JP2024078506A - インプリント装置、物品製造方法、決定方法及びプログラム - Google Patents

インプリント装置、物品製造方法、決定方法及びプログラム Download PDF

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Publication number
JP2024078506A
JP2024078506A JP2022190922A JP2022190922A JP2024078506A JP 2024078506 A JP2024078506 A JP 2024078506A JP 2022190922 A JP2022190922 A JP 2022190922A JP 2022190922 A JP2022190922 A JP 2022190922A JP 2024078506 A JP2024078506 A JP 2024078506A
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JP
Japan
Prior art keywords
substrate
mold
imprinting
imprint
partial region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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JP2022190922A
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English (en)
Japanese (ja)
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JP2024078506A5 (enExample
Inventor
敬司 山下
Takashi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2022190922A priority Critical patent/JP2024078506A/ja
Priority to KR1020230163981A priority patent/KR20240081365A/ko
Priority to US18/523,745 priority patent/US20240176231A1/en
Publication of JP2024078506A publication Critical patent/JP2024078506A/ja
Publication of JP2024078506A5 publication Critical patent/JP2024078506A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2022190922A 2022-11-30 2022-11-30 インプリント装置、物品製造方法、決定方法及びプログラム Pending JP2024078506A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2022190922A JP2024078506A (ja) 2022-11-30 2022-11-30 インプリント装置、物品製造方法、決定方法及びプログラム
KR1020230163981A KR20240081365A (ko) 2022-11-30 2023-11-23 임프린트 장치, 물품 제조 방법, 결정 방법, 및 기록 매체
US18/523,745 US20240176231A1 (en) 2022-11-30 2023-11-29 Imprint apparatus, article manufacturing method, determination method, and recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022190922A JP2024078506A (ja) 2022-11-30 2022-11-30 インプリント装置、物品製造方法、決定方法及びプログラム

Publications (2)

Publication Number Publication Date
JP2024078506A true JP2024078506A (ja) 2024-06-11
JP2024078506A5 JP2024078506A5 (enExample) 2025-10-16

Family

ID=91191581

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022190922A Pending JP2024078506A (ja) 2022-11-30 2022-11-30 インプリント装置、物品製造方法、決定方法及びプログラム

Country Status (3)

Country Link
US (1) US20240176231A1 (enExample)
JP (1) JP2024078506A (enExample)
KR (1) KR20240081365A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102820446B1 (ko) * 2019-05-08 2025-06-16 도쿄엘렉트론가부시키가이샤 접합 장치, 접합 시스템 및 접합 방법
US12237234B2 (en) * 2019-05-22 2025-02-25 VueReal Alignment process for the transfer setup

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4854383B2 (ja) * 2006-05-15 2012-01-18 アピックヤマダ株式会社 インプリント方法およびナノ・インプリント装置
JP5214683B2 (ja) * 2010-08-31 2013-06-19 株式会社東芝 インプリントレシピ作成装置及び方法並びにインプリント装置及び方法
JP6602033B2 (ja) * 2015-03-31 2019-11-06 キヤノン株式会社 インプリント装置、供給量分布の作成方法、インプリント方法、及び物品の製造方法
JP6590667B2 (ja) * 2015-11-30 2019-10-16 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法

Also Published As

Publication number Publication date
US20240176231A1 (en) 2024-05-30
KR20240081365A (ko) 2024-06-07

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