JP2025501494A - 少なくとも１つの中空構造を作製する方法及び装置、ミラー、ｅｕｖリソグラフィシステム、流体供給装置、及び流体を供給する方法 - Google Patents

少なくとも１つの中空構造を作製する方法及び装置、ミラー、ｅｕｖリソグラフィシステム、流体供給装置、及び流体を供給する方法 Download PDF

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JP2025501494A
JP2025501494A JP2024535549A JP2024535549A JP2025501494A JP 2025501494 A JP2025501494 A JP 2025501494A JP 2024535549 A JP2024535549 A JP 2024535549A JP 2024535549 A JP2024535549 A JP 2024535549A JP 2025501494 A JP2025501494 A JP 2025501494A
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Prior art keywords
channel
fluid
workpiece
hollow structure
removal
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Pending
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JP2024535549A
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Japanese (ja)
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JP2025501494A5 (https=
Inventor
ウルスペアガー トビアス
ノルテ シュテファン
グリーズン クリスティアン
クノール ソーレン
モンツ トーマス
ザルター シュテファン
クラースナ ミヒャエル
ツァチェク クリストフ
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Priority claimed from DE102021214310.5A external-priority patent/DE102021214310A1/de
Priority claimed from DE102021214318.0A external-priority patent/DE102021214318B4/de
Priority claimed from DE102022203593.3A external-priority patent/DE102022203593A1/de
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2025501494A publication Critical patent/JP2025501494A/ja
Publication of JP2025501494A5 publication Critical patent/JP2025501494A5/ja
Pending legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
    • B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/55—Working by transmitting the laser beam through or within the workpiece for creating voids inside the workpiece, e.g. for forming flow passages or flow patterns
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G02B7/1815—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation with cooling or heating systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/04—Tubular or hollow articles
    • B23K2101/14—Heat exchangers

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Chemical & Material Sciences (AREA)
  • Laser Beam Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Lasers (AREA)
JP2024535549A 2021-12-14 2022-12-13 少なくとも１つの中空構造を作製する方法及び装置、ミラー、ｅｕｖリソグラフィシステム、流体供給装置、及び流体を供給する方法 Pending JP2025501494A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
DE102021214318.0 2021-12-14
DE102021214310.5A DE102021214310A1 (de) 2021-12-14 2021-12-14 Verfahren und Vorrichtung zum Erzeugen mindestens einer Hohlstruktur, EUVSpiegel und EUV-Lithographiesystem
DE102021214310.5 2021-12-14
DE102021214318.0A DE102021214318B4 (de) 2021-12-14 2021-12-14 Fluidzuführungsvorrichtung und Verfahren zum Zuführen eines Fluids zu mindestens einer Ablationsfront
DE102022203593.3A DE102022203593A1 (de) 2022-04-08 2022-04-08 Optisches Element und EUV-Lithographiesystem
DE102022203593.3 2022-04-08
PCT/EP2022/085520 WO2023110816A2 (de) 2021-12-14 2022-12-13 Verfahren und vorrichtung zum erzeugen mindestens einer hohlstruktur, spiegel, euv-lithographiesystem, fluidzuführungsvorrichtung und verfahren zum zuführen eines fluids

Publications (2)

Publication Number Publication Date
JP2025501494A true JP2025501494A (ja) 2025-01-22
JP2025501494A5 JP2025501494A5 (https=) 2025-12-24

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JP2024535549A Pending JP2025501494A (ja) 2021-12-14 2022-12-13 少なくとも１つの中空構造を作製する方法及び装置、ミラー、ｅｕｖリソグラフィシステム、流体供給装置、及び流体を供給する方法

Country Status (6)

Country Link
US (1) US20240329285A1 (https=)
EP (3) EP4448213B1 (https=)
JP (1) JP2025501494A (https=)
KR (1) KR20240119295A (https=)
TW (2) TWI889440B (https=)
WO (1) WO2023110816A2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102023205947A1 (de) * 2023-06-23 2024-05-02 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines Grundkörpers einer Komponente, optisches Element und optische Anordnung
DE102023205946A1 (de) 2023-06-23 2024-06-13 Carl Zeiss Smt Gmbh Optisches Element mit Kühlkanälen und optische Anordnung
DE102023205966A1 (de) * 2023-06-23 2024-06-06 Carl Zeiss Smt Gmbh Optisches Element mit Temperierkanälen und Lithographiesystem
DE102023208751A1 (de) 2023-09-11 2024-07-18 Carl Zeiss Smt Gmbh Optische Anordnung mit einer zu temperierenden Komponente
DE102023211220A1 (de) 2023-11-13 2024-10-10 Carl Zeiss Smt Gmbh Optisches Element mit Temperierkanälen und optische Anordnung
EP4684906A1 (de) 2024-07-22 2026-01-28 Carl Zeiss SMT GmbH Verfahren und vorrichtung zum bestimmen von lageparametern und/oder bewegungsparametern einer flexiblen fluidleitung
DE102024207384A1 (de) * 2024-08-05 2026-02-05 Carl Zeiss Smt Gmbh Fluidzuführungsvorrichtung und Verfahren zum Zuführen eines Fluids zu mindestens einer Abtragsfront
DE102024209846A1 (de) 2024-10-10 2026-04-16 Carl Zeiss Smt Gmbh Verfahren zum Optimieren der Temperierung eines Werkstücks, Spiegel und Anlage der Halbleitertechnologie

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3327586A1 (de) * 1982-08-17 1984-02-23 Andrew Charles Bromley Kent MacKechnie-Jarvis Wunddrainagekatheder
DE102009039400A1 (de) * 2009-08-31 2011-03-03 Carl Zeiss Laser Optics Gmbh Reflektives optisches Element zur Verwendung in einem EUV-System
WO2012013751A1 (en) * 2010-07-30 2012-02-02 Carl Zeiss Smt Gmbh Euv exposure apparatus
CN109254501A (zh) * 2012-02-03 2019-01-22 Asml荷兰有限公司 衬底支架、光刻装置、器件制造方法和制造衬底保持器的方法
WO2019158215A1 (de) * 2018-02-19 2019-08-22 Trumpf Lasersystems For Semiconductor Manufacturing Gmbh Faraday-rotator, optischer isolator, treiberlaseranordnung und euv-strahlungserzeugungsvorrichtung
DE102018202687A1 (de) * 2018-02-22 2018-05-03 Carl Zeiss Smt Gmbh Herstellungsverfahren für Komponenten einer Projektionsbelichtungsanlage für die Halbleiterlithographie und Projektionsbelichtungsanlage
DE102019205265A1 (de) * 2019-04-11 2020-10-15 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines Glaskörpers mit Kühlkanälen
DE102019219179A1 (de) * 2019-12-09 2021-06-10 Carl Zeiss Smt Gmbh Optisches Element und Lithographiesystem

Also Published As

Publication number Publication date
KR20240119295A (ko) 2024-08-06
EP4625018A2 (de) 2025-10-01
TWI884402B (zh) 2025-05-21
EP4448213B1 (de) 2025-10-15
WO2023110816A3 (de) 2023-09-07
EP4448213C0 (de) 2025-10-15
US20240329285A1 (en) 2024-10-03
TWI889440B (zh) 2025-07-01
TW202443288A (zh) 2024-11-01
EP4448213A2 (de) 2024-10-23
EP4621465A3 (de) 2026-01-07
WO2023110816A2 (de) 2023-06-22
TW202332979A (zh) 2023-08-16
EP4621465A2 (de) 2025-09-24
EP4625018A3 (de) 2026-01-14

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