JP2024070578A - 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子 - Google Patents

感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子 Download PDF

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Publication number
JP2024070578A
JP2024070578A JP2022181166A JP2022181166A JP2024070578A JP 2024070578 A JP2024070578 A JP 2024070578A JP 2022181166 A JP2022181166 A JP 2022181166A JP 2022181166 A JP2022181166 A JP 2022181166A JP 2024070578 A JP2024070578 A JP 2024070578A
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JP
Japan
Prior art keywords
photosensitive resin
group
film
resin composition
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2022181166A
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English (en)
Japanese (ja)
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JP2024070578A5 (enExample
Inventor
仁 丸山
Hitoshi Maruyama
義弘 野島
Yoshihiro Nojima
伸司 青木
Shinji Aoki
一也 鳶島
Kazuya TOBISHIMA
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2022181166A priority Critical patent/JP2024070578A/ja
Priority to CN202380077666.4A priority patent/CN120202438A/zh
Priority to EP23888530.5A priority patent/EP4617775A1/en
Priority to PCT/JP2023/038853 priority patent/WO2024101182A1/ja
Priority to KR1020257015000A priority patent/KR20250096723A/ko
Priority to TW112143038A priority patent/TW202428842A/zh
Publication of JP2024070578A publication Critical patent/JP2024070578A/ja
Publication of JP2024070578A5 publication Critical patent/JP2024070578A5/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/002—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials
    • G02B1/005—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of materials engineered to provide properties not available in nature, e.g. metamaterials made of photonic crystals or photonic band gap materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Silicon Polymers (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Luminescent Compositions (AREA)
JP2022181166A 2022-11-11 2022-11-11 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子 Pending JP2024070578A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2022181166A JP2024070578A (ja) 2022-11-11 2022-11-11 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
CN202380077666.4A CN120202438A (zh) 2022-11-11 2023-10-27 光敏树脂组合物、光敏树脂覆膜、光敏干膜、图案形成方法及发光元件
EP23888530.5A EP4617775A1 (en) 2022-11-11 2023-10-27 Photosensitive resin composition, photosensitive resin film, photosensitive dry film, pattern forming method, and light-emitting element
PCT/JP2023/038853 WO2024101182A1 (ja) 2022-11-11 2023-10-27 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
KR1020257015000A KR20250096723A (ko) 2022-11-11 2023-10-27 감광성 수지 조성물, 감광성 수지피막, 감광성 드라이필름, 패턴형성방법 및 발광소자
TW112143038A TW202428842A (zh) 2022-11-11 2023-11-08 感光性樹脂組成物、感光性樹脂皮膜、感光性乾膜、圖型形成方法及發光元件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2022181166A JP2024070578A (ja) 2022-11-11 2022-11-11 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子

Publications (2)

Publication Number Publication Date
JP2024070578A true JP2024070578A (ja) 2024-05-23
JP2024070578A5 JP2024070578A5 (enExample) 2025-05-09

Family

ID=91032844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2022181166A Pending JP2024070578A (ja) 2022-11-11 2022-11-11 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子

Country Status (6)

Country Link
EP (1) EP4617775A1 (enExample)
JP (1) JP2024070578A (enExample)
KR (1) KR20250096723A (enExample)
CN (1) CN120202438A (enExample)
TW (1) TW202428842A (enExample)
WO (1) WO2024101182A1 (enExample)

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3159662A (en) 1962-07-02 1964-12-01 Gen Electric Addition reaction
US3220972A (en) 1962-07-02 1965-11-30 Gen Electric Organosilicon process using a chloroplatinic acid reaction product as the catalyst
US3159601A (en) 1962-07-02 1964-12-01 Gen Electric Platinum-olefin complex catalyzed addition of hydrogen- and alkenyl-substituted siloxanes
US3775452A (en) 1971-04-28 1973-11-27 Gen Electric Platinum complexes of unsaturated siloxanes and platinum containing organopolysiloxanes
JP6302387B2 (ja) * 2014-09-30 2018-03-28 富士フイルム株式会社 波長変換部材の製造方法、波長変換部材、バックライトユニットおよび液晶表示装置
JP7183939B2 (ja) * 2018-11-22 2022-12-06 信越化学工業株式会社 ポリシロキサン骨格含有ポリマー、感光性樹脂組成物、パターン形成方法、及び光半導体素子の製造方法
JP7227890B2 (ja) 2019-12-03 2023-02-22 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
JP2021182025A (ja) * 2020-05-18 2021-11-25 Jnc株式会社 量子ドットの樹脂分散
JP2022024425A (ja) * 2020-07-28 2022-02-09 冨士色素株式会社 蛍光ホイール及び光源装置
JP7355724B2 (ja) * 2020-12-07 2023-10-03 信越化学工業株式会社 量子ドットの表面処理方法及び表面処理装置

Also Published As

Publication number Publication date
WO2024101182A1 (ja) 2024-05-16
CN120202438A (zh) 2025-06-24
KR20250096723A (ko) 2025-06-27
EP4617775A1 (en) 2025-09-17
TW202428842A (zh) 2024-07-16

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