TW202320593A - 線圈對直接驅動式射頻電源供應器的對稱耦合 - Google Patents

線圈對直接驅動式射頻電源供應器的對稱耦合 Download PDF

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Publication number
TW202320593A
TW202320593A TW111134897A TW111134897A TW202320593A TW 202320593 A TW202320593 A TW 202320593A TW 111134897 A TW111134897 A TW 111134897A TW 111134897 A TW111134897 A TW 111134897A TW 202320593 A TW202320593 A TW 202320593A
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TW
Taiwan
Prior art keywords
coil
shaped
transistor
plasma processing
direct
Prior art date
Application number
TW111134897A
Other languages
English (en)
Chinese (zh)
Inventor
約翰 朱爾瑞
亞歷山大 米勒 派特森
Original Assignee
美商蘭姆研究公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 美商蘭姆研究公司 filed Critical 美商蘭姆研究公司
Publication of TW202320593A publication Critical patent/TW202320593A/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32155—Frequency modulation
    • H01J37/32165—Plural frequencies
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32128—Radio frequency generated discharge using particular waveforms, e.g. polarised waves
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32137—Radio frequency generated discharge controlling of the discharge by modulation of energy
    • H01J37/32146—Amplitude modulation, includes pulsing
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H01J37/32183—Matching circuits

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
TW111134897A 2021-09-17 2022-09-15 線圈對直接驅動式射頻電源供應器的對稱耦合 TW202320593A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US202163245773P 2021-09-17 2021-09-17
US63/245,773 2021-09-17

Publications (1)

Publication Number Publication Date
TW202320593A true TW202320593A (zh) 2023-05-16

Family

ID=85603449

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111134897A TW202320593A (zh) 2021-09-17 2022-09-15 線圈對直接驅動式射頻電源供應器的對稱耦合

Country Status (6)

Country Link
US (2) US12482634B2 (enExample)
JP (1) JP2024534990A (enExample)
KR (1) KR20240058940A (enExample)
CN (1) CN117957632A (enExample)
TW (1) TW202320593A (enExample)
WO (1) WO2023043795A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2023018596A1 (en) * 2021-08-12 2023-02-16 Lam Research Corporation Process module chamber providing symmetric rf return path
US12482634B2 (en) * 2021-09-17 2025-11-25 Lam Research Corporation Symmetric coupling of coil to direct-drive radiofrequency power supplies
JP7577093B2 (ja) * 2022-06-29 2024-11-01 東京エレクトロン株式会社 プラズマ処理システムおよびプラズマ処理方法
NL2036982B1 (en) * 2024-02-07 2025-08-20 Prodrive Tech Innovation Services B V Radio frequency drive generator for plasma sources

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6129807A (en) 1997-10-06 2000-10-10 Applied Materials, Inc. Apparatus for monitoring processing of a substrate
US6527912B2 (en) 2001-03-30 2003-03-04 Lam Research Corporation Stacked RF excitation coil for inductive plasma processor
JP2006186222A (ja) 2004-12-28 2006-07-13 Matsushita Electric Ind Co Ltd プラズマ処理装置
US20080179948A1 (en) 2005-10-31 2008-07-31 Mks Instruments, Inc. Radio frequency power delivery system
US7570028B2 (en) 2007-04-26 2009-08-04 Advanced Energy Industries, Inc. Method and apparatus for modifying interactions between an electrical generator and a nonlinear load
WO2010115128A2 (en) * 2009-04-03 2010-10-07 Applied Materials, Inc. High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
JP5461261B2 (ja) 2010-03-23 2014-04-02 株式会社ダイヘン 電力測定装置の信頼性の評価方法
US10125422B2 (en) * 2013-03-27 2018-11-13 Applied Materials, Inc. High impedance RF filter for heater with impedance tuning device
GB201316815D0 (en) 2013-09-23 2013-11-06 Renishaw Plc Additive manufacturing apparatus and method
JP6746865B2 (ja) * 2016-09-23 2020-08-26 株式会社ダイヘン プラズマ生成装置
US10264663B1 (en) * 2017-10-18 2019-04-16 Lam Research Corporation Matchless plasma source for semiconductor wafer fabrication
CN112385029B (zh) 2018-05-08 2025-09-16 朗姆研究公司 包括带有远心透镜的透镜电路、光束折叠组件或多边形扫描仪的原子层蚀刻和沉积处理系统
US10515781B1 (en) 2018-06-13 2019-12-24 Lam Research Corporation Direct drive RF circuit for substrate processing systems
EP3850656A4 (en) 2018-09-10 2022-06-22 Fluidigm Canada Inc. APPARATUS AND METHOD FOR HIGH SPEED MODULATION SAMPLE IMAGING
JP7542555B2 (ja) * 2019-04-30 2024-08-30 ラム リサーチ コーポレーション 二重周波数、直接駆動誘導結合プラズマ源
US12482634B2 (en) * 2021-09-17 2025-11-25 Lam Research Corporation Symmetric coupling of coil to direct-drive radiofrequency power supplies
US20250174431A1 (en) * 2021-12-17 2025-05-29 Lam Research Corporation Apparatus and Method for Splitting Current from Direct-Drive Radiofrequency Signal Generator between Multiple Coils
WO2024004766A1 (ja) * 2022-06-29 2024-01-04 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法

Also Published As

Publication number Publication date
US20240395503A1 (en) 2024-11-28
US12482634B2 (en) 2025-11-25
WO2023043795A1 (en) 2023-03-23
CN117957632A (zh) 2024-04-30
US20260058095A1 (en) 2026-02-26
KR20240058940A (ko) 2024-05-07
JP2024534990A (ja) 2024-09-26

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