JP2504924B2 - Method for manufacturing semiconductor device - Google Patents

Method for manufacturing semiconductor device

Info

Publication number
JP2504924B2
JP2504924B2 JP8995194A JP8995194A JP2504924B2 JP 2504924 B2 JP2504924 B2 JP 2504924B2 JP 8995194 A JP8995194 A JP 8995194A JP 8995194 A JP8995194 A JP 8995194A JP 2504924 B2 JP2504924 B2 JP 2504924B2
Authority
JP
Japan
Prior art keywords
conductor pattern
semiconductor chip
carrier tape
lead conductor
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP8995194A
Other languages
Japanese (ja)
Other versions
JPH077040A (en
Inventor
直之 田島
孝明 津田
保憲 千川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP8995194A priority Critical patent/JP2504924B2/en
Publication of JPH077040A publication Critical patent/JPH077040A/en
Application granted granted Critical
Publication of JP2504924B2 publication Critical patent/JP2504924B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体チップをキャリ
アテープに搭載してなる半導体装置の製造方法に関する
ものであり、更に詳しくは、製造工程中の静電破壊を防
止する手段に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a semiconductor device in which a semiconductor chip is mounted on a carrier tape, and more particularly to a means for preventing electrostatic breakdown during the manufacturing process. .

【0002】[0002]

【従来の技術】半導体チップ実装技術のワイヤレスボン
ディング法の1つにTape Automated B
onding(以下、「T.A.B.」という。)法が
ある。該T.A.B.法では金属箔をエッチングしたフ
ィンガー状リード導体を接続に用いるもので、このフィ
ンガー状リード導体は絶縁性の樹脂フィルムからなるキ
ャリアテープ上に作られる。
2. Description of the Related Art Tape Automated B is one of the wireless bonding methods for mounting semiconductor chips.
There is an oncoming (hereinafter referred to as "T.A.B.") method. The T. A. B. In the method, a finger-shaped lead conductor obtained by etching a metal foil is used for connection, and this finger-shaped lead conductor is formed on a carrier tape made of an insulating resin film.

【0003】図3は従来例の上面図であり、T.A.
B.法を説明するためのものである。長尺のキャリアテ
ープ1には孔2とリード導体パターン4が複数個形成さ
れており、リード導体パターン4はリード端子をなし、
銅箔等の金属膜をエッチングして形成される。前記リー
ド導体パターン4の孔2側の先端に半導体チップ3上の
バンプ(図示せず。)を対向させてボンディングする。
このようにT.A.B.法にて半導体チップ3を実装し
てデバイスを作成すると、キャリアテープ1を巻き取る
リールやその他装置との接触・摩擦によってデバイス表
面に静電荷が蓄積され、デバイスの電位が上昇する。そ
してデバイス上のリード導体パターン4がデバイスの表
面と異なる電位を有する他の物体と接触した時、その電
位差によって半導体チップ3内の絶縁膜等が破壊されて
フィルムキャリアデバイスとしての機能を失う。
FIG. 3 is a top view of a conventional example. A.
B. It is for explaining the law. The long carrier tape 1 has a plurality of holes 2 and a plurality of lead conductor patterns 4, and the lead conductor patterns 4 form lead terminals.
It is formed by etching a metal film such as a copper foil. A bump (not shown) on the semiconductor chip 3 is opposed to the tip of the lead conductor pattern 4 on the hole 2 side for bonding.
Thus, T. A. B. When the semiconductor chip 3 is mounted by the method to create a device, electrostatic charges are accumulated on the device surface due to contact and friction with the reel on which the carrier tape 1 is wound and other devices, and the potential of the device rises. When the lead conductor pattern 4 on the device comes into contact with another object having a potential different from the surface of the device, the potential difference destroys the insulating film in the semiconductor chip 3 and loses the function as a film carrier device.

【0004】こういったフィルムキャリアデバイスの静
電破壊を防止するため図4のようにキャリアテープ1上
の各デバイス毎に荷電粒子を吹き付けたり、或はデバイ
スと導電材料とを接触させることによりデバイス除電し
ていた。
In order to prevent electrostatic breakdown of such a film carrier device, as shown in FIG. 4, charged particles are sprayed onto each device on the carrier tape 1 or the device and the conductive material are brought into contact with each other. The charge was being removed.

【0005】[0005]

【発明が解決しようとする課題】上記図4に示すように
キャリアテープ1の各デバイス毎に荷電粒子を吹き付け
たり、或はデバイスと導電材料とを接触されることによ
りデバイスを除電される方法は各デバイス毎確実に行え
ば効果があるが、フィルムキャリアデバイスのように長
尺のキャリアテープ1上に連続して形成され、高速で工
程中を流れている場合、全デバイスを確実に除電するこ
とは難しい。そのため隣接するデバイスの一方だけ除電
され、もう一方が帯電したままの状態となり、デバイス
間に電位差が生じて製造工程中に静電破壊を引き起こ
し、不良となるという問題がある。
As shown in FIG. 4, there is a method of discharging electricity by spraying charged particles on each device of the carrier tape 1 or by contacting the device with a conductive material. Although it is effective to carry out each device surely, if it is continuously formed on a long carrier tape 1 like a film carrier device and flows through the process at a high speed, surely remove all charges from the devices. Is difficult Therefore, only one of the adjacent devices is discharged, and the other remains charged, resulting in a potential difference between the devices, causing electrostatic breakdown during the manufacturing process, resulting in a defect.

【0006】また、上記問題点に対しては、実開昭61
−17737号公報に、搭載された複数の半導体チップ
3を電気的に一体化する静電破壊防止用導体パターン1
0をキャリアテープ1上に形成して、複数の半導体チッ
プ3の除電を一度に行う方法が記載されている。
[0006] In addition, as for the above-mentioned problems,
No. 17737, an electrostatic breakdown preventing conductor pattern 1 for electrically integrating a plurality of mounted semiconductor chips 3 is disclosed.
A method is described in which 0 is formed on the carrier tape 1 and the plurality of semiconductor chips 3 are neutralized at once.

【0007】しかし、上記実開昭61−17737号公
報には、図5に示すように、半導体チップ3の全ての電
極が静電破壊防止用導体パターン10と接続するため、
デバイス試験を行う為には静電破壊防止用導体パターン
10を半導体チップ3から切り離さなくてはならないと
いう問題がある。尚、図5は他の従来例を示す上面図で
あり、2は孔、4はリード導体パターンを示す。
However, in Japanese Utility Model Laid-Open No. 61-17737, as shown in FIG. 5, since all the electrodes of the semiconductor chip 3 are connected to the electrostatic breakdown preventing conductor pattern 10,
In order to perform the device test, there is a problem that the electrostatic breakdown preventing conductor pattern 10 must be separated from the semiconductor chip 3. FIG. 5 is a top view showing another conventional example, in which 2 is a hole and 4 is a lead conductor pattern.

【0008】[0008]

【課題を解決するための手段】請求項1記載の本発明の
半導体装置の製造方法は、複数の半導体チップを、該半
導体チップの電極と接続されるリード導体パターンが複
数個、長軸方向に形成されたキャリアテープに搭載して
成る半導体装置の製造方法において、上記リード導体パ
ターンの内上記半導体チップの接地電極に接続されるリ
ード導体パターンと電気的に接続し、一体化するように
上記キャリアテープの長軸方向の縁部に静電破壊防止用
導体パターンを形成する工程と、上記キャリアテープに
上記半導体チップを搭載し、上記半導体チップの電極と
上記リード導体パターンとを接続する工程と、上記静電
破壊防止用導体パターンを上記半導体チップから切り離
す前に、上記半導体チップのテスト及び上記静電破壊防
止用導体パターンに導電材料治具を接触させることによ
る除電を行う工程とを有することを特徴とするものであ
る。
According to a first aspect of the present invention, there is provided a method of manufacturing a semiconductor device, wherein a plurality of semiconductor chips are provided with a plurality of lead conductor patterns connected to electrodes of the semiconductor chips in a longitudinal direction. In a method for manufacturing a semiconductor device mounted on a formed carrier tape, the carrier is electrically connected to and integrated with a lead conductor pattern of the lead conductor patterns that is connected to a ground electrode of the semiconductor chip. A step of forming a conductor pattern for preventing electrostatic breakdown at the edge in the long axis direction of the tape, a step of mounting the semiconductor chip on the carrier tape, and connecting the electrode of the semiconductor chip and the lead conductor pattern, Before separating the electrostatic breakdown preventing conductor pattern from the semiconductor chip, a test of the semiconductor chip and the electrostatic breakdown preventing conductor pattern It is characterized in that a step of performing a neutralization by contacting the conductive material jig.

【0009】また、請求項2記載の本発明の半導体装置
の製造方法は、複数の半導体チップを、該半導体チップ
の電極と接続されるリード導体パターンが複数個、長軸
方向に形成されたキャリアテープに搭載して成る半導体
装置の製造方法において、上記リード導体パターンの内
上記半導体チップの接地電極に接続されるリード導体パ
ターンと電気的に接続するように、上記キャリアテープ
上のリード導体パターン間のリード導体パターン分離領
域と上記キャリアテープの長軸方向の縁部とに、一体化
された静電破壊防止用導体パターンを形成する工程と、
上記キャリアテープに上記半導体チップを搭載し、上記
半導体チップの電極と上記静電破壊防止用リード導体パ
ターンとを接続する工程と、上記半導体チップの接地電
極と接続した導体パターンを上記半導体チップから切り
離す前に、上記半導体チップのテスト及び上記静電破壊
防止用導体パターンに導電材料治具を接触させることに
よる除電を行う工程とを有することを特徴とするもので
ある。
According to a second aspect of the present invention, there is provided a method of manufacturing a semiconductor device, wherein a plurality of semiconductor chips are provided with a plurality of lead conductor patterns connected to electrodes of the semiconductor chips in a longitudinal direction. In a method of manufacturing a semiconductor device mounted on a tape, between the lead conductor patterns on the carrier tape so as to be electrically connected to a lead conductor pattern connected to a ground electrode of the semiconductor chip among the lead conductor patterns. A step of forming an integrated electrostatic breakdown preventing conductor pattern on the lead conductor pattern separation region and the longitudinal edge of the carrier tape;
The step of mounting the semiconductor chip on the carrier tape, connecting the electrode of the semiconductor chip and the electrostatic breakdown preventing lead conductor pattern, and separating the conductor pattern connected to the ground electrode of the semiconductor chip from the semiconductor chip The method is characterized by further comprising a step of performing a test of the semiconductor chip and a static electricity removal by bringing a conductive material jig into contact with the electrostatic breakdown preventing conductor pattern.

【0010】[0010]

【作用】上述のようにキャリアテープにリード導体パタ
ーンと静電破壊防止用導体パターンとを形成することに
より、静電破壊防止用導体パターンの除電を行うと、全
デバイスの除電がほぼ均一に行え、更には半導体チップ
の接地電極の電位を下げることができる。
When the conductive pattern for preventing electrostatic breakdown is discharged by forming the lead conductive pattern and the conductive pattern for preventing electrostatic breakdown on the carrier tape as described above, all the devices can be discharged almost uniformly. Moreover, the potential of the ground electrode of the semiconductor chip can be lowered.

【0011】[0011]

【実施例】以下、一実施例に基づいて本発明について詳
細に説明するが、本発明はこれに限定されるものではな
い。
EXAMPLES The present invention will be described in detail below with reference to examples, but the present invention is not limited thereto.

【0012】図1は本発明の一実施例を示す上面図であ
る。
FIG. 1 is a top view showing an embodiment of the present invention.

【0013】以下に、本発明の一実施例の半導体装置の
製造工程を説明する。
The manufacturing process of a semiconductor device according to an embodiment of the present invention will be described below.

【0014】まず、長尺のキャリアテープ5の長軸方向
に複数個の孔6を形成し、1個の孔6の周囲にはリード
端子となるリード導体パターン7を、キャリアテープ5
に被着した銅箔等の金属膜をエッチングすることにより
形成する。また、前記リード導体パターン7の内半導体
チップ8の接地電極に接続されるリード導体7aと電気
的に接続するように、キャリアテープ5上のリード導体
パターン7間のリード導体パターン分離領域とキャリア
テープ5の縁部とに、一体化された静電破壊防止用の導
体パターン9a、bを形成する。
First, a plurality of holes 6 are formed in the long axis direction of a long carrier tape 5, and a lead conductor pattern 7 serving as a lead terminal is formed around each hole 6 in the carrier tape 5.
It is formed by etching a metal film such as a copper foil adhered to. In addition, the carrier tape and the lead conductor pattern separation area between the lead conductor patterns 7 on the carrier tape 5 and the carrier tape are electrically connected to the lead conductor 7a of the lead conductor pattern 7 which is connected to the ground electrode of the semiconductor chip 8. The integrated conductor patterns 9a and 9b for preventing electrostatic breakdown are formed on the edge portion of the electrode 5.

【0015】次に、上記各孔6毎に1つの半導体チップ
8をセットし、半導体チップ8上のバンプ(図示せ
ず。)とリード導体パターン7の孔6側の先端とを対向
させてボンディングして、デバイスを作成し、導体パタ
ーン9を半導体チップ8から切り離す前にデバイスのテ
ストを行う。そして、導体パターン9を高抵抗導電材料
の治具等に接触させ、実装工程中にリール、その他装置
類との接触、摩擦によりデバイス表面に蓄積された静電
荷を、デバイスから放電させることにより、全てのデバ
イスの除電がほぼ均一に行え、同時に半導体チップ8の
接地電極の電位を下げることが可能になる。
Next, one semiconductor chip 8 is set for each hole 6, and a bump (not shown) on the semiconductor chip 8 and a tip of the lead conductor pattern 7 on the hole 6 side are opposed to each other for bonding. Then, a device is created, and the device is tested before the conductor pattern 9 is separated from the semiconductor chip 8. Then, the conductor pattern 9 is brought into contact with a jig or the like made of a high-resistance conductive material, and electrostatic charges accumulated on the device surface due to contact with the reel and other devices and friction during the mounting process are discharged from the device. It is possible to remove charges from all devices substantially uniformly, and at the same time reduce the potential of the ground electrode of the semiconductor chip 8.

【0016】本実施例を幅が35mm及び70mmのキ
ャリアテープに実施した処、製造工程中でのデバイスの
静電破壊が著しく減少した。上記本実施例において放電
用の導体パターン9はリード導体パターン7の三方向を
囲むように形成されているが、本発明はこれに限定され
るものではなく図2に示すようにリード導体パターン7
四方を囲むように形成してもよい。
When this example was applied to carrier tapes having widths of 35 mm and 70 mm, electrostatic breakdown of the device during the manufacturing process was significantly reduced. In the present embodiment, the discharge conductor pattern 9 is formed so as to surround the lead conductor pattern 7 in three directions. However, the present invention is not limited to this, and the lead conductor pattern 7 is formed as shown in FIG.
You may form so that it may surround four sides.

【0017】[0017]

【発明の効果】以上、詳細に説明したように本発明を用
いることにより、半導体チップの接地電極の電位を下
げ、半導体チップ内の平面上の電位不均衡を緩和するこ
とが可能となるため、デバイス製造工程中の静電破壊を
防止することができる。
As described above in detail, by using the present invention, it is possible to lower the potential of the ground electrode of the semiconductor chip and alleviate the potential imbalance on the plane in the semiconductor chip. It is possible to prevent electrostatic breakdown during the device manufacturing process.

【0018】また、静電破壊防止用の導体パターンを切
り離さずに、製造された個々のデバイスのテストを行う
こともでき、テスト後の静電破壊防止の除電を特別な工
程の付加なしに行える。したがって、本発明は信頼性の
高い半導体デバイス製造工程の高効率化に寄与するもの
である。
Further, the manufactured individual devices can be tested without disconnecting the conductor pattern for preventing electrostatic breakdown, and static eliminator after the test can be removed without adding a special step. . Therefore, the present invention contributes to high efficiency of the highly reliable semiconductor device manufacturing process.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例の上面図である。FIG. 1 is a top view of an embodiment of the present invention.

【図2】本発明の他の実施例の上面図である。FIG. 2 is a top view of another embodiment of the present invention.

【図3】従来例の上面図である。FIG. 3 is a top view of a conventional example.

【図4】T.A.B.法でのデバイス除電方法を示す図
である。
FIG. A. B. It is a figure which shows the device static elimination method by the method.

【図5】他の従来例の上面図である。FIG. 5 is a top view of another conventional example.

【符号の説明】[Explanation of symbols]

5 キャリアテープ 6 孔 7、7a リード導体パターン 8 半導体チップ 9、9a、9b 導体パターン 5 carrier tape 6 holes 7, 7a lead conductor pattern 8 semiconductor chip 9, 9a, 9b conductor pattern

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭62−5652(JP,A) 特開 昭61−90453(JP,A) 実開 昭61−17737(JP,U) ─────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-62-5652 (JP, A) JP-A-61-90453 (JP, A) Actually-opened JP-A-61-17737 (JP, U)

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 複数の半導体チップを、該半導体チップ
の電極と接続されるリード導体パターンが複数個、長軸
方向に形成されたキャリアテープに搭載して成る半導体
装置において、 上記リード導体パターンの内上記半導体チップの接地電
極に接続されるリード導体パターンと電気的に接続し、
一体化するように上記キャリアテープの長軸方向の縁部
に静電破壊防止用導体パターンを形成する工程と、 上記キャリアテープに上記半導体チップを搭載し、上記
半導体チップの電極と上記リード導体パターンとを接続
する工程と、 上記静電破壊防止用導体パターンを上記半導体チップか
ら切り離す前に、上記半導体チップのテスト及び上記静
電破壊防止用導体パターンに導電材料治具を接触させる
ことによる除電を行う工程とを有することを特徴とす
る、半導体装置の製造方法。
1. A semiconductor device in which a plurality of semiconductor chips are mounted on a carrier tape having a plurality of lead conductor patterns connected to electrodes of the semiconductor chips and formed in a longitudinal direction, wherein Inside electrically connected to the lead conductor pattern connected to the ground electrode of the semiconductor chip,
A step of forming a conductor pattern for preventing electrostatic breakdown on the longitudinal edge of the carrier tape so as to be integrated; mounting the semiconductor chip on the carrier tape; and electrodes of the semiconductor chip and the lead conductor pattern And the step of connecting with, and before removing the electrostatic breakdown preventing conductor pattern from the semiconductor chip, the semiconductor chip is tested and static electricity removing is performed by bringing a conductive material jig into contact with the electrostatic breakdown preventing conductor pattern. A method of manufacturing a semiconductor device, comprising the steps of:
【請求項2】 複数の半導体チップを、該半導体チップ
の電極と接続されるリード導体パターンが複数個、長軸
方向に形成されたキャリアテープに搭載して成る半導体
装置の製造方法において、 上記リード導体パターンの内上記半導体チップの接地電
極に接続されるリード導体パターンと電気的に接続する
ように、上記キャリアテープ上のリード導体パターン間
のリード導体パターン分離領域と上記キャリアテープの
長軸方向の縁部とに、一体化された静電破壊防止用導体
パターンを形成する工程と、 上記キャリアテープに上記半導体チップを搭載し、上記
半導体チップの電極と上記リード導体パターンとを接続
する工程と、 上記静電破壊防止用導体パターンを上記半導体チップか
ら切り離す前に、上記半導体チップのテスト及び上記静
電破壊防止用導体パターンに導電材料治具を接触させる
ことによる除電を行う工程とを有することを特徴とす
る、請求項1記載の半導体装置の製造方法。
2. A method for manufacturing a semiconductor device, comprising: mounting a plurality of semiconductor chips on a carrier tape formed with a plurality of lead conductor patterns connected to electrodes of the semiconductor chips in a longitudinal direction. The lead conductor pattern separation region between the lead conductor patterns on the carrier tape and the long axis direction of the carrier tape are electrically connected to the lead conductor pattern connected to the ground electrode of the semiconductor chip in the conductor pattern. A step of forming an integrated electrostatic breakdown preventing conductor pattern on the edge portion, a step of mounting the semiconductor chip on the carrier tape, and connecting an electrode of the semiconductor chip and the lead conductor pattern, Before the conductor pattern for preventing electrostatic damage is separated from the semiconductor chip, the semiconductor chip is tested and the electrostatic damage is prevented. 2. A method of manufacturing a semiconductor device according to claim 1, further comprising a step of removing static electricity by bringing a conductive material jig into contact with the breakage preventing conductor pattern.
JP8995194A 1994-04-27 1994-04-27 Method for manufacturing semiconductor device Expired - Lifetime JP2504924B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8995194A JP2504924B2 (en) 1994-04-27 1994-04-27 Method for manufacturing semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8995194A JP2504924B2 (en) 1994-04-27 1994-04-27 Method for manufacturing semiconductor device

Publications (2)

Publication Number Publication Date
JPH077040A JPH077040A (en) 1995-01-10
JP2504924B2 true JP2504924B2 (en) 1996-06-05

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JP8995194A Expired - Lifetime JP2504924B2 (en) 1994-04-27 1994-04-27 Method for manufacturing semiconductor device

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US7679003B2 (en) 2005-05-24 2010-03-16 Nec Electronics Corporation Carrier tape

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