JP2520834B2 - Inorganic film forming method and film forming article - Google Patents
Inorganic film forming method and film forming articleInfo
- Publication number
- JP2520834B2 JP2520834B2 JP4358030A JP35803092A JP2520834B2 JP 2520834 B2 JP2520834 B2 JP 2520834B2 JP 4358030 A JP4358030 A JP 4358030A JP 35803092 A JP35803092 A JP 35803092A JP 2520834 B2 JP2520834 B2 JP 2520834B2
- Authority
- JP
- Japan
- Prior art keywords
- heat
- inorganic
- inorganic film
- forming
- titanate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Paints Or Removers (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、無機系被膜形成方法と
その無機系被膜を形成した物品に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming an inorganic coating and an article formed with the inorganic coating.
【０００２】[0002]
【従来の技術】従来、シラン化合物の加水分解・重縮合
反応物を主成分とする無機系コーテイング組成物、さら
に詳しくは、有機溶剤系シリカゾルの加水分解・重縮合
物とアルキルチタネートとを主成分とする無機系被膜形
成用組成物と、これを耐熱性基材に塗布して乾燥した
後、室温ないし数１００℃で熱処理して無機系被膜を形
成することは公知であった。2. Description of the Related Art Conventionally, an inorganic coating composition containing a hydrolysis / polycondensation reaction product of a silane compound as a main component, more specifically, a hydrolysis / polycondensation product of an organic solvent silica sol and an alkyl titanate as main components It has been known that the above-mentioned composition for forming an inorganic coating film, and that the composition is applied to a heat resistant substrate, dried, and then heat-treated at room temperature to several 100 ° C. to form an inorganic coating film.
【０００３】[0003]
【発明が解決しようとする課題】しかし、上記したシラ
ン化合物の加水分解・重縮合反応物を主成分とする無機
系コーテイング組成物を用いて得られる被膜は、電気絶
縁性の高いものであり、非絶縁性すなわち導電性または
半導電性（半導体）のものを得ることができなかった。
本発明の目的は、耐熱性基材に、電気的に半導体レベル
の電導性を有する非絶縁性であって、かつ、耐食性、耐
薬品性、耐熱性、耐磨耗性を有する透明な無機系被膜を
形成できるようにすることにある。However, a coating film obtained by using the above-mentioned inorganic coating composition containing the hydrolysis / polycondensation reaction product of a silane compound as a main component has a high electric insulation property. It was not possible to obtain non-insulating, ie conductive or semi-conductive (semiconductor) materials.
An object of the present invention is to provide a heat-resistant substrate with a transparent inorganic system which is electrically non-insulating having electrical conductivity at a semiconductor level, and which has corrosion resistance, chemical resistance, heat resistance, and abrasion resistance. It is to be able to form a film.
【０００４】本発明は、特定のシラン化合物の加水分解
・重縮合反応物と特定アルキルチタネートを主成分とす
る無機系コーテイング組成物を耐熱性基材に塗布して乾
燥した後、特定の熱処理条件で処理し得られた無機系被
膜が、従来の技術で得られたものに比べて、より高い導
電性無機系被膜であるとの知見を得たことに基づいてな
された。According to the present invention, a hydrolysis / polycondensation reaction product of a specific silane compound and an inorganic coating composition containing a specific alkyl titanate as a main component are applied to a heat resistant substrate and dried, followed by specific heat treatment conditions. It was made based on the finding that the inorganic coating film obtained by the treatment of 1. is a higher conductive inorganic coating film than that obtained by the conventional technique.
【０００５】本発明による無機系被膜は、ステンレス、
鉄、真鍮などの金属や、レンガ、スレート、アルミナ基
板などのセラミックスあるいはガラス、石英などのよう
な耐熱性基材に塗布、乾燥、熱処理によって形成され、
最終熱処理温度が３００℃以上では、透明で緻密な被膜
を与えられ、表面保護や帯電防止機能が付与されるので
工業的に極めて有用である。The inorganic coating according to the present invention is made of stainless steel,
Formed by coating, drying and heat treatment on metals such as iron and brass, ceramics such as bricks, slate and alumina substrates, or heat resistant substrates such as glass and quartz.
When the final heat treatment temperature is 300 ° C. or higher, a transparent and dense coating film is provided, and surface protection and antistatic functions are provided, which is industrially extremely useful.
【０００６】[0006]
【課題を解決するための手段】本発明の無機系被膜形成
用組成物は、有機溶剤系シリカゾルの加水分解・重縮合
物とアルキルチタネートとを主成分とする無機系被膜形
成用組成物であって、ＳｉＯ２／Ｔｉの比が重量換算で
１００／０．１〜１００／３であることを特徴とする。The composition for forming an inorganic film of the present invention is a composition for forming an inorganic film containing a hydrolysis / polycondensation product of an organic solvent-based silica sol and an alkyl titanate as main components. Then, the ratio of SiO 2 / Ti is 100 / 0.1 to 100/3 in terms of weight.
【０００７】ここで、シラン化合物としては、数多くの
ものが市販されているが、本願発明に用いられるシラン
化合物は、次式（１）で示されるように、シリコンの４
つの結合がアルコキシであることが好ましい。 Ｓｉ（ＯＲ）４ （１） ここで、ＲはＣｎＨ２ｎ＋１で示されるアルキル基で、 ｎ＝１〜４、好ましくはｎ＝１〜２である。式（１）に
おいて、ＯＲの一部を−ＣＨ３などのアルキル基、ある
いはγ−グリシドキシプロピルやγ−アミノプロピルな
どで置換された構造をもつ各種シラン化合物も多くの市
販品があるが、本発明に使用することができない。Although many silane compounds are commercially available, the silane compound used in the present invention is a silicon silane compound represented by the following formula (1).
It is preferred that one bond is alkoxy. Si (OR) 4 (1) Here, R is an alkyl group represented by C n H 2n + 1 , and n = 1 to 4, preferably n = 1 to 2. In the formula (1), various silane compounds having a structure in which a part of OR is substituted with an alkyl group such as —CH 3 or γ-glycidoxypropyl or γ-aminopropyl are available on the market. , Cannot be used in the present invention.
【０００８】このように、本発明に使用することができ
るシラン化合物が特定のものに限定される理由は、本発
明の無機系被膜形成用組成物を耐熱性基材に塗布して乾
燥した後、特定の熱処理条件で熱処理することによって
形成される無機系被膜の透明性を確保するための条件に
なるからである。As described above, the reason why the silane compound which can be used in the present invention is limited to a particular one is that the composition for forming an inorganic film of the present invention is applied to a heat resistant substrate and dried. The reason is that the heat treatment is performed under a specific heat treatment condition to ensure the transparency of the inorganic coating film formed.
【０００９】式（１）で示されるシラン化合物でＲが、
例えばＣ８Ｈ１７のものや、ＣＨ３Ｓｉ（ＯＣＨ３）３
で示されるシラン化合物を用いた場合、熱処理後の被膜
が茶色ないし褐色かかった色に着色してしまう問題があ
り好ましくない。また、特定シラン化合物の加水分解・
重縮合物に組み合わせて本発明に用いられる特定アルキ
ルチタネートとしては、アルコール可溶性であるアルコ
キシチタンが好ましい。特にテトラブチルチタネートの
単量体あるいは２量体、３量体などのオリゴマーまたは
ポリマーが好ましい。In the silane compound represented by the formula (1), R is
For example, C 8 H 17 or CH 3 Si (OCH 3 ) 3
The use of the silane compound represented by is not preferable because there is a problem that the coating film after heat treatment is colored brown or brownish. In addition, hydrolysis of specific silane compounds
As the specific alkyl titanate used in the present invention in combination with the polycondensate, alcohol-soluble alkoxy titanium is preferable. Particularly preferred are tetrabutyl titanate monomers or oligomers or polymers such as dimers and trimers.
【００１０】特定シラン化合物の加水分解・重縮合物と
特定アルキルチタネートの比率は、ＳｉＯ２／Ｔｉ（重
量比）で示して、１００／０．１〜１００／５、好まし
くは１００／０．２〜１００／３がよい。この比率より
Ｔｉが少ないと得られた無機系被膜は電気絶縁性が高く
なり好ましくない。またこの比率よりＴｉが多くなると
無機系コーテイング組成物自身の安定性が悪く、ゲル状
物となり塗布して均一な膜を形成することができない。The ratio of the hydrolysis / polycondensation product of the specific silane compound to the specific alkyl titanate is 100 / 0.1 to 100/5, preferably 100 / 0.2, expressed as SiO 2 / Ti (weight ratio). ~ 100/3 is preferable. When the content of Ti is less than this ratio, the obtained inorganic coating film has high electric insulation and is not preferable. On the other hand, if the content of Ti is larger than this ratio, the stability of the inorganic coating composition itself is poor, and a gel-like material cannot be applied to form a uniform film.
【００１１】本発明の無機系被膜形成用組成物の熱処理
条件も本発明の効果を引き出すために重要な要素であ
る。本発明の無機系被膜形成用組成物を浸漬、ロールコ
ート、スプレー、スピンコート、刷毛塗り、印刷など任
意の方法で耐熱性基材に塗布し、室温ないし１５０℃以
下の温度で加熱乾燥した後、少なくとも最高温度が３０
０℃以上で焼成することが必要である。この温度が低い
場合には、被膜は電気絶縁性のままである。The heat treatment conditions of the composition for forming an inorganic coating film of the present invention are also important factors for bringing out the effects of the present invention. After applying the composition for forming an inorganic film of the present invention to a heat resistant substrate by any method such as dipping, roll coating, spraying, spin coating, brush coating, printing, and after heating and drying at room temperature to 150 ° C. or lower , At least the maximum temperature is 30
It is necessary to bake at 0 ° C or higher. When this temperature is low, the coating remains electrically insulating.
【００１２】本発明によって電気的に非絶縁性の無機系
被膜が形成される原理は、明らかではないが、本発明の
ＳｉとＴｉを含む無機系コーテイング組成物が３００℃
以上の熱処理によって、ＳｉとＴｉを含む炭化物が形成
されるためではないかと推定している。The principle of forming an electrically non-insulating inorganic coating film according to the present invention is not clear, but the inorganic coating composition containing Si and Ti according to the present invention is 300 ° C.
It is presumed that the above heat treatment may be due to the formation of carbides containing Si and Ti.
【００１３】本発明に用いられる基材としては、上記の
製膜条件に耐えられる耐熱性の基材である必要があり、
たとえば、ステンレス、鉄、真鍮などの金属や、レン
ガ、スレート、アルミナ基板、素焼などのセラミックス
あるいはガラス、石英などがあげられる。The base material used in the present invention must be a heat resistant base material that can withstand the above film forming conditions.
Examples thereof include metals such as stainless steel, iron, and brass, bricks, slate, alumina substrates, ceramics such as unglazed ceramics, glass, and quartz.
【００１４】[0014]
【作用】本発明によって、耐熱性基材に、電気的に非絶
縁性であって、かつ、耐食性、耐薬品性、耐熱性、耐磨
耗性の無機系無色透明被膜を形成でき、その被膜は帯電
防止性能をもった各種保護膜などとして極めて有用であ
る。According to the present invention, an inorganic colorless transparent coating which is electrically non-insulating, and has corrosion resistance, chemical resistance, heat resistance and abrasion resistance can be formed on a heat resistant substrate. Is extremely useful as various protective films having antistatic properties.
【００１５】[0015]
【実施例】以下、本発明を実施例で説明するが、本発明
が以下の実施例に限定されるものではない。 実施例１ まず、ブチルチタネート（松本製薬工業製、オルガチッ
クスＴ−２５、Ｔｉとして１７ｗｔ％を含むイソプロピ
ルアルコール溶液）４ｇをイソプロピルアルコール１９
６ｇに希釈した。これをエチルシリケートの加水分解・
重縮合物として市販されているＨＡＳ−１０（コルコー
ト（株）製、ＳｉＯ２として１０ｗｔ％を含む）８００
ｇ中に除々に添加し、室温に２４時間放置し無機系コー
テイング組成物を得た。EXAMPLES The present invention will be described below with reference to examples, but the present invention is not limited to the following examples. Example 1 First, 4 g of butyl titanate (manufactured by Matsumoto Pharmaceutical Co., Organix T-25, an isopropyl alcohol solution containing 17 wt% as Ti) was added to 19 g of isopropyl alcohol.
Diluted to 6 g. This is the hydrolysis of ethyl silicate
HAS-10 commercially available as a polycondensate (manufactured by Colcoat Co., Ltd., containing 10 wt% as SiO 2 ) 800
Gradually added to g, the mixture was allowed to stand at room temperature for 24 hours to obtain an inorganic coating composition.
【００１６】これを石英ガラスに浸漬塗布（引上げ速度
５ｃｍ／分）した後、８０℃で３０分乾燥した。これを
４２０℃に設定したマッフル炉に入れ、１時間熱処理を
行って膜厚約０．５ミクロンの無機系被膜を形成した。
得られた塗膜は、干渉色は認められるものの無色透明被
膜で、表面をスチールウールで擦っても何らのキズが付
かず、また、沸騰水中に２４０時間放置しても被膜に剥
離、白濁など何らの変化も認められなかった。これの電
気絶縁性を超絶縁計で測定したところ２×１０８Ωであ
った。This was applied to quartz glass by dipping (pulling speed: 5 cm / min) and then dried at 80 ° C. for 30 minutes. This was placed in a muffle furnace set at 420 ° C. and heat-treated for 1 hour to form an inorganic coating film having a thickness of about 0.5 μm.
The obtained coating film is a colorless and transparent coating film although interference color is recognized, and it is not scratched even if the surface is rubbed with steel wool, and it is peeled off or clouded even if left in boiling water for 240 hours. No change was observed. The electrical insulation of this product was measured by a super-insulation meter and found to be 2 × 10 8 Ω.
【００１７】比較例１ 実施例１において、ＨＡＳ−１０のみをコーテイング剤
として用い、実施例１と同様な手順で得た無機系被膜
は、無色透明であるが電気絶縁性は１０１１Ωであっ
た。Comparative Example 1 The inorganic coating obtained by the same procedure as in Example 1 except that HAS-10 was used as the coating agent in Example 1 was colorless and transparent, but had an electrical insulation property of 10 11 Ω. It was
【００１８】ブチルチタネート（松本製薬工業製、オル
ガチックスＴ−２５、Ｔｉとして１７ｗｔ％を含むイソ
プロピルアルコール溶液）５ｇをイソプロピルアルコー
ル１９５ｇに希釈した。これをエチルシリケートの加水
分解・重縮合物として市販されているＨＡＳ−１０（コ
ルコート（株）製、ＳｉＯ２として１０ｗｔ％含む）３
００ｇ中に除々に添加し、室温にて１５０時間養生して
無機系コーテイング組成物を得た。5 g of butyl titanate (manufactured by Matsumoto Pharmaceutical Co., Ltd., Organix T-25, isopropyl alcohol solution containing 17 wt% as Ti) was diluted with 195 g of isopropyl alcohol. This is commercially available as a hydrolysis / polycondensation product of ethyl silicate, HAS-10 (manufactured by Colcoat Co., Ltd., containing 10 wt% as SiO 2 ) 3
It was gradually added to 00 g and cured at room temperature for 150 hours to obtain an inorganic coating composition.
【００１９】これをアルミナ系セラミックス製ピンセッ
トに浸漬塗布した後、室温で１５分、８０℃で３０分乾
燥した。、これを４５０℃に設定したマッフル炉に入
れ、１時間熱処理を行って膜厚約１ミクロンの無機系被
膜を形成した。得られた塗膜は、無色透明被膜で、１０
９Ωの電気絶縁性であり、帯電防止効果のあるピンセッ
トとして、半導体などのチップの取扱いに好適であっ
た。After this was dipped and coated on alumina-based ceramic tweezers, it was dried at room temperature for 15 minutes and at 80 ° C. for 30 minutes. This was placed in a muffle furnace set at 450 ° C. and heat-treated for 1 hour to form an inorganic coating film having a thickness of about 1 micron. The resulting coating film was a colorless transparent film and had a thickness of 10
The tweezers having an electric insulation property of 9 Ω and having an antistatic effect were suitable for handling chips such as semiconductors.
【００２０】[0020]
【発明の効果】本発明によって、耐熱性基材に、電気的
に非絶縁性であって、かつ、耐食性、耐薬品性、耐熱
性、耐磨耗性の無機系透明被膜を形成できる。それは、
ステンレス、鉄、真鍮などの金属や、レンガ、スレー
ト、アルミナ基板、素焼などのセラミックスあるいはガ
ラス、石英などのような耐熱性基材に塗布乾燥後、３０
０℃以上の最終熱処理によって容易に形成され、それ
は、帯電防止効果のある耐火物の保護膜として極めて有
用である。Industrial Applicability According to the present invention, an inorganic transparent coating film which is electrically non-insulating, corrosion resistant, chemical resistant, heat resistant and abrasion resistant can be formed on a heat resistant substrate. that is,
After coating and drying on metals such as stainless steel, iron, and brass, bricks, slate, alumina substrates, ceramics such as unglazed, or heat-resistant substrates such as glass and quartz, 30
It is easily formed by a final heat treatment at 0 ° C or higher, and it is extremely useful as a protective film for a refractory material having an antistatic effect.
Claims (4)
し、ｎは１ないし４である）を有するシラン化合物を加
水分解・重縮合して得られる有機溶剤系シリカゾルとア
ルキルチタネートとを主成分とし、ＳｉＯ２／Ｔｉの比
が重量換算で１００／０．１〜１００／３である無機系
被膜形成用組成物を、耐熱性基材に塗布して乾燥した
後、３００℃以上で熱処理することを特徴とする無機系
被膜形成方法。1. A silane compound having the general formula Si (OR) 4 (1) (wherein R represents an alkyl group represented by C n H 2n + 1 and n is 1 to 4) is hydrolyzed and deuterated. A heat-resistant inorganic film-forming composition comprising an organic solvent-based silica sol obtained by condensation and an alkyl titanate as main components and having a SiO 2 / Ti ratio of 100 / 0.1 to 100/3 in terms of weight. A method for forming an inorganic coating, which comprises heat-treating at 300 ° C. or higher after being applied to a substrate, dried.
し、ｎは１ないし４である）を有するシラン化合物を加
水分解・重縮合して得られる有機溶剤系シリカゾルとア
ルキルチタネートとを主成分とし、そのアルキルチタネ
ートがアルコール可溶性のテトラブチルチタネートの単
量体あるいは２量体、３量体などのオリゴマーまたはポ
リマーであり、ＳｉＯ２／Ｔｉの比が重量換算で１００
／０．１〜１００／３である無機系被膜形成用組成物
を、耐熱性基材に塗布して乾燥した後、３００℃以上で
熱処理することを特徴とする無機系被膜形成方法。2. A silane compound having the general formula Si (OR) 4 (1) (wherein R represents an alkyl group represented by C n H 2n + 1 and n is 1 to 4) is hydrolyzed and deuterated. An organic solvent-based silica sol obtained by condensation and an alkyl titanate as main components, the alkyl titanate being an alcohol-soluble tetrabutyl titanate monomer or dimer, trimer or other oligomer or polymer, SiO 2 / Ti ratio is 100 in terms of weight
/0.1 to 100/3 of the composition for forming an inorganic film, which is applied to a heat resistant substrate, dried, and then heat-treated at 300 ° C or higher.
し、ｎは１ないし４である）を有するシラン化合物を加
水分解・重縮合して得られる有機溶剤系シリカゾルとア
ルキルチタネートとを主成分とし、ＳｉＯ２／Ｔｉの比
が重量換算で１００／０．１〜１００／３である無機系
被膜形成用組成物を、耐熱性基材に塗布して乾燥した
後、３００℃以上で熱処理することによって形成された
無機系被膜を有することを特徴とする無機系被膜形成物
品。3. A silane compound having the general formula Si (OR) 4 (1) (wherein R represents an alkyl group represented by C n H 2n + 1 and n is 1 to 4) is hydrolyzed and deuterated. A heat-resistant inorganic film-forming composition comprising an organic solvent-based silica sol obtained by condensation and an alkyl titanate as main components and having a SiO 2 / Ti ratio of 100 / 0.1 to 100/3 in terms of weight. An inorganic film-forming article having an inorganic film formed by applying a heat treatment at 300 ° C. or higher after being applied to a substrate, dried.
し、ｎは１ないし４である）を有するシラン化合物を加
水分解・重縮合して得られる有機溶剤系シリカゾルとア
ルキルチタネートとを主成分とし、そのアルキルチタネ
ートがアルコール可溶性のテトラブチルチタネートの単
量体あるいは２量体、３量体などのオリゴマーまたはポ
リマーであり、ＳｉＯ２／Ｔｉの比が重量換算で１００
／０．１〜１００／３である無機系被膜形成用組成物
を、耐熱性基材に塗布して乾燥した後、３００℃以上で
熱処理することによって形成された無機系被膜を有する
ことを特徴とする無機系被膜形成物品。4. A silane compound having the general formula Si (OR) 4 (1) (wherein R represents an alkyl group represented by C n H 2n + 1 and n is 1 to 4) is hydrolyzed and deuterated. An organic solvent-based silica sol obtained by condensation and an alkyl titanate as main components, the alkyl titanate being an alcohol-soluble tetrabutyl titanate monomer or dimer, trimer or other oligomer or polymer, SiO 2 / Ti ratio is 100 in terms of weight
/0.1 to 100/3 of the inorganic coating forming composition is applied to a heat resistant substrate, dried, and then heat treated at 300 ° C. or higher to have an inorganic coating formed. And an inorganic film-forming article.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4358030A JP2520834B2 (en) | 1992-12-25 | 1992-12-25 | Inorganic film forming method and film forming article |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4358030A JP2520834B2 (en) | 1992-12-25 | 1992-12-25 | Inorganic film forming method and film forming article |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06192620A JPH06192620A (en) | 1994-07-12 |
| JP2520834B2 true JP2520834B2 (en) | 1996-07-31 |
Family
ID=18457181
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4358030A Expired - Fee Related JP2520834B2 (en) | 1992-12-25 | 1992-12-25 | Inorganic film forming method and film forming article |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2520834B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4953564B2 (en) * | 2003-11-27 | 2012-06-13 | Ｎｏｋ株式会社 | Metal surface treatment agent |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5477635A (en) * | 1977-12-01 | 1979-06-21 | Kansai Paint Co Ltd | Surface treating composition for metal |
| US4725501A (en) * | 1985-05-28 | 1988-02-16 | Ppg Industries, Inc. | Primer for adherence to plastic substrates |
-
1992
- 1992-12-25 JP JP4358030A patent/JP2520834B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06192620A (en) | 1994-07-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3317998B2 (en) | Substrate coating method with silica precursor | |
| US4694040A (en) | Liquid composition for forming a coating film of organopolysiloxane and method for the preparation thereof | |
| JP4681094B2 (en) | Compositions having fluoroorganofunctional silanes and / or siloxanes, their preparation, their use and surface-modified supports | |
| EP0327311B1 (en) | A coating fluid for forming an oxide coating | |
| KR100333989B1 (en) | Method of forming Si-O containing coatings | |
| KR100251819B1 (en) | Curing silicon hydride containing materials by exposure to nitrous oxide | |
| US4981530A (en) | Planarizing ladder-type silsesquioxane polymer insulation layer | |
| JPH03183675A (en) | Coating of air tight substrate in inert gas atmosphere | |
| JPH04228415A (en) | Conversion of silica precuarsor at low temperature using amine catalyst | |
| CA2034908A1 (en) | Coatings for microelectronic devices and substrates | |
| JPS589791B2 (en) | Method for reducing porosity and surface roughness of ceramic substrates | |
| JPH0791509B2 (en) | Insulating film forming coating solution for semiconductors | |
| US5445894A (en) | Ceramic coatings | |
| JPH0225990B2 (en) | ||
| JP2520834B2 (en) | Inorganic film forming method and film forming article | |
| US5271768A (en) | Coating for forming an oxide coating | |
| KR100285872B1 (en) | Borosilicate electronic paint | |
| CN110256960B (en) | Organic silicon high-temperature-resistant coating and preparation method thereof | |
| JPH08283661A (en) | Composition for coating layer | |
| EP0635554B1 (en) | Hydrogen silsesquioxane optical fiber coatings | |
| JPH0320377A (en) | Coating liquid for forming oxide coating film and method for forming oxide coating film | |
| JP2752968B2 (en) | Method of forming silica-based coating | |
| JPS6155164A (en) | Production of silica film-forming coating solution | |
| JPH09183665A (en) | Coating composition for optical device | |
| JPH04108881A (en) | Production of coating solution for forming silica-based coating film and silica-based coating film |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |