JP2578273B2 - Method for manufacturing multilayer electrode substrate - Google Patents

Method for manufacturing multilayer electrode substrate

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Publication number
JP2578273B2
JP2578273B2 JP3210909A JP21090991A JP2578273B2 JP 2578273 B2 JP2578273 B2 JP 2578273B2 JP 3210909 A JP3210909 A JP 3210909A JP 21090991 A JP21090991 A JP 21090991A JP 2578273 B2 JP2578273 B2 JP 2578273B2
Authority
JP
Japan
Prior art keywords
weight
metal powder
parts
electrode substrate
multilayer electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP3210909A
Other languages
Japanese (ja)
Other versions
JPH0554714A (en
Inventor
雅利 末広
康一 河津
将 愛知後
やまお 桐生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DAIICHI KOGYO SEIYAKU KK
DOWA KOGYO KK
Original Assignee
DAIICHI KOGYO SEIYAKU KK
DOWA KOGYO KK
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Filing date
Publication date
Application filed by DAIICHI KOGYO SEIYAKU KK, DOWA KOGYO KK filed Critical DAIICHI KOGYO SEIYAKU KK
Priority to JP3210909A priority Critical patent/JP2578273B2/en
Publication of JPH0554714A publication Critical patent/JPH0554714A/en
Application granted granted Critical
Publication of JP2578273B2 publication Critical patent/JP2578273B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、セラミックパッケージ
や多層配線基板あるいは積層セラミックコンデンサー等
の多層電極基板を製造する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer electrode substrate such as a ceramic package, a multilayer wiring substrate or a multilayer ceramic capacitor.

【0002】[0002]

【従来の技術】セラミックパッケージや多層配線基板あ
るいは積層セラミックコンデンサー等の多層電極基板
は、それらの基体となる誘電体グリーンシート上に金、
銀、パラジウム、白金、銅あるいはニッケルの中の1種
以上の金属粉末を含む導電ペーストが印刷され、これら
導電ペーストを印刷された誘電体グリーンシートを複数
枚積層した後、高温で一括焼成して製造されている。
2. Description of the Related Art A multilayer electrode substrate such as a ceramic package, a multilayer wiring board or a multilayer ceramic capacitor is formed by depositing gold,
A conductive paste containing one or more metal powders of silver, palladium, platinum, copper or nickel is printed. After laminating a plurality of dielectric green sheets on which these conductive pastes are printed, collectively bake at high temperature. Being manufactured.

【0003】この用途に用いられる導電ペーストには、
上記の金属粉末以外に、誘電体グリーンシートとの焼成
時の反りやデラミネーションを防ぐ目的で種々の化合物
が添加されている。例えば、多層配線基板ではこの目的
のために、アルミナ、ジルコニア、マグネシア等の粉末
が添加され、また、誘電体グリーンシートとの接着を良
くするためにガラス質フリット等が添加されている。
[0003] The conductive paste used for this purpose includes:
In addition to the above metal powders, various compounds are added for the purpose of preventing warpage and delamination during firing with the dielectric green sheet. For example, in a multilayer wiring board, powder such as alumina, zirconia, or magnesia is added for this purpose, and a vitreous frit or the like is added for improving the adhesion to the dielectric green sheet.

【0004】[0004]

【発明が解決しようとする課題】しかし、そのような各
種の化合物が添加されても、導電ペーストを印刷した誘
電体グリーンシートを積層して一括焼成する場合、導電
体グリーンシートと誘電ペーストとが同じように収縮し
ない結果、基板の反りや内層導体と誘電体グリーンシー
トとが部分的に収縮する、いわゆるデラミネーションが
発生した。これは、誘電体グリーンシートと導電ペース
トの収縮開始温度、収縮時の収縮速度および最終的な収
縮率の差に起因するものである。
However, even when such various compounds are added, when the dielectric green sheets on which the conductive paste is printed are laminated and fired at a time, the conductive green sheets and the dielectric paste are not mixed. Similarly, as a result of not shrinking, so-called delamination, in which the substrate is warped or the inner layer conductor and the dielectric green sheet partially shrink, occurs. This is due to the difference between the shrinkage start temperature of the dielectric green sheet and the conductive paste, the shrinkage speed during shrinkage, and the final shrinkage rate.

【0005】さらに、これらの反りやデラミネーション
は積層体の枚数を増やすほど顕著となり、その結果、当
然のこととして積層焼成された積層体の歩留りが低下し
た。本発明は従来の技術の有するこのような問題点に鑑
みてなされたものであって、その目的は、焼成に伴う基
体の反りやデラミネーションが発生することのない多層
電極基板の製造方法を提供することにある。
[0005] Further, these warpage and delamination become more remarkable as the number of laminated bodies increases, and as a result, the yield of laminated and fired laminated bodies naturally declined. SUMMARY OF THE INVENTION The present invention has been made in view of such problems of the prior art, and an object of the present invention is to provide a method of manufacturing a multilayer electrode substrate without warping or delamination of a substrate due to firing. Is to do.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に本発明の要旨は、導電ペースト組成物を基体上に印刷
し、印刷された基体を複数枚積層した後焼成して多層電
極基板を製造する方法において、上記導電ペースト組成
物が、金、銀、パラジウム、白金、銅、あるいはニッケ
ルの中の1種以上の金属粉末と該金属粉末をペースト化
するために必要な有機ビヒクルと、R4-n Si(O
R’)n (ただし、R及びR’はアルキル基あるいはア
リール基を示し、nは1以上4以下の整数である)で示
されるアルコキシシラン化合物を加水分解して得られる
化合物(以下「本化合物」ともいう)とを含有し、且つ
本化合物の配合量が上記金属粉末100重量部に対して
SiO2 換算値で0.01〜5重量部であることを特徴
とする多層電極基板の製造方法にある。
In order to achieve the above object, the gist of the present invention is to print a conductive paste composition on a substrate, stack a plurality of printed substrates, and fire the multilayer electrode substrate. In the method for producing, the conductive paste composition comprises one or more metal powders of gold, silver, palladium, platinum, copper, or nickel, and an organic vehicle required to paste the metal powders; 4-n Si (O
R ′) n (where R and R ′ each represent an alkyl group or an aryl group, and n is an integer of 1 or more and 4 or less) (hereinafter referred to as “the present compound”). ), And the compounding amount of the present compound is 0.01 to 5 parts by weight in terms of SiO 2 with respect to 100 parts by weight of the metal powder. It is in.

【0007】本化合物の導電ペーストへの添加方法は、
『本化合物自身を導電ペースト中に配合するか』、ある
いは『金属粉末を本化合物を含有する溶液中で処理した
後、この処理粉末をペースト化するか』のいずれの方法
でもよい。
The method of adding the present compound to the conductive paste is as follows.
Either "whether the present compound itself is mixed in a conductive paste" or "whether the metal powder is treated in a solution containing the present compound and then the treated powder is formed into a paste" may be used.

【0008】本化合物の製法について説明すると、例え
ばモノメチルトリメトキシシランやジメチルジエトキシ
シランのようなアルコキシシラン化合物の1種以上を、
イソプロピルアルコール、ブチルカルビトールアセテー
ト等のアルコキシシラン化合物が溶解する有機溶媒中で
水を加えて加水分解して製造することができる。加水分
解に際しては、硝酸や有機酸などの酸触媒を加えてもよ
い。また、反応速度を速める目的で反応温度を上げるこ
ともできる。反応が進行するとヒドロキシシラン(R
4-n Si(OH)n )が生成するようになる。(これら
の製法についての詳細は、特開昭63−241076
号、特開昭63−297468号参照)本発明の金、
銀、パラジウム、白金、銅あるいはニッケル粉末の平均
粒径は5μ以下であることが好ましく、粉末形状につい
ては特に限定されない。また、有機ビヒクルについても
ペースト化できればよく、特に限定されない。
The method for producing the present compound will be described. For example, one or more alkoxysilane compounds such as monomethyltrimethoxysilane and dimethyldiethoxysilane are used.
It can be produced by adding water and hydrolyzing in an organic solvent in which an alkoxysilane compound such as isopropyl alcohol and butyl carbitol acetate is dissolved. During the hydrolysis, an acid catalyst such as nitric acid or an organic acid may be added. Further, the reaction temperature can be increased for the purpose of increasing the reaction rate. When the reaction proceeds, hydroxysilane (R
4-n Si (OH) n ) is produced. (Details of these production methods are described in JP-A-63-241076.
No. JP-A-63-297468).
The average particle size of the silver, palladium, platinum, copper or nickel powder is preferably 5 μm or less, and the shape of the powder is not particularly limited. Also, the organic vehicle is not particularly limited as long as it can be made into a paste.

【0009】[0009]

【作用】本化合物を導電ペースト中に含有させることに
より、グリーンシート焼成時にグリーンシートの収縮と
導電ペーストの収縮とをマッチングさせることができ
る。すなわち、本化合物は焼成時に熱分解してシリカ微
粒子を生成するが、このシリカ微粒子が金属の粒子間に
均一に分散され、金属粉末の焼結をコントロールするも
のと考えられる。
When the present compound is contained in the conductive paste, the shrinkage of the green sheet and the shrinkage of the conductive paste can be matched during firing of the green sheet. That is, it is considered that the present compound is thermally decomposed during firing to produce silica fine particles, and the silica fine particles are uniformly dispersed between the metal particles, thereby controlling the sintering of the metal powder.

【0010】また、本化合物は液体状であるためペース
ト中に均一に溶解しやすく、さらにR4-n SiのR基
(アルキル基あるいはアリール基)は有機ビヒクルとの
相溶性がよいため、ペースト化状態での金属粉末の分散
安定性が良好となる。
Further, since the present compound is in a liquid state, it is easily dissolved uniformly in a paste. Further, the R group (alkyl group or aryl group) of R 4-n Si has good compatibility with an organic vehicle. The dispersion stability of the metal powder in the oxidized state is improved.

【0011】さらに、ケイ素原子に結合しているOH基
が金属粉末表面と親和性が高く金属粉末表面を均一に覆
うので、少量で効果を発揮する。従って、金属粉100
重量部に対する本化合物の配合量はSiO2 換算値で
0.01重量部以上あればよい。しかし、0.01重量
部未満では焼結コントロールの効果が少なく、一方、5
重量部を超えると金属粉末の焼結を抑制しすぎて抵抗値
が高くなりすぎるので好ましくない。
Further, the OH group bonded to the silicon atom has a high affinity for the surface of the metal powder and uniformly covers the surface of the metal powder. Therefore, the metal powder 100
The compounding amount of the present compound relative to parts by weight may be 0.01 parts by weight or more in terms of SiO 2 . However, when the amount is less than 0.01 part by weight, the effect of the sintering control is small.
Exceeding the weight part is not preferred because the sintering of the metal powder is suppressed too much and the resistance value becomes too high.

【0012】このように、本化合物を金属粉末100重
量部に対してSiO2 換算値で0.01〜5重量部配合
することにより、金属粉末の焼結が適度に抑制され、焼
成に伴う基板の反りやデラミネーションが発生すること
はなくなる。
As described above, by adding 0.01 to 5 parts by weight of the present compound in terms of SiO 2 with respect to 100 parts by weight of the metal powder, sintering of the metal powder is appropriately suppressed, and Warpage and delamination do not occur.

【0013】[0013]

【実施例】以下、本発明を実施例に基づいて説明する。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below based on embodiments.

【0014】(実施例1) ブチルカルビトールアセテート中にテトラメトキシシラ
ンとジメチルジメトキシシランを加えた後、室温で撹拌
しつつ蒸留水を滴下することによってSiO2換算値で
20重量部の本化合物を合成した。そして、平均粒径
1.3μの銀粉末100重量部に対し、この本化合物を
SiO2 換算値で0〜10重量部と適量の有機ビヒクル
(エチルセルロースのターピネオール溶解液)とを加え
てペースト化した。ペースト化には3本ロールミルを使
用し、ペーストの粘度は10万cps〜40万cpsと
した。次いで、ホウケイ酸系ガラス−アルミナセラミッ
クス混合低温焼成基板用のグリーンシート上に上記ペー
ストを印刷し、500℃で脱バインダー後、900℃で
1時間焼成した。そして、その基板の反りと焼き付けら
れた導体の抵抗値を測定した。
Example 1 After adding tetramethoxysilane and dimethyldimethoxysilane to butyl carbitol acetate, distilled water was added dropwise with stirring at room temperature to obtain 20 parts by weight of the present compound in terms of SiO 2. Synthesized. Then, this compound was pasted into 100 parts by weight of silver powder having an average particle diameter of 1.3 μm by adding 0 to 10 parts by weight in terms of SiO 2 and an appropriate amount of an organic vehicle (a solution of terpineol in ethyl cellulose). . A three-roll mill was used for making the paste, and the viscosity of the paste was 100,000 cps to 400,000 cps. Next, the paste was printed on a green sheet for a borosilicate glass-alumina ceramic mixed low-temperature fired substrate, debindered at 500 ° C, and fired at 900 ° C for 1 hour. Then, the warpage of the substrate and the resistance value of the baked conductor were measured.

【0015】なお、基板の反りの測定は、グリーンシー
ト1枚上に10mm×10mmのパッドを印刷し、焼成した
後の導体が印刷された側のグリーンシート焼成体表面と
導体印刷部の凹凸の頂上部との距離を測定することで求
めた。導体がグリーンシート焼成体表面より凸の場合は
プラス、一方凹の場合はマイナスとした。また、導体の
抵抗値はグリーンシート積層体の最上層に印刷されるパ
ターンより比抵抗で求めた。
The warpage of the substrate was measured by printing a 10 mm × 10 mm pad on one green sheet, and firing and firing the surface of the green sheet fired body on the side where the conductor was printed and the unevenness of the printed conductor. It was determined by measuring the distance to the top. Positive when the conductor was convex from the surface of the green sheet fired body, and negative when it was concave. Further, the resistance value of the conductor was determined by the specific resistance from the pattern printed on the uppermost layer of the green sheet laminate.

【0016】これらの基板の反り(×)と比抵抗(○)
を図1に示す。図1に示すように、本化合物無添加のも
のでは反りは大きいが、本化合物を0.01重量部加え
ると大幅に反りは減少し、5重量部までの添加量では大
きな反りは発生しない。しかし、10重量部も加えると
マイナス側に大きな反りが発生する。また、比抵抗は5
重量部までの添加では非常に小さいが、10重量部も加
えると銀粉の焼成を大幅に抑制するので、比抵抗は増大
する。
The warpage (×) and the specific resistance (○) of these substrates
Is shown in FIG. As shown in FIG. 1, the warpage is large in the case where the present compound is not added, but the warpage is significantly reduced when the present compound is added in an amount of 0.01 part by weight, and no large warp occurs when the addition amount is up to 5 parts by weight. However, if 10 parts by weight is added, a large warp occurs on the minus side. The specific resistance is 5
Addition of up to 10 parts by weight is very small, but addition of 10 parts by weight greatly suppresses the sintering of silver powder, and increases the specific resistance.

【0017】さらに、本化合物をSiO2 換算値で0.
5重量部加えた導体ペーストを印刷したグリーンシート
を30枚積層して焼成したところ、反りは全く見られ
ず、導体の比抵抗も2μΩ・cmと低く、非常に良好な結
果を示した。また、積層体断面のSEM観察でもデラミ
ネーションは全く発生していなかった。
Further, this compound is used in an amount of 0.1 in terms of SiO 2 .
When 30 green sheets printed with the conductor paste to which 5 parts by weight were added were laminated and fired, no warpage was observed, and the specific resistance of the conductor was as low as 2 μΩ · cm, which was a very good result. Delamination did not occur at all in the SEM observation of the cross section of the laminate.

【0018】このように本化合物は少量の添加でも基板
の反りの抑制に優れた効果を示すが、シラン化合物とし
てシランカップリング剤や粉末状のシリカを使用した場
合、これらも金属粉末の焼結のコントロールに効果を発
揮するが、その添加量は本化合物に比べてかなり多量と
なり、その結果導電ペーストの特徴の1つである良導性
が阻害され、抵抗値が大幅に増加してしまう。
As described above, the compound of the present invention exhibits an excellent effect of suppressing the warpage of a substrate even when added in a small amount. However, when a silane coupling agent or powdered silica is used as a silane compound, these compounds also cause sintering of metal powder. However, the amount of the compound added is considerably larger than that of the present compound. As a result, good conductivity, which is one of the characteristics of the conductive paste, is impaired, and the resistance value is greatly increased.

【0019】(実施例2) 平均粒径0.3μの球状のニッケル粉を実施例1の銀粉
に代えて用い、同上の方法でペーストを作製した。図2
は、チタン酸バリウム系の積層セラミックコンデンサー
用グリーンシートにこのペーストを適用した結果である
(×、○の意味は図1と同じである)。グリーンシート
は、350℃(空気中)で脱バインダー後、1250℃
で2時間窒素中で焼成した。図2に示すように、本グリ
ーンシートにおいても図1と同様の傾向を示しており、
本化合物の添加がグリーンシートの反りの抑制に対して
非常に有効に作用することが分かる。
Example 2 A paste was prepared in the same manner as in Example 1 except that spherical nickel powder having an average particle diameter of 0.3 μm was used in place of the silver powder of Example 1. FIG.
Is the result of applying this paste to a barium titanate-based green sheet for a multilayer ceramic capacitor (the meanings of x and o are the same as in FIG. 1). After debinding at 350 ° C (in air), the green sheet is 1250 ° C
For 2 hours in nitrogen. As shown in FIG. 2, this green sheet also shows the same tendency as FIG.
It can be seen that the addition of this compound has a very effective effect on suppressing the warpage of the green sheet.

【0020】さらに、本化合物をSiO2 換算値で1重
量部加えた導電ペーストを印刷したグリーンシートを1
00枚積層して焼成しても、反り、デラミネーションと
もに認められず、良好な結果を示した。
Further, a green sheet printed with a conductive paste obtained by adding 1 part by weight of the present compound in terms of SiO 2 was prepared.
Even when 00 sheets were laminated and fired, neither warpage nor delamination was observed, and good results were shown.

【0021】[0021]

【発明の効果】本発明により、焼成に伴う基板の反りや
デラミネーションが発生することのない多層電極基板の
製造方法を提供することができる。
According to the present invention, it is possible to provide a method for manufacturing a multilayer electrode substrate which does not cause warpage or delamination of the substrate due to firing.

【図面の簡単な説明】[Brief description of the drawings]

【図1】低温焼成多層基板用グリーンシートの反りと比
抵抗に及ぼす本化合物の添加量の効果を示す図である。
FIG. 1 is a graph showing the effect of the amount of the present compound on the warpage and specific resistance of a green sheet for a low-temperature fired multilayer substrate.

【図2】積層セラミックコンデンサー用グリーンシート
の反りと比抵抗に及ぼす本化合物の添加量の効果を示す
図である。
FIG. 2 is a graph showing the effect of the amount of the present compound on the warpage and specific resistance of a green sheet for a multilayer ceramic capacitor.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 桐生 やまお 滋賀県大津市若葉台27−13 (56)参考文献 特開 平1−189806(JP,A) 特開 昭55−62938(JP,A) 特開 平3−122162(JP,A) 特開 昭57−155386(JP,A) 実開 昭63−115252(JP,U) ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yamao Kiryu 27-13 Wakabadai, Otsu City, Shiga Prefecture (56) References JP-A-1-189806 (JP, A) JP-A-55-62938 (JP, A) JP-A-3-122162 (JP, A) JP-A-57-155386 (JP, A) JP-A-63-115252 (JP, U)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 導電ペースト組成物を基体上に印刷し、
印刷された基体を複数枚積層した後焼成して多層電極基
板を製造する方法において、上記導電ペースト組成物
、金、銀、パラジウム、白金、銅、あるいはニッケル
の中の1種以上の金属粉末と該金属粉末をペースト化す
るために必要な有機ビヒクルと、R4-nSi(OR’)
n (ただし、R及びR’はアルキル基あるいはアリール
基を示し、nは1以上4以下の整数である)で示される
アルコキシシラン化合物を加水分解して得られる化合物
とを含有し、且つ該加水分解後の化合物の配合量が上記
金属粉末100重量部に対してSiO2 換算値で0.0
1〜5重量部であることを特徴とする多層電極基板の製
造方法
(1) printing a conductive paste composition on a substrate,
After laminating a plurality of printed substrates, firing is performed to form a multilayer electrode substrate.
In the method for producing a plate, the conductive paste composition
But gold, silver, palladium, platinum, copper, or an organic vehicle necessary to paste at least one metal powder and the metal powder in the nickel, R 4-n Si (OR ')
n (where R and R ′ each represent an alkyl group or an aryl group, and n is an integer of 1 or more and 4 or less), and a compound obtained by hydrolyzing an alkoxysilane compound represented by the formula: The compounding amount of the decomposed compound is 0.02 in terms of SiO 2 with respect to 100 parts by weight of the metal powder.
1 to 5 parts by weight of a multilayer electrode substrate
Construction method .
JP3210909A 1991-08-22 1991-08-22 Method for manufacturing multilayer electrode substrate Expired - Lifetime JP2578273B2 (en)

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Application Number Priority Date Filing Date Title
JP3210909A JP2578273B2 (en) 1991-08-22 1991-08-22 Method for manufacturing multilayer electrode substrate

Publications (2)

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JPH0554714A JPH0554714A (en) 1993-03-05
JP2578273B2 true JP2578273B2 (en) 1997-02-05

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7291789B2 (en) 2002-07-17 2007-11-06 Ngk Spark Plug Co., Ltd. Copper paste and wiring board using the same

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JP4659463B2 (en) * 2004-01-30 2011-03-30 東光株式会社 Multilayer inductor and manufacturing method thereof
JP4965232B2 (en) * 2006-11-27 2012-07-04 ナミックス株式会社 Conductive paste
JP4854705B2 (en) * 2008-05-26 2012-01-18 Dowaエレクトロニクス株式会社 Silver powder for conductive paste and conductive paste using the silver powder

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5562938A (en) * 1978-11-02 1980-05-12 Matsushita Electric Ind Co Ltd Electrically conductive resin
JPS57155386A (en) * 1981-03-18 1982-09-25 Murata Mfg Co Ltd Preventing method for oxidation of copper powder
JPS63115252U (en) * 1987-01-21 1988-07-25
JPH0662738B2 (en) * 1988-01-26 1994-08-17 住友ベークライト株式会社 Conductive resin paste
JPH0686571B2 (en) * 1989-10-06 1994-11-02 株式会社日板研究所 Antibacterial / conductive composition and antibacterial / conductive resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7291789B2 (en) 2002-07-17 2007-11-06 Ngk Spark Plug Co., Ltd. Copper paste and wiring board using the same

Also Published As

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JPH0554714A (en) 1993-03-05

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