JP2605312B2 - Flattening method for color solid-state imaging device surface - Google Patents
Flattening method for color solid-state imaging device surfaceInfo
- Publication number
- JP2605312B2 JP2605312B2 JP62301376A JP30137687A JP2605312B2 JP 2605312 B2 JP2605312 B2 JP 2605312B2 JP 62301376 A JP62301376 A JP 62301376A JP 30137687 A JP30137687 A JP 30137687A JP 2605312 B2 JP2605312 B2 JP 2605312B2
- Authority
- JP
- Japan
- Prior art keywords
- light receiving
- transparent resin
- scribe
- section
- region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000003384 imaging method Methods 0.000 title claims description 15
- 238000000034 method Methods 0.000 title claims description 6
- 239000011347 resin Substances 0.000 claims description 42
- 229920005989 resin Polymers 0.000 claims description 42
- 238000000926 separation method Methods 0.000 claims description 18
- 238000009825 accumulation Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 24
- 239000003086 colorant Substances 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
Landscapes
- Transforming Light Signals Into Electric Signals (AREA)
- Color Television Image Signal Generators (AREA)
- Solid State Image Pick-Up Elements (AREA)
Description
【０００１】[0001]
本発明は、色分解フィルターが固体撮像素子の上に設
けられているカラー固体撮像素子表面の平坦化方法に関
する。The present invention relates to a method for flattening a surface of a color solid-state imaging device in which a color separation filter is provided on a solid-state imaging device.
【０００２】[0002]
固体撮像素子は、第３図に示す様に蓄積領域11（電荷
蓄積部）と受光領域12とスクライブ部13（回路素子とし
て裁断されるスクライブライン部分、若しくは基板に多
面付けした回路素子毎に小片状に裁断するスクライブラ
イン部分）の各々高さが異なる。また、受光領域12で
も、受光領域14と非受光部15では、高さが異なる。 その為に、我々は先願において、固体撮像素子上の凹
凸が感光性透明樹脂を付与する事で全面が平坦化された
平坦面上に色分解フィルターを設ける技術を開示した。As shown in FIG. 3, the solid-state imaging device includes a storage area 11 (charge storage section), a light receiving area 12, and a scribe section 13 (a scribe line portion cut as a circuit element, or a small circuit element for each circuit element mounted on a substrate). Each of the scribe line portions cut into flakes has a different height. Also in the light receiving region 12, the light receiving region 14 and the non-light receiving portion 15 have different heights. Therefore, in the prior application, we have disclosed a technique in which a color separation filter is provided on a flat surface whose entire surface is flattened by applying a photosensitive transparent resin to irregularities on a solid-state imaging device.
【０００３】[0003]
上述のようなカラー固体撮像素子に於いて平坦面を形
成した場合において、例え平坦になったとしても、次の
色分解フィルターを形成する場合、その色分解フィルタ
ーは、まず感光性透明樹脂を全面に塗布し、プリベーク
し、画素部を除いたパターンマスクを載せてから露光
し、現像し、ポストベークする。In the case where a flat surface is formed in the color solid-state imaging device as described above, even if the surface is flat, when forming the next color separation filter, the color separation filter firstly covers the photosensitive transparent resin over the entire surface. Is applied, prebaked, a pattern mask excluding the pixel portion is placed, exposed, developed, and postbaked.
【０００４】 二色目以降も同様に形成する。しかし、平坦面上に感
光性透明樹脂を形成する場合には、スピンコートして感
光性透明樹脂液を均一にして乾かそうとするものであ
る。しかしながら例えスピンコートしたとしても、下地
が透明樹脂と金属層若しくはシリコン層とでは、親和性
や表面粗さが相違し、均一な厚さを持つ膜とはならな
い。この感光性透明樹脂はパターン化され染色されるわ
けでこれにより色分解フィルターの色濃度に直接影響さ
れる。従って、色濃度にムラのあるカラーフィルターが
形成される事となる。The second and subsequent colors are formed in the same manner. However, when a photosensitive transparent resin is formed on a flat surface, the photosensitive transparent resin liquid is uniformly dried by spin coating. However, even if it is spin-coated, the affinity and surface roughness are different between the transparent resin and the metal layer or the silicon layer, and the film does not have a uniform thickness. This photosensitive transparent resin is patterned and dyed, which directly affects the color density of the color separation filter. Therefore, a color filter having uneven color density is formed.
【０００５】[0005]
本発明は、表面の最も高い位置にある蓄積領域11及び
パッド部16と、次に高い位置にある受光領域12の非受光
部15と、最も低い位置にある上記受光領域12の受光部14
及びスクライブ部13とを有し、且つ色分解フィルターを
有するカラー固体撮像素子表面を平坦化する方法におい
て、 最も低い位置にある前記スクライブ部13及び前記受光
領域12の受光部14に選択的に第一の感光性透明樹脂を充
填して、前記受光領域12及びスクライブ部13を、前記受
光領域12の非受光部15の高さと同じ高さになるように平
坦化する第一工程、 次に、平坦化された前記受光領域12及びスクライブ部
13に選択的に第二の感光性透明樹脂を充填して、前記受
光領域12及びスクライブ部13を、最も高い位置にある前
記蓄積領域11の高さと同じ高さになるように平坦化する
第二工程、 次に、前記パッド部を除く平坦化された前記蓄積領域
及び受光領域12及びスクライブ部13の全面に第三の感光
性透明樹脂を被覆して平坦層23を設ける第三工程、 最後に、前記平坦層23上に色分解フィルターを設ける
第四工程、 とを備えることを特徴とするカラー固体撮像素子表面の
平坦化方法である。The present invention includes a storage area 11 and a pad section 16 at the highest position on the surface, a non-light receiving section 15 of the light receiving area 12 at the next highest position, and a light receiving section 14 of the light receiving area 12 at the lowest position.
And a scribe section 13, and a method of flattening the surface of the color solid-state imaging device having a color separation filter, wherein the scribe section 13 at the lowest position and the light receiving section 14 of the light receiving area 12 are selectively placed on the light receiving section 14. Filling one photosensitive transparent resin, the first step of flattening the light receiving region 12 and the scribe portion 13 so as to have the same height as the height of the non-light receiving portion 15 of the light receiving region 12, Flattened light receiving area 12 and scribe section
13 is selectively filled with a second photosensitive transparent resin, and the light receiving region 12 and the scribe portion 13 are flattened so as to have the same height as the height of the accumulation region 11 at the highest position. A second step of providing a flat layer 23 by coating a third photosensitive transparent resin on the entire surface of the flattened accumulation region and light receiving region 12 and the scribe portion 13 excluding the pad portion; And a fourth step of providing a color separation filter on the flat layer 23.
【０００６】[0006]
本発明によれば、第一の感光性透明樹脂と、第二の感
光性透明樹脂が、順次低い位置から順に充填され、第三
の樹脂を被覆する際には、その被覆部位のほぼ全面が同
一材料となり、その親和力や粗さが同一となるため、こ
の第三の樹脂を均一な厚さに被覆して、その表面を平坦
化できるものである。According to the present invention, the first photosensitive transparent resin and the second photosensitive transparent resin are filled in order from a lower position, and when covering the third resin, almost the entire covering portion is covered. Since the same material is used and the affinity and the roughness are the same, the third resin can be coated to a uniform thickness and its surface can be flattened.
【０００７】[0007]
本発明の実施の形態につき、図面を用いて詳細に説明
する。 第１図は、本発明の一実施例を示す部分側断面図、第
２図は、第一の感光性透明樹脂による透明樹脂層形成前
の側断面図、第３図は、第一の感光性透明樹脂による透
明樹脂層形成後の側断面図、第４図は、第二の感光性透
明樹脂による透明樹脂層形成後の側断面図、第５図は、
第三の感光性透明樹脂による平坦層形成後の側断面図で
ある。Embodiments of the present invention will be described in detail with reference to the drawings. FIG. 1 is a partial side sectional view showing an embodiment of the present invention, FIG. 2 is a side sectional view before a transparent resin layer is formed by a first photosensitive transparent resin, and FIG. FIG. 4 is a side cross-sectional view after forming a transparent resin layer using a transparent resin, FIG. 4 is a side cross-sectional view after forming a transparent resin layer using a second photosensitive transparent resin, and FIG.
It is a sectional side view after flat layer formation by the 3rd photosensitive transparent resin.
【０００８】 この固体撮像素子は、パッド部16と蓄積領域11が特に
高く形成され、この部分が他より高い。また、スクライ
ブ部13とパッド部16と蓄積領域11と受光領域12の受光部
14と非受光部15とを除いたほぼ全面は、ほぼその高さが
同じ様になっている。また、スクライブ部13と受光部14
については、他より低くなっている。この状態は、第２
図で示されている。この様な固体撮像素子に対し、その
全面に第一の感光性透明樹脂を塗布し、非受光部15の高
さと同じ高さになるようにスクライブ部13と受光部14
（非受光部15、15の間）に、該第一の感光性透明樹脂を
充填する。In this solid-state imaging device, the pad portion 16 and the accumulation region 11 are formed particularly high, and this portion is higher than the others. In addition, the scribe section 13, the pad section 16, the storage area 11, and the light receiving section of the light receiving area 12
Almost the entire surface except for the non-light receiving portion 14 and the non-light receiving portion 15 has almost the same height. The scribe section 13 and the light receiving section 14
About, it is lower than others. This state is the second
This is shown in the figure. A first photosensitive transparent resin is applied to the entire surface of such a solid-state imaging device, and the scribe unit 13 and the light receiving unit 14 are set to have the same height as the non-light receiving unit 15.
(Between the non-light receiving portions 15 and 15) is filled with the first photosensitive transparent resin.
【０００９】 次にプリベークした後、この第一の感光性透明樹脂上
より、スクライブ部13と受光部14を除いたパターンのマ
スクを用いて露光し、現像し、ポストベークを行い、第
３図に示した様な、スクライブ部13と受光部14とに、第
一層目の透明樹脂層21が設けられた状態にして、該受光
領域12からスクライブ部13にかけて平坦化する。Next, after pre-baking, the first photosensitive transparent resin is exposed to light using a mask having a pattern excluding a scribe portion 13 and a light-receiving portion 14, developed, and post-baked. In the state where the first layer of the transparent resin layer 21 is provided in the scribe section 13 and the light receiving section 14 as shown in (1), flattening is performed from the light receiving area 12 to the scribe section 13.
【００１０】 次に、その上から全面に第二の感光性透明樹脂を塗布
し、最も高い蓄積領域11の高さ同じ高さになるように、
該第二の感光性透明樹脂を充填し、プリベークし、更に
蓄積領域11とパッド部16のみパターンでマスクし、露光
したあと現像し、ポストベークを行う事によって、第４
図に示した様な、前記平坦化した受光領域12の非受光部
15上からスクライブ部13にかけて、第二層目の透明樹脂
層22が設けられて、平坦な平坦面を有する固体撮像素子
を得る。Next, a second photosensitive transparent resin is applied to the entire surface from above, so that the height of the highest accumulation region 11 is the same as the height of the accumulation region 11.
The second photosensitive transparent resin is filled, pre-baked, and only the accumulation region 11 and the pad portion 16 are masked with a pattern, exposed, developed, and post-baked.
Non-light-receiving part of the flattened light-receiving area 12, as shown in the figure
A second layer of transparent resin layer 22 is provided from above 15 to the scribe section 13 to obtain a solid-state imaging device having a flat flat surface.
【００１１】 この平坦面上に第三の感光性透明樹脂をスピンコート
で全面に塗布し、プリベークした後、パッド部16のみの
パターンでマスクし、露光したあと現像し、ポストベー
クを行う事によって平坦化して平坦層23を設け、第５図
の様な固体撮像素子を得る。A third photosensitive transparent resin is spin-coated on the entire flat surface, pre-baked, masked with a pattern of only the pad portion 16, exposed, developed, and post-baked. After flattening, a flat layer 23 is provided to obtain a solid-state imaging device as shown in FIG.
【００１２】 この後、この平坦層23上に、全面に一色目の色分解フ
ィルター用の着色樹脂を塗布し、該着色樹脂上より画素
部以外をマスクした上で露光し、現像した後染色し、一
色目の色分解フィルター31を設ける。この上に更に感光
性透明樹脂を全面に設けた後にプリベークし、パッド部
16のパターンのマスクを載せて露光し、現像し、ポスト
ベークを行い、透明な中間層51を得る。二色目以降につ
いても、同様に二色目の色分解フィルター32、透明な中
間層52、三色目の色分解フィルター33、透明な上部保護
層53を設け、第１図の様なカラー固体撮像素子を得る。Thereafter, a coloring resin for a first color separation filter is applied to the entire surface of the flat layer 23, the mask is applied to a portion other than the pixel portion from the coloring resin, and then exposed, developed, and dyed. , A first color separation filter 31 is provided. After further providing a photosensitive transparent resin on the entire surface, prebaking is performed, and a pad portion is formed.
A mask having 16 patterns is placed thereon, exposed, developed, and post-baked to obtain a transparent intermediate layer 51. For the second and subsequent colors, similarly, a second color separation filter 32, a transparent intermediate layer 52, a third color separation filter 33, and a transparent upper protective layer 53 are provided, and a color solid-state imaging device as shown in FIG. obtain.
【００１３】[0013]
本発明のカラー固体撮像素子表面の平坦化方法によれ
ば、色分解フィルターの厚みがほぼ一定となり、特に蓄
積領域等の盛り上がった形状の部分に近い領域において
も、均一な厚さの色分解フィルターとなり、分光特性も
均一となる。According to the method of flattening the surface of the color solid-state imaging device of the present invention, the thickness of the color separation filter becomes substantially constant, and especially in the region close to the raised portion such as the accumulation region, the color separation filter having a uniform thickness. And the spectral characteristics are also uniform.
【図面の簡単な説明】[Brief description of the drawings]
【第１図】 本発明の実施の形態を示す部分側断面図。FIG. 1 is a partial side sectional view showing an embodiment of the present invention.
【第２図】 本発明の実施の形態を示す第一層目の透明樹脂層形成前
の側断面図。FIG. 2 is a side cross-sectional view showing an embodiment of the present invention before forming a first transparent resin layer.
【第３図】 本発明の実施の形態を示す第一の感光性透明樹脂による
平坦化された第一層目の透明樹脂層形成後の側断面図。FIG. 3 is a side sectional view showing a flattened first transparent resin layer made of a first photosensitive transparent resin according to an embodiment of the present invention.
【第４図】 本発明の実施の形態を示す第二の感光性透明樹脂による
平坦化された第二層目の透明樹脂層形成後の側断面図。FIG. 4 is a side cross-sectional view showing a flattened second transparent resin layer made of a second photosensitive transparent resin according to the embodiment of the present invention.
【第５図】 本発明の実施の形態を示す第三の感光性透明樹脂による
平坦層形成後の側断面図。FIG. 5 is a sectional side view after a flat layer is formed with a third photosensitive transparent resin according to the embodiment of the present invention.
【第６図】 本発明の実施の形態を示す完成後のカラー固体撮像素子
の平面図。FIG. 6 is a plan view of a completed color solid-state imaging device showing an embodiment of the present invention.
11……蓄積領域、12……受光領域、13……スクライブ
部、14……受光部 15……非受光部、16……パッド部 21……第一層目の透明樹脂層、22……第二層目の透明樹
脂層 23……平坦層 31……一色目の色分解フィルター、32……二色目の色分
解フィルター 33……三色目の色分解フィルター 51、52……透明な中間層、53……透明な上部保護層11: accumulation area, 12: light receiving area, 13: scribe section, 14: light receiving section 15, non-light receiving section, 16: pad section 21: first transparent resin layer, 22 ... Second transparent resin layer 23 Flat layer 31 First color separation filter 32 Second color separation filter 33 Third color separation filter 51, 52 Transparent intermediate layer , 53 …… Transparent upper protective layer
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭62−78502（ＪＰ，Ａ) ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-62-78502 (JP, A)
Claims (1)
パッド部16と、次に高い位置にある受光領域12の非受光
部15と、最も低い位置にある上記受光領域12の受光部14
及びスクライブ部13とを有し、且つ色分解フィルターを
有するカラー固体撮像素子表面を平坦化する方法におい
て、 最も低い位置にある前記スクライブ部13及び前記受光領
域12の受光部14に選択的に第一の感光性透明樹脂を充填
して、前記受光領域12及びスクライブ部13を、前記受光
領域12の非受光部15の高さと同じ高さになるように平坦
化する第一工程、 次に、平坦化された前記受光領域12及びスクライブ部13
に選択的に第二の感光性透明樹脂を充填して、前記受光
領域12及びスクライブ部13を、最も高い位置にある前記
蓄積領域11の高さと同じ高さになるように平坦化する第
二工程、 次に、前記パッド部を除く平坦化された前記蓄積領域及
び受光領域12及びスクライブ部13の全面に第三の感光性
透明樹脂を被覆して平坦層23を設ける第三工程、 最後に、前記平坦層23上に色分解フィルターを設ける第
四工程、 とを備えることを特徴とするカラー固体撮像素子表面の
平坦化方法。1. A storage region 11 and a pad portion 16 at the highest position on the surface, a non-light receiving portion 15 of a light receiving region 12 at the next highest position, and a light receiving portion 14 of the light receiving region 12 at the lowest position.
And a scribe section 13, and a method of flattening the surface of the color solid-state imaging device having a color separation filter, wherein the scribe section 13 at the lowest position and the light receiving section 14 of the light receiving area 12 are selectively placed on the light receiving section 14. Filling one photosensitive transparent resin, the first step of flattening the light receiving region 12 and the scribe portion 13 so as to have the same height as the height of the non-light receiving portion 15 of the light receiving region 12, Flattened light receiving area 12 and scribe section 13
A second photosensitive transparent resin, and the light receiving region 12 and the scribe portion 13 are flattened so as to have the same height as the height of the accumulation region 11 at the highest position. Next, a third step of providing a flat layer 23 by coating a third photosensitive transparent resin on the entire surface of the flattened accumulation region and light receiving region 12 and the scribe portion 13 excluding the pad portion, And a fourth step of providing a color separation filter on the flat layer 23.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62301376A JP2605312B2 (en) | 1987-11-28 | 1987-11-28 | Flattening method for color solid-state imaging device surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62301376A JP2605312B2 (en) | 1987-11-28 | 1987-11-28 | Flattening method for color solid-state imaging device surface |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01143483A JPH01143483A (en) | 1989-06-06 |
| JP2605312B2 true JP2605312B2 (en) | 1997-04-30 |
Family
ID=17896129
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62301376A Expired - Lifetime JP2605312B2 (en) | 1987-11-28 | 1987-11-28 | Flattening method for color solid-state imaging device surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2605312B2 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5978568A (en) * | 1982-10-28 | 1984-05-07 | Toshiba Corp | Manufacture of color solid-state image pick-up element |
| JPH0677083B2 (en) * | 1983-09-20 | 1994-09-28 | 株式会社東芝 | Method for manufacturing color filter |
| JPS60106167A (en) * | 1983-11-14 | 1985-06-11 | Mitsubishi Electric Corp | Manufacture of color image sensor |
| JPH0685003B2 (en) * | 1985-06-17 | 1994-10-26 | 富士写真フイルム株式会社 | Solid color image sensor |
| JPS6278502A (en) * | 1985-10-01 | 1987-04-10 | Toshiba Corp | Color solid state image pickup element and its production |
-
1987
- 1987-11-28 JP JP62301376A patent/JP2605312B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01143483A (en) | 1989-06-06 |
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