JPH0357427Y2 - - Google Patents
Info
- Publication number
- JPH0357427Y2 JPH0357427Y2 JP1986004322U JP432286U JPH0357427Y2 JP H0357427 Y2 JPH0357427 Y2 JP H0357427Y2 JP 1986004322 U JP1986004322 U JP 1986004322U JP 432286 U JP432286 U JP 432286U JP H0357427 Y2 JPH0357427 Y2 JP H0357427Y2
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- polished
- polishing
- tape
- synthetic resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920003002 synthetic resin Polymers 0.000 claims description 11
- 239000000057 synthetic resin Substances 0.000 claims description 11
- 239000002245 particle Substances 0.000 claims description 6
- 238000005498 polishing Methods 0.000 description 17
- 239000003082 abrasive agent Substances 0.000 description 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000006260 foam Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- -1 polypropylene Polymers 0.000 description 2
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
Description
【考案の詳細な説明】
[産業上の利用分野]
本考案は、スクラツチの発生がなく被研摩面を
精密かつ均一に研摩することが出来る研摩テープ
に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an abrasive tape that can precisely and uniformly abrade a surface to be abraded without causing scratches.
[従来の技術]
一般に金属などの被研摩体の面を研摩する場合
には、最初粗目の研摩材から、順次細目の研摩材
を用いて研摩し、最終的には極微粒の研摩材によ
つて面を仕上げている。この仕上げ研摩において
は、被研摩体の面に僅かのスクラツチが存在する
ことも許されない。[Prior Art] Generally, when polishing the surface of an object to be polished such as metal, it is first polished using a coarse abrasive, then successively finer, and finally polished with an extremely fine abrasive. Finishing the surface. In this final polishing, the presence of even the slightest scratch on the surface of the object to be polished is not allowed.
上記仕上げ研摩は、通常第3図a,bに示すよ
うに、プラスチツク,紙などのシート1の面に極
微粒の研摩材を塗布して研摩材層2を設けた研摩
テープ或いはシート(以下研摩テープという)3
を条板上に置いて、この面に被研摩体の研摩する
面をこすつて仕上げ研摩を行なつている。 The above-mentioned final polishing is usually carried out using an abrasive tape or sheet (hereinafter referred to as abrasive), which has an abrasive layer 2 formed by coating a surface of a sheet 1 made of plastic, paper, etc. with extremely fine abrasive particles, as shown in FIGS. 3a and 3b. (referred to as tape) 3
is placed on a strip plate, and the surface of the object to be polished is rubbed against this surface for final polishing.
しかし、研摩中に条板と研摩テープとの間に微
細砂粒などが入ると、研摩材層2の面が突出し、
被研摩面にスクラツチが発生する。そのため終了
に近づいていた研摩をある程度粗目にさかのぼつ
てやりなおさなければならない欠点があつた。 However, if fine sand particles etc. enter between the strip and the abrasive tape during polishing, the surface of the abrasive layer 2 will protrude.
Scratches occur on the polished surface. Therefore, there was a drawback that the polishing, which was nearing completion, had to be repeated to a certain degree of roughness.
本考案者等は、上記の欠点を改良すべく、種々
研摩テープを試作検討した結果、第4図に示すよ
うに研摩テープ3の研摩材層2と反対側の面に、
合成ゴム,発泡合成樹脂製等弾性体シート4を貼
付した研摩テープ5をつくり、研摩材層2が突出
して被研摩面を損傷するのを防止した。さらに、
第5図に示すように弾性体シート4の下面に接着
剤6を塗布し、これを紙7等で覆い、研摩テープ
を使用する際、紙7を剥離して接着剤を露出さ
せ、これを条板などに貼付け固定可能とすること
により使い易くした。 In order to improve the above-mentioned drawbacks, the inventors of the present invention investigated various prototype abrasive tapes, and as a result, as shown in FIG.
An abrasive tape 5 was prepared to which an elastic sheet 4 made of synthetic rubber, foamed synthetic resin, etc. was attached to prevent the abrasive layer 2 from protruding and damaging the surface to be polished. moreover,
As shown in FIG. 5, an adhesive 6 is applied to the lower surface of the elastic sheet 4, and this is covered with paper 7, etc. When using the abrasive tape, the paper 7 is peeled off to expose the adhesive, and this is It is easy to use by being able to be attached and fixed to a strip plate, etc.
ところで、上記研摩テープ5は、弾性体シート
4によつて条板等と研摩テープ5との間に入つた
異物の影響は完全に吸収出来るが、第6図に示す
ように、被研摩面と研摩材層2との間に異物8が
入ると、研摩材層2はシート1が凹形となるのに
伴なわれ、大きな凹部9が形成され、この部分の
研摩が行なわれないため、被研摩体10の研摩面
にスクラツチが発生する不都合があつた。 By the way, the polishing tape 5 can completely absorb the influence of foreign matter that gets between the strip plate etc. and the polishing tape 5 due to the elastic sheet 4, but as shown in FIG. When a foreign substance 8 enters between the abrasive layer 2 and the abrasive layer 2, the abrasive layer 2 becomes concave as the sheet 1 becomes concave, forming a large concave portion 9. Since this portion is not polished, the abrasive layer 2 becomes concave. There was a problem in that scratches were generated on the polished surface of the polishing body 10.
近時、コンピユータのハードデイスクにおい
て、A基板にNi,P等をメツキし、この面に、
Fe,Cr,Co等をスパツタリングするが、その
際、スパツタリングした金属を強固に固定するた
め、メツキした面を研摩して、面に均一な微細な
傷痕をつける必要があり、これに上記研摩シート
が使用されている。この場合、スクラツチ発生す
ることなく、均一に研摩出来ることが強く要望さ
れている。 Recently, in computer hard disks, the A substrate is plated with Ni, P, etc., and this side is plated with Ni, P, etc.
Fe, Cr, Co, etc. are sputtered, but in order to firmly fix the sputtered metal, it is necessary to polish the plated surface to create uniform fine scratches on the surface. is used. In this case, there is a strong demand for uniform polishing without scratching.
[考案が解決しようとする問題点]
本考案は上記の事情に鑑み、研摩中に多少の異
物が研摩材層と被研摩体、或いは研摩テープと条
板等の間に入つても、これによる影響を受けるこ
とのない研摩テープを提供することを目的とす
る。[Problems to be solved by the invention] In view of the above circumstances, the present invention solves the problem even if some foreign matter gets between the abrasive layer and the object to be polished, or between the abrasive tape and the strip plate, etc. during polishing. The purpose is to provide an abrasive tape that is not affected.
[問題点を解決するための手段]
本考案は上記の目的を達成するためになされた
もので、その要旨は、薄い発泡合成樹脂製シート
面に直接研摩材微粒子の薄層を設けた研摩テープ
にある。[Means for solving the problem] The present invention was made to achieve the above object, and its gist is to provide an abrasive tape in which a thin layer of fine abrasive particles is directly provided on the surface of a thin foamed synthetic resin sheet. It is in.
[考案の具体的構成および作用] 以下本考案を図面を参照して説明する。[Specific structure and function of the invention] The present invention will be explained below with reference to the drawings.
第1図は、本考案に係る研摩テープの一実施例
を示すもので、図中符号11は微細な気泡を内蔵
する薄い発泡合成樹脂製シートである。この発泡
合成樹脂製シート11の面には、微粒の研摩材が
塗布されて形成された研摩材層12が設けられ、
研摩テープ13が構成されている。 FIG. 1 shows an embodiment of the abrasive tape according to the present invention, and reference numeral 11 in the figure is a thin foamed synthetic resin sheet containing fine air bubbles. An abrasive layer 12 formed by applying fine particles of abrasive is provided on the surface of the foamed synthetic resin sheet 11.
An abrasive tape 13 is constructed.
本考案に用いられる発泡合成樹脂製シート11
は、ポリプロピレン,ポリエチレン,ウレタン,
スチレン,ポリエステル等通常の合成樹脂によつ
てつくられた発泡シートで、その厚さは、20〜
500μm、特に40〜150μmの範囲が好ましい。厚
さが20μm未満では、発泡シートの有する弾性が
充分発揮されず、500μmを越えると厚くなり過
ぎて研摩しにくくなる。 Foamed synthetic resin sheet 11 used in the present invention
are polypropylene, polyethylene, urethane,
A foam sheet made from ordinary synthetic resins such as styrene and polyester, with a thickness of 20~
A range of 500 μm, particularly 40 to 150 μm is preferred. If the thickness is less than 20 μm, the elasticity of the foam sheet will not be fully exhibited, and if it exceeds 500 μm, it will become too thick and difficult to polish.
また使用される研摩材としてはアルミナ,炭化
けい素,ダイヤモンド等、通常の研摩材の微粒子
がいずれも使用出来る。 Further, as the abrasive material used, fine particles of ordinary abrasive materials such as alumina, silicon carbide, diamond, etc. can be used.
また、製造に際しては、上記発泡合成樹脂シー
ト面に、研摩材微粒子を塗布接着しても、或いは
発泡する前の合成樹脂シートに研摩材微粒子を塗
布した後、シートを発泡させてもよい。 Further, during production, the abrasive particles may be applied and adhered to the surface of the foamed synthetic resin sheet, or the abrasive particles may be applied to the synthetic resin sheet before foaming, and then the sheet may be foamed.
上記構成の研摩テープを用いて被研摩体を研摩
し、研摩中に、第2図に示すように研摩面に異物
8が入つた場合、異物8は被研摩体10の面に押
圧されるが、研摩材層12は直接発泡合成樹脂シ
ート11と接しているため、その弾性によつて異
物8のみが研摩材層12に押込まれた状態とな
り、大きな凹部が形成されることがない。したが
つて、被研摩体10の研摩面は、ほぼ均等に研摩
され、大きなスクラツチの発生が防止される。 When an object to be polished is polished using the abrasive tape having the above structure, and a foreign object 8 enters the polished surface as shown in FIG. 2 during polishing, the foreign object 8 is pressed against the surface of the object to be polished 10. Since the abrasive layer 12 is in direct contact with the foamed synthetic resin sheet 11, only the foreign matter 8 is pushed into the abrasive layer 12 due to its elasticity, and no large recesses are formed. Therefore, the polished surface of the object 10 to be polished is polished almost evenly, and the occurrence of large scratches is prevented.
[効果]
以上述べたように、本考案に係る研摩テープ
は、多少の異物が研摩している面に入つても、殆
どその影響を受けることなく研摩が行なわれるの
で、コンピユータのハードデイスクその他の研摩
を効率よく行なうことが出来、その経済的効果は
極めて大きい。[Effects] As described above, the polishing tape according to the present invention can perform polishing almost unaffected even if some foreign matter enters the surface being polished, so it is suitable for polishing computer hard disks and other objects. can be carried out efficiently, and the economic effect is extremely large.
第1図は、本考案に係る研摩テープの一実施例
を示す縦断面図、第2図は、第1図の研摩テープ
を用いて研摩する際に異物が入つた状態を示す
図、第3図a,bは、従来の研摩テープを示すも
ので、第3図aは斜視図、第3図bは、第3図a
の−線矢視断面図、第4図および第5図は、
試作した研摩テープの縦断面図、第6図は、第4
図の研摩テープを用いて研摩した際に、研摩面に
異物が入つた状態を示す図である。
8……異物、10……被研摩体、11……発泡
合成樹脂製シート、12……研摩材層、13……
研摩テープ。
FIG. 1 is a longitudinal cross-sectional view showing one embodiment of the abrasive tape according to the present invention, FIG. Figures a and b show conventional abrasive tapes, with Figure 3 a being a perspective view and Figure 3 b being a perspective view of Figure 3 a.
4 and 5 are cross-sectional views taken along the - line arrow of
The longitudinal cross-sectional view of the prototype abrasive tape, Figure 6, is
FIG. 3 is a diagram showing a state in which foreign matter has entered the polished surface when polishing is performed using the polishing tape shown in the figure. 8... Foreign matter, 10... To be polished, 11... Foamed synthetic resin sheet, 12... Abrasive material layer, 13...
Abrasive tape.
Claims (1)
子の薄層を設けたことを特徴とする研摩テープ。 An abrasive tape characterized by having a thin layer of fine abrasive particles placed directly on the surface of a thin foamed synthetic resin sheet.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986004322U JPH0357427Y2 (en) | 1986-01-16 | 1986-01-16 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986004322U JPH0357427Y2 (en) | 1986-01-16 | 1986-01-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62117068U JPS62117068U (en) | 1987-07-25 |
JPH0357427Y2 true JPH0357427Y2 (en) | 1991-12-27 |
Family
ID=30784883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986004322U Expired JPH0357427Y2 (en) | 1986-01-16 | 1986-01-16 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0357427Y2 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2808261B2 (en) * | 1995-10-31 | 1998-10-08 | 株式会社コバックス | Polishing sheet and method for producing the same |
US20020090901A1 (en) * | 2000-11-03 | 2002-07-11 | 3M Innovative Properties Company | Flexible abrasive product and method of making and using the same |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4837312A (en) * | 1971-09-14 | 1973-06-01 | ||
JPS5497408A (en) * | 1978-01-19 | 1979-08-01 | Fuji Photo Film Co Ltd | Polishing tape |
JPS62241674A (en) * | 1986-04-14 | 1987-10-22 | Orufua Kk | Abrasive tool |
-
1986
- 1986-01-16 JP JP1986004322U patent/JPH0357427Y2/ja not_active Expired
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4837312A (en) * | 1971-09-14 | 1973-06-01 | ||
JPS5497408A (en) * | 1978-01-19 | 1979-08-01 | Fuji Photo Film Co Ltd | Polishing tape |
JPS62241674A (en) * | 1986-04-14 | 1987-10-22 | Orufua Kk | Abrasive tool |
Also Published As
Publication number | Publication date |
---|---|
JPS62117068U (en) | 1987-07-25 |
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