JP2652383B2 - Method for producing transfer sheet having partial metal deposition layer - Google Patents

Description

Description: TECHNICAL FIELD The present invention relates to a method for producing a transfer sheet having a partial metal deposition layer.

[Conventional technology]

2. Description of the Related Art In recent years, a transfer sheet in which a metal vapor-deposited layer is partially formed and a metal glossy pattern formed by the vapor-deposited layer is made to appear while being combined with a display portion formed by a printed picture layer to enhance a design effect has attracted attention.

In producing this type of transfer sheet, usually,
First, after forming a partial metal vapor deposition layer by various methods, a pattern layer is printed and formed at a predetermined position based on the pattern of the vapor deposition layer in a two-step process.

[Problems to be solved by the invention]

However, in the conventional manufacturing method, it is necessary to provide the pattern layer accurately in synchronization with the pattern of the partial metal deposition layer (to have a certain positional relationship), and therefore, the sheet being manufactured is accurately positioned at a predetermined position. In order to perform positioning, stopping, and the like, a detection mark must be provided on the sheet to perform the positioning operation.

Further, the base material (resin film or the like) may expand and contract due to heating or the like in the step of forming the partial metal deposition layer. In such a case, the pattern layer is formed at a predetermined position even if the detection mark is provided. Was difficult. Even in the case where the base material does not expand or contract, alignment is generally performed in offline printing.
It is difficult to perform the transfer accurately, so that the partial metal deposition layer and the pattern layer are formed out of alignment, and as a result, there is a disadvantage that the design effect of the obtained transfer sheet is not sufficiently exhibited.

The present invention has been made in view of the above points, and the pattern layer is formed at the same time as the formation of the partial metal deposition layer, and both are precisely synchronized with each other, particularly, the end of the pattern layer which is synchronized with the end of the partial metal deposition layer. It is another object of the present invention to provide a method for producing a transfer sheet that can be formed sharp and sharp.

[Means for Solving the Problems] The present invention provides (1) a release layer provided on one surface of a heat-resistant base material,
After providing a metal vapor deposition layer on the front surface on the release layer, a transparent resist layer is formed with an ink having good acid or alkali resistance and good adhesion to the metal vapor deposition layer at a necessary vapor deposition position on the metal vapor deposition layer. Then, at least on the resist layer, a pattern layer is formed with a printing ink having low adhesion to the metal deposition layer so as to proudly cover both the resist layer and the metal deposition layer around the resist layer. After that, the metal vapor deposition layer and the pattern layer immediately above the metal vapor deposition layer in the non-formed portion of the resist layer are immersed in an acid or alkali solution to dissolve and remove both the metal vapor deposition layer and the end of the pattern layer and the metal vapor deposition layer. Forming a partial metal vapor deposition layer in a state where the end is aligned, a method of manufacturing a transfer sheet having a partial metal vapor deposition layer characterized by thereafter providing an adhesive layer on the entire surface,
(2) The method for producing a transfer sheet according to the above (1), wherein a heat-resistant resin layer is provided on the release layer, and then a metal deposition layer is provided.
(3) The method for producing a transfer sheet according to the above (1), wherein the release layer is provided on the heat-resistant substrate, and then the release layer is provided.

〔Example〕

 Hereinafter, embodiments of the present invention will be described with reference to the drawings.

The heat-resistant substrate used in the present invention has a thickness of 12 to
100 μm polyethylene film, a 12 to 100 μm thick nylon film, a resin film having heat resistance such as a 12 to 50 μm thick polypropylene film,
Preferably, it is a polyethylene film having a thickness of 25 to 50 μm.

In the manufacturing method of the present invention, first, a release layer 2 is provided on one surface of a heat-resistant base material 1 as shown in FIG.

The peeling layer 2 is for allowing the peeling operation to be performed more favorably when the base material 1 is peeled after the transfer, and for playing a role of protecting the surface of the transfer sheet after the transfer. Examples of the material include methacrylic acid resin, methacrylic acid resin and copolymer of styrene and acrylic acid, vinyl chloride resin, rubber chloride, environmental rubber, vinyl chloride-vinyl acetate copolymer, nitrocellulose, cellulose acetate butyrate, and the like. Then, these resins are applied by an application means such as gravure coating, roll coating, silk screen printing, offset printing or the like to form the release layer 2. The thickness of the release layer 2 is 0.2 to 5 μm
m, preferably 0.5 to 2 μm.

Next, a metal is deposited on the entire surface of the release layer 2 to provide a metal deposition layer 3. The layer 3 is formed by depositing a metal such as aluminum, chromium, antimony, copper, silver, or an alloy thereof by a vacuum deposition method, an ion plating method, a sputtering method, or the like. The thickness of the vapor deposition layer 3 is 100 to 1000 mm, preferably 3
It is 00-400〜.

After forming the metal vapor deposition layer 3, a transparent resist layer 4 is provided on the layer 3 at a necessary position on the vapor deposition layer. The resist layer 4 has an acid or alkali resistance and is formed in a pattern with an ink having good adhesion to a metal deposition layer. As the ink, a mixture of a vinyl chloride-vinyl acetate copolymer and an acrylic resin, Examples thereof include a mixture of a polyamide and a nitrocellulose resin, a mixture of a vinyl chloride-vinyl acetate copolymer, an isocyanate compound, and an acrylic resin, a polyurethane resin, and an epoxy resin. The resist layer 4 is formed to have the same thickness as the release layer 2 by printing means such as silk screen printing or offset printing.

Next, a pattern layer 5 on which various patterns, coloring, and the like are applied is provided on at least the resist layer 4. Since the picture layer 5 is configured as various display sections in combination with the metallic luster by the partial metal vapor deposition layer described later, it is formed at a predetermined position on the resist layer 4 which is integral with the vapor deposition layer (positionally the same). You. In the case where the picture layer 5 is provided in the partial metal deposition layer (resist layer 4) as shown by 5a in FIG. 1, the picture layer 5 may be formed on the resist layer 4 only at a desired position. In the case where the end of the pattern layer 5 is provided in synchronization with the end of the partial metal deposition layer, it is preferable to extend over the metal deposition layer 3 beyond the resist layer 4 as shown by 5b and 5c in FIG. It is formed. The ink used for forming the picture layer 4 is a printing ink having low adhesion to the metal deposition layer 3, and specific examples include cellulose-based inks and vinyl chloride-based inks such as vinyl chloride-vinyl acetate copolymer. No. The printing means and the thickness of the pattern layer 4 are the same as those of the resist layer 4.

As shown in FIG. 1, the sheet on which the pattern layer 5 has been formed is immersed in an acid or alkali solution to perform an etching treatment. By this immersion, a portion of the metal deposition layer 3 corresponding to a portion where the resist layer 4 is not formed is dissolved and removed, and as a result, a partial metal deposition layer 6 is formed as shown in FIG. In the etching treatment, the substrate is immersed in an acid or alkali solution having a liquid temperature of 45 to 50 ° C. for 10 to 30 seconds, and then washed with water and dried. As the acid solution, an aqueous solution of an organic acid or inorganic acid such as about 1 N hydrochloric acid is used, and as the alkaline solution, 0.2 to 0.5
An aqueous solution of an organic or inorganic base such as sodium hydroxide of N is used.

Here, the partial metal deposition layer 6 is formed by the etching process.
Is formed, and the resist layer 4 shown in FIG.
The pattern layer portion 5d provided on the metal deposition layer 3 is also formed of ink having low adhesion to the deposition layer 3, so that the pattern layer portion 5d and the metal deposition layer 3 immediately below the portion are formed. The etchant enters the interface of the substrate and is dissolved and removed. As a result, as shown in FIG. 2, pattern layers 5b and 5c whose edges are sharply etched similarly to the partial metal deposition layer 6 are formed.

Next, an adhesive is applied to the entire surface by a conventionally known means to provide an adhesive layer 7, whereby a transfer sheet 8 according to the production method of the present invention as shown in FIG. 3 is obtained. Acrylic resin, vinyl acetate resin, vinyl chloride
Vinyl acetate copolymer, olefin resin, rubber resin,
An epoxy resin, a diallyl phthalate resin, or a mixture of an epoxy resin, a melamine resin, and an acrylic resin is used.

In the manufacturing method of the present invention, a peelability adjusting layer 9 can be provided on the substrate 1 as shown in FIG. 5 before forming the release layer 2. The adjustment layer 9 is a layer for adjusting the degree of releasability of the substrate 1, and is peeled off from the surface of the release layer 2 integrally with the substrate 1 at the time of peeling. By providing this layer 9, it is possible to prevent the substrate 1 and the release layer 2 from being thermally fused by heating in the process of forming the partial metal deposition layer 6 (heating for drying or the like), thereby preventing difficulty in peeling. In addition, the degree of the releasability of the substrate 1 can be freely adjusted. The material of the adjustment layer 9 is a polyurethane resin, a polyester resin, an epoxy resin, a melamine resin, or the like, and among them, a melamine resin is preferable. The adjustment layer 9 is 0.1 to 1 μm by gravure coating, roll coating, offset printing, or the like using the above resin. It is formed by coating to a thickness of.

Prior to forming the metal deposition layer 3 according to the present invention, a heat-resistant resin layer was formed on the release layer 2 as shown in FIG.
10 can be provided. By providing the resin layer 10, expansion and contraction of the base material 1 caused by heating in the step of forming the partial metal deposition layer 6 and heating during transfer can be prevented. Examples of the material of the resin layer 10 include an epoxy resin, a urethane resin, a urethane-based resin, and an epoxy-based ultraviolet curable resin.These resins are applied by gravure coating, roll coating, silk screen printing, offset printing, or the like. To form a resin layer 10. The thickness of the resin layer 10 is 0.2 to
It is 3 μm, preferably 0.5 to 2 μm.

Further, in the manufacturing method of the present invention, the partial metal deposition layer 6 or a portion where the deposition layer 6 is not provided, that is, the release layer 2
A hologram image layer can be provided at a predetermined position on the (or heat-resistant resin layer 10). By providing this image layer, a design effect by a hologram image can be imparted in addition to the design of the picture layer 5 and the partial metal vapor deposition layer 6, thereby obtaining a transfer sheet having a more excellent design effect. it can. The hologram image layer is formed by vapor-depositing a metal such as aluminum to form a metal vapor-deposited layer, and press-forming the hologram image on the thin film layer by a known method such as a hot embossing method. The thickness of the image layer is preferably from 200 to 300 °.

The transfer sheet 8 obtained by the manufacturing method of the present invention having the above-described configuration is used after being back-transferred to a transfer receiving body 11 made of a transparent base material as shown in FIG. Back transfer is a transfer object consisting of a transparent substrate as shown in the figure.
After the adhesive layer 7 is brought into contact with the back surface of the substrate 11 and heated and pressurized, the transfer is performed by peeling and removing the base material 1, and the transfer object 11 is removed.
Is a transfer method in which the pattern layer 5 and the partial metal deposition layer 6 can be observed from the surface side of the substrate. In order to perform this back transfer, in the present invention, the resist layer 4 is configured to be transparent, so that even when the back transfer is performed, the partial metal vapor deposition layer 6 located below the resist layer 4 forms the resist layer 4. It can be seen through.

Next, the present invention will be described in more detail with reference to specific examples.

Example A melamine-based resin (manufactured by DAINICHI SEIKA: EX114D) was gravure coated on one surface of a polyethylene terephthalate film (manufactured by DiaWheel: S type) having a thickness of 38 μm so that the basis weight when dried was 0.1 g / m ² . Thereafter, the resultant was dried at 170 ° C. for 40 seconds to form a release-adjusting layer. Then an acrylic resin (Showa Ink Kogyo: "peeled off 35") on the after basis weight during drying was gravure coated as a 2 g / m ^2, and further the basis weight of the dry by gravure coating on the Is 1g / m
² so as to polyurethane-based resin (Moroboshi ink made: UMN
o.15), and then aluminum was vacuum-deposited on the entire surface to form a metal-deposited layer having a thickness of 300 mm. A 1.2 μm-thick transparent resist layer was formed on this vapor-deposited layer by pattern screen printing using an ink composed of a polyurethane-based resin (manufactured by Dainichi Seika: VMAL). A pattern layer was formed by silk screen printing using an ink consisting of TASS (manufactured by Ink Industries, Ltd.).

Next, the substrate is immersed in a 1% aqueous solution of sodium hydroxide to perform etching, and the metal deposition layer in the portion where the resist layer is not provided is dissolved and removed to form a partial metal deposition layer. An adhesive layer made of a base resin (TACSHS, manufactured by Showa Ink Industries, Ltd.) was formed to obtain a transfer sheet.

In this transfer sheet, the picture layer and the partial metal vapor-deposited layer were formed precisely in synchronization with each other, and particularly, the picture layer to be provided in a state in which the vapor-deposited layer was aligned with the ends had clear edges.

〔The invention's effect〕

As described above, the manufacturing method of the present invention is formed with an ink having low adhesion to the metal deposition layer of the picture layer, and is formed simultaneously with the partial metal deposition layer. As described above, there is no need to perform a positioning operation (providing a detection mark) for synchronizing the pattern layer with the partial metal deposition layer, and forming the pattern layer and the partial metal deposition layer accurately and quickly. It is particularly effective when the pattern layer is provided in alignment with the end of the partial metal deposition layer, and as a result, the design effect is achieved by the synergistic effect of the display effect of the pattern layer and the metallic luster of the partial metal deposition layer. An excellent transfer sheet can be obtained.

Further, in the present invention, since the pattern layer and the partial metal vapor deposition layer are formed at once, even if the base material or the like expands or contracts, the pattern layer and the partial metal vapor deposition layer are formed as in the conventional transfer sheet manufacturing method. There is an advantage that it is difficult to tune and there is no risk of being formed out of alignment. In particular, the invention of the present application is to form a printing ink for a pattern layer with a printing ink having low adhesion to a metal vapor deposition layer, and to straddle the pattern layer on both the resist layer and the metal vapor deposition layer around the resist layer. Then, by adopting a configuration in which the metal vapor deposition layer on the non-formed portion of the resist layer and the picture layer immediately above the metal vapor deposition layer are both dissolved and removed, the metal vapor deposition layer and the picture layer are etched at the time of etching. The etchant penetrates the interface with the metal layer, and the pattern layer on the metal deposition layer without the resist layer is easily removed. As a result, a pattern in which the metal vapor deposition layer and the picture layer overlap is obtained, and the ends of both layers are aligned in the overlapping portion of the two, and the pattern in which the positions are accurately synchronized is the registration accuracy at the time of printing, the time of the vapor deposition processing, Is reliably obtained without being affected by the expansion and contraction of the sheet.

[Brief description of the drawings]

The drawings show one embodiment of the present invention. FIGS. 1 to 3 are longitudinal sectional views showing each step of the manufacturing method of the present invention, and FIG. 4 is a reverse transfer of a transfer sheet obtained by the method of the present invention. FIG. 5 is a longitudinal sectional view showing a state of the transfer sheet obtained by the method of the present invention. DESCRIPTION OF SYMBOLS 1 ... Heat resistant base material 2 ... Release layer 3 ... Metal vapor deposition layer 4 ... Transparent resist layer 5 ... Picture layer 6 ... Partial metal vapor deposition layer 7 ... Adhesive layer

Claims (3)

(57) [Claims] 1. A heat-resistant base material having a release layer provided on one side thereof, a metal deposition layer provided on the entire surface of the release layer, and having a resistance to acid or alkali at a required position on the metal deposition layer. A transparent resist layer is formed with an ink having good adhesion with the metal deposition layer, and then, at least on the resist layer, a pattern layer is formed on the resist layer with a printing ink having low adhesion with the metal deposition layer on and around the resist layer. The metal deposition layer is formed so as to cover both the metal deposition layer and the metal deposition layer, and thereafter, is immersed in an acid or alkali solution to form both the metal deposition layer on the non-formed portion of the resist layer and the pattern layer immediately above the metal deposition layer. Dissolving and removing, forming a partial metal deposition layer in a state where the end of the picture layer and the end of the metal deposition layer are aligned, and thereafter providing an adhesive layer on the entire surface; A method for producing a transfer sheet having: 2. The method for producing a transfer sheet according to claim 1, wherein a heat-resistant resin layer is provided on the release layer, and then a metal deposition layer is provided. 3. After providing a releasability adjusting layer on a heat resistant substrate,
The method for producing a transfer sheet according to claim 1, wherein a release layer is provided.