immersing the substrate in a solvent in an ultrasonic cleaning tank for cleaning, and then inserting it into a steam cleaning tank for cleaning. -271762) has been proposed.

[発明が解決しようとする課題] 切削加工後、長期間放置されたアルミ合金基体には、
切削油、ダスト等がアルミ基体の表面に強固に付着して
いるので、上述の洗浄方法又はそれらを組合せて処理を
しても、これらの付着物を完全に除去することは困難
で、これらの付着物がアルミ基体の表面に残り、この付
着物が感光体の電子写真特性を局部的に変え、画像品質
に悪影響を及ぼす。
[Problems to be Solved by the Invention] After cutting, the aluminum alloy substrate left for a long time
Since cutting oil, dust and the like are firmly attached to the surface of the aluminum base, it is difficult to completely remove these deposits even if the above-mentioned cleaning method or a combination thereof is used. Deposits remain on the surface of the aluminum substrate, which locally alter the electrophotographic properties of the photoreceptor and adversely affect image quality.

本発明の目的は、前述のような従来技術の欠点を解決
するために、基体上に感光層を形成するに先立って、基
体表面の切削油、ダスト等の付着物を除去し、感光液を
基体表面に塗布した際のハジキ等の塗布欠陥の発生及び
それによる画像品質の悪化を防ぎ、電子写真特性が一定
で且つ優れた画像形成能を有する感光体を高い歩留で製
造する方法を提供することである。
An object of the present invention is to remove the deposits such as cutting oil and dust on the surface of a substrate before forming a photosensitive layer on the substrate to solve the above-mentioned drawbacks of the prior art, and to remove the photosensitive liquid. Provided is a method for producing a photoreceptor having a constant electrophotographic characteristic and excellent image forming ability at a high yield by preventing the occurrence of coating defects such as repelling and the like and the deterioration of image quality when applied to a substrate surface. It is to be.

[課題を解決するための手段] 本発明者等の鋭意研究の結果、感光体基体上に感光層
を形成して感光体を製造するに際し、感光体基体の加工
後、沸点150〜300℃の石油系溶剤に浸漬し、浸漬後少な
くとも1日程度放置し、その放置後洗浄処理することに
よって、前述の目的を達成することを見出し、この知見
に基ずいて本発明を成すに至った。
[Means for Solving the Problems] As a result of earnest research by the present inventors, when a photosensitive layer is formed on a photosensitive member substrate to produce a photosensitive member, the boiling point of the photosensitive member substrate is 150 to 300 ° C. after processing. It has been found that the above-mentioned object is achieved by immersing in a petroleum-based solvent, leaving it for at least about one day after immersion, and then performing a washing treatment after the immersion, and based on this finding, the present invention has been accomplished.

[作用] 本発明の方法においては、表面切削、EI又はDI加工も
しくは成型等の処理された感光体基体は、感光層の形成
前に、切削油等の基体表面の付着物に対して溶解性を有
する溶剤、例えば、石油系溶剤に浸漬される。
[Action] In the method of the present invention, the photoreceptor substrate that has been subjected to surface cutting, EI or DI processing or molding, etc. is soluble in deposits on the substrate surface such as cutting oil before forming the photosensitive layer. , For example, a petroleum-based solvent.

本発明で使用される溶剤としては、蒸発速度の大きく
ない且つ蒸発潜熱の大きくないものが好ましい。蒸発速
度が大きかったり、蒸発潜熱が大きかったりすると、浸
漬処理後基体表面の溶剤が速く蒸発し表面が乾燥してし
まい、表面の付着物が取れにくくなったり、また溶剤が
乾燥することにより基体の温度が低くなり、空気中の水
分が基体表面に凝結することがある。このような水滴は
基体表面にシミを生ぜしめる。
As the solvent used in the present invention, those having a small evaporation rate and a small latent heat of evaporation are preferable. If the evaporation rate is large or the latent heat of evaporation is large, the solvent on the substrate surface evaporates quickly after the immersion treatment, and the surface dries, making it difficult to remove the adhered substances on the surface. The temperature may decrease, and moisture in the air may condense on the substrate surface. Such water droplets cause spots on the substrate surface.

具体的には、本発明の液剤として、沸点150〜300℃、
好ましくは150〜200℃の、石油を分留して得られる主と
して脂肪族炭化水素の混合物からなる石油系溶剤(芳香
族炭化水素を含んでいても良い)、例えば、灯油、テレ
ビン油、石油スピリット、ターペン、アイソパー等が挙
げられる。
Specifically, as the liquid agent of the present invention, a boiling point of 150 to 300 ° C,
A petroleum-based solvent (which may contain aromatic hydrocarbons) preferably consisting of a mixture of aliphatic hydrocarbons obtained by fractionating petroleum, preferably at 150 to 200 ° C, for example, kerosene, turpentine, petroleum spirit, Tarpen, isoper and the like.

浸漬時間は、付着物が溶解もしくは剥離する時間であ
れば特に限定されることはないが、その時間は5秒以
上、より好ましくは10〜30秒が好ましい。
The immersion time is not particularly limited as long as the attached matter is dissolved or peeled off, but the time is preferably 5 seconds or more, more preferably 10 to 30 seconds.

石油系溶剤に浸漬処理された基体は感光液を塗布する
前に、少なくとも1日程度放置され、放置後公知の洗浄
法で洗浄される。
The substrate immersed in the petroleum-based solvent is allowed to stand for at least one day before applying the photosensitive solution, and then washed by a known washing method.

公知の洗浄方法としては、例えば、前述のスクラブ洗
浄法、超音波洗浄法、蒸気洗浄法、紫外線オゾン洗浄法
及びそれらを任意に組合せた洗浄方法が使用し得る。
As the known cleaning method, for example, the above-described scrub cleaning method, ultrasonic cleaning method, steam cleaning method, ultraviolet ozone cleaning method, and a cleaning method arbitrarily combining these can be used.

その一例としては、有機溶剤として、塩素系溶剤(ト
リクロルエチレン、パークロルエチレン、塩化メチレ
ン、トリクロルエタン等)、弗素系溶剤(フロン−11
3、フロン−112、その他フロン系混合溶剤等)、芳香族
系溶剤(ベンゼン、トルエン等)アルコール(メタノー
ル、エタノール、イソプロピルアルコール等)又はアセ
トンを用いて、温媒(溶媒の沸点から5〜15℃低い温
度)槽中で超音波洗浄(照射時間:10秒〜2分)をし、
冷媒(10〜30℃)槽中で洗浄をし、更に、蒸気洗浄(洗
浄時間:10秒〜2分)を行ない洗浄する方法が挙げられ
る。
For example, as an organic solvent, a chlorinated solvent (trichloroethylene, perchlorethylene, methylene chloride, trichloroethane, etc.), a fluorinated solvent (CFC-11) is used.
3, using CFC-112, other CFC-based mixed solvents, aromatic solvents (benzene, toluene, etc.), alcohols (methanol, ethanol, isopropyl alcohol, etc.) or acetone, and heating medium (5 to 15 from the boiling point of the solvent). Ultrasonic cleaning (irradiation time: 10 seconds to 2 minutes) in the bath)
Washing is performed by washing in a refrigerant (10 to 30 ° C.) tank, and then performing steam washing (washing time: 10 seconds to 2 minutes).

洗浄処理した基体は、クリーンルーム中で室温まで冷
却され、その表面に公知の方法で感光層が形成される。
The washed substrate is cooled to room temperature in a clean room, and a photosensitive layer is formed on the surface by a known method.

本発明の基体は、導電性材料例えば金属(アルミニウ
ム合金、ニッケル、銅等)からなる円筒形の基体であ
る。
The substrate of the present invention is a cylindrical substrate made of a conductive material such as a metal (aluminum alloy, nickel, copper, etc.).

本発明の感光層としては、アモルファスセレン、酸化
亜鉛、アモルファス珪素等の無機物質からなる感光層及
びキャリア発生物質とキャリア輸送物質とからなる機能
分離型有機質感光層が挙げられる。
Examples of the photosensitive layer of the present invention include a photosensitive layer composed of an inorganic substance such as amorphous selenium, zinc oxide, and amorphous silicon, and a function-separated organic photosensitive layer composed of a carrier generating substance and a carrier transporting substance.

本発明の洗浄方法で処理された感光体基体は、基体の
表面に付着している切削油、ダスト等の付着物の除去が
迅速且つ効果的になされるので、得られる感光体は、付
着物に起因するハジキ等の塗工欠陥の発生が防止され、
電子写真特性の局部的な変化が抑制され、且つ黒ポチ、
白ポチ等の画像欠陥のない画像品質の優れたものであ
る。
The photoreceptor substrate treated by the cleaning method of the present invention can quickly and effectively remove deposits such as cutting oil and dust adhering to the surface of the substrate. Prevents the occurrence of coating defects such as repelling caused by
Local changes in electrophotographic characteristics are suppressed, and black spots,
The image quality is excellent without image defects such as white spots.

[実施例] 以下、実施例により本発明を具体的に説明するが、本
発明はこれら実施例に限定されるものではない。
[Examples] Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited to these Examples.

実施例1〜3 厚さ0.75mm:直径80φ、長さ340mmのアルミ合金素管の
表面を0.2μmRmaxに切削し、灯油に30秒間浸漬し取り出
した後、1日(実施例1)、1週間(実施例2)及び1
ケ月(実施例3)放置した。放置されたアルミ合金素管
を有機溶剤として60℃のトリクロルエタンを用いた超音
波・温浴洗浄処理を30秒間行なった。20℃のトリクロル
エタンで30秒間冷浴した後、トリクロルエタンを用いた
蒸気洗浄を30秒間行ない、クリーンルームで20分間放冷
した。
Examples 1 to 3 Thickness 0.75 mm: The surface of an aluminum alloy tube having a diameter of 80φ and a length of 340 mm was cut to 0.2 μmR max , immersed in kerosene for 30 seconds, taken out, and then 1 day (Example 1), 1 day. Week (Example 2) and 1
(Monthly Example 3) The left aluminum alloy tube was subjected to an ultrasonic / warm bath cleaning treatment using trichloroethane at 60 ° C. for 30 seconds as an organic solvent. After cooling in trichloroethane at 20 ° C. for 30 seconds, steam cleaning using trichloroethane was performed for 30 seconds and allowed to cool in a clean room for 20 minutes.

ジブロムアンスアンスロン2重量部、ブチラール樹脂
(エスレックBM−2、セキスイ化学社製)2重量部、シ
クロヘキサノン230重量部をボールミルで8時間粉砕・
混合して、電荷発生材の塗工液を調製した。得られた電
荷発生材の塗工液を浸漬法により、クリーンルームで放
冷処理したアルミ合金素管の外周面上に、乾燥膜厚とし
て0.5μmとなるように塗布し、80℃で30分間乾燥して
電荷発生層を形成した。
2 parts by weight of dibromance anthuron, 2 parts by weight of butyral resin (ESLEC BM-2, manufactured by Sekisui Chemical Co., Ltd.), and 230 parts by weight of cyclohexanone are ground by a ball mill for 8 hours.
By mixing, a coating liquid of the charge generating material was prepared. The coating liquid of the obtained charge generating material is applied to the outer peripheral surface of the aluminum alloy tube cooled in a clean room by a dipping method so as to have a dry film thickness of 0.5 μm, and dried at 80 ° C. for 30 minutes. Thus, a charge generation layer was formed.

ヒドラゾン系電荷輸送剤(ABPH、亜南香料社製)1重
量部、ポリカーボネート樹脂(パンライト L−1250、
帝人化成社製)1重量部をジクロルエタン8重量部に溶
解して電荷輸送材の塗工液を調製した。得られた電荷輸
送材の塗工液を浸漬法により電荷発生層の上に、乾燥膜
厚として15μmとなるように塗布し、70℃で1時間乾燥
して電荷輸送層を形成し、感光体を作成した。
1 part by weight of a hydrazone-based charge transport agent (ABPH, manufactured by Anan Kofu Co., Ltd.), a polycarbonate resin (Panlite L-1250,
1 part by weight (manufactured by Teijin Chemicals Ltd.) was dissolved in 8 parts by weight of dichloroethane to prepare a coating solution for the charge transport material. The obtained coating solution of the charge transport material is applied on the charge generation layer by a dipping method so as to have a dry film thickness of 15 μm, and dried at 70 ° C. for 1 hour to form a charge transport layer. It was created.

得られた感光体をSF−8100(シャープ社製複写機)に
装置し、ハーフトーン画像をコピーして、画像チェック
を行なった。
The obtained photoreceptor was set on an SF-8100 (copier made by Sharp Corporation), and a halftone image was copied to check the image.

その結果を表−1に示す。 Table 1 shows the results.

比較例1〜3 実施例1〜3の切削加工後のアルミ合金素管を、灯油
に浸漬する処理をすることなく、超音波・温浴洗浄処理
した以外は、実施例1〜3と同じ方法で感光体を作成し
た。
Comparative Examples 1 to 3 The same method as in Examples 1 to 3, except that the aluminum alloy tube after the cutting process in Examples 1 to 3 was not subjected to the treatment of dipping in kerosene, but was subjected to an ultrasonic / hot bath cleaning treatment. A photoreceptor was made.

実施例1〜3と同様の方法で画像チェックをした。結
果を表−1に示す。
The image was checked in the same manner as in Examples 1 to 3. The results are shown in Table 1.

実施例1〜3と比較例1〜3とから、浸漬処理を行な
った場合は、浸漬処理を行なわない場合に比べて、不良
発生率が著しく低下していることが判る。特に、表−1
から理解できるように少なくとも1日程度放置すれば、
良好か結果が得られる。
From Examples 1 to 3 and Comparative Examples 1 to 3, it can be seen that when the immersion treatment was performed, the defect occurrence rate was significantly lower than when the immersion treatment was not performed. In particular, Table 1
If you leave it for at least a day as you can understand from
Good or good result.

[発明の効果] 本発明は、洗浄効果を高めることができ、切削後長期
間放置された基体でも付着物によるハジキ等の塗工欠陥
が生ずることなく、黒ポチ、白ポチ等の画像欠陥のない
優れた画像品質の感光体の高い歩留で製造し得る。
[Effects of the Invention] The present invention can enhance the cleaning effect, and can prevent image defects such as black spots and white spots without causing coating defects such as cissing due to deposits even on a substrate left for a long time after cutting. No excellent image quality can be produced with high yield of photoreceptor.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】感光体基体上に感光層を形成して感光体を
製造するに際し、該感光体基体を加工後沸点が150〜300
℃の石油系溶剤に浸漬し、浸漬後少なくとも1日程度放
置し、その放置後洗浄処理することを特徴とする感光体
の製造方法。
In producing a photoreceptor by forming a photosensitive layer on a photoreceptor substrate, the boiling point of the photoreceptor substrate after processing is 150 to 300.
A method for producing a photoreceptor, characterized by immersing in a petroleum-based solvent at a temperature of at least about 1 ° C., leaving it to stand for at least one day after immersion, and then washing it.
JP23382490A 1990-09-04 1990-09-04 Photoconductor production method Expired - Lifetime JP2713651B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23382490A JP2713651B2 (en) 1990-09-04 1990-09-04 Photoconductor production method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23382490A JP2713651B2 (en) 1990-09-04 1990-09-04 Photoconductor production method

Publications (2)

Publication Number Publication Date
JPH04114167A JPH04114167A (en) 1992-04-15
JP2713651B2 true JP2713651B2 (en) 1998-02-16

Family

ID=16961139

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23382490A Expired - Lifetime JP2713651B2 (en) 1990-09-04 1990-09-04 Photoconductor production method

Country Status (1)

Country Link
JP (1) JP2713651B2 (en)

Also Published As

Publication number Publication date
JPH04114167A (en) 1992-04-15

Similar Documents

Publication Publication Date Title
JP2614980B2 (en) Composition and method for removing rosin soldering fluxes with terpenes and hydrocarbons
JP2001517728A (en) Aqueous rinse composition and method using the same
JPH08187475A (en) Method of removing metal in scrubber
FR2828746A1 (en) Composition useful for removing resist layers in the manufacture of semiconductor devices comprises an N-hydroxyalkyl alkoxyalkanamide and a swelling agent
TW201301378A (en) A group III-V compound semiconductor wafer and method for cleaning the same
JP2812369B2 (en) Novel azeotropic solvent mixture and method for cleaning electronic components using the same
US4971715A (en) Phenolic-free stripping composition and use thereof
TWI781168B (en) Cleaning method and rinsing composition of mask for vacuum evaporation
US7638004B1 (en) Method for cleaning microwave applicator tube
KR20070095297A (en) Cmp polishing method, cmp polishing apparatus, and process for producing semiconductor device
JP2713651B2 (en) Photoconductor production method
US5378315A (en) Removing imaging member layers from a substrate
KR930010054B1 (en) Cleaning material for semiconductor and method using thereof
EP0426369B1 (en) A method of manufacturing an electrophotographic photoconductor drum
KR100819180B1 (en) Method for anodizing of aluminium drum
JP2651652B2 (en) Fluorinated alcohol-based cleaning agent
JPH0536661A (en) Cleaning method
JP2005079239A (en) Liquid and method for cleaning semiconductor substrate
JPH07197092A (en) Method for cleaning and drying
JP3529850B2 (en) Manufacturing method of electrophotographic photoreceptor
US5834148A (en) Electrically-conductive substrate for electrophotographic photoreceptor, electrophotographic photoreceptor comprising same and process for the preparation thereof
JPH0342002A (en) Method for washing and dehydrating article
JPH07265604A (en) Washing and drying method
JP3047509B2 (en) Manufacturing method of electrophotographic photoreceptor
JPH04335355A (en) Manufacture of electrophotographic sensitive body

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20071031

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081031

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081031

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091031

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091031

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101031

Year of fee payment: 13

EXPY Cancellation because of completion of term