JPH02301934A - Manufacture of gaseous discharge panel - Google Patents

Abstract

PURPOSE:To easily form an insulating bulkhead in a mesh shape with high accuracy by sand-blasting a thick insulating layer formed on a glass substrate with resist mask patterns used. CONSTITUTION:An insulating material mainly composed of SiO2.Al2O3 is apllied on a glass substrate 21, after it has been dried, it is heat-treated while a hard insulating transparent buffer layer 22 the hardness of which is about 1.5 to 2.0 times as much as that of glass with a low fusing point, is formed. Thus, glass paste with a low fusing point is continuously applied on the surface of the layer. Then, the coated layer is dried so as to be heat-treated so that an insulating layer 23 is formed. In the second place, a resist film is applied onto the insulating layer 23, then pattering is processed so that a mask pattern 24 in a mesh shape for demarcating a discharge cell is thereby formed. Successive ly, each insulating section 23a exposed through the mask pattern 24 in a mesh shape is snad-blasted so that the section is ground so as to be removed. The insulating layer section 23a is efficiently struck out by selecting injected grain size, injection pressure, distance from am injection nozzle and the like at the time of sand-blasting.

Description

[Detailed Description of the Invention] [Summary] This invention relates to a method for manufacturing a gas discharge panel for display, particularly a method for forming insulating partition walls that define individual discharge cells configured within the gas discharge panel. The objective is to easily and accurately form an insulating layer on, for example, a mesh-like insulating partition wall by a sandblasting process using a resist mask pattern. a process of coating and forming an insulating layer for forming barrier ribs on the transparent buffer layer, a process of forming a mask pattern for defining discharge cells on the insulating layer, and a process of exposing the cells through the mask pattern. and removing only the insulating layer portion by sandblasting to form barrier ribs defining individual discharge cells on the buffer layer.

[Industrial application field]

The present invention relates to a method of manufacturing a gas discharge panel for display use, and more particularly to a method of forming insulating partition walls that define individual discharge cells configured within the gas discharge panel.

BACKGROUND ART Various types of gas discharge panels that display characters and graphics using gas discharge light have been put into practical use, such as DC1 or AC driven counter electrode discharge types and surface discharge types. In order to obtain a clear display image with good resolution, these gas discharge panels require insulating partition walls to equalize the gas discharge gap between opposing substrates and ensure independence between individual discharge cells. Particularly in color display, the partition walls are essential for preventing color crosstalk. Therefore, a method is required for forming such barrier ribs with high positional accuracy and uniform thickness between individual discharge cells.

[Conventional technology]

Conventionally, as a method for forming insulating partition walls to equalize the gas discharge gap between opposing substrates in a gas discharge panel and ensure independence between individual discharge cells, for example, surface discharge, which is a type of gas discharge panel, has been used. In the case of a type gas discharge panel, as shown in FIGS. 2(a) and 2(b), a pair of parallel scanning electrodes 3a of a pair of glass substrates 1.2 constituting the panel envelope, On the other glass substrate 2 facing one glass substrate 1, five groups of address electrodes and the like are arranged in a direction perpendicular to the scanning electrodes 3a and 3b groups, with a dielectric layer 4 interposed on the group 3b. , the one glass substrate 1
Corresponding to the discharge cells 6 constituted by the side pairs of parallel scanning electrodes 3a and 3b, the mesh-shaped insulating partitions 7 defining the discharge cells 6 are made of, for example, a low melting point glass paste. It was provided by forming a pattern using a screen printing method or the like and firing the pattern at a predetermined temperature.

[Problem 8 to be solved by the invention] However, in the method of forming the mensch-shaped insulating partition walls 7 by the conventional screen printing method using a low melting point glass paste as described above, it is difficult to use a low melting point glass paste. The thickness of the insulating film applied by one screen printing is about several μm to 7 μm, for example, 20 to 1 μm.
When forming the mensch-like insulating partition walls 7 with a film thickness of 00 μm, it is necessary to repeat the screen printing several times to several times and form them in layers. This has the disadvantage that sag occurs and pattern accuracy decreases as the film thickness increases.

In particular, in order to increase the density and resolution of discharge display, it is difficult to form the mesh-like insulating barrier ribs 7 in a pattern with a fine pitch of, for example, 0.2 mm or less due to sagging of the coating paste. Ta.

Furthermore, as the size of the display panel increases, the formation area of the mensch-like insulating partition wall 7 becomes wider than 50 cm, causing pattern misalignment due to slight elongation of the screen pattern, reducing positional accuracy and uniformity. There was a problem.

In order to solve this problem, for example, an insulating layer made of low-melting glass is formed on the entire surface of a glass substrate by a screen printing method and a baking process, and then the insulating layer is etched by a chemical etching method using a resist mask pattern. A method of forming the mesh-like insulating barrier ribs by patterning them into a predetermined mesh-like pattern has also been attempted.
In this method, as shown in FIG. 3, the side surfaces of the insulating partition walls 11 formed on the glass substrate 2 are tapered, and the insulating layer made of low-melting glass with a thickness of about 100 μm is coated with a fine film of about 0.3 μm. It was difficult to form a pattern with high precision using a pitch pattern.

For this reason, attempts have also been made to improve the pattern accuracy by patterning the insulating layer using a dry etching method using a resist mask pattern or by a sandblasting method to form mesh-like insulating partition walls. However, the former dry etching method has the disadvantage that the dry etching process requires an extremely long time, and the latter sandblasting method has the disadvantage that the inside surrounded by the partition walls that are formed is scraped down to the glass substrate surface. There was a drawback that the internal depth was uneven.

In view of the above-mentioned conventional drawbacks, the present invention enables a thick insulating layer formed on a glass substrate to be easily and precisely formed into, for example, a mesh-like insulating partition wall by a sandblasting process using a resist mask pattern. The object of the present invention is to provide a novel method for manufacturing a gas discharge panel.

[Means to solve the problem]

In order to achieve the above-mentioned object, the present invention includes the steps of coating and forming a hard insulating transparent buffer layer on the surface of a glass substrate serving as a panel envelope, and an insulating layer for forming partition walls on the buffer layer; A step of forming a mask pattern for defining discharge cells on the insulating layer, and a step of removing only the portion of the insulating layer exposed through the mask pattern by sandblasting are performed to form individual discharges on the buffer layer. The structure is configured to form partition walls that define cells.

[For production]

In the present invention, an insulating layer made of low-melting glass for forming discharge cell definition, for example, mesh-like partition walls on a glass substrate is sandblasted using SiO・Because it is formed with a hard insulating transparent buffer layer containing AfJ3 as the main component, the portion of the insulating layer exposed from the mask pattern through the mesh-like mask pattern for defining discharge cells is predetermined. By performing sandblasting under processing conditions that completely remove the insulating layer portion, the transparent buffer layer requires less grinding, and mesh-like barrier ribs for defining discharge cells can be easily patterned with high precision.

〔Example〕

Embodiments of the present invention will be described in detail below with reference to the drawings.

FIGS. 1(a) to 1(d) are sectional views of essential parts showing, in order of steps, a method for forming insulating barrier ribs for defining discharge cells on one substrate surface of a gas discharge panel according to the present invention.

First, as shown in FIG. 1(a), one glass substrate 21 of a pair of glass substrates constituting a gas discharge panel, for example.
On top, SiO□・AI! , z03 as the main component, for example, a paste-like insulating material such as Sumiceram (trade name) manufactured by Sumitomo Chemical, is applied, and after drying, heat treatment is performed at about 600 ° C to form partition walls. A hard insulating transparent buffer layer 22 having a thickness of 10 μm and having a hardness approximately 1.5 to 2.0 times as hard as low melting point glass (Mohs hardness is approximately 6) is formed, and a low melting point glass layer 22 is formed on the surface thereof. Apply glass paste.

Then, the coating layer is dried and heat treated at a firing temperature of about 600''C to form the insulating layer 23 that is to form the partition wall and has a thickness of 20 to 100 μm, for example, 100 μm in this embodiment.

Next, as shown in FIG. 1(b), a resist film is applied on the insulating layer 23, and the resist film is patterned by an exposure and development process to form a mesh-like mask pattern 24 for defining discharge cells. do.

Next, as shown in FIG. 1C, each insulating layer portion 23a exposed through the mesh-like mask pattern 24 is sandblasted to be polished away.

During this sandblasting process, since the sandblasting speed of the hard insulating transparent buffer layer 22 is much lower than that of the insulating layer 23 made of low melting point glass, the size of the abrasive grains, the jetting pressure, the jetting nozzle Processing conditions are determined in advance so that the insulating layer portion 23a is efficiently and completely removed depending on the distance between the two and the like.

After the sandblasting process is completed, the mask pattern 24 is removed using a release material to form the structure shown in FIG. 1(d).
As shown in FIG. 3, the grinding of the transparent buffer layer 22 is extremely small, and it becomes possible to easily form mesh-like partition walls 25 for defining discharge cells with good pattern accuracy.

The above embodiments are examples in which a mesh-like barrier rib for defining discharge cells corresponding to the discharge cells on the glass substrate side of the opposing electrode structure is formed on the glass substrate surface on the display side in a surface discharge type gas discharge panel. Although the present invention is not limited to such an example, for example, a surface discharge type for male display, a DC drive type, or an A
It can also be applied to the case where a mesh-like partition wall for defining discharge cells is formed on one glass substrate surface of a C-drive type opposed electrode type gas discharge panel, etc., and the same effect can be obtained.

〔Effect of the invention〕

As is clear from the above description, according to the method for manufacturing a gas discharge panel according to the present invention, a hard insulating transparent buffer with a low grinding speed by sandblasting is provided between the glass substrate and the insulating layer to form the partition wall. By interposing the layer and patterning by sandblasting through a resist mask pattern, it becomes possible to easily form mesh-like barrier ribs for defining discharge cells with a height of about 100 m with high precision. It has excellent effects.Therefore,
It is extremely advantageous to apply it to methods of manufacturing various gas discharge panels having partition walls.

[Brief explanation of drawings]

FIGS. 1(a) to 1(d) are cross-sectional views of essential parts showing, in order of steps, an embodiment of a method for forming an insulating barrier rib for defining discharge cells on one substrate surface of a gas discharge panel according to the present invention; FIG. 2(a) is a perspective view showing a substrate on the display surface side in a surface discharge type gas discharge panel; FIG. 2(b) is a perspective view showing a substrate on the electrode configuration side in the surface discharge type gas discharge panel; The figure is a sectional view of a main part illustrating problems in forming conventional insulating barrier ribs for defining discharge cells. In FIGS. 1(a) to (d), 21 is one glass substrate, 22 is a transparent buffer layer, 23 is an insulating layer, 23a is an insulating layer portion, 24 is a mesh-like mask pattern, and 25 is a mesh-like partition, respectively. show. (Q) (b) (C) <d)
Figure i Mansara Katsuoga χ Hojo 1 [Baril l-mi d1! (I: iqw
Figure 2 (Q) Figure 3

Claims (1)

[Claims] A hard insulating transparent buffer layer (22) on the surface of a glass substrate (21) serving as a panel envelope, and an insulating layer (23) for forming partition walls on the buffer layer (22). a step of forming a mask pattern (24) for defining discharge cells on the insulating layer (23); and a step of forming the insulating layer portion (23a) exposed through the mask pattern (24). A method for producing a gas discharge panel, comprising the step of: forming barrier ribs (25) on the buffer layer (22) for defining individual discharge cells by sandblasting.