JP2529183B2 - Method of manufacturing thin film magnetic head - Google Patents
Method of manufacturing thin film magnetic headInfo
- Publication number
- JP2529183B2 JP2529183B2 JP60067138A JP6713885A JP2529183B2 JP 2529183 B2 JP2529183 B2 JP 2529183B2 JP 60067138 A JP60067138 A JP 60067138A JP 6713885 A JP6713885 A JP 6713885A JP 2529183 B2 JP2529183 B2 JP 2529183B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic head
- film magnetic
- piezoelectric element
- head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 title claims description 53
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 8
- 239000010408 film Substances 0.000 description 13
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B33/00—Constructional parts, details or accessories not provided for in the other groups of this subclass
- G11B33/10—Indicating arrangements; Warning arrangements
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3109—Details
- G11B5/313—Disposition of layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/40—Protective measures on heads, e.g. against excessive temperature
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔概要〕 基板上に下部磁極層、ギャップ層、絶縁層、薄膜コイ
ル、上部磁極層等よりなる薄膜磁気ヘッドを形成した基
板の製造工程と同一工程で同磁気ヘッドに近接して下部
電極、圧電性部材、上部電極からなる圧電素子を形成し
た小型かつ軽量な薄膜磁気ヘッドの製造方法である。DETAILED DESCRIPTION OF THE INVENTION [Outline] The same magnetic head is manufactured in the same manufacturing process as a substrate in which a thin film magnetic head including a lower magnetic pole layer, a gap layer, an insulating layer, a thin film coil, and an upper magnetic pole layer is formed on a substrate. A method of manufacturing a small-sized and lightweight thin-film magnetic head in which a piezoelectric element including a lower electrode, a piezoelectric member, and an upper electrode is formed in close proximity.
本発明は薄膜磁気ヘッドに係り、特に磁気ディスクと
の間の異常接触を容易に検知できるようにした薄膜磁気
ヘッドの製造方法に関する。The present invention relates to a thin film magnetic head, and more particularly to a method of manufacturing a thin film magnetic head capable of easily detecting abnormal contact with a magnetic disk.
最近、磁気ヘッドは益々高記録密度化、小型化、高精
度化が要求され、更に量産性に富んだ低コストの磁気ヘ
ッドが要求されている。このような条件を充たす磁気ヘ
ッドとして、記録に寄与するヘッドの磁界分布が急峻で
高密度記録ができ、一括生産によって低価格と特性の均
一化が図れる小型な薄膜磁気ヘッドが実用化されてい
る。Recently, magnetic heads are required to have higher recording densities, smaller sizes, and higher precision, and further, low-cost magnetic heads having high mass productivity are required. As a magnetic head satisfying these conditions, a small thin-film magnetic head has been put into practical use, in which the magnetic field distribution of the head contributing to recording is steep and high-density recording can be performed, and low cost and uniform characteristics can be achieved by batch production. .
ところでこのような薄膜磁気ヘッドは、エアスライダ
に搭載され、磁気ディスクの高速回転で生じる空気流に
より空気力学的に支持されている。By the way, such a thin film magnetic head is mounted on an air slider and is supported aerodynamically by an air flow generated by high speed rotation of a magnetic disk.
そしてこの磁気ヘッドのギャップ層と磁気ディスクの
磁性膜との間で漏れ磁界を発生させ、この漏れ磁界によ
って情報の記録再生を行っている。Then, a leak magnetic field is generated between the gap layer of the magnetic head and the magnetic film of the magnetic disk, and information is recorded / reproduced by the leak magnetic field.
今、磁気ディスク上に塵やゴミ等が付着すると、この
塵を介して磁気ディスクと磁気ヘッドが接触する接触回
数が頻繁になり、磁気ディスクと磁気ヘッドの両方が損
傷するといったヘッドクラッシュ現象を発生し、装置の
使用が不可能になる。Now, if dust or dirt adheres to the magnetic disk, the number of times the magnetic disk and the magnetic head come into contact with each other via this dust will occur frequently, resulting in a head crash phenomenon in which both the magnetic disk and the magnetic head are damaged. However, the device cannot be used.
従来の薄膜磁気ヘッドを含むヘッド支持機構の要部平
面図と側面図を第５図，第６図に示す。5 and 6 are a plan view and a side view of a main part of a head supporting mechanism including a conventional thin film magnetic head.
第５図、および第６図に示すように薄膜ヘッド１を形
成して所定形状に切り出したアルミナ系セラミックスよ
りなるスライダ２が、弾力性のある薄板状の金属部材よ
りなるジンバル構造体３に取りつけられ、このジンバル
構造体３がバネ板４を介してアーム５に取りつけられて
いる。As shown in FIG. 5 and FIG. 6, the slider 2 made of alumina ceramics, which is formed by cutting the thin film head 1 into a predetermined shape, is attached to the gimbal structure 3 made of an elastic thin plate metal member. The gimbal structure 3 is attached to the arm 5 via the spring plate 4.
このスライダ２の磁気ディスク６と対向する面の背面
側に圧電素子７を固着し、この圧電素子７を用いて磁気
ディスクと磁気ヘッドが接触した時、ディスク或いはヘ
ッドに於ける歪みのエネルギーが弾性波として放出され
るのを検知し、ディスクとヘッド間の接触状況を検知す
る方法が考えられている。A piezoelectric element 7 is fixed to the back side of the surface of the slider 2 facing the magnetic disk 6, and when the magnetic disk and the magnetic head are brought into contact with each other using this piezoelectric element 7, the energy of strain in the disk or the head is elastic. A method has been considered in which it is detected as a wave and the contact state between the disk and the head is detected.
ところでこのような薄膜磁気ヘッドは益々小型化され
ようとしており、このように圧電素子７をスライダ２の
背面に固着したのでは、ヘッドの構造が複雑で小型化で
きない。また固着条件によっては検出感度にバラツキを
生じる。また固着した圧電素子が装置の稼働中に外れる
等の欠点があった。By the way, such thin-film magnetic heads are becoming smaller and smaller, and if the piezoelectric element 7 is fixed to the back surface of the slider 2 as described above, the head structure is complicated and cannot be made smaller. Further, the detection sensitivity may vary depending on the fixing conditions. Further, there is a defect that the fixed piezoelectric element comes off during operation of the apparatus.
そこで圧電素子を、薄膜磁気ヘッドを形成する工程で
一括して製造して設け、ヘッドと圧電素子とスライダと
を一体化した構造が望まれるようになっている。Therefore, there is a demand for a structure in which a piezoelectric element is manufactured and provided in a batch in the process of forming a thin film magnetic head, and the head, the piezoelectric element, and the slider are integrated.
第１図は本発明の薄膜磁気ヘッドの斜視図及び第２図
の薄膜磁気ヘッドの要部断面図に示すように基板11上に
は絶縁層24を介して圧電素子22の下部電極19と所定形状
の薄膜磁気ヘッド18の下部磁極層12とを所定間隔で同時
に形成する工程と、次に個別工程の後に、圧電素子22の
上部電極21と薄膜磁気ヘッド18の上部磁極層17とを同時
に形成する工程を経由して圧電素子搭載の薄膜磁気ヘッ
ドが製造される。FIG. 1 is a perspective view of a thin film magnetic head according to the present invention and a sectional view of a main part of the thin film magnetic head shown in FIG. 2, where a lower electrode 19 of a piezoelectric element 22 and a predetermined electrode are provided on a substrate 11 via an insulating layer 24. Of the shaped thin-film magnetic head 18 and the lower pole layer 12 of the thin-film magnetic head 18 at a predetermined interval at the same time, and after the individual steps, the upper electrode 21 of the piezoelectric element 22 and the upper pole layer 17 of the thin-film magnetic head 18 are simultaneously formed. Through the steps described above, a thin film magnetic head with a piezoelectric element mounted is manufactured.
即ち、本発明の薄膜磁気ヘッドは、薄膜磁気ヘッド18
を形成する基板11に、薄膜磁気ヘッド18を形成する工程
の一部を利用して圧電素子22を同時に設け、薄膜磁気ヘ
ッド18と圧電素子22とを一体化して小型、軽量化を図っ
たものである。That is, the thin film magnetic head of the present invention is the thin film magnetic head 18
A piezoelectric element 22 is simultaneously provided on a substrate 11 on which the thin film magnetic head 18 is formed by utilizing a part of the process of forming the thin film magnetic head 18, and the thin film magnetic head 18 and the piezoelectric element 22 are integrated to reduce the size and weight. Is.
以下、図面を用いながら本発明の一実施例につき詳細
に説明する。Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings.
第１図は本発明の薄膜磁気ヘッドの斜視図で、第２図
は第１図をII-II′線に沿って切断した薄膜磁気ヘッド
の要部断面図を示し、第３図は第１図をIII-III′線に
沿って切断した圧電素子の要部断面図を示す。FIG. 1 is a perspective view of a thin film magnetic head according to the present invention, FIG. 2 is a sectional view of a main part of the thin film magnetic head taken along the line II-II 'of FIG. 1, and FIG. FIG. 3 is a cross-sectional view of the main part of the piezoelectric element taken along the line III-III ′.
第１図、第２図および第３図に示すように本発明の薄
膜磁気ヘッドは、アルミナ系セラミックス、或いはフォ
トセラムよりなる非磁性基板11上に、メッキ、蒸着、ス
パッタ、レジストコーティング等ホトリソグラフィ法を
用いて、下部磁極層12、薄膜コイル15、上部磁極層17及
び端子引出し層23とからなる薄膜磁気ヘッド18と、下部
電極19、圧電性部材20および上部電極21からなる圧電素
子22とを近接して設けている。As shown in FIGS. 1, 2 and 3, the thin film magnetic head of the present invention is a photolithography method such as plating, vapor deposition, sputtering, resist coating, etc. on a non-magnetic substrate 11 made of alumina ceramics or photoceram. Method, a thin film magnetic head 18 including a lower magnetic pole layer 12, a thin film coil 15, an upper magnetic pole layer 17 and a terminal lead layer 23, and a piezoelectric element 22 including a lower electrode 19, a piezoelectric member 20 and an upper electrode 21. Are provided close to each other.
このような薄膜磁気ヘッドを形成するには、まずアル
ミナ系セラミックス、或いはフォトセラムよりなる非磁
性基板11全面に二酸化シリコン膜より成る絶縁層24を形
成する。この絶縁層24上にニッケル−鉄（Ni-Fe）合金
よりなる被膜を所定のパターンに形成して薄膜磁気ヘッ
ド18の下部磁極層12及び圧電素子22の下部電極19を形成
する。In order to form such a thin film magnetic head, first, an insulating layer 24 made of a silicon dioxide film is formed on the entire surface of the non-magnetic substrate 11 made of alumina ceramics or photoceram. A film made of a nickel-iron (Ni-Fe) alloy is formed on the insulating layer 24 in a predetermined pattern to form the lower magnetic pole layer 12 of the thin film magnetic head 18 and the lower electrode 19 of the piezoelectric element 22.
次いで薄膜磁極ヘッド18のギャップ層13となるSiO2膜
を所定のパターンに形成する。Next, a SiO 2 film to be the gap layer 13 of the thin film magnetic pole head 18 is formed in a predetermined pattern.
次いで圧電素子22の圧電性部材20となる酸化亜鉛（Zn
O2）膜を所定のパターンに形成する。Next, zinc oxide (Zn
An O 2 ) film is formed in a predetermined pattern.
更にこの基板11上にホトレジスト膜を所定のパターン
に形成し、薄膜磁気ヘッド18の下部絶縁層14を形成す
る。Further, a photoresist film is formed on the substrate 11 in a predetermined pattern to form the lower insulating layer 14 of the thin film magnetic head 18.
更に銅（Cu）よりなる薄膜コイル15を所定のパターン
に形成後、この基板11上にホトレジスト膜を所定のパタ
ーンに形成し薄膜磁気ヘッド18の上部絶縁層16を形成す
る。Further, after forming a thin film coil 15 made of copper (Cu) in a predetermined pattern, a photoresist film is formed in a predetermined pattern on the substrate 11 to form an upper insulating layer 16 of the thin film magnetic head 18.
この時、同時に圧電素子22の上部電極21と下部電極19
間の絶縁層25も上記ホトレジスト膜にて形成する。At this time, at the same time, the upper electrode 21 and the lower electrode 19 of the piezoelectric element 22 are
The insulating layer 25 between them is also formed of the above photoresist film.
更に、この基板上にNi-Fe膜を所定のパターンに形成
し、薄膜磁気ヘッド18の上部磁極層17および圧電素子22
の上部電極21を形成する。Further, a Ni-Fe film is formed in a predetermined pattern on this substrate, and the upper magnetic pole layer 17 and the piezoelectric element 22 of the thin film magnetic head 18 are formed.
The upper electrode 21 of is formed.
次いでCuよりなる薄膜磁気ヘッド18の端子引出し層23
を形成後、該基板11上にアルミナよりなる保護膜を被着
して、基板11上を平坦にした後、第４図に示すようなス
ライダ31の形状に切り出して圧電素子付きの薄膜磁気ヘ
ッドを形成する。Next, the terminal lead-out layer 23 of the thin-film magnetic head 18 made of Cu
After forming the film, a protective film made of alumina is deposited on the substrate 11 to flatten the substrate 11, and then cut out into a slider 31 shape as shown in FIG. 4 to form a thin film magnetic head with a piezoelectric element. To form.
以上のべた薄膜形成工程の全工程は、環境温度を約10
0℃以下で処理可能であり、高環境温度による圧電性部
材20の検出感度劣化は防止できる。The ambient temperature is approximately 10 for all of the above solid film formation processes.
Processing can be performed at 0 ° C. or less, and deterioration of detection sensitivity of the piezoelectric member 20 due to high environmental temperature can be prevented.
第４図に示すような本発明の圧電素子付き薄膜磁気ヘ
ッドを支持したスライダ31の構造によれば、薄膜磁気ヘ
ッド18と圧電素子22が同一基板11に近接して一括して形
成されているので、小型、軽量なものが得られる。According to the structure of the slider 31 supporting the thin film magnetic head with a piezoelectric element of the present invention as shown in FIG. 4, the thin film magnetic head 18 and the piezoelectric element 22 are formed in close proximity to the same substrate 11 at once. Therefore, a small and lightweight product can be obtained.
また薄膜磁気ヘッド18の下部磁極層12と圧電素子22の
下部電極19、並びに薄膜磁気ヘッド18の上部磁極層17と
圧電素子22の上部電極21とが同一工程で形成されるの
で、従来の薄膜磁気ヘッドの形成工程より工程数が余り
増加しない状態で圧電素子付きの薄膜磁気ヘッドが得ら
れる。Further, since the lower magnetic pole layer 12 of the thin film magnetic head 18 and the lower electrode 19 of the piezoelectric element 22, and the upper magnetic pole layer 17 of the thin film magnetic head 18 and the upper electrode 21 of the piezoelectric element 22 are formed in the same step, the conventional thin film A thin-film magnetic head with a piezoelectric element can be obtained in a state in which the number of steps does not increase much compared to the magnetic head forming step.
以上述べたように本発明の圧電素子付きの薄膜磁気ヘ
ッドによれば、磁気ディスクと磁気ヘッドの異常接触を
検知できる小型で軽量の薄膜磁気ヘッドが得られる効果
がある。As described above, according to the thin film magnetic head with the piezoelectric element of the present invention, it is possible to obtain a small and lightweight thin film magnetic head capable of detecting abnormal contact between the magnetic disk and the magnetic head.
第１図は本発明の薄膜磁気ヘッドの斜視図、 第２図は第１図のII-II′線に沿って切断した断面図、 第３図は第１図のIII-III′線に沿って切断した断面
図、 第４図は本発明の薄膜磁気ヘッドを支持したスライダの
斜視図、 第５図、および第６図は従来の薄膜磁気ヘッドを含むヘ
ッド支持機構の要部平面図と要部側面図である。 第１図乃至第４図に於いて、 11は基板、12は下部磁極層、13はギャップ層、14は下部
絶縁層、15は薄膜コイル、16は上部絶縁層、17は上部磁
極層、18は薄膜磁気ヘッド、19は下部電極、20は圧電性
部材、21は上部電極、22は圧電素子、23は端子引出し
層、24はSiO2よりなる絶縁層、25はホトレジスト膜より
なる絶縁層、31はスライダを示す。1 is a perspective view of a thin film magnetic head of the present invention, FIG. 2 is a sectional view taken along the line II-II 'of FIG. 1, and FIG. 3 is a view taken along the line III-III' of FIG. FIG. 4 is a perspective view of a slider supporting the thin film magnetic head of the present invention, and FIGS. 5 and 6 are plan views and main views of a main part of a head supporting mechanism including a conventional thin film magnetic head. FIG. 1 to 4, 11 is a substrate, 12 is a lower magnetic pole layer, 13 is a gap layer, 14 is a lower insulating layer, 15 is a thin film coil, 16 is an upper insulating layer, 17 is an upper magnetic pole layer, 18 Is a thin film magnetic head, 19 is a lower electrode, 20 is a piezoelectric member, 21 is an upper electrode, 22 is a piezoelectric element, 23 is a terminal lead layer, 24 is an insulating layer made of SiO 2 , 25 is an insulating layer made of a photoresist film, 31 indicates a slider.
Claims (1)
膜コイル、上部絶縁層、上部磁極層よりなる薄膜磁気ヘ
ッドと、下部電極、圧電性部材、上部電極よりなる圧電
素子とを同一基板上に形成する方法であって、前記下部
磁極層と前記圧電素子の下部電極、及び前記上部磁極層
と前記圧電素子の上部電極とを夫々同一工程で形成する
ようにしたことを特徴とする薄膜磁気ヘッドの製造方
法。1. A thin film magnetic head comprising a lower magnetic pole layer, a gap layer, a lower insulating layer, a thin film coil, an upper insulating layer and an upper magnetic pole layer, and a piezoelectric element comprising a lower electrode, a piezoelectric member and an upper electrode on the same substrate. A method of forming a thin film, characterized in that the lower magnetic pole layer and the lower electrode of the piezoelectric element, and the upper magnetic pole layer and the upper electrode of the piezoelectric element are formed in the same process, respectively. Magnetic head manufacturing method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60067138A JP2529183B2 (en) | 1985-03-29 | 1985-03-29 | Method of manufacturing thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60067138A JP2529183B2 (en) | 1985-03-29 | 1985-03-29 | Method of manufacturing thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61227210A JPS61227210A (en) | 1986-10-09 |
| JP2529183B2 true JP2529183B2 (en) | 1996-08-28 |
Family
ID=13336238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60067138A Expired - Lifetime JP2529183B2 (en) | 1985-03-29 | 1985-03-29 | Method of manufacturing thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2529183B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000348321A (en) * | 1999-06-03 | 2000-12-15 | Nec Corp | Magnetic disk device, magnetic head, manufacture of magnetic head, and manufacture of magnetic disk device |
| US20080023468A1 (en) * | 2006-07-27 | 2008-01-31 | Fujitsu Limited | Magnetic head |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58153270A (en) * | 1982-03-05 | 1983-09-12 | Hitachi Ltd | Floating head |
-
1985
- 1985-03-29 JP JP60067138A patent/JP2529183B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61227210A (en) | 1986-10-09 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0013363B1 (en) | Method of making read/write transducer heads and heads so made | |
| US5065271A (en) | Thin film magnetic head apparatus and method of manufacturing the same | |
| US4195323A (en) | Thin film magnetic recording heads | |
| EP0012913B1 (en) | A method of making a thin film magnetic head and a head so made | |
| US4321641A (en) | Thin film magnetic recording heads | |
| US4489484A (en) | Method of making thin film magnetic recording heads | |
| JP2529183B2 (en) | Method of manufacturing thin film magnetic head | |
| US6008969A (en) | Planar recording head having formed yokes | |
| US6503406B1 (en) | Method for forming the air bearing surface of a slider using nonreactive plasma | |
| US6416935B1 (en) | Method for forming the air bearing surface of a slider | |
| JP2707758B2 (en) | Method for manufacturing thin-film magnetic head | |
| US5279026A (en) | Process for producing a thin-film magnetic tape head | |
| US5057959A (en) | Thin-film magnetic head having substrate formed of crystallized glass | |
| JPS6124007A (en) | Thin film magnetic head | |
| JP2779036B2 (en) | Thin film magnetic head | |
| JP2707760B2 (en) | Method for manufacturing thin-film magnetic head | |
| JPH04268204A (en) | Production of magnetic head | |
| JPH10334412A (en) | Thin film magnetic head and magnetic disk device | |
| CA1146269A (en) | Integrated magnetic head slider assembly | |
| JPS5857614A (en) | Production of thin film magnetic head | |
| JPS6231015A (en) | Thin-film magnetic head | |
| JPH02292707A (en) | Thin-film magnetic head | |
| JPS5885970A (en) | Magnetic head assembly | |
| JPH02166610A (en) | Thin-film magnetic head and production thereof | |
| JPH04339306A (en) | Thin film magnetic head and manufacture of it |