JP2024514551A5 - - Google Patents
Info
- Publication number
- JP2024514551A5 JP2024514551A5 JP2023561031A JP2023561031A JP2024514551A5 JP 2024514551 A5 JP2024514551 A5 JP 2024514551A5 JP 2023561031 A JP2023561031 A JP 2023561031A JP 2023561031 A JP2023561031 A JP 2023561031A JP 2024514551 A5 JP2024514551 A5 JP 2024514551A5
- Authority
- JP
- Japan
- Prior art keywords
- series
- input
- evc
- variable capacitance
- matching circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163170768P | 2021-04-05 | 2021-04-05 | |
| US63/170,768 | 2021-04-05 | ||
| PCT/US2022/023395 WO2022216649A1 (en) | 2021-04-05 | 2022-04-05 | Rf impedance matching network |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024514551A JP2024514551A (ja) | 2024-04-02 |
| JP2024514551A5 true JP2024514551A5 (https=) | 2025-03-31 |
Family
ID=81384653
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023561031A Pending JP2024514551A (ja) | 2021-04-05 | 2022-04-05 | Ｒｆインピーダンス整合ネットワーク |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20240194449A1 (https=) |
| JP (1) | JP2024514551A (https=) |
| KR (1) | KR20240032713A (https=) |
| TW (1) | TWI851988B (https=) |
| WO (1) | WO2022216649A1 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10431428B2 (en) * | 2014-01-10 | 2019-10-01 | Reno Technologies, Inc. | System for providing variable capacitance |
| WO2024110007A1 (en) * | 2022-11-21 | 2024-05-30 | Hitachi Energy Ltd | Modular multi-level converter for dc transmission |
| CN117459023B (zh) * | 2023-11-17 | 2024-07-16 | 深圳市恒运昌真空技术股份有限公司 | 阻抗匹配阵列、匹配方法、射频电源及等离子体射频系统 |
| US20250316453A1 (en) * | 2024-04-05 | 2025-10-09 | Applied Materials, Inc. | Solid state variable capacitors for rf matches |
| CN118740089A (zh) * | 2024-07-09 | 2024-10-01 | 深圳捷迅通射频技术有限公司 | 一种射频匹配器、匹配方法、装置、设备及介质 |
| US20260074693A1 (en) * | 2024-09-09 | 2026-03-12 | Applied Materials, Inc. | High bandgap switched shunt capacitor architecture |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6677828B1 (en) * | 2000-08-17 | 2004-01-13 | Eni Technology, Inc. | Method of hot switching a plasma tuner |
| EP1891650A4 (en) | 2005-03-05 | 2012-03-28 | Innovation Engineering Llc | ELECTRONICALLY VARIABLE CAPACITOR ARRAY |
| JP2012060104A (ja) * | 2010-08-11 | 2012-03-22 | Toshiba Corp | 電源制御装置、プラズマ処理装置、及びプラズマ処理方法 |
| EP3048741B1 (en) * | 2013-10-25 | 2018-09-12 | Huawei Technologies Co., Ltd. | Copper wire interface circuit |
| US9844127B2 (en) | 2014-01-10 | 2017-12-12 | Reno Technologies, Inc. | High voltage switching circuit |
| US10679824B2 (en) | 2015-06-29 | 2020-06-09 | Reno Technologies, Inc. | Capacitance variation |
| US10431428B2 (en) | 2014-01-10 | 2019-10-01 | Reno Technologies, Inc. | System for providing variable capacitance |
| US10340879B2 (en) | 2015-02-18 | 2019-07-02 | Reno Technologies, Inc. | Switching circuit |
| US10984986B2 (en) * | 2015-06-29 | 2021-04-20 | Reno Technologies, Inc. | Impedance matching network and method |
| US10692699B2 (en) | 2015-06-29 | 2020-06-23 | Reno Technologies, Inc. | Impedance matching with restricted capacitor switching |
| US10229816B2 (en) * | 2016-05-24 | 2019-03-12 | Mks Instruments, Inc. | Solid-state impedance matching systems including a hybrid tuning network with a switchable coarse tuning network and a varactor fine tuning network |
| US10148231B2 (en) * | 2016-06-14 | 2018-12-04 | Analogic Corporation | RF power amplifier with dynamic impedance matching through discrete presets and/or a variable power supply |
| US20180175819A1 (en) * | 2016-12-16 | 2018-06-21 | Lam Research Corporation | Systems and methods for providing shunt cancellation of parasitic components in a plasma reactor |
| US11521833B2 (en) | 2017-07-10 | 2022-12-06 | Reno Technologies, Inc. | Combined RF generator and RF solid-state matching network |
| US12272522B2 (en) * | 2017-07-10 | 2025-04-08 | Asm America, Inc. | Resonant filter for solid state RF impedance matching network |
| US10269540B1 (en) * | 2018-01-25 | 2019-04-23 | Advanced Energy Industries, Inc. | Impedance matching system and method of operating the same |
| JP7211806B2 (ja) * | 2018-12-26 | 2023-01-24 | 株式会社ダイヘン | インピーダンス整合装置及びインピーダンス整合方法 |
| JP7105184B2 (ja) * | 2018-12-27 | 2022-07-22 | 株式会社ダイヘン | インピーダンス整合装置及びインピーダンス整合方法 |
| US12355418B2 (en) * | 2021-11-01 | 2025-07-08 | Advanced Energy Industries, Inc. | Two stage pin diode driver with energy recovery |
| US12537483B2 (en) * | 2022-11-15 | 2026-01-27 | Nxp Usa, Inc. | Amplifier device with low frequency resonance decoupling circuitry |
-
2022
- 2022-04-05 US US18/553,890 patent/US20240194449A1/en active Pending
- 2022-04-05 JP JP2023561031A patent/JP2024514551A/ja active Pending
- 2022-04-05 KR KR1020237037551A patent/KR20240032713A/ko active Pending
- 2022-04-05 WO PCT/US2022/023395 patent/WO2022216649A1/en not_active Ceased
- 2022-04-06 TW TW111113028A patent/TWI851988B/zh active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2024514551A5 (https=) | ||
| CN111224626B (zh) | 宽带功率组合布置 | |
| TWI355015B (en) | Dual frequency rf match | |
| CN102742366B (zh) | 阻抗匹配装置 | |
| US8508296B1 (en) | Tunable directional power combiner | |
| WO2001043282A1 (en) | Variable load switchable impedance matching system | |
| US20220028659A1 (en) | Broadband Plasma Processing Systems and Methods | |
| CN1965475A (zh) | 可变匹配电路 | |
| KR102825664B1 (ko) | 임피던스 매칭 회로, 및 이를 포함하는 전력 공급 장치 및 플라즈마 처리 설비 | |
| CN103456591A (zh) | 自动频率调谐源和偏置射频电源的电感耦合等离子处理室 | |
| US6633209B2 (en) | Filter | |
| JP2026506809A (ja) | インピーダンス整合回路、プラズマプロセス供給システム及びプラズマプロセスシステム | |
| US12293897B2 (en) | Radio frequency diverter assembly enabling on-demand different spatial | |
| KR20150064722A (ko) | 플라즈마 임피던스 매칭 장치 및 그 방법 | |
| JP2014239486A (ja) | インピーダンス整合回路 | |
| WO2018023367A1 (zh) | 电压波形整形振荡器 | |
| KR100809764B1 (ko) | 진공 처리 챔버의 ｒｆ 매칭 네트워크와 그 구성 방법 | |
| US20240321552A1 (en) | Impedance Matching Network and Control Method | |
| WO2022075975A1 (en) | Broadband plasma processing systems and methods | |
| CN105228330B (zh) | 一种射频等离子体设备匹配器 | |
| JP2003264402A (ja) | 分布定数回路 | |
| US20250167748A1 (en) | Match network with switchable variable capacitance | |
| KR100775559B1 (ko) | 전압이득이 일정한 ｒｆ 전원 필터 회로 | |
| CN121641800A (zh) | 用于等离子体工艺的阻抗匹配网络、等离子体控制系统及用于等离子体工艺的阻抗匹配方法 | |
| CN110517942B (zh) | 感应耦合等离子体蚀刻系统及其切换式匹配装置 |