JP2546026Y2 - Adjustment table for laser interferometer - Google Patents

Adjustment table for laser interferometer

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Publication number
JP2546026Y2
JP2546026Y2 JP1781591U JP1781591U JP2546026Y2 JP 2546026 Y2 JP2546026 Y2 JP 2546026Y2 JP 1781591 U JP1781591 U JP 1781591U JP 1781591 U JP1781591 U JP 1781591U JP 2546026 Y2 JP2546026 Y2 JP 2546026Y2
Authority
JP
Japan
Prior art keywords
measured
laser
interferometer
stand
adjustment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1781591U
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Japanese (ja)
Other versions
JPH04109313U (en
Inventor
重徳 大井
Original Assignee
富士写真光機株式会社
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Filing date
Publication date
Application filed by 富士写真光機株式会社 filed Critical 富士写真光機株式会社
Priority to JP1781591U priority Critical patent/JP2546026Y2/en
Publication of JPH04109313U publication Critical patent/JPH04109313U/en
Application granted granted Critical
Publication of JP2546026Y2 publication Critical patent/JP2546026Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)

Description

【考案の詳細な説明】[Detailed description of the invention]

【0001】[0001]

【産業上の利用分野】この考案は、レーザー干渉計の被
測定物調整台に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for adjusting an object to be measured of a laser interferometer.

【0002】[0002]

【従来の技術】従来の被測定物調整台は、スタンドから
立上る支柱に干渉計本体を取付け、干渉計のレーザー光
を下方に出射するレーザー干渉計においては、図8に示
すようにX軸及びY軸の各方向への調整を図るXYステ
ージ100を基台101上に設け、XYステージ100
上にZ軸方向(上下方向)の調整を図る立壁102を設
け、この立壁102上に被測定物載置用の載置台103
を設けていた。
2. Description of the Related Art In a conventional device for adjusting an object to be measured, a main body of an interferometer is mounted on a column rising from a stand, and a laser interferometer for emitting a laser beam of the interferometer downward has an X-axis as shown in FIG. And an XY stage 100 for adjusting in each direction of the Y axis and the Y axis.
A vertical wall 102 for adjusting in the Z-axis direction (vertical direction) is provided on the upper surface, and a mounting table 103 for mounting an object to be measured is provided on the vertical wall 102.
Was provided.

【0003】[0003]

【考案が解決しようとする課題】従来の被測定物調整台
は、被測定物を交換する時に被測定物をその光軸方向に
動かしていたので、被測定物と基準レンズとが接触して
いずれか一方又は両方が破損する場合があった。そこ
で、この考案は、被測定物を交換する時に、基準レンズ
との接触を防ぐとともに、被測定物の測定時における操
作性の向上、特に同一種類の被測定物を次々に測定する
ための操作性の向上とコンパクト化を図ったレーザー干
渉計の被測定物調整台を提供することを目的とする。
In the conventional device for adjusting the object to be measured, the object to be measured is moved in the optical axis direction when the object to be measured is replaced, so that the object to be measured contacts the reference lens. Either or both could be damaged. Therefore, the present invention prevents the contact with the reference lens when exchanging the DUT, and improves the operability when measuring the DUT, particularly the operation for successively measuring the same type of DUT. It is an object of the present invention to provide a device for adjusting an object to be measured of a laser interferometer, which is improved in performance and compact.

【0004】[0004]

【課題を解決するための手段】上述の目的を達成するた
め、この考案は、少なくともレーザーとレーザー導光光
学系を備えた干渉計本体をスタンドから立上る支柱に取
付け、前記レーザー導光光学系から出射されるレーザー
光束中に被測定物載置用の載置台を設けたレーザー干渉
計の被測定物調整台であって、前記スタンド上に取付け
られる基台上に前記支柱に沿って立ち上る立壁を設け、
前記立壁から前記レーザー導光光学系の光軸を越えて突
出し前記立壁に沿って上下動可能に受台を設け、前記受
台の上面に左右にスライドするスライド台を設け、前記
スライド台上にX軸及びY軸の各方向の調整を図るXY
ステージを取付けたものである。
In order to achieve the above-mentioned object, the present invention relates to a method of mounting an interferometer having at least a laser and a laser light guiding optical system on a column rising from a stand. An object adjustment table of a laser interferometer provided with a mounting table for mounting an object to be measured in a laser beam emitted from the laser beam, the standing wall rising along the support on a base mounted on the stand Is established,
Providing a pedestal protruding from the upright wall beyond the optical axis of the laser light guiding optical system so as to be able to move up and down along the upright wall, and providing a slide table that slides left and right on the upper surface of the pedestal, XY for adjustment in each direction of X axis and Y axis
A stage is attached.

【0005】[0005]

【作用】この考案において、初めに基台の傾斜具合を調
整してスタンドに取付けると、レーザー導光光学系の光
軸と立壁とが平行になり、この状態で基台をスタンド上
に固定する。Z軸方向の移動は、立壁に取付けた受台の
上下移動で行い、X軸、Y軸の各方向の移動はXYステ
ージにより行う。次いで、被測定物をXYステージ上の
載置台(又は2軸調整台の上面)に載置し、基準レンズ
の集光点に被測定物の中心をもってくる。これにより、
基準レンズの基準面からの反射光と被測定物の被測定面
からの反射光とによる干渉縞が発生する。この干渉縞を
図示していないモニターを通して確認できたら上下方向
を調整するZステージで被測定物を光軸の方向へ移動さ
せてゆく。小さな干渉縞が画面から逃げないようにXY
ステージを調整しながら、再び干渉縞が大きく見えはじ
めたらZステージの粗動調整用の固定用つまみをロック
する。次にZステージの微調整用のつまみ及びXYステ
ージの調整つまみで干渉縞を見やすくする。同一種類の
被測定物を測定し、しかも被測定物が基準レンズに接近
している場合には、スライド台をX方向(左右方向)に
移動させて、被測定物を基準レンズの光軸外に退避させ
る。被測定物が基準レンズと充分な距離をへだてている
ことを確認してから、被測定物を次の被測定物と交換す
る。交換後、スライド台を逆方向に移動させて、基準レ
ンズの光軸上に次の被測定物が位置するようにする。
In the present invention, when the inclination of the base is adjusted first and the stand is mounted on the stand, the optical axis of the laser light guide optical system and the vertical wall become parallel, and the base is fixed on the stand in this state. . Movement in the Z-axis direction is performed by moving the pedestal mounted on the vertical wall up and down, and movement in each of the X-axis and Y-axis directions is performed by the XY stage. Next, the object to be measured is mounted on a mounting table (or an upper surface of a biaxial adjustment table) on the XY stage, and the center of the object to be measured is brought to the focal point of the reference lens. This allows
Interference fringes are generated by the reflected light from the reference surface of the reference lens and the reflected light from the measured surface of the device under test. When the interference fringes can be confirmed through a monitor (not shown), the object to be measured is moved in the direction of the optical axis by a Z stage for adjusting the vertical direction. XY so that small interference fringes do not escape from the screen
When the interference fringes begin to look large again while adjusting the stage, the locking knob for coarse adjustment of the Z stage is locked. Next, the interference fringes are made easier to see with a knob for fine adjustment of the Z stage and an adjustment knob for the XY stage. When measuring the same type of DUT and the DUT is approaching the reference lens, move the slide base in the X direction (left / right direction) to move the DUT out of the optical axis of the reference lens. Evacuate to After confirming that the measured object has a sufficient distance from the reference lens, the measured object is replaced with the next measured object. After the replacement, the slide table is moved in the opposite direction so that the next DUT is positioned on the optical axis of the reference lens.

【0006】[0006]

【実施例】以下に、この考案の好適な一実施例を図面を
参照にして説明する。図1において、スタンド1から立
上る支柱2に少なくともレーザーとレーザー導光光学系
を備えた干渉計本体3(図2参照)を取付け、干渉計の
レーザーから出射されたレーザー光をレーザー導光光学
系を介して下方に導く。スタンド1上に取付けられる基
台5に支柱2に沿って立上り基台5と直角な立壁6を設
けてある。この立壁6に上下動可能に基台5と平行に延
びる受台7を設ける。この受台7に設けたX軸及びY軸
の各方向への調整を図るXYステージ8に2軸調整台9
を設ける。この2軸調整台9の上面9Aが被測定物Sの
載置面を兼用する場合もあり(図6参照)、被測定物が
小さい場合には前記上面9A上に載置台4を載置する。
この場合、載置台4は前記レーザー導光光学系の光路中
に位置するようにする。符号10はXYステージ8の調
整つまみを示し、符号11は2軸調整台9の調整つまみ
を夫々示す。また、符号3Aはレーザー導光光学系の光
軸上であって、干渉計本体3のレーザー光出射出口に設
けられた基準レンズを示す。受台7の立壁6に取付く基
端部7Aにはロッド12を介して移動ブロック13が取
付けてある。ロッド12の下端には微調節用のつまみ1
4を設けてある。移動ブロック13も立壁6に対して上
下動可能に取付けてあり、固定用つまみ15により粗調
整ができるようになっている。この固定用つまみ15を
解除することにより受台7の粗調整を行い所定の位置に
固定し、調整つまみ14により受台7の微調整を行う。
また、立壁6には位置決め用のストッパ16を設けてあ
る。この例では、受台7を上昇させすぎて基準レンズ3
Aを破壊したりしないように、受台7の上昇高さをこの
ストッパ16で規制している。支柱2には干渉計本体3
の上下動を図るための調整つまみ17を設けてある。立
壁6と受台7との間にはバランサー18を設け、受台7
が急激に落下するのを防ぐようになっている。このバラ
ンサー18は薄い鋼板18Bを用い、この鋼板18Bは
受台7の基端部7Aの中でコイル状に巻かれているもの
であり、スチールの巻き尺と同様の構造である。前述の
XYステージ8はスライド台19に取付けてあり、この
スライド台19のスライドはロックノブ20によりロッ
クされるようになっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of the present invention will be described below with reference to the drawings. In FIG. 1, an interferometer main body 3 (see FIG. 2) having at least a laser and a laser light guiding optical system is attached to a support 2 rising from a stand 1, and a laser light emitted from a laser of the interferometer is used for laser light guiding optics. Guide down through the system. A base 5 mounted on the stand 1 is provided with a standing wall 6 perpendicular to the rising base 5 along the column 2. A receiving stand 7 is provided on the standing wall 6 so as to be vertically movable and extend in parallel with the base 5. An XY stage 8 provided on the receiving table 7 for adjusting the X axis and the Y axis in each direction is provided with a two-axis adjusting table 9.
Is provided. In some cases, the upper surface 9A of the biaxial adjustment table 9 also serves as the mounting surface of the object S (see FIG. 6), and when the object to be measured is small, the mounting table 4 is mounted on the upper surface 9A. .
In this case, the mounting table 4 is located in the optical path of the laser light guiding optical system. Reference numeral 10 indicates an adjustment knob of the XY stage 8, and reference numeral 11 indicates an adjustment knob of the two-axis adjustment table 9. Reference numeral 3A denotes a reference lens provided on the optical axis of the laser light guiding optical system and provided at the laser light exit of the interferometer body 3. A moving block 13 is attached via a rod 12 to a base end 7A attached to the upright wall 6 of the cradle 7. A knob 1 for fine adjustment is provided at the lower end of the rod 12.
4 are provided. The moving block 13 is also attached to the upright wall 6 so as to be vertically movable, and can be roughly adjusted by the fixing knob 15. By releasing the fixing knob 15, the receiving stand 7 is roughly adjusted and fixed at a predetermined position, and the adjusting knob 14 is finely adjusted.
The standing wall 6 is provided with a positioning stopper 16. In this example, the pedestal 7 is raised too much and the reference lens 3
The stopper 16 regulates the height of the pedestal 7 so as not to destroy A. The support 2 has an interferometer body 3
There is provided an adjustment knob 17 for vertically moving the knob. A balancer 18 is provided between the standing wall 6 and the pedestal 7, and the pedestal 7
Is designed to prevent sudden drops. The balancer 18 uses a thin steel plate 18B. The steel plate 18B is wound in a coil shape in the base end portion 7A of the cradle 7, and has the same structure as a steel tape measure. The XY stage 8 is mounted on a slide base 19, and the slide of the slide base 19 is locked by a lock knob 20.

【0007】図3は正面から見た部分的な断面図であ
り、前述のロッド12の下端に微調整用のつまみ14が
固着され、このロッド12の上半分12Aはネジが切っ
てあり、この上半分12Aのネジを切った部分がスリー
ブ24にねじ込まれる。移動ブロック13は、固定用つ
まみ15に固定されているので、ロッド12の一方向の
回転により、受台7を下方に押し下げる。これにより2
軸調整台9が下方に下げられて基準レンズ3Aを透過し
た波面と載置面9A上に載置された被測定物Sの被測定
面からの反射光の波面とを一致させる。この結果、基準
レンズ3Aの基準面からの反射光と被測定面からの反射
光とによる干渉縞が観察できる。また、受台7の下面に
はゴム等の緩衝用脚部7Bを設けてある。スライド台1
9は、図3〜5に示すように、受台7の台状部7Cに上
下方向にブレないように規制され、台状部7Cの長手方
向に沿ってスライドするように取付けてある。
FIG. 3 is a partial cross-sectional view as viewed from the front. A knob 14 for fine adjustment is fixed to the lower end of the rod 12, and the upper half 12A of the rod 12 is threaded. The threaded portion of the upper half 12A is screwed into the sleeve 24. Since the moving block 13 is fixed to the fixing knob 15, the rotation of the rod 12 in one direction pushes down the receiving table 7. This gives 2
The shaft adjustment table 9 is lowered, and the wavefront transmitted through the reference lens 3A is matched with the wavefront of the light reflected from the measurement surface of the measurement object S mounted on the mounting surface 9A. As a result, interference fringes due to the reflected light from the reference surface of the reference lens 3A and the reflected light from the measured surface can be observed. A cushioning leg 7B made of rubber or the like is provided on the lower surface of the receiving table 7. Slide stand 1
As shown in FIGS. 3 to 5, 9 is mounted on the trapezoidal portion 7C of the receiving table 7 so as not to be vertically displaced and to slide along the longitudinal direction of the trapezoidal portion 7C.

【0008】図6は側面図であり、基台5の四隅の一個
所には球面ブッシュ21が設けてあり、この球面ブッシ
ュ21の個所を支点にして基台5は傾斜具合を調整でき
るようになっている。球面ブッシュ21を設けた個所以
外の3個所には傾斜調整用のネジ22を設け、球面ブッ
シュ21及び傾斜調整用のネジ22の外周側の四隅には
調整後基台5をスタンド1に固定するための固定用のネ
ジ23を設けてある。基台5の傾斜具合を調整するに
は、3本のネジ22を回転させ、スタンド1からの高さ
を夫々微調整する。このとき、レーザー干渉計を作動さ
せてレーザー光が立壁6に平行になる位置を探す。この
ような位置を探したら、ネジ23により基台5をスタン
ド1に固定する。ここでは、ネジ22と球面ブッシュ2
1とが調節手段を構成する。基台5の傾斜具合の調整は
干渉計本体3に設けられ、コリメーターレンズ等からな
るレーザー導光光学系の光軸と立壁6とが平行になるよ
うに調整し、このように調整した後固定ネジ23でスタ
ンド1に基台5を固定する。
FIG. 6 is a side view. A spherical bush 21 is provided at one of the four corners of the base 5, and the base 5 can be adjusted with the spherical bush 21 as a fulcrum. Has become. Screws 22 for adjusting the inclination are provided at three places other than the places where the spherical bushes 21 are provided, and the base 5 after the adjustment is fixed to the stand 1 at the four outer peripheral corners of the spherical bush 21 and the screws 22 for adjusting the inclination. Screw 23 is provided for fixing. To adjust the inclination of the base 5, the three screws 22 are rotated, and the height from the stand 1 is finely adjusted. At this time, the laser interferometer is operated to search for a position where the laser beam becomes parallel to the standing wall 6. After searching for such a position, the base 5 is fixed to the stand 1 with the screws 23. Here, the screw 22 and the spherical bush 2
1 constitutes the adjusting means. The inclination of the base 5 is adjusted in the interferometer main body 3 so that the optical axis of the laser light guiding optical system including a collimator lens and the upright wall 6 are parallel to each other. The base 5 is fixed to the stand 1 with fixing screws 23.

【0009】2軸調整台(載置台)9の上面(載置面)
9Aがレーザー導光光学系と同軸上にある基準レンズ3
Aの光軸と直交するように調整する調整方法は、基準レ
ンズ3Aを取付ける前に干渉計本体3から平行光束が照
射されているので、この光軸と被測定物調整台のZステ
ージ(移動ブロック13による上下動及びつまみ14に
よる微調節)による被測定物の移動が平行になるように
調整する。その手順として、最初に干渉計本体3には基
準板も基準レンズ3Aも取りついていないようにする。
そして、干渉計本体3から照射されている光が上面9A
に当たっていることが分かりその光束の周辺部がはっき
りわかる程度に部屋を暗くする。干渉計本体3の光量調
整つまみを指で回転させ干渉計本体3から出射されるレ
ーザー光を最高に明るくする。その後、2軸調整台(載
置台)9の上面9Aに直径64mmの円内に十字を記入し
たパターンを書いた板目紙を乗せる。次いで、Zステー
ジを粗動させて2軸調整台(載置台)9を最下部に移動
させ、レーザー光束のφ64の外周円と上記板目紙の円
形パターンを合致させる(紙を移動させる)。Zステー
ジを粗動させ、2軸調整台(載置台)9を最上部に移動
させる。このときにレーザー光束の外周と板目紙の円形
パターンの位置がずれている場合にはこれらが合致する
ように基台5の調節手段により調整する。Zステージを
最上部及び最下部に粗動させ両方の位置でもレーザー光
束の外周と上記円形パターンが合致するまで上述の動作
を繰り返す。次に基台5をスタンド1に固定する。すな
わち、ネジ22とネジ23とは押しネジと引きネジの関
係になって、お互いに力が加わり基台5とスタンド1を
がっちりと固定することとなる。固定用のネジ23が有
効に力を発揮するまで、つまり固定用のネジ23が基台
5を引く直前まで軽く回る範囲はそれぞれの固定用のネ
ジ23を回し続ける。固定用のネジ23を回転するのに
力が掛かる様になったらZステージを最上部に移動し、
上記レーザー光束と円形パターンを合致させ観察しなが
ら固定用のネジ23を1本ずつ交互に少しずつ締めつけ
る。1本のネジ23だけを一度に強く締めつけると基台
5が傾いてしまうので上記光束と円形パターンがずれな
いことを確認しながら1本のネジ23を1回に1/10
回転程度締めつけ、順序良く何度も回転させて平均に固
定されるようにする。このようにして立壁6とレーザー
導光光学系の光軸とが平行になる。
Upper surface (mounting surface) of a two-axis adjustment table (mounting table) 9
Reference lens 9 9A is coaxial with the laser light guiding optical system
In the adjustment method for adjusting the optical axis of the sample A so as to be orthogonal to the optical axis of the sample A, the parallel beam is irradiated from the interferometer main body 3 before the reference lens 3A is attached. The movement of the object to be measured by the vertical movement by the block 13 and the fine adjustment by the knob 14) is adjusted to be parallel. As a procedure, first, neither the reference plate nor the reference lens 3A is attached to the interferometer body 3.
Then, the light emitted from the interferometer main body 3 is applied to the upper surface 9A.
The room is darkened to such an extent that it is clear that the light is hitting and the periphery of the light beam can be clearly seen. The light amount adjustment knob of the interferometer main body 3 is rotated with a finger to make the laser light emitted from the interferometer main body 3 the brightest. Thereafter, on the upper surface 9A of the biaxial adjustment table (mounting table) 9, a board having a pattern in which a cross is drawn in a circle having a diameter of 64 mm is placed. Next, the Z stage is coarsely moved to move the biaxial adjustment table (mounting table) 9 to the lowermost position, so that the outer circumferential circle of φ64 of the laser beam and the circular pattern of the board are matched (the paper is moved). The Z stage is coarsely moved, and the biaxial adjustment table (mounting table) 9 is moved to the uppermost position. At this time, if the position of the outer periphery of the laser beam and the position of the circular pattern of the board are shifted, the adjustment means of the base 5 adjusts them so that they match. The Z stage is roughly moved to the uppermost position and the lowermost position, and the above operation is repeated at both positions until the outer periphery of the laser beam and the circular pattern match. Next, the base 5 is fixed to the stand 1. That is, the screw 22 and the screw 23 are in a relation of a push screw and a pull screw, and a force is applied to each other, thereby firmly fixing the base 5 and the stand 1. Until the fixing screw 23 exerts a force effectively, that is, the range in which the fixing screw 23 turns lightly until immediately before the base 5 is pulled, the respective fixing screw 23 continues to be turned. When a force is applied to rotate the fixing screw 23, move the Z stage to the uppermost position,
The fixing screws 23 are alternately tightened little by little one by one while observing the laser beam and the circular pattern while observing them. If only one screw 23 is strongly tightened at a time, the base 5 will be tilted. Therefore, while confirming that the luminous flux and the circular pattern do not deviate, one screw 23 is reduced to 1/10 at a time.
Tighten by rotation and rotate it in order to fix it at an average. Thus, the upright wall 6 and the optical axis of the laser light guiding optical system become parallel.

【0010】図1に示す載置台4を用いる場合は、被測
定物が小口径のレンズ等のように小さい場合であり、こ
のような小口径のレンズを載置台4に載置し、基準レン
ズ3Aの集光点に被測定物の中心を持ってくる。基準レ
ンズ3Aからの反射光と被測定面からの反射光とによる
干渉縞が確認できたらZステージで被測定物を光軸の方
向へ移動させてゆく。小さな干渉縞が画面から逃げない
ようにXYステージ8を調整してやり、再び干渉縞が大
きく見えはじめたら粗動調整用の固定用つまみ15をロ
ックする。Z軸微調整用のつまみ14及びXYステージ
8の調整つまみ10で干渉縞を見やすくする。同一種類
の被測定物を測定する場合、載置台4の位置を動かさず
に被測定物のみ交換すればだいたい上述した操作ははぶ
くことができる。被測定物が基準レンズ3Aに接近して
いる場合はスライド台19を利用し、被測定物が基準レ
ンズ3Aの内側に入る場合、被測定物と基準レンズ3A
とが接触していずれか一方又は両方が破損することを防
止するために、位置決め用のストッパー16を利用す
る。
When the mounting table 4 shown in FIG. 1 is used, the object to be measured is small like a small-diameter lens or the like. Such a small-diameter lens is mounted on the mounting table 4 and a reference lens is used. The center of the object to be measured is brought to the focal point of 3A. When interference fringes due to the reflected light from the reference lens 3A and the reflected light from the surface to be measured can be confirmed, the object to be measured is moved in the direction of the optical axis on the Z stage. The XY stage 8 is adjusted so that small interference fringes do not escape from the screen. When the interference fringes start to look large again, the coarse adjustment knob 15 is locked. The knob 14 for fine adjustment of the Z axis and the adjustment knob 10 of the XY stage 8 make it easy to see the interference fringes. When measuring the same type of the object to be measured, the above-described operation can be substantially eliminated by replacing only the object to be measured without moving the mounting table 4. When the object to be measured approaches the reference lens 3A, the slide table 19 is used. When the object to be measured enters the inside of the reference lens 3A, the object to be measured and the reference lens 3A are used.
In order to prevent any one or both of them from being damaged by contact with the positioning stopper 16, a positioning stopper 16 is used.

【0011】図7はバランサー18の個所を示し、基端
部7Aに設けたローラー18Aに薄い鋼板18Bを巻き
付けてあり、受台7の急激な落下を防止し、作業の安全
を図るようになっている。受台7は鋼板18Bで吊り下
げられた恰好となる。
FIG. 7 shows a portion of the balancer 18, in which a thin steel plate 18B is wound around a roller 18A provided at the base end 7A, so that the receiving table 7 is prevented from dropping suddenly and work safety is ensured. ing. The cradle 7 looks like it is suspended by a steel plate 18B.

【0012】[0012]

【考案の効果】以上説明したように、この考案によれ
ば、受台に取付けられた左右にスライドするスライド台
にXYステージを取付けたので、被測定物を交換する際
に、スライド台を移動させることにより被測定物と基準
レンズとの接触を防止し、被測定物を安全に交換するこ
とができる。また、スライド台のスライドにより被測定
物を交換すれば、X,Y,Zの各軸方向の粗調整は不要
となり、微調整のみ行なえばよいので操作性が向上す
る。
As described above, according to the present invention, since the XY stage is mounted on the slide table that slides to the left and right attached to the receiving table, the slide table is moved when the object to be measured is replaced. By doing so, contact between the object to be measured and the reference lens can be prevented, and the object to be measured can be safely replaced. In addition, if the object to be measured is replaced by sliding the slide table, coarse adjustment in each of the X, Y, and Z directions is not required, and only fine adjustment is required, so that operability is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】この考案の好適な実施例を示す斜視図。FIG. 1 is a perspective view showing a preferred embodiment of the present invention.

【図2】干渉計本体部分を示す斜視図。FIG. 2 is a perspective view showing an interferometer main body.

【図3】一部断面の正面図。FIG. 3 is a front view of a partial cross section.

【図4】XYステージから上のものを除いた一部断面の
平面図。
FIG. 4 is a plan view of a partial cross section of the XY stage excluding the upper one.

【図5】スライド台取付個所の図4のA−A′線断面
図。
FIG. 5 is a cross-sectional view taken along line AA ′ of FIG.

【図6】一部断面の側面図。FIG. 6 is a partial cross-sectional side view.

【図7】バランサーの個所を示す断面図。FIG. 7 is a sectional view showing a portion of a balancer.

【図8】従来の被測定物調整台を示す斜視図。FIG. 8 is a perspective view showing a conventional DUT adjusting table.

【符号の説明】[Explanation of symbols]

1 スタンド 2 支柱 3 干渉計本体 4 載置台 5 基台 6 立壁 7 受台 8 XYステージ 9 2軸調整台(載置台) 9A 2軸調整台の上面(載置面) 19 スライド台 DESCRIPTION OF SYMBOLS 1 Stand 2 Prop 3 Interferometer main body 4 Mounting table 5 Base 6 Standing wall 7 Receiving stand 8 XY stage 9 2-axis adjustment table (mounting table) 9A Upper surface of 2 axis adjustment table (mounting surface) 19 slide table

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】 少なくともレーザーとレーザー導光光学
系を備えた干渉計本体をスタンドから立上る支柱に取付
け、前記レーザー導光光学系から出射されるレーザー光
束中に被測定物載置用の載置台を設けたレーザー干渉計
の被測定物調整台であって、前記スタンド上に取付けら
れる基台上に前記支柱に沿って立ち上る立壁を設け、前
記立壁から前記レーザー導光光学系の光軸を越えて突出
し前記立壁に沿って上下動可能に受台を設け、前記受台
の上面に左右にスライドするスライド台を設け、前記ス
ライド台上にX軸及びY軸の各方向の調整を図るXYス
テージを取付けたことを特徴とするレーザー干渉計の被
測定物調整台。
An interferometer body having at least a laser and a laser light guiding optical system is mounted on a column rising from a stand, and a laser beam emitted from the laser light guiding optical system is used to mount an object to be measured. An object adjustment table of a laser interferometer provided with a mounting table, provided with a standing wall rising along the support on a base mounted on the stand, from the standing wall to the optical axis of the laser light guide optical system. An XY protruding beyond the erection wall is provided so as to be able to move up and down along the vertical wall, and a slide pedestal is provided on the upper surface of the pedestal so as to slide left and right. An object adjustment table for a laser interferometer, which has a stage attached.
JP1781591U 1991-03-01 1991-03-01 Adjustment table for laser interferometer Expired - Lifetime JP2546026Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1781591U JP2546026Y2 (en) 1991-03-01 1991-03-01 Adjustment table for laser interferometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1781591U JP2546026Y2 (en) 1991-03-01 1991-03-01 Adjustment table for laser interferometer

Publications (2)

Publication Number Publication Date
JPH04109313U JPH04109313U (en) 1992-09-22
JP2546026Y2 true JP2546026Y2 (en) 1997-08-27

Family

ID=31904497

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1781591U Expired - Lifetime JP2546026Y2 (en) 1991-03-01 1991-03-01 Adjustment table for laser interferometer

Country Status (1)

Country Link
JP (1) JP2546026Y2 (en)

Also Published As

Publication number Publication date
JPH04109313U (en) 1992-09-22

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