JPS6375708A - Manufacture of distributed thickness film - Google Patents

Manufacture of distributed thickness film

Info

Publication number
JPS6375708A
JPS6375708A JP21978286A JP21978286A JPS6375708A JP S6375708 A JPS6375708 A JP S6375708A JP 21978286 A JP21978286 A JP 21978286A JP 21978286 A JP21978286 A JP 21978286A JP S6375708 A JPS6375708 A JP S6375708A
Authority
JP
Japan
Prior art keywords
film
region
light
photoreaction
difference
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21978286A
Other languages
Japanese (ja)
Inventor
Toshihiro Suzuki
敏弘 鈴木
Yasuyuki Todokoro
泰之 外處
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP21978286A priority Critical patent/JPS6375708A/en
Priority to CA000542888A priority patent/CA1294470C/en
Priority to US07/077,337 priority patent/US4877717A/en
Priority to EP87306609A priority patent/EP0258994B1/en
Priority to DE8787306609T priority patent/DE3782783T2/en
Publication of JPS6375708A publication Critical patent/JPS6375708A/en
Pending legal-status Critical Current

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  • Optical Integrated Circuits (AREA)

Abstract

PURPOSE:To enable manufacture of a distributed thickness film having a large change of the film shape by producing a difference in the concn. of the photoreaction forming material in a photoreactive material by local photoirradiation and making use of the permeation having the tendency to decrease said concn. difference. CONSTITUTION:This method utilizes the permeation which appears between a solvent and soln. isolated by a semipermeable membrane. Light 3 is projected to the film 1 consisting of the photoreactive material M by using a mask 2. A resultant product (m) of photoreaction is formed from the photoreactive material M in the irradiated region R of the film 1 but an increase in the concn. of the resultant product (m) of photoreaction is caused in the irradiated region R by the photoirradiation if the photoreactive material M has a solvent-like property to the resultant product (m) of photoreaction. The permeation having the tendency to decrease said concn. difference, thereupon, arises at the boundary B between the irradiated region R and the unirradiated region Q so that the photoreactive material M migrates from the region Q to the region R. As a result, a film thickness difference (h) arises between the region R and the region Q.

Description

【発明の詳細な説明】 〔概 要〕 膜厚分布膜の作製方法であって、光反応性物質からなる
膜に局部的に光照射し、光照射領域と光未照射領域とで
前記光反応性物質の中の光反応生成物質の濃度に差を出
現させ、その濃度差を減少させようとする浸透現象によ
り光照射領域と光未照射領域との境界に膜形状を変化さ
せることを可能とする。
[Detailed Description of the Invention] [Summary] A method for producing a thickness distribution film, in which a film made of a photoreactive substance is locally irradiated with light, and the photoreaction occurs in the light irradiated area and the non-light irradiated area. It is possible to change the shape of the film at the boundary between the light-irradiated area and the non-light-irradiated area by creating a difference in the concentration of the photoreaction product in the chemical substance, and by an osmosis phenomenon that attempts to reduce the difference in concentration. do.

〔産業上の利用分野〕[Industrial application field]

本発明は光通信用の光学装置等に用いられるレンズ、光
導波路、回折格子などの作製方法に関するもので、さら
に詳しく言えば、その形状変化を起させる方法に関する
ものである。
The present invention relates to a method for manufacturing lenses, optical waveguides, diffraction gratings, etc. used in optical devices for optical communications, and more specifically, to a method for causing changes in their shapes.

光通信用の光学装置にはセンサ用マイクロレンズアレイ
、CD用マイクロレンズなど短焦点のマイクロレンズが
望まれている。また先導波路はJ]失の小さいもの、回
折格子は効率の良いものが望まれている。これに対し有
機高分子膜に局部的に光を照射してレンズ等を作製する
方法が開発されているが、前記の要求を満たすためには
膜の形状変化を大きくする必要がある。
Short-focus microlenses such as microlens arrays for sensors and microlenses for CDs are desired for optical devices for optical communication. Further, it is desired that the leading waveguide has a small J] loss and that the diffraction grating has high efficiency. In response to this, a method has been developed in which lenses and the like are manufactured by locally irradiating an organic polymer film with light, but in order to meet the above requirements, it is necessary to increase the change in the shape of the film.

〔従来の技術〕[Conventional technology]

従来の膜形状分布膜の作製法としては、光反応性物質を
均一に混ぜた膜に局部的に光照射して光反応生成物の分
布をつくり、アニールにより未反応光反応性物質を除去
することにより、膜厚分布膜をつくる方法と、光未照射
領域から光照射領域への光反応性物質の拡散のみを利用
した方法とがある。
The conventional method for producing film shape distribution films is to locally irradiate a film uniformly mixed with photoreactive substances to create a distribution of photoreaction products, and then remove unreacted photoreactive substances by annealing. Accordingly, there are two methods: one method is to create a thickness distribution film, and the other is a method that utilizes only the diffusion of the photoreactive substance from the non-light irradiated area to the light irradiated area.

前者は光導波路作製に利用されており、後者はホログラ
ムの形成に利用されているが、もともと光分布を膜の密
度分布(屈折率分布)とするための方法であり、膜の形
状変化は非常に小さい。
The former is used to fabricate optical waveguides, and the latter is used to form holograms, but this method was originally used to make the light distribution the density distribution (refractive index distribution) of the film, and changes in the shape of the film are extremely difficult. small.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来の方法では膜形状変化を大きくできないという
欠点があった。
The conventional method described above has the disadvantage that it is not possible to greatly change the shape of the film.

本発明はこのような点に鑑みて創作されたもので膜形状
変化の大きい膜厚分布膜の作製方法を捉供することを目
的としている。
The present invention was created in view of the above points, and an object of the present invention is to provide a method for manufacturing a thickness distribution film having a large change in film shape.

〔問題点を解決するための手段〕 第1図は本発明の詳細な説明3−るための図である。[Means for solving problems] FIG. 1 is a diagram for detailed explanation of the present invention.

本発明は先ず第1図aに示すように、少なくとも光反応
性物質Mからなる膜1にマスク2を用いて局部的に光3
を照射し、該光照射領域Rで第1図すの如く光反応性物
質Mから光反応生成物mを生成させて膜厚分布膜を形成
するのである。
In the present invention, as shown in FIG.
is irradiated, and a photoreaction product m is generated from the photoreactive substance M in the light irradiation region R as shown in FIG. 1, thereby forming a thickness distribution film.

〔作 用〕[For production]

本発明の作用は第1図Cに示すように半透膜4によって
溶媒と溶液を隔てた場合に出現する浸透現象にほぼ同じ
であり、異なるのは溶質が溶媒の化学変化したものであ
ることと、この化学変化を光照射によってひき起こして
いることと、半透膜的作用が光反応生成物mが光未照射
領域Qで動けないことである。
The effect of the present invention is almost the same as the osmosis phenomenon that occurs when a solvent and a solution are separated by a semipermeable membrane 4, as shown in FIG. 1C, and the difference is that the solute is a chemical change of the solvent. This chemical change is caused by light irradiation, and the semi-permeable membrane action prevents the photoreaction product m from moving in the non-light irradiated region Q.

即ち第1図すにおいて膜1は光照射によって光反応生成
物mを生成する光反応性物質Mを含んでおり、この光反
応性物質Mが光反応生成物mに対して溶媒的性質を有す
るときは、光照射により光照射領域Rで光反応生成物m
の濃度が増すことになり、光照射領域Rと光未照射領域
Qとの境界Bにおいてこの濃度を薄めようとする浸透の
現象が起こり、光反応性物質Mが光未照射領域Qから光
照射領域Rへ移動する。この結果光照射領域Rと光未照
射領域Qとの間に膜厚差りが生ずる。
That is, in FIG. 1, the membrane 1 contains a photoreactive substance M that generates a photoreaction product m upon irradiation with light, and this photoreactive substance M has solvent-like properties for the photoreaction product m. When the photoreaction product m is generated in the light irradiation area R by light irradiation,
As a result, a phenomenon of penetration occurs to dilute this concentration at the boundary B between the light-irradiated region R and the non-irradiated region Q, and the photoreactive substance M is transferred from the non-irradiated region Q to the light-irradiated region. Move to area R. As a result, a difference in film thickness occurs between the light irradiated area R and the non-light irradiated area Q.

〔実施例〕〔Example〕

第1図により本実施例を説明する。膜1は光重合反応物
iMとパインディング用高分子Pからなる。物質Mとし
て、膜中で拡散し、物質Mとこの物質に光照射して得ら
れる低重合度重合物mの混合物M + mが光照射時に
液体であるものを選ぶ。
This embodiment will be explained with reference to FIG. The film 1 consists of a photopolymerization reactant iM and a binding polymer P. As the substance M, a substance is selected that diffuses in the film, and a mixture M + m of the substance M and a low polymerization degree polymer m obtained by irradiating the substance with light is a liquid upon irradiation with light.

高分子Pは光照射領域Rと光未照射領域Qの境界Bで半
透膜的作用を効果的に現わすものを選ぶ。
The polymer P is selected so as to effectively exhibit a semi-permeable membrane action at the boundary B between the light irradiated region R and the non-light irradiated region Q.

これに光照射を行なうことにより膜中の光重合反応物質
Mがなくなるまで光照射領域Rの体積は膨張することに
なり、光未照射領域Qに対する光照射領域Rの面積を小
さくする程、光照射領域Rの体積を大きくできる。
By irradiating this with light, the volume of the light irradiated region R will expand until the photopolymerization reaction substance M in the film is exhausted. The volume of the irradiation area R can be increased.

〔発明の効果〕〔Effect of the invention〕

以上述べてきたように、本発明によれば、光照射により
浸透現象が発現するので、大きな膜形状変化が得られ、
さらに重力等の外力を排した系においては膜中の光反応
性物質Mが涸渇するまで体積膨張が続き、形状変化の大
きいg!膜厚分布膜形成でき、実用的には極めて有用で
ある。
As described above, according to the present invention, a penetration phenomenon occurs due to light irradiation, so a large change in membrane shape can be obtained.
Furthermore, in a system that excludes external forces such as gravity, the volume expansion continues until the photoreactive substance M in the film is depleted, causing a large change in shape. It is possible to form a film with a thickness distribution, and is extremely useful in practical terms.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の詳細な説明するための図、第1図にお
いて、 1は膜、 2はマスク、 3は光、 Mは光反応性物質、 mは光反応生成物、 Rは光照射領域、 Qは光未照射領域、 Bは半透膜、 hは膜厚差である。
FIG. 1 is a diagram for explaining the present invention in detail. In FIG. 1, 1 is a film, 2 is a mask, 3 is light, M is a photoreactive substance, m is a photoreaction product, and R is light irradiation. area, Q is the unirradiated area, B is the semi-transparent film, and h is the difference in film thickness.

Claims (1)

【特許請求の範囲】 1、少なくとも光反応性物質(M)からなる膜(1)に
局部的に光を照射し、 該部を少なくとも光反応性物質(M)と光反応生成物(
m)とからなる膜(2)となし、 光照射領域(R)と光未照射領域(Q)とで光反応性物
質(M)中の光反応生成物(m)の濃度に差を出現させ
、 上記濃度差を減少させようとする浸透現象を光照射領域
(R)と光未照射領域(Q)の境界(B)において出現
させて膜形状を変化させることを特徴とした膜厚分布膜
の作製方法。
[Claims] 1. Locally irradiating a film (1) made of at least a photoreactive substance (M) with light;
A difference appears in the concentration of the photoreaction product (m) in the photoreactive substance (M) between the light irradiated area (R) and the non-light irradiated area (Q). A film thickness distribution characterized in that a permeation phenomenon that attempts to reduce the concentration difference appears at the boundary (B) between the light irradiated region (R) and the non-light irradiated region (Q), thereby changing the film shape. Membrane preparation method.
JP21978286A 1986-07-26 1986-09-19 Manufacture of distributed thickness film Pending JPS6375708A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP21978286A JPS6375708A (en) 1986-09-19 1986-09-19 Manufacture of distributed thickness film
CA000542888A CA1294470C (en) 1986-07-26 1987-07-23 Process for the production of optical elements
US07/077,337 US4877717A (en) 1986-07-26 1987-07-24 Process for the production of optical elements
EP87306609A EP0258994B1 (en) 1986-07-26 1987-07-27 Process for the production of optical elements
DE8787306609T DE3782783T2 (en) 1986-07-26 1987-07-27 METHOD FOR PRODUCING OPTICAL COMPONENTS.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21978286A JPS6375708A (en) 1986-09-19 1986-09-19 Manufacture of distributed thickness film

Publications (1)

Publication Number Publication Date
JPS6375708A true JPS6375708A (en) 1988-04-06

Family

ID=16740920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21978286A Pending JPS6375708A (en) 1986-07-26 1986-09-19 Manufacture of distributed thickness film

Country Status (1)

Country Link
JP (1) JPS6375708A (en)

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