JP2530626B2 - Method of producing film thickness distribution film - Google Patents
Method of producing film thickness distribution filmInfo
- Publication number
- JP2530626B2 JP2530626B2 JP61219772A JP21977286A JP2530626B2 JP 2530626 B2 JP2530626 B2 JP 2530626B2 JP 61219772 A JP61219772 A JP 61219772A JP 21977286 A JP21977286 A JP 21977286A JP 2530626 B2 JP2530626 B2 JP 2530626B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- thickness distribution
- solvent
- producing
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/124—Geodesic lenses or integrated gratings
- G02B6/1245—Geodesic lenses
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Integrated Circuits (AREA)
Description
【発明の詳細な説明】 〔概 要〕 膜圧分布膜の作製方法であって、光反応性物質を含む
膜に溶媒を含ませ、光照射と同時に、または光照射後に
膜中より溶媒を除去することにより、膜厚分布膜を作製
するために使用できる光反応性物質及びバインディング
用高分子の種類及び重合度の選択幅を広げることを可能
とする。DETAILED DESCRIPTION OF THE INVENTION [Summary] A method for producing a transmembrane pressure distribution film, wherein a solvent is included in a film containing a photoreactive substance, and the solvent is removed from the film simultaneously with or after the light irradiation. By doing so, it becomes possible to widen the selection range of the type and degree of polymerization of the photoreactive substance and the binding polymer that can be used for producing the film thickness distribution film.
本発明は膜厚分布膜の作製方法に関するもので、さら
に詳しく言えば、プラスチックマイクロレンズ、プラス
チック導波管、ホログラム等の作製方法に関するもので
ある。The present invention relates to a method for producing a film thickness distribution film, and more particularly to a method for producing a plastic microlens, a plastic waveguide, a hologram and the like.
プチスチックレンズは、光ファイバ通信における光の
分岐、結合、合波、分波等への応用、光集積回路におけ
る発光ダイオード集光や導波路レンズへの応用などアレ
イ化及び微小化の要求が高まっている。このためアレイ
化が容易で安価なレンズアレイの製造方法が必要とされ
ている。The demand for arraying and miniaturization of plastic lenses is increasing for applications such as branching, coupling, multiplexing, and demultiplexing of light in optical fiber communications, light-emitting diode focusing in optical integrated circuits, and applications in waveguide lenses. ing. Therefore, there is a need for a lens array manufacturing method that is easy to array and inexpensive.
従来の膜厚分布膜の作製方法は第2図aに示すように
基板1の上に形成された光反応性物質を含む膜2に対し
マスク3を用いて局部的に光4を照射することにより第
2図bのように光照射された部分に光反応生成物を生成
させて膜形状を変化させ、レンズ5等を形成していた。As shown in FIG. 2a, the conventional method of forming a film having a thickness distribution is to irradiate a film 2 containing a photoreactive substance formed on a substrate 1 with light 4 locally using a mask 3. Thus, as shown in FIG. 2B, a photoreaction product is generated in the light-irradiated portion to change the film shape, and the lens 5 and the like are formed.
光化学反応を利用して膜厚分布膜を作製する方法で
は、(1)光反応性物質が膜中を拡散することと、
(2)少なくとも光反応性物質と光反応生成物の混合状
態では液性を有することが必要である。(1)は膜形状
が変化するために必要であり、(2)は表面張力が働ら
いて曲面ができるために必要である。従って前記従来の
膜厚分布膜の作製方法では溶媒を用いていないため、例
えばけい皮酸やけい皮酸コレステロールのような光反応
性物質はモノマが膜中を拡散しない。またモノマとダイ
マの混合物は光照射温度で固体であるために使えない。
また同様に光反応性物質のモノマが拡散しないため重合
度の大きい高分子をバインダーとして使えない等の欠点
があった。In the method of forming a film thickness distribution film using a photochemical reaction, (1) the photoreactive substance diffuses in the film,
(2) It is necessary to have liquidity at least in the mixed state of the photoreactive substance and the photoreaction product. (1) is necessary because the film shape changes, and (2) is necessary because surface tension acts to form a curved surface. Therefore, since no solvent is used in the conventional method for producing a film thickness distribution film, a monomer of a photoreactive substance such as cinnamic acid or cholesterol cinnamate does not diffuse in the film. Also, a mixture of a monomer and a dimer cannot be used because it is solid at the light irradiation temperature.
Similarly, since the photoreactive substance monomer does not diffuse, a polymer having a high degree of polymerization cannot be used as a binder.
本発明はこのような点に鑑みて創作されたもので、膜
厚分布膜を作製するために使用できる光反応性物質及び
バインディング用高分子の種類及び重合度の選択幅の広
い膜厚分布膜の作製方法を提供することを目的としてい
る。The present invention has been made in view of the above points, and a film thickness distribution film having a wide selection range of the type and the degree of polymerization of the photoreactive substance and the binding polymer that can be used for manufacturing the film thickness distribution film. It is an object of the present invention to provide a method for producing.
このため本発明においては、光の照射により反応して
分子量が増大する光反応物質を少なくとも含む膜11に局
部的に光照射することにより、光照射部部分にレンズ体
を形成する膜厚分布膜の作製方法において、上記膜11に
溶媒として1,4−ジオキサンまたは1,4−ジオキサンより
光照射温度での蒸気圧が低い溶媒を含み、光照射と同時
に、または光照射後に膜中より溶媒が除去されることを
特徴とする。Therefore, in the present invention, by locally irradiating the film 11 containing at least a photoreactive substance whose molecular weight increases by reacting with irradiation of light, a film thickness distribution film for forming a lens body in the light irradiation portion. In the preparation method of 1, the film 11 contains 1,4-dioxane or a solvent having a lower vapor pressure at a light irradiation temperature than 1,4-dioxane as a solvent, and the solvent is contained in the film at the same time as the light irradiation or after the light irradiation. It is characterized by being removed.
光反応性物質を含む膜11に溶媒を含ませることによ
り、光反応性物質が膜中を拡散することができ、また光
反応性物質と光反応生成物の混合状態で液性を有するた
め、従来使えなかった光反応性物質やバインディング用
高分子を使用することが可能となる。By including a solvent in the film 11 containing the photoreactive substance, the photoreactive substance can be diffused in the film, and since the photoreactive substance and the photoreaction product have a liquid state in a mixed state, It becomes possible to use photoreactive substances and binding polymers that could not be used conventionally.
本実施例は先ず第1図aに示すように、基板10の上に
光反応性物質及び溶媒を含む膜11を形成し、該膜11にマ
スク12を用いて光13を局部的に照射し、第1図bの如く
膜形状を変化させてレンズ14等を形成し、溶媒は光照射
と同時にまたは光照射後に除去するのである。In this embodiment, first, as shown in FIG. 1A, a film 11 containing a photoreactive substance and a solvent is formed on a substrate 10, and a light 12 is locally irradiated on the film 11 using a mask 12. As shown in FIG. 1b, the film shape is changed to form the lens 14 and the like, and the solvent is removed simultaneously with or after the light irradiation.
溶媒としては、第1表に示す如きものを用いることが
できる。As the solvent, those shown in Table 1 can be used.
第1表は溶媒と共に光反応性物質及びバインダーを示
している。例1及び例2の溶媒は光照射後、アニールに
より除去する。例3の溶媒であるけい皮酸ビニルは同時
に光二量化反応する物質であり、またビニル基をもって
いるため熱重合反応もするので後処理としてアニールに
より熱重合を行ない安定化する。 Table 1 shows the photoreactive material and the binder together with the solvent. The solvents of Examples 1 and 2 are removed by annealing after irradiation with light. The solvent of Example 3, vinyl cinnamate, is a substance that undergoes a photodimerization reaction at the same time, and since it has a vinyl group, it also undergoes a thermal polymerization reaction. Therefore, annealing is performed as a post-treatment to stabilize it.
これら実施例では溶媒が膜中に存在することによって
光反応性物質は膜中を拡散でき、表面張力が働いて曲面
が形成でき、レンズや光導波路などの膜厚分布膜を作製
することができる。In these examples, the presence of the solvent in the film allows the photoreactive substance to diffuse in the film, and the surface tension acts to form a curved surface, thereby making it possible to form a film thickness distribution film such as a lens or an optical waveguide. .
以上述べてきたように、本発明によれば、膜に溶媒が
含まれないときには膜厚分布膜の作製に使えなかったけ
い皮酸やけい皮酸コレステロール等の光反応性物質やバ
インディング高分子を溶媒を含ませることにより使用す
ることができ、実用的には極めて有用である。As described above, according to the present invention, a photoreactive substance such as cinnamic acid or cholesterol cinnamate, which cannot be used in the production of a film thickness distribution film when the film does not contain a solvent, or a binding polymer. It can be used by including a solvent and is extremely useful in practice.
第1図は本発明の実施例を説明するための図、 第2図は従来の膜厚分布膜の作製方法を説明するための
図である。 第1図において、 10は基板、 11は光反応性物質及び溶媒を含む膜、 12はマスク、 13は光、 14はレンズである。FIG. 1 is a diagram for explaining an embodiment of the present invention, and FIG. 2 is a diagram for explaining a conventional method for producing a film thickness distribution film. In FIG. 1, 10 is a substrate, 11 is a film containing a photoreactive substance and a solvent, 12 is a mask, 13 is light, and 14 is a lens.
Claims (1)
光反応性物質を少なくとも含む膜(11)に局部的に光照
射することにより、光照射部部分にレンズ体を形成する
膜厚分布膜の作製方法において、 上記膜(11)に溶媒として1,4−ジオキサンまたは1,4−
ジオキサンより光照射温度での蒸気圧が低い溶媒を含
み、光照射と同時に、または光照射後に膜中より溶媒が
除去されることを特徴とする膜厚分布膜の作製方法。1. A film thickness distribution for forming a lens body at a light irradiation portion by locally irradiating light on a film (11) containing at least a photoreactive substance whose molecular weight increases by reaction with light irradiation. In the method for producing a film, 1,4-dioxane or 1,4-
A method for producing a film thickness distribution film, which comprises a solvent having a vapor pressure lower than that of dioxane at a light irradiation temperature, and the solvent is removed from the film simultaneously with or after the light irradiation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61219772A JP2530626B2 (en) | 1986-09-19 | 1986-09-19 | Method of producing film thickness distribution film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61219772A JP2530626B2 (en) | 1986-09-19 | 1986-09-19 | Method of producing film thickness distribution film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6375707A JPS6375707A (en) | 1988-04-06 |
JP2530626B2 true JP2530626B2 (en) | 1996-09-04 |
Family
ID=16740765
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61219772A Expired - Fee Related JP2530626B2 (en) | 1986-09-19 | 1986-09-19 | Method of producing film thickness distribution film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2530626B2 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100425511B1 (en) * | 2000-08-23 | 2004-03-30 | 양근창 | Apparatus and Method for Manufacturing light guide plate for plane light source unit |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4395484A (en) * | 1982-06-25 | 1983-07-26 | Minnesota Mining And Manufacturing Company | Roomlight-stable ultraviolet-response photothermographic imaging material |
-
1986
- 1986-09-19 JP JP61219772A patent/JP2530626B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPS6375707A (en) | 1988-04-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |