JP2514846Y2 - Ｃｖｄエピタキシヤル成長装置用加熱コイル - Google Patents

Ｃｖｄエピタキシヤル成長装置用加熱コイル

Info

Publication number
JP2514846Y2
JP2514846Y2 JP1986181968U JP18196886U JP2514846Y2 JP 2514846 Y2 JP2514846 Y2 JP 2514846Y2 JP 1986181968 U JP1986181968 U JP 1986181968U JP 18196886 U JP18196886 U JP 18196886U JP 2514846 Y2 JP2514846 Y2 JP 2514846Y2
Authority
JP
Japan
Prior art keywords
susceptor
heating coil
reaction tube
coil
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1986181968U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6389230U (enrdf_load_stackoverflow
Inventor
公夫 天野
芳男 上野
Original Assignee
日本真空技術 株式会社
高周波熱錬 株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本真空技術 株式会社, 高周波熱錬 株式会社 filed Critical 日本真空技術 株式会社
Priority to JP1986181968U priority Critical patent/JP2514846Y2/ja
Publication of JPS6389230U publication Critical patent/JPS6389230U/ja
Application granted granted Critical
Publication of JP2514846Y2 publication Critical patent/JP2514846Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Constitution Of High-Frequency Heating (AREA)
JP1986181968U 1986-11-28 1986-11-28 Ｃｖｄエピタキシヤル成長装置用加熱コイル Expired - Lifetime JP2514846Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1986181968U JP2514846Y2 (ja) 1986-11-28 1986-11-28 Ｃｖｄエピタキシヤル成長装置用加熱コイル

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1986181968U JP2514846Y2 (ja) 1986-11-28 1986-11-28 Ｃｖｄエピタキシヤル成長装置用加熱コイル

Publications (2)

Publication Number Publication Date
JPS6389230U JPS6389230U (enrdf_load_stackoverflow) 1988-06-10
JP2514846Y2 true JP2514846Y2 (ja) 1996-10-23

Family

ID=31127334

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1986181968U Expired - Lifetime JP2514846Y2 (ja) 1986-11-28 1986-11-28 Ｃｖｄエピタキシヤル成長装置用加熱コイル

Country Status (1)

Country Link
JP (1) JP2514846Y2 (enrdf_load_stackoverflow)

Also Published As

Publication number Publication date
JPS6389230U (enrdf_load_stackoverflow) 1988-06-10

Similar Documents

Publication Publication Date Title
JP5063755B2 (ja) 誘導加熱装置および誘導加熱方法
JPS62205619A (ja) 半導体の加熱方法及びその方法に使用されるサセプタ
JPH10270423A (ja) エッチング装置
JP2514846Y2 (ja) Ｃｖｄエピタキシヤル成長装置用加熱コイル
TW201824958A (zh) 電感耦合電漿處理裝置
US4486461A (en) Method and apparatus for gas phase treating substrates
JP3127981B2 (ja) 高周波誘導加熱装置
JPH1116893A (ja) プラズマ処理装置及びプラズマ処理方法
KR20210020153A (ko) 반도체 재료의 단결정 형성 방법, 이 방법을 수행하는 장치 및 실리콘 반도체 웨이퍼
JP2012019005A (ja) 成膜装置及び成膜方法
JPH1081970A (ja) 薄膜形成方法
JP2001122692A (ja) 半導体結晶の製造方法およびこれを利用する製造装置
EP0235570B1 (en) Susceptor
JP2014017439A (ja) 半導体製造装置および半導体製造方法
JP3089116B2 (ja) 電子サイクロトロン共鳴プラズマｃｖｄ装置
CN118109898B (zh) 沉积设备
JP2848416B2 (ja) 気相成長装置
KR100294934B1 (ko) 균일한 코아간 간극을 가지는 환단면 선형유도전자펌프
WO2001027363A1 (en) A device and a method for heat treatment of an object in a susceptor
CN222294262U (zh) 外延基座以及外延设备
KR101309385B1 (ko) 유도가열장치
JPH032376A (ja) マイクロ波プラズマ処理装置
JPS63136615A (ja) Ｃｖｄエピタキシヤル成長装置用加熱コイル
CN109487239B (zh) 旋转托盘固定装置
JPH03197383A (ja) 気相成長装置