JP2543461B2 - Ultra-thin metal foil plating equipment - Google Patents

Ultra-thin metal foil plating equipment

Info

Publication number
JP2543461B2
JP2543461B2 JP4105874A JP10587492A JP2543461B2 JP 2543461 B2 JP2543461 B2 JP 2543461B2 JP 4105874 A JP4105874 A JP 4105874A JP 10587492 A JP10587492 A JP 10587492A JP 2543461 B2 JP2543461 B2 JP 2543461B2
Authority
JP
Japan
Prior art keywords
roll
plating
strip
metal foil
ultra
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4105874A
Other languages
Japanese (ja)
Other versions
JPH05279894A (en
Inventor
龍夫 友森
敏夫 菅原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Kohan Co Ltd
Original Assignee
Toyo Kohan Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Kohan Co Ltd filed Critical Toyo Kohan Co Ltd
Priority to JP4105874A priority Critical patent/JP2543461B2/en
Publication of JPH05279894A publication Critical patent/JPH05279894A/en
Application granted granted Critical
Publication of JP2543461B2 publication Critical patent/JP2543461B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、ラジアルセルを用いて
極薄金属箔にめっきをする場合において使用する装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an apparatus used for plating an ultrathin metal foil using a radial cell.

【0002】[0002]

【従来の技術】従来ラジアルセル方式を用いて金属板
(以下ストリップという。)にめっきを施す場合に、め
っき浴浸漬中にめっき液が金属板の裏側に回りコンダク
ターロール(以下CRという。)へ析出するのを防止す
るため、CRの一部に絶縁部材料として軟質のゴムを使
用し、高いラインテンションをかけてストリップをCR
に押し付けている。例えば特公昭46−7162号公報
では、CR面に小径ロールを押し付け電解液フィルムの
厚さを制御することでZn析出を防止できるとしてい
る。また、特公昭59−15997号公報では、めっき
液の噴流と押えロールの併用によるCRへのストリップ
押し付けによりCRへのZn析出を防止できるとしてい
る。しかし、従来のラジアルセル方式を用いて極薄箔ス
トリップにめっきをする場合には、板厚が薄いためめっ
き液裏廻り防止に必要なストリップテンションを負荷す
ることができない。また、押えロールの使用はCRの通
電部と絶縁部の境界の段差による押さえ跡が発生するな
どの不都合がある。
2. Description of the Related Art When a metal plate (hereinafter referred to as a strip) is conventionally plated using a radial cell system, a plating solution rotates around the back side of the metal plate during immersion in a plating bath to a conductor roll (hereinafter referred to as CR). In order to prevent precipitation, a soft rubber is used as a part of the CR for the insulation part, and a high line tension is applied to the strip for CR.
Are pressed against. For example, Japanese Patent Publication No. 46-7162 discloses that Zn precipitation can be prevented by pressing a small diameter roll against the CR surface to control the thickness of the electrolyte solution film. Further, Japanese Patent Publication No. 59-15997 discloses that Zn deposition on CR can be prevented by pressing a strip against CR by using a jet of plating solution and a pressing roll together. However, when plating a very thin foil strip by using the conventional radial cell method, the strip tension required to prevent the backing of the plating solution cannot be applied because the plate thickness is thin. Further, the use of the press roll has a disadvantage that a pressing mark is generated due to a step at the boundary between the CR current-carrying part and the insulating part.

【0003】[0003]

【発明が解決しようとする課題】本発明の課題は、前記
従来技術の問題点に鑑み、ラジアルセルを用いてストリ
ップにめっきを施す場合に、めっき液が金属板の裏側に
回りCRへめっき金属が析出するのを防止するための極
薄金属箔用めっき装置を提供することにある。
SUMMARY OF THE INVENTION In view of the above-mentioned problems of the prior art, the object of the present invention is to apply a plating solution to the back side of a metal plate when plating a strip using a radial cell, and to plate the metal on the CR. An object of the present invention is to provide an ultrathin metal foil plating apparatus for preventing the precipitation of metal.

【0004】[0004]

【課題を解決するための手段】上記の目的を達成するた
め本発明は、極薄金属箔にめっきを施すため低いストリ
ップテンションでめっき液の裏廻りのない装置について
鋭意研究した結果、CRの絶縁部(両端部)材質とし
て、ゴムのようには弾性変形しないアルミナセラミック
を使用した。また、リンガーロールをCR前(ストリッ
プの入り側方向をいう)に設置することにより前処理液
の持込みを防止し、CRにストリップを押えロールで押
し付けることでめっき液浸漬中、通電帯までのめっき液
裏まわりを防止することができた。さらに、CR上(C
Rの上部に接して)にダムロールを設置し、めっき液を
溜めることにより、連続運転中にCR通電部にわずかず
つ析出してくるZn等のめっき金属を溶解できるように
することにより、めっき金属の析出防止対策を、より完
全なものとすることができた。すなわち本発明は、ラジ
アルセル方式めっき装置において、両端部に絶縁部材質
としてセラミックを用いたCRと、CRへの前処理液持
ち込みを防止するためにCR前に設置されたリンガーロ
ールと、CRにストリップを押し付けるための押さえロ
ールと、CR通電部上にわずかずつ析出してくるZn等
のめっき金属を溶解するためのCR上に設置されたダム
ロールとを含むことを特徴とする極薄金属箔用めっき装
置、によって構成される。
In order to achieve the above object, the present invention has conducted extensive studies on an apparatus having a low strip tension and no backing of a plating solution for plating an ultrathin metal foil. Alumina ceramic that does not elastically deform like rubber was used as the material of the parts (both ends). In addition, the ringer roll is installed in front of the CR (refers to the strip entry side direction) to prevent the pretreatment liquid from being brought in, and by pressing the strip against the CR with the roll, plating is performed during immersion of the plating solution to the current band. It was possible to prevent the back of the liquid. Furthermore, on CR ((C
By placing a dam roll (in contact with the upper part of R) and accumulating the plating solution, it is possible to dissolve the plating metal such as Zn which is gradually deposited in the CR current-carrying part during continuous operation. It was possible to make the prevention measures against precipitation more complete. That is, the present invention provides a CR using a ceramic as an insulating material at both ends, a ringer roll installed in front of the CR to prevent the pretreatment liquid from being brought into the CR, and a CR in the radial cell plating apparatus. For an ultra-thin metal foil, including a pressing roll for pressing the strip and a dam roll installed on the CR for melting plating metal such as Zn that is deposited little by little on the CR current-carrying part. It is composed of a plating device.

【0005】[0005]

【作用】次に本発明の作用を詳細に説明する。図1は本
発明のめっき装置を用いて極薄金属箔にめっきをする場
合の装置概略図である。図1において、1はめっき液槽
であり、2はめっき液、3はCR、4はデフレクターロ
ール、5はストリップ、6は電極、7はリンガーロー
ル、8は押さえロール、9はダムロールである。図1の
右方向から、前処理されたストリップ5が、リンガーロ
ール7(リンガーロールはCR前、すなわち図1で示せ
ば、ストリップ入り側方向に設置されている)に入り、
十分に水切りされてからデフレクターロール4を介して
CR3に巻き付けられる。その後、めっき液に浸漬され
たアノードによりCRに巻き付けられたストリップがめ
っきされる。その際、ストリップの巻き付け部、及び、
CRを離れる部分を押さえロール8で押さえることによ
りめっき液浸漬中にCR通電帯までめっき液が浸入して
来ることを防止した。めっき対象が極薄金属箔にもかか
わらず押さえロールでストリップを押さえることが出来
たのは、CR両端部(ロール長手方向における両側端
部)の材質を硬いセラミックとし、通電部との段差をな
くしたためである。さらに、僅かずつ析出して来るめっ
き金属の除去のため、ダムロール9をCR上(図1で示
せばCRの上部に接した状態で)においてに設置し、そ
こに低PHのめっき液を溜めることにより、析出物を溶
解した。
Next, the operation of the present invention will be described in detail. FIG. 1 is a schematic view of an apparatus for plating an ultrathin metal foil using the plating apparatus of the present invention. In FIG. 1, 1 is a plating solution tank, 2 is a plating solution, 3 is CR, 4 is a deflector roll, 5 is a strip, 6 is an electrode, 7 is a ringer roll, 8 is a press roll, and 9 is a dam roll. From the right side of FIG. 1, the pretreated strip 5 enters the ringer roll 7 (the ringer roll is placed in front of CR, that is, in the strip entering side direction as shown in FIG. 1),
After being sufficiently drained, it is wound around the CR 3 via the deflector roll 4. After that, the strip wound around the CR is plated by the anode immersed in the plating solution. At that time, the strip winding portion, and
By pressing the part leaving the CR with the pressing roll 8, the plating solution was prevented from entering the CR energizing band during immersion of the plating solution. It was possible to press the strip with the pressing roll even though the object to be plated was an ultra-thin metal foil. Because it was done. Further, in order to remove the plating metal that is deposited little by little, install the dam roll 9 on the CR (in a state of being in contact with the upper part of the CR in FIG. 1) and store the low-PH plating solution there. The precipitate was dissolved by.

【0010】[0010]

【発明の効果】本発明は上記のように構成したので、前
処理液の持込みを防止し、めっき液浸漬中において通電
帯までのめっき液裏まわりを防止することができ、CR
上にダムロールを設置し、めっき液を溜めることによ
り、連続運転中にCR通電部にわずかずつ析出してくる
Znを溶解できるようにすることにより、Zn析出防止
対策を、より完全なものとすることができる極薄金属箔
めっき装置を提供できる。
EFFECTS OF THE INVENTION Since the present invention is constructed as described above, it is possible to prevent the pretreatment liquid from being brought in, and to prevent the plating solution from wrapping around to the conduction band during immersion of the plating solution.
By installing a dam roll on top and accumulating the plating solution, it becomes possible to dissolve Zn that gradually precipitates in the CR current-carrying part during continuous operation, thereby making the Zn precipitation prevention measure more complete. It is possible to provide an ultra-thin metal foil plating apparatus that can be used.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明のめっき装置概略図である。 1、めっき液槽 2、めっき液 3、コンダクタロール 4、デフレクターロール 5、ストリップ 6、電極 7、リンガーロール 8、押さえロール 9、ダムロールFIG. 1 is a schematic view of a plating apparatus of the present invention. 1, plating bath 2, plating bath 3, conductor roll 4, deflector roll 5, strip 6, electrode 7, ringer roll 8, press roll 9, dam roll

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ラジアルセル方式めっき装置において、
両端部に絶縁部材質としてセラミックを用いたコンダク
ターロールと、コンダクターロールへの前処理液持ち込
みを防止するためにコンダクターロール前に設置された
リンガーロールと、コンダクターロールにストリップを
押し付けるための押さえロールと、コンダクターロール
の上部に接して設置され、コンダクターロール通電部上
にわずかずつ析出してくるZn等のめっき金属溶解用の
液を溜めるためのダムロールと、を含むことを特徴とす
る極薄金属箔用めっき装置。
1. In a radial cell type plating apparatus,
A conductor roll using ceramics as an insulating material at both ends, a ringer roll installed in front of the conductor roll to prevent carry-in of pretreatment liquid to the conductor roll, and a press roll for pressing the strip on the conductor roll. An ultra-thin metal foil, which is installed in contact with the upper portion of the conductor roll, and a dam roll for accumulating a solution for dissolving a plating metal such as Zn, which is deposited little by little on the current-carrying portion of the conductor roll. Plating equipment.
JP4105874A 1992-03-30 1992-03-30 Ultra-thin metal foil plating equipment Expired - Fee Related JP2543461B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4105874A JP2543461B2 (en) 1992-03-30 1992-03-30 Ultra-thin metal foil plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4105874A JP2543461B2 (en) 1992-03-30 1992-03-30 Ultra-thin metal foil plating equipment

Publications (2)

Publication Number Publication Date
JPH05279894A JPH05279894A (en) 1993-10-26
JP2543461B2 true JP2543461B2 (en) 1996-10-16

Family

ID=14419099

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4105874A Expired - Fee Related JP2543461B2 (en) 1992-03-30 1992-03-30 Ultra-thin metal foil plating equipment

Country Status (1)

Country Link
JP (1) JP2543461B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6119722B2 (en) * 2014-11-21 2017-04-26 Jfeスチール株式会社 Electroplating method, electrode roll, and electroplating apparatus

Also Published As

Publication number Publication date
JPH05279894A (en) 1993-10-26

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