JP2538450Y2 - Semiconductor laser device - Google Patents

Semiconductor laser device

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Publication number
JP2538450Y2
JP2538450Y2 JP1988041294U JP4129488U JP2538450Y2 JP 2538450 Y2 JP2538450 Y2 JP 2538450Y2 JP 1988041294 U JP1988041294 U JP 1988041294U JP 4129488 U JP4129488 U JP 4129488U JP 2538450 Y2 JP2538450 Y2 JP 2538450Y2
Authority
JP
Japan
Prior art keywords
laser beam
emission
semiconductor substrate
semiconductor laser
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988041294U
Other languages
Japanese (ja)
Other versions
JPH01145160U (en
Inventor
泰明 井上
隆夫 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP1988041294U priority Critical patent/JP2538450Y2/en
Publication of JPH01145160U publication Critical patent/JPH01145160U/ja
Application granted granted Critical
Publication of JP2538450Y2 publication Critical patent/JP2538450Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【考案の詳細な説明】 (イ)産業上の利用分野 本考案は複数本のレーザビームを出射する半導体レー
ザ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a semiconductor laser device that emits a plurality of laser beams.

(ロ)従来の技術 複数本のレーザビームを出射する所謂マルチビーム出
力型の半導体レーザ装置が本願出願人等によって開発さ
れ、例えば信学技報Vol.86、No.323第75頁〜第79頁、
(1987)にその報告が為されている。斯る複数本のレー
ザビームを出射する半導体レーザビームチップは通常上
記先行技術第76頁図2に示されている如く、ヒートシン
クに対しレーザビームの出射部を上方に離して組立てら
れる。
(B) Conventional technology A so-called multi-beam output type semiconductor laser device that emits a plurality of laser beams has been developed by the present applicant and the like. For example, IEICE Technical Report Vol.86, No.323, pp.75-79. page,
(1987). Such a semiconductor laser beam chip for emitting a plurality of laser beams is usually assembled with a laser beam emitting portion separated upward with respect to a heat sink, as shown in FIG.

このようにヒートシンクに対してレーザビームが出射
される出射部を、上方に離して組立てることにより、各
出射部の電極を分離して設けられるために、レーザビー
ムの出射動作を独立して制御可能となる。
By assembling the emission part from which the laser beam is emitted to the heat sink in this way, it is possible to control the emission operation of the laser beam independently, because the electrodes of each emission part are provided separately. Becomes

然し乍ら、斯る構造では出射部からヒートシンクまで
に半導体基板の厚みに相当する距離が存在するために、
上記出射部の発熱を効率良くヒートシンクに導くことが
できず、その結果当該出射部における温度上昇のみなら
ず隣接する出射部へも熱影響を与えるという不都合があ
る。特に、3本のレーザビームを選択的に出射し得る半
導体レーザビームチップにあっては、中央の出射部は両
隣りの出射部の熱影響を受けるために、他の出射部より
温度上昇が著しい。
However, in such a structure, since there is a distance corresponding to the thickness of the semiconductor substrate from the emission part to the heat sink,
The heat generated from the emission unit cannot be efficiently guided to the heat sink, and as a result, there is a disadvantage that not only the temperature rise in the emission unit but also the adjacent emission unit is affected by heat. In particular, in a semiconductor laser beam chip capable of selectively emitting three laser beams, the central emission part is affected by heat of the emission parts on both sides, so that the temperature rise is more remarkable than the other emission parts. .

(ハ)考案が解決しようとする課題 本考案は上述の如く複数本のレーザビームを複数の出
射部から独立して出射する半導体レーザ装置にあって、
出射部の温度上昇が著しく当該温度上昇に起因する出力
変動や、寿命の低下を解決せんとするものである。
(C) Problems to be Solved by the Invention The present invention relates to a semiconductor laser device that emits a plurality of laser beams independently from a plurality of emission units as described above.
The temperature rise of the light emitting portion is remarkable, and the output fluctuation and the shortening of the life caused by the temperature rise are not solved.

(ニ)課題を解決するための手段 本考案半導体レーザ装置は上記課題を解決するため
に、GaAs半導体基板、該基板上に形成された成長層、該
成長層の複数箇所に個別に設けられ各々独立してレーザ
ビームを出射する出射部、を備えた半導体レーザビーム
チップと、該レーザビームチップを上記半導体基板側か
ら良熱伝導的に固着するSiからなるヒートシンクと、か
らなり、上記レーザビームのピッチを約100μmとする
と共に上記半導体基板の厚みを約70μm以下とし、出射
部の他の出射部からの熱影響による温度上昇を約6.6℃
以下としたことを特徴とする。
(D) Means for Solving the Problems In order to solve the above problems, the semiconductor laser device of the present invention has a GaAs semiconductor substrate, a growth layer formed on the substrate, and individually provided at a plurality of locations on the growth layer. A semiconductor laser beam chip having an emission portion for independently emitting a laser beam, and a heat sink made of Si for fixing the laser beam chip in good thermal conductivity from the semiconductor substrate side, comprising: The pitch is set to about 100 μm and the thickness of the semiconductor substrate is set to about 70 μm or less.
It is characterized by the following.

(ホ)作用 上述の如く半導体レーザビームチップと、該レーザビ
ームチップを半導体基板側から保持するヒートシンク
と、からなり、上記半導体基板の厚みを約70μm以下と
することによって、複数の出射部個々の発熱が他の出射
部に与える熱影響を抑止し得る。
(E) Action As described above, the semiconductor laser beam chip and the heat sink for holding the laser beam chip from the semiconductor substrate side are provided. By setting the thickness of the semiconductor substrate to about 70 μm or less, each of the plurality of emission sections is individually formed. It is possible to suppress the thermal influence of the heat generation on the other light emitting portions.

(ヘ)実施例 第1図は本考案半導体レーザ装置の要部を示し、
(1)は図示していないパッケージのステムに良熱伝導
的に固着されたSi単結晶からなるヒートシンク、(2)
は該ヒートシンク(1)に同じく良熱伝導的に固着され
た半導体レーザビームチップで、該レーザビームチップ
(2)はGaAs単結晶の半導体基板(3)と、該基板
(3)上にエピタキシャル成長によりレーザビームを出
射すべき半導体接合が形成された成長層(4)と、該成
長層(4)を上記基板(3)に到達する分離溝(5)
(5)により3分割されて図中黒丸にて示す成長層部分
から各々独立してレーザビームを出射する第1〜第3出
射部(6a)(6b)(6c)と、から構成されている。斯る
半導体レーザビームチップ(2)の第1〜第3出射部
(6a)(6b)(6c)は図示していない各個別の電極から
給電が施されると、各々独立してレーザビームを出射す
る構成となっており、従って当該半導体レーザビームチ
ップ(2)はヒートシンク(1)に対して半導体基板
(3)側から保護される所謂ジャンクションアップ構造
となっている。
(F) Embodiment FIG. 1 shows a main part of the semiconductor laser device of the present invention.
(1) a heat sink made of single crystal Si fixed to the stem of a package (not shown) with good thermal conductivity, (2)
Is a semiconductor laser beam chip similarly fixed to the heat sink (1) with good thermal conductivity. The laser beam chip (2) is composed of a GaAs single crystal semiconductor substrate (3) and an epitaxial growth on the substrate (3). A growth layer (4) on which a semiconductor junction to emit a laser beam is formed; and a separation groove (5) for reaching the growth layer (4) to the substrate (3).
The first to third emission portions (6a), (6b), and (6c), which are divided into three portions by (5) and emit laser beams independently from the growth layer portions indicated by black circles in the figure, respectively. . The first to third emission portions (6a), (6b), and (6c) of the semiconductor laser beam chip (2) independently supply laser beams when supplied with power from individual electrodes (not shown). The semiconductor laser beam chip (2) has a so-called junction-up structure that is protected from the semiconductor substrate (3) side with respect to the heat sink (1).

第2図は動作電流と光出力の出射部における温度依存
性を示す特性図であり、出射部の温度が低いほど同じ動
作電流でも高出力なレーザビームが得られることが判
る。即ち、出射部の温度が変動すると動作電流が一定の
場合、レーザビームの出力も変動し、その変動の形態は
温度上昇に対し出力の低下を招く。従って、出力が一定
なレーザビームを得るためには温度上昇に対し動作電流
を大きくすれば良い。斯る出力変動に対して半導体レー
ザビームチップのレーザビームの出射が双方向性である
ことを利用して必要とする出射方向と逆の方向に出射さ
れるレーザビームの出力を光センサにてモニタリング
し、動作電流を増減することによる駆動(以下単にAPC
駆動と呼ぶ)が知られている。しかし、このAPC駆動に
あっても、自ずと限界があり、特に上述の如く3本のレ
ーザビームの出射を得られる半導体レーザ装置にあって
は、第2の出射部(6b)の温度上昇は、両隣りの第1、
第3の出射部(6a)、(6c)の発熱による熱影響を受け
る結果、1番高く、当該第2の出射部(6b)の出力を許
容範囲、例えば書換え可能な光ディスクの要求特性であ
る出力変動1%以下にAPC駆動のみで制御することは難
しい。
FIG. 2 is a characteristic diagram showing the dependence of the operating current and the optical output on the temperature at the emission section. It can be seen that the lower the temperature of the emission section, the higher the output laser beam can be obtained with the same operating current. That is, when the operating current is constant when the temperature of the emitting portion changes, the output of the laser beam also changes, and the form of the change causes a decrease in output with respect to a rise in temperature. Therefore, in order to obtain a laser beam having a constant output, the operating current may be increased with increasing temperature. The output of the laser beam emitted in the direction opposite to the required emission direction is monitored by an optical sensor by utilizing the bidirectional emission of the laser beam from the semiconductor laser beam chip with respect to such output fluctuation. Drive by increasing or decreasing the operating current (hereinafter simply APC
Driving) is known. However, the APC drive has its own limitations. Particularly, in a semiconductor laser device capable of emitting three laser beams as described above, the temperature rise of the second emitting portion (6b) is The first on both sides,
As a result of being affected by the heat generated by the third light emitting portions (6a) and (6c), the output is the highest, and the output of the second light emitting portion (6b) is within an allowable range, for example, a required characteristic of a rewritable optical disk. It is difficult to control the output fluctuation to 1% or less only by APC drive.

第3図は半導体基板(3)の厚みと、温度上昇の関係
を中央の第2の出射部(6b)について調べたものであ
る。曲線(a)は第2の出射部(6b)のみに出力が20mW
となるようにDC駆動により連続動作させたときのもので
あり、曲線(b)は第2の出射部(6b)の連続動作に加
え、隣接の第1、第3の出射部(6a)、(6c)を出力20
mWでパルス駆動したときのものである。このときのレー
ザビームのピッチは100μmである。このように半導体
基板(3)の厚みは温度上昇と密接な関係にある。APC
駆動において、第2出射部(6b)の出力変動を上述の1
%以下にするためには、他の出射部(6a)、(6c)から
の熱影響による温度上昇が約6.6℃以下であれば良いこ
とを本考案者らは見い出している。従って、曲線(b)
と曲線(a)との温度差が約6.6℃の半導体基板(3)
の厚みを求めれば約70μmの値が得られる。この数値
は、従来の半導体基板(3)の厚みが約120μmである
ことから、約50μm薄い。即ち、半導体基板(3)の厚
みを従来より薄い約70μm以下とすることによって、中
央の出射部(6b)であっても他の出射部(6a)、(6c)
の熱影響による温度上昇を回路的に補償可能な温度幅に
抑圧することができる。
FIG. 3 shows the relationship between the thickness of the semiconductor substrate (3) and the temperature rise for the central second emission part (6b). Curve (a) shows an output of 20 mW only at the second emission part (6b)
The curve (b) shows the continuous operation of the second emission part (6b) and the adjacent first and third emission parts (6a), (6c) output 20
This is when pulse driving is performed at mW. The pitch of the laser beam at this time is 100 μm. Thus, the thickness of the semiconductor substrate (3) is closely related to the temperature rise. APC
In the driving, the output fluctuation of the second emitting section (6b) is controlled by the above-described 1
The inventors of the present invention have found that the temperature rise due to the heat from the other emission portions (6a) and (6c) should be about 6.6 ° C. or less in order to make the emission percentage or less. Therefore, curve (b)
Semiconductor substrate (3) in which the temperature difference between the curve and curve (a) is about 6.6 ° C.
Is about 70 μm. This value is about 50 μm thin because the thickness of the conventional semiconductor substrate (3) is about 120 μm. That is, by setting the thickness of the semiconductor substrate (3) to be about 70 μm or less, which is thinner than the conventional one, even if the central emission part (6b) is used, the other emission parts (6a) and (6c)
Can be suppressed to a temperature range that can be compensated for in a circuit.

(ト)考案の効果 本考案半導体レーザ装置は以上の説明から明らかな如
くGaAs半導体基板側からSiヒートシンクに熱良伝導的に
固着し、レーザビームのピッチを約100μmとすると共
に前記半導体基板の厚みを約70μm以下とし、出射部の
他の出射部からの熱影響による温度上昇を約6.6℃以下
とするので、温度上昇に起因する出力変動幅を縮小する
ことができると共に、長寿命化を図れる。
(G) Effect of the Invention As is clear from the above description, the semiconductor laser device of the present invention is fixed to the Si heat sink from the GaAs semiconductor substrate side with good thermal conductivity, the laser beam pitch is set to about 100 μm, and the thickness of the semiconductor substrate is set. Is about 70 μm or less, and the temperature rise due to thermal influence from other emission sections is about 6.6 ° C. or less, so that the output fluctuation width due to the temperature rise can be reduced and the life can be extended. .

【図面の簡単な説明】 第1図は本考案半導体レーザ装置の要部を示す模式図、
第2図は動作電流と光出力の出射部における温度依存性
を示す特性図、第3図は半導体基板の厚みと温度上昇の
関係を示す特性図、である。 (1)……ヒートシンク、(2)……半導体レーザビー
ムチップ、(3)……半導体基板、(4)……成長層、
(6a)〜(6c)……第1〜第3の出射部。
BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view showing a main part of the semiconductor laser device of the present invention,
FIG. 2 is a characteristic diagram showing the dependence of the operating current and the optical output on the temperature at the emission portion, and FIG. 3 is a characteristic diagram showing the relationship between the thickness of the semiconductor substrate and the temperature rise. (1) ... heat sink, (2) ... semiconductor laser beam chip, (3) ... semiconductor substrate, (4) ... growth layer,
(6a) to (6c) ... first to third emission units.

Claims (1)

(57)【実用新案登録請求の範囲】(57) [Scope of request for utility model registration] 【請求項1】GaAs半導体基板、該基板上に形成された成
長層、該成長層の複数箇所に個別に設けられ各々独立し
てレーザビームを出射する出射部、を備えた半導体レー
ザビームチップと、該レーザビームチップを上記半導体
基板側から良熱伝導的に固着するSiからなるヒートシン
クと、からなり、上記レーザビームのピッチを約100μ
mとすると共に上記半導体基板の厚みを約70μm以下と
し、出射部の他の出射部からの熱影響による温度上昇を
約6.6℃以下としたことを特徴とする半導体レーザ装
置。
1. A semiconductor laser beam chip comprising: a GaAs semiconductor substrate; a growth layer formed on the substrate; and emission sections individually provided at a plurality of locations of the growth layer and independently emitting laser beams. A heat sink made of Si for fixing the laser beam chip from the semiconductor substrate side in good thermal conductivity, and the pitch of the laser beam is set to about 100 μm.
m, the thickness of the semiconductor substrate is about 70 μm or less, and the temperature rise due to the influence of heat from the other emission section is about 6.6 ° C. or less.
JP1988041294U 1988-03-29 1988-03-29 Semiconductor laser device Expired - Lifetime JP2538450Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988041294U JP2538450Y2 (en) 1988-03-29 1988-03-29 Semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988041294U JP2538450Y2 (en) 1988-03-29 1988-03-29 Semiconductor laser device

Publications (2)

Publication Number Publication Date
JPH01145160U JPH01145160U (en) 1989-10-05
JP2538450Y2 true JP2538450Y2 (en) 1997-06-18

Family

ID=31267735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988041294U Expired - Lifetime JP2538450Y2 (en) 1988-03-29 1988-03-29 Semiconductor laser device

Country Status (1)

Country Link
JP (1) JP2538450Y2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5127076A (en) * 1974-08-30 1976-03-06 Hitachi Ltd HANDOT AIREEZA SOCHI
JPS6242592A (en) * 1985-08-20 1987-02-24 Matsushita Electric Ind Co Ltd Semiconductor laser array device and manufacture of same

Also Published As

Publication number Publication date
JPH01145160U (en) 1989-10-05

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