JP2504485Y2 - Polishing equipment - Google Patents
Polishing equipmentInfo
- Publication number
- JP2504485Y2 JP2504485Y2 JP1990004048U JP404890U JP2504485Y2 JP 2504485 Y2 JP2504485 Y2 JP 2504485Y2 JP 1990004048 U JP1990004048 U JP 1990004048U JP 404890 U JP404890 U JP 404890U JP 2504485 Y2 JP2504485 Y2 JP 2504485Y2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polished
- elastic member
- protective mask
- hard plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【考案の詳細な説明】 〔産業上の利用分野〕 本考案は、被研磨物を研磨剤で研磨する一方、保護マ
スクにより被研磨物の研磨を必要としない部分を研磨か
ら保護する乾式ブラストあるいは液体ホーニング等の研
磨装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention provides a dry blast method for polishing an object to be polished with an abrasive while protecting a portion of the object to be polished that does not require polishing from polishing. The present invention relates to a polishing device such as liquid honing.
従来、一般には、ガラス板および金属板等の平板のバ
リ取り、表面の処理あるいは切削加工を行う場合には、
研磨手段としての噴射ノズルから被研磨物としての平板
に研磨剤の粉体を高圧で噴射し、また、保護マスクを被
研磨物の研磨を必要としない部分に配することで、被研
磨物の研磨を必要としない部分を研磨から保護する研磨
装置としての乾式ブラストが用いられている。Conventionally, in general, when deburring flat plates such as glass plates and metal plates, surface treatment or cutting,
By injecting abrasive powder at a high pressure from a spray nozzle as a polishing means onto a flat plate as an object to be polished, and by disposing a protective mask in a portion of the object to be polished that does not require polishing, A dry blast is used as a polishing device that protects a portion that does not require polishing from polishing.
上記研磨装置は、保護マスクとしてテープマスクを備
えたものと、平板マスクを備えたものとが有る。The above-mentioned polishing apparatus includes one provided with a tape mask as a protective mask and one provided with a flat plate mask.
上記テープマスクを備えた研磨装置30は、第４図に示
すように、例えばビニルテープのような耐ブラスト性を
有し、且つテープ材41の背面に粘着剤層42を備えた粘着
テープを保護マスク40として、平板43の研磨を必要とし
ない部分に貼着させる。次に、噴射ノズル44から平板43
に研磨剤45を高圧で噴射する。これにより、平板43を、
平板43の研磨を必要としない部分を研磨から保護した状
態で研磨する。As shown in FIG. 4, the polishing device 30 equipped with the above-mentioned tape mask protects an adhesive tape having a blast resistance such as vinyl tape and having an adhesive layer 42 on the back surface of the tape material 41. The mask 40 is attached to a portion of the flat plate 43 that does not require polishing. Next, from the injection nozzle 44 to the flat plate 43
The polishing agent 45 is sprayed at a high pressure on. Thereby, the flat plate 43,
The flat plate 43 is polished in a state where the portion not requiring polishing is protected from polishing.
上記平板マスクを備えた研磨装置60は、第５図に示す
ように、例えばゴム板のような弾性による耐ブラスト性
を有する弾性部材、あるいは、例えば金属板のような硬
度による耐ブラスト性を有する硬質部材を保護マスク50
として、平板51の研磨を必要としない部分に載置し、次
に、錘等による押圧力52を保護マスク50に付与する。そ
の後は、第４図に示す研磨装置と同様の機構で、平板51
を、平板51の研磨を必要としない部分を研磨から保護し
た状態で研磨する。As shown in FIG. 5, the polishing apparatus 60 provided with the flat plate mask has an elastic member having a blast resistance due to elasticity such as a rubber plate, or has a blast resistance due to hardness such as a metal plate. Hard material protection mask 50
As a result, the flat plate 51 is placed on a portion that does not require polishing, and then a pressing force 52 by a weight or the like is applied to the protective mask 50. After that, with the same mechanism as the polishing apparatus shown in FIG.
Is polished with a portion of the flat plate 51 not requiring polishing protected from polishing.
尚、上記テープマスクを備えた研磨装置30は、保護マ
スク40を平板43の研磨を必要としない部分の形状に合わ
せて切断するため、保護マスク40の切断が可能であれ
ば、かなり複雑な形状にでも対応することができ、ま
た、比較的手軽に平板43の研磨を行うことができる。こ
のため、サンプルテストあるいは少量の平板43の加工生
産に適した装置といえる。Since the polishing device 30 including the tape mask cuts the protective mask 40 in accordance with the shape of the flat plate 43 that does not require polishing, if the protective mask 40 can be cut, it has a considerably complicated shape. The flat plate 43 can be polished relatively easily. For this reason, it can be said that the device is suitable for a sample test or processing and production of a small number of flat plates 43.
また、上記平板マスクを備えた研磨装置60は、イニシ
ャルコストは高いが、保護マスク50を洗浄することによ
り、保護マスク50を繰り返して使用することができる。
このため、トータル的なコスト面において、大量の平板
51の加工生産に適しており、また、保護マスク50の被研
磨物に対する着脱が比較的簡単なため、保護マスク50の
平板51上での位置決めさえできれば、平板51の加工生産
の自動化も容易な装置といえる。Although the polishing apparatus 60 including the flat plate mask has a high initial cost, the protective mask 50 can be repeatedly used by cleaning the protective mask 50.
Therefore, in terms of total cost, a large number of flat plates
It is suitable for processing production of 51, and since the attachment and removal of the protective mask 50 with respect to the object to be polished is relatively easy, if the positioning of the protective mask 50 on the flat plate 51 is possible, the automation of the production of the flat plate 51 is easy. It can be called a device.
ところで、第４図に示すテープマスクを備えた研磨装
置30は、平板43の研磨を行った後に、保護マスク40を平
板43から剥離させるため、保護マスク40の粘着力が劣化
する。このため、平板43から剥離した保護マスク40を再
使用した場合には、保護マスク40を平板43に確実に貼着
することができないないため、平板43の研磨中に保護マ
スク40が剥離して、研磨作業の能率が低下する。また。
平板43の研磨毎に新しい保護マスク40を使用した場合に
は、大量の平板41の加工生産を行う際、コストが増大す
る。By the way, in the polishing apparatus 30 equipped with the tape mask shown in FIG. 4, the protective mask 40 is peeled from the flat plate 43 after the flat plate 43 is polished, so that the adhesive force of the protective mask 40 deteriorates. Therefore, when the protective mask 40 separated from the flat plate 43 is reused, the protective mask 40 cannot be surely attached to the flat plate 43, and therefore the protective mask 40 peels off during polishing of the flat plate 43. However, the efficiency of polishing work is reduced. Also.
When a new protective mask 40 is used every time the flat plate 43 is polished, the cost increases when a large number of flat plates 41 are processed and produced.
一方、第５図に示す平板マスクを備えた研磨装置60
は、保護マスク50に押圧力52を付与する際、押圧力52が
保護マスク50の全面に分散されるため、保護マスク50の
エッジ部50aに、保護マスク50と平板51との隙間が生じ
る。このため、平板51の研磨時に、上記隙間内に研磨剤
45が浸入して、平板15の表面51aに損傷が生じたり、隙
間内に浸入した研磨剤45が平板51の表面51aに固着した
り、あるいは、研磨剤45が平板51の研磨を必要としない
部分を研磨することにより、正確な寸法精度で平板51を
研磨することができないといった問題を有している。On the other hand, a polishing apparatus 60 equipped with a flat plate mask shown in FIG.
When the pressing force 52 is applied to the protective mask 50, the pressing force 52 is dispersed over the entire surface of the protective mask 50, so that a gap between the protective mask 50 and the flat plate 51 is formed at the edge portion 50a of the protective mask 50. Therefore, when polishing the flat plate 51, an abrasive
If 45 penetrates and the surface 51a of the flat plate 15 is damaged, the abrasive 45 that has penetrated into the gap adheres to the surface 51a of the flat plate 51, or the abrasive 45 does not require polishing of the flat plate 51. There is a problem that the flat plate 51 cannot be polished with accurate dimensional accuracy by polishing the portion.
本考案に係る研磨装置は、上記課題を解決するため
に、被研磨物を研磨剤により研磨する研磨手段と、被研
磨物の研磨を必要としない部分に配される保護マスクと
を備え、研磨手段が被研磨物を研磨するときに、保護マ
スクが押圧されて、被研磨物の研磨を必要としない部分
を研磨から保護する研磨装置において、以下の手段を講
じている。In order to solve the above problems, a polishing apparatus according to the present invention comprises a polishing means for polishing an object to be polished with an abrasive, and a protective mask arranged on a portion of the object to be polished which does not require polishing. When the means polishes the object to be polished, the protective mask is pressed to protect the portion of the object to be polished that does not require polishing from the polishing, and the following means are taken.
即ち、前記保護マスクは、下面のエッジ部の全周に堤
状の突起部が形成された弾性部材と、弾性部材の上面部
と略同形状に形成されて、前記上面部に配される上面硬
質板と、弾性部材の突起部に包囲された弾性部材の下面
部と略同形状に形成されて、前記下面部に配される下面
硬質板と、弾性部材と上面硬質板と下面硬質板とを一体
に固定する固定部材とを備えている。That is, the protective mask is formed with an elastic member in which a bank-shaped projection is formed on the entire circumference of the edge portion of the lower surface, and an upper surface that is formed in substantially the same shape as the upper surface portion of the elastic member and is disposed on the upper surface portion. A hard plate, a lower surface hard plate formed in substantially the same shape as the lower surface portion of the elastic member surrounded by the protrusions of the elastic member, and arranged on the lower surface portion; an elastic member, an upper surface hard plate, and a lower surface hard plate; And a fixing member for integrally fixing the.
上記の構成によれば、弾性部材の突起部のみが被研磨
物に当接し、また、弾性部材の上面部と下面部とに、上
面硬質板と下面硬質板とが各々固定されているため、保
護マスクを押圧したときに、保護マスクが撓むことな
く、押圧力を上記突起部に集中することができる。この
ため、保護マスクを被研磨物に完全に密着することがで
きる。According to the above configuration, only the protrusion of the elastic member contacts the object to be polished, and the upper surface and the lower surface of the elastic member are fixed to the upper hard plate and the lower hard plate, respectively, When the protective mask is pressed, the pressing force can be concentrated on the protrusion without bending the protective mask. Therefore, the protective mask can be brought into complete contact with the object to be polished.
本考案の一実施例を第１図ないし第３図に基づいて説
明すれば、以下の通りである。One embodiment of the present invention will be described below with reference to FIGS.
本考案に係る研磨装置20は、第１図に示すように、研
磨剤９を高圧で噴射する噴射ノズル８と、被研磨物７の
研磨を必要としない部分に載置される保護マスク10とを
備えている。As shown in FIG. 1, a polishing apparatus 20 according to the present invention includes a spray nozzle 8 for spraying a polishing agent 9 at a high pressure, and a protective mask 10 placed on a portion of an object 7 to be polished that does not require polishing. Is equipped with.
上記保護マスク10は、第３図に示すように、被研磨物
７の研磨を必要としない部分の形状に合わせて形成さ
れ、且つ後述の突起部1cが形成された弾性部材１と、弾
性部材１の上面部1aと略同形状に形成されて、上記上面
部1aに配される上面硬質板２と、弾性部材１の突起部1c
に包囲された弾性部材１の下面部1bと略同形状に形成さ
れて、上記下面部1bに配される下面硬質板３と、これら
弾性部材１と上面硬質板２と下面硬質板３とを一体に固
定する固定部材４とから構成されている。As shown in FIG. 3, the protective mask 10 is formed in conformity with the shape of the portion of the object to be polished 7 that does not require polishing, and has an elastic member 1 on which a projection 1c described later is formed, and an elastic member. 1. The upper hard plate 2 which is formed in substantially the same shape as the upper surface 1a of the first member 1 and is arranged on the upper surface 1a, and the protrusion 1c of the elastic member 1.
The lower surface hard plate 3 formed in substantially the same shape as the lower surface 1b of the elastic member 1 surrounded by the lower surface 1b, and the elastic member 1, the upper surface hard plate 2 and the lower surface hard plate 3 The fixing member 4 is integrally fixed.
上記弾性部材１は、天然ゴム、１液性のシリコン樹脂
および２液性のシリコン樹脂等の弾性回復力を有するも
のである。The elastic member 1 is made of natural rubber, a one-component silicone resin, a two-component silicone resin or the like and has an elastic recovery force.
上記弾性部材１は、第２図に示すように、下面のエッ
ジ部の全周に堤状の突起部1cを形成している。上記突起
部1cは、弾性部材１の下面部1bに厚さ0.5〜1.0mm程度の
下面硬質板３を配するように、３〜5mm程度の高さＨに
形成されている。また、突起部1cの幅Ｄは、研磨加工時
に突起部1cが潰れないように、２〜5mm程度で形成され
ている。As shown in FIG. 2, the elastic member 1 has a bank-shaped protrusion 1c formed on the entire circumference of the edge portion of the lower surface. The protrusion 1c is formed at a height H of about 3 to 5 mm so that the lower surface hard plate 3 having a thickness of about 0.5 to 1.0 mm is arranged on the lower surface 1b of the elastic member 1. The width D of the protrusion 1c is set to about 2 to 5 mm so that the protrusion 1c is not crushed during polishing.
尚、高さＨと幅Ｄとの関係は、 （H/D）＜３ 程度となるのが望ましい。 The relationship between the height H and the width D is preferably (H / D) <3.
上記上面硬質板２と下面硬質板３とは、スチレン、Ti
合金およびセラミック等の研磨加工に対して耐久力を有
するものであり、また、これら上面硬質板２と下面硬質
板３とは弾性部材１に、これら三者を貫通して設けられ
た固定部材４としてのビス５…とナット６…により固定
されている。The upper hard plate 2 and the lower hard plate 3 are made of styrene, Ti
The upper hard plate 2 and the lower hard plate 3 have durability against polishing of alloys and ceramics, and the fixing member 4 is provided on the elastic member 1 so as to penetrate these three members. Are fixed by screws 5 ... and nuts 6 ...
尚、上記固定部材３は、ビス５…とナット６…とに限
定するものではなく、リベットあるいは上面硬質板２と
下面硬質板３とを各々弾性部材１に貼着する粘着剤等の
ものであっても良い。The fixing member 3 is not limited to the screws 5 and the nuts 6, but may be a rivet or an adhesive agent or the like for attaching the upper hard plate 2 and the lower hard plate 3 to the elastic member 1, respectively. It may be.
上記の構成において、本研磨装置20により、被研磨物
７を研磨するときには、先ず、保護マスク10を、被研磨
物７の研磨を必要としない部分の形状に合うように、被
研磨物７上に載置する。次に、錘等による押圧力12を保
護マスク10に付与する。これにより、突起部1cが被研磨
物７に密着され、且つ突起部1cに包囲された部分11が中
空状態となる。次に、噴射ノズル８から被研磨物７に研
磨剤９を噴射する。In the above configuration, when the object 7 to be polished is polished by the present polishing device 20, first, the protective mask 10 is placed on the object 7 to be polished so as to match the shape of the portion of the object 7 that does not require polishing. Place on. Next, a pressing force 12 by a weight or the like is applied to the protective mask 10. As a result, the protrusion 1c is brought into close contact with the object 7 to be polished, and the portion 11 surrounded by the protrusion 1c becomes hollow. Next, the abrasive 9 is injected from the injection nozzle 8 onto the object 7 to be polished.
これにより、研磨剤９が被研磨物７を研磨する一方、
保護マスク10が被研磨物７の研磨を必要としない部分を
研磨から保護する。As a result, the abrasive 9 polishes the object 7 to be polished,
The protective mask 10 protects the portion of the object 7 to be polished that does not require polishing from polishing.
尚、上記上面硬質板２の板厚は、研磨に耐えうる強度
を上面硬質板２にもたせるため、1mm以上が適当であ
る。また、上面硬質板２の材質は、上面硬質板２の耐久
性とコストとの両者の比重に応じて選択することができ
る。The upper hard plate 2 preferably has a thickness of 1 mm or more in order to give the upper hard plate 2 sufficient strength to withstand polishing. Further, the material of the upper hard plate 2 can be selected according to the specific gravity of both the durability and the cost of the upper hard plate 2.
また、上記弾性部材１は、弾性部材１の成形型を用い
て製造した場合、複雑な形状の弾性部材１の製造にも対
応でき、且つ同一形状の弾性部材１を大量に製造するこ
とが容易である。Further, when the elastic member 1 is manufactured by using the mold for the elastic member 1, it is possible to manufacture the elastic member 1 having a complicated shape, and it is easy to mass-produce the elastic member 1 having the same shape. Is.
本考案に係る研磨装置は、以上のように、保護マスク
が、下面のエッジ部の全周に堤状の突起部が形成された
弾性部材と、弾性部材の上面部と略同形状に形成され
て、前記上面部に配される上面硬質板と、弾性部材の突
起部に包囲された弾性部材の下面部と略同形状に形成さ
れて、前記下面部に配される下面硬質板と、弾性部材と
上面硬質板と下面硬質板とを一体に固定する固定部材と
を備えている構成である。As described above, in the polishing apparatus according to the present invention, the protective mask is formed in the same shape as the elastic member in which the bank-shaped protrusion is formed on the entire circumference of the edge of the lower surface and the upper surface of the elastic member. An upper surface hard plate arranged on the upper surface portion, a lower surface hard plate formed on the lower surface portion of the elastic member surrounded by the protrusions of the elastic member in substantially the same shape and arranged on the lower surface portion, and elastic. This is a configuration including a fixing member that integrally fixes the member, the upper hard plate, and the lower hard plate.
これにより、上記突起部を被研磨物に完全に密着する
ことができるため、被研磨物の研磨を必要としない部分
に研磨剤が浸入することがなく、被研磨物の研磨精度を
向上させる一方、保護マスクの突起部に包囲された部分
が中空状態となるため、保護マスクの突起部に包囲され
た部分に損傷が生じる虞れがない。また、被研磨物の大
量の加工生産時には、保護マスクを洗浄することで、保
護マスクの再使用が可能なため、トータル的なコスト面
で有利であり、さらには、研磨装置の自動化が容易とな
るという効果を奏する。As a result, the protrusions can be brought into complete contact with the object to be polished, so that the polishing agent does not penetrate into a portion of the object to be polished that does not require polishing, and the polishing accuracy of the object to be polished is improved. Since the portion of the protective mask surrounded by the protrusions is in a hollow state, the portion of the protective mask surrounded by the protrusions is not likely to be damaged. In addition, when a large number of products to be polished are produced, the protective mask can be reused by washing the protective mask, which is advantageous in terms of total cost. Furthermore, the polishing device can be easily automated. Has the effect of becoming.
第１図ないし第３図は本考案の一実施例を示すものであ
る。 第１図は研磨時の研磨装置を示す矢視断面図である。 第２図は弾性部材を示す縦断面図である。 第３図は保護マスクを示す縦断面図である。 第４図は従来例を示すものであって、テープマスクを備
えた研磨装置を示す矢視断面図である。 第５図は他の従来例を示すものであって、平板マスクを
備えた研磨装置を示す矢視断面図である。 １は弾性部材、1cは突起部、２は上面硬質板、３は下面
硬質板、４は固定部材、７は被研磨物、８は噴射ノズル
（研磨手段）、９は研磨剤、10は保護マスク、12は押圧
力、20は研磨装置である。1 to 3 show an embodiment of the present invention. FIG. 1 is a cross-sectional view showing the polishing apparatus during polishing. FIG. 2 is a vertical sectional view showing the elastic member. FIG. 3 is a vertical sectional view showing a protective mask. FIG. 4 shows a conventional example and is a cross-sectional view taken along the arrow showing a polishing apparatus provided with a tape mask. FIG. 5 shows another conventional example and is a cross-sectional view showing a polishing apparatus equipped with a flat plate mask. 1 is an elastic member, 1c is a protrusion, 2 is an upper hard plate, 3 is a lower hard plate, 4 is a fixing member, 7 is an object to be polished, 8 is an injection nozzle (polishing means), 9 is an abrasive, and 10 is protective. A mask, 12 is a pressing force, and 20 is a polishing device.
───────────────────────────────────────────────────── フロントページの続き (72)考案者 岸下 博 大阪府大阪市阿倍野区長池町22番22号 シャープ株式会社内 (56)参考文献 実開 昭53−140366（ＪＰ，Ｕ) 実開 昭60−29050（ＪＰ，Ｕ) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Hiroshi Kishishita 22-22 Nagaike-cho, Abeno-ku, Osaka-shi, Osaka Inside Sharp Corporation (56) References -29050 (JP, U)
Claims (1)
と、被研磨物の研磨を必要としない部分に配される保護
マスクとを備え、研磨手段が被研磨物を研磨するとき
に、保護マスクが押圧されて、被研磨物の研磨を必要と
しない部分を研磨から保護する研磨装置において、 上記保護マスクは、下面のエッジ部の全周に堤状の突起
部が形成された弾性部材と、 弾性部材の上面部と略同形状に形成されて、前記上面部
に配される上面硬質板と、 弾性部材の突起部に包囲された弾性部材の下面部と略同
形状に形成されて、前記下面部に配される下面硬質板
と、 弾性部材と上面硬質板と下面硬質板とを一体に固定する
固定部材とを備えていることを特徴とする研磨装置。1. A polishing means for polishing an object to be polished with an abrasive, and a protective mask disposed on a portion of the object to be polished which does not require polishing. When the polishing means polishes the object to be polished, In a polishing device for pressing a protective mask to protect a portion of a workpiece to be polished from polishing, the protective mask is an elastic member in which a bank-shaped protrusion is formed on the entire circumference of an edge portion of a lower surface. An upper surface hard plate that is formed in substantially the same shape as the upper surface of the elastic member, and is formed in substantially the same shape as the lower surface of the elastic member that is surrounded by the protrusions of the elastic member. A polishing apparatus comprising: a lower surface hard plate disposed on the lower surface portion; and a fixing member that integrally fixes the elastic member, the upper surface hard plate, and the lower surface hard plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990004048U JP2504485Y2 (en) | 1990-01-19 | 1990-01-19 | Polishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1990004048U JP2504485Y2 (en) | 1990-01-19 | 1990-01-19 | Polishing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0396176U JPH0396176U (en) | 1991-10-01 |
| JP2504485Y2 true JP2504485Y2 (en) | 1996-07-10 |
Family
ID=31507817
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1990004048U Expired - Lifetime JP2504485Y2 (en) | 1990-01-19 | 1990-01-19 | Polishing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2504485Y2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4690896B2 (en) * | 2006-01-10 | 2011-06-01 | 三菱重工業株式会社 | Blast polishing mask, automatic blast polishing apparatus, and solar cell panel manufacturing method |
| US10927959B2 (en) * | 2019-02-27 | 2021-02-23 | Caterpillar Inc. | Method and appliance for making isotropically finished seal ring of seal assembly for machine |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53140366U (en) * | 1977-04-13 | 1978-11-06 | ||
| JPS6029050U (en) * | 1983-03-08 | 1985-02-27 | 日東電工株式会社 | Masking sheet for machining stone etc. |
-
1990
- 1990-01-19 JP JP1990004048U patent/JP2504485Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0396176U (en) | 1991-10-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |