JP2520202B2 - Measured value evaluation method - Google Patents
Measured value evaluation methodInfo
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- JP2520202B2 JP2520202B2 JP3189245A JP18924591A JP2520202B2 JP 2520202 B2 JP2520202 B2 JP 2520202B2 JP 3189245 A JP3189245 A JP 3189245A JP 18924591 A JP18924591 A JP 18924591A JP 2520202 B2 JP2520202 B2 JP 2520202B2
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- measurement
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Description
【０００１】[0001]
【産業上の利用分野】本発明は、例えば三次元測定機等
で測定された被測定自由曲面の三次元測定データが設計
値通りの値になっているかどうかを評価するための測定
値評価方式に関し、特に測定値照合処理の前処理に関す
る。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a measurement value evaluation method for evaluating whether or not the three-dimensional measurement data of a free-form surface to be measured, which is measured by, for example, a three-dimensional measuring machine, is a value as designed. In particular, the present invention relates to preprocessing of measurement value matching processing.
【０００２】[0002]
【従来の技術】近年、ＣＡＤ／ＣＡＭ（Computer Aided
Design ／Computer Aided Manufacturing）システムに
よる設計・加工効率の向上及びＮＣ工作機械の高性能化
等に伴い、複雑な形状の製品を高精度に加工することが
可能になってきた。このため、製品評価の測定工程にお
いても、自由曲面を含む複雑な三次元形状の測定を高精
度に行えることが要求され、そのための高精度な三次元
測定機が開発されるようになってきた。2. Description of the Related Art In recent years, CAD / CAM (Computer Aided)
With the improvement of design / processing efficiency by Design / Computer Aided Manufacturing) system and the high performance of NC machine tools, it has become possible to machine products with complicated shapes with high precision. Therefore, even in the measurement process of product evaluation, it is required to accurately measure a complicated three-dimensional shape including a free-form surface, and a high-precision three-dimensional measuring machine for that purpose has been developed. .
【０００３】[0003]
【発明が解決しようとする課題】しかしながら、長さ、
厚さ、半径等の一次元座標系における測定値を設計値と
照合させて製品評価を行うことは比較的簡単であるが、
三次元座標系の座標値として求められる測定値が設計公
差範囲内に含まれているかどうかの評価はきわめて難し
い。これは、測定時や加工時に発生するワークの取り付
け誤差等に起因して、測定値の座標系自体が評価すべき
座標系からずれてしまうからである。このため、従来
は、三次元座標値として求められる測定値と設計値とを
正しく照合することができず、正しい評価が行えないと
いう問題点があった。However, the length,
It is relatively easy to evaluate the product by comparing the measured values in the one-dimensional coordinate system such as thickness and radius with the design values.
It is extremely difficult to evaluate whether or not the measured value obtained as the coordinate value of the three-dimensional coordinate system falls within the design tolerance range. This is because the coordinate system itself of the measured value deviates from the coordinate system to be evaluated due to a work mounting error or the like that occurs during measurement or machining. For this reason, conventionally, there has been a problem that the measured value obtained as the three-dimensional coordinate value cannot be correctly collated with the design value, and correct evaluation cannot be performed.
【０００４】本発明は、このような点に鑑みなされたも
ので、測定時や加工時にワークの取り付け誤差が発生し
ても、これによる設計値照合への影響を取り除くことが
可能であり、常に正しい測定値の評価を行うことが可能
な測定値評価方法を提供することを目的とする。The present invention has been made in view of such a point. Even if a work mounting error occurs during measurement or machining, it is possible to eliminate the influence on design value verification due to the error. It is an object of the present invention to provide a measurement value evaluation method capable of evaluating a correct measurement value.
【０００５】本発明は、既知形状についての測定座標値
と設計座標値との間の誤差を評価する測定値評価方法に
おいて、既知形状について任意の測定ピッチ及び測定点
数で測定して得られた点群データに基づいて前記既知形
状に対応する自由曲面を生成し、生成された自由曲面と
複数の設計座標値との間の最短距離を評価関数として求
め、この評価関数が最小値に収束する測定座標系と設計
座標系との間の相対位置関係を求め、得られた両座標系
の間の相対位置関係に基づいて前記両座標系の一方に対
して他方を整合させる座標変換処理を行ったのち、前記
測定座標値と設計座標値との間の誤差を評価することを
特徴とする。[0005] The present onset Ming, <br/> Oite the measured value evaluation method for evaluating an error between the measured coordinate values and the design coordinate values for known shape, any measured pitch and measured points on known shapes
Based on the point cloud data obtained by measuring
Form a free-form surface, and generate the free-form surface
Calculated by the evaluation function the shortest distance between the plurality of design coordinate values
Because, the measurement coordinate system and the design of the evaluation function converges to a minimum value
The relative position relationship with the coordinate system is obtained, and after the coordinate conversion process for matching the other with one of the coordinate systems based on the obtained relative position relationship between the coordinate systems, the measurement is performed. It is characterized by evaluating an error between the coordinate value and the design coordinate value.
【０００６】[0006]
【作用】本発明によれば、測定座標値によって特定され
る自由曲面と設計座標値との間の最短距離を評価関数と
し、この評価関数が最小値に収束するような測定座標系
（第１座標系）と設計座標系（第２座標系）との間の相
対位置関係が求められる。そして、求められた両座標系
の相対位置関係に基づいて、一方の座標系に他方の座標
系が一致するように両座標値の座標変換が行われる。こ
の結果、本発明によれば、測定時や加工時のワークの取
り付け誤差等による影響が排除され、正しい測定値の評
価を行うことが可能になる。According to the present invention, the shortest distance between the free-form surface specified by the measurement coordinate value and the design coordinate value is used as the evaluation function, and the measurement coordinate system (first measurement function) such that the evaluation function converges to the minimum value (first A relative positional relationship between the coordinate system) and the design coordinate system (second coordinate system) is obtained. Then, based on the obtained relative positional relationship between both coordinate systems, coordinate conversion of both coordinate values is performed so that one coordinate system matches the other coordinate system. As a result, according to the present invention, it is possible to eliminate the influence of a work attachment error during measurement or machining, and to correctly evaluate the measured value.
【０００７】なお、測定座標値によって特定される自由
曲面を順次小さいパッチに絞り込んでいきながら、設計
座標値に最も近いパッチを選択していく、或いは更に選
択されたパッチの内部に複数の点を発生させ、設計座標
値に近い点の選択処理と、選択された点の周囲に更に複
数の点を発生させる処理とを繰り返す等の処理を行うよ
うにすると、処理すべきデータ量を大幅に削減すること
ができ、処理速度を高めることができる。The free-form surface specified by the measured coordinate values is successively narrowed down to smaller patches, and the patch closest to the design coordinate values is selected, or a plurality of points are added to the inside of the selected patch. If you repeat the process of generating and selecting points close to the design coordinate value and the process of generating multiple points around the selected point, the amount of data to be processed will be greatly reduced. It is possible to increase the processing speed.
【０００８】[0008]
【実施例】以下、添付の図面を参照して本発明の実施例
を説明する。図１は、本発明の一実施例に係る測定値評
価方式において、特に設計値との照合に先立つ評価座標
系（測定座標系；第１座標系）と設計座標系（第２座標
系）との間の座標系整合処理の部分を示すフローチャー
トである。ここでの座標系整合処理は、具体的には、図
２に示すように、与えられた各設計点Ｑと自由曲面Ｓと
の最短距離を計算し、例えばその二乗和が最小になる評
価座標系Ｇ１に対する設計座標系Ｇ２の位置関係を求
め、その位置関係に基づいて設計点Ｑを座標変換する処
理である。Embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 shows an evaluation coordinate system (measurement coordinate system; first coordinate system) and a design coordinate system (second coordinate system), particularly prior to collation with a design value, in a measurement value evaluation method according to an embodiment of the present invention. 5 is a flowchart showing a part of coordinate system matching processing between the two. Specifically, the coordinate system matching process here calculates the shortest distance between each given design point Q and the free-form surface S, as shown in FIG. This is a process of obtaining the positional relationship of the design coordinate system G2 with respect to the system G1 and performing coordinate conversion of the design point Q based on the positional relationship.
【０００９】先ず、本実施例の処理の説明に先立ち、三
次元測定機の測定データから自由曲面（プローブ中心曲
面）を生成する方法について簡単に説明する。First, prior to the description of the processing of this embodiment, a method of generating a free-form surface (probe center curved surface) from measurement data of a coordinate measuring machine will be briefly described.
【００１０】即ち、三次元測定機を使用した測定工程で
は、図３に示すように、各測定断面ＭＳ毎にプローブ中
心点群データ（以下、「測定点群データ」と呼ぶ）Ｄを
求める。このとき、測定ピッチ及び測定点数は任意で良
い。従って、三次元測定機から得られた測定点群データ
Ｄは、まちまちの間隔となっている。That is, in the measuring process using the coordinate measuring machine, as shown in FIG. 3, probe center point group data (hereinafter referred to as "measurement point group data") D is obtained for each measurement cross section MS. At this time, the measurement pitch and the number of measurement points may be arbitrary. Therefore, the measurement point group data D obtained from the coordinate measuring machine has various intervals.
【００１１】この測定点群データＤに対し、次に第１の
自由曲線Ｃ1 の当てはめ処理を行う。この第１の自由曲
線Ｃ1 の当てはめ処理は、各測定断面の測定点列毎に行
われる。この第１の自由曲線Ｃ1 は、図４に示すよう
に、測定点間を微小値εの範囲をはみださないような複
数の曲線からなり、隣り合う曲線は、その接続点におい
て接線が共通であるように決定する。A first free curve C 1 fitting process is then performed on this measurement point group data D. The fitting process of the first free curve C 1 is performed for each measurement point sequence of each measurement cross section. As shown in FIG. 4, the first free curve C 1 is composed of a plurality of curves that do not extend the range of the minute value ε between the measurement points, and adjacent curves are tangents at their connecting points. Decide to be common.
【００１２】次に、求められた各測定点列に対応する第
１の自由曲線Ｃ1 を、例えば弦長を基準として各々ｎ等
分（ｎは任意の整数）した後、得られた等分点を滑らか
に通るように第１の自由曲線を再び算出する。ここで、
第ｊ番目の測定点列におけるｉ番目（（ｉは０〜ｎ）の
分割点のベクトルデータをＰijとする。Next, the first free-form curve C 1 corresponding to each of the obtained measurement point sequences is divided into n equal parts (n is an arbitrary integer) based on, for example, the chord length, and the obtained equal parts are obtained. The first free-form curve is calculated again so as to smoothly pass through the points. here,
The vector data of the i-th ((i is 0 to n) division point in the j-th measurement point sequence is P ij .
【００１３】次に、図５に示すように、ｉを共通とする
分割点を通る自由曲線、即ち、上記の処理で求められた
第１の自由曲線Ｃ1 （この第１の自由曲線Ｃ1 の方向を
以下ｕ方向とする）と交差する第２の自由曲線Ｃ2 （こ
の第２の自由曲線Ｃ2 の方向を以下ｖ方向とする）を決
定する。この第２の自由曲線Ｃ2 は、通過点Ｐijを通
り、通過点Ｐijにおける接線が共通になることを条件と
して決定される。この自由曲線の決定アルゴリズムとし
ては、例えばＣ1 級接続又はＣ2 級接続の３次ベジェ曲
線の生成アルゴリズムを使用することができる。Next, as shown in FIG. 5, a free curve passing through a division point having a common i, that is, the first free curve C 1 (the first free curve C 1 obtained by the above process A second free curve C 2 (hereinafter, the direction of the second free curve C 2 is hereinafter referred to as the v direction) is determined. The second free curve C 2 is passed through the pass point P ij, tangent in the pass point P ij is determined as a condition to become in common. As an algorithm for determining the free curve, for example, an algorithm for generating a cubic Bezier curve of class C 1 connection or class C 2 connection can be used.
【００１４】次に、このようなアルゴリズムによって生
成された自由曲線で各々囲まれた範囲に接平面が共通に
なる自由曲面を生成する。接平面が共通であるように張
ったパッチを生成するには、例えば、共通の境界曲線を
有し、且つその両端点で接平面が一致する条件を満たす
２枚のパッチを生成すればよい。この条件を満たせば、
境界曲線上の全ての点で接平面が一致することになる。
以上の処理により、単位自由曲面が夫々生成され、これ
らの単位自由曲面の集合によってプローブ中心曲面を生
成することができる。Next, a free-form surface having a common tangent plane in a range surrounded by free-form curves generated by such an algorithm is generated. In order to generate a patch stretched so that the tangent planes are common, for example, two patches having a common boundary curve and satisfying the condition that the tangent planes match at both end points may be generated. If this condition is met,
The tangent planes match at all points on the boundary curve.
By the above processing, unit free-form surfaces are generated, and the probe center curved surface can be generated by a set of these unit free-form surfaces.
【００１５】求められたプローブ中心曲面に対しては、
プローブ半径分のオフセット処理を行うことにより実曲
面を算出することができるが、本処理で対象とする自由
曲面は、実曲面でも、プローブ中心曲面でもよい。For the obtained probe center curved surface,
Although a real curved surface can be calculated by performing offset processing for the probe radius, the free curved surface targeted in this processing may be the real curved surface or the probe center curved surface.
【００１６】自由曲面が求められたら、自由曲面と各設
計点との最短距離を評価関数として求めるため、先ず、
設計点に最も近い自由曲面上の位置Ｐを算する（Ｓ
１）。ここでは、データ量を削減して計算の高速化を図
るため、図６に示すように、パッチ全体をいくつかのパ
ッチ群にグループ分けする。次に、図７に示すように、
指定された設計点に最も近いｎ個のパッチ群を抽出し、
抽出されたパッチ群に含まれるパッチの中から、図８に
示すように、設計点に最も近いｍ個のパッチを抽出す
る。次に、図９に示すように、抽出されたパッチの中に
内点を発生させ、指定された設計点に最も近い点をｌ点
だけ抽出する。そして、図１０に示すように、抽出され
た内点の周囲を更に分割して、最も近い点をｋ点だけ抽
出する。このｋ点の抽出処理をｓ回繰り返すことによ
り、設計値に最も近い１点を求める。なお、ここで、
ｎ，ｍ，ｌ，ｋ，ｓは、チューニングパラメータであ
り、処理の効率と精度とを考慮して任意に設定可能であ
る。When the free-form surface is obtained, the shortest distance between the free-form surface and each design point is obtained as an evaluation function.
The position P on the free-form surface closest to the design point is calculated (S
1). Here, in order to reduce the data amount and speed up the calculation, the entire patch is divided into several patch groups as shown in FIG. Next, as shown in FIG.
Extract the n patch groups that are closest to the specified design point,
As shown in FIG. 8, m patches closest to the design point are extracted from the patches included in the extracted patch group. Next, as shown in FIG. 9, an internal point is generated in the extracted patch, and only one point, which is the closest to the designated design point, is extracted. Then, as shown in FIG. 10, the periphery of the extracted inner point is further divided, and only the closest k points are extracted. By repeating this k-point extraction processing s times, one point closest to the design value is obtained. Here,
n, m, l, k, and s are tuning parameters, which can be arbitrarily set in consideration of processing efficiency and accuracy.
【００１７】自由曲面上の位置Ｐが算出されたら、次に
評価関数ｆを算出する（Ｓ２）。評価関数ｆは、図１１
に示すように、求められた各点の位置Ｐから各設計点Ｑ
までの最短距離Ｌによって表される。もし、自由曲面が
プローブ中心曲面であれば、上記自由曲面をプローブ先
端球の半径ｒ分だけ補正すればよい。図１２（ａ）は、
設計点Ｑがプローブ中心曲面Ｓに対し、実面側に存在す
る場合、図１２（ｂ）は、設計点Ｑがプローブ中心曲面
Ｓに対し、実面とは反対側に存在する場合をそれぞれ示
している。After the position P on the free-form surface is calculated, the evaluation function f is then calculated (S2). The evaluation function f is shown in FIG.
As shown in, each design point Q is calculated from the obtained position P of each point.
It is represented by the shortest distance L to. If the free curved surface is the probe center curved surface, the free curved surface may be corrected by the radius r of the probe tip sphere. FIG. 12A shows
When the design point Q exists on the real surface side with respect to the probe center curved surface S, FIG. 12B shows the case where the design point Q exists on the opposite side to the probe center curved surface S with respect to the real surface. ing.
【００１８】続いて、非線形最小二乗法により設計基準
座標系の最適位置と姿勢を求める（Ｓ３）。非線形最小
二乗法の可変パラメータとしては、原点の平行移動パラ
メータ（Δｘ，Δｙ，Δｚ）〔図１３（ａ）〕と、Ｚ軸
の倒れ量パラメータ（Δｌ，Δｍ）〔図１３（ｂ）〕
と、Ｚ軸の回転パラメータ（Δω）〔図１３（ｃ）〕と
を使用する。即ち、Δｌ，ΔｍによってＺ軸，Ｘ軸及び
Ｙ軸の方向は、数１のように求められる。Then, the optimum position and orientation of the design reference coordinate system are obtained by the nonlinear least squares method (S3). Variable parameters of the nonlinear least squares method include a translational parameter of the origin (Δx, Δy, Δz) [FIG. 13 (a)] and a tilt amount parameter of the Z axis (Δl, Δm) [FIG. 13 (b)].
And the Z-axis rotation parameter (Δω) [Fig. 13 (c)]. That is, the directions of the Z-axis, the X-axis, and the Y-axis can be calculated by Δl and Δm as shown in Equation 1.
【００１９】[0019]
【数１】 [Equation 1]
【００２０】パラメータは、（Δｘ，Δｙ，Δｚ），
（Δｌ，Δｍ），Δωの順に座標系に適用する。但し、
（）内は同時に適用する。最適位置を算出するには、次
の方程式を繰り返し適用する非線形最小二乗法を使用す
る。The parameters are (Δx, Δy, Δz),
(Δl, Δm) and Δω are applied to the coordinate system in this order. However,
The values in parentheses apply at the same time. To calculate the optimum position, a non-linear least squares method is used which repeatedly applies the following equation.
【００２１】[0021]
【数２】 [Equation 2]
【００２２】ここで、Δｘ，Δｙ，Δｚはチューニング
パラメータとする。Δｌ，Δｍ，Δωは、設計基準座標
系の原点から各設計点までの平均距離Ｒによって、下記
数３のように設定し、Ｌ，Ｍ，Ωをチューニングパラメ
ータとする。Here, Δx, Δy, and Δz are tuning parameters. Δl, Δm, and Δω are set according to the following equation 3 according to the average distance R from the origin of the design reference coordinate system to each design point, and L, M, and Ω are used as tuning parameters.
【００２３】[0023]
【数３】Δｌ＝Ｌ／Ｒ Δｍ＝Ｍ／Ｒ Δω＝Ω／Ｒ## EQU3 ## Δl = L / R Δm = M / R Δω = Ω / R
【００２４】下記数２を変形Cholesky法によって解いて
ａ1 〜ａ6 を求める（Ｓ４）。次に非線形最小二乗法の
収束判定処理を行う（Ｓ５）。収束判定では、数４の３
つの条件のいずれか一つを使用し、これを満足したかど
うかを判定する。The following expression 2 is solved by the modified Cholesky method to obtain a1 to a6 (S4). Next, a convergence determination process of the nonlinear least squares method is performed (S5). In the convergence determination, the number 3 of 4
Use one of the two conditions to determine if this is met.
【００２５】[0025]
【数４】 [Equation 4]
【００２６】もし、条件が満足されたら、処理を終了
し、そうでない場合には、下記数５により新しい座標系
位置と姿勢とを求め、再度同様な処理を実行する（Ｓ
５）。If the conditions are satisfied, the process is terminated, and if not, a new coordinate system position and orientation are obtained by the following equation 5, and the same process is executed again (S).
5).
【００２７】[0027]
【数５】ｘ＝ｘ＋ａ1 ｙ＝ｙ＋ａ2 ｚ＝ｚ＋ａ3 ｌ＝ｌ＋ａ4 ｍ＝ｍ＋ａ5 ω＝ω＋ａ6X = x + a1 y = y + a2 z = z + a3 l = l + a4 m = m + a5 ω = ω + a6
【００２８】そして、収束するまで、この処理を繰り返
すと、最終的に評価座標系を基準した設計座標系の最適
位置及び姿勢を算出することができる。なお、上記実施
例では、評価座標系（第１座標系）に対する設計座標系
（第２座標系）の位置及び姿勢を求めるようにしたが、
設計座標系に対する評価座標系の位置及び姿勢を求め、
測定値を座標変換するようにしてもよい。但し、この場
合には、自由曲面に対する座標変換を行う必要があるた
め、先の実施例よりもややデータ処理量が増すことにな
る。By repeating this process until convergence, the optimum position and orientation of the design coordinate system based on the evaluation coordinate system can be finally calculated. In the above embodiment, the position and orientation of the design coordinate system (second coordinate system) with respect to the evaluation coordinate system (first coordinate system) are obtained.
Obtain the position and orientation of the evaluation coordinate system with respect to the design coordinate system,
You may make it coordinate-convert the measured value. However, in this case, since it is necessary to perform coordinate conversion on the free-form surface, the amount of data processing will be slightly increased compared to the previous embodiment.
【００２９】[0029]
【発明の効果】以上述べたように、本発明によれば、測
定座標値によって特定される自由曲面と設計座標値との
間の最短距離を評価関数とし、この評価関数化が最小値
に収束するような測定座標系（第１座標系）と設計座標
系（第２座標系）との間の相対位置関係を求めると共
に、求められた両座標系の相対位置関係に基づいて、一
方の座標系に他方の座標系が一致するように座標変換を
行うようにしているので、測定時や加工時のワークの取
り付け誤差等による影響が排除され、測定値を正しく評
価することが可能になる。As described above, according to the present invention, the shortest distance between the free-form surface specified by the measurement coordinate value and the design coordinate value is used as the evaluation function, and this evaluation function conversion converges to the minimum value. to such a measurement coordinate system with determining the relative positional relationship between the (first coordinate system) and the design coordinate system (second coordinate system), based on the relative positional relationship between the two coordinate systems obtained, one coordinate since to perform the coordinate transformation as the other coordinate system matches the system, effects of the mounting error of the measurement time and the processing time of the workpiece is eliminated, it is possible to evaluate the measured values correctly .
【図面の簡単な説明】[Brief description of drawings]
【図１】 本発明の一実施例に係る測定評価方式におけ
る座標系整合処理のフローチャートである。FIG. 1 is a flowchart of coordinate system matching processing in a measurement / evaluation method according to an embodiment of the present invention.
【図２】 本実施例に係る座標系整合処理の概要を説明
するための模式図である。FIG. 2 is a schematic diagram for explaining an outline of coordinate system matching processing according to the present embodiment.
【図３】 三次元測定機から得られる測定点群データを
示す模式図である。FIG. 3 is a schematic diagram showing measurement point cloud data obtained from a coordinate measuring machine.
【図４】 測定点群データを第１の自由曲線で当てはめ
た様子を示す模式図である。FIG. 4 is a schematic diagram showing a state in which measured point cloud data is fitted with a first free curve.
【図５】 第１の自由曲線を等分して各等分点を第２の
自由曲線で滑らかに結合した様子を示す模式図である。FIG. 5 is a schematic diagram showing a state in which a first free curve is equally divided and respective equally divided points are smoothly connected by a second free curve.
【図６】 設計点に最短の自由曲面上の位置を求める処
理のため複数のパッチをグループ化した様子を示す模式
図である。FIG. 6 is a schematic diagram showing a state in which a plurality of patches are grouped for the process of obtaining the shortest free-form surface position at a design point.
【図７】 同処理においてパッチ群を絞り込む様子を示
す模式図である。FIG. 7 is a schematic diagram showing how patch groups are narrowed down in the same process.
【図８】 同処理において最終的に絞り込まれたパッチ
を示す模式図である。FIG. 8 is a schematic diagram showing patches finally narrowed down in the same process.
【図９】 同処理において選択されたパッチに内点を発
生させた様子を示す模式図である。FIG. 9 is a schematic diagram showing a state in which inner points are generated in a patch selected in the same process.
【図１０】 同処理において選択された点の周囲に複数
の点を発生させた様子を示す模式図である。FIG. 10 is a schematic diagram showing how a plurality of points are generated around the selected point in the same process.
【図１１】 選択された自由曲面上の点と設計点との距
離を示す模式図である。FIG. 11 is a schematic diagram showing the distance between a selected point on the free-form surface and the design point.
【図１２】 プローブ半径分のオフセットをした場合の
自由曲面上の点と設計点との距離を示す模式図である。FIG. 12 is a schematic diagram showing a distance between a point on a free-form surface and a design point when the probe radius is offset.
【図１３】 非線形最小二乗法における可変パラメータ
を説明するための評価座標系と設計座標系とを示す模式
図である。FIG. 13 is a schematic diagram showing an evaluation coordinate system and a design coordinate system for explaining variable parameters in the nonlinear least squares method.
ＭＳ…測定断面、Ｄ…測定点群データ、Ｃ1 …第１の自
由曲線、Ｃ2 …第２の自由曲線、Ｓ…プローブ中心曲
面、Ｑ…設計点。MS ... measurement section, D ... measurement point group data, C1 ... first free curve, C2 ... second free curve, S ... probe center curved surface, Q ... design point.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 有我 幸三 東京都文京区湯島１丁目３番４号 ＫＴ お茶の水聖橋ビル６階 株式会社システ ムテクノロジーインスティテュート内 (56)参考文献 特開 昭53−1552（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kozo Ariga 1-3-4 Yushima, Bunkyo-ku, Tokyo KT Ochanomizu Seihashi Building 6F, System Technology Institute Co., Ltd. (56) Reference JP-A-53-1552 (JP, A)
Claims (3)
標値との間の誤差を評価する測定値評価方法において、既知形状について任意の測定ピッチ及び測定点数で測定
して得られた点群データに基づいて前記既知形状に対応
する自由曲面を生成し、 生成された自由曲面と複数の 設計座標値との間の最短距
離を評価関数として求め、 この評価関数が最小値に収束する測定座標系と設計座標
系との間の相対位置関係を求め、 得られた両座標系の間の相対位置関係に基づいて前記両
座標系の一方に対して他方を整合させる座標変換処理を
行ったのち、前記測定座標値と設計座標値との間の誤差
を評価することを特徴とする測定値評価方法。1. A measurement value evaluation method for evaluating an error between a measurement coordinate value and a design coordinate value for a known shape, wherein the known shape is measured at an arbitrary measurement pitch and an arbitrary number of measurement points.
Corresponds to the known shape based on the point cloud data obtained by
Free-form surface generates, calculated as the evaluation function the shortest distance between the generated free-form surface and a plurality of design coordinate values, measurement coordinate system and the design coordinate the evaluation function converges to a minimum value of
After obtaining the relative positional relationship with the system, based on the obtained relative positional relationship between both coordinate systems, after performing coordinate conversion processing to match one of the two coordinate systems with the other, the measured coordinates A measured value evaluation method , characterized by evaluating an error between a value and a design coordinate value.
曲面を順次小さいパッチに絞り込んでいきながら、前記
設計座標値に最も近いパッチを選択していくことによ
り、前記評価関数を算出することを特徴とする請求項１
記載の測定値評価方法。2. The evaluation function is calculated by sequentially narrowing down the free-form surface specified by the measurement coordinate value into smaller patches and selecting the patch closest to the design coordinate value. Claim 1
The measurement value evaluation method described.
生させたのち、前記設計座標値に最も近い点を選択する
処理と、選択された点の周囲に更に複数の点を発生させ
る処理とを複数回繰り返すことにより、前記評価関数を
算出することを特徴とする請求項２記載の測定値評価方
法。3. A process of generating a plurality of points inside a selected patch, a process of selecting a point closest to the design coordinate value, and a process of generating a plurality of points around the selected point. The measurement value evaluation method according to claim 2, wherein the evaluation function is calculated by repeating and a plurality of times.
Law .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3189245A JP2520202B2 (en) | 1991-07-03 | 1991-07-03 | Measured value evaluation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3189245A JP2520202B2 (en) | 1991-07-03 | 1991-07-03 | Measured value evaluation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0510751A JPH0510751A (en) | 1993-01-19 |
| JP2520202B2 true JP2520202B2 (en) | 1996-07-31 |
Family
ID=16238057
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3189245A Expired - Fee Related JP2520202B2 (en) | 1991-07-03 | 1991-07-03 | Measured value evaluation method |
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| Country | Link |
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| JP (1) | JP2520202B2 (en) |
Cited By (2)
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| JP2010190790A (en) * | 2009-02-19 | 2010-09-02 | Olympus Corp | Surface shape measuring machine, surface shape measuring method and method for analyzing measured value of surface shape |
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Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS531552A (en) * | 1976-06-25 | 1978-01-09 | Honda Motor Co Ltd | Coordinate selffestimating calculation system with multiipoint measurement |
| JPS57132015A (en) * | 1981-02-09 | 1982-08-16 | Kosaka Kenkyusho:Kk | Coordinate transformation device |
-
1991
- 1991-07-03 JP JP3189245A patent/JP2520202B2/en not_active Expired - Fee Related
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| JP2002039908A (en) * | 2000-07-25 | 2002-02-06 | Canon Inc | Method for evaluating shape, and method for manufacturing part |
| JP4564632B2 (en) * | 2000-07-25 | 2010-10-20 | キヤノン株式会社 | Shape evaluation method and component manufacturing method |
| JP2010190790A (en) * | 2009-02-19 | 2010-09-02 | Olympus Corp | Surface shape measuring machine, surface shape measuring method and method for analyzing measured value of surface shape |
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| Publication number | Publication date |
|---|---|
| JPH0510751A (en) | 1993-01-19 |
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