JP2546178B2 - Leadless diode - Google Patents

Leadless diode

Info

Publication number
JP2546178B2
JP2546178B2 JP5322686A JP32268693A JP2546178B2 JP 2546178 B2 JP2546178 B2 JP 2546178B2 JP 5322686 A JP5322686 A JP 5322686A JP 32268693 A JP32268693 A JP 32268693A JP 2546178 B2 JP2546178 B2 JP 2546178B2
Authority
JP
Japan
Prior art keywords
semiconductor element
tubular insulator
slag
insulator
slugs
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5322686A
Other languages
Japanese (ja)
Other versions
JPH07176663A (en
Inventor
朗 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP5322686A priority Critical patent/JP2546178B2/en
Publication of JPH07176663A publication Critical patent/JPH07176663A/en
Application granted granted Critical
Publication of JP2546178B2 publication Critical patent/JP2546178B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Die Bonding (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はリードレスダイオードの
構造の改良に関する。
FIELD OF THE INVENTION The present invention relates to improvements in the structure of leadless diodes.

【0002】[0002]

【従来の技術】図2および図3は、従来例におけるケー
ス材質にガラス管を用い、外部電極としてスラグリード
を用いたリードレスダイオードの構成を示す断面図であ
る。ガラス管11内に半導体素子4が封止されたこの種
のダイオードは、スラグ2aおよび2bとフランジ3a
および3bとにより構成された一対のスラグリードを使
用して半導体素子4をガラス管11内に保持し、スラグ
リードのスラグ2aおよび2bの外周面をガラス管11
に溶着させて、半導体素子4をガラス管11内に封止し
て構成されている。
2. Description of the Related Art FIGS. 2 and 3 are sectional views showing the structure of a leadless diode using a glass tube as a case material and a slug lead as an external electrode in a conventional example. This type of diode, in which the semiconductor element 4 is sealed in the glass tube 11, is composed of the slugs 2a and 2b and the flange 3a.
The semiconductor element 4 is held in the glass tube 11 by using a pair of slag leads composed of the slag leads 3a and 3b, and the outer peripheral surfaces of the slugs 2a and 2b of the slag leads are held by the glass tube 11
The semiconductor element 4 is sealed in the glass tube 11 by welding.

【0003】このリードレスダイオードは、封止治具1
2に設けた孔にフランジ3bを下にしてスラグリードを
挿入し、次にガラス管11および半導体素子4を挿入
し、さらにフランジ3aを上にしてスラグ2aを挿入し
封止される。続いてガラス管11内で半導体素子4を両
スラグリードのスラグ2aおよび2bの端面にて狭持し
た状態で封止治具を加熱し、ガラス管11をスラグ2a
および2bの外周部に溶着させて作成されている(特公
昭58−168269号公報)。
This leadless diode has a sealing jig 1
The slag lead is inserted into the hole provided in 2 with the flange 3b facing down, then the glass tube 11 and the semiconductor element 4 are inserted, and the slug 2a is inserted with the flange 3a facing up to be sealed. Subsequently, the sealing jig is heated in a state where the semiconductor element 4 is sandwiched between the slugs 2a and 2b of both slag leads in the glass tube 11 to heat the glass tube 11 to the slag 2a.
And 2b are welded to the outer peripheral portion (Japanese Patent Publication No. 58-168269).

【0004】[0004]

【発明が解決しようとする課題】マイクロ波ダイオード
は半導体素子の構造上アクティブエリア開口部がφ10
μm〜φ20μmと比較的小さく、電極構造も平面電極
とバンプ形状電極との2種類に大別される。
Due to the structure of the semiconductor device, the microwave diode has an active area opening of φ10.
The size of the electrode structure is relatively small, that is, .mu.m to .phi.20 .mu.m.

【0005】この中でバンプ形状電極品は、一般的にガ
ラスパッケージ品に使用される。このバンプ形状電極品
の場合、アクティブエリア開口部が小さいためバンプ形
状電極との接続部での密着強度が30〜60grと弱
く、かつ接合部の深さも浅いため機械的応力に弱く、特
性劣化などを引きおこし易い。
Among them, the bump-shaped electrode product is generally used for a glass package product. In the case of this bump-shaped electrode product, since the opening of the active area is small, the adhesion strength at the connection portion with the bump-shaped electrode is weak at 30 to 60 gr, and the depth of the bonding portion is also weak, so it is weak against mechanical stress and the characteristics are degraded. It is easy to cause

【0006】また、特性面ではショットキダイオードの
場合、その性質上熱応力によるショットキ性劣化モード
があるので熱に対する考慮が必要である。前述した従来
例の場合、スラグ部とフランジ部とからなる一対のスラ
グリードを使用してスラグリードをケースに挿入し、ス
ラグ部を直接半導体素子のバンプ形状電極上面に圧接
し、ガラスとスラグリードを高温(500〜600℃程
度)で溶着封止する方法がとられている。
Further, in terms of characteristics, in the case of a Schottky diode, due to its nature, there is a Schottky deterioration mode due to thermal stress, so heat must be taken into consideration. In the case of the conventional example described above, the slag lead is inserted into the case by using a pair of slag leads including the slag portion and the flange portion, and the slug portion is directly pressed onto the upper surface of the bump-shaped electrode of the semiconductor element, and the glass and the slag lead are connected. Is sealed at a high temperature (about 500 to 600 ° C.).

【0007】この方法では、上述したようにマイクロ波
ダイオードは半導体素子の構造上スラグ部が直接圧接さ
れた場合に、バンプ形状電極に過大な荷重が加わり、機
械的応力による接合部の破壊やバンプ形状電極の破損な
どによって特性劣化を起こす問題がある。
According to this method, as described above, in the microwave diode, when the slug portion is directly pressure-contacted due to the structure of the semiconductor element, an excessive load is applied to the bump-shaped electrode, and the joint portion is broken or the bump is broken by mechanical stress. There is a problem that characteristic deterioration is caused by damage to the shape electrode.

【0008】本発明はこのような問題を解決するもの
で、組立時に半導体素子に加わる機械的応力あるいは熱
応力による影響を少くし、特性劣化を防止することがで
きるリードレスダイオードを提供することを目的とす
る。
The present invention solves such a problem, and it is an object of the present invention to provide a leadless diode capable of reducing the influence of mechanical stress or thermal stress applied to a semiconductor element during assembly and preventing characteristic deterioration. To aim.

【0009】[0009]

【課題を解決するための手段】本発明は、筒状絶縁体
と、導電材料からなりこの筒状絶縁体の内部に両側の開
口部からそれぞれ挿入されこの筒状絶縁体に固着される
二つのスラグと、前記筒状絶縁体の内部に配置され前記
二つのスラグの間に圧接される半導体素子とを備えたリ
ードレスダイオードにおいて、前記半導体素子の電極と
前記スラグの端面との間に導電性弾性材料によりC形に
形成されたCベンドが介挿されたことを特徴とする。
According to the present invention, there is provided a tubular insulator, and two tubular insulators made of a conductive material which are inserted into the tubular insulator through openings on both sides and fixed to the tubular insulator. In a leadless diode comprising a slug and a semiconductor element that is disposed inside the tubular insulator and is pressure-contacted between the two slugs, a conductive material is provided between an electrode of the semiconductor element and an end surface of the slug. It is characterized in that a C bend formed in a C shape by an elastic material is inserted.

【0010】前記筒状絶縁体は、角柱状セラミック材に
より形成され、前記スラグにそれぞれ固定され前記筒状
絶縁体の両側の開口部を封止するフランジを備えること
が望ましい。
It is preferable that the tubular insulator is provided with a flange formed of a prismatic ceramic material and fixed to the slugs to seal openings on both sides of the tubular insulator.

【0011】[0011]

【作用】半導体素子が弾力性のあるCベンドを介在して
スラグおよびフランジにより構成されたスラグリードに
より筒状絶縁体内に封止されるので、構成部品の寸法ば
らつきが吸収され、かつ半導体素子への応圧力を所定範
囲内に設定することが可能となる。したがって半導体素
子に加えられる機械的応力は適した値に保たれ、接合部
の破壊や電極の破損がなくなり、特性劣化が防止され
る。
Since the semiconductor element is sealed in the cylindrical insulator by the slag lead constituted by the slag and the flange with the elastic C bend interposed, the dimensional variation of the component parts is absorbed and the semiconductor element is transferred to the semiconductor element. It is possible to set the responsive pressure of within a predetermined range. Therefore, the mechanical stress applied to the semiconductor element is maintained at an appropriate value, the damage of the joint portion and the damage of the electrode are eliminated, and the characteristic deterioration is prevented.

【0012】また、筒状絶縁体をガラス管に代えてセラ
ミック材を使用することにより、各接合部をろう付けす
る際の加熱温度を低下させることができるので、熱応力
が小さくなるとともに、半導体素子が高温を受けずにす
むため加工時の加熱による劣化を避けることができる。
Further, by using a ceramic material instead of the glass tube for the cylindrical insulator, the heating temperature at the time of brazing each joint can be lowered, so that the thermal stress is reduced and the semiconductor is reduced. Since the element does not need to be exposed to high temperatures, deterioration due to heating during processing can be avoided.

【0013】[0013]

【実施例】次に、本発明実施例を図面に基づいて説明す
る。図1は本発明実施例の構成を示す図である。
Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a diagram showing a configuration of an embodiment of the present invention.

【0014】本発明実施例は、筒状絶縁体1と、導電材
料からなりこの筒状絶縁体1の内部に両側の開口部から
それぞれ挿入され筒状絶縁体1に固着される二つのスラ
グ2a、2bと、筒状絶縁体1の内部に配置され二つの
スラグ2a、2bの間に圧接される半導体素子4とを備
え、さらに、本発明の特徴として、半導体素子4の電極
とスラグ2a、2bの端面との間に導電性弾性材料によ
りC形に形成されたCベンド5が介挿され、筒状絶縁体
1は、角柱状セラミック材により形成され、スラグ2
a、2bにそれぞれ固定され筒状絶縁体1の両側の開口
部を封止するフランジ3a、3bを備える。
In the embodiment of the present invention, a tubular insulator 1 and two slugs 2a made of a conductive material and fixed to the tubular insulator 1 are inserted into the tubular insulator 1 through openings on both sides thereof. 2b and a semiconductor element 4 arranged inside the cylindrical insulator 1 and pressed between the two slugs 2a and 2b. Further, as a feature of the present invention, an electrode of the semiconductor element 4 and the slug 2a, A C-bend 5 formed in a C shape by a conductive elastic material is interposed between the end surface of 2b, and the cylindrical insulator 1 is formed by a prismatic ceramic material, and the slag 2 is formed.
It is provided with flanges 3a and 3b which are fixed to a and 2b respectively and seal the openings on both sides of the tubular insulator 1.

【0015】ここで、本発明実施例の製造工程について
図面を参照して説明する。
Here, the manufacturing process of the embodiment of the present invention will be described with reference to the drawings.

【0016】スラグ2aおよびフランジ3aにより構成
されたスラグリードのダイマウント部にバンプ形状の電
極4aを備えた半導体素子4を銀錫合金などのろう材に
より接着固定し、これを角柱状セラミックにより形成さ
れた筒状絶縁体1の一方の端面側から挿入する。このと
き筒状絶縁体の端面とフランジ3aの当り面とはAu、
Snを主成分とするろう材によりろう付けされる。
A semiconductor element 4 provided with bump-shaped electrodes 4a is adhered and fixed to a die mount portion of a slag lead constituted by a slag 2a and a flange 3a by a brazing material such as silver-tin alloy, which is formed of prismatic ceramics. The cylindrical insulator 1 is inserted from one end face side. At this time, the end surface of the cylindrical insulator and the contact surface of the flange 3a are Au,
It is brazed with a brazing material containing Sn as a main component.

【0017】また、筒状絶縁体1の他方の端面側から
は、スラグ2b、フランジ3b、およびCベンド5によ
り構成されたスラグリードを挿入し、筒状絶縁体1の端
面とフランジ3bの当り面とを同様にろう材によりろう
付けする。
Further, a slug 2b, a flange 3b, and a slag lead constituted by a C-bend 5 are inserted from the other end face side of the tubular insulator 1 to hit the end face of the tubular insulator 1 and the flange 3b. Similarly, the surface is brazed with a brazing material.

【0018】このように、スラグリードのスラグ3bの
先端に弾力を有する金属板材(本実施例では幅100μ
m、厚さ75μm)に形成されたCベンド5からろう付
けされているので、このCベンド5と半導体素子4のバ
ンプ形状の電極4aとが所定の押圧力をもって接触す
る。フランジ3bはその上方から封止加重として10〜
15gr程度の加重が加えられ、ろう材が用いられて3
00〜350℃の温度にて加熱され、筒状絶縁体1がフ
ランジ3bにより封止される。
As described above, the elastic metal plate material (width 100 μm in this embodiment) is provided at the tip of the slag 3b of the slag lead.
Since it is brazed from a C bend 5 formed to have a thickness of 75 m and a thickness of 75 μm, the C bend 5 and the bump-shaped electrode 4a of the semiconductor element 4 come into contact with each other with a predetermined pressing force. The flange 3b has a sealing weight of 10 to 10 from above.
With a weight of about 15 gr, brazing filler metal is used.
It is heated at a temperature of 00 to 350 ° C., and the tubular insulator 1 is sealed by the flange 3b.

【0019】このときの加重は7gr以下程度であると
Cベンド5と電極4aとの接触圧力が弱くなり電気的オ
ープンになりやすく、また、18gr以上であると加重
が大きすぎてCベンド5の形状を変形させ、あるいは破
損を生じさせるので前述の10〜15grに設定される
ことが望ましい。
At this time, if the weight is about 7 gr or less, the contact pressure between the C bend 5 and the electrode 4a is weakened so that an electric open is likely to occur, and if it is 18 gr or more, the weight is too large and the C bend 5 has a large load. Since the shape is deformed or damaged, it is desirable to set the above-mentioned 10 to 15 gr.

【0020】なお、筒状絶縁体1をセラミックにより形
成することによって、従来フランジを溶着するのに50
0〜600℃での加熱を要したのに対し、セラミック材
へのろう付けは300〜350℃の温度があればよく、
高温による特性劣化が防止され、さらに、その形状を角
柱状にすることによって実装時の安定性が得られる。
Since the cylindrical insulator 1 is made of ceramic, it is possible to weld the flange by 50.
While heating at 0 to 600 ° C. was required, brazing to a ceramic material should have a temperature of 300 to 350 ° C.,
Deterioration of characteristics due to high temperature is prevented, and further, by making the shape into a prismatic shape, stability during mounting can be obtained.

【0021】[0021]

【発明の効果】以上説明したように本発明によれば、半
導体素子を筒状絶縁体内に挿入し封止したときに、弾力
性のあるCベンドと電極とが接触するために、各構成部
品に無理な機械的応力が加わることが緩和され、破壊や
破損による特性劣化を生じることを防止することがで
き、また、筒状絶縁体にセラミック材を用いることによ
って、フランジを封止するときの加熱温度が従来の半分
程度にすることが可能となり、熱およびその熱による応
力の影響を受けて生じる特性劣化を避けることができる
効果がある。さらに、筒状絶縁体を角柱状に形成するこ
とが容易であり、基板などへの実装時の安定性を得るこ
とができる。
As described above, according to the present invention, when the semiconductor element is inserted and sealed in the cylindrical insulator, the elastic C-bend and the electrode come into contact with each other, so that each component is Unreasonable mechanical stress is relieved to prevent the deterioration of characteristics due to breakage or damage, and by using a ceramic material for the cylindrical insulator, it is possible to prevent The heating temperature can be reduced to about half that of the conventional one, and there is an effect that characteristic deterioration caused by the influence of heat and stress due to the heat can be avoided. Furthermore, it is easy to form the cylindrical insulator into a prismatic shape, and it is possible to obtain stability when mounting on a substrate or the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明実施例の構成を示す断面図。FIG. 1 is a sectional view showing the configuration of an embodiment of the present invention.

【図2】従来例の構成を示す断面図。FIG. 2 is a sectional view showing a configuration of a conventional example.

【図3】従来例における組立工程を説明する断面図。FIG. 3 is a sectional view illustrating an assembly process in a conventional example.

【符号の説明】[Explanation of symbols]

1 筒状絶縁体 2a、2b スラグ 3a、3b フランジ 4 半導体素子 4a 電極 5 Cベンド 11 ガラス管 12 封止治具 DESCRIPTION OF SYMBOLS 1 Cylindrical insulator 2a, 2b Slug 3a, 3b Flange 4 Semiconductor element 4a Electrode 5 C bend 11 Glass tube 12 Sealing jig

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 筒状絶縁体と、導電材料からなりこの筒
状絶縁体の内部に両側の開口部からそれぞれ挿入されこ
の筒状絶縁体に固着される二つのスラグと、前記筒状絶
縁体の内部に配置され前記二つのスラグの間に圧接され
る半導体素子とを備えたリードレスダイオードにおい
て、 前記半導体素子の電極と前記スラグの端面との間に導電
性弾性材料によりC形に形成されたCベンドが介挿され
たことを特徴とするリードレスダイオード。
1. A tubular insulator, two slugs made of a conductive material, inserted into the inside of the tubular insulator through openings on both sides and fixed to the tubular insulator, and the tubular insulator. In a leadless diode having a semiconductor element disposed inside of the slug and press-contacted between the two slugs, the leadless diode being formed in a C shape by a conductive elastic material between an electrode of the semiconductor element and an end surface of the slug. A leadless diode, in which a C-bend is inserted.
【請求項2】 前記筒状絶縁体は、角柱状セラミック材
により形成された請求項1記載のリードレスダイオー
ド。
2. The leadless diode according to claim 1, wherein the tubular insulator is made of a prismatic ceramic material.
【請求項3】 前記スラグにそれぞれ固定され前記筒状
絶縁体の両側の開口部を封止するフランジを備えた請求
項1記載のリードレスダイオード。
3. The leadless diode according to claim 1, further comprising flanges that are fixed to the slugs and seal openings on both sides of the tubular insulator.
JP5322686A 1993-12-21 1993-12-21 Leadless diode Expired - Fee Related JP2546178B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5322686A JP2546178B2 (en) 1993-12-21 1993-12-21 Leadless diode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5322686A JP2546178B2 (en) 1993-12-21 1993-12-21 Leadless diode

Publications (2)

Publication Number Publication Date
JPH07176663A JPH07176663A (en) 1995-07-14
JP2546178B2 true JP2546178B2 (en) 1996-10-23

Family

ID=18146491

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5322686A Expired - Fee Related JP2546178B2 (en) 1993-12-21 1993-12-21 Leadless diode

Country Status (1)

Country Link
JP (1) JP2546178B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4912118B2 (en) * 2006-06-29 2012-04-11 京セラ株式会社 Electronic component storage package and electronic device

Also Published As

Publication number Publication date
JPH07176663A (en) 1995-07-14

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