JP2023184422A - 計測方法、計測装置、リソグラフィ装置および物品製造方法 - Google Patents

計測方法、計測装置、リソグラフィ装置および物品製造方法 Download PDF

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Publication number
JP2023184422A
JP2023184422A JP2023030136A JP2023030136A JP2023184422A JP 2023184422 A JP2023184422 A JP 2023184422A JP 2023030136 A JP2023030136 A JP 2023030136A JP 2023030136 A JP2023030136 A JP 2023030136A JP 2023184422 A JP2023184422 A JP 2023184422A
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Japan
Prior art keywords
measurement
sensitivity
wavelength
substrate
value
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Pending
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JP2023030136A
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English (en)
Japanese (ja)
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JP2023184422A5 (https=
Inventor
渉 山口
Wataru Yamaguchi
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Canon Inc
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Canon Inc
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Application filed by Canon Inc filed Critical Canon Inc
Priority to KR1020230072599A priority Critical patent/KR20230173023A/ko
Priority to TW112121446A priority patent/TW202414124A/zh
Priority to US18/331,986 priority patent/US12578181B2/en
Priority to CN202310707304.0A priority patent/CN117250830A/zh
Publication of JP2023184422A publication Critical patent/JP2023184422A/ja
Publication of JP2023184422A5 publication Critical patent/JP2023184422A5/ja
Pending legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2023030136A 2022-06-16 2023-02-28 計測方法、計測装置、リソグラフィ装置および物品製造方法 Pending JP2023184422A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
KR1020230072599A KR20230173023A (ko) 2022-06-16 2023-06-07 계측방법, 계측장치, 리소그래피 장치, 및 물품 제조방법
TW112121446A TW202414124A (zh) 2022-06-16 2023-06-08 測量方法、測量設備、光刻設備、及物品製造方法
US18/331,986 US12578181B2 (en) 2022-06-16 2023-06-09 Measuring method, measuring apparatus, lithography apparatus, and article manufacturing method
CN202310707304.0A CN117250830A (zh) 2022-06-16 2023-06-14 测量方法、测量装置、光刻装置和物品制造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022097424 2022-06-16
JP2022097424 2022-06-16

Publications (2)

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JP2023184422A true JP2023184422A (ja) 2023-12-28
JP2023184422A5 JP2023184422A5 (https=) 2026-03-10

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JP2023030136A Pending JP2023184422A (ja) 2022-06-16 2023-02-28 計測方法、計測装置、リソグラフィ装置および物品製造方法

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025243386A1 (ja) * 2024-05-21 2025-11-27 株式会社日立ハイテク 計測システム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2025243386A1 (ja) * 2024-05-21 2025-11-27 株式会社日立ハイテク 計測システム

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