JP2024505557A - 補正板を使用した光学システムの収差及びアポダイゼーションの補正 - Google Patents
補正板を使用した光学システムの収差及びアポダイゼーションの補正 Download PDFInfo
- Publication number
- JP2024505557A JP2024505557A JP2023546431A JP2023546431A JP2024505557A JP 2024505557 A JP2024505557 A JP 2024505557A JP 2023546431 A JP2023546431 A JP 2023546431A JP 2023546431 A JP2023546431 A JP 2023546431A JP 2024505557 A JP2024505557 A JP 2024505557A
- Authority
- JP
- Japan
- Prior art keywords
- aberration
- optical system
- aberration correction
- term
- correction plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000005286 illumination Methods 0.000 claims abstract description 90
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- 230000036961 partial effect Effects 0.000 claims abstract description 9
- 201000009310 astigmatism Diseases 0.000 claims description 83
- 206010010071 Coma Diseases 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 48
- 238000003384 imaging method Methods 0.000 claims description 42
- 235000004035 Cryptotaenia japonica Nutrition 0.000 claims description 28
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/0257—Testing optical properties by measuring geometrical properties or aberrations by analyzing the image formed by the object to be tested
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0207—Details of measuring devices
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/58—Optics for apodization or superresolution; Optical synthetic aperture systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Geometry (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202163144996P | 2021-02-03 | 2021-02-03 | |
| US63/144,996 | 2021-02-03 | ||
| US17/574,157 US12092814B2 (en) | 2021-02-03 | 2022-01-12 | Correcting aberration and apodization of an optical system using correction plates |
| US17/574,157 | 2022-01-12 | ||
| PCT/US2022/014177 WO2022169675A1 (fr) | 2021-02-03 | 2022-01-28 | Correction d'aberration et d'apodisation d'un système optique à l'aide de plaques de correction |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2024505557A true JP2024505557A (ja) | 2024-02-06 |
Family
ID=82612379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023546431A Pending JP2024505557A (ja) | 2021-02-03 | 2022-01-28 | 補正板を使用した光学システムの収差及びアポダイゼーションの補正 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US12092814B2 (fr) |
| EP (1) | EP4278172A1 (fr) |
| JP (1) | JP2024505557A (fr) |
| KR (1) | KR20230136619A (fr) |
| CN (1) | CN116670499A (fr) |
| IL (1) | IL304202A (fr) |
| TW (1) | TW202246749A (fr) |
| WO (1) | WO2022169675A1 (fr) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115542678B (zh) * | 2022-09-05 | 2024-07-09 | 上海镭望光学科技有限公司 | 校正组件设计方法、校正组件及光刻机照明系统 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19516017C1 (de) | 1995-05-02 | 1996-09-19 | Leica Ag | Verfahren zur Kompensation von Wellenfrontdeformationen |
| KR100335446B1 (ko) | 2000-08-08 | 2002-05-04 | 윤종용 | 수차 보정소자 및 이를 채용한 광픽업장치 |
| JP4170712B2 (ja) | 2002-09-05 | 2008-10-22 | パイオニア株式会社 | 球面収差補正装置 |
| JP2004138900A (ja) | 2002-10-18 | 2004-05-13 | Pioneer Electronic Corp | 収差補正素子、収差補正装置、情報記録再生装置及び収差補正方法 |
| JP2011028823A (ja) * | 2008-10-31 | 2011-02-10 | Asahi Glass Co Ltd | 収差補正装置、光学装置および光ヘッド装置 |
| WO2014027694A1 (fr) | 2012-08-16 | 2014-02-20 | シチズンホールディングス株式会社 | Unité optique de correction d'aberration et microscope laser |
| US9335206B2 (en) | 2012-08-30 | 2016-05-10 | Kla-Tencor Corporation | Wave front aberration metrology of optics of EUV mask inspection system |
| US10761031B1 (en) | 2018-03-20 | 2020-09-01 | Kla-Tencor Corporation | Arbitrary wavefront compensator for deep ultraviolet (DUV) optical imaging system |
| US11118903B2 (en) | 2018-10-17 | 2021-09-14 | Kla Corporation | Efficient illumination shaping for scatterometry overlay |
| US11156846B2 (en) | 2019-04-19 | 2021-10-26 | Kla Corporation | High-brightness illumination source for optical metrology |
-
2022
- 2022-01-12 US US17/574,157 patent/US12092814B2/en active Active
- 2022-01-25 TW TW111103095A patent/TW202246749A/zh unknown
- 2022-01-28 EP EP22750203.6A patent/EP4278172A1/fr active Pending
- 2022-01-28 WO PCT/US2022/014177 patent/WO2022169675A1/fr active Application Filing
- 2022-01-28 CN CN202280008758.2A patent/CN116670499A/zh active Pending
- 2022-01-28 JP JP2023546431A patent/JP2024505557A/ja active Pending
- 2022-01-28 KR KR1020237027381A patent/KR20230136619A/ko active Search and Examination
-
2023
- 2023-07-03 IL IL304202A patent/IL304202A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230136619A (ko) | 2023-09-26 |
| IL304202A (en) | 2023-09-01 |
| EP4278172A1 (fr) | 2023-11-22 |
| TW202246749A (zh) | 2022-12-01 |
| WO2022169675A1 (fr) | 2022-08-11 |
| US12092814B2 (en) | 2024-09-17 |
| CN116670499A (zh) | 2023-08-29 |
| US20220244530A1 (en) | 2022-08-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240918 |
|
| A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20240918 |