JP2602222B2 - Surface acoustic wave convolver - Google Patents

Surface acoustic wave convolver

Info

Publication number
JP2602222B2
JP2602222B2 JP62037946A JP3794687A JP2602222B2 JP 2602222 B2 JP2602222 B2 JP 2602222B2 JP 62037946 A JP62037946 A JP 62037946A JP 3794687 A JP3794687 A JP 3794687A JP 2602222 B2 JP2602222 B2 JP 2602222B2
Authority
JP
Japan
Prior art keywords
surface acoustic
acoustic wave
semiconductor substrate
wave convolver
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62037946A
Other languages
Japanese (ja)
Other versions
JPS63206017A (en
Inventor
憲生 保坂
利光 高橋
一志 渡辺
山田  純
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62037946A priority Critical patent/JP2602222B2/en
Publication of JPS63206017A publication Critical patent/JPS63206017A/en
Application granted granted Critical
Publication of JP2602222B2 publication Critical patent/JP2602222B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、高効率で相関信号処理可能なモノリシック
型の弾性表面波装置に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a monolithic surface acoustic wave device capable of processing a correlation signal with high efficiency.

〔従来の技術〕[Conventional technology]

弾性表面波は電磁波に比べ伝搬速度が約5桁小さく、
電気信号の処理に応用した場合、素子の小型化、無調整
化が可能であることからフィルタ素子などに実用化され
ている。さらに、物質表面にエネルギーが集中している
ことから、弾性表面波自身や半導体との非線形効果を利
用して、相関処理やたたみ込み積分等を行わせる弾性表
面波装置の研究開発が行われている。このような装置に
関して、例えば、日本学術振興会弾性表面波素子技術第
150委員会第1回資料「モノリシック弾性表面波コンボ
ルバ」において論じられている。前記文献において、特
に効率の良い構成として半導体基板表面に圧電薄膜を形
成してモノリシックに作成した弾性表面波装置があり、
弾性表面波の非線形効果のみ利用した装置に比べ30〜40
dBの効率向上の効果がある。
A surface acoustic wave has a propagation speed about five orders of magnitude lower than an electromagnetic wave,
When applied to the processing of electric signals, the element can be reduced in size and no adjustment is required, so that it has been put to practical use as a filter element or the like. Furthermore, since energy is concentrated on the material surface, research and development of surface acoustic wave devices that perform correlation processing, convolution integration, etc. using the surface acoustic wave itself and nonlinear effects with semiconductors have been conducted. I have. For such a device, for example, the Japan Society for the Promotion of Science
It is discussed in the 150th committee's first document, "Monolithic Surface Acoustic Wave Convolver". In the above document, there is a surface acoustic wave device formed monolithically by forming a piezoelectric thin film on the surface of a semiconductor substrate as a particularly efficient configuration,
30 to 40 compared to a device using only the nonlinear effect of surface acoustic waves
It has the effect of improving the efficiency of dB.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

上記半導体基板を用いた弾性表面波装置は相関信号処
理の効率向上の点から弾性表面波の効率的な励振、電気
機械結合係数の向上、および半導体中への漏れ電界強度
の向上等が必要であるが、従来技術では漏れ電界の向上
に適した装置構成について特に配慮されていなかった。
A surface acoustic wave device using the above-mentioned semiconductor substrate requires efficient excitation of surface acoustic waves, improvement of electromechanical coupling coefficient, improvement of electric field intensity leaking into a semiconductor, etc. from the viewpoint of improving the efficiency of correlation signal processing. However, in the prior art, no special consideration has been given to a device configuration suitable for improving the leakage electric field.

本発明の目的はさらに相関信号処理の効率向上を達成
する事にある。
Another object of the present invention is to achieve an improvement in the efficiency of correlation signal processing.

〔問題点を解決するための手段〕[Means for solving the problem]

半導体基板表面に圧電薄膜を形成した弾性表面波装置
では、半導体表面の安定化のため間に保護層を設けてい
る。上記目的は、この保護層に比誘電率が大きく、半導
体基板への漏れ電界強度が高い材料を用いることにより
達成される。
In a surface acoustic wave device in which a piezoelectric thin film is formed on the surface of a semiconductor substrate, a protective layer is provided for stabilizing the semiconductor surface. The above object is achieved by using a material having a large relative dielectric constant and a high electric field leakage to a semiconductor substrate for the protective layer.

〔作用〕[Action]

弾性表面波と半導体中のキャリアとの結合は、圧電体
中を表面波が伝搬する時に発生する電界の半導体中への
漏れによる。したがって、前述したように相関信号処理
の効率向上のためには電気機械結合係数を向上するとと
もに、比誘電率の大きな材料を用い漏れ電界を大きくす
る配慮が必要である。従来半導体基板と圧電薄膜間の保
護膜としては、二酸化シリコン(SiO2)薄膜が用いられ
ていたが、その比誘電率は3〜4程度であった。本発明
は、前記保護膜に二酸化シリコンの代わりに比誘電率の
大きな材料を用いることにより、前記弾性表面波による
半導体中への漏れ電界強度を向上し、これにより相関信
号処理の効率を向上したものである。
The coupling between the surface acoustic wave and the carrier in the semiconductor is due to the leakage of the electric field generated when the surface wave propagates through the piezoelectric body into the semiconductor. Therefore, as described above, in order to improve the efficiency of the correlation signal processing, it is necessary to improve the electromechanical coupling coefficient and to increase the leakage electric field by using a material having a large relative dielectric constant. Conventionally, a silicon dioxide (SiO 2 ) thin film has been used as a protective film between the semiconductor substrate and the piezoelectric thin film, but its relative dielectric constant is about 3 to 4. The present invention improves the leakage electric field strength into the semiconductor due to the surface acoustic wave by using a material having a large relative dielectric constant instead of silicon dioxide for the protective film, thereby improving the efficiency of the correlation signal processing. Things.

〔実施例〕〔Example〕

以下、本発明の実施例を第1図から第3図により説明
する。
Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

第1図は本発明の弾性表面波コンボルバの実施例を模
式的に示した装置の断面図である。本装置は半導体基板
1にシリコンを用い、その表面に保護膜2として酸化チ
タン薄膜を形成し、さらに圧電体薄膜3として酸化亜鉛
薄膜を形成して積層基板10を作成した。また、出力用ゲ
ート電極4、入力用くし形電極5,6および接地電極9は
アルミニウム薄膜により形成した。
FIG. 1 is a sectional view of a device schematically showing an embodiment of a surface acoustic wave convolver of the present invention. In this apparatus, a silicon substrate was used as a semiconductor substrate 1, a titanium oxide thin film was formed as a protective film 2 on the surface thereof, and a zinc oxide thin film was further formed as a piezoelectric thin film 3, thereby producing a laminated substrate 10. The output gate electrode 4, the input comb electrodes 5, 6 and the ground electrode 9 were formed of an aluminum thin film.

入力端子7に印加された電気信号は、くし形電極で弾
性表面波に変換され基板表面を伝搬していき、半導体中
のキャリアとの非線形作用により出力用ゲート電極より
相関信号が出力される。
The electric signal applied to the input terminal 7 is converted into a surface acoustic wave by the comb-shaped electrode and propagates on the substrate surface, and a correlation signal is output from the output gate electrode by a non-linear action with carriers in the semiconductor.

酸化チタンの比誘電率は50〜150と二酸化シリコンに
比べて1桁以上大きく、これにより半導体中への漏れ電
界強度を従来より向上できる効果がある。
The relative dielectric constant of titanium oxide is 50 to 150, which is at least one order of magnitude larger than that of silicon dioxide, which has the effect of improving the strength of the leakage electric field into the semiconductor as compared with the conventional case.

本発明の他の実施例を第2図に示す。本実施例では、
積層基板の構造は第1の実施例と同様に半導体基板と保
護膜および圧電膜より成るが、保護膜の材料として、こ
こではアルミナを用いた。アルミナの比誘電率は約10で
あり、二酸化シリコンに比べ漏れ電界を向上できる。ま
た、本実施例では、くし形電極に一方向性電極を用いて
おり、効率的に弾性表面波の励振を行うことができる。
FIG. 2 shows another embodiment of the present invention. In this embodiment,
The structure of the laminated substrate is composed of a semiconductor substrate, a protective film and a piezoelectric film as in the first embodiment, but alumina is used here as the material of the protective film. Alumina has a relative dielectric constant of about 10, and can improve the leakage electric field as compared with silicon dioxide. In the present embodiment, a unidirectional electrode is used as the comb-shaped electrode, so that surface acoustic waves can be efficiently excited.

第3図は本発明の第3の実施例であり、積層基板は第
1,第2の実施例と同様の構造である。本発明では高次モ
ードのレーリー波を用いており、速度分散性のため広帯
域で信号処理を行うことが難しい。そこで、本実施例で
は入力用くし形電極の周期を連続的に変化させたチャー
プ型電極として遅延時間を変え、速度分散性を補償する
ように構成した。これにより、従来に比べ広帯域の信号
処理を行うことができる。
FIG. 3 shows a third embodiment of the present invention.
1. The structure is similar to that of the second embodiment. In the present invention, a higher-order mode Rayleigh wave is used, and it is difficult to perform signal processing in a wide band because of speed dispersion. Therefore, in the present embodiment, a delay time is changed as a chirped electrode in which the period of the input comb-shaped electrode is continuously changed to compensate for the speed dispersion. Thereby, signal processing in a wider band can be performed as compared with the related art.

〔発明の効果〕〔The invention's effect〕

本発明によれば、弾性表面波コンバルボの保護層を、
比誘電率が大きく、漏れ電界強度が高い材料である酸化
チタン、アルミナとしたので、相関信号処理の効率を向
上させることができる。このため、本装置をスペクトラ
ム拡散通信システムなどに用いれば、エラーレートが低
下し性能を向上することができる。
According to the present invention, the protective layer of the surface acoustic wave convalbo,
Since titanium oxide and alumina, which are materials having a large relative dielectric constant and a high leakage electric field strength, are used, the efficiency of the correlation signal processing can be improved. Therefore, if the present apparatus is used in a spread spectrum communication system or the like, the error rate can be reduced and the performance can be improved.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例の弾性表面波装置の断面図、
第2図は本発明の第2の実施例を示す平面図、第3図は
第3の実施例を示す平面図である。 1……半導体基板、2……保護膜 3……圧電体薄膜、4……ゲート電極 5,6……入力用くし形電極 7……入力端子、8……出力端子 9……接地電極、10……積層基板 11……一方向性電極、12……位相器 13……チャープ電極
FIG. 1 is a sectional view of a surface acoustic wave device according to one embodiment of the present invention,
FIG. 2 is a plan view showing a second embodiment of the present invention, and FIG. 3 is a plan view showing a third embodiment. DESCRIPTION OF SYMBOLS 1 ... Semiconductor substrate, 2 ... Protective film 3 ... Piezoelectric thin film, 4 ... Gate electrode 5, 6 ... Comb electrode for input 7 ... Input terminal, 8 ... Output terminal 9 ... Ground electrode 10: laminated substrate 11: unidirectional electrode, 12: phase shifter 13: chirp electrode

───────────────────────────────────────────────────── フロントページの続き (72)発明者 山田 純 横浜市戸塚区吉田町292番地 株式会社 日立製作所家電研究所内 (56)参考文献 特開 昭56−79487(JP,A) ──────────────────────────────────────────────────続 き Continuation of the front page (72) Inventor Jun Yamada 292 Yoshidacho, Totsuka-ku, Yokohama-shi Inside the Home Appliances Research Laboratory, Hitachi, Ltd. (56) References JP-A-56-79487 (JP, A)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】半導体基板の表面に順に保護層、圧電層を
形成し、前記圧電層の表面にゲート電極を設け、前記圧
電層の表面に前記ゲート電極を挟んでそれぞれ入力用く
し形電極を設けた弾性表面波コンボルバであって、 前記保護層は、前記半導体基板への漏れ電界強度が二酸
化シリコン(SiO2)より高い酸化チタン(TiO2)あるい
はアルミナ(Al2O3)から成ることを特徴とする弾性表
面波コンボルバ。
1. A protective layer and a piezoelectric layer are sequentially formed on a surface of a semiconductor substrate, a gate electrode is provided on the surface of the piezoelectric layer, and a comb-shaped input electrode is provided on the surface of the piezoelectric layer with the gate electrode interposed therebetween. A surface acoustic wave convolver provided, wherein the protective layer is made of titanium oxide (TiO 2 ) or alumina (Al 2 O 3 ) having a leakage electric field intensity higher than that of silicon dioxide (SiO 2 ) to the semiconductor substrate. Characteristic surface acoustic wave convolver.
JP62037946A 1987-02-23 1987-02-23 Surface acoustic wave convolver Expired - Lifetime JP2602222B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62037946A JP2602222B2 (en) 1987-02-23 1987-02-23 Surface acoustic wave convolver

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62037946A JP2602222B2 (en) 1987-02-23 1987-02-23 Surface acoustic wave convolver

Publications (2)

Publication Number Publication Date
JPS63206017A JPS63206017A (en) 1988-08-25
JP2602222B2 true JP2602222B2 (en) 1997-04-23

Family

ID=12511717

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62037946A Expired - Lifetime JP2602222B2 (en) 1987-02-23 1987-02-23 Surface acoustic wave convolver

Country Status (1)

Country Link
JP (1) JP2602222B2 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10284762A (en) 1995-02-16 1998-10-23 Asahi Chem Ind Co Ltd Laminated structure for amplifying surface acoustic wave and amplifier
WO1996025792A1 (en) * 1995-02-16 1996-08-22 Asahi Kasei Kogyo Kabushiki Kaisha Elastic surface wave functional device and electronic circuit using the element

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5679487A (en) * 1979-12-04 1981-06-30 Fuji Photo Film Co Ltd Amplefier for elastic surface wave

Also Published As

Publication number Publication date
JPS63206017A (en) 1988-08-25

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