JP2571864B2 - Thick film type thermal head - Google Patents

Thick film type thermal head

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Publication number
JP2571864B2
JP2571864B2 JP2109643A JP10964390A JP2571864B2 JP 2571864 B2 JP2571864 B2 JP 2571864B2 JP 2109643 A JP2109643 A JP 2109643A JP 10964390 A JP10964390 A JP 10964390A JP 2571864 B2 JP2571864 B2 JP 2571864B2
Authority
JP
Japan
Prior art keywords
film
silver
common electrode
silver film
thermal head
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2109643A
Other languages
Japanese (ja)
Other versions
JPH047161A (en
Inventor
浩昭 林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP2109643A priority Critical patent/JP2571864B2/en
Publication of JPH047161A publication Critical patent/JPH047161A/en
Application granted granted Critical
Publication of JP2571864B2 publication Critical patent/JP2571864B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (イ)産業上の利用分野 この発明は、共通電極を銀膜で補強した厚膜型サーマ
ルヘッドに関する。
The present invention relates to a thick-film type thermal head in which a common electrode is reinforced with a silver film.

(ロ)従来の技術 従来の厚膜型サーマルヘッドの構成を第3図に基づい
て以下に説明する。12は、アルミナセラミック等の材質
よりなる基板であり、その表面には、蓄熱層としてのガ
ラスグレーズ層13が形成されている〔第3図(a)参
照〕。
(B) Conventional technology The configuration of a conventional thick film type thermal head will be described below with reference to FIG. Reference numeral 12 denotes a substrate made of a material such as alumina ceramic, on the surface of which a glass glaze layer 13 as a heat storage layer is formed [see FIG. 3 (a)].

ガラスグレーズ層13上には、金膜よりなる共通電極14
及び個別電極16が形成されており、これらの先端部14
a、16aは櫛歯状に交互に噛み合う配置とされる〔第3図
(b)参照〕。この金膜は金ペーストを印刷・焼成して
なるもので、金(Au)だけではなく、ガラス成分等も含
まれている。これら共通電極先端部14a、…、個別電極
先端部16a、…上には、帯状の発熱抵抗体17が形成され
ている。
A common electrode 14 made of a gold film is formed on the glass glaze layer 13.
And the individual electrodes 16 are formed.
The a and 16a are arranged so as to be alternately meshed in a comb shape (see FIG. 3 (b)). The gold film is formed by printing and firing a gold paste, and includes not only gold (Au) but also a glass component and the like. A strip-shaped heating resistor 17 is formed on the common electrode tips 14a,..., The individual electrode tips 16a,.

第3図に示すように、発熱抵抗体17が基板12のエッジ
に沿って形成される場合、すなわちエッジ型の場合に
は、共通電極14の幅が大きくとれないため、その抵抗値
が増大し、電圧降下が大きくなってしまう。そこで、共
通電極14上には、補強用の銀膜15を形成している。この
銀膜15は、銀ペーストを印刷・焼成してなるもので、銀
(Ag)、ガラス成分等より構成される。
As shown in FIG. 3, when the heating resistor 17 is formed along the edge of the substrate 12, that is, in the case of the edge type, the width of the common electrode 14 cannot be made large, so that the resistance value increases. , The voltage drop becomes large. Therefore, a reinforcing silver film 15 is formed on the common electrode 14. The silver film 15 is formed by printing and baking a silver paste, and is made of silver (Ag), a glass component, or the like.

共通電極14、銀膜15、個別電極16及び発熱抵抗体17
は、耐摩耗層18で被覆されると共に感熱記録紙との摩耗
から保護される。
Common electrode 14, silver film 15, individual electrode 16, and heating resistor 17
Is covered with a wear-resistant layer 18 and protected from abrasion with the thermal recording paper.

(ハ)発明が解決しようとする課題 上記銀膜は、銀ペーストを印刷し、これを高温で焼成
して形成されるが、その際に金膜中の金により合金層を
生じてしまい、比抵抗が増大してしまう。第2図(a)
に示すように、グレーズ層13上に銀膜Sのみで共通電極
を構成した場合では、8インチサイズのサーマルヘッド
で共通電極の抵抗値は約0.7Ωとなる。ところが、第2
図(b)に示すように、金膜G上に銀膜Sを重ねて共通
電極とした場合には、8インチサイズのサーマルヘッド
で1.8Ωにまで抵抗値が増大し、銀膜Sのみの場合と比
べて2倍以上になってしまう。
(C) Problems to be Solved by the Invention The silver film is formed by printing a silver paste and baking it at a high temperature. At that time, the gold in the gold film forms an alloy layer, and The resistance increases. Fig. 2 (a)
As shown in the figure, when the common electrode is formed only of the silver film S on the glaze layer 13, the resistance value of the common electrode is about 0.7Ω in an 8-inch size thermal head. However, the second
As shown in FIG. 5B, when a silver film S is superimposed on a gold film G to form a common electrode, the resistance increases to 1.8Ω with an 8-inch size thermal head, and only the silver film S is used. It is more than twice as large as the case.

そこで、従来は銀膜を二層以上重ねて形成することが
行われており、第3図では、二層の銀膜15a、15bを積層
し(例えば両者の膜厚は共に10μm)、共通電極14を補
強している。
In view of this, conventionally, two or more silver films are formed to be stacked. In FIG. 3, two silver films 15a and 15b are stacked (for example, both have a film thickness of 10 μm) and a common electrode is formed. 14 are reinforced.

ところが、銀膜を積層して形成し、その膜厚を大きく
すると、それだけ銀(ペースト)が多量に必要となりコ
ストが上昇してしまう問題点があった。また、銀膜15と
発熱抵抗体17との高低差が大きくなり、発熱抵抗体17へ
のプラテン(図示せず)のあたりが弱くなって、印字濃
度が下がり、印字品位が損なわれる。このため、印字濃
度を上げるには、印加するエネルギを増加しなければな
らない問題点があった。
However, when a silver film is formed by lamination and the film thickness is increased, a large amount of silver (paste) is required and the cost is increased. In addition, the height difference between the silver film 15 and the heating resistor 17 becomes large, and the contact of the platen (not shown) to the heating resistor 17 becomes weak, so that the print density is reduced and the print quality is impaired. For this reason, there is a problem that the applied energy must be increased in order to increase the print density.

この発明は上記に鑑みなされたもので、補強用銀膜の
膜厚を小さくし、コストの低減及び印字品位の向上を図
れる厚膜型サーマルヘッドの提供を目的としている。
The present invention has been made in view of the above, and an object of the present invention is to provide a thick-film type thermal head capable of reducing the thickness of a reinforcing silver film, reducing costs and improving printing quality.

(ニ)課題を解決するための手段及び作用 上記課題を解決するため、この発明の厚膜型サーマル
ヘッドは、基板上にグレーズ層を形成し、このグレーズ
層上には金膜よりなる共通電極及び個別電極を形成し、
共通電極先端部と個別電極先端部とを交互に噛み合うよ
うに配置し、これら共通電極先端部及び個別電極先端部
上には帯状の発熱抵抗体が形成され、前記共通電極上に
は、少なくとも二層以上の銀膜を積層した補強用の銀膜
を形成してなるものにおいて、前記銀膜の内、共通電極
に接する銀膜の膜厚をそれ以外の銀膜の膜厚より小さく
したことを特徴とするものである。
(D) Means and Action for Solving the Problems To solve the above problems, a thick film type thermal head according to the present invention forms a glaze layer on a substrate, and a common electrode made of a gold film on the glaze layer. And forming individual electrodes,
A common electrode tip and an individual electrode tip are arranged so as to alternately mesh with each other, and a strip-shaped heating resistor is formed on the common electrode tip and the individual electrode tip, and at least two heating resistors are formed on the common electrode. In the case where a reinforcing silver film in which at least two silver films are laminated is formed, the thickness of the silver film in contact with the common electrode is smaller than the thickness of the other silver films. It is a feature.

この発明の厚膜型サーマルヘッドでは、共通電極に接
する銀膜は、膜厚を小さくし合金化を終結させるための
ものとし、共通電極の補強は前記銀膜上に積層される他
の銀膜に担わせる。従って、同じ抵抗値ならば、銀膜全
体の厚さを小さくすることができ、銀ペースト使用量の
低減及び銀膜と発熱抵抗体との高低差の緩和を図ること
が可能となる。
In the thick film type thermal head according to the present invention, the silver film in contact with the common electrode is for reducing the film thickness and terminating alloying, and the common electrode is reinforced by another silver film laminated on the silver film. To carry. Therefore, with the same resistance value, the thickness of the entire silver film can be reduced, and the amount of silver paste used can be reduced, and the difference in height between the silver film and the heating resistor can be reduced.

(ホ)実施例 この発明の一実施例を第1図に基づいて以下に説明す
る。
(E) Embodiment One embodiment of the present invention will be described below with reference to FIG.

第1図(a)は、実施例厚膜型サーマルヘッドの要部
断面図を示している。2は、アルミナセラミック等の材
質よりなる基板で、その表面には蓄熱層として機能する
ガラスグレーズ層3が形成されている。このガラスグレ
ーズ層3は、基板2表面に非晶質ガラスペーストを印刷
し、焼成してなるものである。
FIG. 1A is a cross-sectional view of a main part of the thick-film type thermal head of the embodiment. Reference numeral 2 denotes a substrate made of a material such as alumina ceramic, on the surface of which a glass glaze layer 3 functioning as a heat storage layer is formed. The glass glaze layer 3 is formed by printing and firing an amorphous glass paste on the surface of the substrate 2.

ガラスグレーズ層3上には、共通電極4及び個別電極
6、…、6が形成される〔第1図(b)も参照〕。これ
ら共通電極4及び個別電極6、…、6を形成するにあた
っては、まずガラスグレーズ層3上に、金ペーストを印
刷し、これを焼成して金膜を形成する。そして、この金
膜をホトリソグラフィーを適用してパターン付けし、共
通電極4及び個別電極6、…、6とする。
A common electrode 4 and individual electrodes 6,..., 6 are formed on the glass glaze layer 3 (see also FIG. 1 (b)). When forming the common electrode 4 and the individual electrodes 6,..., 6 first, a gold paste is printed on the glass glaze layer 3, and the gold paste is fired to form a gold film. Then, this gold film is patterned by applying photolithography to form a common electrode 4 and individual electrodes 6,.

共通電極4は、基板2のエッジに沿って延伸してお
り、櫛歯状の先端部4a、…、4aが列設されている。これ
ら先端部4a、…、4aと交互に噛み合うように、個別電極
先端部6a、…、6aが配置されている。
The common electrode 4 extends along the edge of the substrate 2, and has a plurality of comb-like tips 4a,..., 4a. The individual electrode tips 6a,..., 6a are arranged so as to alternately mesh with the tips 4a,.

共通電極4上には、補強用の銀膜5が形成されてい
る。銀膜5は、下層銀膜5a、上層銀膜5bを積層してなる
もので、例えば、下層銀膜5aの膜厚は2μm、上層銀膜
5bの膜厚は10μmとする。もちろん、両者の膜厚はこれ
に限定されるものではなく、共通電極4を構成する金膜
の膜厚、金の含有量に合わせて適宜変更するが、下層銀
膜5aの膜厚はそれ以外の銀膜(この場合は上層銀膜5b)
よりは常に小さく設定する。
On the common electrode 4, a silver film 5 for reinforcement is formed. The silver film 5 is formed by stacking a lower silver film 5a and an upper silver film 5b. For example, the lower silver film 5a has a thickness of 2 μm,
The film thickness of 5b is 10 μm. Of course, the film thickness of both is not limited to this, and is appropriately changed according to the film thickness of the gold film constituting the common electrode 4 and the content of gold, but the film thickness of the lower silver film 5a is other than that. Silver film (in this case, upper silver film 5b)
Always set smaller.

銀膜5の形成は、まず下層銀膜5a用の銀ペーストを印
刷し、これを焼成する。この焼成の際に金膜中の金によ
る合金層が生じ、下層銀膜5aは比抵抗の高い状態となっ
ている。
To form the silver film 5, first, a silver paste for the lower silver film 5a is printed and baked. During this firing, an alloy layer of gold in the gold film is formed, and the lower silver film 5a is in a state of high specific resistance.

次に、下層銀膜5a上に、上層銀膜5b用の銀ペーストを
印刷し、これを焼成する。この焼成の際には、上層銀膜
5bには合金層がほとんど生じないことが実験的に確かめ
られている。従って、合金化反応は下層銀膜5aで終結し
ており、上層銀膜5bの比抵抗は、ガラスグレーズ層上に
銀膜を直接形成した場合とほとんどかわらない。
Next, a silver paste for the upper silver film 5b is printed on the lower silver film 5a, and is fired. During this firing, the upper silver film
It has been experimentally confirmed that almost no alloy layer is formed in 5b. Therefore, the alloying reaction ends at the lower silver film 5a, and the specific resistance of the upper silver film 5b is almost the same as when the silver film is directly formed on the glass glaze layer.

一方、両電極先端部4a、6a、…上には帯状の発熱抵抗
体7が形成される。発熱抵抗体7は、酸化ルテニウム等
の抵抗成分を含む抵抗体ペーストをスクリーン印刷し、
これを焼成してなるものである。発熱抵抗体7の、相隣
合う共通電極先端部4a、4aで挟まれる部分が一つのドッ
トに対応している。
On the other hand, a strip-shaped heating resistor 7 is formed on both electrode tips 4a, 6a,. The heating resistor 7 is screen-printed with a resistor paste containing a resistance component such as ruthenium oxide,
This is fired. The portion of the heating resistor 7 sandwiched between the adjacent common electrode tips 4a, 4a corresponds to one dot.

基板2上には、さらに耐摩耗層8が形成され、共通電
極4、銀膜5、個別電極6及び発熱抵抗体7が被覆、絶
縁され、感熱記録紙との摩耗より保護される。この耐摩
耗層8は、非晶質ガラスペーストを印刷・焼成して形成
される。
An abrasion-resistant layer 8 is further formed on the substrate 2 to cover and insulate the common electrode 4, the silver film 5, the individual electrodes 6, and the heating resistor 7, thereby protecting the recording medium from abrasion with the thermal recording paper. The wear-resistant layer 8 is formed by printing and firing an amorphous glass paste.

この実施例厚膜型サーマルヘッドでは、銀膜S全体と
しての膜厚を従来の2/3程度まで小さくできるため、銀
(ペースト)の使用量が従来よりも少なくなり、コスト
の低減を図ることができる。また、銀膜5と発熱抵抗体
7との高低差が緩和され、発熱抵抗体7へのプラテンの
あたりが改善される。このため印字濃度が高くなって印
字品位が向上し、印加エネルギも少なくて済み、省エネ
ルギ化を図ることができる。
In the thick-film type thermal head of this embodiment, since the thickness of the silver film S as a whole can be reduced to about 2/3 of the conventional thickness, the amount of silver (paste) used is smaller than in the conventional case, and the cost is reduced. Can be. In addition, the height difference between the silver film 5 and the heating resistor 7 is reduced, and the contact of the platen to the heating resistor 7 is improved. For this reason, the print density is increased, the print quality is improved, the applied energy is reduced, and energy saving can be achieved.

(ヘ)発明の効果 以上説明したように、この発明の厚膜型サーマルヘッ
ドは、二層以上の銀膜を積層した補強用の銀膜の内、共
通電極に接する銀膜の膜厚をそれ以外の銀膜の膜厚より
小さくしたことを特徴としたものであり、共通電極の補
強効果を維持したまま、銀膜全体の膜厚を小さくでき、
コストの低減、印字品位の向上及び駆動時の省エネルギ
化を図れる利点を有している。
(F) Effect of the Invention As described above, the thick-film type thermal head of the present invention has the thickness of the silver film in contact with the common electrode among the reinforcing silver films in which two or more silver films are laminated. It is characterized by being smaller than the thickness of the silver film other than that, while maintaining the reinforcing effect of the common electrode, the thickness of the entire silver film can be reduced,
It has the advantages of reducing costs, improving printing quality, and saving energy during driving.

【図面の簡単な説明】[Brief description of the drawings]

第1図(a)は、この発明の一実施例に係る厚膜型サー
マルヘッドの要部断面図、第1図(b)は、同厚膜型サ
ーマルヘッドの電極及び発熱抵抗体の配置を説明する
図、第2図(a)及び第2図(b)は、銀膜単層での抵
抗値の挙動を説明する断面図、第3図(a)は、従来の
厚膜型サーマルヘッドの要部断面図、第3図(b)は、
同従来の厚膜型サーマルヘッドの電極及び発熱抵抗体の
配置を説明する図である。 2:基板、3:ガラスグレーズ層、 4:共通電極、5:銀膜、 5a:下層銀膜、5b:上層銀膜、 6・…・6:個別電極、7:発熱抵抗体。
FIG. 1A is a sectional view of a principal part of a thick-film type thermal head according to an embodiment of the present invention, and FIG. 1B is a diagram showing the arrangement of electrodes and heating resistors of the thick-film type thermal head. FIGS. 2 (a) and 2 (b) are cross-sectional views for explaining the behavior of the resistance value of a single silver film, and FIG. 3 (a) is a conventional thick film type thermal head. FIG. 3 (b) is a sectional view of a main part of FIG.
FIG. 4 is a diagram illustrating the arrangement of electrodes and heating resistors of the conventional thick film type thermal head. 2: substrate, 3: glass glaze layer, 4: common electrode, 5: silver film, 5a: lower silver film, 5b: upper silver film, 6... 6: individual electrode, 7: heating resistor.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】基板上にグレーズ層を形成し、このグレー
ズ層上には金膜よりなる共通電極及び個別電極を形成
し、共通電極先端部と個別電極先端部とを交互に噛み合
うように配置し、これら共通電極先端部及び個別電極先
端部上には帯状の発熱抵抗体が形成され、前記共通電極
上には、少なくとも二層以上の銀膜を積層した補強用の
銀膜を形成してなる厚膜型サーマルヘッドにおいて、 前記銀膜の内、共通電極に接する銀膜の膜厚をそれ以外
の銀膜の膜厚より小さくしたことを特徴とする厚膜型サ
ーマルヘッド。
1. A glaze layer is formed on a substrate, and a common electrode and an individual electrode made of a gold film are formed on the glaze layer, and the common electrode tips and the individual electrode tips are arranged so as to alternately mesh with each other. A strip-shaped heating resistor is formed on the common electrode tip and the individual electrode tip, and a reinforcing silver film formed by stacking at least two or more silver films is formed on the common electrode. A thick-film type thermal head according to claim 1, wherein the thickness of the silver film in contact with the common electrode is smaller than the thickness of the other silver films.
JP2109643A 1990-04-24 1990-04-24 Thick film type thermal head Expired - Lifetime JP2571864B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2109643A JP2571864B2 (en) 1990-04-24 1990-04-24 Thick film type thermal head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2109643A JP2571864B2 (en) 1990-04-24 1990-04-24 Thick film type thermal head

Publications (2)

Publication Number Publication Date
JPH047161A JPH047161A (en) 1992-01-10
JP2571864B2 true JP2571864B2 (en) 1997-01-16

Family

ID=14515484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2109643A Expired - Lifetime JP2571864B2 (en) 1990-04-24 1990-04-24 Thick film type thermal head

Country Status (1)

Country Link
JP (1) JP2571864B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6448993B1 (en) 1997-07-22 2002-09-10 Rohm Co., Ltd. Construction of thermal print head and method of forming protective coating
JP2014087938A (en) * 2012-10-29 2014-05-15 Rohm Co Ltd Thermal print head
JP6383852B2 (en) * 2017-10-04 2018-08-29 ローム株式会社 Thermal print head

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0712694B2 (en) * 1986-10-23 1995-02-15 三菱電機株式会社 Thermal head
JPH0280262A (en) * 1988-09-19 1990-03-20 Hitachi Ltd Thermal head

Also Published As

Publication number Publication date
JPH047161A (en) 1992-01-10

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