JP2024521061A - 効率的なイオン収集部を備えたイオン生成システム - Google Patents

効率的なイオン収集部を備えたイオン生成システム Download PDF

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Publication number
JP2024521061A
JP2024521061A JP2023570163A JP2023570163A JP2024521061A JP 2024521061 A JP2024521061 A JP 2024521061A JP 2023570163 A JP2023570163 A JP 2023570163A JP 2023570163 A JP2023570163 A JP 2023570163A JP 2024521061 A JP2024521061 A JP 2024521061A
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JP
Japan
Prior art keywords
target
ions
voltage
ion beam
energy
Prior art date
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Pending
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JP2023570163A
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English (en)
Japanese (ja)
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JP2024521061A5 (enExample
Inventor
ジョセフ シャーマン
サルコ チェレクドジアン
Original Assignee
シャイン テクノロジーズ リミテッド ライアビリティ カンパニー
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Publication of JP2024521061A publication Critical patent/JP2024521061A/ja
Publication of JP2024521061A5 publication Critical patent/JP2024521061A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01F—COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
    • C01F17/00—Compounds of rare earth metals
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D59/00—Separation of different isotopes of the same chemical element
    • B01D59/44—Separation by mass spectrography
    • B01D59/48—Separation by mass spectrography using electrostatic and magnetic fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3178—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/221—Ion beam deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0475—Changing particle velocity decelerating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/05—Arrangements for energy or mass analysis
    • H01J2237/055—Arrangements for energy or mass analysis magnetic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06375—Arrangement of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3142—Ion plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • External Artificial Organs (AREA)
  • Treatment Of Water By Ion Exchange (AREA)
JP2023570163A 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム Pending JP2024521061A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US202163188729P 2021-05-14 2021-05-14
US63/188,729 2021-05-14
PCT/US2022/029153 WO2022241196A1 (en) 2021-05-14 2022-05-13 Ion production system with efficient ion collection

Publications (2)

Publication Number Publication Date
JP2024521061A true JP2024521061A (ja) 2024-05-28
JP2024521061A5 JP2024521061A5 (enExample) 2025-03-11

Family

ID=83998469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2023570163A Pending JP2024521061A (ja) 2021-05-14 2022-05-13 効率的なイオン収集部を備えたイオン生成システム

Country Status (10)

Country Link
US (1) US12391568B2 (enExample)
EP (1) EP4338194A4 (enExample)
JP (1) JP2024521061A (enExample)
KR (1) KR20240035391A (enExample)
CN (1) CN117678050A (enExample)
AU (1) AU2022273773A1 (enExample)
CA (1) CA3218431A1 (enExample)
IL (1) IL308413A (enExample)
MX (1) MX2023013468A (enExample)
WO (1) WO2022241196A1 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20240090158A (ko) * 2021-10-01 2024-06-21 샤인 테크놀로지스 엘엘씨 이온 수집을 위한 섬유질 격자를 갖는 이온 생성 시스템

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299716A (ja) * 1992-07-09 1993-11-12 Shimadzu Corp 集束イオンビーム装置
JPH0673537A (ja) * 1992-08-27 1994-03-15 Ishikawajima Harima Heavy Ind Co Ltd イオンビームデポジション装置
JPH06103953A (ja) * 1992-09-18 1994-04-15 Elionix Kk 金属イオンを用いた薄膜形成方法およびその装置
JP2004139913A (ja) * 2002-10-21 2004-05-13 National Institute Of Advanced Industrial & Technology イオンビーム発生装置、イオンビーム発生方法、イオン処理装置およびイオン処理方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5354583A (en) * 1992-11-09 1994-10-11 Martin Marietta Energy Systems, Inc. Apparatus and method for selective area deposition of thin films on electrically biased substrates
RU2158170C1 (ru) * 1999-11-01 2000-10-27 Комбинат "Электрохимприбор" Способ разделения изотопов иттербия в электромагнитном сепараторе с использованием источника ионов
US6501078B1 (en) * 2000-03-16 2002-12-31 Applied Materials, Inc. Ion extraction assembly
US7138626B1 (en) * 2005-05-05 2006-11-21 Eai Corporation Method and device for non-contact sampling and detection
WO2007067296A2 (en) * 2005-12-02 2007-06-14 Alis Corporation Ion sources, systems and methods
JP5575198B2 (ja) * 2012-09-25 2014-08-20 株式会社東芝 磁気抵抗効果素子の製造方法及び磁気抵抗効果素子の製造装置
US9443708B2 (en) * 2014-09-10 2016-09-13 Battelle Memorial Institute Ion implantation system and process for ultrasensitive determination of target isotopes

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05299716A (ja) * 1992-07-09 1993-11-12 Shimadzu Corp 集束イオンビーム装置
JPH0673537A (ja) * 1992-08-27 1994-03-15 Ishikawajima Harima Heavy Ind Co Ltd イオンビームデポジション装置
JPH06103953A (ja) * 1992-09-18 1994-04-15 Elionix Kk 金属イオンを用いた薄膜形成方法およびその装置
JP2004139913A (ja) * 2002-10-21 2004-05-13 National Institute Of Advanced Industrial & Technology イオンビーム発生装置、イオンビーム発生方法、イオン処理装置およびイオン処理方法

Also Published As

Publication number Publication date
WO2022241196A1 (en) 2022-11-17
US12391568B2 (en) 2025-08-19
EP4338194A4 (en) 2025-10-29
US20220363558A1 (en) 2022-11-17
CN117678050A (zh) 2024-03-08
MX2023013468A (es) 2024-03-07
IL308413A (en) 2024-01-01
EP4338194A1 (en) 2024-03-20
AU2022273773A1 (en) 2023-11-23
CA3218431A1 (en) 2022-11-17
KR20240035391A (ko) 2024-03-15

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