JP2509215B2 - Transparent conductive film with antireflection function - Google Patents
Transparent conductive film with antireflection functionInfo
- Publication number
- JP2509215B2 JP2509215B2 JP10152587A JP10152587A JP2509215B2 JP 2509215 B2 JP2509215 B2 JP 2509215B2 JP 10152587 A JP10152587 A JP 10152587A JP 10152587 A JP10152587 A JP 10152587A JP 2509215 B2 JP2509215 B2 JP 2509215B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- transparent conductive
- layer
- conductive film
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Description
【発明の詳細な説明】 ＜産業上の利用分野＞ 本発明は、透明導電性フィルムに関する。本発明の透
明導電性フィルムは、液晶用表示電極、面発熱式防曇
膜、液晶ディスプレーやCRTディスプレーなどと組み合
わせて使用する透明タッチパネル等のような光学特性及
び電気特性が特に重要な分野において使用される。DETAILED DESCRIPTION OF THE INVENTION <Field of Industrial Application> The present invention relates to a transparent conductive film. The transparent conductive film of the present invention is used in fields where optical properties and electrical properties are particularly important, such as display electrodes for liquid crystals, surface heating type anti-fog films, transparent touch panels used in combination with liquid crystal displays and CRT displays, etc. To be done.
＜従来技術及びその欠点＞ 透明基板表面に透明導電性膜を成膜するとこの導電性
膜の高い屈折率に起因して表面反射が増大するという欠
点を有している。以下、この点を本発明の透明導電性フ
ィルムの最適応用分野である透明タッチパネルを例にし
て詳述する。透明タッチパネルは透明導電性膜を導体と
した透明な入力スイッチであり、例えば第２図に示すよ
うにベースフィルム１上に透明導電性膜５を設けた透明
導電性フィルムを２枚用い、透明導電性膜５を内側にし
てスペーサー６を介して対向させた構造となっており、
これを指で押すと、対向している透明導電性膜５が接触
してスイッチがオン（ON）の状態となって入力される。
ここで用いられる透明導電性フィルムは電極グレードの
もので、ポリエステル（特にポリエチンテレフタレー
ト）、ポリエーテルサルフォン等の機械的強度、耐熱
性、耐薬晶性に優れたベースフィルム表面にインジウム
錫酸化物（以下、ITOという）、錫アンチモン酸化物等
の半導体薄膜、金、パラジウム、アルミニウムあるいは
クロム系合金等の金属薄膜を真空蒸着、スパッタリン
グ、イオンプレーティング、イオンビーム蒸着等の方法
により形成したものである。現在市販されている透明導
電性フィルムの多くはポリエステルフィルム表面にITO
膜を形成したタイプのものである。<Prior Art and Its Deficiencies> When a transparent conductive film is formed on the surface of a transparent substrate, it has a drawback that surface reflection increases due to the high refractive index of the conductive film. Hereinafter, this point will be described in detail by taking a transparent touch panel which is an optimum application field of the transparent conductive film of the present invention as an example. The transparent touch panel is a transparent input switch using a transparent conductive film as a conductor. For example, as shown in FIG. 2, two transparent conductive films each having a transparent conductive film 5 provided on a base film 1 are used. The structure is such that the permeable film 5 faces inside and the spacers 6 face each other.
When this is pushed with a finger, the transparent conductive film 5 facing each other is brought into contact with the switch, and the switch is turned on (ON) for input.
The transparent conductive film used here is of electrode grade, and is made of indium tin oxide, which is a base film with excellent mechanical strength, heat resistance and chemical resistance, such as polyester (especially polyethylene terephthalate) and polyether sulfone. (Hereinafter referred to as ITO), a semiconductor thin film such as tin antimony oxide, or a metal thin film such as gold, palladium, aluminum, or a chromium alloy is formed by a method such as vacuum deposition, sputtering, ion plating, or ion beam deposition. is there. Most of the transparent conductive films currently on the market are ITO on the polyester film surface.
It is a type with a film formed.
しかしながら、これらの透明導電性膜はベースフィル
ムより屈折率が高く、これらの被膜を形成した透明導電
性フィルムは表面の反射が増大するという欠点を有して
いる。この点を第３図の分光反射率曲線図を用いて説明
すると、図中、ａはポリエステルベースフィルム、ｂは
ITO薄膜（光学膜厚72.3nm）を設けたポリエステルフィ
ルムの片面分光反射率曲線であり、曲線ａとｂの対比よ
り、ITO薄膜を設けたポリエステルフィルムの反射率
が、ポリエステルベースフィルムの反射率よりも著しく
増大している。However, these transparent conductive films have a higher refractive index than the base film, and the transparent conductive film having these coatings has a drawback that reflection on the surface is increased. This point will be described with reference to the spectral reflectance curve diagram of FIG. 3. In the figure, a is a polyester base film and b is
It is a single-sided spectral reflectance curve of the polyester film provided with the ITO thin film (optical film thickness 72.3 nm). From the comparison of curves a and b, the reflectance of the polyester film provided with the ITO thin film is more than that of the polyester base film. Is also increasing significantly.
そしてITO薄膜を設けたポリエステルフィルムからな
る透明導電性フィルムの上述の欠点は、該透明導電性フ
ィルムを用いて得られた従来の透明タッチパネルの欠点
ともなっており、タッチパネル画面のコントラストが悪
い、表示がクリアーでない、反射が強くて見づらい等の
問題点があった。And the above-mentioned drawbacks of the transparent conductive film made of a polyester film provided with an ITO thin film are also the drawbacks of the conventional transparent touch panel obtained using the transparent conductive film, and the contrast of the touch panel screen is poor, and the display is There were problems such as not being clear and strong reflections making it difficult to see.
このような従来の透明タッチパネルの問題点を解消す
るために、ベースフィルムの透明導電性膜の設けられて
いない面をあらし処理（ぼかし処理）することが行なわ
れているが、その効果は十分でなく、上述の問題点を解
消するに至っていない。In order to solve such a problem of the conventional transparent touch panel, a surface of the base film on which the transparent conductive film is not provided is subjected to a storm treatment (blurring treatment), but the effect is not sufficient. However, the above problems have not been solved yet.
＜発明が解決しようとする問題点＞ 従って本発明の目的は、透明タッチパネル等に用いら
れる透明導電性フィルムの本来の機能である導電性を完
全に維持しつつ、その欠点である反射性を著しく軽減さ
せた透明導電性フィルムを提供することにある。<Problems to be Solved by the Invention> Accordingly, an object of the present invention is to completely maintain the conductivity which is the original function of the transparent conductive film used for a transparent touch panel and the like, and to remarkably improve the reflectivity which is a drawback thereof. It is to provide a reduced transparent conductive film.
＜問題点を解決するための手段＞ 上述の目的を達成するため、本発明者は、反射防止膜
を設けることに着目し、その成膜位置について検討した
結果、透明導電性フィルムの透明導電性膜層が形成され
ていない面に反射防止膜を設けても、その反射性は軽減
するものの十分でないのに対し、透明基板上に透明導電
性膜層を最外層とし、第１〜３層が下記に特定する材料
および光学膜厚からなる多層反射防止膜を物理的方法ま
たは化学的気相成長法により設けると導電性を完全に維
持し、かつその反射性が著しく軽減されることを見い出
し、本発明を完成させた。<Means for Solving Problems> In order to achieve the above-mentioned object, the present inventor focused on providing an antireflection film, and examined the film formation position, and as a result, found that the transparent conductive film had a transparent conductive film. Even if an antireflection film is provided on the surface on which the film layer is not formed, its reflectivity is reduced but not sufficient, whereas the transparent conductive film layer is the outermost layer on the transparent substrate, and the first to third layers are It was found that when a multilayer antireflection film consisting of the materials and optical thicknesses specified below is provided by a physical method or a chemical vapor deposition method, the conductivity is completely maintained, and the reflectivity is remarkably reduced. The present invention has been completed.
従って本発明は、 透明基板上に透明導電性膜層を最外層とする多層反射
防止膜を物理的方法または化学的気相成長法により設け
てなり、該多層反射防止膜における、基板側から外方に
向けて数えて第１層がSiO2からなる第１低屈折率膜層L1
（光学膜厚０＜［L1］≦λ/4、但しλは中心波長500〜6
00nm）であり、第２層がTiO2および／またはZrO2からな
る高屈折率膜層Ｈ（光学膜厚λ/8≦［Ｈ］≦λ/4）であ
り、第３層がSiO2からなる第２低屈折率膜層L2（光学膜
厚０＜［L2］≦λ/4）であり、第４層（最外層）が透明
導電性膜層TC（光学膜厚０＜［TC］≦λ/4）であること
を特徴とする透明導電性フィルム を要旨とする。Therefore, the present invention provides a multilayer antireflection film having a transparent conductive film layer as an outermost layer on a transparent substrate by a physical method or a chemical vapor deposition method. The first low-refractive-index film layer L 1 whose first layer is SiO 2 when counted toward
(Optical film thickness 0 <[L 1 ] ≤ λ / 4, where λ is the center wavelength of 500 to 6
00 nm), the second layer is a high refractive index film layer H made of TiO 2 and / or ZrO 2 (optical film thickness λ / 8 ≦ [H] ≦ λ / 4), and the third layer is made of SiO 2 Is a second low refractive index film layer L 2 (optical film thickness 0 <[L 2 ] ≦ λ / 4), and the fourth layer (outermost layer) is a transparent conductive film layer TC (optical film thickness 0 <[TC ] ≤ λ / 4) is a transparent conductive film characterized by the following.
従来透明基板用多層反射防止膜の最外層としてSiO2,M
gF2等の低屈折率膜が使用されているが、本発明はITO膜
のような導電性高屈折率膜（屈折率ｎ≒２）を導電性膜
として機能させるだけでなく、反射防止膜の最外層とて
も機能させていることを特徴とするものである。As the outermost layer of conventional multi-layer antireflection coatings for transparent substrates, SiO 2 , M
Although a low-refractive index film such as gF 2 is used, the present invention not only allows a conductive high-refractive index film (refractive index n≈2) such as an ITO film to function as a conductive film, but also an antireflection film. The outermost layer of is characterized by being very functional.
本発明においては、上記多層反射防止膜は、基板側か
ら外方に向けて数えて第１層がSiO2からなる第１低屈折
率膜層L1（光学膜厚０＜［L1］≦λ/4、但しλは中心波
長500〜600nm）であり、第２層がTiO2および／またはZr
O2からなる高屈折率膜層Ｈ（光学膜厚λ/8≦［Ｈ］≦λ
/4）であり、第３層がSiO2からなる第２低屈折率膜層L2
（光学膜厚０＜［L2］≦λ/4）であり、第４層（最外
層）が透明導電性膜層TC（光学膜厚０＜［TC］≦λ/4）
である多層膜により構成される。多層反射防止膜全体の
膜厚はλ/4以上3/4λ以下であるのが好ましい。In the present invention, the multilayer antireflection film, the first low refractive index film layer L 1 (optical film thickness by the first layer counted outward from the substrate side is made of SiO 2 0 <[L 1] ≦ λ / 4, where λ is the central wavelength of 500 to 600 nm) and the second layer is TiO 2 and / or Zr.
High refractive index film layer H made of O 2 (optical film thickness λ / 8 ≦ [H] ≦ λ
/ 4), and a second low refractive index film layer is a third layer made of SiO 2 L 2
(Optical film thickness 0 <[L 2 ] ≦ λ / 4), and the fourth layer (outermost layer) is a transparent conductive film layer TC (optical film thickness 0 <[TC] ≦ λ / 4)
Is composed of a multilayer film. The total thickness of the multilayer antireflection film is preferably λ / 4 or more and 3 / 4λ or less.
また酸化インジウム、酸化錫、ITO、錫アンチモン酸
化物、酸化亜鉛などの導電性酸化物が最外層の導電性高
屈折率膜層TCとして用いられることはもちろんである。Further, it goes without saying that a conductive oxide such as indium oxide, tin oxide, ITO, tin antimony oxide, or zinc oxide is used as the outermost conductive high refractive index film layer TC.
これらの反射防止膜は、真空蒸着法、スパッタリング
法、イオンプレーティング法、イオンビーム蒸着法等の
物理的方法や化学的気相成長法（CVD）などの従来より
慣用されている方法によって形成される。These antireflection films are formed by a physical method such as a vacuum vapor deposition method, a sputtering method, an ion plating method or an ion beam vapor deposition method, or a conventionally used method such as a chemical vapor deposition method (CVD). It
以下、本発明の透明導電性フィルムを透明タッチパネ
ルに応用した場合について図面を参照しながら説明す
る。Hereinafter, a case where the transparent conductive film of the present invention is applied to a transparent touch panel will be described with reference to the drawings.
第１図は本発明の透明導電性フィルムを２枚用いて得
られた透明タッチパネルの一例を示すものである。各透
明導電性フィルムは、ベースフィルム１上に、ベースフ
ィルム側から外方に向けて数えて第１層がSiO2からなる
第１低屈折率膜層（L1）２（光学膜厚０＜［L1］≦λ/
4）であり、第２層がTiO2および／またはZrO2からなる
高屈折率膜層（Ｈ）３（光学膜厚λ/8≦［Ｈ］≦λ/4）
であり、第３層がSiO2からなる第２低屈折率膜層（L2）
４（光学膜厚０＜［L2］≦λ/4）であり、第４層（最外
層）が透明導電性膜厚（TC）５（光学膜厚）０＜［TC］
≦λ/4）である多層反射防止膜を設けることにより形成
されている。即ち、上記透明導電性フィルムは、ベース
フィルムと透明導電性膜とからなる従来の透明導電性フ
ィルムのベースフィルムと透明導電性膜の間に更に多層
反射防止膜の構成要素として低屈折率膜層、高屈折率膜
層を設けたものである。そしてこの多層反射防止膜を有
する２枚の透明導電性フィルムを導電面を内側にしてス
ペーサー６を介して対向させることにより目的とする透
明タッチパネルが形成される。FIG. 1 shows an example of a transparent touch panel obtained by using two transparent conductive films of the present invention. Each transparent conductive film on the base film 1, a first low refractive index film layer in which the first layer counted outward from the base film side is made of SiO 2 (L 1) 2 (optical film thickness 0 < [L 1 ] ≤ λ /
4), and the second layer is a high refractive index film layer (H) 3 made of TiO 2 and / or ZrO 2 (optical film thickness λ / 8 ≦ [H] ≦ λ / 4)
And the second low refractive index film layer (L 2 ) in which the third layer is made of SiO 2.
4 (optical film thickness 0 <[L 2 ] ≦ λ / 4), and the fourth layer (outermost layer) has a transparent conductive film thickness (TC) 5 (optical film thickness) 0 <[TC]
It is formed by providing a multilayer antireflection film with ≦ λ / 4). That is, the transparent conductive film is a low refractive index film layer as a component of a multilayer antireflection film between the base film and the transparent conductive film of a conventional transparent conductive film consisting of a base film and a transparent conductive film. A high refractive index film layer is provided. Then, the two transparent conductive films having the multilayer antireflection film are made to face each other with the conductive surface inside and the spacer 6 is interposed therebetween, whereby the target transparent touch panel is formed.
なお第１図に示された透明タッチパネルにおいては、
一対の透明導電性フィルムの両方の透明導電性フィルム
に多層反射防止膜が設けられているが、上側透明導電性
フィルム又は下側透明導電性フィルムのみに多層反射防
止膜を設けても良く、多層反射防止膜を片側のみに設け
た場合、両側に設けた場合よりも反射防止効果は劣る
が、本発明の目的を達成しうる。In the transparent touch panel shown in FIG. 1,
A multilayer antireflection film is provided on both transparent conductive films of the pair of transparent conductive films, but a multilayer antireflection film may be provided only on the upper transparent conductive film or the lower transparent conductive film, When the antireflection film is provided on only one side, the antireflection effect is inferior to that when it is provided on both sides, but the object of the present invention can be achieved.
また上記透明タッチパネルにおいて、透明導電性膜を
最外層とする多層反射防止膜とともに非導電面（すなわ
ち透明タッチパネルの外表面）にも反射防止膜（光学膜
厚λ/4以上3/4λ以下）が設けられていても良く、両面
に反射防止膜を有する透明導電性フィルムは透明導電性
膜を最外層とする多層反射防止膜のみ有するものに比べ
反射率特性が更に改良される。この場合、非導電面の反
射防止膜は一般に用いられている低屈折率膜単層膜ある
いは低屈折率膜層を最外層とする多層反射防止膜のいず
れでもよいが、広い波長域でより低反射が実現できる多
層反射防止膜であるのが好ましい。一般に利用されてい
る反射防止膜は絶縁層であるが、本発明の透明導電性フ
ィルムを用いた透明タッチパネルにおいて内側導電面反
射防止膜は透明導電性膜を最外層とする多層反射防止膜
であるため導電性は全く損われない。又スイッチング時
の接触抵抗、作動力も従来のタイプと比較して全く変わ
らない。その一方で多層反射防止膜としたことにより、
光学特性及び機械的耐久性が向上するという利点があ
る。Further, in the above transparent touch panel, an antireflection film (optical film thickness λ / 4 or more and 3 / 4λ or less) is formed on the non-conductive surface (that is, the outer surface of the transparent touch panel) together with the multilayer antireflection film having the transparent conductive film as the outermost layer. The transparent conductive film, which may be provided, has an antireflection film on both sides, and the reflectance characteristic is further improved as compared with a transparent conductive film having only a multilayer antireflection film having a transparent conductive film as an outermost layer. In this case, the antireflection film on the non-conductive surface may be either a commonly used low-refractive index film single-layer film or a multilayer antireflection film having a low-refractive index film layer as the outermost layer. It is preferably a multilayer antireflection film capable of realizing reflection. Although the generally used antireflection film is an insulating layer, in the transparent touch panel using the transparent conductive film of the present invention, the inner conductive surface antireflection film is a multilayer antireflection film having the transparent conductive film as the outermost layer. Therefore, the conductivity is not impaired at all. Moreover, the contact resistance and operating force during switching are not different from those of the conventional type. On the other hand, by using a multilayer antireflection film,
There is an advantage that the optical characteristics and mechanical durability are improved.
一般に電極グレードで使用される透明導電性膜の表面
抵抗は102〜103Ω／□ぐらいであり、成膜法、成膜温度
その他の条件により異なるものの、光学膜厚０＜［IT
O］≦λ/4のITO膜により、上記表面抵抗は十分実現可能
である。ITO膜の膜厚により、多層反射防止膜を構成す
る他の誘電体膜の反射防止効果を最大とするための最適
膜厚も変化する。第１低屈折率膜層L1は多層反射防止層
の構成要素として反射率調整機能をもつほか、密着性、
耐熱性その他の機械的耐久性を高める役割も有する。Generally, the surface resistance of transparent conductive film used in electrode grade is about 10 2 to 10 3 Ω / □, and the optical film thickness is 0 <[IT
The above surface resistance can be sufficiently realized by the ITO film of O] ≦ λ / 4. Depending on the film thickness of the ITO film, the optimum film thickness for maximizing the antireflection effect of other dielectric films forming the multilayer antireflection film also changes. The first low refractive index film layer L 1 has a reflectance adjusting function as a constituent element of the multilayer antireflection layer,
It also has the role of increasing heat resistance and other mechanical durability.
以上、本発明の透明導電性フィルムの応用例を透明タ
ッチパネルを例にして説明してきたが、本発明の透明導
電性フィルムの応用分野はこれに限定されるものではな
く、液晶用表示電極、面発熱式防曇膜等の用途にも用い
られる。Although the application examples of the transparent conductive film of the present invention have been described above by taking a transparent touch panel as an example, the application field of the transparent conductive film of the present invention is not limited thereto, and a display electrode for liquid crystal, a surface It is also used in applications such as heat generation type anti-fog films.
＜実施例＞ 以下、実施例を挙げて本発明を更に説明する。<Example> Hereinafter, the present invention will be further described with reference to examples.
実施例１ ポリエステルフィルム（300×210mm、125μ厚）の表
面に真空蒸着法（真空度10-5Torr、温度120℃）によ
り、第１低屈折率膜層（L1）として二酸化ケイ素（Si
O2）、高屈折率膜層（Ｈ）として酸化チタン（TiO2）、
第２低屈折率膜層（L2）として二酸化ケイ素（SiO2）を
順次、それぞれの光学膜厚が27.5nm、137.5nm、49.5nm
となるように形成した後、高周波イオンプレーティング
法（400W、150V、酸素分圧10-4Torr）により透明導電性
膜層としてITO膜を光学膜厚が72.3nmとなるように形成
した。得られた反射防止膜を有する透明導電性フィルム
の片面分光反射率曲線を第３図ｄに示す。得られた分光
反射率曲線に基づき計算することにより視感反射率1.4
％が算出され、良好な反射防止効果が得られた。又、表
面抵抗は220Ω／□であった。Example 1 The surface of a polyester film (300 × 210 mm, 125 μ thick) was subjected to vacuum deposition (vacuum degree 10 −5 Torr, temperature 120 ° C.) as a first low refractive index film layer (L 1 ) using silicon dioxide (Si).
O 2 ), titanium oxide (TiO 2 ) as the high refractive index film layer (H),
Silicon dioxide (SiO 2 ) is sequentially used as the second low refractive index film layer (L 2 ) and the respective optical film thicknesses are 27.5 nm, 137.5 nm and 49.5 nm.
After that, an ITO film was formed as a transparent conductive film layer to have an optical film thickness of 72.3 nm by a high frequency ion plating method (400 W, 150 V, oxygen partial pressure 10 −4 Torr). The single-sided spectral reflectance curve of the obtained transparent conductive film having an antireflection film is shown in FIG. 3d. The luminous reflectance of 1.4 was calculated by calculating based on the obtained spectral reflectance curve.
% Was calculated, and a good antireflection effect was obtained. The surface resistance was 220Ω / □.
実施例２ 実施例１の成膜条件に従ってポリエステルフィルム表
面にSiO2（L1）/TiO2（Ｈ）/SiO2（L2）/ITO（TC）、
TiO2（Ｈ）/SiO2（L2）/ITO（TC）、SiO2（L1）/Zr
O2（Ｈ）/SiO2（L2）/ITO（TC）、ITO（TC）のみの４
種類の膜構成で合計24種の多層反射防止膜を形成した。
ITO膜の光学膜厚を137.5nm、110nm、82.6nm、68.8nm、5
5nm、27.6nmと変化させた場合の各層の光学膜厚と、得
られた片面分光反射率曲線に基づく視感反射率及び表面
抵抗との関係を表１に示す。Example 2 According to the film forming conditions of Example 1, SiO 2 (L 1 ) / TiO 2 (H) / SiO 2 (L 2 ) / ITO (TC) was formed on the surface of the polyester film,
TiO 2 (H) / SiO 2 (L 2 ) / ITO (TC), SiO 2 (L 1 ) / Zr
O 2 (H) / SiO 2 (L 2 ) / ITO (TC), ITO (TC) only 4
A total of 24 types of multilayer antireflection coatings were formed with the types of film configurations.
The optical thickness of ITO film is 137.5nm, 110nm, 82.6nm, 68.8nm, 5
Table 1 shows the relationship between the optical film thickness of each layer when changed to 5 nm and 27.6 nm, and the luminous reflectance and surface resistance based on the obtained one-sided spectral reflectance curve.
表−１より明らかなように、、及びに示された
本発明の透明導電性フィルムはいずれもに示された比
較例の透明導電性フィルムに比べ、視感反射率が著しく
低く良好な反射防止効果が得られている。 As is clear from Table 1, the transparent conductive films of the present invention shown in, and and, in comparison with the transparent conductive films of the comparative examples shown in, have significantly low luminous reflectance and good antireflection. The effect is obtained.
実施例１及び実施例２の透明導電性フィルム並びに実
施例３の表−１、及びに示された透明導電性フィ
ルムを用いて得られた透明タッチパネルは、その導電性
を完全に維持しつつタッチパネルの画面のコントラスト
が良く、表示がクリアーで画面が見やすいという効果を
有していた。これに対して表−１のに比較例として示
された、ポリエステルフィルムにITO膜のみを被覆して
なる透明導電性フィルムを用いて得られた透明タッチパ
ネルは、上記の効果を奏することができなかった。A transparent touch panel obtained by using the transparent conductive films of Examples 1 and 2 and the transparent conductive films shown in Table-1 and Example 3 of Example 3 is a touch panel while completely maintaining its conductivity. The screen had good contrast, the display was clear, and the screen was easy to see. On the other hand, the transparent touch panel obtained by using the transparent conductive film obtained by coating the polyester film with the ITO film alone, which is shown as a comparative example in Table 1, cannot exhibit the above effects. It was
＜発明の効果＞ 以上詳述したように、本発明の透明導電性フィルム
は、その従来の機能である導電性等を完全に維持しつ
つ、その欠点である反射性を著しく軽減させたので、例
えば透明タッチパネルに応用した場合タッチパネル画面
のコントラストが良く、表示がクリアーであり、画面が
見やすい等の利点をもたらす。また本発明の透明導電性
フィルムは同時に機能的耐久性が向上しているので、そ
の応用製品の機械的耐久性も向上するという利点があ
る。<Effects of the Invention> As described in detail above, the transparent conductive film of the present invention, while completely maintaining the conductivity or the like which is the conventional function thereof, remarkably reduces the defectivity thereof. For example, when applied to a transparent touch panel, the contrast of the touch panel screen is good, the display is clear, and the screen is easy to see. Moreover, since the transparent conductive film of the present invention has improved functional durability at the same time, there is an advantage that the mechanical durability of the applied product is also improved.
第１図は本発明の透明導電性フィルムを用いて得られた
透明タッチパネルの一例を示す概略図、第２図は従来の
透明導電性フィルムを用いて得られた透明タッチパネル
を示す概略図、第３図は本発明の透明導電性フィルム等
の分光反射率曲線を示すグラフである。 １……ベースフィルム ２……第１低屈折率膜層（L1） ３……高屈折率膜層（Ｈ） ４……第２低屈折率膜層（L2） ５……透明導電性膜（TC） ６……スペーサーFIG. 1 is a schematic view showing an example of a transparent touch panel obtained by using the transparent conductive film of the present invention, and FIG. 2 is a schematic view showing a transparent touch panel obtained by using a conventional transparent conductive film, FIG. 3 is a graph showing a spectral reflectance curve of the transparent conductive film of the present invention. 1 ... Base film 2 ... First low-refractive index film layer (L 1 ) 3 ... High-refractive index film layer (H) 4 ... Second low-refractive index film layer (L 2 ) 5 ... Transparent conductivity Membrane (TC) 6 ... Spacer
Claims (1)
る多層反射防止膜を物理的方法または化学的気相成長法
により設けてなり、該多層反射防止膜における、基板側
から外方に向けて数えて第１層がSiO2からなる第１低屈
折率膜層L1（光学膜厚０＜［L1］≦λ/4、但しλは中心
波長500〜600nm）であり、第２層がTiO2および／または
ZrO2からなる高屈折率膜層Ｈ（光学膜厚λ/8≦［Ｈ］≦
λ/4）であり、第３層がSiO2からなる第２高屈折率膜層
L2（光学膜厚０＜［L2］≦λ/4）であり、第４層（最外
層）が透明導電性膜層TC（光学膜厚０＜［TC］≦λ/4）
であることを特徴とする透明導電性フィルム。1. A multilayer antireflection film having a transparent conductive film layer as an outermost layer is provided on a transparent substrate by a physical method or a chemical vapor deposition method. Is a first low refractive index film layer L 1 (optical film thickness 0 <[L 1 ] ≦ λ / 4, where λ is a central wavelength of 500 to 600 nm), the first layer of which is counted toward one side and which is made of SiO 2 . The second layer is TiO 2 and / or
High refractive index film layer H made of ZrO 2 (optical film thickness λ / 8 ≦ [H] ≦
λ / 4) and the second high-refractive index film layer in which the third layer is made of SiO 2.
L 2 (optical film thickness 0 <[L 2 ] ≦ λ / 4) and the fourth layer (outermost layer) is a transparent conductive film layer TC (optical film thickness 0 <[TC] ≦ λ / 4)
Is a transparent conductive film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10152587A JP2509215B2 (en) | 1987-04-24 | 1987-04-24 | Transparent conductive film with antireflection function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10152587A JP2509215B2 (en) | 1987-04-24 | 1987-04-24 | Transparent conductive film with antireflection function |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63265625A JPS63265625A (en) | 1988-11-02 |
| JP2509215B2 true JP2509215B2 (en) | 1996-06-19 |
Family
ID=14302898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10152587A Expired - Lifetime JP2509215B2 (en) | 1987-04-24 | 1987-04-24 | Transparent conductive film with antireflection function |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2509215B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011017795A (en) * | 2009-07-07 | 2011-01-27 | Innovation & Infinity Global Corp | Optical film structure |
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|---|---|---|---|---|
| US5513040B1 (en) * | 1994-11-01 | 1998-02-03 | Deposition Technology Inc | Optical device having low visual light transmission and low visual light reflection |
| JPH09305317A (en) * | 1996-05-21 | 1997-11-28 | Totoku Electric Co Ltd | Transparent type digitizer sensor plate and electromagnetic induction type digitizer |
| US6583935B1 (en) * | 1998-05-28 | 2003-06-24 | Cpfilms Inc. | Low reflection, high transmission, touch-panel membrane |
| US6958748B1 (en) | 1999-04-20 | 2005-10-25 | Matsushita Electric Industrial Co., Ltd. | Transparent board with conductive multi-layer antireflection films, transparent touch panel using this transparent board with multi-layer antireflection films, and electronic equipment with this transparent touch panel |
| DE60045758D1 (en) | 1999-08-31 | 2011-05-05 | Teijin Ltd | TRANSPARENT CONDUCTIVE MULTILAYER BODY AND THEREFORE PROVIDED TOUCH-SENSITIVE SCREEN |
| JP2001330707A (en) * | 2000-05-19 | 2001-11-30 | Nof Corp | Electrically conductive reflection reducing material, producing method and use |
| WO2002029830A1 (en) * | 2000-09-29 | 2002-04-11 | Matsushita Electric Industrial Co., Ltd. | Transparent substrate with conductive multilayer anti reflection film, transparent touch panel using the transparent substrate with multilayer anti reflection film and electronic apparatus using the touch panel |
| JP5346769B2 (en) * | 2009-10-21 | 2013-11-20 | 株式会社ジャパンディスプレイ | Touch panel and display device including the same |
| JP5413304B2 (en) * | 2010-05-20 | 2014-02-12 | 大日本印刷株式会社 | Touch panel sensor and laminate for producing touch panel sensor |
| JP5568398B2 (en) * | 2010-07-13 | 2014-08-06 | 株式会社カネカ | Substrate with transparent electrode and method for producing the same |
| US20130095308A1 (en) * | 2010-09-17 | 2013-04-18 | Lg Hausys, Ltd. | Transparent conductive film having excellent visibility and method of manufacturing the same |
| KR101313663B1 (en) * | 2011-06-22 | 2013-10-02 | 도레이 필름 카코우 가부시키가이샤 | Transparent conductive film and touch panel |
| KR20140074922A (en) * | 2011-09-07 | 2014-06-18 | 어플라이드 머티어리얼스, 인코포레이티드 | Method and system for manufacturing a transparent body for use in a touch panel |
| KR101392050B1 (en) * | 2012-01-06 | 2014-05-07 | (주)엘지하우시스 | Double-sided transparent conductive film with excellent visibility and method of manufacturing the same |
| TWI559330B (en) * | 2013-09-18 | 2016-11-21 | 鼎展電子股份有限公司 | Transparent conductive structure having metal mesh |
| CN112526650A (en) * | 2020-12-09 | 2021-03-19 | 浙江日久新材料科技有限公司 | Low impedance type ITO conductive film |
| CN115373055A (en) * | 2021-05-17 | 2022-11-22 | 大永真空设备股份有限公司 | Optical multilayer film and use thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5949501A (en) * | 1982-09-16 | 1984-03-22 | Toray Ind Inc | Transparent material having antireflection film |
| JPS6017421A (en) * | 1983-07-09 | 1985-01-29 | Konishiroku Photo Ind Co Ltd | Electrically conductive transparent film |
| JPS61159602A (en) * | 1984-12-30 | 1986-07-19 | Olympus Optical Co Ltd | Multi-layered antireflection film |
| JPS61190808A (en) * | 1985-02-19 | 1986-08-25 | 三井東圧化学株式会社 | Transparent electrode |
-
1987
- 1987-04-24 JP JP10152587A patent/JP2509215B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011017795A (en) * | 2009-07-07 | 2011-01-27 | Innovation & Infinity Global Corp | Optical film structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63265625A (en) | 1988-11-02 |
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