JP2024521061A5 - - Google Patents

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Publication number
JP2024521061A5
JP2024521061A5 JP2023570163A JP2023570163A JP2024521061A5 JP 2024521061 A5 JP2024521061 A5 JP 2024521061A5 JP 2023570163 A JP2023570163 A JP 2023570163A JP 2023570163 A JP2023570163 A JP 2023570163A JP 2024521061 A5 JP2024521061 A5 JP 2024521061A5
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JP
Japan
Prior art keywords
target
voltage
ion beam
energy
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2023570163A
Other languages
English (en)
Japanese (ja)
Other versions
JP2024521061A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2022/029153 external-priority patent/WO2022241196A1/en
Publication of JP2024521061A publication Critical patent/JP2024521061A/ja
Publication of JP2024521061A5 publication Critical patent/JP2024521061A5/ja
Pending legal-status Critical Current

Links

JP2023570163A 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム Pending JP2024521061A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163188729P 2021-05-14 2021-05-14
US63/188,729 2021-05-14
PCT/US2022/029153 WO2022241196A1 (en) 2021-05-14 2022-05-13 Ion production system with efficient ion collection

Publications (2)

Publication Number Publication Date
JP2024521061A JP2024521061A (ja) 2024-05-28
JP2024521061A5 true JP2024521061A5 (enExample) 2025-03-11

Family

ID=83998469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023570163A Pending JP2024521061A (ja) 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム

Country Status (10)

Country Link
US (1) US12391568B2 (enExample)
EP (1) EP4338194A4 (enExample)
JP (1) JP2024521061A (enExample)
KR (1) KR20240035391A (enExample)
CN (1) CN117678050A (enExample)
AU (1) AU2022273773A1 (enExample)
CA (1) CA3218431A1 (enExample)
IL (1) IL308413A (enExample)
MX (1) MX2023013468A (enExample)
WO (1) WO2022241196A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240090158A (ko) * 2021-10-01 2024-06-21 샤인 테크놀로지스 엘엘씨 이온 수집을 위한 섬유질 격자를 갖는 이온 생성 시스템

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH077743B2 (ja) * 1992-07-09 1995-01-30 株式会社島津製作所 集束イオンビーム装置
JP3309435B2 (ja) * 1992-08-27 2002-07-29 石川島播磨重工業株式会社 イオンビームデポジション装置
JPH06103953A (ja) * 1992-09-18 1994-04-15 Elionix Kk 金属イオンを用いた薄膜形成方法およびその装置
US5354583A (en) * 1992-11-09 1994-10-11 Martin Marietta Energy Systems, Inc. Apparatus and method for selective area deposition of thin films on electrically biased substrates
RU2158170C1 (ru) * 1999-11-01 2000-10-27 Комбинат "Электрохимприбор" Способ разделения изотопов иттербия в электромагнитном сепараторе с использованием источника ионов
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
JP2004139913A (ja) * 2002-10-21 2004-05-13 National Institute Of Advanced Industrial & Technology イオンビーム発生装置、イオンビーム発生方法、イオン処理装置およびイオン処理方法
US7138626B1 (en) * 2005-05-05 2006-11-21 Eai Corporation Method and device for non-contact sampling and detection
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP5575198B2 (ja) * 2012-09-25 2014-08-20 株式会社東芝 磁気抵抗効果素子の製造方法及び磁気抵抗効果素子の製造装置
US9443708B2 (en) * 2014-09-10 2016-09-13 Battelle Memorial Institute Ion implantation system and process for ultrasensitive determination of target isotopes

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