JP2578521B2 - Aluminum foil for electrolytic capacitor electrodes - Google Patents

Aluminum foil for electrolytic capacitor electrodes

Info

Publication number
JP2578521B2
JP2578521B2 JP2167085A JP16708590A JP2578521B2 JP 2578521 B2 JP2578521 B2 JP 2578521B2 JP 2167085 A JP2167085 A JP 2167085A JP 16708590 A JP16708590 A JP 16708590A JP 2578521 B2 JP2578521 B2 JP 2578521B2
Authority
JP
Japan
Prior art keywords
aluminum foil
foil
electrolytic capacitor
surface layer
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2167085A
Other languages
Japanese (ja)
Other versions
JPH0462819A (en
Inventor
永三 礒山
雅司 坂口
忠雄 藤平
正蔵 梅津
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Aluminum Can Corp
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2167085A priority Critical patent/JP2578521B2/en
Publication of JPH0462819A publication Critical patent/JPH0462819A/en
Application granted granted Critical
Publication of JP2578521B2 publication Critical patent/JP2578521B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 産業上の利用分野 この発明は電解コンデンサ電極用アルミニウム箔、と
くに中高圧用の陽極材料として用いられるアルミニウム
箔に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an aluminum foil for an electrolytic capacitor electrode, and more particularly to an aluminum foil used as an anode material for medium and high pressures.

従来の技術 電解コンデンサ電極用アルミニウム箔は、その実効表
面積を拡大して単位面積当りの静電容量を増大するた
め、一般に電気的あるいは電気化学的なエッチング処理
が施される。そしてこの拡面率を上げるために、エッチ
ング処理により箔表面に形成されるエッチングピットの
密度を増大することについて、従来から多くの研究がな
されてきた。なかでも、エッチングピットの密度は、ア
ルミニウム箔の表面部の組成、組織に大きく影響される
ことの知見から、特公昭62−42370号公報に見られるよ
うに、表層部に、Pb、Bi、Inの群から選ばれた1種以上
の元素を高濃度に含有せしめるものとする技術の有用性
が提案されている。そしてかゝるアルミニウム箔の製造
は、その一例として、アルミニウム箔の表面にPb、In及
びBiの少なくとも1種を化合物の状態で付与し、これら
金属の融点以上の温度で熱拡散処理し、必要ならば常法
に従って焼鈍を行うもとのすることが提案されている。
2. Description of the Related Art Generally, an aluminum foil for an electrolytic capacitor electrode is subjected to an electrical or electrochemical etching treatment in order to increase its effective surface area and increase the capacitance per unit area. In order to increase the surface area, many studies have been made on increasing the density of etching pits formed on the foil surface by etching. Among them, from the knowledge that the density of etching pits is greatly affected by the composition and structure of the surface portion of the aluminum foil, as seen in JP-B-62-42370, Pb, Bi, In The usefulness of a technique for allowing one or more elements selected from the group to be contained in a high concentration has been proposed. In the production of such an aluminum foil, as an example, at least one of Pb, In and Bi is applied in the form of a compound to the surface of the aluminum foil, and heat diffusion treatment is performed at a temperature equal to or higher than the melting point of these metals. Then, it is proposed to perform annealing in accordance with a conventional method.

発明が解決しようとする課題 この発明は、上記のような従来技術の背景の中で、ア
ルミニウム箔の表面に高濃度に含有せしめて拡面率の増
大に有効に寄与せしめうる上記以外の元素を探索し、そ
の分布状態と分布量との関係から、最も拡面率の拡大に
有効な範囲を見出すことにより、静電容量の増大をはか
りうる電解コンデンサ電極用アルミニウム箔を提供する
ことを目的とする。
Problems to be Solved by the Invention In the background of the prior art as described above, the present invention includes elements other than those described above which can be contained in a high concentration on the surface of an aluminum foil to effectively contribute to an increase in the area coverage. The purpose of the present invention is to provide an aluminum foil for an electrolytic capacitor electrode capable of increasing the capacitance by searching and finding a range that is most effective in increasing the area coverage from the relationship between the distribution state and the distribution amount. I do.

課題を解決するための手段 この発明では、上記拡面率の増大に有効に作用する元
素として、Siuを選択するものである。
Means for Solving the Problems According to the present invention, Siu is selected as an element that effectively acts on the increase in the area coverage.

而して、この発明は、Fe5〜1,000ppm、Si5〜1,000pp
m、Cu5〜1,000ppmを含有し、残りAl及び不可避不純物の
組成を有するアルミニウム箔からなり、かつ表面から厚
さ0.1μmまでの表層部のSi濃度が箔内部のSi含有量の
2〜250倍に設定されてなることを特徴とする電解コン
デンサ電極用アルミニウム箔を要旨とする。
Thus, the present invention provides Fe 5-1,000 ppm, Si 5-1,000 pp
m, containing 5 to 1,000 ppm of Cu, aluminum foil having a composition of remaining Al and unavoidable impurities, and the Si concentration in the surface layer from the surface to a thickness of 0.1 μm is 2 to 250 times the Si content in the foil. An aluminum foil for an electrolytic capacitor electrode characterized by being set to:

この発明において、アルミニウム箔の全体中にFe5〜
1,000ppm、Si5〜1,000ppm、Cu5〜1,000ppmの含有を必要
とするのは、周知のごとく、いずれの元素も上記上限値
をこえて含有するときは電解エッチング時にエッチング
ピットの成長が、多くの不純物の存在によって阻害さ
れ、均一な深いトンネル状ピットを形成できず、従って
静電容量の高いアルミニウム箔を得ることができないた
めであり、また上記下限値未満では、最終焼鈍後におい
て結晶粒が粗大化したり、エッチングピットが少ないも
のとなって静電容量の向上効果を十分に得ることができ
ないためである。好ましくはFe8〜100ppm、Si8〜100pp
m、Cu15〜60ppmの範囲とするのが良い。
In the present invention, Fe5 ~ in the entire aluminum foil
It is well known that the content of 1,000 ppm, Si 5 to 1,000 ppm, and Cu 5 to 1,000 ppm is required. This is because it is hindered by the presence of impurities and cannot form a uniform deep tunnel-like pit, and therefore cannot obtain an aluminum foil having a high capacitance. If it is less than the above lower limit, crystal grains are coarse after final annealing. This is because the number of etching pits is reduced and the effect of improving the capacitance cannot be sufficiently obtained. Preferably Fe8-100ppm, Si8-100pp
m, Cu is preferably in the range of 15 to 60 ppm.

アルミニウム箔の表面から0.1μmの厚さの範囲内にS
iを高濃度に含有せしめることは、静電容量の増大効果
を得るための主要素をなすものであり、上記高濃度の含
有によって箔表面の酸化皮膜が微細な欠陥部を無数に有
するものとなり、エッチングの初期の段階で上記欠陥部
がエッチングの開始点となり、多数のエッチングピット
が形成され、以降箔内面にトンネル状に深く進行するた
め、より大きな拡面率が得られることによるものと考え
られる。従って、表層部の厚さ0.1μmは、必ずしもそ
の数値自体に作用効果上の臨界意義を有するものではな
く、その厚み範囲内の表面層においてSiの濃度が箔の内
部のSi含有量に対しその2〜250倍であるべきものとす
る点にその限定意義を有するものである。従ってまた、
Siは上記表層部に均一に分布していることを要するもの
ではなく、むしろその更に表面部に高濃度に偏在するこ
とが好ましいものである。
S within 0.1μm thickness from the surface of aluminum foil
Inclusion of i at a high concentration is a main factor for obtaining the effect of increasing the capacitance, and the oxide film on the foil surface has countless fine defects due to the high concentration. In the early stage of the etching, the above-mentioned defective portion becomes the starting point of the etching, and a large number of etching pits are formed. Can be Therefore, the thickness of the surface layer portion of 0.1 μm does not necessarily have a critical significance in terms of the effect itself in the numerical value itself, and the concentration of Si in the surface layer within the thickness range is different from the Si content inside the foil. It has a limiting significance in that it should be 2-250 times. So also
It is not necessary that Si is uniformly distributed in the surface layer portion, but rather it is preferable that Si is unevenly distributed at a higher concentration on the surface portion.

表層部におけるSiの含有量が箔内部のSi含有量の2倍
未満では、エッチングピットの密度が不十分なものとな
り、十分な静電容量の増大効果を得ることができない。
一方、Siの表層部含有量が内部含有量の250倍を超える
と、アルミニウム箔表面の耐食性が著しく低下し、箔表
面の全面溶解につながり、かえって表面積が小さいもの
となる。上記表層部におけるSiの含有量の最も好ましい
範囲は、箔内部のSi含有量に対し概ね5〜150倍であ
る。
If the Si content in the surface layer is less than twice the Si content in the foil, the density of the etching pits becomes insufficient, and a sufficient effect of increasing the capacitance cannot be obtained.
On the other hand, if the surface layer content of Si exceeds 250 times the internal content, the corrosion resistance of the aluminum foil surface is significantly reduced, leading to the entire melting of the foil surface, and the surface area is rather small. The most preferable range of the Si content in the surface layer is about 5-150 times the Si content inside the foil.

上記の如く表層部にSiを高濃度に含有するアルミニウ
ム箔の製造は、アルミニウム地金を溶解する段階で所要
量のSiを添加し、鋳造後、常法に従って熱間圧延、冷間
圧延、箔圧延、要すればその間に更に中間焼鈍を行って
製箔し、この箔を例えば460〜580℃で1〜24時間、好ま
しくは485〜540℃で2〜5時間の加熱処理を施すことに
よって製造することができる。地金中に添加したSiは、
上記加熱処理によって表層部に濃化し、上記添加量との
関係においてこの発明の規定範囲に表層部に集中的に含
有せしめたものとすることができる。
As described above, the production of aluminum foil containing Si at a high concentration in the surface layer is performed by adding a required amount of Si at a stage of dissolving the aluminum base metal, casting, and then hot rolling, cold rolling, and foil in a conventional manner. Rolling, if necessary, further intermediate annealing is performed to make a foil, and this foil is subjected to a heat treatment at 460 to 580 ° C. for 1 to 24 hours, preferably at 485 to 540 ° C. for 2 to 5 hours. can do. Si added to the metal
By the above-mentioned heat treatment, it can be concentrated in the surface layer portion and intensively contained in the surface layer portion within the specified range of the present invention in relation to the amount of addition.

もっとも、この発明に係るアルミニウム箔の製造は、
上記に限定されるものではなく、実質的にSiを添加しな
いアルミニウム箔をケイ酸を含む溶液への浸漬や蒸着等
の方法で表面に適宣厚みの皮膜として付与し、然るのち
熱処理を行うことによってSiを表層部に拡散せしめるも
のとしても良い。更には上記手段を併用するものとして
も良い。
However, the production of the aluminum foil according to the present invention,
Without being limited to the above, an aluminum foil to which substantially no Si is added is applied to the surface as a film having an appropriate thickness by a method such as immersion or vapor deposition in a solution containing silicic acid, and then heat treatment is performed. Thereby, Si may be diffused into the surface layer. Further, the above means may be used in combination.

発明の効果 この発明に係る電解コンデンサの電極用アルミニウム
箔は、エッチング性に優れ、エッチング処理により極め
て大きな拡面率を得ることができると共に、該エッチン
グ時において箔表面の全面溶解を抑制しうる。
Effect of the Invention The aluminum foil for an electrode of an electrolytic capacitor according to the present invention is excellent in etching properties, can obtain an extremely large area coverage by etching treatment, and can suppress dissolution of the entire foil surface during the etching.

従って、大きな静電容量を有し、電気的特性に優れる
と共に、強度にも優れたものとなしうる。
Therefore, it is possible to have a large capacitance, excellent electrical characteristics, and excellent strength.

実施例 純度99.99%の純アルミニウム地金(Fe:12ppm、Cu:35
ppm)にSiを第1表に示す各種の含有量(アルミ箔中のS
i含有量)となるように添加し、溶解鋳造、熱間圧延、
冷間圧延、箔圧延、中間焼鈍、箔圧延を順次実施して厚
さ0.1mmのアルミニウム箔に製造した。そして、このア
ルミニウム箔を各種濃度のケイ酸ソーダ液に浸漬して表
面にSiを所定量付与したものと、上記浸漬を行わないそ
のまゝのものとを各種作製した。次いで、これらのアル
ミニウム箔に、真空下で520℃×3時間の最終焼鈍処理
を施し、電解コンデンサ電極材として各種供試料を得
た。
Example Pure aluminum ingot having a purity of 99.99% (Fe: 12 ppm, Cu: 35
ppm) of various contents shown in Table 1 (S in aluminum foil)
i content), melt casting, hot rolling,
Cold rolling, foil rolling, intermediate annealing, and foil rolling were sequentially performed to produce an aluminum foil having a thickness of 0.1 mm. The aluminum foil was immersed in various concentrations of sodium silicate solution to give a predetermined amount of Si to the surface, and various types were prepared without the immersion. Next, these aluminum foils were subjected to a final annealing treatment under vacuum at 520 ° C. × 3 hours to obtain various samples as electrode materials for electrolytic capacitors.

これらの各種供試料は、表面から0.1μmの表層部に
おけるSiの濃度が、該表層部を除いた箔内部におけるSi
の含有量との比較において第1表に併記する倍率を有す
るものとした。
In these various samples, the concentration of Si in the surface layer of 0.1 μm from the surface was higher than the Si concentration in the foil excluding the surface layer.
In comparison with the content of, the ratios shown in Table 1 were used.

次いで、上記の各種アルミニウム箔を、液温85℃の5w
t%塩酸及び20wt%硫酸を含むエッチング液で、電流密
度20A/dm2の直流電流を通じて1分30秒間の第1段エッ
チングを施したのち、液温85℃の5wt%塩酸及び0.2wt%
蓚酸を含むエッチング液で、電流密度5A/dm2の直流電流
により9分間の第2段エッチングを施した。
Next, the above various aluminum foils were heated at a liquid temperature of 85 ° C for 5w.
After performing the first-stage etching for 1 minute and 30 seconds with a direct current having a current density of 20 A / dm 2 with an etching solution containing t% hydrochloric acid and 20 wt% sulfuric acid, 5 wt% hydrochloric acid and 0.2 wt% at a liquid temperature of 85 ° C.
The second-stage etching was performed for 9 minutes with a direct current having a current density of 5 A / dm 2 using an etching solution containing oxalic acid.

そして、上記エッチド箔を380Vに化成したのちそれぞ
れの静電容量を測定し、比較例No.8の試料の静電容量
を100%とした場合との対比において、他の各種試料の
静電容量比を求めた。その結果を第1表に併記する。
After forming the etched foil to 380 V, the capacitance of each sample was measured, and the capacitance of other various samples was compared with the case where the capacitance of the sample of Comparative Example No. 8 was set to 100%. The ratio was determined. The results are shown in Table 1.

上記第1表の結果から分かるように、表層部にSiを本
発明の規定量の範囲で含有する電極箔は、実質的にそれ
を含まない箔、及び表層部にSiを濃化していない箔、あ
るいは表層部に過多にSiを含有する箔に較べ、静電容量
の増大効果を有し、併せて強度に優れるものである。
As can be seen from the results in Table 1 above, the electrode foil containing Si in the surface layer portion within the range of the specified amount of the present invention is a foil that does not substantially contain it, and a foil that does not contain Si in the surface layer portion. Or, it has an effect of increasing the capacitance and is excellent in strength as compared with a foil containing Si excessively in the surface layer portion.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】Fe5〜1,000ppm、Si5〜1,000ppm、Cu5〜1,0
00ppmを含有し、残りAl及び不可避不純物の組成を有す
るアルミニウム箔からなり、かつ表面から厚さ0.1μm
までの表層部のSi濃度が箔内部のSi含有量の2〜250倍
に設定されてなることを特徴とする電解コンデンサ電極
用アルミニウム箔。
(1) Fe5 to 1,000 ppm, Si5 to 1,000 ppm, Cu5 to 1,0
It is composed of aluminum foil having a composition of Al and unavoidable impurities containing 00 ppm, and a thickness of 0.1 μm from the surface.
An aluminum foil for an electrode of an electrolytic capacitor, characterized in that the Si concentration in the surface layer is set to 2 to 250 times the Si content in the foil.
JP2167085A 1990-06-25 1990-06-25 Aluminum foil for electrolytic capacitor electrodes Expired - Lifetime JP2578521B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2167085A JP2578521B2 (en) 1990-06-25 1990-06-25 Aluminum foil for electrolytic capacitor electrodes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2167085A JP2578521B2 (en) 1990-06-25 1990-06-25 Aluminum foil for electrolytic capacitor electrodes

Publications (2)

Publication Number Publication Date
JPH0462819A JPH0462819A (en) 1992-02-27
JP2578521B2 true JP2578521B2 (en) 1997-02-05

Family

ID=15843138

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2167085A Expired - Lifetime JP2578521B2 (en) 1990-06-25 1990-06-25 Aluminum foil for electrolytic capacitor electrodes

Country Status (1)

Country Link
JP (1) JP2578521B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002118035A (en) * 2000-07-31 2002-04-19 Showa Denko Kk Electrolytic capacitor electrode aluminum foil
KR100445999B1 (en) * 2002-03-12 2004-08-25 김용래 Electrolytic condenser having a reinforcement external case
CN103748714B (en) * 2011-07-29 2016-08-24 株式会社Uacj Electrode collector alloy foil and manufacture method thereof

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01128419A (en) * 1987-11-13 1989-05-22 Sumitomo Light Metal Ind Ltd Aluminum foil for electrolytic capacitor
JPH01248609A (en) * 1988-03-30 1989-10-04 Showa Alum Corp Manufacture of aluminium material for electrolytic capacitor

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01128419A (en) * 1987-11-13 1989-05-22 Sumitomo Light Metal Ind Ltd Aluminum foil for electrolytic capacitor
JPH01248609A (en) * 1988-03-30 1989-10-04 Showa Alum Corp Manufacture of aluminium material for electrolytic capacitor

Also Published As

Publication number Publication date
JPH0462819A (en) 1992-02-27

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