JP2685048B2 - Method for manufacturing substrate assembly for plasma display panel - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a substrate structure for a plasma display panel, and more particularly to a glass substrate in a firing process of insulating layers of electrodes and barrier ribs for preventing crosstalk. To a pattern forming method of electrodes or crosstalk preventing partition walls that compensates for dimensional error due to shrinkage of particles. Plasma display panels (hereinafter referred to as PD
One of the pair of substrates (referred to as P) constituting the substrate (substrate structure) is provided with an electrode having a predetermined pattern, a glass insulating layer (hereinafter abbreviated as IF layer), and a crosstalk preventing partition wall of an adjacent discharge cell. There are those sequentially laminated, and those in which an electrode is further formed on the partition wall for crosstalk prevention. On the other hand, the pattern of the electrodes and the partition wall for crosstalk prevention is becoming denser and the number of elements is increasing, and the pitch is 360 μm and the pattern layer
The number of patterns is 00 μm and the total number of patterns is 640. Therefore, there has been a demand for a method of manufacturing a panel substrate assembly having high accuracy and high work efficiency. [0004] Soda lime glass is used for the glass substrate that is the base of the PDP substrate assembly, and this material is the firing temperature of the partition wall for preventing crosstalk and the IF layer, which is 500 to 500. After 600 ° C., the shrinkage allowance is 0.0323% after one firing, 0.999679 after shrinkage, and 0.0537% after two shrinks, respectively, as compared to the dimensions before firing as shown in the representative example in FIG. It becomes 0.99473.
The shrinkage allowance is 0.02 each depending on the firing conditions.
61-0.0398%, 0.0407-0.0549%
There are variations. This shrinkage reaches 74 μm and 124 μm on a 230 mm glass substrate, respectively. When the conventional pitch is large, the pattern width is large, and the total number is small,
Although such an error can be ignored, recently, as described above, a minute and a large number of patterns with a pitch of 360 μm, an electrode width of 100 μm, and a total of 640 are used, and these contraction values have become values that cannot be ignored. . In view of the above conventional circumstances, it is an object of the present invention to provide a method of manufacturing a PDP substrate structure capable of forming a highly precise pattern of electrodes and crosstalk preventing partitions by a simple method. I am trying. According to the present invention, an electrode having a predetermined pattern is formed on a glass substrate, and an insulating layer which is fired at a predetermined temperature is formed on the electrode, and then crosstalk of the predetermined pattern is prevented. In the production of a plasma display panel substrate structure for forming partition walls, when forming a plurality of linear electrodes parallel to each other at a predetermined pitch on the glass substrate,
The electrodes are formed in a pattern in which the pitch in the width direction of the electrodes and the occupied width of all the electrodes are larger than a predetermined dimension by a dimension that allows for the amount of shrinkage of the glass substrate when firing the insulating layer, and then the insulating layer is formed. The layer is formed by applying a glass paste and baking it, and further, the crosstalk preventing partition wall is formed on the insulating layer by a parallel pattern having a predetermined interval so as to be located between the electrode patterns. A method of manufacturing a substrate structure for a plasma display panel is provided. The pattern of the electrodes formed on the glass substrate shrinks by a predetermined amount when the insulating layer is formed thereon, but the contracted pattern is the pattern of the partition for crosstalk prevention formed on the insulating layer. Since there is an appropriate positional relationship, there is substantially no positional deviation between the patterns of the electrodes and the crosstalk preventing partition. First Embodiment FIG. 1 is a configuration diagram of one substrate structure in a memory type PDP according to the first embodiment. In the figure, 1 is a glass substrate, 2 is a linear pattern electrode, 3
Is an IF layer, and 4 is a partition for crosstalk prevention. The electrode pattern 2 is formed on the glass substrate 1 by a method such as vapor deposition or sputtering. The IF layer 3 is formed by applying a glass paste on the electrode pattern 2 and then 500
It is formed by firing at ~ 600 ° C. The partition 4 for preventing crosstalk is the electrode pattern 2 after the above IF layer firing.
Is formed by the printing method so that the electrode pattern 2 is aligned correctly at the center of the pitch of the partition walls 4. Now, the dimensions of these patterns will be described with specific numerical values. The completed electrode pattern is pitch 360
In the case of μm and the total number is 640, the width occupied by all the patterns on the glass substrate (width occupied by all electrode patterns) is 0.36.
X (640-1) = 230.04 mm. Therefore,
The pitch of the electrode pattern 2 and the occupying width of all the electrode patterns before firing the IF layer 3 depend on the firing conditions of the IF layer.
Since it contracts by 9996 to 0.9998 times,
The shrinkage ratio adapted to the actual firing conditions is selected and applied. Now, as a typical value, the central value of the shrinkage ratio is 0.99.
When using 97, the following is obtained. That is, Pitch = 360 / 0.9997 = 360.11 μm Occupied width = 230.04 / 0.9997 = 230.11 mm After forming the electrode pattern 2 having this size, the IF
IF layer glass 3 is applied to form a layer, and 500 to 6
When baked at a predetermined temperature of 00 ° C., the electrode pattern shrinks together with the glass substrate 1 as described above, but the pitch after shrinkage and the entire pattern occupancy width of the partition pattern 4 for crosstalk prevention are aligned on this. Matches the pitch and width of the entire pattern. It should be noted that the shrinkage is from 2.30 depending on the firing conditions.
Since there is a variation of 3.98 × 10 ⁴ , the optimum value according to the firing conditions is determined from the above range. [Second Embodiment] The present inventors first filed Japanese Patent Application No. 60-16
In the surface discharge type gas discharge panel proposed by Japanese Patent Laid-Open No. 0952/1987, an electrode, an IF layer, a barrier for crosstalk prevention, and an electrode are sequentially laminated on one glass substrate, A firing step at 500 to 600 ° C. is included in the formation of the IF layer and the partition for crosstalk prevention. When the firing process is performed twice as described above, the shrinkage further progresses as shown in FIG. 2, and the shrinkage is 0.0537% from the size before the first firing. Therefore, in the case of having two firing steps, the dimension of the pattern to be aligned after the second firing is selected from 0.9993 to 0.9996.
The value obtained by dividing by the shrinkage ratio selected according to the firing conditions is the dimension before the first firing. The same concept is applied when the firing process is performed three times or more. According to the present invention, a highly accurate electrode pattern and crosstalk preventing partition pattern can be efficiently formed on a glass substrate by an extremely simple method.
It contributes to the quality improvement and cost reduction of PDP, and its industrial effect is great.

BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a cross-sectional view of a main part of a plasma display panel substrate assembly according to a first embodiment, and FIG. 2 is a diagram for explaining shrinkage measurement values of a glass substrate by firing. [Explanation of reference numerals] 1 glass substrate, 2 electrode pattern, 3 IF layer, 4 barrier for crosstalk prevention

Claims (1)

(57) [Claims] A method of manufacturing a substrate structure for a plasma display panel, comprising forming electrodes having a predetermined pattern on a glass substrate, forming an insulating layer that is baked at a predetermined temperature on the glass substrate, and then forming barrier ribs for preventing crosstalk having a predetermined pattern. Then, when forming a plurality of linear electrodes parallel to each other at a predetermined pitch on the glass substrate, the pitch in the width direction of the electrodes and the occupied width of all electrodes of the glass substrate when firing the insulating layer It is formed in a pattern having a size larger than a predetermined size by a size that allows for the amount of shrinkage, and then the insulating layer is formed by applying a glass paste and baking it, and further between the electrode patterns on the insulating layer. A method for manufacturing a substrate structure for a plasma display panel, characterized in that the barrier ribs for preventing crosstalk are formed by parallel patterns having a predetermined interval in relation to each other.