JP2024534990A5 - - Google Patents

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Publication number
JP2024534990A5
JP2024534990A5 JP2024515615A JP2024515615A JP2024534990A5 JP 2024534990 A5 JP2024534990 A5 JP 2024534990A5 JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024515615 A JP2024515615 A JP 2024515615A JP 2024534990 A5 JP2024534990 A5 JP 2024534990A5
Authority
JP
Japan
Prior art keywords
radio frequency
coil
shaped
direct
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024515615A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024534990A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2022/043464 external-priority patent/WO2023043795A1/en
Publication of JP2024534990A publication Critical patent/JP2024534990A/ja
Publication of JP2024534990A5 publication Critical patent/JP2024534990A5/ja
Pending legal-status Critical Current

Links

JP2024515615A 2021-09-17 2022-09-14 ダイレクトドライブ無線周波電源に対するコイルの対称的結合 Pending JP2024534990A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163245773P 2021-09-17 2021-09-17
US63/245,773 2021-09-17
PCT/US2022/043464 WO2023043795A1 (en) 2021-09-17 2022-09-14 Symmetric coupling of coil to direct-drive radiofrequency power supplies

Publications (2)

Publication Number Publication Date
JP2024534990A JP2024534990A (ja) 2024-09-26
JP2024534990A5 true JP2024534990A5 (enExample) 2025-09-19

Family

ID=85603449

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024515615A Pending JP2024534990A (ja) 2021-09-17 2022-09-14 ダイレクトドライブ無線周波電源に対するコイルの対称的結合

Country Status (6)

Country Link
US (2) US12482634B2 (enExample)
JP (1) JP2024534990A (enExample)
KR (1) KR20240058940A (enExample)
CN (1) CN117957632A (enExample)
TW (1) TW202320593A (enExample)
WO (1) WO2023043795A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023018596A1 (en) * 2021-08-12 2023-02-16 Lam Research Corporation Process module chamber providing symmetric rf return path
US12482634B2 (en) * 2021-09-17 2025-11-25 Lam Research Corporation Symmetric coupling of coil to direct-drive radiofrequency power supplies
JP7577093B2 (ja) * 2022-06-29 2024-11-01 東京エレクトロン株式会社 プラズマ処理システムおよびプラズマ処理方法
NL2036982B1 (en) * 2024-02-07 2025-08-20 Prodrive Tech Innovation Services B V Radio frequency drive generator for plasma sources

Family Cites Families (18)

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Publication number Priority date Publication date Assignee Title
US6129807A (en) 1997-10-06 2000-10-10 Applied Materials, Inc. Apparatus for monitoring processing of a substrate
US6527912B2 (en) 2001-03-30 2003-03-04 Lam Research Corporation Stacked RF excitation coil for inductive plasma processor
JP2006186222A (ja) 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7570028B2 (en) 2007-04-26 2009-08-04 Advanced Energy Industries, Inc. Method and apparatus for modifying interactions between an electrical generator and a nonlinear load
WO2010115128A2 (en) * 2009-04-03 2010-10-07 Applied Materials, Inc. High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
JP5461261B2 (ja) 2010-03-23 2014-04-02 株式会社ダイヘン 電力測定装置の信頼性の評価方法
US10125422B2 (en) * 2013-03-27 2018-11-13 Applied Materials, Inc. High impedance RF filter for heater with impedance tuning device
GB201316815D0 (en) 2013-09-23 2013-11-06 Renishaw Plc Additive manufacturing apparatus and method
JP6746865B2 (ja) * 2016-09-23 2020-08-26 株式会社ダイヘン プラズマ生成装置
US10264663B1 (en) * 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
CN112385029B (zh) 2018-05-08 2025-09-16 朗姆研究公司 包括带有远心透镜的透镜电路、光束折叠组件或多边形扫描仪的原子层蚀刻和沉积处理系统
US10515781B1 (en) 2018-06-13 2019-12-24 Lam Research Corporation Direct drive RF circuit for substrate processing systems
EP3850656A4 (en) 2018-09-10 2022-06-22 Fluidigm Canada Inc. APPARATUS AND METHOD FOR HIGH SPEED MODULATION SAMPLE IMAGING
JP7542555B2 (ja) * 2019-04-30 2024-08-30 ラム リサーチ コーポレーション 二重周波数、直接駆動誘導結合プラズマ源
US12482634B2 (en) * 2021-09-17 2025-11-25 Lam Research Corporation Symmetric coupling of coil to direct-drive radiofrequency power supplies
US20250174431A1 (en) * 2021-12-17 2025-05-29 Lam Research Corporation Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple Coils
WO2024004766A1 (ja) * 2022-06-29 2024-01-04 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

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