JP2514846Y2 - Cvdエピタキシヤル成長装置用加熱コイル - Google Patents
Cvdエピタキシヤル成長装置用加熱コイルInfo
- Publication number
- JP2514846Y2 JP2514846Y2 JP1986181968U JP18196886U JP2514846Y2 JP 2514846 Y2 JP2514846 Y2 JP 2514846Y2 JP 1986181968 U JP1986181968 U JP 1986181968U JP 18196886 U JP18196886 U JP 18196886U JP 2514846 Y2 JP2514846 Y2 JP 2514846Y2
- Authority
- JP
- Japan
- Prior art keywords
- susceptor
- heating coil
- reaction tube
- coil
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Constitution Of High-Frequency Heating (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986181968U JP2514846Y2 (ja) | 1986-11-28 | 1986-11-28 | Cvdエピタキシヤル成長装置用加熱コイル |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986181968U JP2514846Y2 (ja) | 1986-11-28 | 1986-11-28 | Cvdエピタキシヤル成長装置用加熱コイル |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6389230U JPS6389230U (enrdf_load_stackoverflow) | 1988-06-10 |
JP2514846Y2 true JP2514846Y2 (ja) | 1996-10-23 |
Family
ID=31127334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986181968U Expired - Lifetime JP2514846Y2 (ja) | 1986-11-28 | 1986-11-28 | Cvdエピタキシヤル成長装置用加熱コイル |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2514846Y2 (enrdf_load_stackoverflow) |
-
1986
- 1986-11-28 JP JP1986181968U patent/JP2514846Y2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPS6389230U (enrdf_load_stackoverflow) | 1988-06-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5063755B2 (ja) | 誘導加熱装置および誘導加熱方法 | |
JPS62205619A (ja) | 半導体の加熱方法及びその方法に使用されるサセプタ | |
JPH10270423A (ja) | エッチング装置 | |
JPS62182179A (ja) | 炭化珪素発熱体の製造方法 | |
JP2514846Y2 (ja) | Cvdエピタキシヤル成長装置用加熱コイル | |
US4486461A (en) | Method and apparatus for gas phase treating substrates | |
JP3127981B2 (ja) | 高周波誘導加熱装置 | |
CN116463728A (zh) | 生长高质量碳化硅晶体的装置、方法及碳化硅晶体 | |
JPH1116893A (ja) | プラズマ処理装置及びプラズマ処理方法 | |
GB2163367A (en) | Crystal puffing | |
KR20210020153A (ko) | 반도체 재료의 단결정 형성 방법, 이 방법을 수행하는 장치 및 실리콘 반도체 웨이퍼 | |
CN110996419B (zh) | 感应加热装置和半导体加工设备 | |
JP2012019005A (ja) | 成膜装置及び成膜方法 | |
JPH1081970A (ja) | 薄膜形成方法 | |
EP0235570B1 (en) | Susceptor | |
JP2014017439A (ja) | 半導体製造装置および半導体製造方法 | |
JP3089116B2 (ja) | 電子サイクロトロン共鳴プラズマcvd装置 | |
CN118109898B (zh) | 沉积设备 | |
KR100294934B1 (ko) | 균일한 코아간 간극을 가지는 환단면 선형유도전자펌프 | |
WO2001027363A1 (en) | A device and a method for heat treatment of an object in a susceptor | |
CN222294262U (zh) | 外延基座以及外延设备 | |
KR101309385B1 (ko) | 유도가열장치 | |
JPS6193604A (ja) | 超電導マグネツト | |
JPH032376A (ja) | マイクロ波プラズマ処理装置 | |
CN109487239B (zh) | 旋转托盘固定装置 |