JP2532905B2 - Plate chuck - Google Patents

Plate chuck

Info

Publication number
JP2532905B2
JP2532905B2 JP63025741A JP2574188A JP2532905B2 JP 2532905 B2 JP2532905 B2 JP 2532905B2 JP 63025741 A JP63025741 A JP 63025741A JP 2574188 A JP2574188 A JP 2574188A JP 2532905 B2 JP2532905 B2 JP 2532905B2
Authority
JP
Japan
Prior art keywords
chuck
vacuum suction
substrate
vacuum
suction grooves
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63025741A
Other languages
Japanese (ja)
Other versions
JPH01201936A (en
Inventor
毅 滝沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP63025741A priority Critical patent/JP2532905B2/en
Publication of JPH01201936A publication Critical patent/JPH01201936A/en
Application granted granted Critical
Publication of JP2532905B2 publication Critical patent/JP2532905B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/707Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、液晶基板等の露光装置における、被露光体
を真空吸着するプレートチャックに関するものである。
Description: TECHNICAL FIELD The present invention relates to a plate chuck for vacuum-sucking an object to be exposed in an exposure apparatus such as a liquid crystal substrate.

液晶基板露光装置においては、原板(マスク)と被露
光体(基板またはウエハ)の間隔を高精度に保ち、マス
クのパターンをファトリソグラフィー技術により基板に
転写する。このため、基板を面精度の良い、吸着溝のあ
るプレートチャック上に真空吸着させて固定保持し露光
を行なっている。
In the liquid crystal substrate exposure apparatus, the distance between the original plate (mask) and the object to be exposed (substrate or wafer) is maintained with high accuracy, and the mask pattern is transferred onto the substrate by the photolithography technique. For this reason, the substrate is vacuum-sucked on a plate chuck having a suction groove with good surface accuracy and is fixedly held to perform exposure.

最近の傾向として、液晶TVあるいは液晶ディスプレイ
用等の液晶表示板が多くの用途に使用されるようにな
り、多種類の表示画面サイズが要求され、それに伴い被
露光体の基板サイズも多様化している。
As a recent trend, liquid crystal display panels for liquid crystal TVs or liquid crystal displays have been used for many purposes, and various types of display screen sizes are required, and the substrate size of the exposed object is also diversified accordingly. There is.

[従来の技術] 従来のプレートチャックの一例を第4図の平面図(上
面図)に示す。チャック本体15の上面に真空吸着溝40が
形成され、ニップル12を介して図示しない真空源に連通
する。露光すべき基板14は位置決め用ピン13に突き当て
て位置合せした後真空吸着されチャック本体15上に固定
保持される。
[Prior Art] An example of a conventional plate chuck is shown in a plan view (top view) of FIG. A vacuum suction groove 40 is formed on the upper surface of the chuck body 15, and communicates with a vacuum source (not shown) through the nipple 12. The substrate 14 to be exposed is brought into contact with the positioning pins 13 to be aligned and then vacuum-sucked and fixedly held on the chuck body 15.

従来のプレートチャックの別の例を第5図の平面図お
よび第6図の断面図を示す。この例では、基板搭載面上
に複数の真空吸着溝40a,40b,40cが中心を整合させて設
けられ、外側2つの真空吸着溝40b,40cには真空源と断
絶するための着脱可能なネジ等からなる栓17が基板搭載
面に装着される。小さな寸法の基板14を搭載する場合に
は、外側の真空吸着溝40b,40cに連通する孔を栓17で塞
ぎ内側の真空吸着溝40aのみを使用する。
Another example of a conventional plate chuck is shown in a plan view of FIG. 5 and a sectional view of FIG. In this example, a plurality of vacuum suction grooves 40a, 40b, 40c are provided on the substrate mounting surface with their centers aligned, and the two outer vacuum suction grooves 40b, 40c are provided with detachable screws for disconnecting from the vacuum source. A plug 17 made up of, etc. is mounted on the board mounting surface. When mounting a small-sized substrate 14, only the inner vacuum suction groove 40a is used by closing the hole communicating with the outer vacuum suction grooves 40b and 40c with the plug 17.

[発明が解決しようとする問題点] 前記第4図のプレートチャックは、吸着面上に1種類
の基板サイズに対応する吸着溝のみが設けられ、異なる
サイズの基板を共用して吸着することはできなかった。
そのため、数種類の基板を露光するには、基板サイズ毎
にプレートチャックを作成しなければならず、その結
果、液晶表示板のコストは高くなり、また各サイズ毎に
プレートチャックを交換しなくてはならないため、作業
性が悪かった。
[Problems to be Solved by the Invention] In the plate chuck shown in FIG. 4, only suction grooves corresponding to one type of substrate size are provided on the suction surface, and different size substrates can be commonly used for suction. could not.
Therefore, in order to expose several kinds of substrates, it is necessary to create a plate chuck for each substrate size. As a result, the cost of the liquid crystal display panel becomes high, and the plate chuck must be replaced for each size. Since it does not happen, workability was poor.

また、第5図、第6図に示した複数種類の基板を吸着
可能な従来のプレートチャックは、基板搭載面上に設け
た栓(ネズ)17により使用する真空吸着溝を選択してい
たため、搭載面で発生する塵埃が問題となり露光精度の
低下を来し、また位置合せ用ネジ13の着脱操作も行なわ
なければならず作業性が悪く、また保管等も面倒なもの
であった。
Further, in the conventional plate chuck capable of adsorbing plural kinds of substrates shown in FIGS. 5 and 6, since the vacuum adsorption groove to be used is selected by the plug (nez) 17 provided on the substrate mounting surface, The dust generated on the mounting surface poses a problem, which lowers the exposure accuracy, and requires the attachment / detachment operation of the positioning screw 13 to be performed, resulting in poor workability and troublesome storage and the like.

[発明の目的] 本発明は前記従来技術の欠点に鑑みなされたものであ
って、複数種類の異なる寸法の基板を吸着可能でかつ基
板吸着面での塵埃の発生を防止し、しかも操作性の良好
な露光装置用プレートチャックの提供を目的とする。
[Object of the Invention] The present invention has been made in view of the above-mentioned drawbacks of the prior art, and is capable of adsorbing a plurality of types of substrates having different sizes, preventing dust from being generated on the substrate adsorbing surface, and having an operability An object is to provide a good plate chuck for an exposure apparatus.

[発明の構成] 上記目的を達成するため本発明では、プレートチャッ
クは、マスクと整合した被露光体を搭載するチャック本
体と、該チャック本体の被露光体搭載面に設けた複数の
真空吸着溝と、搭載すべき被露光体の形状に応じて前記
真空吸着溝を選択する選択手段とを備えるプレートチャ
ックにおいて、前記選択手段は、搭載すべき被露光体の
吸着面以外の部分を覆うシートを具備することを特徴と
し、あるいは前記複数の真空吸着溝が、実質上一隅部を
整合させた矩形状のもの、または前記搭載面上に各々分
離して形成された矩形状のものであることを特徴とす
る。
[Configuration of the Invention] In order to achieve the above object, according to the present invention, a plate chuck includes a chuck body on which an object to be exposed that is aligned with a mask is mounted, and a plurality of vacuum suction grooves provided on an object mounting surface of the chuck body. And a selecting means for selecting the vacuum suction groove according to the shape of the exposed object to be mounted, in the plate chuck, the selecting means selects a sheet covering a portion other than the suction surface of the exposed object to be mounted. Or a plurality of vacuum suction grooves, each of which has a substantially rectangular shape in which one corner is aligned, or a rectangular shape formed separately on the mounting surface. Characterize.

[実施例] 第1図および第2図は、各々本発明の第1の実施例の
平面図および断面図である。図において、1はユニバー
サルプレートチャック本体、2a,2b,2cはバルブ開閉用の
ツマミ、3a,3b,3cはバルブ、4は穴を塞ぐためのゴム、
5はOリング、6はバルブのガイト筒、7はガイドピ
ン、8はガスケット、9はフタ、10は封止ピン、11は取
付ネジ、12はニップル、13は基板の位置決めピン、14お
よび14′は基板である。
[Embodiment] FIGS. 1 and 2 are a plan view and a sectional view, respectively, of a first embodiment of the present invention. In the figure, 1 is a universal plate chuck body, 2a, 2b, 2c are knobs for opening and closing valves, 3a, 3b, 3c are valves, 4 is rubber for closing holes,
Reference numeral 5 is an O-ring, 6 is a valve guide tube, 7 is a guide pin, 8 is a gasket, 9 is a lid, 10 is a sealing pin, 11 is a mounting screw, 12 is a nipple, 13 is a positioning pin for the substrate, and 14 and 14 ′ Is a substrate.

上記構成において、基板14は位置決めピン13に突当て
て位置決めされる。ニップル12より真空圧を導入するこ
とにより、真空吸着溝30が真空吸引状態になり基板14は
チャック本体1上に吸着される。この状態で基板14がマ
スク(図示しない)を介して露光される。この時他の穴
(真空吸着溝)はバルブ3a,3b,3cで封止されているた
め、バキュームはリークしない。
In the above structure, the substrate 14 is positioned by abutting the positioning pin 13. By introducing a vacuum pressure from the nipple 12, the vacuum suction groove 30 is brought into a vacuum suction state, and the substrate 14 is sucked onto the chuck body 1. In this state, the substrate 14 is exposed through a mask (not shown). At this time, the other holes (vacuum suction grooves) are sealed by the valves 3a, 3b, 3c, so that the vacuum does not leak.

次に、別のサイズの基板14′を露光するには、この基
板14′を位置決めピン13に突当てて位置決めした後、左
から3番目のツマミ2cを回す。これによりバルブ3cはガ
イドピン7(バルブ3aにのみ図示)で回転が束縛されて
いるため、ガイド筒6の中を(第1図で下方向、第2図
では左方向に)移動する。したがって、このバルブ3cに
連通する真空吸着溝31にも真空が導入され、基板14′は
2つの真空吸着溝30,31によりチャック本体1上に吸着
される。
Next, in order to expose the substrate 14 'of another size, the substrate 14' is abutted against the positioning pins 13 to be positioned, and then the third knob 2c from the left is turned. As a result, the valve 3c moves in the guide cylinder 6 (downward in FIG. 1 and leftward in FIG. 2) because its rotation is restricted by the guide pin 7 (only valve 3a is shown). Therefore, vacuum is also introduced into the vacuum suction groove 31 communicating with the valve 3c, and the substrate 14 'is sucked onto the chuck body 1 by the two vacuum suction grooves 30 and 31.

同様にして、さらに左側のバルブ3b,3aを開けてゆく
ことにより、さらに大きいサイズの基板を吸着可能とな
る。このようにバルブを用いて吸着溝を選択することに
より、従来のネジを用いた場合に比べ塵埃の発生は抑制
される。またこのようなバルブ3a,3b,3cはチャック本体
1内に埋設されて基板搭載面には露出せず、また操作も
チャック本体側面から行なわれるため、基板搭載面での
塵埃発生はさらに抑制される。また操作も簡単であり、
各サイズの位置決め用ピンは共用できるため操作性が良
好である。
Similarly, by further opening the valves 3b and 3a on the left side, it is possible to adsorb a larger size substrate. By selecting the suction groove using the valve in this way, the generation of dust is suppressed as compared with the case of using the conventional screw. Further, since such valves 3a, 3b, 3c are embedded in the chuck body 1 and are not exposed on the substrate mounting surface, and the operation is also performed from the side surface of the chuck body, the generation of dust on the substrate mounting surface is further suppressed. It It is also easy to operate,
Since the positioning pins of each size can be shared, operability is good.

前記実施例では一枚のプレートチャックで数種類のサ
イズの基板に対応した例を述べたが、基板サイズがさら
に多様化し、一枚のプレートチャックで数十種類の基板
サイズに対応する場合は、プレートチャック上の吸着溝
をラバーシートで塞ぐ方式を取る。
In the above embodiment, an example in which one plate chuck is compatible with substrates of several kinds of sizes has been described. However, when the plate size is further diversified and one plate chuck can support several tens of kinds of substrate sizes, The suction groove on the chuck is covered with a rubber sheet.

第3図は本発明の別の実施例を示す。同図において、
20はプレートチャック本体、21〜24は基板、25〜27は吸
着溝を塞ぐラバーシートであり、材質は発塵しにくく、
アルコール等の洗浄に耐え得るノーカーボンのエチレン
プロピレンを使用する。基板搭載面には多数の矩形真空
吸着溝が分離して形成されている。これらの真空吸着溝
はチャック本体内で相互に連通している。
FIG. 3 shows another embodiment of the present invention. In the figure,
20 is a plate chuck main body, 21 to 24 are substrates, and 25 to 27 are rubber sheets that block the suction grooves.
Uses carbon-free ethylene propylene that can withstand cleaning with alcohol. A large number of rectangular vacuum suction grooves are separately formed on the substrate mounting surface. These vacuum suction grooves communicate with each other in the chuck body.

上記構成において、最も小さなサイズの基板21(第3
図(1)は位置決めピン13により位置合わせされる。プ
レートチャック本体20上に設けられている各吸着溝には
真空圧が導入されているため、基板21はプレートチャッ
ク本体20に吸着される。この時、基板21が吸着している
吸着溝以外の溝にも真空圧が作用するが、それらの溝は
ラバーシート25で覆いこれを吸着させることにより、真
空の漏れが防がれる。
In the above configuration, the smallest size substrate 21 (third
The position (1) in FIG. Since vacuum pressure is introduced into each suction groove provided on the plate chuck body 20, the substrate 21 is attracted to the plate chuck body 20. At this time, vacuum pressure also acts on the grooves other than the suction groove on which the substrate 21 is sucked, but by covering these grooves with the rubber sheet 25 and sucking them, vacuum leakage can be prevented.

また第3図(3),(4)に示すように基板のサイズ
が変わった場合(基板23あるいは基板24)は、それに対
応するラバーシート26あるいは27を作製し、前述と同様
に用いる。ただし第3図(2)に示すように最も大きな
基板22を吸着する時はラバーシートは不要である。
When the size of the substrate is changed (the substrate 23 or the substrate 24) as shown in FIGS. 3 (3) and (4), the rubber sheet 26 or 27 corresponding thereto is prepared and used as described above. However, as shown in FIG. 3 (2), the rubber sheet is not necessary when adsorbing the largest substrate 22.

このような方法で、吸着溝を基板サイズに合わせて設
計し、基板に対応するラバーシートを使用することによ
り、一枚のチャックで数十種類のサイズの基板が吸着可
能となる。
With such a method, the suction groove is designed according to the size of the substrate, and a rubber sheet corresponding to the substrate is used, so that substrates of several tens of sizes can be sucked by one chuck.

[発明の効果] 以上のように本発明によれば、選択手段を、搭載すべ
き被露光体の吸着面以外の部分を覆うシートを用いて構
成するようにし、あるいは複数の真空吸着溝を、実質上
一隅部を整合させた矩形状のもの、または前記搭載面上
に各々分離して形成された矩形状のものとしたため、容
易に、複数種類の異なる寸法の基板を吸着することがで
きる。また、吸着溝の形状によっては、容易に数十種類
のサイズの基板に対しても対応することができる。さら
に、シートとして発塵しにくい材質のものを選択するこ
とにより、容易に発塵の発生を防止することができる。
EFFECTS OF THE INVENTION As described above, according to the present invention, the selecting means is configured by using a sheet that covers a portion other than the suction surface of the exposed object to be mounted, or a plurality of vacuum suction grooves are provided. Substantially different kinds of substrates having different sizes can be easily adsorbed because the rectangular shape in which one corner portion is substantially aligned or the rectangular shape formed separately on the mounting surface is adopted. Further, depending on the shape of the suction groove, it is possible to easily deal with substrates of several tens of sizes. Furthermore, by selecting a sheet of a material that does not easily generate dust, it is possible to easily prevent generation of dust.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の第1実施例の平面図、第2図は第1図
の実施例の断面図、第3図(1)〜(4)は各々異なる
寸法の基板を搭載した本発明の第2実施例の平面図、第
4図は従来のプレートチャックの平面図、第5図は従来
の別のプレートチャックの平面図、第6図は第5図のプ
レートチャックの断面図である。 1,20:チャック本体、 2,2a,2b,2c:ツマミ、 3,3a,3b,3c:バルブ、 14,14′,21,22,23,24:基板、 19,19′:ウエハ、 30,31,32,33:真空吸着溝。
FIG. 1 is a plan view of the first embodiment of the present invention, FIG. 2 is a sectional view of the embodiment of FIG. 1, and FIGS. 3 (1) to (4) are the present invention in which substrates of different sizes are mounted. FIG. 4 is a plan view of a second conventional plate chuck, FIG. 4 is a plan view of a conventional plate chuck, FIG. 5 is a plan view of another conventional plate chuck, and FIG. 6 is a sectional view of the plate chuck of FIG. . 1,20: Chuck body, 2,2a, 2b, 2c: Knobs, 3,3a, 3b, 3c: Valve, 14,14 ′, 21,22,23,24: Substrate, 19,19 ′: Wafer, 30 , 31,32,33: Vacuum suction groove.

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】マスクと整合した被露光体を搭載するチャ
ック本体と、該チャック本体の被露光体搭載面に設けた
複数の真空吸着溝と、搭載すべき被露光体の形状に応じ
て前記真空吸着溝を選択する選択手段とを備え、前記選
択手段は、搭載すべき被露光体の吸着面以外の部分を覆
うシートを具備することを特徴とするプレートチャッ
ク。
1. A chuck main body for mounting an exposure target aligned with a mask, a plurality of vacuum suction grooves provided on a surface of the chuck main body on which the exposure target is mounted, and a plurality of vacuum suction grooves according to the shape of the exposure target to be mounted. A plate chuck, comprising: a selection unit that selects a vacuum suction groove, the selection unit including a sheet that covers a portion other than the suction surface of the exposed object to be mounted.
【請求項2】マスクと整合した被露光体を搭載するチャ
ック本体と、該チャック本体の被露光体搭載面に設けた
複数の真空吸着溝と、搭載すべき被露光体の形状に応じ
て前記真空吸着溝を選択する選択手段とを備え、前記複
数の真空吸着溝は実質上一隅部を整合させた矩形状であ
ることを特徴とするプレートチャック。
2. A chuck main body for mounting an exposure target aligned with a mask, a plurality of vacuum suction grooves provided on a surface of the chuck main body for mounting the exposure target, and the chuck according to the shape of the exposure target to be mounted. A plate chuck, comprising: a selection unit for selecting a vacuum suction groove, wherein the plurality of vacuum suction grooves are substantially rectangular with one corner aligned.
【請求項3】マスクと整合した被露光体を搭載するチャ
ック本体と、該チャック本体の被露光体搭載面に設けた
複数の真空吸着溝と、搭載すべき被露光体の形状に応じ
て前記真空吸着溝を選択する選択手段とを備え、前記複
数の真空吸着溝は前記搭載面上に各々分離して形成され
た矩形状であることを特徴とするプレートチャック。
3. A chuck body on which an exposed object aligned with a mask is mounted, a plurality of vacuum suction grooves provided on an exposed object mounting surface of the chuck body, and the chuck body according to the shape of the exposed object to be mounted. A plate chuck, comprising: a selection unit for selecting a vacuum suction groove, wherein the plurality of vacuum suction grooves have a rectangular shape formed separately on the mounting surface.
JP63025741A 1988-02-08 1988-02-08 Plate chuck Expired - Lifetime JP2532905B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63025741A JP2532905B2 (en) 1988-02-08 1988-02-08 Plate chuck

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63025741A JP2532905B2 (en) 1988-02-08 1988-02-08 Plate chuck

Publications (2)

Publication Number Publication Date
JPH01201936A JPH01201936A (en) 1989-08-14
JP2532905B2 true JP2532905B2 (en) 1996-09-11

Family

ID=12174248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63025741A Expired - Lifetime JP2532905B2 (en) 1988-02-08 1988-02-08 Plate chuck

Country Status (1)

Country Link
JP (1) JP2532905B2 (en)

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JP5965133B2 (en) * 2011-11-17 2016-08-03 リンテック株式会社 Light irradiation apparatus and light irradiation method
DE102016106706A1 (en) * 2016-04-12 2017-10-12 Laser Imaging Systems Gmbh Device for fixing objects by means of vacuum
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