JP2508005B2 - Continuous diffusion bonding equipment - Google Patents

Continuous diffusion bonding equipment

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Publication number
JP2508005B2
JP2508005B2 JP61179550A JP17955086A JP2508005B2 JP 2508005 B2 JP2508005 B2 JP 2508005B2 JP 61179550 A JP61179550 A JP 61179550A JP 17955086 A JP17955086 A JP 17955086A JP 2508005 B2 JP2508005 B2 JP 2508005B2
Authority
JP
Japan
Prior art keywords
chamber
diffusion bonding
joined
materials
bonded
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61179550A
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Japanese (ja)
Other versions
JPS6335466A (en
Inventor
敏幸 那須
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
IHI Corp
Original Assignee
IHI Corp
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Filing date
Publication date
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Priority to JP61179550A priority Critical patent/JP2508005B2/en
Publication of JPS6335466A publication Critical patent/JPS6335466A/en
Application granted granted Critical
Publication of JP2508005B2 publication Critical patent/JP2508005B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Pressure Welding/Diffusion-Bonding (AREA)
  • Ceramic Products (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は拡散接合装置の改良に関し、被接合材の搬
入から接合後の冷却までを連続的に行なえるようにした
ものであり、特に大形の板材の接合に好適なものであ
る。
Description: TECHNICAL FIELD The present invention relates to an improvement of a diffusion bonding apparatus, which is capable of continuously performing from the loading of the materials to be bonded to the cooling after the bonding. It is suitable for joining plate-shaped materials.

〔従来の技術〕[Conventional technology]

金属同士や金属とセラミックス、あるいはセラミック
ス同士等の被接合材の接合法ひとつである拡散接合は、
平滑な接合面を接触させ、高温に保持して原子の相互拡
散によって接合するものである。
Diffusion bonding, which is one of the methods for joining materials such as metals, metals and ceramics, or ceramics,
The smooth bonding surfaces are brought into contact with each other, kept at a high temperature, and bonded by mutual diffusion of atoms.

この拡散接合では、被接合材の表面の仕上精度や酸化
皮膜の厚さ,性質が接合性に大きな影響を与えるととも
に、原子の拡散係数が大きく、再結晶温度が低い材料ほ
ど容易に接合できる。
In this diffusion bonding, the finishing accuracy of the surface of the material to be bonded and the thickness and properties of the oxide film have a great influence on the bondability, and a material having a large atomic diffusion coefficient and a low recrystallization temperature can be bonded more easily.

近年、接合強度の向上を目的として清浄にした接合面
に適当な材質のインサート材を入れることが研究され、
例えばスパッタリングにより膜をコーティングし、この
後に加熱押圧して拡散接合することが行なわれている。
In recent years, research has been conducted to insert an insert material of an appropriate material into a cleaned joint surface for the purpose of improving joint strength.
For example, a film is coated by sputtering, followed by heating and pressing for diffusion bonding.

このため従来使用されている拡散接合装置は、例えば
第5図に示すように、拡散接合室01に隣接して被接合材
Wの搬入・搬出を行なう搬入出室02を設け、この搬入出
室02に隣接して清浄・コーティング室03を設ける3室構
造が採られている。そして、各室間に密閉状態に保持す
るためのゲートバルブ04,05が設けられる一方、各室01,
02,03は図示しない排気装置に接続され、内部を高真空
状態に保持するようになっている。また、各室01,02,03
の下部には、被接合材Wを搬送するための搬送台車06が
設けられ、ドック付チェーンで駆動されるようになって
いる。
For this reason, the diffusion bonding apparatus conventionally used is provided with a loading / unloading chamber 02 for loading / unloading the material W to be bonded, which is adjacent to the diffusion bonding chamber 01, as shown in FIG. 5, for example. A three-chamber structure in which a cleaning / coating chamber 03 is provided adjacent to 02 is adopted. And, while the gate valves 04, 05 for maintaining the sealed state between the respective chambers are provided, the respective chambers 01,
02 and 03 are connected to an exhaust device (not shown) so that the inside is kept in a high vacuum state. In addition, each room 01, 02, 03
A transport carriage 06 for transporting the materials W to be joined is provided in the lower part of the, and is driven by a chain with a dock.

拡散接合室01内には、押圧用を一対のラム07が設けら
れるとともに、加熱用のヒータ08が設けてある。
In the diffusion bonding chamber 01, a pair of rams 07 for pressing are provided and a heater 08 for heating is provided.

搬入出室02内には、上下にそれぞれ上下方向に動くマ
ニプレータ09が設置され、側方に水平方向に動くマニプ
レータ010が設置されている。
In the loading / unloading chamber 02, manipulators 09 that move vertically are installed vertically, and a manipulator 010 that moves horizontally is installed laterally.

清浄・コーティング室03内には、清浄用のイオンビー
ムガン011が上部に取付けられ、下部にコーティング用
のスパッタ装置012が設置されており、これらに被接合
材Wを移動する回転移動用のマニプレータ013が側部に
取付けられるとともに、底部に上下方向に動くマニプレ
ータ014が設置してある。
In the cleaning / coating chamber 03, an ion beam gun 011 for cleaning is mounted on the upper part, and a sputtering device 012 for coating is installed on the lower part, and a manipulator 013 for rotating and moving the material W to be bonded thereto. Is attached to the side, and a manipulator 014 that moves in the vertical direction is installed on the bottom.

したがって、拡散接合にあたっては、被接合材Wを2
個搬入出室02に装入し、内部を真空排気したのち、清浄
・コーティング室03に通じるゲートバルブ05を開いて搬
送台車06によって清浄・コーティング室03に搬入し、ゲ
ートバルブ05を閉じる。
Therefore, in the diffusion bonding, the material W to be bonded is
After loading into the individual loading / unloading chamber 02 and evacuating the inside thereof, the gate valve 05 leading to the cleaning / coating chamber 03 is opened, and the carrier truck 06 loads the cleaning / coating chamber 03 into the cleaning / coating chamber 03, and the gate valve 05 is closed.

次いで、マニプレータ013とマニプレータ014により、
1個の被接合材Wをイオンビームガン011の下方に移動
し、イオンビームの照射によって接合面を清浄にする。
清浄にした被接合材Wをスパッタ装置012のターゲット
の上方に反転して位置させ、清浄面に所定の膜をコーテ
ィングする。
Then, by manipulator 013 and manipulator 014,
One bonded material W is moved below the ion beam gun 011 and the bonded surface is cleaned by irradiation with an ion beam.
The cleaned material W to be bonded is inverted and positioned above the target of the sputtering apparatus 012, and the clean surface is coated with a predetermined film.

同様にしてもう1個の被接合材Wも清浄・コーティン
グを行なったのち、ゲートバルブ05を開いて搬入出室02
に戻し、ゲートバルブ05を閉じてマニプレータ09,010で
接合面同士を重ね合わす。
In the same manner, after cleaning and coating another material W to be joined, the gate valve 05 is opened and the loading / unloading chamber 02
, The gate valve 05 is closed, and the joint surfaces are overlapped with the manipulator 09,010.

次いで、拡散接合室01に通じるゲートバルブ04を開い
て搬送台車06で被接合材Wを搬入し、移動する下側のラ
ム07上方に位置させてゲートバルブ04を閉じる。
Next, the gate valve 04 leading to the diffusion bonding chamber 01 is opened, the material W to be bonded is loaded by the transport carriage 06, and the gate valve 04 is closed by positioning it above the moving lower ram 07.

こののち、ラム07を上昇させて上方のラム07との間で
被接合材Wを挟んで加圧すると同時にヒータ08で加熱し
て拡散接合する。
After that, the ram 07 is raised and the material W to be bonded is sandwiched between the upper ram 07 and the upper ram 07 to be pressurized and simultaneously heated by the heater 08 to perform diffusion bonding.

接合終了後、被接合材Wを搬送台車06上に降下させて
冷却したのち、搬入出室02から取り出すことで全工程が
完了する。
After the joining is completed, the material W to be joined is dropped onto the transport carriage 06, cooled, and then taken out from the carry-in / out chamber 02, whereby the whole process is completed.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

このような拡散接合装置では、被接合材Wが搬入出室
02を中心に往きつ戻りつして搬入,搬出,重ね合せが行
なわれるため、経路が複雑で無駄な動きも多く、生産性
が低い。
In such a diffusion bonding apparatus, the material W to be bonded is in the loading / unloading chamber.
Since 02 is used to carry in, out, and superimpose back and forth, the route is complicated, there are many unnecessary movements, and productivity is low.

また、被接合材Wが搬入出室02から清浄・コーティン
グ室03に搬送された後、接合前に再び搬入出室02に戻さ
れるため、一度に1組の被接合材Wしか接合できず、作
業能率が低い。
Further, since the material W to be joined is conveyed from the loading / unloading chamber 02 to the cleaning / coating chamber 03 and then returned to the loading / unloading chamber 02 again before joining, only one set of materials W can be joined at one time. The work efficiency is low.

さらに、マニプレータ013,014を清浄とコーティング
に利用できるよう清浄とコーティングを一室で行なうよ
うにしているため、イオンビームの照射によって飛散し
たダストがコーティング膜に付着することもあり、拡散
接合の接合強度の低下を招くという問題がある。
Furthermore, since the manipulators 013 and 014 are cleaned and coated in a single chamber so that they can be used for cleaning and coating, dust scattered by the irradiation of the ion beam may adhere to the coating film, resulting in a decrease in the bonding strength of diffusion bonding. There is a problem of causing a decrease.

この発明は係る従来技術の問題点に鑑みてなされたも
ので、拡散接合に必要な各処理を一方向に送りながら連
続的に行なうことで、高品質かつ高能率で接合できる連
続子拡散接合装置を提供しようとするものである。
The present invention has been made in view of the problems of the related art, and a continuous diffusion welding device capable of performing high quality and high efficiency welding by continuously performing each process required for diffusion bonding in one direction. Is to provide.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点を解決するためこの発明は、複数組の被接
合材を収容する前室と、この前室から搬送される被接合
材の接合面を清浄にする清浄室と、清浄にされた被接合
材の接合面に拡散接合用のインサート材をコーティング
するコーティング室と、コーティングされた被接合材の
接合面同士を重ね合せて熱間で押圧接合する拡散接合室
と、拡散接合された被接合材を冷却する後室とを順次拡
散接合工程にしたがって配置し、前記前室と前記清浄室
との間および前記拡散接合室と前記後室との間を開閉可
能かつ可能なゲートバルブを備えた連結路で接続すると
ともに、前記清浄室と前記コーティング室の間および前
記コーティング室と前記拡散接合室との間を被整合材が
シール状態で通過可能なローラ式シール機構を備えた連
結路で接続する一方、これら各室内を非酸化性雰囲気に
保持する雰囲気調整装置を設けたことを特徴とするもの
である。
In order to solve the above problems, the present invention provides a front chamber for accommodating a plurality of sets of materials to be welded, a clean room for cleaning the bonding surface of the materials to be transferred conveyed from the front chamber, and a cleaned room. A coating chamber that coats the bonding surface of the bonding material with an insert material for diffusion bonding, a diffusion bonding chamber that superimposes the bonding surfaces of the coated materials to be bonded by hot pressing, and a diffusion bonding target material A rear chamber for cooling the material is sequentially arranged according to a diffusion bonding process, and a gate valve capable of opening and closing between the front chamber and the cleaning chamber and between the diffusion bonding chamber and the rear chamber is provided. In addition to connecting with a connecting path, the cleaning chamber and the coating chamber and between the coating chamber and the diffusion bonding chamber are connected by a connecting passage provided with a roller-type sealing mechanism through which a material to be matched can pass in a sealed state. While doing It is characterized in providing the atmospheric adjustment device for holding the respective chamber in a non-oxidizing atmosphere.

〔作 用〕[Work]

拡散接合に必要な処理を行なう前室,清浄室,コーテ
ィング室,拡散接合室,後室を拡散接合工程順に配置
し、開閉可能かつシール可能なゲートバルブを備えた連
通路や被接合材がシール状態で通過可能なローラ式シー
ル機構を備えた連結路で接続するようにしており、各室
を非酸化性雰囲気に保持しながら被接合材を順次搬送し
て連続的に拡散接合を行なうようにしている。
The front chamber, the clean room, the coating chamber, the diffusion bonding chamber, and the rear chamber, which perform the necessary processing for diffusion bonding, are arranged in the diffusion bonding process order, and the communication passage with the gate valve that can be opened and closed and the material to be bonded is sealed. It is designed to be connected by a connecting path equipped with a roller type seal mechanism that can pass through in a state, and while maintaining each chamber in a non-oxidizing atmosphere, the materials to be welded are sequentially conveyed to perform continuous diffusion bonding. ing.

〔実施例〕〔Example〕

以下この発明の一実施例を図面に基づき詳細に説明す
る。
An embodiment of the present invention will be described below in detail with reference to the drawings.

第1図および第2図はこの発明の連続式拡散接合装置
の一実施例にかかり、第1図は縦断面図、第2図は平断
面図である。
1 and 2 relate to an embodiment of the continuous diffusion bonding apparatus of the present invention. FIG. 1 is a longitudinal sectional view and FIG. 2 is a plan sectional view.

この連続式拡散接合装置40は、拡散接合に必要な各処
理を5室に分けて行なう5室構造が採られており、前室
1,清浄室2,コーティング室3,拡散接合室4,後室5が順に
配置され、開閉可能かつシール可能なゲートバルブ6あ
るいは、ローラ式シール機構7を具えた連結路8によっ
て各室が接続してある。
This continuous diffusion bonding apparatus 40 has a five-chamber structure in which each process required for diffusion bonding is divided into five chambers.
1, a clean room 2, a coating room 3, a diffusion bonding room 4, and a rear room 5 are arranged in order, and each room is connected by a gate valve 6 that can be opened and closed and can be sealed, or a connection path 8 equipped with a roller type seal mechanism 7. I am doing it.

また、各室1,2,3,4,5には、内部を非酸化性雰囲気に
保持する雰囲気調整装置9として真空排気装置が接続さ
れ、高真空状態に保持できるようになっている。
Further, a vacuum exhaust device is connected to each of the chambers 1, 2, 3, 4, and 5 as an atmosphere adjusting device 9 for maintaining the inside in a non-oxidizing atmosphere so that it can be maintained in a high vacuum state.

さらに、各室2〜5および各連結路8の下部には、搬
送ローラ10が設置され、電動機等で駆動することで、被
接合材Wを順次搬送するようになっている(第2図中に
は、搬送ローラを省略している。)。
Further, a conveying roller 10 is installed below each of the chambers 2 to 5 and each of the connecting paths 8 so that the materials W to be joined are sequentially conveyed by being driven by an electric motor or the like (in FIG. 2). The transport rollers are omitted in.).

前室1には、上部にシール機能を具えた扉11が設けて
あり、内部には、被接合材Wを載置して昇降するパンタ
グラフ式の昇降装置12が設置されるとともに、側部に昇
降装置12上の被接合材Wを搬送ローラ10上に押し出すた
めのプッシャ13が設けてある。
The front chamber 1 is provided with a door 11 having a sealing function on an upper part thereof, and a pantograph-type lifting device 12 for mounting and lifting a material W to be joined is installed therein and at a side portion thereof. A pusher 13 is provided for pushing out the material W to be joined on the lifting device 12 onto the transport roller 10.

清浄室2には、被接合材Wの接合面を製造にするため
イオンビームガン14が搬送ローラ10の下側に設けてあ
る。
In the clean room 2, an ion beam gun 14 is provided below the transport roller 10 in order to manufacture the bonding surface of the material W to be bonded.

コーティング室3には、清浄室2で清浄にされた被接
合材Wの清浄面に拡散接合の際のインサート材となる膜
をコーティングするコーティング装置15として抵抗加熱
式,高周波加熱式あるいは、電子ビーム式等の蒸発源装
置が設置してある。
The coating chamber 3 has a resistance heating type, a high frequency heating type, or an electron beam type as a coating device 15 for coating a film serving as an insert material for diffusion bonding on the clean surface of the material W to be bonded that has been cleaned in the cleaning room 2. An evaporation source device such as a formula is installed.

拡散接合室4内には、コーティングされた被接合材W
の接合面同士を重ね合せるため被接合材Wを交互に反転
する反転装置16が設置され、その前方の横に拡散接合時
の加圧用の一対のラム17が上下に配置されるとともに、
ラム17の周囲にヒータ18が設けられて加熱できるように
なっている。そして、反転装置16で搬送された被接合材
Wをラム17上に移載するため水平方向左右に動くプッシ
ャ19が設けられるとともに、次の室である後室5に搬送
するため水平方向前後に動くプッシャ20が設けてある。
また、反転装置16と加圧用ラム17間には、複数組の被接
合材W同士の接合を防止するため接着防止板21を供給す
る接着防止板供給装置22が設けてある。
In the diffusion bonding chamber 4, a coated material W to be bonded is formed.
A reversing device 16 for alternately reversing the materials W to be bonded is placed to overlap the bonding surfaces of, and a pair of rams 17 for pressurizing at the time of diffusion bonding are arranged vertically in front of it.
A heater 18 is provided around the ram 17 for heating. Then, a pusher 19 that moves horizontally to the left and right is provided to transfer the material W to be welded transferred by the reversing device 16 onto the ram 17, and in the horizontal direction forward and backward to transfer it to the rear chamber 5, which is the next chamber. A moving pusher 20 is provided.
Further, between the reversing device 16 and the pressurizing ram 17, there is provided an anti-adhesion plate supply device 22 for supplying the anti-adhesion plate 21 in order to prevent joining of a plurality of sets of materials W to be joined.

この反転装置16は、第3図にその断面構造を示すよう
に、架台23上に取付けたガイドローラ24上に回転筒25の
外周面が転動可能に支持されており、回転筒25の外周部
に取付けたリングギヤ26を図示しない電動機等で駆動さ
れるピニオン27に噛み合わすことで反転できるようにな
っている。この回転筒25の内側には、昇降シリンダ28で
昇降される昇降フレーム29が相対向して設けられ、それ
ぞれの昇降フレーム29の表面に被接合材Wを支持する支
持ローラ30が複数取付けてあり、図示しない電動機等で
駆動されるようになっている。
As shown in the sectional structure of FIG. 3, the reversing device 16 has an outer peripheral surface of a rotary cylinder 25 rotatably supported on a guide roller 24 mounted on a pedestal 23. It is possible to reverse by engaging a ring gear 26 attached to the portion with a pinion 27 driven by an electric motor or the like not shown. Elevating frames 29 that are raised and lowered by the raising and lowering cylinders 28 are provided inside the rotating cylinder 25 so as to face each other, and a plurality of support rollers 30 that support the workpiece W are attached to the surfaces of the respective raising and lowering frames 29. It is adapted to be driven by an electric motor (not shown) or the like.

後室5には、シール機能をもつ扉31が設けてあり、接
合完了後の製品を搬出できるようになっている。また、
後室5内には、接合後の被接合材Wを冷却するための冷
却装置(図示せず)が設けられ、例えばアルゴンや窒素
ガス等の不活性ガス循環式のもので構成されている。
A door 31 having a sealing function is provided in the rear chamber 5 so that the product after the joining is completed can be carried out. Also,
In the rear chamber 5, a cooling device (not shown) for cooling the joined materials W after joining is provided, and is constituted by, for example, an inert gas circulation type such as argon or nitrogen gas.

このような各室1〜5のうち、清浄室2とコーティン
グ室3、コーティング室3と拡散接合室4を接続する連
結路8には、ローラ式シール機構7が設けられており、
被接合材Wの通過中にもシールできるようになってい
る。
Among these chambers 1 to 5, a roller type seal mechanism 7 is provided in the connecting passage 8 connecting the clean chamber 2 and the coating chamber 3 and the coating chamber 3 and the diffusion bonding chamber 4.
A seal can be made even while the material W to be joined is passing.

このローラ式シール機構7は、第4図にその断面構造
を示すように、連結路に取付けられる下部ケーシング32
と上部ケーシング33との対向部にそれぞれシールローラ
34,35が配置され、上側のシールローラ35は上ケーシン
グ33に形成された凹部36に嵌合されている摺動板37で支
持されており、昇降可能となっている。38はシリンダの
ロッドである。
This roller type seal mechanism 7 has a lower casing 32 attached to the connecting path as shown in the sectional structure of FIG.
And a seal roller on the opposite side of the upper casing 33.
34 and 35 are arranged, and the upper seal roller 35 is supported by a slide plate 37 fitted in a recess 36 formed in the upper casing 33, and can be moved up and down. 38 is a rod of the cylinder.

したがって、上下のシールローラ34,35で挟持されな
がら搬送される被接合材Wは、シール状態で連結路を通
過して次室に送られる。
Therefore, the material W to be joined, which is conveyed while being sandwiched by the upper and lower seal rollers 34 and 35, is sent to the next chamber through the connecting path in a sealed state.

次に、かように構成した連続式拡散接合装置40による
拡散接合について説明する。
Next, the diffusion bonding by the continuous diffusion bonding device 40 configured as above will be described.

まず、前室1の扉11を開けてクレーン等により昇降装
置12上に複数組の被接合材Wを載置したのち、扉11を閉
じて雰囲気調整装置9により前記1,洗浄室2,コーティン
グ室3および拡散接合室4をそれぞれ真空排気する。
First, the door 11 of the antechamber 1 is opened, and a plurality of sets of materials W to be joined are placed on the elevating device 12 by a crane or the like, and then the door 11 is closed and the atmosphere adjusting device 9 is used to perform the above 1, cleaning chamber 2, coating The chamber 3 and the diffusion bonding chamber 4 are evacuated.

こののち、連結路8のゲートバルブ6を開けて最上段
の被接合材Wをプッシャ13で押し出して搬送ローラ10上
に載せ、次室の清浄室2に送る。
After that, the gate valve 6 of the connecting path 8 is opened, the material W at the uppermost stage is pushed out by the pusher 13, placed on the transport roller 10, and sent to the clean room 2 of the next chamber.

清浄室2に送られた被接合材Wは、搬送ローラ10によ
る搬送中にイオンビームガン14からの水素やアルゴン等
のイオンビームの照射により、接合面となる下面が清浄
にされる。そして、被接合材Wが次の連結路8に近づく
と、図示しない位置検出スイッチからの信号により、ロ
ーラ式シール機構6の上側のシールローラ35が引き上げ
られ、上下のシールローラ34,35で挟んでシールした状
態で次室のコーティング室3に搬送される。
The material W to be bonded sent to the cleaning chamber 2 is cleaned at the bonding surface by irradiation of an ion beam such as hydrogen or argon from the ion beam gun 14 during transportation by the transportation roller 10. Then, when the material W to be joined approaches the next connecting path 8, a signal from a position detection switch (not shown) pulls up the upper seal roller 35 of the roller type seal mechanism 6 and sandwiches it between the upper and lower seal rollers 34, 35. It is conveyed to the coating chamber 3 which is the next chamber in a state of being sealed with.

したがって、連結路8を被接合材Wが通過する間も清
浄室2内に浮遊しているダスト等がコーティング室3に
侵入することがない。
Therefore, dust and the like floating in the clean chamber 2 do not enter the coating chamber 3 even while the material W to be joined passes through the connecting path 8.

コーティング室3に送られた被接合材Wは、コーティ
ング室3内を搬送される間に、清浄にされた下面にコー
ティング装置15からの蒸発物質でコーティングされ、ロ
ーラ式シール機構7を介して次室の拡散接合室4に送ら
れる。
The material W to be welded sent to the coating chamber 3 is coated on the cleaned lower surface with the evaporation material from the coating device 15 while being conveyed in the coating chamber 3, and then is transferred to the next via the roller type seal mechanism 7. It is sent to the diffusion bonding chamber 4 of the chamber.

拡散接合室4に送られた被接合材Wが反転装置16内に
収容されると、支持ローラ30を停止したのち、反転装置
16の上側に位置する昇降シリンダ28で支持フレーム29が
下降し、支持ローラ30間に被接合材Wを挟み、回転筒25
を回転駆動して被接合材Wのコーティング面を上にする
よう反転する。そして、反転装置16の上側に位置する昇
降シリンダ28を縮めるとともに、下側に位置する昇降シ
リンダ28で搬送ローラ10との高さを調整して支持ローラ
30の駆動によりプッシャ19の前に位置させる。
When the material W to be welded sent to the diffusion bonding chamber 4 is accommodated in the reversing device 16, the supporting roller 30 is stopped and then the reversing device 16 is stopped.
The supporting frame 29 descends by the elevating cylinder 28 located on the upper side of 16, and the joined material W is sandwiched between the supporting rollers 30, and the rotating cylinder 25
Is rotated and inverted so that the coating surface of the material W to be bonded faces upward. Then, the lifting cylinder 28 located on the upper side of the reversing device 16 is contracted, and the height of the conveying roller 10 is adjusted by the lifting cylinder 28 located on the lower side to support rollers.
It is located in front of the pusher 19 by driving 30.

こののち、プッシャ19で接合面が上となっている被接
合材Wを加圧用ラム17上に載せ、下側の加工用ラム17を
被接合材Wの板厚分だけ下降させておく。
After that, the material W to be joined whose bonding surface is upward is placed on the pressing ram 17 by the pusher 19, and the lower processing ram 17 is lowered by the thickness of the material W to be joined.

このような被接合材Wの処理と平行して次の被接合材
Wを処理し、コーティングが終った被接合材Wを反転装
置16に載せるが、この被整合材Wは反転せずコーティン
グ面を下面としたままプッシャ19の前に搬送し、プッシ
ャ19で加圧用ラム17上に押し出して前の被接合材Wと重
ねる。
The next material W to be bonded is processed in parallel with the processing of the material W to be bonded, and the material W to be bonded, which has been coated, is placed on the reversing device 16. Is conveyed to the front of the pusher 19 while keeping the lower surface as the lower surface, and is pushed onto the pressurizing ram 17 by the pusher 19 to be overlapped with the material W to be joined in front.

こうして1組の被接合材Wが重ね合されたのち、接着
防止板21例えば黒鉛板、を接着防止供給装置22によって
プッシャ19の前に供給し、ラム17上の被接合材Wの上に
載せておく。
After a set of materials W to be bonded is superposed in this way, an adhesion prevention plate 21, for example, a graphite plate, is supplied in front of the pusher 19 by the adhesion prevention supply device 22 and placed on the materials W to be bonded on the ram 17. Keep it.

同様にして複数組の被接合材Wを全て処理し、加圧用
ラム17上に積み重ねる。この積み重ねの間、被接合材W
が1枚載せられる毎に加圧用ラム17を順次下降するとと
もに、1組の被接合材W毎に接着防止板21を重ねてお
く。
In the same manner, a plurality of sets of materials W to be joined are all processed and stacked on the pressing ram 17. During this stacking, the material to be welded W
The pressurizing ram 17 is sequentially lowered every time one sheet of the sheet is placed, and the adhesion preventing plate 21 is stacked for each set of the joined materials W.

最後の被接合材Wが積み重ねられると、加圧用ラム17
を下降させてヒータ18内に全部の被接合材Wを位置させ
たのち、加熱しながら加圧して拡散接合を行なう。
When the last materials W to be joined are stacked, the pressing ram 17
Is lowered to position all the materials W to be joined in the heater 18, and then pressure is applied while heating to perform diffusion bonding.

この拡散接合に際しては、各組の被接合材Wの間に黒
鉛板等の接着防止板21が挟んであるため、各組の接合が
防止される。
At the time of this diffusion bonding, since the adhesion prevention plate 21 such as a graphite plate is sandwiched between the materials W to be bonded of each set, the bonding of each set is prevented.

拡散接合の終了後、被接合材Wは、拡散接合室4の前
方のゲートバルブ6が開けられて搬送ローラ10上にプッ
シャ20で押し出され、予め真空状態としてある後室5内
に送られてゲートバルブ6が閉じられる。
After the completion of the diffusion bonding, the material W to be bonded is pushed out onto the conveying roller 10 by the pusher 20 with the gate valve 6 in front of the diffusion bonding chamber 4 opened and sent into the rear chamber 5 which is in a vacuum state in advance. The gate valve 6 is closed.

後室5では、図示しない冷却装置で被接合材Wが冷却
され、冷却後、扉31を開いて装置外に出され、全工程が
完了する。
In the rear chamber 5, the material W to be welded is cooled by a cooling device (not shown), and after cooling, the door 31 is opened to be taken out of the device, and all steps are completed.

なお、上記実施例では、清浄室内にイオンビームガン
を設置し、イオンビームで接合面を清浄にするようにし
たが、グロー放電を利用したスパッタリング装置によっ
て清浄にするようにしても良く、連続して清浄にできる
ものであれば良い。
In the above example, the ion beam gun was installed in the clean room and the bonding surface was cleaned with the ion beam, but it may be cleaned with a sputtering device using glow discharge, and the cleaning may be performed continuously. Anything that can be cleaned is acceptable.

また、コーティング室に設置するコーテイング装置も
スパッタリング装置やイオンプレーティング装置であっ
ても良く、コーティング物質も被接合材により適宜選定
すれば良く、ニッケル,ボロン,シリコン等種々の材料
が使用される。
Further, the coating device installed in the coating chamber may be a sputtering device or an ion plating device, and the coating material may be appropriately selected depending on the material to be bonded, and various materials such as nickel, boron, silicon, etc. are used.

さらに、接着防止のため黒鉛板に代え、黒鉛粉末を薄
く散布するようにしても良い。
Further, in order to prevent adhesion, instead of the graphite plate, graphite powder may be sprinkled thinly.

また、前室と清浄室の間に加熱室を設けて清浄化を容
易にするようにしたり、拡散接合室内の反転装置と加圧
用ラム(ホットプレス)との間に予熱室を設けて拡散接
合時の加熱時間の短縮化をはかるようにしても良い。
In addition, a heating chamber is provided between the front chamber and the cleaning chamber to facilitate cleaning, or a preheating chamber is provided between the reversing device and the pressure ram (hot press) in the diffusion bonding chamber to perform diffusion bonding. The heating time may be shortened.

さらに、雰囲気調整装置として真空排気装置を用いる
場合に限らず、アルゴンや窒素等の不活性ガス雰囲気と
したり、水素等の還元ガス雰囲気として非酸化性雰囲気
にするよう装置を設けても良い。
Further, the device is not limited to the case where a vacuum exhaust device is used as the atmosphere adjusting device, and an apparatus may be provided so that an atmosphere of an inert gas such as argon or nitrogen or a reducing gas atmosphere such as hydrogen is a non-oxidizing atmosphere.

〔発明の効果〕〔The invention's effect〕

以上一実施例とともに具体的に説明したようにこの発
明によれば、拡散接合に必要な処理を行なう前室,清浄
室,コーティング室,拡散接合室,後室を順に配置する
とともに、各室を開閉およびシールができる連結路で接
続したので、被接合材の搬入から接合後の搬出までを一
方向に連続的に送りながら拡散接合することができ、生
産性の大幅向上がはかれる。
According to the present invention as specifically described with reference to the above embodiment, the front chamber, the cleaning chamber, the coating chamber, the diffusion bonding chamber, and the rear chamber for performing the processing necessary for the diffusion bonding are sequentially arranged, and each chamber is arranged. Since the connection is made by a connection path that can be opened and closed and sealed, it is possible to carry out diffusion bonding while continuously feeding in one direction from the loading of the materials to be joined to the unloading after the joining, and the productivity is greatly improved.

また、被接合材を一方向に送ることで各処理ができる
ので、複数組の被接合材を1度に拡散接合でき、従来装
置に比べ、効率良く接合作業ができるとともに、処理時
間の大幅短縮となる。
In addition, each process can be performed by sending the materials to be bonded in one direction, so multiple sets of materials to be bonded can be diffusion bonded at one time, and the bonding work can be performed more efficiently and the processing time can be greatly shortened compared to the conventional device. Becomes

さらに、清浄室とコーティング室とを別室にしたので
清浄によって飛散したダスト等がコーティング膜に付着
する等の汚染がなく、接合強度が向上し、品質向上とな
る。
Further, since the clean room and the coating room are separated from each other, there is no contamination such as dust scattered by the cleaning adhered to the coating film, the bonding strength is improved, and the quality is improved.

また、連結路に開閉とシールとを行なう機構を設けた
ので、連続的にシールができ、被接合材の連続処理がで
きる。
Further, since the connection path is provided with a mechanism for opening and closing and sealing, it is possible to continuously seal and continuously process the materials to be joined.

【図面の簡単な説明】[Brief description of drawings]

第1図〜第4図はこの発明の連続拡散接合装置の一実施
例にかかり、第1図は縦断面図、第2図は平断面図、第
3図は反転装置の断面図、第4図はローラ式シール機構
の断面図、第5図は従来装置の縦断面図である。 1……前室、2……洗浄室、3……コーティング室、4
……拡散接合室、5……後室、6……ケートバルブ、7
……ローラ式シール機構、8……連結路、9……雰囲気
調整装置、W……被接合材。
1 to 4 relate to an embodiment of the continuous diffusion bonding apparatus of the present invention. FIG. 1 is a vertical sectional view, FIG. 2 is a plane sectional view, FIG. 3 is a sectional view of an inversion device, and FIG. FIG. 5 is a sectional view of a roller type seal mechanism, and FIG. 5 is a vertical sectional view of a conventional device. 1 ... Front room, 2 ... Washing room, 3 ... Coating room, 4
…… Diffusion bonding chamber, 5 …… Rear chamber, 6 …… Kate valve, 7
...... Roller type seal mechanism, 8 ...... connecting path, 9 ...... atmosphere adjusting device, W ...... Material to be joined.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】複数組の被接合材を収容する前室と、この
前室から搬送される被接合材の接合面を清浄にする清浄
室と、清浄にされた被接合材の接合面に拡散接合用のイ
ンサート材をコーティングするコーティング室と、コー
ティングされた被接合材の接合面同士を重ね合せて熱間
で押圧接合する拡散接合室と、拡散接合された被接合材
を冷却する後室とを順次拡散整合工程にしたがって配置
し、前記前室と前記清浄室との間および前記拡散接合室
と前記後室との間を開閉可能かつシール可能なゲートバ
ルブを備えた連結路で接続するとともに、前記清浄室と
前記コーティング室の間および前記コーティング室と前
記拡散接合室との間を被接合材がシール状態で通過可能
なローラ式シール機構を備えた連結路で接続する一方、
これら各室内を非酸化性雰囲気に保持する雰囲気調整装
置を設けたことを特徴とする連続式拡散接合装置。
1. A front chamber for accommodating a plurality of sets of materials to be joined, a cleaning chamber for cleaning the joining surface of the materials to be joined conveyed from the front chamber, and a joining surface of the cleaned materials to be joined. A coating chamber that coats the insert material for diffusion bonding, a diffusion bonding chamber that superimposes the bonding surfaces of the coated materials to be joined by hot pressing, and a rear chamber that cools the diffusion-bonded material. Are sequentially arranged according to a diffusion matching process, and the front chamber and the clean chamber and the diffusion bonding chamber and the rear chamber are connected by a connection path having a gate valve that can be opened and closed and can be sealed. In addition, while connecting the cleaning chamber and the coating chamber and between the coating chamber and the diffusion bonding chamber by a connection path including a roller-type sealing mechanism through which the material to be bonded can pass in a sealed state,
A continuous diffusion bonding apparatus, which is provided with an atmosphere adjusting device for maintaining each of these chambers in a non-oxidizing atmosphere.
JP61179550A 1986-07-30 1986-07-30 Continuous diffusion bonding equipment Expired - Lifetime JP2508005B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61179550A JP2508005B2 (en) 1986-07-30 1986-07-30 Continuous diffusion bonding equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61179550A JP2508005B2 (en) 1986-07-30 1986-07-30 Continuous diffusion bonding equipment

Publications (2)

Publication Number Publication Date
JPS6335466A JPS6335466A (en) 1988-02-16
JP2508005B2 true JP2508005B2 (en) 1996-06-19

Family

ID=16067704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61179550A Expired - Lifetime JP2508005B2 (en) 1986-07-30 1986-07-30 Continuous diffusion bonding equipment

Country Status (1)

Country Link
JP (1) JP2508005B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008155245A (en) * 2006-12-22 2008-07-10 Matsushita Electric Works Ltd Joining method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6082280A (en) * 1983-10-05 1985-05-10 Hitachi Ltd Joining device for clean surface

Also Published As

Publication number Publication date
JPS6335466A (en) 1988-02-16

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