JP2604217Y2 - Cleaning equipment - Google Patents

Description

[Detailed description of the invention]

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning apparatus for cleaning a work such as a printed circuit board, and more particularly to a cleaning apparatus which has a small number of cleaning tanks and can omit a mechanism for transporting the work for cleaning. Things.

[0002]

2. Description of the Related Art A cleaning process is required in a process of manufacturing a work to remove a flux from a printed circuit board or the like, or to degrease a metal part. Freon has conventionally been used. However, a method of cleaning with a cleaning liquid such as an organic solvent and a rinsing liquid such as pure water has recently been adopted due to the problem of ozone destruction. A conventional cleaning apparatus that performs cleaning using two types of liquids, a cleaning liquid and a rinsing liquid, includes a plurality of cleaning tanks storing at least the respective liquids, and further, works from the cleaning tanks to the next cleaning tank. A transport mechanism for transporting is required.

[0003]

A mechanism such as a spray or a shower is installed in each of these washing tanks in order to improve the efficiency of washing or rinsing the work. Therefore, the size of each washing tank is determined in consideration of not only the capacity for installing the work, but also the space for accommodating these mechanisms and the space for installing a shower or the like.

Further, in the conventional cleaning apparatus, since a work is moved by a transfer mechanism between a plurality of cleaning tanks, a moving space for moving the work by the transfer mechanism is also required. Furthermore, in order to keep contamination of the washing tank containing the rinsing liquid as low as possible, a space for draining water when moving the work is required. As described above, the conventional cleaning apparatus requires a very large volume, and the space for installing the apparatus is very large. In addition, since the transport mechanism and the draining mechanism are provided, the mechanism of the drive system is complicated, and the weight of the apparatus is large and expensive. Therefore, in order to introduce a cleaning device into a factory, there is a problem that the cost of purchasing the cleaning device is high and the cost of securing a storage space is also high.

The present invention has been made in view of the above-mentioned problems, and has as its object to provide a cleaning device which has a simple mechanism and saves space, and has a cleaning power equal to or higher than that of a conventional cleaning device.

[0006]

In order to solve the above-mentioned problems, in the present invention, first, two or more cleaning tanks conventionally required are replaced by a single cleaning tank to which a cleaning liquid and a rinsing liquid are supplied. By doing so, the area occupied by the cleaning device is reduced, and the structure of the cleaning device is simplified. With it
The cleaning liquid in the cleaning tank is supplied to the cleaning tank via piping and a pump.
Cleaning system for supply and recovery, and rinse solution
Using a rinse system that supplies and drains water through piping and pumps
By arranging cleaning tanks, cleaning liquid tanks, etc. side by side,
A small cleaning device high enough to allow the workpiece being cleaned to be observed.
Is provided.

In addition, the rinsing system includes a rough rinsing system and a finishing rinsing system, and an intermediate water tank for storing drainage from the finishing rinsing system via a pipe and a pump and supplying water to the rough rinsing system is provided. . As a result, despite the use of a single cleaning tank, the wastewater of the finish rinsing system with a low degree of contamination can be used as the feedwater for the coarse rinsing system with a high degree of contamination, thereby suppressing the consumption of the rinsing liquid. It is possible to do.

That is, the cleaning apparatus for cleaning a work using the cleaning liquid and the rinsing liquid according to the present invention has a single cleaning tank in which the work is set and the cleaning liquid and the rinsing liquid are supplied, respectively. The rinsing system includes a rough rinsing system and a finishing rinsing system, and has an intermediate water tank that stores drainage from the finishing rinsing system via a pipe and a pump and supplies water to the rough rinsing system. As described above, conventionally, two or more cleaning devices are required, and by using a single cleaning tank having a large capacity, the size of the cleaning device is greatly reduced. Further, since it is possible to omit the transport mechanism for moving the work between the plurality of cleaning tanks, it is possible to provide a cleaning apparatus having a simple mechanism with few driving parts. Furthermore, by using a cleaning system that not only supplies and recovers a cleaning liquid through a pipe and a pump, and a rinse system that not only supplies a rinsing liquid through a pipe and a pump but also discharges water, it is convenient and compact. Cleaning equipment.

When such a single cleaning tank is used, and a cleaning system and a rinsing system using a pipe and a pump are used, the cleaning liquid is diluted by the cleaning liquid and the rinsing liquid remaining in the rinsing liquid pipe, and the life of the cleaning liquid is shortened. The problem that the cleaning solution becomes shorter and the rinsing solution is contaminated by the remaining cleaning solution, and the consumption of the rinsing solution increases, is likely to occur. Therefore, it is desirable to provide a cleaning system that supplies and recovers the cleaning liquid from the cleaning liquid tank to the cleaning tank, and a rinse system that supplies and drains the rinsing liquid to and from the cleaning tank. By thus independently providing the cleaning system and the rinsing system, it is possible to minimize the flow of the cleaning liquid and the rinsing liquid in the same pipe.
Therefore, the concentration of the cleaning liquid is prevented from being reduced by the rinsing liquid remaining in the piping system, and the rinsing liquid is also prevented from being contaminated by the remaining cleaning liquid. For this reason, the cleaning power of the cleaning liquid can be kept high, and consumption of the cleaning liquid is suppressed. In addition, since the rinsing liquid is prevented from being contaminated, consumption of the rinsing liquid is also suppressed.

Further, when the cleaning system is provided with a recovery source valve for shutting off a cleaning liquid recovery system, and when the rinsing system is provided with a drainage source valve for shutting off a rinsing liquid discharge system, these are provided. It is desirable to install a recovery valve and a drain valve near the washing tank. The recovery source valve is provided to prevent the entry of the rinsing liquid into the cleaning system by closing the collecting liquid after collecting the cleaning liquid from the cleaning tank. At this time, by minimizing the distance from the cleaning tank to the recovery source valve,
The cleaning liquid remaining in the piping system from the cleaning tank to the recovery source valve and possibly contaminating the rinsing liquid when the rinsing liquid is supplied to the cleaning tank can be minimized. Therefore, contamination of the rinsing liquid can be prevented, and consumption of the rinsing liquid can be suppressed. Similarly, the drain valve is closed to prevent the cleaning liquid from entering the rinsing system. By installing the discharge valve near the cleaning tank, the length of the pipe from the cleaning tank to the discharge valve can be minimized, and the cleaning liquid remains in the pipe from the cleaning tank to the discharge valve. Rinsing fluids that can be diluted are minimized. Thus, it is possible to supply and recover the cleaning liquid from the cleaning liquid tank to the cleaning tank while keeping the concentration of the cleaning liquid constant, and it is possible to keep the life of the cleaning liquid long and suppress consumption.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

FIGS. 1 to 4 show a cleaning apparatus 1 according to an embodiment.
FIG. 5 shows the system of the cleaning apparatus 1 of the present example. 2 and 3 show an apparatus 1 for explanation.
The tanks and the like installed inside are indicated by broken lines such as dashed lines. In the cleaning apparatus 1 of the present example, a single, substantially rectangular cleaning tank 2 is disposed substantially at the center of a base plate 7. An aqua tank 1 for storing a cleaning liquid is provided on one side of the cleaning tank 2.
2 and an intermediate water tank 32 for storing intermediate water to be described later. Further, a pure tank 52 is arranged to face the tanks 12 and 32 with the cleaning tank 2 interposed therebetween. A hood 4 having an opening / closing pipe 3 is provided at an upper portion of the cleaning tank 2, and a work (not shown) can be set inside the cleaning tank 2 by opening the hood 4. The installed work is supplied with a cleaning liquid and a rinsing liquid from a cleaning system and a rinsing system, which will be described later, to perform cleaning and rinsing. Hood 4 while cleaning the work
By closing the opening, leakage of the cleaning liquid or the rinsing liquid can be prevented. The hood 4 is also provided with a transparent viewing window 6 so that the work being washed can be observed. On the front surface of the device provided with the viewing window 6,
Further, a pressure gauge 16 and a control panel 5 are also provided. In addition, a pump 11, a pipe, a valve, and the like, such as a cleaning system 10, which will be described later, are disposed on the back surface of the apparatus 1, and these tanks, pumps, pipes, valves, and the like are also installed on the base 7. Further, a drying mechanism 8 for drying the work after cleaning is attached to the back surface of the cleaning tank 2.

Next, the system of the apparatus 1 will be described with reference to FIG. The cleaning apparatus 1 includes a cleaning system 10 that supplies a cleaning liquid in an aqua tank 12 to a cleaning tank 2 by an aqua pump 11 and collects the cleaning liquid. Further, as a rinsing system for rinsing the work cleaned by the cleaning liquid in the cleaning tank 2, a rough rinsing system 30 and a finish rinsing system 50 are used.
Is provided. The coarse rinsing system 30 is a system that can supply the recovered water stored in the intermediate water tank 32 by the coarse rinsing pump 31 to the cleaning tank 2 and discharge the same, and the finish rinsing system 50 is a system that can store the pure water stored in the pure water tank 52. This is a system in which water can be supplied to the cleaning tank 2 by the finishing pump 51. The pure water supplied to the cleaning tank 2 by the finish rinsing system 50 is drained by the coarse rinsing pump 31 or collected in the intermediate water tank 32.

In the cleaning system 10, a supply source valve 13 from an aqua tank 12 is provided on a suction side 11 a of an aqua pump 11.
Is connected to a cleaning liquid supply system 13A in which a recovery source valve 14 from the cleaning tank 2 is installed, and an aqua supply system 15A in which an aqua supply source valve 15 is installed. . The discharge side 11b of the aqua pump 11 is provided with a cleaning discharge system 17A provided with a cleaning liquid supply valve 17 for supplying a cleaning liquid to the cleaning tank 2 via a pressure meter 16 and a cleaning liquid collected in the aqua tank 12. The collection and discharge system 18A in which the cleaning liquid collection valve 18 is installed is connected. Also, the collection and release system 18A
Is provided with a filter 18 inserted between the washing liquid recovery valve 18 and the aqua tank 12 so as to be shut off by front and rear valves 19a and 19b. The washing liquid recovery system 14A includes:
A Y-strainer 20 is inserted between the recovery source valve 14 and the aqua pump 11. An aqua discharge system 2 is provided on the delivery side 11b of the aqua pump 11 so that the cleaning liquid in the aqua tank 12 can be discharged via a manual valve 21.
1A is also connected.

Further, the inside of the cleaning tank 2 is divided into a cleaning shower chamber 2a in which the cleaning liquid or the like is sprayed toward the substrate provided therein, and a cleaning tank 2b in which the cleaning liquid or the like is collected below the shower chamber 2a. ing. A cleaning pump 22 is provided in the cleaning tank 2b.
Accordingly, the cleaning liquid in the cleaning tank 2 is sucked, and is uniformly sprayed and supplied to a work (not shown) set in the cleaning shower room 2a via the rotary spray 23. The cleaning pump 22 is an automatic drain, and when the cleaning liquid in the cleaning tank 2 is recovered through the recovery source valve 14, the cleaning liquid in the circulation pump 22 is also recovered.

In the coarse rinsing system 30, an intermediate water supply system 33A provided with an intermediate water supply valve 33 from an intermediate water tank 32 and a drain valve 34 from the washing tank 2 are provided on the suction side 31a of the coarse rinsing pump 31. Is connected. On the discharge side 31b of the coarse rinsing pump 31, an intermediate water discharge system 35 provided with an intermediate water supply valve 35 is provided.
A, an intermediate water recovery system 36A provided with an intermediate water recovery valve 36 for recovering waste water from the cleaning tank 2 (the cleaning tank 2b) to the intermediate water tank 31, and a discharge for discharging the waste water from the cleaning tank 2 The discharge system 37A in which the valve 37 is installed is connected. Further, from the intermediate water discharge system 35A, the intermediate water is applied to a work (not shown) set inside the cleaning tank 2 by a spray shower 38 installed in the cleaning shower room 2a which is the upper part of the cleaning tank 2. ing.

In the finish rinsing system 50, a pure water supply system 53A from a pure water tank 52 is connected to the suction side 51a of the finish rinsing pump 51, and a pure water discharge valve 54 is installed on the discharge side 51b. A pure water discharge system 54A for supplying pure water to the cleaning tank 2 is connected. From the pure water discharge system 54A, pure water is applied to the work via a rotary spray 55 installed in the cleaning tank 2. The pure water tank 52 is also connected to a pure water supply system 56 </ b> A provided with a pure water supply valve 56.

A point to be noted in the cleaning apparatus 1 of the present embodiment is that the cleaning tank 2 is one.
Conventionally, at least two tanks, a tank for cleaning a work using a cleaning liquid and a tank for rinsing the work using a rinsing liquid, were required. In the present apparatus 1, both cleaning and rinsing are performed by one cleaning tank 2. Is possible. Therefore, there is no need to install a transport mechanism for transporting the work between the plurality of tanks, and it is very compact, has a simple mechanism, and has a small weight as compared with a conventional cleaning apparatus. Next, a cleaning system 10 for supplying a cleaning liquid, and a rinsing system for supplying pure water as a rinsing liquid. In the apparatus 1 of this example, a rough rinsing system 30 and a finishing rinsing system 50 are separately provided. . Each of these systems is composed of a dedicated pump, valve, piping, and the like, so that cleaning liquid and rinsing liquid having different effects can be separately supplied, discharged, or recovered to the cleaning tank 2. Therefore, it is possible to prevent the cleaning liquid and the rinsing liquid from being mixed during the supply and the like, and it is possible to shorten the cleaning time and prevent the cleaning liquid and the rinsing liquid from being wasted. Further, in the apparatus 1 of the present embodiment, as shown in FIGS. 3 and 5, the recovery source valve 14 for recovering the cleaning liquid of the cleaning system 10 is used.
Discharge source valve 34 for discharging the rinsing liquid of the coarse rinsing system 30
Is located below the washing tank 2 and as close as possible to the tank 2 as far as the valve can be set. Thereby, the cleaning system 1
The possibility that the cleaning liquid or the rinsing liquid flows back to the cleaning tank 2 from the zero or coarse rinsing system 30 is minimized, and the cleaning time, waste of the cleaning liquid and the rinsing liquid can be further suppressed. In the apparatus 1 of the present embodiment, the cleaning system 1
Although a common discharge nozzle is prepared in the cleaning tank 2 for the zero and the coarse rinsing system 30, a separate nozzle may be installed in the cleaning tank 2 as a matter of course. Furthermore, in the apparatus 1 of the present example, wastewater from the washing by the finish rinsing system 50 is collected in the intermediate water tank 32 and used as the rinsing solution for the coarse rinsing system 30 to further reduce the consumption of the rinsing solution, that is, pure water. It is possible to suppress.

The pure water can be supplied from the tap water to the pure water tank 52 via the pure water device 61, and is supplied as needed during the washing. Also, Aqua Tank 1
The washing liquid in 2 is replenished to the aqua tank 12 via the aqua supply system 15A from the aqua stock tank 62 in which the stock solution of the washing liquid is stored as needed when the concentration is reduced, when the washing liquid is exchanged, or the like. Further, the wastewater from the drainage system 37A can be discharged to the sewage drainage through the wastewater treatment system 70. Although various types of wastewater treatment systems 70 can be adopted, in this example, the neutralized solution stored in the neutralization tank 72 is supplied to the drainage tank 71 where the wastewater is stored via the neutralized solution pump 73. The first step is to neutralize the wastewater. At this time, the drainage in the drainage tank 71 is stirred by the drainage pump 74 via the recirculation valve 75. The wastewater that has reached the predetermined pH
The water is discharged from a drain pump 74 through a drain valve 76, and further controlled to a drain allowable range by an activated carbon 77 and an ion exchange device 78 for removing metal ions and the like, and discharged to sewage drain.

The operation of the apparatus 1 of this embodiment will be described with reference to the flowchart shown in FIG. First, in step ST1, the hood 4 of the cleaning tank 2 is opened using the opening / closing pipe 3, and a work is loaded and set inside the cleaning tank 2.

Next, cleaning is started in step ST2. Prior to this, it is necessary to prepare a cleaning solution having a predetermined concentration in the aqua tank 12 as an initial process.
In this example, Aqua Cleaner 210SEP manufactured by Yamaei Chemical Co., Ltd. and provided by the present applicant, which is suitable for cleaning a rosin-based flux, is used. This cleaning liquid is supplied from the aqua stock solution tank 62 to the aqua tank 12 via the aqua supply system 15A. The concentration of the cleaning solution is determined inside the undiluted solution tank 62 or in the aqua tank 12.
, And can be adjusted using pure water.
Cleaning is performed by a cleaning liquid supply system 13A from the aqua tank 12,
The water is supplied to the cleaning tank 2 via the aqua pump 11 and the cleaning liquid discharge system 17A. Then, by operating the cleaning pump 22, the cleaning liquid in the cleaning tank 2b is sprayed from the rotary spray 23 onto the work in the shower room 2a to perform cleaning. During this process, systems other than those described above are shut off by respective valves. In particular, cleaning tank 2
Since the main valve 34 of the rinsing system connected to the cleaning tank 2b is installed near the cleaning tank 2b, the rinsing liquid does not flow back to the cleaning liquid side. This also prevents a situation in which the concentration of the cleaning solution is reduced due to dissolution in the cleaning solution.

When the washing is completed, the liquid is drained in step ST3. In this step, the cleaning tank 2
Is supplied to the aqua tank 12. First, the cleaning pump 22 is stopped, and the cleaning liquid is returned to the cleaning tank 2b. Then, the cleaning liquid in the cleaning tank 2b is recovered in the aqua tank 12 via the cleaning liquid recovery system 14A, the aqua pump 11, and the recovery and discharge system 18A. The operation time of this step is mainly determined by the amount of the cleaning liquid supplied to the cleaning tank 2, but in order to improve the efficiency of draining, a time obtained by adding a predetermined time to the calculated time, that is, emptying and Is determined by adding a certain time. When this step ST3 is completed, the recovery source valve 14 disposed near the cleaning tank 2 is closed to allow the cleaning liquid to flow back into the cleaning tank 2 and to reduce the rinsing liquid in the next step. The dissolution of the washing liquid is suppressed. In this way, the recovery source valve and the
Cleaning fluid or pipes from the cleaning tank to the drain valve.
As a method to prevent rinsing liquid from remaining,
Is capable of recovering the supplied or supplied amount of liquid
Is a collection work for a certain period of time beyond the predetermined time that can be discharged,
Alternatively, it is effective to continue the discharging operation.

In step ST4, a rough rinsing is performed. In this step, the first rinse after washing is performed using the intermediate water stored in the intermediate water tank 32. As will be described later, the intermediate water is obtained by collecting the waste water from the finish rinse, and the purity is almost the same as pure water. Therefore, the intermediate water is sufficient as the first rinsing liquid having a high degree of contamination, and the consumption of pure water can be reduced. The intermediate water stored in the intermediate water tank 32 is supplied to the intermediate water supply system 33A, the coarse rinsing pump 3
1. It is supplied to the cleaning tank 2 via the intermediate water discharge system 35A. At this time, the intermediate water is jetted from the intermediate water discharge system 35A to the work via the spray shower 38, and the rough rinsing is performed efficiently.

When the rough rinsing is completed, drainage is performed in step ST5. The waste water after the coarse rinsing accumulated in the cleaning tank 2b of the cleaning tank 2 is discharged to a waste water treatment system 70 outside the apparatus via a drain system 34A, a coarse rinsing pump 31, and a discharge system 37A.

When the rough rinsing is completed, a middle rinsing is performed in step ST6. In this step, a finish rinsing system 50 is used, and pure water stored in a pure water tank 52 is supplied to a work via a pure water supply system 53A, a finishing pump 51, a pure water discharge system 54A, and a rotary spray 55. It is spouted toward and rinsed. When the rinsing is completed, the rinsing liquid in the washing tank 2b is discharged in step ST7 in the same manner as in step ST5.

After the middle rinsing liquid is discharged, a final rinsing is performed in step ST8. In this step, pure water in the pure water tank 52 is spouted from the rotary spray 55 toward the work in the same system as in step ST6, and finish rinsing is performed. When the finish rinsing step is completed, the rinsing liquid in the washing tank 2b is discharged in step ST9. At this time, the drainage water is discharged through the drainage system 34A, the coarse rinsing pump 31, and the intermediate water discharge system 35A. Collected in the tank 32. The finish rinsing step is a step for final rinsing, and the wastewater has a very low degree of contamination. Therefore, the consumption of pure water is reduced by temporarily storing the wastewater in the intermediate water tank 32 and using it in the rough rinsing step described above.

As described above, when the washing / rinsing process is completed, the air dried by the drying mechanism 8 in step ST10 is supplied toward the work, and the rough drying is performed. The dried and cleaned work is placed in step ST11.
, Is carried out of the washing tank 2.

As described above, in the device 1 of the present embodiment,
Washing and rinsing are performed using one washing tank 2. Since the cleaning system 10 and the rinsing systems 30 and 50 are separately installed, the cleaning liquid and the rinsing liquid do not mix with each other, and the waste of the cleaning liquid and the rinsing liquid is small. Further, since the recovery source valve 14 and the discharge source valve 34 are disposed very close to the cleaning tank 2, interference of the cleaning liquid or the rinsing liquid from each system is suppressed, and the cleaning can be performed efficiently. It is possible. Further, since the intermediate water is used for the coarse rinsing, the consumption amount of the rinsing liquid is further suppressed. As described above, the cleaning apparatus 1 of the present embodiment is an apparatus that can prevent the waste of the cleaning liquid and the rinsing liquid and efficiently perform the cleaning and the rinsing while the work is set in one cleaning tank 2. Therefore, complicated and expensive apparatuses such as a large number of cleaning tanks and transport mechanisms can be omitted, and a low-cost and space-saving cleaning apparatus can be provided.

The aqua cleaner 210SEP manufactured by Yamaei Chemical Co., Ltd., which is used as a cleaning liquid in the cleaning apparatus of the present embodiment and which can be purchased from the present applicant, includes N-methylpyrrolidone (20%), butyl propylene diglycol ( 2
3%), monoethanolamine (14%), triethanolamine (6%), surfactant (5%), etc., a solvent with a very good compatibility with rosin and a surfactant are used. It has high cleanability and reliability regardless of flux, cream solder, etc., and has a great track record. In addition, this cleaning agent does not contain hazardous substances under the Fire Service Law, does not receive the application of specified chemical substances under the Organic Solvent Poisoning Prevention Regulations, the specified chemical substances under the Occupational Safety and Health Law and the harmful substances under the Water Pollution Control Law. Since it does not contain any substance which is applicable to the present invention, it can be said that it is a cleaning agent suitable for a small and inexpensive cleaning device with high cleaning performance like the cleaning device of this example. Of course, the cleaning apparatus of the present embodiment is not limited to this cleaning agent, and it is also possible to use other organic or other cleaning agents.

The number of times of rinsing using a rinsing system, the number of times of cleaning using a cleaning agent, and the number of times of rough rinsing using intermediate water are the types of cleaning agents, types of workpieces, and types of substances to be removed. The most suitable one can be selected depending on, for example.

[0031]

As described above, the cleaning device according to the present invention can greatly reduce the occupied area of the cleaning device by using a single cleaning tank, and furthermore, the structure of the cleaning device. By simplifying the above, the transport mechanism can be omitted, so that an inexpensive cleaning device can be realized.

Further, the cleaning liquid in the cleaning liquid tank is connected to the cleaning tank by piping and piping.
By independently providing a washing system for supplying and collecting the washing solution via a pump and a rinsing system for supplying and draining the rinsing solution to the washing tank via a pipe and a pump , the washing power of the washing solution is kept high, and Since unnecessary contamination of the rinsing liquid can be prevented, the consumption of the cleaning liquid and the rinsing liquid can be suppressed while maintaining high cleaning performance. With it
In addition, a washing tank, a washing liquid tank, and an intermediate water tank are lined up
It is possible to provide a small cleaning device with a height that is easy to use. Ma
Was, by placing a collection source valve and water discharge main valve in the vicinity of the cleaning tank, it is possible to suppress the consumption of more wash and rinse, in rinses, single by providing the intermediate water tank Despite being a washing tank
The consumption can be further reduced.

[Brief description of the drawings]

FIG. 1 is a perspective view showing an outline of a cleaning apparatus of the present embodiment.

FIG. 2 is a plan view of the cleaning device shown in FIG. 1 as viewed from above. The inside of the cleaning device is partially shown by broken lines.

FIG. 3 is a front view of the cleaning apparatus shown in FIG.

FIG. 4 is a side view showing the cleaning device shown in FIG. 1 from the side.

FIG. 5 is a system diagram showing a system of the cleaning device shown in FIG. 1;

6 is a flowchart showing the operation of the cleaning device shown in FIG.

[Explanation of symbols]

 1. Cleaning device 2. Cleaning tank 3. Opening / closing pipe 4. Hood 5. Control panel 6. Peep window 7. Base plate 8. Drying mechanism 10. Cleaning system 11. Aqua pump 12.・ ・ Aqua tank 22 ・ ・ Washing pump 30 ・ ・ Coarse rinsing system 31 ・ ・ Coarse rinsing pump 32 ・ ・ Intermediate water tank 50 ・ ・ Finishing rinsing system 51 ・ ・ Finishing rinsing pump 52 ・ ・ Pure water tank 70 ・ ・ Drainage treatment system

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-4-110483 (JP, A) JP-B-63-21755 (JP, B2) JP-B-42-21694 (JP, Y1) (58) Field (Int.Cl. ⁷ , DB name) C23G 3/00 B08B 3/04 H05K 3/26

Claims (2)

(57) [Scope of request for utility model registration] 1. A cleaning apparatus for cleaning a work using a cleaning liquid and a rinsing liquid, wherein the work is set and a single cleaning tank to which the cleaning liquid and the rinsing liquid are respectively supplied; cleaning system and has a rinsing system and to plumbing via a pipe and pump the rinse liquid to the cleaning tank, the rinsing system is rough rinsing system and finishing supplying the cleaning liquid through a pipe and a pump and recovery With rinsing system
The drainage from this finishing rinse system is
Intermediate water that can be recovered through a pump and supplied to the coarse rinsing system
A cleaning device having a tank . 2. The cleaning system according to claim 1, wherein the cleaning system includes a recovery source valve for shutting off a recovery system for the cleaning liquid, and the rinsing system includes a drainage valve for shutting off a discharge system for the rinsing liquid. A cleaning device, wherein the recovery source valve and the drainage source valve are installed near the cleaning tank.