JP2023530849A - 迅速な計測回復のための精密真空ウィンドウビューポート及びペリクル - Google Patents
迅速な計測回復のための精密真空ウィンドウビューポート及びペリクル Download PDFInfo
- Publication number
- JP2023530849A JP2023530849A JP2022573205A JP2022573205A JP2023530849A JP 2023530849 A JP2023530849 A JP 2023530849A JP 2022573205 A JP2022573205 A JP 2022573205A JP 2022573205 A JP2022573205 A JP 2022573205A JP 2023530849 A JP2023530849 A JP 2023530849A
- Authority
- JP
- Japan
- Prior art keywords
- window
- optical axis
- aspects
- radiation
- nominal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005259 measurement Methods 0.000 title claims abstract description 32
- 238000011084 recovery Methods 0.000 title description 7
- 230000005855 radiation Effects 0.000 claims abstract description 178
- 230000003287 optical effect Effects 0.000 claims abstract description 132
- 238000006073 displacement reaction Methods 0.000 claims abstract description 105
- 230000000670 limiting effect Effects 0.000 claims description 9
- 230000009471 action Effects 0.000 claims description 4
- 238000000034 method Methods 0.000 abstract description 34
- 239000000758 substrate Substances 0.000 description 62
- 238000000059 patterning Methods 0.000 description 41
- 239000000446 fuel Substances 0.000 description 35
- 238000005286 illumination Methods 0.000 description 24
- 238000007789 sealing Methods 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 210000001747 pupil Anatomy 0.000 description 13
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 10
- 238000009826 distribution Methods 0.000 description 9
- 239000007789 gas Substances 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- 239000010410 layer Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000003384 imaging method Methods 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 239000005304 optical glass Substances 0.000 description 6
- 230000036961 partial effect Effects 0.000 description 6
- 239000013077 target material Substances 0.000 description 6
- 230000008901 benefit Effects 0.000 description 5
- 239000000356 contaminant Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 238000005538 encapsulation Methods 0.000 description 5
- 230000007246 mechanism Effects 0.000 description 5
- 230000003595 spectral effect Effects 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 230000004888 barrier function Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 238000007654 immersion Methods 0.000 description 4
- 238000009434 installation Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 230000000903 blocking effect Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 201000009310 astigmatism Diseases 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000009304 pastoral farming Methods 0.000 description 2
- 230000010363 phase shift Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 241000473391 Archosargus rhomboidalis Species 0.000 description 1
- 101100508416 Caenorhabditis elegans ifd-1 gene Proteins 0.000 description 1
- 101100508417 Caenorhabditis elegans ifd-2 gene Proteins 0.000 description 1
- -1 Li vapor Substances 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 206010040925 Skin striae Diseases 0.000 description 1
- 101150095130 URAD gene Proteins 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000005331 crown glasses (windows) Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 210000003128 head Anatomy 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/007—Pressure-resistant sight glasses
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
- H05G2/005—X-ray radiation generated from plasma being produced from a liquid or gas containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063046984P | 2020-07-01 | 2020-07-01 | |
| US63/046,984 | 2020-07-01 | ||
| PCT/EP2021/065676 WO2022002560A1 (en) | 2020-07-01 | 2021-06-10 | Precise vacuum window viewports and pellicles for rapid metrology recovery |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2023530849A true JP2023530849A (ja) | 2023-07-20 |
Family
ID=76522945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022573205A Pending JP2023530849A (ja) | 2020-07-01 | 2021-06-10 | 迅速な計測回復のための精密真空ウィンドウビューポート及びペリクル |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP2023530849A (zh) |
| KR (1) | KR20230031830A (zh) |
| CN (1) | CN115735163A (zh) |
| IL (1) | IL298613A (zh) |
| WO (1) | WO2022002560A1 (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023241885A1 (en) * | 2022-06-13 | 2023-12-21 | Asml Netherlands B.V. | Viewport assembly for an extreme ultraviolet light source |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7511799B2 (en) | 2006-01-27 | 2009-03-31 | Asml Netherlands B.V. | Lithographic projection apparatus and a device manufacturing method |
| US9341752B2 (en) * | 2012-11-07 | 2016-05-17 | Asml Netherlands B.V. | Viewport protector for an extreme ultraviolet light source |
| US11029324B2 (en) * | 2018-09-28 | 2021-06-08 | Taiwan Semiconductor Manufacturing Co., Ltd. | Particle image velocimetry of extreme ultraviolet lithography systems |
-
2021
- 2021-06-10 CN CN202180046991.5A patent/CN115735163A/zh active Pending
- 2021-06-10 IL IL298613A patent/IL298613A/en unknown
- 2021-06-10 WO PCT/EP2021/065676 patent/WO2022002560A1/en active Application Filing
- 2021-06-10 KR KR1020227043861A patent/KR20230031830A/ko active Search and Examination
- 2021-06-10 JP JP2022573205A patent/JP2023530849A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20230031830A (ko) | 2023-03-07 |
| IL298613A (en) | 2023-01-01 |
| CN115735163A (zh) | 2023-03-03 |
| WO2022002560A1 (en) | 2022-01-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI574122B (zh) | 高數值孔徑物鏡系統 | |
| TWI420257B (zh) | 微影裝置及元件製造方法 | |
| US20230269858A1 (en) | Systems and methods for laser-to-droplet alignment | |
| JP2023530849A (ja) | 迅速な計測回復のための精密真空ウィンドウビューポート及びペリクル | |
| US11204558B2 (en) | Particle suppression systems and methods | |
| US11740565B2 (en) | Collector flow ring | |
| US20230018949A1 (en) | Calibration system for an extreme ultraviolet light source | |
| US20230266255A1 (en) | Monolithic particle inspection device | |
| US20230021360A1 (en) | Systems and methods for manufacturing a double-sided electrostatic clamp | |
| US20230031443A1 (en) | Wafer clamp hard burl production and refurbishment | |
| WO2022263148A1 (en) | Cooling hood for reticle | |
| WO2022161795A1 (en) | Fast uniformity drift correction | |
| WO2023016815A1 (en) | Lithographic method to enhance illuminator transmission | |
| WO2022175025A1 (en) | Augmented reality (ar) assisted particle contamination detection | |
| KR20230170025A (ko) | 액추에이터-센서 디바이스 및 리소그래피 장치 | |
| TW202236001A (zh) | 倍縮光罩容器 | |
| TW202105078A (zh) | 具有改進污染微粒捕獲之微影設備及方法 | |
| CN116762042A (zh) | 快速均匀性漂移校正 | |
| CN117337412A (zh) | 模块化晶片台以及制造模块化晶片台的方法 | |
| CN117581160A (zh) | 光刻系统、衬底下垂补偿器及方法 | |
| CN114391125A (zh) | 具有远心转换器的放大率恒定的多级光学装置 | |
| Gower | High-Resolution EUV Imaging Tools for Resist Exposure and Aerial Image Monitoring | |
| JP2018522292A (ja) | アライメントシステムの光学システム |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20230131 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20240527 |