JP2507792B2 - Method for manufacturing memory-disk substrate - Google Patents

Method for manufacturing memory-disk substrate

Info

Publication number
JP2507792B2
JP2507792B2 JP589A JP589A JP2507792B2 JP 2507792 B2 JP2507792 B2 JP 2507792B2 JP 589 A JP589 A JP 589A JP 589 A JP589 A JP 589A JP 2507792 B2 JP2507792 B2 JP 2507792B2
Authority
JP
Japan
Prior art keywords
coining
blank material
disk substrate
memory disk
peripheral edge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP589A
Other languages
Japanese (ja)
Other versions
JPH02179920A (en
Inventor
芳人 稲林
章 斎藤
知克 畑
淳 山崎
昭茂 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ITOCHU SHOJI KK
JFE Steel Corp
Furukawa Electric Co Ltd
Original Assignee
ITOCHU SHOJI KK
Furukawa Electric Co Ltd
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ITOCHU SHOJI KK, Furukawa Electric Co Ltd, Kawasaki Steel Corp filed Critical ITOCHU SHOJI KK
Priority to JP589A priority Critical patent/JP2507792B2/en
Publication of JPH02179920A publication Critical patent/JPH02179920A/en
Application granted granted Critical
Publication of JP2507792B2 publication Critical patent/JP2507792B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は中心に穴のあいたアルミニウム板、アルミニ
ウム合金板又はそれらの複合材からなるブランク材(以
下単にブランク材という。)から表面平滑なメモリーデ
ィスク用基板を製造する方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Industrial field of application) The present invention relates to a memory having a smooth surface from a blank material (hereinafter simply referred to as a blank material) made of an aluminum plate having a hole in the center, an aluminum alloy plate or a composite material thereof. The present invention relates to a method for manufacturing a disk substrate.

(従来の技術) 電子計算機の外部記憶装置に用いられるメモリーディ
スクは、通常アルミニウム板(サブストレート)に磁性
体を被覆した構造となっている。メモリーディスクは磁
気ヘッドによる読み書きを正確に行うために高度の平坦
性、平滑性が要求されるが、メモリーディスクの表面状
態はアルミニウム基板の表面状態に左右されるため、ア
ルミニウム基板には極めて高い寸法精度と高品質の表面
状態が要求される。
(Prior Art) A memory disk used in an external storage device of an electronic computer usually has a structure in which an aluminum plate (substrate) is coated with a magnetic material. The memory disk requires a high degree of flatness and smoothness in order to read and write accurately with a magnetic head, but the surface condition of the memory disk depends on the surface condition of the aluminum substrate, so the aluminum substrate has extremely high dimensions. Precision and high quality surface conditions are required.

従来、このようなメモリーディスク用基板を製造する
方法としては、ブランク材を(a)天然ダイヤモンドバ
イトにより超精密切削する方法、(b)砥石により両面
を同時に研磨する方法、(c)ラップ盤を用い砥粒およ
び温水により両面を同時に研磨する方法などがある。
Conventionally, as a method for manufacturing such a memory disk substrate, (a) a method of ultra-precision cutting a blank material with a natural diamond cutting tool, (b) a method of simultaneously polishing both surfaces with a grindstone, and (c) a lapping machine There is a method in which both surfaces are simultaneously polished with abrasive grains and warm water.

(発明が解決しようとする課題) 上記の基板の製造方法は、いずれも切削あるいは研削
による加工であるため、加工に時間がかかり、生産性が
悪いという問題があった。そこで硬貨の製造に通常用い
られる圧印加工の利用が検討されている。圧印加工の技
術は通常加工面に凹凸模様を形成する技術であるが、従
来のような凹凸模様の形成とは異なり、加圧面の平滑な
ダイスを用いてブランク材に平滑な面を圧印すること
で、メモリーディスク用基板を得ることが試みられた
(特開昭61−502787号公報)。
(Problems to be Solved by the Invention) Since all of the above-described substrate manufacturing methods are processing by cutting or grinding, there is a problem in that processing takes time and productivity is poor. Therefore, the use of coining, which is usually used for manufacturing coins, is being considered. The coining technique is usually a technique to form a concavo-convex pattern on the machined surface, but unlike the conventional method of forming a concavo-convex pattern, a smooth die is used to impress a smooth surface on the blank material. Attempts have been made to obtain a substrate for a memory disk (Japanese Patent Laid-Open No. 61-502787).

ところで通常のメモリーディスク用基板は、中心に穴
のあいたドーナツ状の円板であり、外周縁及び内周縁の
角部には面取り部を形成する必要がある。しかし、圧印
加工は通常、材料の広がり限度を規制するタイスリング
の中で行われるために、加工面の平滑なダイスによって
圧印加工を行うと、周縁の角部が立ったメモリーディス
ク用基板ができることとなる。周縁の面取り加工は圧印
加工後に行えなくもないが、面取り加工の際せっかく圧
印加工により形成した平滑な面が傷ついたり汚れたりす
る恐れが大きく、好適な方法とは言えない。さらには、
面取り加工を行う際は通常真空チャックにより旋盤に取
付けるが、その時に圧印加工により矯正された真直度等
の機械的特性が悪化する恐れがある。
By the way, a normal memory disk substrate is a donut-shaped disc having a hole in the center, and it is necessary to form chamfered portions at the corners of the outer peripheral edge and the inner peripheral edge. However, coining is usually performed in a tice ring that regulates the spread limit of the material.Therefore, when coining is performed with a die with a smooth surface, a memory disk substrate with raised peripheral corners can be formed. Becomes The chamfering of the peripheral edge can be performed after the coining, but the chamfering is not a preferable method because the smooth surface formed by the coining is likely to be damaged or soiled. Furthermore,
When performing chamfering, it is usually attached to a lathe by a vacuum chuck, but at that time, mechanical properties such as straightness corrected by coining may deteriorate.

本発明は上記のような従来技術の問題点を解決して、
圧印加工により、極めて生産性の高い、メモリーディス
ク用基板の製造方法を提供することを目的とするもので
ある。
The present invention solves the problems of the prior art as described above,
It is an object of the present invention to provide a method for manufacturing a memory disk substrate, which has extremely high productivity by coining.

(課題を解決するための手段) 本発明者らは、圧印加工における板厚の減少に伴う材
料の流れによる面取り部の減少率の度合いが、板厚の減
少率と密接な関係があることを見出し、この知見に基づ
いて本発明を完成するに至った。
(Means for Solving the Problem) The present inventors have found that the degree of reduction rate of the chamfered portion due to the flow of material accompanying the reduction of sheet thickness in coining has a close relationship with the reduction rate of sheet thickness. Based on this finding, the present invention has been completed based on this finding.

すなわち本発明は、中心に穴のあいたアルミニウム
板、アルミニウム合金板又はそれらの複合材からなるブ
ランク材を、加圧面の平滑な2つのダイスの間に挟ん
で、かつブランク材の広がり限度を規制するダイリング
の中で圧印加工を行うメモリーディスク用基板の製造方
法であって、圧印加工を行うにあたり前記ブランク材の
外周縁及び内周縁にあらかじめ製品として得ようとする
面取り幅の1〜1.7倍の大きさの面取り部を形成してお
き、板厚減少率1〜4%で圧印加工を行うことを特徴と
するメモリーディスク用基板の製造方法を提供するもの
である。
That is, according to the present invention, a blank material made of an aluminum plate having a hole in the center, an aluminum alloy plate or a composite material thereof is sandwiched between two dies having a smooth pressing surface, and the spread limit of the blank material is regulated. A method of manufacturing a memory disk substrate for coining in die ring, which is 1 to 1.7 times the chamfering width to be obtained as a product in advance on the outer peripheral edge and the inner peripheral edge of the blank material in performing coining. The present invention provides a method for manufacturing a memory disk substrate, characterized in that a chamfered portion having a size is formed and coining is performed at a plate thickness reduction rate of 1 to 4%.

第1図に示すようにメモリーディスク用基板の面取り
部2は、ブランク材1をブランキングする際にその外周
縁及び内周縁に形成されるものであり、その面取り幅W0
に対して、一般的に±50%の公差がある。つまり、0.5
〜1.5W0の面取り幅が製品として認められる。通常、圧
印加工では板厚の減少に伴う材料の流れにより面取り部
は小さくなり、その度合は板厚の減少率と密切な関係が
ある。
As shown in FIG. 1, the chamfered portion 2 of the memory disk substrate is formed on the outer peripheral edge and the inner peripheral edge of the blank material 1 when blanking the blank material 1, and the chamfered width W 0 thereof.
In general, there is a tolerance of ± 50%. That is, 0.5
A chamfer width of ~ 1.5W 0 is acceptable for the product. Usually, in coining, the chamfered portion becomes smaller due to the flow of material accompanying the reduction in plate thickness, and the degree thereof has a close relationship with the reduction rate of plate thickness.

また、この板厚減少率は圧印加工の特徴である平坦な
面を得るうえでも重要な要因で、板厚減少率が1%より
も小さすぎると本体の目的である平坦な面を得るのに十
分な塑性加工量をブランクに与えることができず、一方
板厚減少率が4%より大きいと過大な材料の流れにより
かえって平坦度が悪化する。通常製品の平坦度は10μm
以下である。
In addition, this plate thickness reduction rate is an important factor in obtaining a flat surface that is a characteristic of coining. If the plate thickness reduction rate is less than 1%, the flat surface that is the purpose of the main body will be obtained. If the blank cannot be given a sufficient amount of plastic working, and if the reduction rate of the sheet thickness is larger than 4%, the flatness is rather deteriorated due to the excessive flow of material. Normal product flatness is 10 μm
It is the following.

以上の理由により本発明では板厚減少率は1〜4%の
範囲とする。
For the above reasons, in the present invention, the reduction rate of the plate thickness is set in the range of 1 to 4%.

この板厚減少率の範囲において材料の流れを考慮する
と、ブランク材に形成しておく面取り部の幅は製品とし
て得ようとする面取り幅より小さくあるいは1.7倍より
大きい寸法では所要の面取り部を得ることは不可能であ
る。以上の理由により±50%の公差を持つ面取り部を作
製するために、予めブランク材に形成しておく面取り幅
は得ようとする面取り幅の1〜1.7倍とする。
Considering the flow of material within this range of plate thickness reduction, the width of the chamfer formed on the blank material is smaller than the chamfer width to be obtained as a product, or the required chamfer is obtained with a dimension larger than 1.7 times. Is impossible. For the above reason, in order to manufacture a chamfered portion having a tolerance of ± 50%, the chamfered width formed in advance on the blank material is 1 to 1.7 times the chamfered width to be obtained.

なお本発明に使用するブランク材は、アルミニウム
材、アルミニウム合金材、またはそれらの複合材を用い
ることができ、その板厚は2mm以下とするのがよい。こ
れは製品としての所定の板厚を得るために必要とされる
元板厚だからである。
The blank material used in the present invention may be an aluminum material, an aluminum alloy material, or a composite material thereof, and the plate thickness thereof is preferably 2 mm or less. This is because the original plate thickness required to obtain a predetermined plate thickness as a product.

(実施例) 以下実施例に基づいて本発明をさらに詳細に説明す
る。
(Example) The present invention will be described in more detail based on the following examples.

第1図に示すブランク材1の外周縁および内周縁に予
め形成しておく面取り部2の幅を各種変えたブランク材
を準備し、圧印加工後の面取り幅および平坦度を確認し
た。
Blank materials having various widths of the chamfered portions 2 formed in advance on the outer peripheral edge and the inner peripheral edge of the blank material 1 shown in FIG. 1 were prepared, and the chamfer width and flatness after coining were confirmed.

ブランク材の寸法は、板厚1.3mm、外径95mm、内径25m
mとし、なおブランク材の平坦度は約30μmである。潤
滑油を約100mg/m塗布し、300トンの荷重で圧印加工し
た。そして成形品について端部の寸法測定および光干渉
縞計により平坦度の測定を行なった。結果は第1表の通
りである。
The blank material has a thickness of 1.3 mm, an outer diameter of 95 mm, and an inner diameter of 25 m.
The flatness of the blank is about 30 μm. Lubricating oil was applied at about 100 mg / m and coined with a load of 300 tons. Then, the dimension of the end of the molded product was measured and the flatness was measured by an optical interference fringe meter. The results are shown in Table 1.

第1表の結果が示すように、製品の面取り幅のみを考
えると、板厚減少率が本発明法で規定した1〜4%の範
囲外の場合でも公差内に入るものもあるが、圧印加工法
の特徴である良好な平坦度を得ることが困難で、メモリ
ーディスク用基板として使用できる品質ではない。
As shown in the results in Table 1, when considering only the chamfer width of the product, there are some cases where the plate thickness reduction rate falls within the tolerance even if it is outside the range of 1 to 4% specified by the method of the present invention. It is difficult to obtain good flatness, which is a feature of the processing method, and it is not of a quality that can be used as a memory disk substrate.

(発明の効果) 以上説明したように本発明によればブランク材に予め
製品の面取り幅の1〜1.7倍の大きな面取り部を形成し
ておき、圧印加工は板圧減少率1〜4%で行うようにし
たので、平坦度を損なうことなく圧印と同時に所要の面
取り部を形成することができ、良好なメモリーディスク
用基板を効率よく製造できるという利点がある。
(Effect of the invention) As described above, according to the present invention, a large chamfered portion having a chamfering width of 1 to 1.7 times is formed in advance on a blank material, and coining is performed at a plate pressure reduction rate of 1 to 4%. Since this is done, the desired chamfered portion can be formed simultaneously with the coining without impairing the flatness, and there is an advantage that a good memory disk substrate can be efficiently manufactured.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明ブランク材の断面図である。 1……ブランク材、2……面取り部 FIG. 1 is a sectional view of the blank material of the present invention. 1 ... Blank material, 2 ... Chamfer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 斎藤 章 栃木県宇都宮市宝木本町1677―24 (72)発明者 畑 知克 栃木県日光市清滝丹勢町610 (72)発明者 山崎 淳 栃木県宇都宮市鶴田町7―62 (72)発明者 吉田 昭茂 神奈川県横浜市南区別所中里台26―1― 206 (56)参考文献 特開 昭61−502787(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Akira Saito 1677-24 Takaragi Honcho, Utsunomiya City, Tochigi Prefecture (72) Inventor Tomokatsu Hata 610 Kiyotaki Tanse Town, Nikko City, Tochigi Prefecture (72) Inventor Jun Yamazaki Utsunomiya City, Tochigi Prefecture 7-62 Tsuruta-cho (72) Inventor Akimoshi Yoshida 26-1-206 (56) Nakazatodai, Minami-Biery Center, Yokohama-shi, Kanagawa Reference JP-A-61-502787 (JP, A)

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】中心に穴のあいたアルミニウム板、アルミ
ニウム合金板又はそれらの複合材からなるブランク材
を、加圧面の平滑な2つのダイスの間に挟んで、かつブ
ランク材の広がり限度を規制するダイリングの中で圧印
加工を行うメモリーディスク用基板の製造方法であっ
て、圧印加工を行うにあたり前記ブランク材の外周縁及
び内周縁にあらかじめ製品として得ようとする面取り幅
1〜1.7倍の大きさの面取り部を形成しておき、板厚減
少率1〜4%で圧印加工を行うことを特徴とするメモリ
ーディスク用基板の製造方法。
1. A blank material made of an aluminum plate having a hole in the center, an aluminum alloy plate or a composite material thereof is sandwiched between two dies having a smooth pressing surface, and the spread limit of the blank material is regulated. A method of manufacturing a memory disk substrate for coining in a die ring, the chamfering width of which is 1 to 1.7 times as large as a product to be preliminarily obtained as a product on an outer peripheral edge and an inner peripheral edge of the blank material in performing coining. A method for manufacturing a substrate for a memory disk, characterized in that a chamfered portion is formed and coining is performed at a thickness reduction rate of 1 to 4%.
JP589A 1989-01-04 1989-01-04 Method for manufacturing memory-disk substrate Expired - Lifetime JP2507792B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP589A JP2507792B2 (en) 1989-01-04 1989-01-04 Method for manufacturing memory-disk substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP589A JP2507792B2 (en) 1989-01-04 1989-01-04 Method for manufacturing memory-disk substrate

Publications (2)

Publication Number Publication Date
JPH02179920A JPH02179920A (en) 1990-07-12
JP2507792B2 true JP2507792B2 (en) 1996-06-19

Family

ID=11462362

Family Applications (1)

Application Number Title Priority Date Filing Date
JP589A Expired - Lifetime JP2507792B2 (en) 1989-01-04 1989-01-04 Method for manufacturing memory-disk substrate

Country Status (1)

Country Link
JP (1) JP2507792B2 (en)

Also Published As

Publication number Publication date
JPH02179920A (en) 1990-07-12

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