JP2707909B2 - Bonding method for integrated circuit chips - Google Patents

Bonding method for integrated circuit chips

Info

Publication number
JP2707909B2
JP2707909B2 JP4079793A JP7979392A JP2707909B2 JP 2707909 B2 JP2707909 B2 JP 2707909B2 JP 4079793 A JP4079793 A JP 4079793A JP 7979392 A JP7979392 A JP 7979392A JP 2707909 B2 JP2707909 B2 JP 2707909B2
Authority
JP
Japan
Prior art keywords
integrated circuit
circuit chip
connection
bonding method
circuit board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4079793A
Other languages
Japanese (ja)
Other versions
JPH05283479A (en
Inventor
直治 仙波
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP4079793A priority Critical patent/JP2707909B2/en
Publication of JPH05283479A publication Critical patent/JPH05283479A/en
Application granted granted Critical
Publication of JP2707909B2 publication Critical patent/JP2707909B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、集積回路チップのボン
ディング方法に関し、特にバンプ接続方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for bonding integrated circuit chips, and more particularly to a method for connecting bumps.

【0002】[0002]

【従来の技術】従来の集積回路チップのボンディング方
法は、図2(A)および図2(B)に示すように集積回
路チップ1′上に酸化膜2′を形成し、その上にアルミ
電極4′を設けている。更に半田バンプ16を設けるた
めにポリイミド膜5′、バリヤーメタル3′等を形成さ
せている。このように半田バンプ16が形成された集積
回路チップ1′とパッドメタル8′、配線導体9′が形
成された回路基板7′とを接続する際には一般的に良く
使用されているボンディング方法は、200〜400℃
程度の雰囲気中で半田を加熱溶融させるリフロー方式で
ある。リフローは、熱板上をシート状のベルトを摺動さ
せて加熱する型式のもの、上部から赤外線加熱する型式
のベルト炉、エヤーにより加熱するエヤーリフロー型式
のもの、ベーパーによるリフロー型式のもの等、各種の
リフロー炉により行なわれている。更に最近ではレーザ
ー光によるリフローも検討されはじめている。(例えば
特願平1−69219、集積回路チップのボンディング
方法)前記発明は、図2(B)に示すように半田バンプ
付集積回路チップ1′を回路基板7′に載置し、レーザ
ー光を集積回路チップ裏面14′の全面に照射し、集積
回路チップ1′の全体を加熱(約200℃〜400℃)
することによって半田バンプ15′を溶融させ、回路基
板7′と接続する方法である。
2. Description of the Related Art A conventional integrated circuit chip bonding method is to form an oxide film 2 'on an integrated circuit chip 1' as shown in FIGS. 4 'is provided. Further, a polyimide film 5 ', a barrier metal 3' and the like are formed to provide the solder bumps 16. A bonding method generally used when connecting the integrated circuit chip 1 'on which the solder bumps 16 are formed and the circuit board 7' on which the pad metal 8 'and the wiring conductor 9' are formed as described above. Is 200-400 ° C
This is a reflow method in which solder is heated and melted in a moderate atmosphere. Reflow is a type that heats by sliding a sheet-shaped belt on a hot plate, a belt furnace of a type that heats infrared rays from the top, an air reflow type that heats by air, a reflow type that uses vapor, etc. It is performed by various reflow furnaces. More recently, reflow by laser light has begun to be studied. (For example, Japanese Patent Application No. 1-69219, bonding method of integrated circuit chip) According to the invention, as shown in FIG. 2B, an integrated circuit chip 1 'with solder bumps is mounted on a circuit board 7' and a laser beam is applied. Irradiate the entire surface of the integrated circuit chip back surface 14 'to heat the entire integrated circuit chip 1' (about 200 ° C. to 400 ° C.)
Then, the solder bumps 15 'are melted and connected to the circuit board 7'.

【0003】[0003]

【発明が解決しようとする課題】この従来の集積回路チ
ップのボンディング方法は、半田バンプ(ウェットバッ
ク済)形成済の集積回路チップを使用しているため、ウ
エハースへの半田供給〜ウェットバック完了までに多数
の工程がある。そのため工期が長く、歩留、品質等に問
題があり、特にフラックス塗布〜ウェットバック〜フラ
ックス洗浄工程についてはフラックス残渣、環境保護等
の問題点を含んでいる。また、リフロー炉による接続方
法を取っているため半田を溶融するのに時間がかかり生
産性が悪く、しかも温度管理が難しく、歩留りが悪いと
いう問題がある。更に装置も大型(例えば幅1〜2m×
長さ3〜5m)となり、集積回路チップと回路基板との
位置合わせ装置とは、各々個別装置となってしまう。最
近検討が進められているレーザー光による集積回路チッ
プのボンディング方法に於いては、集積回路チップ全体
を急加熱するため、歪みが残り、電気特性の変動やクラ
ック等の問題点を多く含んでいる。
The conventional method of bonding an integrated circuit chip uses an integrated circuit chip on which solder bumps (wet back already formed) have been formed, and therefore, from the supply of solder to a wafer to the completion of wet back. Has a number of steps. Therefore, the construction period is long, and there are problems in yield, quality, and the like. In particular, the steps from flux application to wet back to flux cleaning include problems such as flux residue and environmental protection. In addition, since the connection method using a reflow furnace is employed, it takes a long time to melt the solder, and the productivity is poor. In addition, there is a problem that the temperature control is difficult and the yield is poor. In addition, the equipment is large (for example, width 1-2m ×
(3-5 m in length), and the alignment device for the integrated circuit chip and the circuit board is an individual device. In a bonding method of an integrated circuit chip using a laser beam, which has been studied recently, since the entire integrated circuit chip is rapidly heated, distortion remains, and there are many problems such as fluctuations in electrical characteristics and cracks. .

【0004】[0004]

【課題を解決するための手段】本発明の集積回路チップ
のボンディング方法は、集積回路チップの外部接続用バ
ンプがウェットバック未了のものを使用し、バンプのウ
ェットバック工程と回路基板との接続を1回のレーザー
光による溶融で接続しているため、ウエハースへの半田
供給〜ウェットバック完了までの多数工程が不要とな
る。また、YAGレーザーによって集積回路チップのシ
リコン中を透過させ、バンプ近傍に焦点を合わせて、バ
ンプのみ加熱溶融させ、接続しているため、集積回路チ
ップへ与えるストレスが小さくなり、歪みが残らない。
従って電気特性の変動や、クラック等の問題がなくな
る。更にリフロー炉に比べ、装置の小型化が可能となる
ため、温度、雰囲気等の管理が容易となる。尚、YAG
レーザーは、波長1.06μm近傍のものが適当であ
る。
According to the present invention, there is provided a method for bonding an integrated circuit chip, wherein the bump for external connection of the integrated circuit chip is not wet-backed, and the wet-back process of the bump and the connection with the circuit board are performed. Are connected by melting by one laser beam, so that many steps from solder supply to wafer to completion of wet back are not required. Further, since the YAG laser transmits through the silicon of the integrated circuit chip, focuses on the vicinity of the bump, heats and melts only the bump, and connects the bump, stress applied to the integrated circuit chip is reduced, and no distortion remains.
Therefore, problems such as fluctuations in electrical characteristics and cracks are eliminated. Further, the size of the apparatus can be reduced as compared with the reflow furnace, so that the control of the temperature, the atmosphere, and the like becomes easy. In addition, YAG
A laser having a wavelength of about 1.06 μm is suitable.

【0005】[0005]

【実施例】次に本発明について図面を参照して説明す
る。図1(A)は、本発明の一実施例を示す断面図であ
り、集積回路チップと回路基板との接続前の状態を示
す。図1(B)は、本発明の一実施例を示す断面図であ
り、集積回路チップと回路基板との接続後の状態を示
す。集積回路チップ1には酸化膜2、アルミ電極4、バ
リヤーメタル3、ポリイミド膜5等が順次形成され、バ
リヤーメタル3形成後、半田バンプ(ウェットバック
前)6を設けている。本発明ではウェットバック工程を
省略した半田バンプ(ウェットバック前)6を使用して
いる。半田バンプ(ウェットバック前)6が設けられて
いる集積回路チップ1を、配線導体9とパッドメタル8
が形成されている回路基板7のパッドメタル8に載置す
る。この時、集積回路チップ1の半田バンプ(ウェット
バック前)6の位置と回路基板7のパッドメタル8との
位置は、精度良く合わせる必要がある。位置合わせ完了
後図1(B)に示すように集積回路チップ裏面14側か
ら、YAGレーザー光(例えば波長:1.06μm )1
0,11,12を照射させる。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Next, the present invention will be described with reference to the drawings. FIG. 1A is a cross-sectional view showing one embodiment of the present invention, and shows a state before connection between an integrated circuit chip and a circuit board. FIG. 1B is a cross-sectional view showing one embodiment of the present invention, and shows a state after connection between the integrated circuit chip and the circuit board. An oxide film 2, an aluminum electrode 4, a barrier metal 3, a polyimide film 5 and the like are sequentially formed on the integrated circuit chip 1. After the barrier metal 3 is formed, solder bumps (before wet back) 6 are provided. In the present invention, a solder bump (before wet back) 6 in which the wet back step is omitted is used. The integrated circuit chip 1 provided with the solder bumps (before wet back) 6 is connected to the wiring conductor 9 and the pad metal 8.
Is mounted on the pad metal 8 of the circuit board 7 on which is formed. At this time, the positions of the solder bumps (before wet back) 6 of the integrated circuit chip 1 and the positions of the pad metals 8 of the circuit board 7 need to be accurately adjusted. After the completion of the alignment, as shown in FIG. 1B, the YAG laser beam (for example, wavelength: 1.06 μm) 1
Irradiate 0,11,12.

【0006】この時、レーザー光10,11,12の焦
点は、図1(B)に示すように集積回路チップ1′中で
はなく、半田バンプ(接続後)15近傍に合わせる。レ
ーザー光10,11,12の照射方法としては、図1
(B)に示すように半田バンプ(接続後)15毎にパル
ス的に行なっても良いし、連続照射してもどちらでも良
い。焦点深度は、集積回路チップ1′の厚さによって変
更する必要があるが、集積回路チップ裏面から120μ
〜600μ位になる。
At this time, the focal points of the laser beams 10, 11, and 12 are set not in the integrated circuit chip 1 'but in the vicinity of the solder bumps (after connection) 15, as shown in FIG. The method of irradiating the laser beams 10, 11, and 12 is shown in FIG.
As shown in (B), the pulse may be performed for each solder bump (after connection) 15 or continuous irradiation may be performed. The depth of focus needs to be changed depending on the thickness of the integrated circuit chip 1 ′,
About 600 μm.

【0007】従って本発明では、集積回路チップ1′の
シリコン中を透過したYAGレーザー光(波長1.06
μm )によって半田バンプ(ウェットバック前)6を溶
融させ、回路基板7′と接続させている。尚YAGレー
ザーのパワー値としては装置、製品にもよるが10W〜
50W位が適当である。
Therefore, according to the present invention, the YAG laser beam (wavelength 1.06) transmitted through the silicon of the integrated circuit chip 1 'is used.
.mu.m) to melt the solder bumps (before wet back) 6 and connect them to the circuit board 7 '. The power value of the YAG laser depends on the device and the product, but it is 10W ~
About 50W is appropriate.

【0008】本発明の他の実施例を説明すると、回路基
板7に、シリコン、ガラス等のレーザー光を透過する材
料が使用されている場合は、図1(B)のレーザー光
1,2、および3は、回路基板7の裏面から照射するこ
とでも実施できる。この方法によれば、あらかじめ集積
回路チップ1の裏面にAl製、あるいはCu製のヒート
スプレッダーを取り付けた後に、ボンディングを行なう
ことができる。
To explain another embodiment of the present invention, when a material that transmits laser light, such as silicon or glass, is used for the circuit board 7, the laser lights 1, 2 and 2 shown in FIG. Steps 3 and 3 can also be performed by irradiating from the back surface of the circuit board 7. According to this method, bonding can be performed after a heat spreader made of Al or Cu is attached to the back surface of the integrated circuit chip 1 in advance.

【0009】[0009]

【発明の効果】以上説明したように、本発明は、ウェッ
トバック未了の半田バンプ付集積回路チップを使用し、
回路基板とレーザー光による一括接続をしているため、
ウェットバック工程が省略できる。また集積回路チップ
のシリコン中を透過したYAGレーザー光によって半田
バンプを直接溶融させ接続するため、集積回路チップへ
のストレスが低減できる。リフロー炉による方法に比
べ、レーザー光による方法は、装置の小型化が可能であ
るため、集積回路チップと回路基板との位置合わせ装置
と一体化することもできる。従って位置合わせ〜接続ま
で一台の装置で可能となる。これは、バンプ間ピッチが
狭いほど位置ずれに対して有利となる。また一台の装置
となるため、位置合わせ、接続条件等の管理が容易とな
る。本発明の実施により、総合的な効果として、従来比
で不良率が3分の1に、加工工程数が20%削減が得ら
れた。
As described above, the present invention uses an integrated circuit chip with solder bumps that has not been wet-backed,
Because the circuit board and the laser beam are connected together,
The wet back process can be omitted. Further, since the solder bumps are directly melted and connected by the YAG laser beam transmitted through the silicon of the integrated circuit chip, stress on the integrated circuit chip can be reduced. Compared to the method using a reflow furnace, the method using a laser beam can reduce the size of the apparatus, and thus can be integrated with an apparatus for aligning an integrated circuit chip and a circuit board. Therefore, positioning to connection can be performed by one device. This is more advantageous for displacement as the pitch between bumps is smaller. In addition, since one device is used, alignment, management of connection conditions, and the like become easy. By implementing the present invention, as a total effect, the defective rate is reduced to one third and the number of processing steps is reduced by 20% as compared with the conventional case.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(A)は、本発明の一実施例を示す断面図で接
続前を示す。(B)は、本発明の一実施例を示す断面図
で接続後を示す。
FIG. 1A is a cross-sectional view showing one embodiment of the present invention before connection. (B) is a cross-sectional view showing one embodiment of the present invention, after connection.

【図2】(A)は、従来技術を示す断面図で接続前を示
す。(B)は、従来技術を示す断面図で接続後を示す。
FIG. 2A is a cross-sectional view showing a conventional technique, before connection. (B) is a cross-sectional view showing the prior art, showing the state after connection.

【符号の説明】[Explanation of symbols]

1,1′ 集積回路チップ 2,2′ 酸化膜 3,3′ バリヤーメタル 4,4′ アルミ電極 5,5′ ポリイミド膜 6 半田バンプ(ウェットバック前) 7,7′ 回路基板 8,8′ パッドメタル 9,9′ 配線導体 10 レーザー光−1 11 レーザー光−2 12 レーザー光−3 13 レーザー光焦点 14 集積回路チップ裏面 15,15′ 半田バンプ(接続後) 16 半田バンプ 1, 1 'integrated circuit chip 2, 2' oxide film 3, 3 'barrier metal 4, 4' aluminum electrode 5, 5 'polyimide film 6 solder bump (before wet back) 7, 7' circuit board 8, 8 'pad Metal 9, 9 'Wiring conductor 10 Laser light-1 11 Laser light-2 12 Laser light-3 13 Laser light focus 14 Backside of integrated circuit chip 15, 15' Solder bump (after connection) 16 Solder bump

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 複数の外部接続用バンプが一面に形成さ
れている集積回路チップと、外部接続用バンプと対応し
た位置に接続端子が設けられている回路基板とを、接続
するボンディング方法に於いて、ウェットバック未了の
外部接続用バンプを使用することを特徴とする集積回路
チップのボンディング方法。
1. A bonding method for connecting an integrated circuit chip having a plurality of external connection bumps formed on one surface to a circuit board having connection terminals provided at positions corresponding to the external connection bumps. And using an external connection bump which has not been wet-backed.
【請求項2】 集積回路チップを透過したレーザー光に
より接続することを特徴とする請求項1記載の集積回路
チップのボンディング方法。
2. The integrated circuit chip bonding method according to claim 1, wherein the connection is performed by a laser beam transmitted through the integrated circuit chip.
【請求項3】 YAGレーザー光により接続することを
特徴とする請求項1記載の集積回路チップのボンディン
グ方法。
3. The bonding method for an integrated circuit chip according to claim 1, wherein the connection is performed by using a YAG laser beam.
JP4079793A 1992-04-01 1992-04-01 Bonding method for integrated circuit chips Expired - Fee Related JP2707909B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4079793A JP2707909B2 (en) 1992-04-01 1992-04-01 Bonding method for integrated circuit chips

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4079793A JP2707909B2 (en) 1992-04-01 1992-04-01 Bonding method for integrated circuit chips

Publications (2)

Publication Number Publication Date
JPH05283479A JPH05283479A (en) 1993-10-29
JP2707909B2 true JP2707909B2 (en) 1998-02-04

Family

ID=13700100

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4079793A Expired - Fee Related JP2707909B2 (en) 1992-04-01 1992-04-01 Bonding method for integrated circuit chips

Country Status (1)

Country Link
JP (1) JP2707909B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2022112184A (en) 2021-01-21 2022-08-02 株式会社ディスコ Electrode welding method and electrode welding apparatus

Also Published As

Publication number Publication date
JPH05283479A (en) 1993-10-29

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