JP2024510662A5 - - Google Patents
Info
- Publication number
- JP2024510662A5 JP2024510662A5 JP2023557655A JP2023557655A JP2024510662A5 JP 2024510662 A5 JP2024510662 A5 JP 2024510662A5 JP 2023557655 A JP2023557655 A JP 2023557655A JP 2023557655 A JP2023557655 A JP 2023557655A JP 2024510662 A5 JP2024510662 A5 JP 2024510662A5
- Authority
- JP
- Japan
- Prior art keywords
- approximately
- duty cycle
- substrate support
- process gas
- supplying
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17/208,735 | 2021-03-22 | ||
| US17/208,735 US20220298636A1 (en) | 2021-03-22 | 2021-03-22 | Methods and apparatus for processing a substrate |
| PCT/US2022/014653 WO2022203763A1 (en) | 2021-03-22 | 2022-02-01 | Methods and apparatus for processing a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2024510662A JP2024510662A (ja) | 2024-03-08 |
| JP2024510662A5 true JP2024510662A5 (https=) | 2025-02-12 |
Family
ID=83285226
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023557655A Pending JP2024510662A (ja) | 2021-03-22 | 2022-02-01 | 基板を処理するための方法及び装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20220298636A1 (https=) |
| JP (1) | JP2024510662A (https=) |
| KR (1) | KR20230159859A (https=) |
| CN (1) | CN117377791A (https=) |
| TW (1) | TW202237879A (https=) |
| WO (1) | WO2022203763A1 (https=) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US12467144B2 (en) * | 2022-10-27 | 2025-11-11 | Applied Materials, Inc. | Methods of correlating zones of processing chambers, and related systems and methods |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6184158B1 (en) * | 1996-12-23 | 2001-02-06 | Lam Research Corporation | Inductively coupled plasma CVD |
| US7622369B1 (en) * | 2008-05-30 | 2009-11-24 | Asm Japan K.K. | Device isolation technology on semiconductor substrate |
| KR101315950B1 (ko) * | 2009-06-24 | 2013-10-08 | 엘지전자 주식회사 | 플라즈마 증착 장치 및 이 장치를 이용한 박막 제조 방법 |
| KR101732187B1 (ko) * | 2009-09-03 | 2017-05-02 | 에이에스엠 저펜 가부시기가이샤 | 플라즈마 강화된 화학기상 증착법에 의해 규소-질소 결합을 갖는 등각성 유전체 막을 형성하는 방법 |
| US20120202315A1 (en) * | 2011-02-03 | 2012-08-09 | Applied Materials, Inc. | In-situ hydrogen plasma treatment of amorphous silicon intrinsic layers |
| JP2013033806A (ja) * | 2011-08-01 | 2013-02-14 | Sharp Corp | 半導体薄膜の製造方法およびプラズマｃｖｄ装置 |
| US20140329027A1 (en) * | 2013-05-02 | 2014-11-06 | Applied Materials, Inc. | Low temperature flowable curing for stress accommodation |
| KR101576637B1 (ko) * | 2014-07-15 | 2015-12-10 | 주식회사 유진테크 | 고종횡비를 가지는 오목부 상에 절연막을 증착하는 방법 |
| US10047440B2 (en) * | 2015-09-04 | 2018-08-14 | Applied Materials, Inc. | Methods and apparatus for uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices |
| KR20190011817A (ko) * | 2016-06-25 | 2019-02-07 | 어플라이드 머티어리얼스, 인코포레이티드 | 갭충전 애플리케이션들을 위한 유동가능 비정질 실리콘 막들 |
| US10840086B2 (en) * | 2018-04-27 | 2020-11-17 | Applied Materials, Inc. | Plasma enhanced CVD with periodic high voltage bias |
| US11578409B2 (en) * | 2019-06-08 | 2023-02-14 | Applied Materials, Inc. | Low deposition rates for flowable PECVD |
| WO2020257003A1 (en) * | 2019-06-17 | 2020-12-24 | Applied Materials, Inc. | High density plasma cvd microcrystalline or amorphous si film for display |
-
2021
- 2021-03-22 US US17/208,735 patent/US20220298636A1/en not_active Abandoned
-
2022
- 2022-02-01 JP JP2023557655A patent/JP2024510662A/ja active Pending
- 2022-02-01 KR KR1020237035855A patent/KR20230159859A/ko active Pending
- 2022-02-01 WO PCT/US2022/014653 patent/WO2022203763A1/en not_active Ceased
- 2022-02-01 CN CN202280018553.2A patent/CN117377791A/zh active Pending
- 2022-02-24 TW TW111106762A patent/TW202237879A/zh unknown
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