JP2702210B2 - Magnetic head - Google Patents
Magnetic headInfo
- Publication number
- JP2702210B2 JP2702210B2 JP1019016A JP1901689A JP2702210B2 JP 2702210 B2 JP2702210 B2 JP 2702210B2 JP 1019016 A JP1019016 A JP 1019016A JP 1901689 A JP1901689 A JP 1901689A JP 2702210 B2 JP2702210 B2 JP 2702210B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- facing surface
- medium facing
- electrode
- magnetoresistive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は磁気ディスク装置や磁気テープ装置やフロッ
ピィデイスク装置等に用いる磁気抵抗効果素子を用いた
磁気ヘッドに関する。Description: BACKGROUND OF THE INVENTION The present invention relates to a magnetic head using a magnetoresistive element used in a magnetic disk device, a magnetic tape device, a floppy disk device and the like.
磁気ディスク装置や磁気テープ装置やフロッピィディ
スク装置に用いる磁気抵抗効果素子を用いた従来の磁気
抵抗効果ヘッド（以下MRヘッドと云う）は、強磁性体の
異常磁気抵抗効果、すなわち磁化の向きと電流の方向と
のなす角度によって抵抗値が変化する性質を利用した磁
気ヘッドである。MRヘッドは、再生専用の磁気ヘッドで
あるが、再生出力が磁気ヘッドと磁気記録媒体との間の
相対速度に依存せず、また極めて高感度であることか
ら、磁気記録装置の小型化や高密度化に対して有効な手
段である。A conventional magnetoresistive head (hereinafter referred to as an MR head) using a magnetoresistive element used in a magnetic disk device, a magnetic tape device, or a floppy disk device has an abnormal magnetoresistance effect of a ferromagnetic material, that is, the direction of magnetization and current. Is a magnetic head utilizing the property that the resistance value changes depending on the angle formed with the direction. The MR head is a read-only magnetic head.However, the read output does not depend on the relative speed between the magnetic head and the magnetic recording medium, and has extremely high sensitivity. This is an effective means for densification.
上述したようなMRヘッドにおいては、磁気抵抗効果を
有するNiFeやCoNi等の強磁性膜を矩形状に形成した磁気
抵抗効果素子（以下MR素子と云う）の両端にCuやAlなど
の良導電体膜からなる電極を接続している。電極として
用いる良導電体膜は、磁気ヘッドを構成する他の材料と
比較して極めて軟かい。従って、電極が記憶媒体（媒
体）との対抗面に露出していると、電極の損傷や変形が
生じやすいため、短絡や断線の原因となる。In the MR head as described above, N i F e and C o N i across the C u of the magnetoresistive element of ferromagnetic film is formed in a rectangular shape such as a (referred to hereinafter MR element) having a magneto-resistance effect An electrode made of a good conductor film such as Al or Al is connected. A good conductor film used as an electrode is extremely soft as compared with other materials constituting a magnetic head. Therefore, if the electrode is exposed on the surface facing the storage medium (medium), the electrode is likely to be damaged or deformed, causing a short circuit or disconnection.
第２図は、このような従来のMRヘッドの例の媒体対向
面の近傍の形状を示す斜視図である。第２図において、
MR素子11および21および31の両端に接続された電極12お
よび22および32は、媒体対向面13および23および33に対
して露出する面積を極力少くするため、MR素子11および
21および31から離れるほど媒体対向面から後退するよう
に配設されている。FIG. 2 is a perspective view showing a shape near the medium facing surface of such an example of the conventional MR head. In FIG.
The electrodes 12, 22 and 32 connected to both ends of the MR elements 11, 21 and 31 reduce the area exposed to the medium facing surfaces 13, 23 and 33 as much as possible.
It is arranged so that it becomes farther away from the medium facing surface as the distance from the medium 21 and 31 increases.
第２図（ａ）は媒体対向面13の加工（加工方向は矢印
Ａ）が理想的に行なわれた例であり、電極12は、MR素子
11との接続点においてのみ、その一端が媒体対向面13に
接している。このような形状においては、電極12が媒体
対向面13に対して殆ど露出していないため、信頼性の高
いMRヘッドを得ることができる。FIG. 2A shows an example in which processing of the medium facing surface 13 (processing direction is indicated by an arrow A) is ideally performed.
Only at the point of connection with 11, one end is in contact with the medium facing surface 13. In such a shape, since the electrode 12 is hardly exposed to the medium facing surface 13, a highly reliable MR head can be obtained.
第２図（ｂ）は媒体対向面の加工が深く行なわれた例
であり、MR素子21の両端で電極22が媒体対向面に大きく
露出している。このような形状においては、上述のよう
に、電極22の損傷や変形が生じやすいために信頼性が低
下する。FIG. 2B shows an example in which the processing of the medium facing surface is performed deeply, and the electrodes 22 are largely exposed at the medium facing surface at both ends of the MR element 21. In such a shape, as described above, since the electrode 22 is easily damaged or deformed, the reliability is reduced.
第２図（ｃ）は媒体対向面33の加工が浅く行なわれた
例であり、MR素子31が媒体対向面33に対して全く露出し
ていない。この場合は、電極32は、媒体対向面33に対し
て露出しないが、MR素子31と磁気記録媒体との間隔（ス
ペーシング）が大きくなり、MRヘッドの再生出力が減少
し、また分解能も低下する。FIG. 2C shows an example in which the processing of the medium facing surface 33 is performed shallowly, and the MR element 31 is not exposed to the medium facing surface 33 at all. In this case, the electrode 32 is not exposed to the medium facing surface 33, but the distance (spacing) between the MR element 31 and the magnetic recording medium increases, the reproduction output of the MR head decreases, and the resolution also decreases. I do.
上述のように、従来のMRヘッドにおいては、信頼性が
高くしかも再生出力の減少が少ない形状を得るための媒
体対向面の加工マージンが極めて狭く、このため量産性
に劣っている。また、量産性を上げるためには、電極が
媒体対向面に対して露出するような構成を採用せざるを
得ないため、信頼性が大幅に低くなっている。As described above, the conventional MR head has a very narrow processing margin on the medium facing surface for obtaining a shape with high reliability and a small decrease in reproduction output, and is therefore inferior in mass productivity. Further, in order to improve mass productivity, a configuration in which the electrodes are exposed to the medium facing surface must be adopted, so that the reliability is significantly reduced.
本発明の目的は、このような従来のMRヘッドの欠点を
除去し、信頼性が高く、しかも量産性にも優れたMRヘッ
ドを提供することにある。An object of the present invention is to eliminate such disadvantages of the conventional MR head and to provide an MR head which is highly reliable and excellent in mass productivity.
［課題を解決するための手段］ 本発明の磁気ヘッドは、 基板と、 この基板上に形成された絶縁膜と、 引出部と四角形の中央部とを有しこの絶縁膜上に形成
された磁気抵抗効果膜であり、前記中央部はその一辺が
媒体対向面に露出し、前記引出部は前記中央部の媒体対
向面から所定の位置だけ後退した位置の中央部側面を前
端として前記媒体対向面から後退する形状を有する磁気
抵抗効果膜と、 この磁気抵抗効果膜上に形成された前記磁気抵抗効果
膜と同一形状の電流シャント膜と、 この電流シャント膜上に形成され、前記磁気抵抗効果
膜と同一形状の、軟磁性薄膜（あるいはリフトフィル
ム）と、 この軟磁性薄膜上の、前記磁気抵抗効果膜の引出部の
上方に相当する位置に形成された電極膜 とから構成される。[Means for Solving the Problems] A magnetic head according to the present invention includes a substrate, an insulating film formed on the substrate, a lead portion and a square central portion, and a magnetic head formed on the insulating film. The central portion is a resistive effect film, one side of which is exposed to the medium facing surface, and the lead-out portion has the center facing side surface at a position receded by a predetermined position from the medium facing surface of the central portion as the front end, and A magneto-resistive film having a shape that recedes from the current-resisting film, a current shunt film having the same shape as the magneto-resistive effect film formed on the magneto-resistive film, and a magneto-resistive film formed on the current shunt film. A soft magnetic thin film (or a lift film) having the same shape as that of the above, and an electrode film formed on the soft magnetic thin film at a position corresponding to a position above the lead portion of the magnetoresistive film.
［実施例］ 次に、本発明の実施例について図面を参照して説明す
る。Example Next, an example of the present invention will be described with reference to the drawings.
第１図は本発明の一実施例を示す斜視図である。第１
図において、４はセラミック基板８の上に絶縁層９を介
して積層した磁気抵抗効果膜（MR膜）であり、四角形の
中央部と、その前端面から所定の寸法Ｄだけ後の位置を
前端とし、四角形の中央部の両側面から斜後方に（航空
機の翼のように）延長している取付部とを有している。
５はMR膜４の上に積層した電流シャント膜であり、MR膜
４と同じ形状を有している。６は電流シャント膜５の上
に積層したソフトフィルムであり、MR膜４と同じ形状を
有している。７は加工限界線であり、MR膜４および電流
シャント膜５およびソフトフィルム６の四角形の中央部
（これをMR素子１と称する）から距離Ｄだけ後の位置に
おけるMR素子１の前端面の媒体対向面３と平行な線であ
る。電極膜2aは、MR膜４および電流シャント膜５および
ソフトフィルム６の取付部（これらを総称して電極取付
部1bと称する）の上に積層されており、電極取付部1bと
共に電極２を形成している。このように、電極２は、MR
素子１の媒体対向面３から距離Ｄだけ後退した位置に配
設されているため、媒体対向面３の加工のとき、MR素子
１が露出してから加工限界線７までの間は、電極２は露
出していない。従って、MR素子１のみを媒体に対して露
出させ、電極２を露出させないための加工上のマージン
を大きくとることができ、信頼性が高く量産性の優れた
MRヘッドを得ることができる。FIG. 1 is a perspective view showing one embodiment of the present invention. First
In the figure, reference numeral 4 denotes a magnetoresistive effect film (MR film) laminated on a ceramic substrate 8 with an insulating layer 9 interposed therebetween. And a mounting portion extending obliquely rearward (like an aircraft wing) from both sides of the center of the square.
Reference numeral 5 denotes a current shunt film laminated on the MR film 4 and has the same shape as the MR film 4. 6 is a soft film laminated on the current shunt film 5 and has the same shape as the MR film 4. Reference numeral 7 denotes a processing limit line, and the medium on the front end face of the MR element 1 at a position that is a distance D from the center of the square of the MR film 4, the current shunt film 5, and the soft film 6 (this is called the MR element 1). This is a line parallel to the facing surface 3. The electrode film 2a is laminated on the mounting portions of the MR film 4, the current shunt film 5, and the soft film 6 (these are collectively referred to as an electrode mounting portion 1b), and forms the electrode 2 together with the electrode mounting portion 1b. doing. Thus, the electrode 2 is
Since the element 1 is disposed at a position retracted by a distance D from the medium facing surface 3, the electrode 2 is exposed from the exposure of the MR element 1 to the processing limit line 7 when the medium facing surface 3 is processed. Is not exposed. Therefore, it is possible to increase a processing margin for exposing only the MR element 1 to the medium and not exposing the electrode 2, thereby providing high reliability and excellent mass productivity.
MR head can be obtained.
本実施例においては、電極２からMR素子１に供給する
センス電流は、MR素子１全体に広がって流れる。また、
MR素子１のみが媒体に対して露出しているため、磁気記
録媒体との間隔が増加することがなく、従って再生出力
や分解能の低下は生じない。このため再生能力の高いMR
ヘッドを得ることがきる。In the present embodiment, the sense current supplied from the electrode 2 to the MR element 1 spreads throughout the MR element 1 and flows. Also,
Since only the MR element 1 is exposed to the medium, the distance between the MR element 1 and the magnetic recording medium does not increase, so that the reproduction output and the resolution do not decrease. For this reason, MR with high reproduction ability
You can get the head.
次に第１図の実施例の製造方法について説明する。 Next, the manufacturing method of the embodiment shown in FIG. 1 will be described.
まず、セラミック基板８上に絶縁層９を介してNiFeか
らなるMR膜４を形成し、次にTiからなる電流シャント膜
５を形成し、次にCoZrMoをアモルファス膜からなるソフ
トフィルム６およびAlCu合金からなる電極膜2aを順次成
膜する。成膜方法として、スパッタリング法および真空
蒸着法およびイオンビーム成膜法などを用いることがで
きる。次に、イオンミリング法を用いて、MR膜４と電流
シャント膜５とソフトフィルム６および電極膜2aとを一
括して加工し、図１の如き四角形の中央部とその両側の
取付部との形状を形成する。次に、化学エッチング法を
用いてMR素子１となる部分の電極膜2aを除去する。First, N i to form an MR film 4 consisting of F e via an insulating layer 9 on the ceramic substrate 8, and then forms a current shunt film 5 made of T i, then amorphous and C o Z r M o A soft film 6 made of a film and an electrode film 2a made of an AlCu alloy are sequentially formed. As a film formation method, a sputtering method, a vacuum evaporation method, an ion beam film formation method, or the like can be used. Next, the MR film 4, the current shunt film 5, the soft film 6, and the electrode film 2a are collectively processed by using the ion milling method, and the center of the square as shown in FIG. Form a shape. Next, the electrode film 2a in a portion to be the MR element 1 is removed by using a chemical etching method.
以上のように形成したMR素子１は、電極２から供給さ
れて、MR素子１の中を流れるセンス電流によってソフト
フィルム６が磁化され、ソフトフィルム６の発生する磁
界がMR膜４のバイアス磁界となり、MR膜４にバイアスが
与えられる。このバイアスにより、MR素子１からなる直
線性の良い応答が得られる。In the MR element 1 formed as described above, the soft film 6 is magnetized by the sense current supplied from the electrode 2 and flowing through the MR element 1, and the magnetic field generated by the soft film 6 becomes the bias magnetic field of the MR film 4. , MR film 4 is biased. With this bias, a response with good linearity composed of the MR element 1 is obtained.
なお、第１図の実施例においては、MR膜４としてNiFe
を、電流シャフト膜５としてTiを、ソフトフィルム６と
してCoZrMoアモルファス膜を用いたが、MR膜としてNiCo
を、電流シャフト膜５としてTaまたはＷまたはＣを、ソ
フトフィルムとしてCoZrNb等のCo系アモルファス膜を用
いることができる。またバイアス法として、バーバーポ
ールバイアス法や永久磁石バイアス法等の他の手段を用
いることもできる。さらに、MR素子１の上下に絶縁膜を
介して磁気シールドを配設したシールド系MRヘッドとす
ることもできる。In the embodiment of FIG. 1, as the MR film 4 N i F e
And the T i as the current shaft film 5, was used C o Z r M o amorphous film as a soft film 6, N i C o as MR film
And the T a or W or C as the current shaft film 5, it is possible to use C o based amorphous film such as C o Z r N b as a soft film. As a bias method, other means such as a barber pole bias method and a permanent magnet bias method can be used. Further, a shielded MR head in which a magnetic shield is provided above and below the MR element 1 via an insulating film may be used.
以上説明したように、本発明の磁気ヘッドは、電極を
媒体対向面から後退させ、MR素子のみを媒体対向面に露
出させることにより、信頼性が高くしかも再生能力に優
れかつ量産性のよいMRヘッドを得ることができるという
効果がある。As described above, the magnetic head of the present invention has a high reliability and an excellent reproduction capability and has a good mass productivity by retreating the electrode from the medium facing surface and exposing only the MR element on the medium facing surface. There is an effect that a head can be obtained.
第１図は、本発明の一実施例を示す斜視図、第２図は従
来のMRヘッドの一例を示す斜視図である。 １・11・21・31……MR素子、２・12・22・32……電極、
３・13・23・33……媒体対向面、４……MR膜、５……電
流シャント膜、６……ソフトフィルム、７……加工限界
線、８……セラミック基板。FIG. 1 is a perspective view showing an embodiment of the present invention, and FIG. 2 is a perspective view showing an example of a conventional MR head. 1.11,21,31 ... MR element, 2,12,22,32 ... electrode,
3.13.23.33 Medium facing surface, 4 MR film, 5 Current shunt film, 6 Soft film, 7 Processing limit line, 8 Ceramic substrate.
Claims (1)
れた磁気抵抗効果膜であり、前記中央部はその一辺が媒
体対向面に露出し、前記引出部は前記中央部の媒体対向
面から所定の位置だけ後退した位置の中央部側面を前端
として前記媒体対向面から後退する形状を有する磁気抵
抗効果膜と、 この磁気抵抗効果膜上に形成された前記磁気抵抗効果膜
と同一形状の電流シャント膜と、 この電流シャント膜上に形成され、前記磁気抵抗効果膜
と同一形状の、軟磁性薄膜と、 この軟磁性薄膜上の、前記磁気抵抗効果膜の引出部の上
方に相当する位置に形成された電極膜 とから構成される磁気ヘッド。1. A magnetoresistive film having a substrate, an insulating film formed on the substrate, a lead portion and a square central portion, the magnetoresistive film being formed on the insulating film. One side is exposed to the medium facing surface, and the lead portion has a shape in which the center portion side surface at a position receded by a predetermined position from the medium facing surface of the central portion is receded from the medium facing surface as a front end. A current shunt film having the same shape as the magnetoresistive film formed on the magnetoresistive film; a soft magnetic thin film formed on the current shunt film and having the same shape as the magnetoresistive film; An electrode film formed on the soft magnetic thin film at a position corresponding to a position above the lead-out portion of the magnetoresistive effect film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1019016A JP2702210B2 (en) | 1989-01-26 | 1989-01-26 | Magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1019016A JP2702210B2 (en) | 1989-01-26 | 1989-01-26 | Magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02198016A JPH02198016A (en) | 1990-08-06 |
| JP2702210B2 true JP2702210B2 (en) | 1998-01-21 |
Family
ID=11987691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1019016A Expired - Fee Related JP2702210B2 (en) | 1989-01-26 | 1989-01-26 | Magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2702210B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03244170A (en) * | 1990-02-22 | 1991-10-30 | Nec Corp | Magnetoresistance effect element and magnetoresistance effect head |
| JP2707850B2 (en) * | 1991-01-28 | 1998-02-04 | 日本電気株式会社 | Magnetoresistive element |
| JPH04284443A (en) * | 1991-03-14 | 1992-10-09 | Fuji Photo Film Co Ltd | Magnetic head |
| WO1992020637A1 (en) * | 1991-05-23 | 1992-11-26 | Asahi Kasei Kogyo Kabushiki Kaisha | Ceramic board having glaze, manufacturing method therefor, and electronic device using the ceramic board |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5945629A (en) * | 1982-09-07 | 1984-03-14 | Alps Electric Co Ltd | Thin film magnetic head |
| JPS61296522A (en) * | 1985-06-24 | 1986-12-27 | Nec Corp | Magnetoresistance effect head |
-
1989
- 1989-01-26 JP JP1019016A patent/JP2702210B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02198016A (en) | 1990-08-06 |
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