JP2604593B2 - Method of forming solder coating on metal surface - Google Patents

Method of forming solder coating on metal surface

Info

Publication number
JP2604593B2
JP2604593B2 JP62120863A JP12086387A JP2604593B2 JP 2604593 B2 JP2604593 B2 JP 2604593B2 JP 62120863 A JP62120863 A JP 62120863A JP 12086387 A JP12086387 A JP 12086387A JP 2604593 B2 JP2604593 B2 JP 2604593B2
Authority
JP
Japan
Prior art keywords
solder
lead
tin
metal
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62120863A
Other languages
Japanese (ja)
Other versions
JPS63114979A (en
Inventor
政直 河野
吉弘 長谷川
康隆 西
久夫 入江
辰二 水田
伸介 小原
Original Assignee
ハリマ化成 株式会社
古河電気工業 株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ハリマ化成 株式会社, 古河電気工業 株式会社 filed Critical ハリマ化成 株式会社
Priority to JP62120863A priority Critical patent/JP2604593B2/en
Publication of JPS63114979A publication Critical patent/JPS63114979A/en
Application granted granted Critical
Publication of JP2604593B2 publication Critical patent/JP2604593B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3457Solder materials or compositions; Methods of application thereof
    • H05K3/3473Plating of solder
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0756Uses of liquids, e.g. rinsing, coating, dissolving
    • H05K2203/0776Uses of liquids not otherwise provided for in H05K2203/0759 - H05K2203/0773
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0783Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/125Inorganic compounds, e.g. silver salt
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/105Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/24Reinforcing the conductive pattern
    • H05K3/244Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/34Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
    • H05K3/3494Heating methods for reflowing of solder

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は、基体金属の表面に半田合金の被膜を形成す
るための方法に関するものである。一般に電子回路等を
形成する場合、回路パターンを描いた基板の露出した基
体金属表面に半田合金の被膜を形成し、所望の回路部品
を当該半田被膜の上に載置し、これを加熱して前記半田
被膜を熔融し、当該半田によって基体金属と回路部品と
を接合することが行われている。
Description: TECHNICAL FIELD The present invention relates to a method for forming a coating of a solder alloy on a surface of a base metal. Generally, when an electronic circuit or the like is formed, a coating of a solder alloy is formed on an exposed base metal surface of a substrate on which a circuit pattern is drawn, and a desired circuit component is placed on the solder coating and heated. Melting the solder coating and joining the base metal and the circuit component by the solder are performed.

本発明は特にこのような回路基板の基体金属の表面に
半田合金の被膜を形成するための新規な方法に関するも
のである。
The present invention particularly relates to a novel method for forming a coating of a solder alloy on the surface of a base metal of such a circuit board.

従来の技術 従来前述のような回路基板の基体金属表面に半田合金
の被膜を形成するには、通常ペースト状半田が使用され
ている。
2. Description of the Related Art Conventionally, in order to form a coating of a solder alloy on the surface of a base metal of a circuit board as described above, paste solder is usually used.

ペースト状半田は、半田合金の粉末とフラックスと
を、粘度調整用のミネラルスピリット等の高沸点溶剤に
分散し、一定の粘度を有するペースト状としたものであ
る。而してこのペースト状半田を使用して基板の基体表
面に金属半田の被覆を形成するには、ペースト状半田を
スクリーン印刷又はディスペンサーで、電子部品搭載基
板上に所定の形状に塗布し、これを加熱して前記半田合
金の粉末を熔融させ、フラックスの補助作用の下で、前
記熔融半田合金を基板の基体金属表面に付着させて被膜
を形成している。
The paste-like solder is obtained by dispersing a powder of a solder alloy and a flux in a high-boiling solvent such as mineral spirit for adjusting viscosity to form a paste having a certain viscosity. In order to form a coating of metal solder on the substrate surface of the substrate using the paste solder, the paste solder is applied to the electronic component mounting board in a predetermined shape by screen printing or a dispenser. Is heated to melt the powder of the solder alloy, and the molten solder alloy is adhered to the base metal surface of the substrate with the help of flux to form a coating.

ペースト状半田を加熱すると、前記半田合金の粉末粒
子が熔融し、前記フラックスによって熔融半田粒子の表
面の酸化物が還元されて純半田熔融粒子となると共に、
基体金属表面も還元されて清浄な表面を形成する。而し
て熔融半田粒子の凝集力と、半田粒子の基体金属に対す
る濡れ性とにより、基体表面に金属半田の被膜が形成さ
れるのである。
When the paste solder is heated, the powder particles of the solder alloy are melted, and the oxide on the surface of the molten solder particles is reduced by the flux to become pure solder molten particles,
The substrate metal surface is also reduced to form a clean surface. Thus, a coating of the metal solder is formed on the surface of the base by the cohesive force of the molten solder particles and the wettability of the solder particles to the base metal.

発明が解決しようとする問題点 しかしながら前記ペースト状半田においては、そのペ
ースト中における半田合金は、フラックスや溶剤とは分
離された遊離の金属粒子であり、その粒子は微細なもの
であるとは言っても、フラックスや溶剤と均一な組成物
を構成しているものではない。半田合金の粒子を小さく
する試みがなされてはいるが、現在では10μ程度が限界
とされている。
Problems to be Solved by the Invention However, in the paste solder, the solder alloy in the paste is free metal particles separated from the flux and the solvent, and the particles are said to be fine. However, it does not constitute a uniform composition with the flux and the solvent. Attempts have been made to reduce the size of the solder alloy particles, but currently the limit is around 10μ.

一方近年電子回路の集積度が高くなり、基板上の回路
パターンも細い線で高密度に構成されるようになってい
る。最近では、百〜数百μ程度の線を同程度の間隔を描
いて回路パターンを構成するようにもなっており、それ
に伴って当該基板上にペースト状半田を供給する場合に
おいても、回路パターンの高密度化に伴い、極めて高精
度で供給する必要がある。従ってスクリーン印刷でペー
スト状半田を供給する場合においては、よりメッシュの
細かいスクリーンを使用しなければならず、またディス
ペンサーを使用する場合においても、より細い吐出穴径
のものを使用する必要が生じてきている。
On the other hand, in recent years, the degree of integration of electronic circuits has increased, and circuit patterns on substrates have also been formed with fine lines at high density. In recent years, circuit patterns have been formed by drawing lines of about one hundred to several hundred μ at approximately the same intervals, and even when supplying paste-like solder on the substrate, the circuit pattern It is necessary to supply with extremely high precision in accordance with the increase in the density of. Therefore, when supplying paste-like solder by screen printing, a screen with a finer mesh must be used, and when a dispenser is used, it is necessary to use a discharge hole with a smaller diameter. ing.

然るに、前述のようにペースト状半田中に半田合金の
固体粉末粒子が含まれているので、これをスクリーン印
刷やディスペンサーにより基板上に供給する際、半田合
金の粒子の大きさを事実上無視することができなくなっ
てくる。
However, as described above, since the solder paste contains solid powder particles of the solder alloy, the size of the solder alloy particles is substantially ignored when supplying the solder alloy onto the substrate by screen printing or a dispenser. I can no longer do it.

スクリーン印刷により供給する場合においては、半田
合金の粉末粒子がスクリーンに目詰まりを生じさせ、半
田合金を所定の形状に均一に印刷して供給することが困
難である。また半田粉末とスクリーンとの摩擦により、
マスクに傷をつけたり破損したりすることがあり、スク
リーンの寿命が短いものとなっている。
In the case of supplying by screen printing, powder particles of the solder alloy cause clogging of the screen, and it is difficult to print and supply the solder alloy uniformly in a predetermined shape. Also, due to the friction between the solder powder and the screen,
The mask may be scratched or damaged, shortening the life of the screen.

またディスペンサーを使用する場合においても、細い
吐出穴に半田粉末が詰まり、詰まった半田粉末がそれに
続くペーストを過して、フラックスや溶剤のみを吐出
することがあり、半田合金の粉末を均一に含むペースト
として吐出することが極めて困難である。
Also, when using a dispenser, the solder powder may be clogged in the narrow discharge holes, the clogged solder powder may pass through the subsequent paste, and discharge only the flux or the solvent, evenly including the solder alloy powder It is extremely difficult to discharge as a paste.

また前述のように、熔融半田の粒子同士の凝集力と被
着金属に対する濡れ性とによって被着金属間の結合を行
うが、個々の熔融半田粒子の表面張力は大きいものであ
って、全ての半田粒子を接合に寄与させることは困難で
あり、接合に寄与しない半田粒子が基板状に残留し、こ
れらは回路の間を短絡させる可能性がある。
Further, as described above, bonding between the adhered metals is performed by the cohesive force between the particles of the molten solder and the wettability to the adhered metal, but the surface tension of each molten solder particle is large, and It is difficult for the solder particles to contribute to the bonding, and the solder particles that do not contribute to the bonding remain on the substrate, which may cause a short circuit between the circuits.

特に先に述べたように集積度の高い電子回路において
は、回路を構成する線の間隔が半田粒子の径にほゞ匹敵
する大きさになり、単一の半田粒子によっても簡単に短
絡が生じ、直ちに地例的な欠陥を生じることになり兼ね
ない。このような事態を避けるために、接合完了後に当
該電子回路を有機溶剤で洗浄して残存半田粒子を除去す
ることが行われるが、それでも完全に除去することは困
難である。
In particular, as described above, in electronic circuits with a high degree of integration, the spacing between the lines that make up the circuit is almost equal to the diameter of the solder particles, and shorts can easily occur even with a single solder particle. , Which can quickly lead to ground defects. In order to avoid such a situation, after the joining is completed, the electronic circuit is washed with an organic solvent to remove the remaining solder particles, but it is still difficult to completely remove the solder particles.

半田合金の粉末粒子の径をさらに小さいものとするこ
とによりこれらの問題点は多少は改善されるが、高価に
なると共に、熔融半田の粒子が安定なものとなって凝集
が起りにくくなり、必ずしも好ましいものと言えない。
By making the diameter of the powder particles of the solder alloy smaller, these problems are somewhat improved, but it becomes expensive, and the particles of the molten solder become stable and hardly agglomerate. Not good.

さらに基板上の金属被膜を形成する部分以外の部分を
レジスト剤でマスクし、所定の部分のみに半田被膜を形
成するとと共に、不要の部分に半田が付着するのを防止
し、回路が短絡するのを防止することも行われている
が、この場合においても半田被膜を形成すべき部分の大
きさが個々の半田粒子の大きさに匹敵するものとなるの
で、所定の部分に確実に半田粒子を供給して、充分に膜
厚の大きな半田金属被膜を形成することは極めて困難で
ある。
Further, the portions other than the portion on which the metal film is formed on the substrate are masked with a resist agent, and a solder film is formed only on a predetermined portion, and at the same time, the solder is prevented from adhering to unnecessary portions, and the circuit is short-circuited. However, in this case as well, since the size of the portion where the solder film is to be formed is comparable to the size of each solder particle, the solder particles are surely applied to the predetermined portion. It is extremely difficult to supply and form a sufficiently thick solder metal coating.

さらにマスクした基板を熔融半田浴に浸漬して金属被
膜を形成することも行われているが、これも微細なパタ
ーンに従って確実に被膜を形成するのは困難である。
Further, although a metal film is formed by immersing the masked substrate in a molten solder bath, it is also difficult to reliably form the film according to a fine pattern.

本発明はかかる事情に鑑みなされたものであって、半
田合金を構成する錫及び鉛を有機カルボン酸に対して化
学的に結合させ、これを有機溶剤に溶解することにより
均一な組成の溶液となし、基体金属を当該溶液に浸漬す
ることにより当該基体金属の表面に半田金属を析出さ
せ、半田粒子の大きさを考慮することなく精密なパター
ンに従って基体金属表面に容易に金属被膜を形成するこ
とを可能にし、さらに被膜形成後における残存半田粒子
による電子回路の短絡を防止することを目的とするもの
である。
The present invention has been made in view of such circumstances, and tin and lead constituting a solder alloy are chemically bonded to an organic carboxylic acid, and a solution having a uniform composition is obtained by dissolving this in an organic solvent. None, by depositing solder metal on the surface of the base metal by immersing the base metal in the solution, and easily forming a metal coating on the surface of the base metal according to a precise pattern without considering the size of the solder particles. And to prevent a short circuit of an electronic circuit due to residual solder particles after the formation of the coating.

問題点を解決する手段 而して本発明は、有機カルボン酸の錫・鉛混合塩又は
有機カルボン酸の錫塩と鉛塩との混合物を高沸点溶剤に
溶解してなる溶液に、加熱下に、錫及び鉛よりもイオン
化傾向の大きい金属を浸漬し、当該金属の表面に半田合
金を析出せしめることを特徴とするものである。
Means for Solving the Problems Accordingly, the present invention provides a method comprising dissolving a tin / lead mixed salt of an organic carboxylic acid or a mixture of a tin salt and a lead salt of an organic carboxylic acid in a high-boiling solvent under heating. , A metal having a greater ionization tendency than tin and lead is immersed, and a solder alloy is deposited on the surface of the metal.

本発明において使用する溶液の溶質は、有機成分とし
ての有機カルボン酸中のカルボキシル基を、錫及び鉛の
塩としたものである。
The solute of the solution used in the present invention is obtained by converting a carboxyl group in an organic carboxylic acid as an organic component into a salt of tin and lead.

有機カルボン酸としては各種のものを使用することが
できる。例えばロジン又はその誘導体、ステアリン酸、
オレイン酸、ネオデカン酸、セバシン酸、フマル酸等の
脂肪族カルボン酸、安息香酸、フタル酸、イソフタル
酸、トリメリット酸、ピロメリット酸等の芳香族カルボ
ン酸、ナフテン酸等を使用することができる。また一塩
基性の酸の他、二塩基性又は三塩基性以上の多塩基性の
酸をも使用することができる。ただし、その有機カルボ
ン酸と錫及び鉛の塩が、有機溶剤に溶解し得るものでな
ければならない。
Various organic carboxylic acids can be used. For example, rosin or a derivative thereof, stearic acid,
Aliphatic carboxylic acids such as oleic acid, neodecanoic acid, sebacic acid, and fumaric acid, aromatic carboxylic acids such as benzoic acid, phthalic acid, isophthalic acid, trimellitic acid, and pyromellitic acid, and naphthenic acid can be used. . In addition to monobasic acids, dibasic or tribasic or higher polybasic acids can also be used. However, the organic carboxylic acid and the salt of tin and lead must be soluble in an organic solvent.

これらの有機カルボン酸としては、特にロジン又はそ
の誘導体が適当である。当該ロジンとしては、ガムロジ
ン、トール油ロジン、ウッドロジンなどの他、これらの
ロジンの主成分であるアビエチン酸、ピマール酸等の純
物質を使用することができる。
As these organic carboxylic acids, rosin or a derivative thereof is particularly suitable. As the rosin, in addition to gum rosin, tall oil rosin, wood rosin and the like, pure substances such as abietic acid and pimaric acid which are the main components of these rosins can be used.

またこれらのロジンの誘導体として、不均斉化ロジ
ン、水素添加ロジンや、マレイン化ロジン又はフマル化
ロジン等を使用することもできる。特にマレイン化ロジ
ンやフマル化ロジンは、ロジンをマレイン化又はフマル
化することによりカルボン酸を導入して三塩基性の誘導
体とし、そのロジン誘導体の三つのカルボン酸を錫及び
鉛の塩とすることにより、金属含有量を大きくすること
ができるので好ましい。
In addition, as such rosin derivatives, asymmetric rosin, hydrogenated rosin, maleated rosin, fumarated rosin, and the like can also be used. In particular, maleated rosin or fumarated rosin is to be converted into a tribasic derivative by introducing carboxylic acid by maleating or fumarating rosin, and converting the three carboxylic acids of the rosin derivative into salts of tin and lead. Is preferable because the metal content can be increased.

有機カルボン酸に対する錫及び鉛の導入は、これらの
有機カルボン酸のアルカリ塩に、錫及び鉛の塩を添加
し、複分解反応により有機カルボン酸の錫及び鉛塩を得
ることができる。有機カルボン酸のアルカリ塩に添加す
る錫の塩としては、塩化第一錫が適当であり、また鉛の
塩としては、酢酸鉛が適当である。
For the introduction of tin and lead into the organic carboxylic acid, tin and lead salts can be obtained by adding a tin and lead salt to these organic carboxylic acid alkali salts and performing a metathesis reaction. Stannous chloride is suitable as the tin salt to be added to the alkali salt of the organic carboxylic acid, and lead acetate is suitable as the lead salt.

また前記有機カルボン酸を加熱して熔融した状態で酸
化錫及び酸化鉛を反応させることにより、前記有機カル
ボン酸の錫及び鉛の塩を得る熔融法によることもでき
る。
Further, the organic carboxylic acid may be heated and melted to react tin oxide and lead oxide, thereby obtaining a salt of tin and lead of the organic carboxylic acid.

この場合において、有機カルボン酸に錫及び鉛を混合
して導入した錫・鉛混合塩であっても良く、また有機カ
ルボン酸の錫塩と鉛塩とをそれぞれ別個に合成し、これ
らを所定の割合で混合したものであっても良い。
In this case, a tin-lead mixed salt in which tin and lead are mixed and introduced into an organic carboxylic acid may be used, or a tin salt and a lead salt of an organic carboxylic acid are separately synthesized, and these are mixed with a predetermined amount. It may be mixed at a ratio.

ただし後者の方が、得られる半田被膜の膜厚が比較的
厚く、接合強度が大きい傾向があり、また用途に応じて
錫及び鉛の含有の比率の異なるものを自由に調製するこ
とができるという利点を有しているので好ましい。
However, in the latter case, the thickness of the obtained solder film tends to be relatively thick and the bonding strength tends to be large, and it is possible to freely prepare those having different tin and lead contents depending on the application. It is preferred because it has advantages.

有機カルボン酸の錫及び鉛塩中に含まれる錫及び鉛の
含有率は、有機カルボン酸の種類によっても異なるが、
2〜70重量%程度が適当であり、さらに好ましくは10〜
60重量%程度とするのが望ましい。
The content of tin and lead contained in the tin and lead salts of the organic carboxylic acid varies depending on the type of the organic carboxylic acid,
About 2 to 70% by weight is appropriate, and more preferably 10 to 70% by weight.
It is desirable to be about 60% by weight.

有機カルボン酸の錫及び鉛塩中の錫と鉛との比率は、
半田合金としての共晶比率である錫/鉛=約60/40とす
るのが適当であるが、一般に半田として使用可能の範囲
内において適宜変更することができる。
The ratio of tin to lead in the tin and lead salts of organic carboxylic acids is
It is appropriate that the eutectic ratio of the solder alloy, tin / lead, is about 60/40, but it can generally be changed as appropriate within the range where the solder can be used.

本発明において、有機カルボン酸の錫及び鉛塩を溶解
するための有機溶剤としては、沸点の高いものが望まし
く、例えばスクアレンや高沸点鉱油等が適している。
In the present invention, as the organic solvent for dissolving the tin and lead salts of the organic carboxylic acid, those having a high boiling point are desirable, and for example, squalene, high-boiling mineral oil and the like are suitable.

また溶液中の成分の比率としては、有機カルボン酸金
属塩中の金属成分の溶液中における濃度が、少なくとも
0.1%以上であることが望ましい。金属成分の含有率が
0.1%未満であっては金属成分の量が少なく、充分な厚
みの半田被膜を形成することができない。
As the ratio of the components in the solution, the concentration of the metal component in the organic carboxylic acid metal salt in the solution is at least
Desirably, it is 0.1% or more. Metal content
If it is less than 0.1%, the amount of the metal component is small, and a solder film having a sufficient thickness cannot be formed.

また、溶液中の金属成分の含有率を設定する場合、金
属含有率の比較的高い有機カルボン酸の金属塩を有機溶
剤に比較的稀薄に溶解したものであっても良く、また金
属成分の含有量の比較的低い有機カルボン酸の金属塩を
有機溶剤に比較的濃厚に溶解したものであっても良い。
When the content of the metal component in the solution is set, a metal salt of an organic carboxylic acid having a relatively high metal content may be relatively dilutely dissolved in an organic solvent. A relatively low amount of a metal salt of an organic carboxylic acid may be relatively thickly dissolved in an organic solvent.

本発明により基体金属に半田被膜を形成する場合に
は、基体金属は錫及び鉛よりも、イオン化傾向の大きい
ものであることを要する。イオン化傾向の小さい基体金
属の表面には有機カルボン酸の錫及び鉛塩から半田合金
が析出せず、半田被膜を形成することができない。
When a solder film is formed on a base metal according to the present invention, the base metal needs to have a higher ionization tendency than tin and lead. The solder alloy does not precipitate from the tin and lead salts of the organic carboxylic acid on the surface of the base metal having a low ionization tendency, so that a solder coating cannot be formed.

従って例えば基体金属が銅であって、その表面に半田
の金属被膜を形成する場合には、銅は錫及び鉛よりもイ
オン化傾向が小さいので、本発明によりその銅の表面に
直接半田の被膜を形成することはできない。それ故、予
め銅の表面に亜鉛又はアルミニウムなどのイオン化傾向
の大きい金属のメッキを施しておき、その表面に本発明
により半田被膜を形成するのが良い。
Therefore, for example, when the base metal is copper and a metal coating of solder is formed on the surface, copper has a smaller ionization tendency than tin and lead, and therefore, according to the present invention, a coating of solder is directly applied to the surface of the copper according to the present invention. It cannot be formed. Therefore, it is preferable that the surface of copper be plated in advance with a metal having a high ionization tendency, such as zinc or aluminum, and a solder film be formed on the surface according to the present invention.

本発明により基体金属の表面に半田被膜を形成するに
は、加熱下において前記有機カルボン酸の錫及び鉛塩の
有機溶剤溶液に、基体金属を浸漬することにより行う。
浸漬時の温度は錫及び鉛の比率や溶剤の沸点によっても
異なるが、溶剤がスクアレンである場合には約250℃程
度が適当である。また浸漬時間は浸漬時の温度によって
も異なり、また形成しようとする半田被膜の厚みにもよ
るが、数秒乃至数十分程度である。
In order to form a solder coating on the surface of the base metal according to the present invention, the base metal is immersed in an organic solvent solution of the tin and lead salts of the organic carboxylic acid under heating.
The temperature at the time of immersion varies depending on the ratio of tin and lead and the boiling point of the solvent, but when the solvent is squalene, about 250 ° C. is appropriate. The immersion time varies depending on the temperature during immersion, and depends on the thickness of the solder film to be formed, but is about several seconds to several tens of minutes.

作用 本発明により基体金属を有機カルボン酸の錫及び鉛塩
の有機溶剤溶液に浸漬すると、溶液中の有機カルボン酸
の錫塩及び鉛塩が、基体金属の表面において分解し、金
属錫及び金属鉛を遊離して半田合金を形成し、当該半田
合金が基体金属の表面に析出して合金層を形成し、さら
にその合金層に新たに遊離した半田合金が合体して半田
被膜を形成するのである。
When the base metal is immersed in an organic solvent solution of a tin and lead salt of an organic carboxylic acid according to the present invention, the tin salt and the lead salt of the organic carboxylic acid in the solution are decomposed on the surface of the base metal to form metal tin and metal lead. To form a solder alloy, the solder alloy deposits on the surface of the base metal to form an alloy layer, and the newly released solder alloy is combined with the alloy layer to form a solder coating. .

本発明により基体金属表面に半田被膜が形成される機
構については必ずしも明らかではないが、次のようなプ
ロセスによるものと思われる。すなわち、有機カルボン
酸の錫及び鉛塩が分解する際には、基体金属との間でイ
オン交換反応を生じ、それによって基体金属の表面にお
いて有機カルボン酸の錫及び鉛の塩から金属錫及び金属
鉛が析出し、析出した金属錫及び金属鉛が合体して半田
合金を形成すると共に、その半田合金が基体金属中に溶
解して合金層を形成する。さらに金属塩から解離した金
属イオンが基体金属の表面に移行してイオン交換反応を
重ねて金属錫及び金属塩を遊離し、基体金属との合金層
の表面に半田被膜層を形成するのである。
Although the mechanism by which the solder film is formed on the surface of the base metal according to the present invention is not necessarily clear, it is thought to be due to the following process. That is, when the tin and lead salts of the organic carboxylic acid are decomposed, an ion exchange reaction occurs with the base metal, whereby the tin and lead salts of the organic carboxylic acid are converted from the tin and lead salts of the organic carboxylic acid on the surface of the base metal. Lead precipitates, and the deposited metallic tin and metallic lead combine to form a solder alloy, and the solder alloy dissolves in the base metal to form an alloy layer. Further, the metal ions dissociated from the metal salt migrate to the surface of the base metal and repeat the ion exchange reaction to release the metal tin and the metal salt, thereby forming a solder coating layer on the surface of the alloy layer with the base metal.

また金属塩の分解によって生じた有機成分である有機
カルボン酸は、フラックスとして作用し、基体金属表面
を還元して半田被膜の形成を促進する。特にロジン又は
その誘導体は元来強力はフラックス作用を有しており、
有機カルボン酸成分としてロジン又はその誘導体を使用
するのが好ましいのである。
The organic carboxylic acid, which is an organic component generated by the decomposition of the metal salt, acts as a flux, reduces the surface of the base metal, and promotes the formation of a solder film. In particular, rosin or its derivatives originally have a strong flux action,
It is preferred to use rosin or a derivative thereof as the organic carboxylic acid component.

発明の効果 本発明によれば、基体金属を所定の溶液に単に浸漬す
るだけで半田被膜を形成することができ、操作が極めて
簡単である。しかも被膜を形成する金属半田は、有機成
分である有機カルボン酸に化学的に結合しており、遊離
の金属半田の粒子を含有しない。従ってこれを精密な回
路パターンを有する回路基板に適用する場合において
も、所望のパターンに従ってレジスト材でマスクした回
路基板を直接溶液に浸漬すれば、微細なパターンに従っ
て確実に被膜を形成することがででき、被膜の欠落や遊
離の半田粒子による短絡等の問題を生じることはない。
According to the present invention, a solder coating can be formed by simply immersing a base metal in a predetermined solution, and the operation is extremely simple. Moreover, the metal solder forming the coating is chemically bonded to the organic carboxylic acid, which is an organic component, and does not contain free metal solder particles. Therefore, even when this is applied to a circuit board having a precise circuit pattern, if a circuit board masked with a resist material according to a desired pattern is directly immersed in a solution, it is possible to reliably form a coating according to a fine pattern. It does not cause problems such as lack of coating and short circuit due to free solder particles.

また本発明においては、先に述べたように金属塩が基
体金属の表面に移行し、該基体金属表面においてイオン
交換反応を生じて金属錫及び金属鉛を析出し、生じた遊
離金属は直ちに基体金属の表面に半田被膜を形成する。
従って操作の過程において系中に遊離金属の粒子が存在
することがなく、溶液中の金属成分は全て半田被膜の形
成に利用される。従って溶液中の金属の含有量が少なく
ても、遊離の半田は基板上の基体金属の露出した部分の
みに集中してそこに充分な厚みの金属被膜が形成され、
極めて効率が良い。
In the present invention, as described above, the metal salt migrates to the surface of the base metal, causes an ion exchange reaction on the surface of the base metal, deposits metal tin and metal lead, and the generated free metal immediately A solder coating is formed on the surface of the metal.
Therefore, there are no free metal particles in the system during the operation, and all the metal components in the solution are used for forming the solder coating. Therefore, even if the content of the metal in the solution is small, the free solder concentrates only on the exposed portion of the base metal on the substrate, and a metal film having a sufficient thickness is formed there,
Extremely efficient.

さらに本発明においては、溶液は均質なものであって
遊離の半田粒子を含まず、また前述のように基体金属が
露出した必要部分のみに半田被膜を形成することができ
るので、電子回路に対する部品の接合の目的だけでな
く、ICやLSI等の製造についても適用可能であり、これ
らにリード線を接合する場合等についても使用すること
が可能である。
Furthermore, in the present invention, since the solution is homogeneous and does not contain free solder particles, and a solder film can be formed only on a necessary portion where the base metal is exposed as described above, a component for an electronic circuit can be formed. The present invention can be applied not only to the purpose of bonding, but also to the manufacture of ICs, LSIs, and the like, and can also be used when bonding lead wires to these.

実施例 有機カルボン酸の錫及び鉛塩の調製 実施例1 コンデンサー及び攪拌機を付した内容量1の四つ口
フラスコに、中国産ガムロジン(酸価169、色調X級、
軟化点78℃)175g、48%か性カリ水溶液63g及び水374g
を仕込み、90℃で3時間攪拌しながら鹸化反応を行い、
pH10.5、固形分30.5%のガムロジンのカリウム塩水溶液
を得た。
Example 1 Preparation of Tin and Lead Salts of Organic Carboxylic Acids Example 1 Into a four-necked flask equipped with a condenser and a stirrer having a capacity of 1, Chinese gum rosin (acid value: 169, color tone X grade,
Softening point 78 ° C) 175g, 48% caustic potash aqueous solution 63g and water 374g
And a saponification reaction is carried out while stirring at 90 ° C. for 3 hours.
An aqueous potassium salt solution of gum rosin having a pH of 10.5 and a solid content of 30.5% was obtained.

攪拌機を付した内容量2のビーカーに、先の工程で
得られたガムロジンのカリウム塩水溶液600gと、水850g
とを仕込み、攪拌しながら稀釈した。一方、内容量500m
lのビーカーに塩化第一錫38g、酢酸鉛26g及び水200gを
入れて、攪拌しながら溶解した。当該金属塩水溶液を前
記ガムロジンカリウム塩の稀釈水溶液に添加し、30℃で
1時間複分解反応を行い、脱水、乾燥して、錫含有率9
重量%、鉛含有率5.8重量%の、ガムロジンの錫・鉛塩
を得た。
In a beaker with an internal capacity of 2 equipped with a stirrer, 600 g of the aqueous solution of the potassium salt of gum rosin obtained in the previous step and 850 g of water
And diluted with stirring. On the other hand, content 500m
In a l beaker, stannous chloride (38 g), lead acetate (26 g) and water (200 g) were put and dissolved with stirring. The aqueous solution of the metal salt was added to the diluted aqueous solution of the potassium salt of gum rosin, subjected to a metathesis reaction at 30 ° C. for 1 hour, dehydrated and dried to obtain a tin content of 9%.
A tin / lead salt of gum rosin having a lead content of 5.8% by weight and a lead content of 5.8% by weight was obtained.

実施例2 実施例1において、中国産ガムロジンに代えてトール
油ロジン(酸価168.5、色調X級、軟化点76℃)を使用
した他は実施例1と同様に操作して、錫含有率8.8%、
鉛含有率5.8%のトール油ロジンの錫・鉛塩を得た。
Example 2 The procedure of Example 1 was repeated, except that tall oil rosin (acid value 168.5, color grade X, softening point 76 ° C.) was used instead of Chinese gum rosin, and the tin content was 8.8. %,
A tin / lead salt of tall oil rosin having a lead content of 5.8% was obtained.

実施例3 実施例1において、中国産ガムロジンに代えて不均斉
化ロジン(酸価167.0、色調WG級、軟化点68℃)を使用
した他は実施例1と同様に操作して、錫含有率8.5%、
鉛含有率5.5%の不均斉化ロジンの錫・鉛塩を得た。
Example 3 The same procedures as in Example 1 were carried out except that asymmetric rosin (acid value 167.0, color tone WG class, softening point 68 ° C) was used instead of Chinese gum rosin, and the tin content was changed. 8.5%,
A tin / lead salt of asymmetric rosin having a lead content of 5.5% was obtained.

実施例4 コンデンサー、水抜き管、温度計及び攪拌機を付した
内容量500mlの四つ口フラスコに、トール油ロジン(酸
価168、色調X級、軟化点76℃)300gを仕込み、マント
ルヒーター上で攪拌しながら加熱して熔融した。熔融後
180℃まで冷却し、無水マレイン酸57gを添加し、190〜2
00℃で2時間加熱してマレイン化反応を行い、鹸化価32
4のマレイン価ロジン350gを得た。
Example 4 A 500-ml four-necked flask equipped with a condenser, a drain tube, a thermometer and a stirrer was charged with 300 g of tall oil rosin (acid value: 168, color tone class X, softening point: 76 ° C), and placed on a mantle heater. The mixture was heated and melted while stirring. After melting
Cool to 180 ° C, add 57 g of maleic anhydride, add 190-2
The mixture was heated at 00 ° C. for 2 hours to perform a maleation reaction, and the saponification value was 32.
350 g of a maleic rosin of 4 were obtained.

次に、コンデンサー及び攪拌機を付した内容量1の
四つ口フラスコに、先の工程で得られたマレイン化ロジ
ン175g、48%か性カリ水溶液120g及び水318gを加えて、
90℃で3時間攪拌しながら鹸化反応を行い、pH10.3、固
形分30%のマレイン化ロジンのカリウム塩水溶液を得
た。
Next, 175 g of the maleated rosin obtained in the previous step, 120 g of a 48% aqueous solution of potassium hydroxide, and 318 g of water were added to a four-necked flask equipped with a condenser and a stirrer and having a content of 1,
The saponification reaction was carried out with stirring at 90 ° C. for 3 hours to obtain an aqueous potassium salt solution of maleated rosin having a pH of 10.3 and a solid content of 30%.

攪拌機を付した内容量2のビーカーに、先の工程で
得られたマレイン化ロジンのカリウム塩水溶液600gと、
水850gとを仕込み、攪拌しながら稀釈した。一方、内容
量500mlのビーカーに塩化第一錫69g、酢酸鉛45g及び水2
00gを入れて、攪拌しながら溶解した。当該金属塩水溶
液の前記マレイン化ロジンカリウム塩の稀釈水溶液に添
加し、30℃で1時間複分解反応を行い、脱水、乾燥し
て、錫含有量17重量%、鉛含有量12重量%のマレイン化
ロジンの錫・鉛塩を得た。
In a beaker with an internal volume of 2 equipped with a stirrer, 600 g of the aqueous potassium salt solution of maleated rosin obtained in the previous step,
850 g of water was charged and diluted with stirring. On the other hand, in a 500 ml beaker, stannous chloride 69 g, lead acetate 45 g and water 2
00g was added and dissolved with stirring. The metal salt aqueous solution was added to the dilute aqueous solution of the maleated rosin potassium salt, subjected to a metathesis reaction at 30 ° C. for 1 hour, dehydrated and dried to obtain a maleate having a tin content of 17% by weight and a lead content of 12% by weight. A rosin tin / lead salt was obtained.

実施例5 水抜き管、コンデンサー、温度計及び攪拌機を付した
内容量1の四つ口フラスコに、中国産ガムロジン(前
出)300gを仕込んで220〜230℃で熔融させ、酸化第一錫
20.3g及び一酸化鉛13.0gを添加して同温度で3時間反応
させ、錫含有量5.5重量%、鉛含有量3.8重量%の、ガム
ロジンの錫・鉛塩を得た。
Example 5 300 g of Chinese gum rosin (described above) was charged into a four-necked flask equipped with a drain tube, a condenser, a thermometer, and a stirrer and having a capacity of 1 and melted at 220 to 230 ° C. to form stannous oxide.
20.3 g and 13.0 g of lead monoxide were added and reacted at the same temperature for 3 hours to obtain a tin / lead salt of gum rosin having a tin content of 5.5% by weight and a lead content of 3.8% by weight.

実施例6 実施例5において、酸化第一錫の添加量を10.0g、一
酸化鉛の添加量を6.5gとした他は実施例5と同様に操作
して、錫含有量2.8重量%、鉛含有量1.8重量%のガムロ
ジンの錫・鉛塩を得た。
Example 6 The procedure of Example 5 was repeated, except that the amount of stannous oxide was changed to 10.0 g and the amount of lead monoxide was changed to 6.5 g. A tin / lead salt of gum rosin having a content of 1.8% by weight was obtained.

実施例7 実施例5において、酸化第一錫の添加量を0.55g、一
酸化鉛の添加量を0.4gとした他は実施例5と同様に操作
して、錫含有量0.55重量%、鉛含有量0.4重量%のガム
ロジンの錫・鉛塩を得た。
Example 7 The procedure of Example 5 was repeated, except that the addition amount of stannous oxide was 0.55 g and the addition amount of lead monoxide was 0.4 g. A tin / lead salt of gum rosin having a content of 0.4% by weight was obtained.

実施例8 水抜き管、コンデンサー、温度計及び攪拌機を付した
内容量200mlの四つ口フラスコに、ナフテン酸(酸価22
4)125gを仕込んで170〜180℃にまで昇温し、酸化第一
錫10.1g及び一酸化鉛5.9gを添加した後220〜230℃にま
で昇温し、同温度で3時間反応させ、錫含有率6.3重量
%、鉛含有率3.9重量%の、ナフテン酸の錫・鉛塩を得
た。
Example 8 A 200 ml four-necked flask equipped with a drainage tube, a condenser, a thermometer and a stirrer was charged with naphthenic acid (acid number 22).
4) Charge 125g, raise the temperature to 170-180 ° C, add 10.1g of stannous oxide and 5.9g of lead monoxide, then raise the temperature to 220-230 ° C, react at the same temperature for 3 hours, A tin / lead salt of naphthenic acid having a tin content of 6.3% by weight and a lead content of 3.9% by weight was obtained.

実施例9 実施例8において、有機カルボン酸としてナフテン酸
に代えてネオデカン酸90gを使用した他は、実施例8と
同様に操作して、錫含有率8.4重量%、鉛含有率5.2重量
%のネオデカン酸の錫・鉛塩を得た。
Example 9 The procedure of Example 8 was repeated, except that 90 g of neodecanoic acid was used instead of naphthenic acid as the organic carboxylic acid, to obtain a tin content of 8.4% by weight and a lead content of 5.2% by weight. A tin / lead salt of neodecanoic acid was obtained.

実施例10 実施例8において、有機カルボン酸としてナフテン酸
に代えてステアリン酸140gを使用した他は、実施例8と
同様に操作して、錫含有率5.6重量%、生含有率3.5重量
%のステアリン酸の錫・鉛塩を得た。
Example 10 The procedure of Example 8 was repeated, except that stearic acid (140 g) was used instead of naphthenic acid as the organic carboxylic acid, to obtain a tin content of 5.6% by weight and a raw content of 3.5% by weight. A tin / lead salt of stearic acid was obtained.

実施例11 水抜き管、コンデンサー、温度計及び攪拌機を付した
内容量300mlの四つ口フラスコに、安息香酸122g及びキ
シレン40gを仕込み、攪拌しながら120〜130℃にまで昇
温して安息香酸をキシレンに溶解し、そこへ酸化第一錫
20.2g及び一酸化鉛11.8gを添加した後、脱キシレンしな
がら220〜230℃にまで昇温して同温度で3時間反応さ
せ、錫含有率11.6重量%、鉛含有率7.1重量%の安息香
酸の錫・鉛塩を得た。
Example 11 A 300 ml four-necked flask equipped with a drain tube, a condenser, a thermometer and a stirrer was charged with 122 g of benzoic acid and 40 g of xylene, and the temperature was raised to 120 to 130 ° C. with stirring to obtain benzoic acid. Dissolved in xylene and stannous oxide
After adding 20.2 g and 11.8 g of lead monoxide, the temperature was raised to 220 to 230 ° C. while dexylene was reacted and reacted at the same temperature for 3 hours. Benzo with a tin content of 11.6% by weight and a lead content of 7.1% by weight was added. An acid tin / lead salt was obtained.

実施例12 攪拌機を付した内容量2のビーカーに、ナフテン酸
(酸価224)125g、48%か性カリ水溶液59g及び水1247g
を仕込み、30℃で2時間攪拌しながら鹸化反応を行い、
pH10.5、固形分10.2重量%のナフテン酸のカリウム塩水
溶液を得た。
Example 12 125 g of naphthenic acid (acid value: 224), 59 g of a 48% aqueous solution of potassium hydroxide, and 1247 g of water were placed in a beaker having a content of 2 and equipped with a stirrer.
And a saponification reaction was performed while stirring at 30 ° C. for 2 hours.
An aqueous solution of potassium salt of naphthenic acid having a pH of 10.5 and a solid content of 10.2% by weight was obtained.

一方、内容量500mlのビーカーに、塩化第一錫38g、酢
酸鉛26g及び水200gを投入し、攪拌しながら溶解した。
当該金属塩水溶液を前記ナフテン酸カリウム塩の水溶液
に添加し、30℃で1時間複分解反応を行い、脱水、乾燥
した後トルエンで抽出し、10mmHgの減圧下にトルエンを
溜去し、錫含有率13.2重量%、鉛含有率9.2重量%の、
ナフテン酸の錫・鉛塩を得た。
On the other hand, 38 g of stannous chloride, 26 g of lead acetate and 200 g of water were put into a beaker having a content of 500 ml, and dissolved with stirring.
The aqueous solution of the metal salt was added to the aqueous solution of the potassium salt of naphthenate, metathesis reaction was carried out at 30 ° C. for 1 hour, dehydration and drying were performed, extraction was performed with toluene, toluene was distilled off under reduced pressure of 10 mmHg, and tin content was reduced. 13.2% by weight, lead content 9.2% by weight,
A tin / lead salt of naphthenic acid was obtained.

実施例13 攪拌機を付した内容量2のビーカーに、オレイン酸
(酸価198)141g、48%か性カリ水溶液59g及び水1406g
を仕込み、30℃で2時間攪拌しながら鹸化反応を行い、
pH10.4、固形分10.1重量%のオレイン酸のカリウム塩水
溶液を得た。
Example 13 In a 2 beaker equipped with a stirrer, 141 g of oleic acid (acid value: 198), 59 g of a 48% aqueous solution of potassium hydroxide, and 1406 g of water were added.
And a saponification reaction was performed while stirring at 30 ° C. for 2 hours.
An aqueous solution of a potassium salt of oleic acid having a pH of 10.4 and a solid content of 10.1% by weight was obtained.

一方、内容量500mlのビーカーに、塩化第一錫38g、酢
酸鉛26g及び水200gを投入し、攪拌しながら溶解した。
当該金属塩水溶液を前記オレイン酸カリウム塩の水溶液
に添加し、30℃で1時間複分解反応を行い、脱水、乾燥
した後トルエンで抽出し、10mmHgの減圧下にトルエンを
溜去し、錫含有率12.0重量%、鉛含有率8.4重量%の、
オレイン酸の錫・鉛塩を得た。
On the other hand, 38 g of stannous chloride, 26 g of lead acetate and 200 g of water were put into a beaker having a content of 500 ml, and dissolved with stirring.
The aqueous solution of the metal salt was added to the aqueous solution of the potassium oleate, subjected to metathesis reaction at 30 ° C. for 1 hour, dehydrated, dried, extracted with toluene, and toluene was distilled off under reduced pressure of 10 mmHg to obtain a tin content. 12.0% by weight, lead content 8.4% by weight,
A tin / lead salt of oleic acid was obtained.

実施例14 水抜き管、コンデンサー、温度計及び攪拌機を付した
内容量200mlの四つ口フラスコに、オレイン酸100gを仕
込んで170〜180℃にまで昇温し、酸化第一錫3.7g及び一
酸化鉛2.4gを添加した後220〜230℃にまで昇温し、同温
度で3時間反応させ、錫含有率2.9重量%、鉛含有率1.8
重量%の、オレイン酸の錫・鉛塩を得た。
Example 14 100 g of oleic acid was charged into a 200-ml four-necked flask equipped with a drain tube, a condenser, a thermometer, and a stirrer, and the temperature was raised to 170 to 180 ° C. After adding 2.4 g of lead oxide, the temperature was raised to 220 to 230 ° C., and the mixture was reacted at the same temperature for 3 hours to obtain a tin content of 2.9% by weight and a lead content of 1.8.
By weight, tin / lead salts of oleic acid were obtained.

実施例15 実施例14において、酸化第一錫及び一酸化鉛の添加量
をそれぞれ0.8g及び0.5gとした他は実施例14と同様に操
作し、錫含有率0.61重量%、鉛含有率0.39重量%のオレ
イン酸の錫・鉛塩を得た。
Example 15 The same operation as in Example 14 was carried out, except that the addition amounts of stannous oxide and lead monoxide were changed to 0.8 g and 0.5 g, respectively, to obtain a tin content of 0.61% by weight and a lead content of 0.39%. By weight, a tin-lead salt of oleic acid was obtained.

溶液の調製 温度計及び攪拌機に付した内容量200mlの四つ口フラ
スコに、スクアレン90g及び先の各実施例で合成された
有機カルボン酸の錫・鉛塩を投入し、100℃で60分間攪
拌して溶解した。有機カルボン酸の錫・鉛塩の投入量
は、溶液中における金属塩中の錫及び鉛成分の含有率が
約1.4重量%となるように調製した。なお実施例7、14
及び15については、溶液中の金属含有率がそれぞれ0.2
重量%及び0.05重量%となるように調整した。
Preparation of solution In a 200 ml four-necked flask equipped with a thermometer and a stirrer, 90 g of squalene and the tin / lead salt of the organic carboxylic acid synthesized in each of the above examples were charged, and stirred at 100 ° C for 60 minutes. And dissolved. The amount of the tin / lead salt of the organic carboxylic acid was adjusted so that the content of the tin and lead components in the metal salt in the solution was about 1.4% by weight. Examples 7 and 14
And 15 have a metal content of 0.2
It was adjusted to be 0.05% by weight and 0.05% by weight.

また溶剤について、スクアレンに代えて高沸点鉱油
(シェル石油株式会社製、シェルフレックス#371)を
使用し、実施例及び8に示される金属塩を溶解したもの
についても同様に操作して調製した。
As for the solvent, a high-boiling-point mineral oil (Shellflex # 371, manufactured by Shell Sekiyu KK) was used in place of squalene, and the solvent in which the metal salt shown in Examples and 8 was dissolved was prepared in the same manner.

基体金属の浸漬 基体金属として、亜鉛、アルミニウム、鉄、ニッケル
及び銅を使用し、これらの金属の板(30mm×30mm×0.1m
m)を250℃に加熱した前記各金属塩の溶液に60秒間浸漬
した。
Immersion of base metal Zinc, aluminum, iron, nickel and copper are used as base metal, and a plate of these metals (30 mm x 30 mm x 0.1 m
m) was immersed in a solution of each of the metal salts heated to 250 ° C. for 60 seconds.

膜厚測定 浸漬前後の金属板の厚みをマイクロメーターで測定
し、該金属板の片面に付着した金属被膜の厚みを算出し
た。
Film thickness measurement The thickness of the metal plate before and after immersion was measured with a micrometer, and the thickness of the metal film adhered to one surface of the metal plate was calculated.

試験結果 試験の結果を次の表に示す。表中○は被膜の厚みが3
μ以上であったことを示す。被膜が3μ以上であれば、
その被膜を形成した基体金属同士を重ねて加熱すること
によりその基体金属を接合することが可能である。
Test results The test results are shown in the following table. In the table, ○ indicates that the film thickness is 3
It shows that it was more than μ. If the coating is 3μ or more,
It is possible to join the base metals by overlapping and heating the base metals on which the coatings are formed.

また△は被膜が形成されるが、その厚みが3μ未満で
あったことを示す。このままでは基体金属同士を接合す
ることは困難であるが、浸漬時間を延長することにより
被膜厚みを大きくすることが可能であると考えられる。
The symbol △ indicates that a film was formed, but the thickness was less than 3 μm. It is difficult to bond the base metals together as it is, but it is considered that the coating thickness can be increased by extending the immersion time.

×は被膜が生じていないことを示し、浸漬時間を延長
しても充分な被膜を形成できないと認められる。
X indicates that no film was formed, and it was recognized that a sufficient film could not be formed even if the immersion time was extended.

短絡試験 ガラス繊維補強エポキシ板の表面に、1mm幅×10mm長
さの線を10本有する櫛型パターン二つを、前記線が0.1m
m間隔で交互に平行に配置されるようにプリントして試
験基板を調製した。次いで該試験基板のパターンにニッ
ケルメッキを施し、実施例1及び8の金属塩のスクアレ
ン溶液(金属含有率1.4重量%)に250℃で約30分間浸漬
し、前記線の表面に約30μの厚みの半田被膜を形成し
た。
Short circuit test On the surface of a glass fiber reinforced epoxy plate, two comb-shaped patterns having 10 lines each having a width of 10 mm and a length of 10 mm, the lines having a length of 0.1 m
A test substrate was prepared by printing so as to be alternately arranged in parallel at m intervals. Next, the pattern of the test substrate was plated with nickel, immersed in a squalene solution of a metal salt of Examples 1 and 8 (metal content: 1.4% by weight) at 250 ° C. for about 30 minutes, and a thickness of about 30 μm was applied to the surface of the wire. Was formed.

比較例として、前記試験基板にペースト状半田をアプ
リケーターで塗布し、これを加熱して半田を熔融し、前
記線の表面に約30μの厚みの半田被膜を形成した。
As a comparative example, paste solder was applied to the test substrate with an applicator and heated to melt the solder, thereby forming a solder coating having a thickness of about 30 μm on the surface of the wire.

而して、各試験基板における線の間隔の部分を顕微鏡
で拡大して、各線の間の短絡の有無を観察した。
Thus, the portion of each test substrate at the line interval was magnified with a microscope, and the presence or absence of a short circuit between the lines was observed.

その結果、各実施例の金属塩の溶液に浸漬した基板に
おいては、全く線間の短絡箇所は見られず、二つのパタ
ーン間に通電しても導通は生じなかった。
As a result, on the substrate immersed in the solution of the metal salt of each example, no short-circuited portion between the lines was observed at all, and no continuity occurred even when the current was applied between the two patterns.

これに対し、比較例のペースト状半田により半田被膜
を形成した基板においては、凝集した半田粒が線間を架
橋しており、極めて多数の短絡箇所が生じていた。また
一部では、数本の線の範囲に亙って、線の部分も間隔の
部分をも含めて、全体にベッタリと半田の膜が形成され
た部分が生じていた。
On the other hand, in the substrate on which the solder coating was formed by the paste solder of the comparative example, the agglomerated solder particles cross-linked between the lines, and an extremely large number of short-circuit portions occurred. In addition, in some parts, the entirety of the line, including the part of the line and the part of the gap, where the film of the solder and the solder is formed, has occurred.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 西 康隆 高砂市米田町塩市46番地の12 (72)発明者 入江 久夫 高砂市米田町神爪423番地 (72)発明者 水田 辰二 神戸市兵庫区東山町3丁目1番8号 (72)発明者 小原 伸介 京都市下京区夷馬場町2番3号 (56)参考文献 特開 昭60−96764(JP,A) 特開 昭55−21532(JP,A) ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Yasutaka Nishi 12-46, Shioichi, Yoneda-cho, Takasago City (72) Inventor Hisao Irie, 423, Kamizume, Yonedacho, Takasago-shi (72) Inventor Tatsuji Mizuta Higashiyama, Hyogo-ku, Kobe-shi 3-18 cho-cho (72) Inventor Shinsuke Ohara 2-3-3 Ibaba-cho, Shimogyo-ku, Kyoto-shi (56) References JP-A-60-96764 (JP, A) JP-A-55-21532 (JP, A)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】有機カルボン酸の錫・鉛混合塩又は有機カ
ルボン酸の錫塩と鉛塩との混合物を高沸点溶剤に溶解し
てなる溶液に、加熱下に、錫及び鉛よりもイオン化傾向
の大きい金属を浸漬し、当該金属の表面に半田合金を析
出せしめることを特徴とする、金属表面に半田被膜を形
成する方法
1. A solution prepared by dissolving a tin-lead mixed salt of an organic carboxylic acid or a mixture of a tin salt of an organic carboxylic acid and a lead salt in a solvent having a high boiling point. Forming a solder coating on a metal surface by dipping a metal having a large surface area and depositing a solder alloy on the surface of the metal.
【請求項2】前記有機カルボン酸が、ロジン又はその誘
導体であることを特徴とする、特許請求の範囲第1項記
載の金属表面に半田被膜を形成する方法
2. The method for forming a solder film on a metal surface according to claim 1, wherein said organic carboxylic acid is rosin or a derivative thereof.
JP62120863A 1986-05-19 1987-05-18 Method of forming solder coating on metal surface Expired - Lifetime JP2604593B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62120863A JP2604593B2 (en) 1986-05-19 1987-05-18 Method of forming solder coating on metal surface

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP61-114441 1986-05-19
JP11444186 1986-05-19
JP61-154811 1986-06-30
JP15481186 1986-06-30
JP62120863A JP2604593B2 (en) 1986-05-19 1987-05-18 Method of forming solder coating on metal surface

Publications (2)

Publication Number Publication Date
JPS63114979A JPS63114979A (en) 1988-05-19
JP2604593B2 true JP2604593B2 (en) 1997-04-30

Family

ID=27312719

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62120863A Expired - Lifetime JP2604593B2 (en) 1986-05-19 1987-05-18 Method of forming solder coating on metal surface

Country Status (1)

Country Link
JP (1) JP2604593B2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0747233B2 (en) * 1987-09-14 1995-05-24 古河電気工業株式会社 Solder deposition composition and solder deposition method
CA2030865C (en) * 1989-11-30 1993-01-12 Kenichi Fuse Method of forming a solder layer on pads of a circuit board and method of mounting an electronic part on a circuit board
JP3390245B2 (en) * 1993-06-01 2003-03-24 富士通株式会社 Cleaning liquid and cleaning method
JP4887659B2 (en) * 2005-05-13 2012-02-29 大日本印刷株式会社 Packaging container

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5521532A (en) * 1978-07-31 1980-02-15 Pentel Kk Treating method for treating surface of aluminum
JPS6096764A (en) * 1983-10-28 1985-05-30 Nissan Chem Ind Ltd Plating method of copper and copper alloy

Also Published As

Publication number Publication date
JPS63114979A (en) 1988-05-19

Similar Documents

Publication Publication Date Title
US5145532A (en) Solder precipitating composition
US7022266B1 (en) Printable compositions, and their application to dielectric surfaces used in the manufacture of printed circuit boards
EP0933010B1 (en) Printable compositions, and their application to dielectric surfaces used in the manufacture of printed circuit boards
US6416590B1 (en) Solder powder and method for preparing the same and solder paste
JP2000094179A (en) Solder paste and manufacture of the same and method for solder precoating
US5045236A (en) Copper conductive composition
JP5902009B2 (en) Method of forming solder bump
JP4231157B2 (en) Solder powder, manufacturing method thereof, and solder paste
JP2604593B2 (en) Method of forming solder coating on metal surface
JP2514516B2 (en) Solderable conductive paste
JPH0564997B2 (en)
KR960003723B1 (en) Method for forming a metal film on the surface of a substrate metal
JP4920401B2 (en) Method for manufacturing conductive circuit board
US9415469B2 (en) Resin composition for solder bump formation, solder bump formation method, and member having solder bumps
KR100203997B1 (en) Solder depositing composition and method of packaging using the same
JP3563500B2 (en) Powder soldered sheet and solder circuit forming method
JP3362079B2 (en) Solder powder fixing method
JPH0516957B2 (en)
JP2987227B2 (en) Low melting point solder deposition composition and method for producing low melting point solder precoated circuit board
JP3278903B2 (en) Solder powder and solder circuit forming method
JPH064791B2 (en) Conductive paint
JP3314856B2 (en) Solder paste
JP2975114B2 (en) Solder deposition composition and mounting method using the same
JP2640676B2 (en) Printed wiring board and method for manufacturing printed wiring board
JP4666714B2 (en) Pre-coat solder composition and solder pre-coat method

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20080129

Year of fee payment: 11